TWI411706B - Atomization nozzle plate and the manufacturing method thereof - Google Patents
Atomization nozzle plate and the manufacturing method thereof Download PDFInfo
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- TWI411706B TWI411706B TW100100323A TW100100323A TWI411706B TW I411706 B TWI411706 B TW I411706B TW 100100323 A TW100100323 A TW 100100323A TW 100100323 A TW100100323 A TW 100100323A TW I411706 B TWI411706 B TW I411706B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000889 atomisation Methods 0.000 title abstract description 18
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 64
- 229910052751 metal Inorganic materials 0.000 claims abstract description 44
- 239000002184 metal Substances 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 22
- 238000005323 electroforming Methods 0.000 claims abstract description 14
- 239000000084 colloidal system Substances 0.000 claims description 44
- 239000000758 substrate Substances 0.000 claims description 23
- 238000000465 moulding Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000007769 metal material Substances 0.000 claims description 8
- 239000003292 glue Substances 0.000 claims description 6
- 238000002347 injection Methods 0.000 claims description 5
- 239000007924 injection Substances 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 3
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 3
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims description 3
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims description 3
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910017709 Ni Co Inorganic materials 0.000 claims description 2
- 229910003267 Ni-Co Inorganic materials 0.000 claims description 2
- 229910003271 Ni-Fe Inorganic materials 0.000 claims description 2
- 229910003286 Ni-Mn Inorganic materials 0.000 claims description 2
- 229910003262 Ni‐Co Inorganic materials 0.000 claims description 2
- 230000009477 glass transition Effects 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 230000005611 electricity Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 description 13
- 239000007921 spray Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 3
- 229920001486 SU-8 photoresist Polymers 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000994 depressogenic effect Effects 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000341 volatile oil Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- -1 methoxy oxane Chemical compound 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 239000006199 nebulizer Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
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Abstract
Description
本發明係關於一種霧化噴孔片及其製作方法,特別是關於一種適用於微型霧化噴孔器之霧化噴孔片及其製作方法。The invention relates to an atomizing orifice sheet and a manufacturing method thereof, in particular to an atomizing orifice sheet suitable for a micro atomizing orificer and a manufacturing method thereof.
請參照第1圖所示,係中華民國公告第I272128號「霧化器結構」發明專利,揭示一種習知霧化噴孔片8。該習知霧化噴孔片8具有一突起部81及數個噴孔82,各該噴孔82係分散設置於該突起部81,且貫通該突起部81之相對二表面。藉此,將該習知霧化噴孔片8裝設於一霧化器後,即可利用壓電材料震動液體,以將液體擠出各該噴孔82後形成液滴,進而可產生霧化效果。Referring to Fig. 1, the invention patent of "Atomizer Structure" of the Republic of China Announcement No. I272128 discloses a conventional atomizing orifice sheet 8. The conventional atomizing orifice 8 has a projection 81 and a plurality of orifices 82. Each of the orifices 82 is disposed in the projection 81 and penetrates the opposite surfaces of the projection 81. Therefore, after the conventional atomizing orifice 8 is installed in an atomizer, the piezoelectric material can be used to vibrate the liquid to extrude the liquid into the nozzle holes 82 to form droplets, thereby generating fog. Effect.
上述習知霧化噴孔片8主要係預先利用電鑄成型一薄板後,再以機械加工方式形成該突起部81與各該噴孔82;然而,由於該習知霧化噴孔片8所形成之薄板的厚度相當薄,因此,導致該突起部81容易於加工過程中產生裂縫,甚至導致部分之噴孔82扭曲變形而阻塞,進而相對影響整體之霧化效果。The above-mentioned atomizing orifice sheet 8 is mainly formed by electroforming a sheet in advance, and then forming the protrusion portion 81 and each of the nozzle holes 82 by mechanical processing; however, due to the conventional atomizing orifice sheet 8 The thickness of the formed thin plate is rather thin, so that the protruding portion 81 is easy to generate cracks during processing, and even the partial spray holes 82 are distorted and blocked, thereby relatively affecting the overall atomization effect.
有鑑於此,為了克服上述習知霧化噴孔片8之缺點,請參照第2及3圖所示,係中華民國公開第200940182號「噴霧裝置之噴嘴片及其製法」發明專利,揭示另一種習知霧化噴孔片9。該習知霧化噴孔片9之製作方法主要包含下列步驟:預先提供一導電層,並於該導電層上形成數個絕緣層,且該些絕緣層皆呈重心位置偏移圖案中心點並形成左右對稱之幾何結構;次於該導電層外形成一電鍍層,並使各該絕緣層之部分保持外露;最後移除該導電層及絕緣層以形成一本體91,且該本體91係形成數個噴孔92,各該噴孔92皆呈重心偏移圖案中心且左右對稱之三角形結構。In view of the above, in order to overcome the above-mentioned shortcomings of the atomized orifice sheet 8, please refer to the invention patents of the Republic of China Publication No. 200940182 "Nozzle of spray device and its preparation method", and disclose another A conventional atomizing orifice sheet 9. The manufacturing method of the atomized orifice sheet 9 mainly comprises the steps of: providing a conductive layer in advance, and forming a plurality of insulating layers on the conductive layer, wherein the insulating layers are at a center point of the center of gravity offset pattern and Forming a bilaterally symmetrical geometric structure; forming a plating layer next to the conductive layer and keeping portions of each of the insulating layers exposed; finally removing the conductive layer and the insulating layer to form a body 91, and the body 91 is formed A plurality of nozzle holes 92, each of which has a triangular structure with a center of gravity offset pattern and a bilaterally symmetrical shape.
