TWI408511B - Exposure machine and its exposure method - Google Patents

Abstract

The exposure machine of the present invention produces at least a strip-like light source irradiating toward the traveling path of an exposure platform above or below locations corresponding to the traveling path of the exposure platform inside its exposure chamber; and the exposure machine is irradiated by the strip-like light source in a manner where a exposure platform displaces in a predetermined speed in relation to the strip-like light source, so as to subject a workpiece-to-be-processed on the exposure platform to exposure and developing. This invention is able to significantly reduce the quantity of light bulbs so as to reduce the size of the whole exposure machine, to reduce the equipment cost, and to reduce the heating concentrating phenomenon of the exposure chamber. In particular, this invention is suitable for process adopting continuous circulation conveying, allowing the exposure platform to sequentially pass through the exposure chamber, so as to enhance the processing productivity of the exposure machine.

Description

Exposure machine and exposure method thereof

The invention relates to an exposure and development technology of an exposure machine, and aims to provide an exposure machine which is less likely to cause a heat collecting phenomenon and which can relatively reduce the volume and cost of the device, and the exposure method associated therewith.

According to the general printed circuit board or the semiconductor wafer, when performing the exposure and development process, a photoresist is applied on the surface of the workpiece, and the circuit wiring pattern on the original is mapped to the surface of the workpiece by the illumination of the light source. On the resist layer, so that the chemical properties of the photoresist layer are changed by the illumination of the light source, and then the photoresist is used to remove the photoresist or the unexposed photoresist that is irradiated by the light source from the surface of the workpiece. To form a line layout corresponding to the original.

The basic structure of the exposure machine for performing the exposure and development processing process is as shown in the first figure, and mainly has an exposure chamber 12 composed of the casing 11, and an exposure platform 13 which is relatively movable into and out of the exposure chamber 12, and At least in the interior of the exposure chamber 12 corresponding to the upper or lower position of the exposure platform 13, a light source group 14 is provided; as shown in the second figure, the exposure platform 13 is used for placing the workpiece 20 and the original ( The transparent platform of the figure is shown in the overall exposure platform 13 and enters and exits the exposure chamber 12 by a set of linear slides 15.

After the exposure platform 13 and the workpiece and the original enter the exposure chamber 12 to be positioned, it is generally necessary to stay inside the exposure chamber 12 for a period of time (about 3 to 5 seconds), so that the workpiece receives the exposure light source of the light source group 14. After the exposure is completed, the workpiece is sent out by the exposure stage 13.

Since the conventional exposure machine performs the exposure operation in such a manner that the exposure platform 13 is stagnated inside the exposure chamber 12, the light source group 14 must have a large number of bulbs 141 in an array configuration, so as to form enough to cover the entire exposure platform 13 Parallel light source; however, when a large number of bulbs 141 are operated at the same time, a serious heat collecting phenomenon will be generated inside the casing 11, and an additional water cooling system is required to dissipate heat, resulting in high equipment cost.

Another conventional exposure machine corrects the light of the bulb through the compound eye device to the required parallel light and area. The action mode is to let the light source bulb pass through the elliptical mirror to direct the light to the compound eye device through a set of first mirrors. The light is homogenized, and then a set of second mirrors is used to change the direction of the light. Finally, a set of convex lenses is used to correct the light to the required parallel light and area, thereby projecting the required exposure light source, thereby reducing the number of light bulbs. .

However, the design of this second will make the structure of the overall exposure machine more complicated, and the body of the overall exposure machine is relatively larger; in particular, a large wattage bulb must be used, and the life of a large wattage bulb is rather short. Not only does it increase the frequency of replacement of the bulb, but the production cost invisibly increases.

In view of the above, the main object of the present invention is to provide an exposure machine which is less likely to cause a heat collecting phenomenon and which can relatively reduce the volume and cost of the apparatus, and an exposure method therefor.

