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TWI405296B - - Google Patents

Info

Publication number
TWI405296B
TWI405296B TW99108158A TW99108158A TWI405296B TW I405296 B TWI405296 B TW I405296B TW 99108158 A TW99108158 A TW 99108158A TW 99108158 A TW99108158 A TW 99108158A TW I405296 B TWI405296 B TW I405296B
Authority
TW
Taiwan
Prior art keywords
carrying
piece
work
exposed
positioning components
Prior art date
Application number
TW99108158A
Other languages
Chinese (zh)
Other versions
TW201133703A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW99108158A priority Critical patent/TW201133703A/en
Publication of TW201133703A publication Critical patent/TW201133703A/en
Application granted granted Critical
Publication of TWI405296B publication Critical patent/TWI405296B/zh

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Automatic Assembly (AREA)

Abstract

Disclosed is a carrying apparatus suitable for holding a work-piece to be exposed. The carrying apparatus comprises a base and a replaceable carrying tray. The base includes a top and a plurality of first positioning components disposed on the top. The replaceable carrying tray includes: a carrying surface which is capable of carrying the work-piece to be exposed and has same size as the work-piece; a bottom which can lean against the top; and a plurality of second positioning components which are disposed on the bottom and can connect with the first positioning components in a detachable way. Accordingly, if the size of another work-piece to be exposed is different, another replaceable carrying tray with the carrying surface corresponding to the size of the work-piece to be exposed can substitute.
TW99108158A 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same TW201133703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW99108158A TW201133703A (en) 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW99108158A TW201133703A (en) 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same

Publications (2)

Publication Number Publication Date
TW201133703A TW201133703A (en) 2011-10-01
TWI405296B true TWI405296B (en) 2013-08-11

Family

ID=46751287

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99108158A TW201133703A (en) 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same

Country Status (1)

Country Link
TW (1) TW201133703A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4775877A (en) * 1985-10-29 1988-10-04 Canon Kabushiki Kaisha Method and apparatus for processing a plate-like workpiece
US6459474B1 (en) * 1999-10-26 2002-10-01 Ushiodenki Kabushiki Kaisha Contact exposure device provided with a mask and workpiece interval setting means
US20040036849A1 (en) * 2000-07-07 2004-02-26 Nikon Corporation Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
US20040130695A1 (en) * 2003-01-08 2004-07-08 Vyacheslav Ananyev Kit for converting a photolithography machine for treating semiconductor wafers of certain diameter to a machine for treating semiconductor wafers of larger diameter
US20080106723A1 (en) * 2004-12-10 2008-05-08 Asml Netherlands B.V. Substrate placement in immersion lithography

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4775877A (en) * 1985-10-29 1988-10-04 Canon Kabushiki Kaisha Method and apparatus for processing a plate-like workpiece
US6459474B1 (en) * 1999-10-26 2002-10-01 Ushiodenki Kabushiki Kaisha Contact exposure device provided with a mask and workpiece interval setting means
US20040036849A1 (en) * 2000-07-07 2004-02-26 Nikon Corporation Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
US20040130695A1 (en) * 2003-01-08 2004-07-08 Vyacheslav Ananyev Kit for converting a photolithography machine for treating semiconductor wafers of certain diameter to a machine for treating semiconductor wafers of larger diameter
US20080106723A1 (en) * 2004-12-10 2008-05-08 Asml Netherlands B.V. Substrate placement in immersion lithography

Also Published As

Publication number Publication date
TW201133703A (en) 2011-10-01

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