按,上述習知霧化噴孔片9雖可藉由在電鍍過程中直接形成該些噴孔92,以改善該習知霧化噴孔片8以機械加工方式所衍生之缺點;然而,由於該習知霧化噴孔片9使用時,主要係藉由壓電材料驅動該本體91震動來霧化液體,以該噴孔92概呈三角形之幾何結構而言,任二相鄰噴孔92之各個尖角之間必須留有適當的間距,方可避免該本體91震動時任二相鄰噴孔92之間出現裂痕,如此一來,導致該習知霧化噴孔片9之體積不易縮減,無法朝向更輕薄短小的方向研發設計,故確實必要進一步加以改良。According to the above-mentioned conventional atomizing orifice sheet 9, although the orifices 92 are directly formed in the plating process, the disadvantages of the conventional atomizing orifice sheet 8 being mechanically processed are improved; however, When the atomizing orifice sheet 9 is used, the liquid is mainly atomized by the piezoelectric material to drive the body 91 to vibrate. In the geometrical structure of the nozzle hole 92, any two adjacent nozzle holes 92 are used. Appropriate spacing must be left between the sharp corners to prevent cracks between the adjacent nozzles 92 when the body 91 is vibrated. As a result, the volume of the conventional atomizing orifice sheet 9 is not easily reduced. It is impossible to develop the design in a direction that is lighter, thinner and shorter, so it is necessary to further improve it.
本發明目的乃改良上述缺點,以提供一種霧化噴孔片之製作方法,藉由縮減整體體積仍可獲得均勻之微霧滴,以便易於朝微型化方向研發設計。SUMMARY OF THE INVENTION The object of the present invention is to improve the above-mentioned disadvantages and to provide a method for producing an atomized orifice sheet, which can be obtained by reducing the overall volume to obtain a uniform micro-droplet so as to be easy to develop in the miniaturization direction.
本發明又一目的係提供一種可應用於微型霧化器之霧化噴孔片,該霧化噴孔片係可有效縮減液滴尺寸,以供產生微霧滴提升霧化效果。Another object of the present invention is to provide an atomized orifice sheet which can be applied to a micro atomizer, which can effectively reduce the droplet size for generating a mist droplet to enhance the atomization effect.
為達到前述發明目的,本發明所運用之技術內容包含有:一種霧化噴孔片之製作方法,係包含:一光阻成形步驟,係於一基材表面形成一光阻層;一光阻加工步驟,係對該光阻層進行曝光及顯影,以獲得一柱狀結構之光阻層;一熱回流步驟,係加熱該柱狀結構之光阻層至熔融態,直到該柱狀結構之光阻層轉換為具有弧面之幾何結構後再進行冷卻,以獲得一凸形光阻層;一金屬成形步驟,係於該基材及凸形光阻層表面形成一金屬層;一製模步驟,係準備具有數個凹室之一模仁,並分別於各該凹室內填充一膠體;一貼附步驟,係將該模仁之膠體貼附於該金屬層表面,使各該膠體結合該金屬層後,將該模仁與該金屬層脫離;一電鑄步驟,係於該金屬層表面電鑄一金屬材料,以於該金屬層表面形成一厚度至少高於各該膠體之高度的電鑄層,且該電鑄層係對應該數個膠體形成有數個凹陷部;及一分割步驟,係將該電鑄層與該金屬層及膠體脫離。In order to achieve the foregoing object, the technical content of the present invention includes: a method for fabricating an atomized orifice sheet, comprising: a photoresist forming step of forming a photoresist layer on a surface of a substrate; a photoresist a processing step of exposing and developing the photoresist layer to obtain a photoresist structure of a columnar structure; and a thermal reflow step of heating the photoresist layer of the columnar structure to a molten state until the columnar structure The photoresist layer is converted into a curved surface geometry and then cooled to obtain a convex photoresist layer; a metal forming step is to form a metal layer on the surface of the substrate and the convex photoresist layer; a step of preparing a mold having a plurality of recesses, and filling a cavity in each of the recesses; and attaching the glue to the surface of the metal layer to bond the colloids After the metal layer, the mold core is separated from the metal layer; an electroforming step is to electroform a metal material on the surface of the metal layer to form a surface having a thickness at least higher than the height of each of the colloids. Cast layer, and the electroformed layer is The plurality of recessed portions several colloid formation; and a dividing step, the lines with electroformed layer from the metal layer and the colloid.
基於相同技術概念下,本發明霧化噴孔片之製作方法所製作的霧化噴孔片具有一弧形部及數個圓形噴孔,該弧形部具有呈相對之一內表面及一外表面,各該圓形噴孔係設置於該弧形部並貫通該內表面及外表面,且各該圓形噴孔皆具有一大徑端、一小徑端及一擴徑端,該大徑端係鄰接該內表面,且該大徑端經由該小徑端及擴徑端連通於該外表面。According to the same technical concept, the atomized orifice sheet produced by the method for manufacturing the atomized orifice sheet of the invention has an arc-shaped portion and a plurality of circular orifices, the curved portion having a relative inner surface and a The outer surface, each of the circular injection holes is disposed in the curved portion and penetrates the inner surface and the outer surface, and each of the circular injection holes has a large diameter end, a small diameter end and an enlarged diameter end, The large diameter end is adjacent to the inner surface, and the large diameter end communicates with the outer surface via the small diameter end and the enlarged diameter end.
