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TWI401113B - Pressure swing adsorption gas generating device - Google Patents

Pressure swing adsorption gas generating device Download PDF

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TWI401113B
TWI401113B TW98109024A TW98109024A TWI401113B TW I401113 B TWI401113 B TW I401113B TW 98109024 A TW98109024 A TW 98109024A TW 98109024 A TW98109024 A TW 98109024A TW I401113 B TWI401113 B TW I401113B
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adsorption
tank
pressure
raw material
desorption
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TW98109024A
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TW201032886A (en
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Yasuhiko Tsuji
Hiroyuki Kawamoto
Yasunari Tsuji
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Advance Riken Co Ltd
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Description

變壓吸附式氣體產生裝置Pressure swing adsorption gas generating device

本發明係關於一種用以藉由變壓吸附法而產生氮氣之變壓吸附式氣體產生裝置,尤其係關於一種用以使原料空氣之消耗減小而獲得節能效果之改良。BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a pressure swing adsorption gas generating apparatus for generating nitrogen gas by a pressure swing adsorption method, and more particularly to an improvement in energy saving effect for reducing consumption of raw material air.

作為用以製造氮氣或氧氣之非低溫技術之一,PSA(變壓吸附)法已為人所知。根據PSA法,例如,將空氣作為原料,藉由吸附劑來吸附原料空氣中之氧,藉此,可將氮分離而獲得高純度之氮氣作為產品氣體。As one of the non-cryogenic techniques for producing nitrogen or oxygen, a PSA (pressure swing adsorption) method is known. According to the PSA method, for example, air is used as a raw material, and oxygen in the raw material air is adsorbed by an adsorbent, whereby nitrogen can be separated to obtain high-purity nitrogen as a product gas.

於PSA製程中,利用高壓之吸附量大於低壓之吸附量這一原理。亦即,一面藉由重複進行吸附脫附而使吸附劑之吸附能力恢復,一面進行連續運轉,其中該吸附脫附係指使高壓下吸附有氧之吸附劑於低壓下脫附氧。因此,於PSA之步驟中,使用兩個填充有吸附劑之吸附槽,於其中一個吸附槽中,在高壓下進行吸附步驟,於此期間,在另一個吸附槽中,於低壓下進行脫附步驟。In the PSA process, the principle that the adsorption amount of high pressure is greater than the adsorption amount of low pressure is utilized. That is, continuous operation is performed while recovering the adsorption capacity of the adsorbent by repeating adsorption desorption, which means that the adsorbent adsorbing oxygen under high pressure desorbs oxygen at a low pressure. Therefore, in the step of PSA, two adsorption tanks filled with an adsorbent are used, and in one of the adsorption tanks, an adsorption step is performed under high pressure, during which desorption is performed at a low pressure in the other adsorption tank. step.

如此,為了使用兩個吸附槽來交替地進行吸附脫附步驟,乃根據待進行之步驟,對使原料空氣自導入口經由吸附槽而達到產品槽之氣體之流路進行切換。亦即,適時地對多數個閥進行切換,使得例如將原料空氣導入至進行吸附步驟之吸附槽,並自該吸附槽導出氮氣,或者自進行脫附步驟之吸附槽排氣,以此方式進行運轉。In this manner, in order to alternately perform the adsorption and desorption step using the two adsorption tanks, the flow path of the gas that has made the raw material air from the introduction port to the product tank through the adsorption tank is switched according to the step to be performed. That is, a plurality of valves are switched in a timely manner so that, for example, the raw material air is introduced into the adsorption tank for performing the adsorption step, and the nitrogen gas is led out from the adsorption tank, or the adsorption tank is exhausted from the desorption step. Running.

然而,實際上例如於使用氮氣產生裝置之場所,氮氣之使用量未必為固定,多數情形下係間歇地使用氮氣,即便並非間歇地使用氮氣,氮氣之使用量亦隨時間變動。又,多數情形下,相對於1台氮氣產生裝置而組合地使用複數台氮氣消耗單元,使用量通常會變動。However, in practice, for example, in a place where a nitrogen generating device is used, the amount of nitrogen used is not necessarily fixed, and in many cases, nitrogen is intermittently used, and even if nitrogen is not used intermittently, the amount of nitrogen used varies with time. Further, in many cases, a plurality of nitrogen gas consumption units are used in combination with one nitrogen gas generator, and the amount of use usually varies.

另一方面,氮氣產生裝置之額定產生量保證最大產生量時之氮氣純度,將此時之原料空氣量設為額定產生量。氮氣使用量比該最大產生量越少,則氮氣純度越高,但原料空氣之使用量僅稍有減少。On the other hand, the rated production amount of the nitrogen generating device ensures the purity of the nitrogen gas at the maximum amount of production, and the amount of the raw material air at this time is set as the rated production amount. The smaller the amount of nitrogen used than the maximum amount produced, the higher the purity of nitrogen, but the amount of raw air used is only slightly reduced.