In order to achieve the above, the exposure machine of the present invention is provided with at least one exposure platform on a machine table, and a transport unit is provided for driving the exposure chamber of the at least one exposure platform relative to the entrance and exit of the machine. Forming an exposure light source group at least above or below a moving stroke corresponding to the exposure platform, and having a light-emitting cover outside the exposure light source group; and further comprising a set of control circuits for setting and integrating the transport unit and the exposure light source group And the operation of the reticle.

Wherein, the light-emitting cover is provided with a long strip-shaped transparent groove at a portion thereof facing the moving stroke of the exposure platform, and an active light-shielding plate is controlled to control whether the light-transmitting groove is opened or not, and the light source of the light source group to be exposed is In the embodiment, when the bulb is activated, the light source can be externally irradiated through the light-transmitting groove of the light-emitting cover to generate a strip light source that is irradiated toward the exposure platform; and the conveying unit drives the exposure platform at a predetermined speed. The reticle is irradiated by the strip light source in such a manner as to be relatively displaced, so that the workpiece on the exposure platform is exposed and developed.

Specifically, the exposure machine of the present invention generates a strip light source that is irradiated toward the exposure stage at least in a position above or below the exposure stage of the exposure stage, and the exposure stage is coupled to the exposure stage at a predetermined speed. The strip light source is irradiated by the strip light source in a relative displacement manner, thereby completing exposure and development of the workpiece on the exposure platform.

俾 can greatly reduce the number of bulbs in the overall exposure machine, so the volume of the overall exposure machine can be reduced, the equipment cost can be reduced, and the heat collection phenomenon of the exposure chamber can be reduced; in particular, it is suitable for continuous circulation conveying, so that the exposure platform is sequentially Through the exposure chamber, the processing capacity of the exposure machine is increased.

The features of the present invention can be clearly understood by referring to the drawings and the detailed description of the embodiments.

The invention aims to provide an exposure machine which is less likely to generate a heat collecting phenomenon and which can relatively reduce the volume and cost of the device, and an exposure method related thereto; the exposure method firstly generates at least one self-exposure inside the exposure chamber of the exposure machine. Above the platform moving stroke, or a strip light source that is irradiated toward the exposure platform from the exposure stroke of the exposure platform; and the exposure platform of the exposure machine is adapted to receive the at least one strip at a predetermined speed relative to the at least one light source. The illumination of the light source further completes the exposure and development of the workpiece on the exposure platform.

As shown in the third and fourth figures, the exposure machine of the present invention comprises: a machine table 30, at least one exposure platform 40, a conveyor unit 50, at least one exposure light source group 60, at least one light exit cover 70, and a control circuit 80; wherein: the machine 30 has an exposure chamber 32 surrounded by a casing 31, and the casing 31 is provided with a heat dissipation vent 311 and at least one loop in a periphery of the exposure chamber 32. The tuyere 312 is provided with a screen 33 at the at least one circulating air inlet 312 to prevent dust and foreign matter from entering the exposure chamber 32.

The at least one exposure platform 40 is a transparent platform for fixing the workpiece and the original; the conveying unit 50 is configured to drive the exposure chamber 32 of the at least one exposure platform 40 relative to and from the machine 30, and has a set of lateral directions. A linear slide 51 extending in the inner and outer regions of the exposure chamber 32 of the machine 30 is provided for carrying the exposure platform 40, a belt 52 is provided for connection with the exposure platform 40, and a motor 53 is provided for driving the belt 52. The operation, and guided by the linear slide 51, drives the exposure platform 40 relative to the exposure chamber 32 of the machine 30.

The at least one exposure light source group 60 is disposed above or below the movement stroke of the exposure chamber 32 with respect to the exposure stage 40. As shown in the fifth to eighth figures, each group of exposure light source groups 60 has a plurality of A light source (in this embodiment, a bulb) 61 is used to generate an exposure light source.