為讓本發明之上述及其他目的、特徵及優點能更明顯易懂,下文特舉本發明之較佳實施例,並配合所附圖式,作詳細說明如下:請參照第4圖所示,本發明較佳實施例之霧化噴孔片的製作方法至少包含一光阻成形步驟S1、一光阻加工步驟S2、一熱回流步驟S3、一金屬層成形步驟S4、一製模步驟S5、一貼附步驟S6、一電鑄步驟S7及一分割步驟S8。The above and other objects, features, and advantages of the present invention will become more apparent from the description of the appended claims. The method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention comprises at least a photoresist forming step S1, a photoresist processing step S2, a heat reflow step S3, a metal layer forming step S4, a molding step S5, A step S6, an electroforming step S7 and a dividing step S8 are attached.
請參照第4及5圖所示,該光阻成形步驟S1係於一基材1[例如:矽晶圓基材或玻璃基材等]表面形成一光阻層2。更詳言之,該光阻成形步驟S1可分為二階段,第一階段係預先對該基材1之表面進行處理,以便去除該基材1表面之雜質,藉此提升該基材1與該光阻層2之間的附著性;在本實施例中,係選擇利用RCA清洗技術[RCA Clean]清洗該基材1,並將該基材1去水烘烤[Dehydration Bake],以將該基材1表面之水分蒸發。第二階段係選擇以旋轉塗覆[Spin]方式將一光阻材料均勻旋佈於該基材1之上表面[依圖面而言],以形成具有一預定厚度之光阻層2,且本實施例之光阻層2的預定厚度係選擇為200μm。又,在本實施例中,該光阻材料係選擇為一商用負型光阻劑SU-8系列做為實施態樣說明,惟本發明並不因此受限,該光阻材料亦可選擇為SP-341、JSR、BCB或AZ-4620等。Referring to FIGS. 4 and 5, the photoresist forming step S1 forms a photoresist layer 2 on the surface of a substrate 1 (for example, a germanium wafer substrate or a glass substrate). More specifically, the photoresist forming step S1 can be divided into two stages. The first stage is to treat the surface of the substrate 1 in advance to remove impurities on the surface of the substrate 1, thereby lifting the substrate 1 and Adhesion between the photoresist layers 2; in this embodiment, the substrate 1 is selected to be cleaned by RCA cleaning technology [RCA Clean], and the substrate 1 is dehydrated [Dehydration Bake] to The moisture on the surface of the substrate 1 evaporates. In the second stage, a photoresist material is uniformly spun on the upper surface of the substrate 1 [in terms of the surface] in a spin coating manner to form a photoresist layer 2 having a predetermined thickness, and The predetermined thickness of the photoresist layer 2 of the present embodiment is selected to be 200 μm. Moreover, in the embodiment, the photoresist material is selected as a commercial negative photoresist SU-8 series as an embodiment, but the invention is not limited thereby, and the photoresist material may also be selected as SP-341, JSR, BCB or AZ-4620.
請參照第4及6圖所示,該光阻加工步驟S2係對該光阻層2進行曝光及顯影,以獲得一柱狀結構之光阻層2’,且該柱狀結構之光阻體2’的側視形狀概呈矩形。更詳言之,該光阻加工步驟S2係選擇使用可提供特定波長之紫外光的一鄰接式印像機[Proximity Printer],並搭配具有欲成形幾何圖樣之一光罩M,使紫外光穿過該光罩M後投射於該光阻層2;待該光阻層2完成曝光後[曝光時間係為熟悉該項技藝者所可以理解,於此容不贅述],再經由一顯影液[例如:EPD1000或EPD2000等]去除未曝光之光阻層2,以獲得柱狀結構之該光阻層2’。Referring to FIGS. 4 and 6, the photoresist processing step S2 exposes and develops the photoresist layer 2 to obtain a columnar structure of the photoresist layer 2', and the columnar structure of the photoresist layer The 2' side view shape is roughly rectangular. More specifically, the photoresist processing step S2 selects an adjacent printer (Proximity Printer) which can provide ultraviolet light of a specific wavelength, and is matched with a mask M having a geometric pattern to be formed, so that the ultraviolet light is worn. After the mask M is projected on the photoresist layer 2; after the photoresist layer 2 is exposed to exposure [exposure time is understood by those skilled in the art, it will not be described here), and then through a developing solution [ For example, EPD1000 or EPD2000, etc. remove the unexposed photoresist layer 2 to obtain the photoresist layer 2' of the columnar structure.
請參照第4及7圖所示,該熱回流步驟S3係加熱該光阻層2’至熔融態,直到該光阻層2’轉換為具有弧面之幾何結構後再進行冷卻,以獲得一凸形光阻層2”。更詳言之,該熱回流步驟S3主要係利用一加熱器將該光阻層2’加熱至SU-8光阻材料之玻璃轉換溫度以上,使該光阻層2’得以憑藉其自身之流動性來形成各種具有弧面之幾何結構後再進行冷卻固化;又,在本實施例中,係選擇將該光阻層2’加熱至130℃,並維持20分鐘後再進行冷卻固化,以形成非球面之該凸形光阻層2”。Referring to FIGS. 4 and 7, the thermal reflow step S3 heats the photoresist layer 2' to a molten state until the photoresist layer 2' is converted into a geometrical structure having a curved surface, and then cooled to obtain a The convex photoresist layer 2". More specifically, the thermal reflow step S3 is mainly to heat the photoresist layer 2' to a glass transition temperature of the SU-8 photoresist material by a heater to make the photoresist layer 2' can be formed into various arcuate geometries by its own fluidity and then cooled and solidified; in addition, in this embodiment, the photoresist layer 2' is selected to be heated to 130 ° C for 20 minutes. Then, it is cooled and solidified to form the convex photoresist layer 2" which is aspherical.
