TWI409936B - Electrostatic discharge protection circuits - Google Patents
Electrostatic discharge protection circuits Download PDFInfo
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- 230000015556 catabolic process Effects 0.000 claims description 8
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- 239000004065 semiconductor Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
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Abstract
Description
本發明係有關於靜電放電(electrostatic discharge,ESD)防護,特別是有關於低壓製程中高壓接腳的靜電放電防護。The invention relates to electrostatic discharge (ESD) protection, in particular to electrostatic discharge protection of high voltage pins in a low voltage process.
靜電放電現象容易導致半導體元件的損害而影響到積體電路之正常功能。因此,在設計積體電路時,需加強靜電放電的防護設計,以提升積體電路之靜電放電敏感度(sensitivity)。The electrostatic discharge phenomenon easily causes damage to the semiconductor element and affects the normal function of the integrated circuit. Therefore, when designing an integrated circuit, it is necessary to strengthen the protection design of the electrostatic discharge to enhance the electrostatic discharge sensitivity of the integrated circuit.
現今,由於低壓(low voltage,LV)製程的進步,越來越多的積體電路可操作在較低的工作電壓下,例如:一般邏輯電路常用的工作電壓(即5V、3.3V、2.5V、1.8V等)。然而,對一些有特殊應用需求的產品而言,積體電路內的部分接腳(pin)需要操作在較高的電壓,例如:7V、8V、9V等。其中,較高的電壓大體上係大於5V並且不屬於高壓(high voltage,HV)範圍,一般稱之為中壓(medium voltage,MV)。Nowadays, due to the progress of the low voltage (LV) process, more and more integrated circuits can be operated at lower operating voltages, such as the commonly used operating voltages of general logic circuits (ie 5V, 3.3V, 2.5V). , 1.8V, etc.). However, for some products with special application requirements, some pins in the integrated circuit need to operate at a higher voltage, such as: 7V, 8V, 9V, and so on. Among them, the higher voltage is generally greater than 5V and does not belong to the high voltage (HV) range, and is generally referred to as medium voltage (MV).
在積體電路中,若將中壓應用在低壓元件上,會造成低壓元件的崩潰(breakdown),使得低壓元件無法正常工作,即低壓製程中的靜電放電防護電路無法對使用中壓的接腳作保護。因此,需要一種能在現有的低壓製程上實現中壓靜電放電防護的電路。In the integrated circuit, if the medium voltage is applied to the low voltage component, the breakdown of the low voltage component will be caused, so that the low voltage component cannot work normally, that is, the electrostatic discharge protection circuit in the low voltage process cannot use the pin using the medium voltage. Protected. Therefore, there is a need for a circuit that achieves medium voltage ESD protection over existing low voltage processes.
本發明提供一種靜電放電防護電路,包括:一電晶體,耦接於一節點以及一接地端之間,具有一閘極耦接至上述接地端;一二極體串,耦接於上述節點以及一接合墊之間,具有以串聯方式連接之複數第一二極體,上述第一二極體係以由上述接合墊至上述節點之順向導通方向而連接;以及一第二二極體,耦接於上述節點以及上述接合墊之間,上述第二二極體係以由上述節點至上述接合墊之順向導通方向而連接。The present invention provides an ESD protection circuit, comprising: a transistor coupled between a node and a ground, having a gate coupled to the ground; a diode string coupled to the node and Between the bonding pads, there are a plurality of first diodes connected in series, the first two-pole system is connected in a forward direction from the bonding pad to the node; and a second diode is coupled Connected between the node and the bonding pad, the second two-pole system is connected in a forward direction from the node to the bonding pad.
再者,本發明提供一種靜電放電防護電路,包括:一N型電晶體,耦接於一節點以及一接地端之間,具有一閘極耦接至上述接地端;一第一二極體,具有一第一陽極以及一第一陰極,上述第一陽極耦接至一接合墊;一第二二極體,具有一第二陽極以及一第二陰極,上述第二陽極耦接至上述第一陰極,而上述第二陰極耦接至上述節點;以及一第三二極體,具有一第三陽極以及一第三陰極,上述第三陽極耦接至上述節點,而上述第三陰極耦接至上述接合墊。Furthermore, the present invention provides an ESD protection circuit comprising: an N-type transistor coupled between a node and a ground, and having a gate coupled to the ground; a first diode, Having a first anode and a first cathode, the first anode is coupled to a bonding pad; a second diode has a second anode and a second cathode, and the second anode is coupled to the first a cathode, wherein the second cathode is coupled to the node; and a third diode having a third anode and a third cathode, the third anode is coupled to the node, and the third cathode is coupled to The above bonding pad.