The at least one light-emitting cover 70 is disposed outside the at least one exposure light source group 60. As shown in the ninth figure, the light-emitting cover 70 is provided with a long strip-shaped transparent groove 71 at a position relatively moving toward the exposure platform, and another The movable visor 72 controls whether the light-transmitting groove 71 is opened or not; at least one power cylinder 73 is connected between the movable visor 72 and the light-emitting cover 70, and the movable visor 72 is driven by the at least one power cylinder 73. The reticle is relatively displaced, thereby controlling the light-transmissive groove 71 to be closed or opened.

As shown in FIG. 7 , the control circuit 80 is configured to integrate and integrate the operation of the transport unit 50 , the at least one exposure light source group 60 and the movable shutter 72 , and has a touch screen disposed on the machine 30 . 81 is provided for setting relevant operating parameters, and at least one sensing switch 82 is provided at the moving stroke of the machine table 30 relative to the exposure platform 40 for sensing the relative position of the exposure platform 40.

Referring to the tenth and eleventh drawings, the light bulbs 61 of the exposed light source group 60 are linearly arranged along the light-transmissive grooves 71 of the light-emitting cover 70, and a set of mirrors 62 are provided for The light of the bulb 61 is directed to the light-transmissive groove 71 of the light-emitting cover 70; further, each of the bulbs is disposed at a specific angle (about 2°) at an angle of the light toward the light irradiation direction, so that the light sources of the respective bulbs 61 are completely connected. The lamp housing 611 of the bulb 61 is internally constructed with a PI coating to increase its reflectivity (as shown in FIG. 12), and a heat dissipating fan 63 is provided at an arrangement position relative to each of the bulbs 61 to increase the exposure light source group 60. Waste heat emission efficiency.

As shown in FIG. 13 , the exposure machine of the present invention fixes the original and the workpiece on the exposure platform 40 before the exposure platform 40 has entered the exposure chamber, and sets the output of the exposure light source 60 via the touch screen 81. The power and the operating speed of the conveyor unit 50 can then begin to operate.

When the exposure machine starts to operate, the light bulb of the exposure light source group 60 is first turned on, and the transport unit 50 is activated to drive the exposure platform 40 to move toward the exposure chamber. When the exposure platform 40 enters the exposure chamber and reaches the slot close to the light transmission slot 71. When the predetermined stroke is performed, the sensing switch 82 of the control circuit 80 is started (as shown in FIG. 8), and the active light shielding plate is operated by the control circuit 80 to open the light-transmitting groove 71 of the light-emitting cover 70. The output power of the exposure light source group 60 is increased.

At this time, the light source of the exposure light source group 60 can be externally irradiated through the light-transmitting groove 71 of the light-emitting cover 70 to generate a strip-shaped light source that is irradiated toward the exposure platform 40; and the exposure unit 40 is driven by the transport unit 50. The strip light source is irradiated at a predetermined speed relative to the exit mask 70, and the workpiece on the exposure stage 40 is exposed and developed.

As shown in FIG. 14, when the exposure platform 40 is relatively moved to a predetermined stroke for completing the exposure development, the sensing switch 82 of the control circuit 80 (shown in FIG. 8) is turned off, and the activity is controlled by the control circuit 80. The visor 72 operates to close the light-transmissive groove of the hood 70 while reducing the output power of the exposure light source group 60.

In this embodiment, the entire exposure machine is provided with an exposure light source group 60 and a light exit cover 70 (shown in FIG. 5 and FIG. 7) above and below the moving stroke of the exposure platform 40; that is, In the exposure chamber interior of the exposure machine, relative to the upper and lower positions of the movement stroke of the exposure platform, a strip light source that is irradiated toward the exposure platform is generated to simultaneously expose and expose the workpiece on the upper and lower surfaces of the exposure platform 40. .