請參照第4及8圖所示,該金屬層成形步驟S4係於該基材1及凸形光阻層2”表面形成一金屬層3。更詳言之,該金屬層成形步驟S4係可選擇利用物理氣相沉積[PVD]或化學氣相沉積[CVD]等方式,於該基材1及凸形光阻層2”之上表面[依圖面而言]形成該金屬層3,且該金屬層3係對應該凸形光阻層2”之外形輪廓形成有一弧形部31;又,在本實施例中,係選擇將鋁或銀以濺鍍[Sputter]方式形成於該基材1及凸形光阻層2”表面,以形成厚度約為0.3μm之鋁層或銀層做為該金屬層3。Referring to Figures 4 and 8, the metal layer forming step S4 forms a metal layer 3 on the surface of the substrate 1 and the convex photoresist layer 2". More specifically, the metal layer forming step S4 is Selecting, by means of physical vapor deposition [PVD] or chemical vapor deposition [CVD], forming the metal layer 3 on the surface of the substrate 1 and the convex photoresist layer 2" (in terms of the surface), and The metal layer 3 is formed with an arc portion 31 corresponding to the convex photoresist layer 2"; in this embodiment, aluminum or silver is selectively formed on the substrate by sputtering [Sputter]. 1 and a surface of the convex photoresist layer 2" to form an aluminum layer or a silver layer having a thickness of about 0.3 μm as the metal layer 3.
請參照第4及9圖所示,該製模步驟S5係準備具有數個凹室41之一模仁4,並分別於各該凹室41內填充一膠體42。更詳言之,在本實施例中,係選擇以PDMS[聚二甲基矽氧烷]做為該模仁4之材料,並於該模仁4之上表面[依圖面而言]開設概呈〝圓柱體〞之數個凹室41後,再以UV膠做為該膠體42注入各該凹室41內;特別是,本實施例之各該凹室41可選擇為交錯排列、等間距排列或平行排列等方式,且各該凹室41之孔徑係選擇為10μm~20μm,以便後續所製成之霧化噴孔片可產生粒徑約為3μm~8μm的霧化液滴,進而可有效提升整體之霧化效果。此外,該製模步驟S5可進一步選擇以物理切割方式[例如:雷射切割或刀具切割等],將超過該模仁4表面之各該凹室41內的UV膠刮除,以利後續該貼附步驟S6之進行。又,本發明之製模步驟S5的實施時間並不受本實施例所侷限,該製模步驟S5亦可選擇實施於該金屬層成形步驟S4之前。Referring to FIGS. 4 and 9, the molding step S5 is to prepare a mold core 4 having a plurality of recesses 41, and a colloid 42 is filled in each of the recesses 41, respectively. More specifically, in the present embodiment, PDMS [polydimethyl methoxy oxane] is selected as the material of the mold core 4, and is opened on the upper surface of the mold core 4 [in terms of the surface] After the plurality of recesses 41 of the cylindrical crucible are formed, the colloids 42 are injected into the recesses 41 by UV glue; in particular, the recesses 41 of the embodiment can be alternately arranged, etc. Arranged in a pitch or parallel manner, and the aperture of each of the recesses 41 is selected to be 10 μm to 20 μm, so that the subsequently produced atomized orifice sheet can produce atomized droplets having a particle diameter of about 3 μm to 8 μm. Can effectively improve the overall atomization effect. In addition, the molding step S5 may further select to scrape the UV glue in each of the recesses 41 beyond the surface of the mold core 4 in a physical cutting manner [eg, laser cutting or cutter cutting, etc.) to facilitate subsequent Attachment step S6 is performed. Moreover, the implementation time of the molding step S5 of the present invention is not limited by the embodiment, and the molding step S5 may also be selected before the metal layer forming step S4.
請參照第4及10圖所示,該貼附步驟S6係將該模仁4之膠體42貼附於該金屬層3之表面,使各該膠體42結合該金屬層3後,將該模仁4與該金屬層3脫離。更詳言之,該貼附步驟S6係預先將該模仁4之各該膠體42貼附於該金屬層3之弧形部31的上表面[依圖面而言],由於PDMS所製成之模仁4柔軟而具有良好的適形性,使各該膠體42得以與該金屬層3之弧形部31相貼接;接著,本實施例係選擇利用紫外光穿過該模仁4後照射於該金屬層3與各該膠體42,直到各該膠體42固化結合於該金屬層3之弧形部31後[固化時間係為熟悉該項技藝者所可以理解,於此容不贅述],即可將該模仁4與該金屬層3脫離。其中,本實施例之弧形部31上之各該膠體42的形狀係對應該凹室41的形狀而概呈〝圓柱體〞,且各該膠體42之高度(H)係選擇小於30μm。Referring to FIGS. 4 and 10, the attaching step S6 attaches the colloid 42 of the mold core 4 to the surface of the metal layer 3, and after bonding the colloid 42 to the metal layer 3, the mold core is attached. 4 is detached from the metal layer 3. More specifically, the attaching step S6 attaches the colloids 42 of the mold core 4 to the upper surface of the curved portion 31 of the metal layer 3 in advance (in terms of the drawing), which is made by PDMS. The mold core 4 is soft and has good conformability, so that the colloids 42 can be attached to the curved portion 31 of the metal layer 3; then, in this embodiment, the ultraviolet light is selected to pass through the mold core 4 Irradiation of the metal layer 3 and each of the colloids 42 until the colloids 42 are cured and bonded to the curved portion 31 of the metal layer 3 [curing time is understood by those skilled in the art, and will not be described herein] The mold core 4 can be detached from the metal layer 3. The shape of each of the colloids 42 on the curved portion 31 of the present embodiment is a cylindrical 〞 corresponding to the shape of the concave chamber 41, and the height (H) of each of the colloids 42 is selected to be less than 30 μm.