原因在於:為了以對應於最大產生量時之回收效率高之吸附脫附週期進行運轉,越以較少之產生量進行運轉,則回收效率越會下降,從而導致消耗較多之原料空氣。因此,即使氮氣之使用量減少,亦會進行同樣使用原料空氣之運轉,供給過剩純度之氮氣,從而徒勞地消耗能量。The reason is that in order to operate at an adsorption desorption cycle having a high recovery efficiency in accordance with the maximum amount of production, the operation is performed with a smaller amount of production, and the recovery efficiency is lowered, resulting in consumption of a large amount of raw material air. Therefore, even if the amount of nitrogen used is reduced, the operation of the raw material air is similarly performed, and nitrogen of excess purity is supplied, thereby consuming the energy in vain.

相對於此,例如於專利文獻1中揭示有如下之方法:於採用PSA方式之氮氣產生裝置中,使氮氣之純度穩定化,並以與氮氣之使用量相對應之適當之原料空氣之使用量而進行運轉。根據該方法,著眼於吸附塔之出口處之氧濃度之變化,當出口處之氧濃度達到所設定之氧濃度時,對吸附塔進行切換,從而使半週期時間自動地產生變化。藉此,可減少原料空氣之使用量,從而可減小消耗電力。On the other hand, for example, Patent Document 1 discloses a method of stabilizing the purity of nitrogen gas in a nitrogen gas generating apparatus using a PSA method, and using an appropriate amount of raw material air corresponding to the amount of nitrogen used. And it works. According to this method, focusing on the change in the oxygen concentration at the outlet of the adsorption tower, when the oxygen concentration at the outlet reaches the set oxygen concentration, the adsorption tower is switched, so that the half cycle time is automatically changed. Thereby, the amount of raw material air used can be reduced, so that power consumption can be reduced.

先行技術文獻Advanced technical literature

[專利文獻1]日本專利特開2005-270953號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2005-270953

然而,於如上述先前例之氮氣產生裝置中,根據所放出之氮氣之純度而使半週期時間產生變化,因此,未必可適當地獲得根據氮氣之使用量而減小原料空氣之使用量之效果。又,半週期時間係於實際運轉中可產生之氮氣之純度之整個區域中,依據預先設定之程式而自動地變化,因此,有實際控制變得相當複雜且運轉之穩定性受損之虞。However, in the nitrogen generating apparatus of the above-described conventional example, the half cycle time is changed depending on the purity of the released nitrogen gas, and therefore, the effect of reducing the amount of raw material air used according to the amount of nitrogen used may not be appropriately obtained. . Further, since the half cycle time is automatically changed in accordance with a predetermined program in the entire region of the purity of nitrogen gas which can be generated during actual operation, the actual control becomes complicated and the stability of the operation is impaired.

因此,本發明之目的在於提供一種變壓吸附式氣體產生裝置,其於以小於最大產生量之產品氮氣流量進行運轉之情形時,可維持既定之回收效率並減小原料空氣量,且可根據使用狀況,使用階段性之設定值而進行控制。Accordingly, it is an object of the present invention to provide a pressure swing adsorption type gas generating apparatus which can maintain a predetermined recovery efficiency and reduce the amount of raw material air when operating at a flow rate of less than the maximum generated product nitrogen gas, and can be The use condition is controlled by using the set value of the phase.

本發明之變壓吸附式氣體產生裝置包括:填充有吸附劑之第1吸附槽及第2吸附槽;連接於上述第1吸附槽及第2吸附槽之原料空氣導入流路;將在上述第1吸附槽及第2吸附槽中自上述原料空氣分離之氮氣加以儲存之產品槽;來自於上述第1吸附槽及第2吸附槽之排氣用流路;使上述第1吸附槽及第2吸附槽之間連通之均壓用流路;位於上述第1吸附槽與上述產品槽之間、以及第2吸附槽與上述產品槽之間之產品氣體流路;設置於上述各個流路之閥;對自上述產品槽流出至外部之上述產品氣體之流量Lp進行檢測之產品氣體流量感應器;以及對上述各個閥之開閉進行控制之控制裝置;上述控制裝置,係對上述兩個吸附槽進行切換而重複地控制吸附脫附動作,該吸附脫附動作係於使上述均壓用流路開放之均壓步驟之後,而在上述第1吸附槽及第2吸附槽之一者,藉由上述吸附劑而進行吸附步驟,於另一個吸附槽,進行使氣體自上述吸附劑脫附之脫附步驟。The pressure swing adsorption type gas generating apparatus of the present invention includes: a first adsorption tank filled with an adsorbent and a second adsorption tank; and a raw material air introduction flow path connected to the first adsorption tank and the second adsorption tank; a product tank for storing nitrogen gas separated from the raw material air in the adsorption tank and the second adsorption tank; an exhaust gas flow path from the first adsorption tank and the second adsorption tank; and the first adsorption tank and the second adsorption tank a pressure equalization flow path that communicates between the adsorption tanks; a product gas flow path between the first adsorption tank and the product tank, and between the second adsorption tank and the product tank; and a valve provided in each of the flow channels a product gas flow sensor for detecting a flow rate Lp of the product gas flowing out from the product tank to the outside; and a control device for controlling opening and closing of the respective valves; wherein the control device performs the two adsorption tanks Switching and repeatedly controlling the adsorption desorption operation after the pressure equalization step of opening the pressure equalization flow path, and by one of the first adsorption tank and the second adsorption tank The adsorption step is performed by the adsorbent, and the desorption step of desorbing the gas from the adsorbent is performed in the other adsorption tank.