Since the light source used in the exposure machine of the present invention is a strip light source instead of a large-area light source covering the entire exposure platform, the number of light bulbs of the exposure light source group 60 can be greatly reduced, and the volume of the overall exposure machine can be relatively reduced. In addition, the control circuit 80 can further increase the output power of the exposure light source group 60 when the exposure platform 40 receives the strip light source, so that the heat collection phenomenon of the exposure chamber can be relatively reduced.

Incidentally, since the exposure platform of the present invention is continuously moving toward the depth of the exposure chamber at a predetermined speed during exposure and development, the overall exposure machine is particularly suitable for continuous circulation conveyance. The platform sequentially passes through the exposure chamber, thereby improving the processing capacity of the exposure and development process.

In summary, the present invention provides a preferably viable exposure machine and an exposure method therefor, and an application for an invention patent according to the law; the technical content and technical features of the present invention are disclosed above, but those skilled in the art It is still possible to make various substitutions and modifications without departing from the spirit of the invention. Therefore, the scope of the present invention should be construed as being limited by the scope of the appended claims

11. . . cabinet

12. . . Exposure room

13. . . Exposure platform

14. . . Light source group

141. . . light bulb

15. . . Linear slide

20. . . Processed object

30. . . Machine

31. . . cabinet

311. . . Heat exhaust vent

312. . . Recirculating air inlet

32. . . Exposure room

33. . . Filter

40. . . Exposure platform

50. . . Conveyor unit

51. . . Linear slide

52. . . Belt

53. . . motor

60. . . Exposure source group

61. . . light bulb

611. . . Lamp housing

62. . . Reflector

63. . . Cooling fan

70. . . Mask

71. . . Light transmission slot

72. . . Shading

73. . . Power cylinder

80. . . Control circuit

81. . . Touch screen

82. . . sensory switch

The first figure is a cross-sectional view of a conventional exposure machine.

The second figure is a perspective view of the appearance of an exposure platform of a conventional exposure machine.

The third figure is a perspective view of the appearance of the exposure machine of the present invention.

The fourth figure is a perspective view of the structure inside the exposure chamber of the exposure machine of the present invention.

The fifth figure is an external structure diagram of the exposure light source group disposed at a position above the moving stroke of the exposure platform in the present invention.

The sixth figure is an enlarged schematic view of the exposure light source group disposed at a position above the moving stroke of the exposure platform in the present invention.

The seventh figure is an external structural view of the exposure light source group and the light-emitting cover which are disposed at a position below the movement stroke of the exposure platform in the present invention.

The eighth figure is an enlarged schematic view of the exposure light source group and the light exit cover disposed at a position below the movement stroke of the exposure platform in the present invention.

The ninth drawing is an exploded view of the reticle structure of the present invention which is disposed at a position below the movement stroke of the exposure platform.

The tenth figure is an external structural view of the exposure light source group and the light-emitting cover which are disposed above the moving stroke of the exposure platform in the present invention.

The eleventh figure is a plan view showing the structure of the exposure light source group disposed at a position above the moving stroke of the exposure platform in the present invention.

The twelfth figure is an external structural view of the lamp housing of the present invention.

The thirteenth figure is a schematic view showing the action of the exposure platform reaching the predetermined stroke of the light-transmitting groove in the present invention.

The fourteenth figure is a schematic view showing the action of the exposure platform reaching the predetermined stroke for completing the exposure and development in the present invention.

30. . . Machine

32. . . Exposure room

40. . . Exposure platform

50. . . Conveyor unit

51. . . Linear slide

52. . . Belt

53. . . motor

60. . . Exposure source group

70. . . Mask

80. . . Control circuit

81. . . Touch screen

82. . . sensory switch

Claims (13)