請參照第4及11圖所示,該電鑄步驟S7係於該金屬層3表面電鑄一金屬材料,以於該金屬層3表面形成一厚度(T)至少高於各該膠體42之高度(H)的電鑄層5,且該電鑄層5係對應該數個膠體42形成有數個凹陷部51。更詳言之,在電鑄過程中,該電鑄層5係會預先從該金屬層3之上表面[依圖面而言]逐漸成長,並填滿該弧形部31上之各該膠體42之間的空隙;當該電鑄層5之厚度(T)超過該膠體42之高度(H)後,由於各該膠體42不導電,故該金屬材料將無法直接從各該膠體42頂面[依圖面而言]成長,而僅可沿各該膠體42頂面外周緣逐漸向內覆蓋各該膠體42頂面,使該電鑄層5分別於各該膠體42頂面形成該凹陷部51;其中,由於各該膠體42為圓柱體之幾何結構,故各該凹陷部51可分別於各該膠體42頂面形成孔徑為(G)之圓形區域421,各該圓形區域421即為各該膠體42頂面尚未被該金屬材料覆蓋之區域。Referring to FIGS. 4 and 11, the electroforming step S7 is to electroform a metal material on the surface of the metal layer 3 to form a thickness (T) on the surface of the metal layer 3 at least higher than the height of each of the colloids 42. The electroformed layer 5 of (H), and the electroformed layer 5 is formed with a plurality of depressed portions 51 corresponding to the plurality of colloids 42. More specifically, in the electroforming process, the electroformed layer 5 is gradually grown from the upper surface of the metal layer 3 [in terms of the surface], and fills the colloids on the curved portion 31. The gap between the 42; when the thickness (T) of the electroformed layer 5 exceeds the height (H) of the colloid 42, since the colloid 42 is not electrically conductive, the metal material cannot be directly from the top surface of each of the colloids 42. [on the surface of the drawing], the top surface of each of the colloids 42 is gradually covered inwardly along the outer periphery of the top surface of each of the colloids 42 so that the electroformed layer 5 forms the depressed portion on the top surface of each of the colloids 42 respectively. 51; wherein, each of the colloids 42 has a cylindrical geometry, each of the recesses 51 can form a circular region 421 having a diameter (G) on each of the top surfaces of the colloids 42, respectively. For each of the top surfaces of the colloid 42 that has not been covered by the metal material.
又,隨著該電鑄層5之厚度(T)的增加,該金屬材料覆蓋各該膠體42頂面之範圍亦隨之增加,相對的使各該膠體42頂面之圓形區域421的孔徑(G)逐漸縮小,在各該圓形區域421之孔徑(G)縮小至一預定尺寸時即可完成該電鑄步驟S7;其中,該圓形區域421之孔徑(G)的大小即為該霧化噴孔片之噴孔的大小,故該孔徑(G)之預定尺寸可依據不同使用需求加以選擇,以便產生不同尺寸之噴霧粒徑;在本實施例中,各該圓形區域421之孔徑(G)係選擇小於5μm做為實施態樣說明,藉此可適當縮減霧化液滴之粒徑,以便獲得均勻之霧化效果。此外,本實施例之電鑄步驟S7所使用的金屬材料係選擇為Ni-Fe、Ni-Co、Ni-Mn或Ni-N等合金,並預先以電流密度為0.1 ASD之低速電流進行電鑄,且維持10分鐘後再以電流密度為1 ASD之高速電流持續電鑄,直到該電鑄層5之厚度(T)到達30μm~50μm。Moreover, as the thickness (T) of the electroformed layer 5 increases, the range of the metal material covering the top surface of each of the colloids 42 also increases, and the aperture of the circular region 421 of the top surface of each of the colloids 42 is relatively increased. (G) is gradually reduced, and the electroforming step S7 is completed when the aperture (G) of each of the circular regions 421 is reduced to a predetermined size; wherein the size of the aperture (G) of the circular region 421 is The size of the orifice of the atomized orifice sheet, so that the predetermined size of the aperture (G) can be selected according to different use requirements to produce spray sizes of different sizes; in this embodiment, each of the circular regions 421 The pore diameter (G) is selected to be less than 5 μm as an embodiment, whereby the particle size of the atomized droplets can be appropriately reduced to obtain a uniform atomization effect. In addition, the metal material used in the electroforming step S7 of the present embodiment is selected to be an alloy such as Ni-Fe, Ni-Co, Ni-Mn or Ni-N, and is electroformed in advance with a low-speed current having a current density of 0.1 ASD. After 10 minutes, the electroforming was continued at a high current of a current density of 1 ASD until the thickness (T) of the electroformed layer 5 reached 30 μm to 50 μm.