為了解決上述問題,本發明之變壓吸附式氣體產生裝置之特徵在於:根據相對於被設定為上述產品氣體流量Lp之最大值之最大產生量Lm之已減小的產生量比率R=Lp/Lm,對作為上述吸附脫附動作之一個週期持續之時間即吸附脫附週期T進行階段性地切換,來對上述吸附脫附動作進行控制。In order to solve the above problems, the pressure swing adsorption type gas generating apparatus of the present invention is characterized in that the ratio of the generated amount R = Lp / is reduced according to the maximum generated amount Lm set to the maximum value of the product gas flow rate Lp. Lm is used to control the adsorption/desorption operation by periodically switching the adsorption/desorption cycle T, which is a period in which one cycle of the adsorption/desorption operation is continued.

根據上述構成之變壓吸附式氣體產生裝置,於以小於最大產生量Lm之產品氣體流量Lp進行運轉之情形時,可將氮氣純度維持於適當之範圍,根據產品氣體流量Lp而階段性地對吸附脫附週期T進行切換,且可維持高回收效率而減小原料空氣量。又,由於根據產品氣體流量Lp而對吸附脫附週期T進行階段性之設定,故而可容易地根據使用狀況而對該設定值進行變更,從而可有效地進行節能運轉。According to the pressure swing adsorption type gas generating apparatus having the above configuration, when the operation is performed at the product gas flow rate Lp smaller than the maximum production amount Lm, the purity of the nitrogen gas can be maintained in an appropriate range, and the product gas flow rate Lp is stepwisely applied. The adsorption desorption cycle T is switched, and the high recovery efficiency can be maintained to reduce the amount of raw material air. Further, since the adsorption/desorption cycle T is set in stages based on the product gas flow rate Lp, the set value can be easily changed according to the use condition, and the energy-saving operation can be efficiently performed.

本發明能夠以上述構成為基礎而採用如下所述之形態。The present invention can adopt the form described below based on the above configuration.

亦即,本發明之變壓吸附式氣體產生裝置可設為如下構成,其進一步具備:比率設定部,其用以將針對上述產生量比率R做階段性地設定之複數個產生量比率Ri =Li /Lm(i=0~n;n為正整數)之設定輸入值予以保持;以及週期設定部,針對上述吸附脫附週期T,用以將與各個上述產生量比率Ri 對應做階段性地設定之吸附脫附週期Ti 之設定輸入值予以保持;上述控制裝置根據由上述產品氣體流量感應器檢測出之上述產品氣體之流量Lp,而依據由上述產生量比率Ri 之各個與上述吸附脫附週期Ti 之對應關係所選擇之上述吸附脫附週期T,來對上述吸附脫附動作進行控制。In other words, the pressure swing adsorption type gas generating apparatus of the present invention may be configured to include a ratio setting unit for sequentially setting a plurality of generation amount ratios R i for the generation amount ratio R in stages. a setting input value of =L i /Lm (i = 0 to n; n is a positive integer) is held; and a period setting unit for correlating with each of the above-described generation amount ratios R i for the adsorption desorption period T The set input value of the stage of the adsorption desorption period T i is maintained; the control means is based on the flow rate Lp of the product gas detected by the product gas flow sensor, and is based on each of the above-described production amount ratios R i The adsorption desorption operation T is controlled by the adsorption desorption cycle T selected in correspondence with the adsorption desorption cycle T i .

又,可設為如下構成:上述產生量比率Ri 、以及上述吸附脫附週期Ti 之值係依據下述之條件而設定,Further, the above-described production amount ratio R i and the value of the adsorption desorption period T i are set according to the following conditions.

Ro =0、Rn =1、0<i<n之範圍中,0<Ri <1(其中,Ri <Ri+1 ),以及In the range of R o =0, R n =1, 0 < i < n, 0 < R i <1 (where R i <R i+1 ), and

Ti >Ti+1T i >T i+1 ;

上述控制裝置依據下述之式(1)而選擇上述吸附脫附週期T,The control device selects the adsorption desorption period T according to the following formula (1),

Ri-1 <(R=Lp/Lm)≦Ri 時,T=Ti  (1)。When R i-1 <(R=Lp/Lm)≦R i , T=T i (1).

又,上述吸附脫附週期Ti 較佳設定為於產生量比率R=Lp/Lm=Ri 時,可維持所需之氮氣純度。Further, the adsorption and desorption cycle is preferably set to T i to produce an amount ratio R = Lp / Lm = when R i, can maintain the desired nitrogen purity.