An exposure machine includes: a machine table having an exposure chamber surrounded by a casing; at least one exposure platform is a transparent platform for fixing the workpiece and the original; and a conveying unit for driving the machine At least one exposure platform is opposite to the exposure chamber of the machine; at least one exposure light source group is disposed above or below the movement stroke of the exposure chamber relative to the exposure platform, and each group of exposure light source groups has a plurality of light sources An exposure light source is generated; at least one reticle is disposed outside the at least one exposure light source group, and a long strip-shaped transparent groove is disposed at a portion relatively moving toward the exposure platform, and a movable visor is further disposed to control the light transmission. The light slot is opened or not; at least one power cylinder is connected between the movable visor and the light-emitting cover, and the at least one power cylinder drives the movable visor to be relatively displaced with the light-emitting cover, thereby controlling the light-transmitting groove to be closed. Or a control circuit for setting and integrating the transport unit, the at least one exposure light source group, and the operation of the movable visor; and the exposure light source group When the light bulb is started, the light source can be externally irradiated through the light-transmitting groove of the light-emitting cover, so as to generate a strip light source that is irradiated toward the moving stroke of the exposure platform; and the transporting unit is driven to drive the exposure platform at a predetermined speed and the light-emitting cover. The relative displacement is received by the strip light source to complete the exposure and development of the workpiece on the exposure platform. The exposure machine according to claim 1 is characterized in that an exposure light source group is disposed above and below the movement stroke of the exposure platform. The exposure machine of claim 1, wherein the casing is opposite to The periphery of the exposure chamber is provided with a heat dissipation air outlet and at least one circulating air inlet, and a filter screen is disposed at the at least one circulating air inlet. The exposure machine of claim 1, wherein the transport unit has a set of linear slide rails extending laterally disposed in the exposure chamber and the outer area of the machine for carrying the exposure platform, and a belt is provided for connecting to the exposure platform. And a motor is provided to drive the belt to run. The exposure machine of claim 1, wherein at least one power cylinder is connected between the movable visor and the hood, and the movable visor and the hood are relatively displaced by the at least one power cylinder, thereby controlling the The light transmission slot is closed or opened. The exposure machine of claim 1, wherein the control circuit has a touch screen disposed on the machine for setting relevant operation parameters, and at least one of the movement steps of the machine relative to the exposure platform. The inductive switch is used to sense the relative position of the exposure platform. The exposure machine of claim 1, wherein each of the at least one exposure light source group is linearly arranged along the light-transmissive groove of the light-emitting cover, and a set of mirrors is provided for directing the light of the light bulb to the light-emitting cover. Light transmission slot. The exposure machine of claim 7, wherein each of the at least one exposure light source group is disposed at a specific angular angle that is yaw toward the light irradiation direction. The exposure machine according to claim 7, wherein each of the at least one exposure light source group is disposed at a 2° angle toward the light irradiation direction. The exposure machine of claim 1, wherein the light source is a light Bubble or LED light source. The exposure method of the exposure machine firstly generates at least one movement light above the exposure platform in the exposure chamber of the exposure machine, or a strip light source that is irradiated toward the exposure platform from the exposure stroke of the exposure platform; and then the exposure machine The exposure platform receives the illumination of the at least one light source at a predetermined speed and the relative displacement of the at least one light source, thereby performing exposure and development on the workpiece on the exposure platform, wherein the exposure machine is provided with at least one light cover, Outside the exposure light source group, a strip-shaped light-transmissive groove is provided at a portion relatively moving toward the exposure platform, and a movable light-shielding plate is provided to control whether the light-transmitting groove is opened or not; when the exposure platform enters the exposure chamber The action of the active visor is controlled by a control circuit to open the light-transmissive groove of the light-emitting cover, and simultaneously increase the output power of the exposure light source group, and the relative movement of the exposure platform to the predetermined stroke for completing the exposure development is performed by The control circuit controls the action of the movable visor to close the light-transmitting groove of the hood and simultaneously reduce the exposure light Groups of output power. The exposure method of the exposure machine according to claim 11 is characterized in that a strip light source that is irradiated toward the exposure stage is formed in the exposure chamber of the exposure machine with respect to the upper and lower positions of the movement stroke of the exposure platform. The exposure machine of claim 11, wherein the light source is a light bulb or an LED light source.