請參照第4及12圖所示,該分割步驟S8係將該電鑄層5與該金屬層3及膠體42脫離,以獲得具有數個圓形通孔之電鑄層5做為該霧化噴孔片成品。Referring to FIGS. 4 and 12, the dividing step S8 separates the electroformed layer 5 from the metal layer 3 and the colloid 42 to obtain an electroformed layer 5 having a plurality of circular through holes as the atomization. The finished orifice sheet.
本發明霧化噴孔片之製作方法的主要技術特點在於:相較於如第2及3圖之習知霧化噴孔片9直接於該導電層上形成三角形結構之數個絕緣層,而必須於各該三角形之各個尖角之間留有較大的間距,造成製作時不易縮減體積之缺點。本發明係利用該製模步驟S5來製作呈圓柱體之膠體42,並藉由該模仁4具有良好之適形性而可於該貼附步驟S6將各該膠體42結合該金屬層3之弧形部31,進而可利用該電鑄步驟S7控制各該圓柱體之膠體42頂面的圓形區域421的孔徑(G)。藉此,由於各該膠體42呈圓柱體之幾何結構,使各該膠體42之間的間距得以有效縮減,相對的使該電鑄步驟S7做為噴孔之各該圓形區域421之間的間距得以隨之縮減,使得本發明縮減整體體積後仍可維持其霧化效果,以達到易於朝微型化研發設計之功效。The main technical feature of the method for fabricating the atomized orifice sheet of the present invention is that a plurality of insulating layers of a triangular structure are formed directly on the conductive layer compared to the conventional atomizing orifice sheet 9 as shown in FIGS. 2 and 3. A large spacing must be left between the sharp corners of each of the triangles, which makes it difficult to reduce the volume during manufacture. The present invention utilizes the molding step S5 to form the colloid 42 in the form of a cylinder, and the colloid 4 can be bonded to the metal layer 3 in the attaching step S6 by the mold 4 having good conformability. The curved portion 31, in turn, can control the aperture (G) of the circular region 421 of the top surface of the colloid 42 of each of the cylinders by the electroforming step S7. Thereby, since the colloids 42 have a cylindrical geometry, the spacing between the colloids 42 can be effectively reduced, and the electroforming step S7 is relatively made between the circular regions 421 of the orifices. The spacing can be reduced accordingly, so that the invention can maintain its atomization effect after reducing the overall volume, so as to achieve the effect of easy to design for miniaturization.
請參照第12及13圖,並配合參照第11圖所示,基於與上述霧化噴孔片之製作方法相同的技術概念,本發明較佳實施例之霧化噴孔片6[亦即第11圖之電鑄層5]係具有一弧形部61及數個圓形噴孔62,且各該圓形噴孔62係形成於該弧形部61。又,在本實施例中,該霧化噴孔片6之厚度係選擇為30μm~50μm,以便適用於微型霧化噴孔器。Referring to Figures 12 and 13, and referring to Figure 11, the atomized orifice sheet 6 of the preferred embodiment of the present invention is based on the same technical concept as the method for producing the atomized orifice sheet. The electroformed layer 5 of Fig. 11 has an arcuate portion 61 and a plurality of circular orifices 62, and each of the circular orifices 62 is formed in the curved portion 61. Further, in the present embodiment, the thickness of the atomizing orifice sheet 6 is selected to be 30 μm to 50 μm so as to be suitable for use in a micro atomizing orifice.
該弧形部61係可選擇為各種具有弧面之幾何結構,而本實施例之弧形部61係選擇為非球面之幾何結構做為實施態樣說明;該弧形部61具有一內表面611及一外表面612,該內表面611及外表面612係分別為該弧形部61之底面及頂面[依圖面而言]。又,該弧形部61於該內表面611係形成有一轉換空間613,該轉換空間613主要係用以將液體初步轉換為霧化液滴[詳參後續說明]。The curved portion 61 can be selected as various geometrical structures having a curved surface, and the curved portion 61 of the embodiment is selected as an aspherical geometrical structure as an embodiment; the curved portion 61 has an inner surface. 611 and an outer surface 612, the inner surface 611 and the outer surface 612 are the bottom surface and the top surface of the curved portion 61, respectively. Moreover, the curved portion 61 is formed on the inner surface 611 with a conversion space 613 for mainly converting liquid into atomized droplets [for details].
各該圓形噴孔62係貫通該弧形部61之內、外表面611、612,且各該圓形噴孔62可定義一大徑端621、一小徑端622及一擴徑端623;該大徑端621係可經由該小徑端622連通於該擴徑端623,且各該大徑端621係鄰接該內表面611,而各該擴徑端623則鄰接該外表面612。特別是,本發明之各該小徑端622所形成之圓形通孔的孔徑係選擇小於5μm。藉此,位於該轉換空間613內之霧化液滴即可依序經由該大徑端621及小徑端622後再度縮減其自身之尺寸,使得經由該擴徑端623向外噴出之霧化液滴得以產生均勻之霧化效果。Each of the circular injection holes 62 extends through the inner and outer surfaces 611 and 612 of the curved portion 61, and each of the circular injection holes 62 defines a large diameter end 621, a small diameter end 622 and an enlarged diameter end 623. The large diameter end 621 can communicate with the enlarged diameter end 623 via the small diameter end 622 , and each of the large diameter ends 621 abuts the inner surface 611 , and each of the enlarged diameter ends 623 abuts the outer surface 612 . In particular, the apertures of the circular through holes formed by each of the small diameter ends 622 of the present invention are selected to be less than 5 μm. Thereby, the atomized droplets located in the conversion space 613 can be further reduced in size by the large diameter end 621 and the small diameter end 622, so that the atomization sprayed outward through the expanded diameter end 623 The droplets produce a uniform atomization effect.