又,較佳為具備儲存並供給上述原料空氣之原料空氣槽、對空氣進行壓縮而將該空氣供給至上述原料空氣槽之壓縮機、以及對上述原料空氣槽內之壓力P01進行檢測之原料空氣壓感應器,上述控制裝置進行如下控制,即,根據上述原料空氣壓感應器之檢測壓力P01而重複上述壓縮機之驅動與停止,藉此將上述檢測壓力P01維持於既定值以上。Further, it is preferable to include a raw material air tank for storing and supplying the raw material air, a compressor for compressing the air to supply the air to the raw material air tank, and a raw material for detecting the pressure P01 in the raw material air tank. In the air pressure sensor, the control device performs control for stopping the driving and stopping of the compressor based on the detection pressure P01 of the raw material air pressure sensor, thereby maintaining the detection pressure P01 at a predetermined value or more.

於該情形時,較佳為設定下基準值Pt1以及上基準值Pth(Pt1<Pth),上述控制裝置以如下方式進行控制,即,於驅動上述壓縮機而使檢測壓力P01上升之過程中,當P01≧Pth時使壓縮機停止;於停止壓縮機而使檢測壓力P01減小之過程中,當P01≦Pt1時開始驅動壓縮機。In this case, it is preferable to set the lower reference value Pt1 and the upper reference value Pth (Pt1 < Pth), and the control device performs control so as to drive the compressor to increase the detection pressure P01. When P01≧Pth, the compressor is stopped; during the process of stopping the compressor to decrease the detection pressure P01, the compressor is started to be driven when P01≦Pt1.

以下,參照圖式,對本發明之實施形態中之變壓吸附式氣體產生裝置進行詳細說明。Hereinafter, the pressure swing adsorption type gas generating apparatus according to the embodiment of the present invention will be described in detail with reference to the drawings.

(實施形態1)(Embodiment 1)

圖1係表示本發明之實施形態1之氮氣產生裝置之構成之概要圖。該裝置具備填充有氧吸附劑之第1吸附槽1與第2吸附槽2作為氣體產生單元,並且具備用以暫時儲存所產生之產品氣體即氮氣並將該氮氣供給至外部之產品槽3。又,設置有用以將原料空氣供給至氣體產生單元之原料空氣入口4、以及用以將氮氣自產品槽3供給至外部之產品氣體出口5。Fig. 1 is a schematic view showing the configuration of a nitrogen generating device according to a first embodiment of the present invention. This apparatus includes a first adsorption tank 1 and a second adsorption tank 2 filled with an oxygen adsorbent as a gas generating unit, and a product tank 3 for temporarily storing the generated product gas, that is, nitrogen gas, and supplying the nitrogen gas to the outside. Further, a raw material air inlet 4 for supplying the raw material air to the gas generating unit, and a product gas outlet 5 for supplying the nitrogen gas from the product tank 3 to the outside are provided.

於連結第1吸附槽1與第2吸附槽2之配管6、7中,設置有第1吸附閥(SV1)、第2吸附閥(SV2)、第1排氣閥(SV3)、第2排氣閥(SV4)、兩個均壓閥(SV5)、第1出口閥(SV6)、第2出口閥(SV7)、以及流量調節閥8。The first adsorption valve (SV1), the second adsorption valve (SV2), the first exhaust valve (SV3), and the second row are provided in the pipes 6 and 7 that connect the first adsorption tank 1 and the second adsorption tank 2. A gas valve (SV4), two pressure equalizing valves (SV5), a first outlet valve (SV6), a second outlet valve (SV7), and a flow regulating valve 8.

將原料空氣導入至每個氣體產生單元中之第1吸附閥(SV1)以及第2吸附閥(SV2)。第1吸附閥(SV1)藉由配管6而連接於第1吸附槽1,第2吸附閥(SV2)藉由配管7而連接於第2吸附槽2。由配管6與配管7所示之流路分別經由第1排氣閥(SV3)以及第2排氣閥(SV4)而連接於排氣口9。第1吸附槽1與第2吸附槽2可經由上下設置之兩個均壓閥(SV5)而連通。The raw material air is introduced into the first adsorption valve (SV1) and the second adsorption valve (SV2) in each of the gas generation units. The first adsorption valve (SV1) is connected to the first adsorption tank 1 by a pipe 6, and the second adsorption valve (SV2) is connected to the second adsorption tank 2 by a pipe 7. The flow path indicated by the pipe 6 and the pipe 7 is connected to the exhaust port 9 via the first exhaust valve (SV3) and the second exhaust valve (SV4), respectively. The first adsorption tank 1 and the second adsorption tank 2 can communicate via two equalizing valves (SV5) provided above and below.

自第1吸附槽1導出之3根配管中之1根經由第1出口閥(SV6)而連接於產品槽3。自第2吸附槽2導出之3根配管中之1根經由第2出口閥(SV7)而連接於產品槽3。第1吸附槽1與第2吸附槽2經由流量調節閥8而彼此連接。One of the three pipes led out from the first adsorption tank 1 is connected to the product tank 3 via the first outlet valve (SV6). One of the three pipes led out from the second adsorption tank 2 is connected to the product tank 3 via the second outlet valve (SV7). The first adsorption tank 1 and the second adsorption tank 2 are connected to each other via a flow rate adjusting valve 8 .