再者,本發明提供一種靜電放電防護電路,包括:一電晶體,耦接於一節點以及一接地端之間,具有一閘極耦接至上述接地端;一二極體串,耦接於上述節點以及一接合墊之間,具有以串聯方式連接之複數第一二極體;以及一第二二極體,耦接於上述節點以及上述接合墊之間,其中,當上述接合墊之一第一電壓大於上述節點之一第二電壓時,上述第一二極體係以由上述接合墊至上述節點之方向而順向導通,而當上述第二電壓大於上述第一電壓時,上述第二二極體係以由上述節點至上述接合墊之方向而順向導通。Furthermore, the present invention provides an ESD protection circuit, comprising: a transistor coupled between a node and a ground, having a gate coupled to the ground; a diode string coupled to Between the node and a bonding pad, a plurality of first diodes connected in series; and a second diode coupled between the node and the bonding pad, wherein one of the bonding pads When the first voltage is greater than a second voltage of the node, the first two-pole system is forwardly connected by the bonding pad to the node, and when the second voltage is greater than the first voltage, the second The two-pole system is guided by the direction from the above node to the bonding pad.
為讓本發明之上述和其他目的、特徵、和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下:The above and other objects, features and advantages of the present invention will become more <RTIgt;
第1圖係顯示根據本發明一實施例所述之靜電放電防護電路100。靜電放電防護電路100包括接合墊(pad)10、二極體串(diode chain)20、二極體30以及電晶體40。接合墊10耦接至接腳,用以接收中壓信號。二極體串20係由四顆二極體22、24、26與28串聯而組成,其中二極體22的陽極(anode)耦接至接合墊10、二極體22的陰極(cathode)耦接至二極體24的陽極、二極體24的陰極耦接至二極體26的陽極、二極體26的陰極耦接至二極體28的陽極,以及二極體28的陰極耦接至節點50。因此,二極體串20內的二極體係以由接合墊10至節點50之順向導通方向(forward conduction direction)而連接。二極體30耦接於接合墊10以及節點50之間,二極體30係以由節點50至接合墊10之順向導通方向而連接,即二極體30的陽極耦接至節點50而陰極耦接至接合墊10。電晶體40耦接於節點50以及接地端VSS之間,其中電晶體40的閘極耦接至接地端VSS。在此實施例中,電晶體40為N型金氧半導體(metal oxide semiconductor,MOS)電晶體。在靜電放電事件中,當接合墊10上的電壓大於節點50之電壓時,二極體串20內的二極體係以由接合墊10至節點50之方向而順向導通。反之,當節點50上的電壓大於接合墊10之電壓時,二極體30係以由節點50至接合墊10之方向而順向導通。Fig. 1 shows an electrostatic discharge protection circuit 100 according to an embodiment of the present invention. The ESD protection circuit 100 includes a bonding pad 10, a diode chain 20, a diode 30, and a transistor 40. The bonding pad 10 is coupled to the pin for receiving the medium voltage signal. The diode string 20 is composed of four diodes 22, 24, 26 and 28 connected in series, wherein the anode of the diode 22 is coupled to the junction pad 10 and the cathode coupling of the diode 22. The anode connected to the diode 24, the cathode of the diode 24 is coupled to the anode of the diode 26, the cathode of the diode 26 is coupled to the anode of the diode 28, and the cathode of the diode 28 is coupled. To node 50. Therefore, the two-pole system in the diode string 20 is connected in a forward conduction direction from the bonding pad 10 to the node 50. The diode 30 is coupled between the bonding pad 10 and the node 50, and the diode 30 is connected in a forward direction from the node 50 to the bonding pad 10, that is, the anode of the diode 30 is coupled to the node 50. The cathode is coupled to the bond pad 10. The transistor 40 is coupled between the node 50 and the ground VSS, wherein the gate of the transistor 40 is coupled to the ground VSS. In this embodiment, the transistor 40 is an N-type metal oxide semiconductor (MOS) transistor. In an electrostatic discharge event, when the voltage on bond pad 10 is greater than the voltage at node 50, the two-pole system within diode string 20 is compliant in the direction from bond pad 10 to node 50. On the other hand, when the voltage on the node 50 is greater than the voltage of the bonding pad 10, the diode 30 is guided in the direction from the node 50 to the bonding pad 10.
第2圖係顯示根據本發明一實施例所述之二極體的剖面圖。如第2圖所示,N型井區220係設置於P型基底210中,而P型摻雜區230係設置於N型井區220中。其中,P型摻雜區230以及N型井區220形成P型二極體250。如第2圖所顯示,P型二極體250係由N型井區220所包圍。由於N型井區220至P型基底210的崩潰電壓(breakdown voltage)很高,所以可使用P型二極體250來進行堆疊(stack)。因此,在本發明一實施例中,第1圖中二極體串20內的二極體以及二極體30皆為P型二極體250。Figure 2 is a cross-sectional view showing a diode according to an embodiment of the present invention. As shown in FIG. 2, the N-type well region 220 is disposed in the P-type substrate 210, and the P-type doped region 230 is disposed in the N-type well region 220. The P-type doping region 230 and the N-type well region 220 form a P-type diode 250. As shown in FIG. 2, the P-type diode 250 is surrounded by the N-type well region 220. Since the breakdown voltage of the N-type well region 220 to the P-type substrate 210 is high, the P-type diode 250 can be used for stacking. Therefore, in one embodiment of the present invention, the diodes and the diodes 30 in the diode string 20 in FIG. 1 are all P-type diodes 250.