請參照第14圖所示,本發明較佳實施例之霧化噴孔片主要係用以結合於一容器7之一開口71,且該容器7內裝設有各種類型之精油或藥品等液體,並可藉由一震盪器72[例如:壓電致動器]連接該容器7,以構成一霧化器。該霧化器可應用於生醫工程之藥物噴霧輸導及檢測技術等相關應用,以及應用於居家與個人化應用[例如:美容肌膚、燙傷傷口給藥噴霧器、室內加溼機、精油霧化器及產品造景裝飾等]。另一方面,該霧化器還可以進一步藉由一控制單元電性連接一顯示單元[例如:電視],且該控制單元可配合該顯示單元播出之內容,於特定之時間對應傳送一驅動訊號至該震盪器72,以供該震盪器72於該內容播出時同步驅動該霧化器產生霧化效果,進而可增加情境,有效達到提升臨場感之功效。Referring to Figure 14, the atomizing orifice sheet of the preferred embodiment of the present invention is mainly used for bonding to an opening 71 of a container 7, and the container 7 is provided with various types of liquid such as essential oil or medicine. The container 7 can be connected by an oscillator 72 [e.g., a piezoelectric actuator] to constitute an atomizer. The nebulizer can be applied to related applications such as drug spray and detection technology for biomedical engineering, as well as for home and personal applications [eg, cosmetic skin, burn wound administration sprayer, indoor humidifier, essential oil atomization). And product landscaping decoration, etc.]. On the other hand, the atomizer can be further electrically connected to a display unit [eg, a television] by a control unit, and the control unit can transmit a drive corresponding to the content broadcast by the display unit at a specific time. The signal is transmitted to the oscillator 72 for the oscillator 72 to synchronously drive the atomizer to generate an atomization effect when the content is broadcasted, thereby increasing the situation and effectively improving the effect of the presence.
特別是,請再參照第14圖所示,該霧化器於實際使用時,藉由該震盪器72驅動該容器7產生振動,以供該容器7內之液體可預先產生粒徑稍大之霧化液滴並聚集於該轉換空間613內;當該轉換空間613內之霧化液滴互相推擠至各該圓形噴孔62之大徑端621,並經由該小徑端622縮減該霧化液滴之尺寸,以便從各該擴徑端623噴出之霧化液滴得以形成尺寸約3~8μm之微霧滴。藉此,利用微霧滴所產生的高滲透性,可有效提高人體之吸收效果,避免過於乾燥的環境使人產生不適,且亦可加強保濕效果。In particular, please refer to FIG. 14 again, in the actual use, the vibrator 72 drives the container 7 to generate vibration, so that the liquid in the container 7 can be pre-produced with a slightly larger particle size. Atomizing the droplets and collecting them in the conversion space 613; when the atomized droplets in the conversion space 613 push each other to the large diameter end 621 of each of the circular orifices 62, and reducing the diameter through the small diameter end 622 The size of the atomized droplets is such that atomized droplets ejected from each of the expanded ends 623 form droplets having a size of about 3 to 8 μm. Thereby, the high permeability produced by the micro-mist droplets can effectively improve the absorption effect of the human body, avoid the unduly dry environment, and can also enhance the moisturizing effect.
本發明之霧化噴孔片的主要技術特點在於:藉由該震盪器72驅動該容器7產生振動,即可於該轉換空間613內初步獲得霧化液滴,並在該轉換空間613內之霧化液滴依序經由各該大徑端611及小徑端612後再進一步縮減該霧化液滴之尺寸,且藉由該擴徑端613之設計可使霧化液滴均勻噴出。換言之,本發明之各該圓形噴孔62之間的間隙得以適當縮小,進而可大幅縮減該霧化噴孔片6之整體體積,使得本發明霧化噴孔片可適用於微型霧化器。The main technical feature of the atomized orifice sheet of the present invention is that the vibration of the container 7 is driven by the oscillator 72, and the atomized droplets can be initially obtained in the conversion space 613 and are in the conversion space 613. The atomized droplets are further reduced in size by the large diameter end 611 and the small diameter end 612, and the atomized droplets are uniformly sprayed by the design of the expanded diameter end 613. In other words, the gap between the circular orifices 62 of the present invention can be appropriately reduced, and the overall volume of the atomizing orifice sheet 6 can be greatly reduced, so that the atomized orifice sheet of the present invention can be applied to a micro atomizer. .
綜上所述,本發明之霧化噴孔片及其製作方法,由於縮減整體體積後仍可維持其霧化效果,進而可易於朝微型化方向研發設計,並可適用於微型霧化器,以產生均勻之微霧滴提升霧化效果。In summary, the atomized orifice sheet of the present invention and the manufacturing method thereof can maintain the atomization effect after reducing the overall volume, and thus can be easily developed in the direction of miniaturization, and can be applied to a micro atomizer. To produce a uniform micro-droplet to enhance the atomization effect.
雖然本發明已利用上述較佳實施例揭示,然其並非用以限定本發明,任何熟習此技藝者在不脫離本發明之精神和範圍之內,相對上述實施例進行各種更動與修改仍屬本發明所保護之技術範疇,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the invention has been described in connection with the preferred embodiments described above, it is not intended to limit the scope of the invention. The technical scope of the invention is protected, and therefore the scope of the invention is defined by the scope of the appended claims.