在連接於原料空氣入口4之管路中設置有原料空氣壓力感應器P0。於第1吸附槽1以及第2吸附槽2中分別設置有第1吸附槽壓力感應器P1與第2吸附槽壓力感應器P2。於產品槽3中設置有對槽內之壓力進行檢測之產品槽壓力感應器P3。於自產品槽3到達產品氣體出口5之流路中,設置有對自產品槽3流出之產品氣體之流量進行檢測之產品氣體流量感應器F、以及作為流出之產品氣體之純度感應器的對產品氣體中之氧濃度進行檢測之含氧濃度感應器OC。再者,於以下之記載中,關於原料空氣壓力感應器P0、第1吸附槽壓力感應器P1、第2吸附槽壓力感應器P2、以及產品槽壓力感應器P3所檢測出之壓力值,使用相對應之相同符號P0、P1、P2、P3進行表示。A raw material air pressure sensor P0 is disposed in the line connected to the raw material air inlet 4. The first adsorption tank pressure sensor P1 and the second adsorption tank pressure sensor P2 are provided in the first adsorption tank 1 and the second adsorption tank 2, respectively. A product tank pressure sensor P3 for detecting the pressure in the tank is provided in the product tank 3. In the flow path from the product tank 3 to the product gas outlet 5, a product gas flow sensor F for detecting the flow rate of the product gas flowing out of the product tank 3, and a pair of purity sensors as the product gas flowing out are provided. The oxygen concentration sensor OC for detecting the oxygen concentration in the product gas. In the following description, the pressure values detected by the raw material air pressure sensor P0, the first adsorption tank pressure sensor P1, the second adsorption tank pressure sensor P2, and the product tank pressure sensor P3 are used. Corresponding symbols P0, P1, P2, and P3 are indicated.

各感應器之輸出係輸入至控制裝置10。又,各閥之開閉動作係藉由控制裝置10所供給之閥驅動信號而受到控制。控制裝置10係藉由CPU(Central Processing Unit,中央處理單元)之通常動作而設定各種設定值,進行閥驅動控制、以及基於各感應器之輸出之運轉控制等,省略與電氣配線相關之圖示。圖1中表示有作為控制裝置10所含之要素之用以保持本實施形態特有之功能之週期控制部11、比率設定部12以及週期設定部13,進而表示有用以進行與該等要素相對應之操作之觸控面板14。The output of each inductor is input to the control device 10. Further, the opening and closing operation of each valve is controlled by the valve drive signal supplied from the control device 10. The control device 10 sets various setting values by a normal operation of a CPU (Central Processing Unit), performs valve drive control, operation control based on output of each sensor, and the like, and omits illustrations related to electric wiring. . Fig. 1 shows a cycle control unit 11, a ratio setting unit 12, and a cycle setting unit 13 for maintaining the functions unique to the embodiment as elements included in the control device 10, and further indicates that it is useful to perform corresponding elements. The touch panel 14 is operated.

其次,參照圖1以及圖2,對上述構成之氮氣產生裝置之動作進行說明。於第1吸附槽1以及第2吸附槽2中,係將吸附動作(供給已被壓縮之原料空氣並於高壓下藉由吸附劑而進行吸附)與脫附動作(使壓力下降,使吸附於吸附劑之氣體脫附),藉由對各閥進行切換而交替地進行。於以下之說明中,將在第1吸附槽1中進行吸附動作並在第2吸附槽2中進行脫附動作之步驟稱為A步驟,將在第2吸附槽2中進行吸附動作並在第1吸附槽1中進行脫附動作之步驟稱為B步驟,將打開均壓閥(SV5)而使兩個吸附槽之壓力均等之步驟稱為C步驟(或者稱為均壓步驟)。於A步驟與B步驟該兩個步驟之間插入C步驟,同時交替地進行A步驟與B步驟,連續地進行取出氮氣或氧氣之運轉。Next, the operation of the nitrogen generating device having the above configuration will be described with reference to Figs. 1 and 2 . In the first adsorption tank 1 and the second adsorption tank 2, the adsorption operation (supplying the compressed raw material air and adsorbing it by the adsorbent under high pressure) and the desorption operation (lowering the pressure to cause adsorption) The gas desorption of the adsorbent is alternately performed by switching the valves. In the following description, the step of performing the adsorption operation in the first adsorption tank 1 and performing the desorption operation in the second adsorption tank 2 is referred to as the A step, and the adsorption operation is performed in the second adsorption tank 2, and The step of performing the desorption operation in the adsorption tank 1 is referred to as the B step, and the step of opening the pressure equalization valve (SV5) to equalize the pressures of the two adsorption tanks is referred to as a C step (or referred to as a pressure equalization step). The C step is inserted between the two steps of the A step and the B step, while the steps A and B are alternately performed, and the operation of taking out nitrogen or oxygen is continuously performed.