參考第1圖,二極體串20內的二極體數量係根據中壓信號之實際操作電壓以及電晶體40之崩潰電壓所決定。對一般邏輯電路而言,常用的工作電壓為5V、3.3V、2.5V、1.8V等。然而,對邏輯電路的部分接腳而言,需要操作在較高的電壓,例如:大於5的電壓,即中壓。舉例來說,假設電晶體40之崩潰電壓為8V,而中壓信號之實際操作電壓為9V。接著,假設防護帶(guard band)為20%,則操作在接合墊10之最大電壓為10.8V。接著,接合墊10之最大電壓與電晶體40之崩潰電壓的電壓差為2.8V。由於二極體的順向偏壓大約為0.7V。因此,當電壓差為2.8V時,二極體串20內需要四顆二極體。在此實施例中,係以中壓為9V來作當作例子,然其並非用以限定本發明的範圍。根據不同的中壓以及低壓元件之崩潰電壓,使用者可選擇適當的二極體數量。Referring to Figure 1, the number of diodes in the diode string 20 is determined by the actual operating voltage of the medium voltage signal and the breakdown voltage of the transistor 40. For general logic circuits, commonly used operating voltages are 5V, 3.3V, 2.5V, 1.8V, and so on. However, for some of the pins of the logic circuit, it is necessary to operate at a higher voltage, for example, a voltage greater than 5, that is, medium voltage. For example, assume that the breakdown voltage of the transistor 40 is 8V, and the actual operating voltage of the medium voltage signal is 9V. Next, assuming that the guard band is 20%, the maximum voltage operating on the bond pad 10 is 10.8V. Next, the voltage difference between the maximum voltage of the bonding pad 10 and the breakdown voltage of the transistor 40 is 2.8V. Since the forward bias of the diode is approximately 0.7V. Therefore, when the voltage difference is 2.8V, four diodes are required in the diode string 20. In this embodiment, a medium voltage of 9 V is taken as an example, which is not intended to limit the scope of the invention. Depending on the medium voltage and the breakdown voltage of the low voltage components, the user can select the appropriate number of diodes.
本發明實施例所述之靜電放電防護電路可在低壓製程所形成的低壓電路內提供中壓的靜電放電防護。再者,本發明不需要額外的製程成本即可在現有的低壓製程中提供較高電壓的靜電放電防護。The electrostatic discharge protection circuit according to the embodiment of the invention can provide medium voltage electrostatic discharge protection in a low voltage circuit formed by a low voltage process. Furthermore, the present invention provides higher voltage ESD protection in existing low voltage processes without the need for additional process cost.
本發明雖以較佳實施例揭露如上,然其並非用以限定本發明的範圍,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,當可做些許的更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。The present invention has been described above with reference to the preferred embodiments thereof, and is not intended to limit the scope of the present invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.
10...接合墊10. . . Mat
20...二極體串20. . . Diode string
22、24、26、28、30...二極體22, 24, 26, 28, 30. . . Dipole
40...電晶體40. . . Transistor
50...節點50. . . node
100...靜電放電防護電路100. . . Electrostatic discharge protection circuit
210...P型基底210. . . P-type substrate
220...N型井區220. . . N type well area
230...P型摻雜區230. . . P-doped region
250...P型二極體250. . . P-type diode
VSS...接地端VSS. . . Ground terminal
第1圖係顯示根據本發明一實施例所述之靜電放電防護電路;以及第2圖係顯示根據本發明一實施例所述之二極體的製程剖面圖。1 is a view showing an electrostatic discharge protection circuit according to an embodiment of the present invention; and FIG. 2 is a cross-sectional view showing a process of a diode according to an embodiment of the present invention.
10...接合墊10. . . Mat
20...二極體串20. . . Diode string
22、24、26、28、30...二極體22, 24, 26, 28, 30. . . Dipole
40...電晶體40. . . Transistor
50...節點50. . . node
100...靜電放電防護電路100. . . Electrostatic discharge protection circuit
VSS...接地端VSS. . . Ground terminal
Claims (13)
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| TW96127285A TWI409936B (en) | 2007-07-26 | 2007-07-26 | Electrostatic discharge protection circuits |
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| TW96127285A TWI409936B (en) | 2007-07-26 | 2007-07-26 | Electrostatic discharge protection circuits |
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| TW200905858A TW200905858A (en) | 2009-02-01 |
| TWI409936B true TWI409936B (en) | 2013-09-21 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200605348A (en) * | 2004-04-20 | 2006-02-01 | Nec Electronics Corp | Electrostatic protection circuit |
| TW200608554A (en) * | 2004-08-30 | 2006-03-01 | Ind Tech Res Inst | Diode structure with low substrate leakage current and applications thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200605348A (en) * | 2004-04-20 | 2006-02-01 | Nec Electronics Corp | Electrostatic protection circuit |
| TW200608554A (en) * | 2004-08-30 | 2006-03-01 | Ind Tech Res Inst | Diode structure with low substrate leakage current and applications thereof |
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