1...基材1. . . Substrate
2、2’...光阻層2, 2’. . . Photoresist layer
2”...凸形光阻層2"...convex photoresist layer
3...金屬層3. . . Metal layer
31...弧形部31. . . Curved part
4...模仁4. . . Mold
41...凹室41. . . Alcove
42...膠體42. . . colloid
421...圓形區域421. . . Circular area
5...電鑄層5. . . Electroformed layer
51...凹陷部51. . . Depression
6...霧化噴孔片6. . . Atomized orifice sheet
61...弧形部61. . . Curved part
611...內表面611. . . The inner surface
612...外表面612. . . The outer surface
613...轉換空間613. . . Conversion space
62...圓形噴孔62. . . Round orifice
621...大徑端621. . . Large diameter end
622...小徑端622. . . Small diameter end
623...擴徑端623. . . Expanding end
G...孔徑G. . . Aperture
H...高度H. . . height
M...光罩M. . . Mask
T...厚度T. . . thickness
8...習知霧化噴孔片8. . . Conventional atomizing orifice
81...突起部81. . . Protrusion
82...噴孔82. . . Spray hole
9...習知霧化噴孔片9. . . Conventional atomizing orifice
91...本體91. . . Ontology
92...噴孔92. . . Spray hole
第1圖:中華民國公告第I272128號「霧化器結構」之霧化噴孔片的示意圖。Fig. 1 is a schematic view of an atomized orifice sheet of the "Atomizer Structure" of the Republic of China Announcement No. I272128.
第2圖:中華民國公開第200940182號「噴霧裝置之噴嘴片及其製法」之製作方法的步驟流程圖。Fig. 2 is a flow chart showing the steps of the method of producing the nozzle piece of the spray device and the method for producing the same.
第3圖:中華民國公開第200940182號「噴霧裝置之噴嘴片及其製法」之霧化噴孔片的示意圖。Fig. 3 is a schematic view of an atomized orifice sheet of the Republic of China Publication No. 200940182 "Nozzle of a spray device and its preparation method".
第4圖:本發明較佳實施例之霧化噴孔片的製作方法的步驟流程方塊圖。Figure 4 is a block diagram showing the steps of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第5圖:本發明較佳實施例之霧化噴孔片的製作方法的光阻成形步驟的剖視示意圖。Figure 5 is a cross-sectional view showing the photoresist forming step of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第6圖:本發明較佳實施例之霧化噴孔片的製作方法的光阻加工步驟的剖視示意圖。Figure 6 is a cross-sectional view showing the photoresist processing step of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第7圖:本發明較佳實施例之霧化噴孔片的製作方法的熱回流步驟的剖視示意圖。Figure 7 is a cross-sectional view showing the heat reflow step of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第8圖:本發明較佳實施例之霧化噴孔片的製作方法的金屬層成形步驟的剖視示意圖。Figure 8 is a cross-sectional view showing the metal layer forming step of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第9圖:本發明較佳實施例之霧化噴孔片的製作方法的製模步驟的剖視示意圖。Figure 9 is a cross-sectional view showing the molding step of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第10圖:本發明較佳實施例之霧化噴孔片的製作方法的貼附步驟的剖視示意圖。Fig. 10 is a cross-sectional view showing the attaching step of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第11圖:本發明較佳實施例之霧化噴孔片的製作方法的電鑄步驟的剖視示意圖。Figure 11 is a cross-sectional view showing the electroforming step of the method for fabricating the atomized orifice sheet of the preferred embodiment of the present invention.
第12圖:本發明較佳實施例之霧化噴孔片的剖視示意圖Figure 12 is a cross-sectional view showing the atomized orifice sheet of the preferred embodiment of the present invention.
第13圖:本發明較佳實施例之霧化噴孔片的立體示意圖。Figure 13 is a perspective view showing the atomized orifice sheet of the preferred embodiment of the present invention.
第14圖:本發明較佳實施例之霧化噴孔片的使用情形示意圖。Figure 14 is a schematic view showing the use of the atomized orifice sheet of the preferred embodiment of the present invention.
Claims (10)
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| TW100100323A TWI411706B (en) | 2011-01-05 | 2011-01-05 | Atomization nozzle plate and the manufacturing method thereof |
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| TW100100323A TWI411706B (en) | 2011-01-05 | 2011-01-05 | Atomization nozzle plate and the manufacturing method thereof |
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| TWI411706B true TWI411706B (en) | 2013-10-11 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080100672A1 (en) * | 2005-04-04 | 2008-05-01 | Silverbrook Research Pty Ltd | Unit Cell Of A Printhead For An Inkjet Printer |
| US20090056133A1 (en) * | 2007-08-29 | 2009-03-05 | United States Of America As Represented By The Secretary Of The Army | Process of forming an intergrated multiplexed electrospray atomizer |
| US20090179952A1 (en) * | 2008-01-16 | 2009-07-16 | Silverbrook Research Pty Ltd | Printhead nozzle face wiper with array of pads |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080100672A1 (en) * | 2005-04-04 | 2008-05-01 | Silverbrook Research Pty Ltd | Unit Cell Of A Printhead For An Inkjet Printer |
| US20090056133A1 (en) * | 2007-08-29 | 2009-03-05 | United States Of America As Represented By The Secretary Of The Army | Process of forming an intergrated multiplexed electrospray atomizer |
| US20090179952A1 (en) * | 2008-01-16 | 2009-07-16 | Silverbrook Research Pty Ltd | Printhead nozzle face wiper with array of pads |
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