圖1中表示了第1吸附槽1為吸附步驟且第2吸附槽2為脫附步驟之狀態,亦即A步驟。由於基本上與眾所周知之步驟相同,因此對B步驟、C步驟則將圖示省略來進行說明。連結各槽等之線中,由粗線表示之配管的部分,其係指有氣體流動之狀態。圖中,添加於閥之影線表示開放狀態,未添加影線之閥處於封閉狀態。又,施加於各吸附槽1、2以及產品槽3之影線表示存在氮氣之狀態。Fig. 1 shows a state in which the first adsorption tank 1 is an adsorption step and the second adsorption tank 2 is in a desorption step, that is, step A. Since it is basically the same as the well-known steps, the description of the B step and the C step will be omitted. Among the lines connecting the grooves and the like, the portion indicated by the thick line means that the gas flows. In the figure, the hatching added to the valve indicates an open state, and the valve without a hatch is closed. Further, the hatching applied to each of the adsorption tanks 1, 2 and the product tank 3 indicates the state in which nitrogen gas is present.

圖2表示各步驟之各部中之壓力分布以及動作時序。圖2之P0所示之曲線表示供給至第1吸附閥(SV1)以及第2吸附閥(SV2)之原料空氣壓。P1~P3分別表示由第1吸附槽壓力感應器P1、第2吸附槽壓力感應器P2、及產品槽壓力感應器P3獲得之壓力值。SV1、SV2、SV3、SV4、SV5、SV6、及SV7分別表示用以使相對應之閥開閉之閥驅動信號。於添加有影線之區域中,各閥由於閥驅動信號而處於開放狀態,於其他區域中,各閥為封閉狀態。圖表中之橫軸表示時間,於時間軸之方向上,按照C步驟、A步驟、C步驟、B步驟、C步驟之順序重複該等步驟。A~C之符號上部所記載之時間為各步驟之持續時間。Fig. 2 shows the pressure distribution and the operation timing in each part of each step. The curve indicated by P0 in Fig. 2 indicates the raw material air pressure supplied to the first adsorption valve (SV1) and the second adsorption valve (SV2). P1 to P3 respectively indicate pressure values obtained by the first adsorption tank pressure sensor P1, the second adsorption tank pressure sensor P2, and the product tank pressure sensor P3. SV1, SV2, SV3, SV4, SV5, SV6, and SV7 respectively indicate valve drive signals for opening and closing the corresponding valves. In the area where the hatching is added, each valve is in an open state due to the valve drive signal, and in other regions, each valve is in a closed state. The horizontal axis in the graph indicates time, and the steps are repeated in the order of the C step, the A step, the C step, the B step, and the C step in the direction of the time axis. The time indicated on the upper part of the symbols A to C is the duration of each step.

於圖2所示之步驟A中,供給至第1吸附閥(SV1)、第2排氣閥(SV4)、及第1出口閥(SV6)之閥驅動信號為開放信號,而封閉信號被供給至其他閥。於第1吸附槽1中,將加壓原料空氣導入至第1吸附槽1之底部而進行吸附步驟。隨著原料空氣壓力P0上升,第1吸附槽壓力P1亦上升。隨之,藉由氧吸附劑而自原料空氣吸附氧,氮氣自槽上部流出並經由出口閥(SV6)而被導入至產品槽3。隨之,產品槽壓力P3上升。In step A shown in FIG. 2, the valve drive signals supplied to the first adsorption valve (SV1), the second exhaust valve (SV4), and the first outlet valve (SV6) are open signals, and the closed signal is supplied. To other valves. In the first adsorption tank 1, the pressurized raw material air is introduced into the bottom of the first adsorption tank 1, and the adsorption step is performed. As the raw material air pressure P0 rises, the first adsorption tank pressure P1 also rises. Accordingly, oxygen is adsorbed from the raw material air by the oxygen adsorbent, and the nitrogen gas flows out from the upper portion of the tank and is introduced into the product tank 3 via the outlet valve (SV6). As a result, the product tank pressure P3 rises.

經由第2排氣閥(SV4)對第2吸附槽2進行減壓,第2吸附槽壓力P2急遽下降。此時,經由流量調節閥8而自第1吸附槽1之頂部取出之環流氮被導入至第2吸附槽2之頂部。藉由該等動作,氧氣自氧吸附劑脫附並排出。The second adsorption tank 2 is depressurized via the second exhaust valve (SV4), and the second adsorption tank pressure P2 is rapidly lowered. At this time, the circulating nitrogen taken out from the top of the first adsorption tank 1 via the flow rate adjusting valve 8 is introduced into the top of the second adsorption tank 2. By these actions, oxygen is desorbed from the oxygen adsorbent and discharged.

於步驟C之均壓步驟中,均壓閥(SV5)被開放,其他閥被封閉。因此,原料空氣壓力P0上升至自原料空氣入口4供給之壓力為止。第1吸附槽壓力P1下降,第2吸附槽壓力P2上升,兩個吸附槽之壓力變得均等。進行該均壓步驟之目的在於:為了減小當自吸附步驟進入至脫附步驟時,因加壓氣體放出至大氣中而引起之能量損耗。亦即,將進入脫附步驟之槽之壓力供給至進入吸附步驟之槽,從而回收約一半之加壓能量。In the pressure equalizing step of step C, the pressure equalizing valve (SV5) is opened and the other valves are closed. Therefore, the raw material air pressure P0 rises to the pressure supplied from the raw material air inlet 4. The first adsorption tank pressure P1 is lowered, the second adsorption tank pressure P2 is increased, and the pressures of the two adsorption tanks are equalized. The purpose of performing the pressure equalization step is to reduce the energy loss caused by the release of pressurized gas into the atmosphere when the self-adsorption step proceeds to the desorption step. That is, the pressure of the tank entering the desorption step is supplied to the tank entering the adsorption step, thereby recovering about half of the pressurized energy.

於步驟B中,在第1吸附槽1中進行脫附步驟,在第2吸附槽2中進行吸附步驟。此時之動作係與步驟A中之動作相對稱,其中第1吸附槽1與第2吸附槽2中之動作係與步驟A相反。亦即,於步驟B中,將開放信號供給至第2吸附閥(SV2)、第1排氣閥(SV3)、及第2出口閥(SV7),而將封閉信號供給至其他閥,其餘與步驟A進行相同之動作,故省略具體之說明。In the step B, the desorption step is performed in the first adsorption tank 1, and the adsorption step is performed in the second adsorption tank 2. The operation at this time is symmetrical with the operation in the step A, and the operation in the first adsorption tank 1 and the second adsorption tank 2 is opposite to the step A. That is, in step B, the open signal is supplied to the second adsorption valve (SV2), the first exhaust valve (SV3), and the second outlet valve (SV7), and the closing signal is supplied to the other valves, and the rest is Step A performs the same operation, and thus the detailed description is omitted.

如上所述,於第1吸附槽1與第2吸附槽2中交替地進行夾雜均壓步驟之吸附步驟與脫附步驟,從而連續地產生氮氣。如此,將伴隨均壓C步驟且藉由A步驟或B步驟中之一個步驟進行之吸附脫附動作之一個週期持續之時間,定義為吸附脫附週期T定義。本實施形態中之氮氣產生裝置,係以對應於所產生之氮氣之使用狀態而使吸附脫附週期T產生變化的方式所構成。As described above, the adsorption step and the desorption step of the inclusion pressure equalization step are alternately performed in the first adsorption tank 1 and the second adsorption tank 2, whereby nitrogen gas is continuously generated. Thus, the time during which one cycle of the adsorption desorption operation by the pressure equalization C step and one of the A step or the B step is continued is defined as the adsorption desorption period T definition. The nitrogen generating device in the present embodiment is configured to change the adsorption/desorption cycle T in accordance with the state of use of the generated nitrogen gas.

此處,氮氣之使用狀態由產品氣體流量Lp表示,該產品氣體流量Lp係藉由流量感應器F對自產品槽3流出之產品氣體之流量進行檢測而獲得者。又,將設定為產品氣體流量Lp之最大值之最大產生量Lm,定義為額定產生量。Here, the state of use of nitrogen is represented by the product gas flow rate Lp, which is obtained by detecting the flow rate of the product gas flowing out of the product tank 3 by the flow sensor F. Further, the maximum generated amount Lm set to the maximum value of the product gas flow rate Lp is defined as the rated generation amount.

將相對於最大產生量Lm之已減小之產生量比率R,定義為R=Lp/Lm。The reduced production amount ratio R with respect to the maximum generation amount Lm is defined as R = Lp / Lm.

本實施形態中,當以小於最大(額定)產生量Lm之產品氣體流量Lp進行運轉時,藉由將氮氣純度維持於既定範圍內,根據產生量比率R=Lp/Lm而對吸附脫附週期T進行階段性地切換,來進行維持高回收效率而使原料空氣量減小之吸附脫附時間控制。In the present embodiment, when the operation is performed at a product gas flow rate Lp smaller than the maximum (rated) production amount Lm, the adsorption desorption cycle is performed according to the generation amount ratio R = Lp / Lm by maintaining the purity of the nitrogen gas within a predetermined range. T is switched stepwise to control the adsorption desorption time at which the high recovery efficiency is maintained and the amount of raw material air is reduced.

以下,對吸附脫附時間控制之具體例進行說明。首先,圖1所示之比率設定部12,其保持針對產生量比率R所階段性地設定之複數個產生量比率Ri =Li /Lm(i=0~n;n為正整數)之設定輸入值。產生量比率R係相對於最大產生量Lm所減小之結果的比率,因此,R≦1。又,週期設定部13,其保持針對吸附脫附週期所對應於各個產生量比率Ri 所階段性地設定之吸附脫附週期Ti 之設定輸入值。該等設定值係藉由使用觸控面板14之操作而被輸入與設定。Hereinafter, a specific example of the adsorption desorption time control will be described. First, the ratio setting unit 12 shown in FIG. 1 holds a plurality of generation amount ratios R i =L i /Lm (i=0 to n; n is a positive integer) which are set stepwise with respect to the generation amount ratio R. Set the input value. The ratio of the amount of production R is a ratio of the result of the decrease with respect to the maximum amount of production Lm, and therefore, R ≦ 1 . Further, the period setting unit 13 holds the set input value of the adsorption desorption period T i which is set stepwise for each of the generation amount ratios R i for the adsorption desorption period. These settings are entered and set by the operation of the touch panel 14.

週期控制部11對應於產品氣體之流量Lp(產生量比率R=Lp/Lm),並根據比率設定部12所保持之各個產生量比率Ri 與週期設定部13所保持之吸附脫附週期Ti 之對應關係,來選擇吸附脫附週期T,並依據所選擇之吸附脫附週期T而對吸附脫附動作進行控制。The cycle control unit 11 corresponds to the flow rate Lp of the product gas (production amount ratio R=Lp/Lm), and the respective adsorption amount ratio R i held by the ratio setting unit 12 and the adsorption desorption period T held by the cycle setting unit 13 The correspondence relationship of i is selected to adsorb the desorption period T, and the adsorption desorption operation is controlled according to the selected adsorption desorption period T.

根據以下之條件,對上述控制中所使用之上述設定值進行調整。The above-mentioned set values used in the above control are adjusted according to the following conditions.

Ro =0,Rn =1,且R o =0, R n =1, and

0<i<n之範圍中,0<Ri <1(其中,Ri <Ri+1 ),以及In the range of 0<i<n, 0<R i <1 (where R i <R i+1 ), and

Ti >Ti+1 T i >T i+1

又,根據下述之(數1)來選擇吸附脫附週期T。Further, the adsorption desorption cycle T is selected in accordance with the following (number 1).

當Ri-1 <(R=Lp/Lm)≦Ri 時,T=Ti  (1)When R i-1 <(R=Lp/Lm)≦R i , T=T i (1)

又,當產生量比率R=Lp/Lm=Ri 時,較佳以維持所需之產品氣體純度之方式對吸附脫附週期Ti 進行設定。Further, when the production amount ratio R = Lp / Lm = R i , it is preferred to set the adsorption desorption period T i in such a manner as to maintain the desired product gas purity.

圖3係表示成為如上所述之吸附脫附時間控制之基準之流量運轉程式的設定之形態的表。並排於縱方向之STEP1~STEP5表示與產生量比率Ri 之各設定值相對應之區段。於各區段中表示有以百分率表示之產生量比率Ri (0%~100%)、吸附脫附週期Ti (秒)、以及設定流量之值。於本例中,n=5。Fig. 3 is a table showing the form of the setting of the flow rate operation program which is the basis of the adsorption desorption time control as described above. STEP1 to STEP5, which are arranged side by side in the vertical direction, indicate segments corresponding to respective set values of the amount-of-production ratio R i . The ratio of the amount of production R i (0% to 100%) expressed in percentage, the adsorption desorption period T i (seconds), and the set flow rate are shown in each segment. In this example, n=5.

例如,於STEP1中,i=5,產生量比率R5 為100%。因此,記載於設定流量顯示欄之設定流量100.0Nm3 /h為額定產生量即最大產生量Lm。於該區段中,吸附脫附週期T5 為60.0秒,其對應於吸附脫附週期T之下限。For example, in STEP 1, i=5, the production amount ratio R 5 is 100%. Therefore, the set flow rate 100.0 Nm 3 /h described in the set flow rate display column is the maximum generated amount Lm which is the rated generation amount. In this section, the adsorption desorption period T 5 is 60.0 seconds, which corresponds to the lower limit of the adsorption desorption period T.

又,STEP2係i=4,產生量比率R4 為75%,設定流量被設定為75.0Nm3 /h之區段。於該區段中,吸附脫附週期T4 為90.0秒。根據上述(數1),於R4 <(R=Lp/Lm)≦Rn 之範圍中,即,於產生量比率R超過75%且為100%以下之範圍中,吸附脫附週期T選擇60.0秒。Further, STEP2 is i=4, the generation amount ratio R 4 is 75%, and the set flow rate is set to a section of 75.0 Nm 3 /h. In this section, the adsorption desorption period T 4 was 90.0 seconds. According to the above (number 1), in the range of R 4 < (R = Lp / Lm) ≦ R n , that is, in the range where the amount-of-production ratio R exceeds 75% and is 100% or less, the adsorption desorption period T is selected. 60.0 seconds.

同樣,於產生量比率R超過50%且為75%以下之範圍中,吸附脫附週期T選擇90.0秒。於產生量比率R超過25%且為50%以下之範圍中,吸附脫附週期T選擇120.0秒。於產生量比率R超過0%且為25%以下之範圍中,吸附脫附週期T選擇150.0秒。Similarly, in the range where the production amount ratio R exceeds 50% and is 75% or less, the adsorption desorption period T is selected to be 90.0 seconds. In the range where the production amount ratio R exceeds 25% and is 50% or less, the adsorption desorption period T is selected to be 120.0 seconds. In the range where the production amount ratio R exceeds 0% and is 25% or less, the adsorption desorption period T is selected to be 150.0 seconds.

如上所述,根據本實施形態之氮氣產生裝置,於以小於最大產生量Lm之產品氣體流量Lp進行運轉之情形時,藉由維持氮氣純度,並根據產品氣體流量Lp而對吸附脫附時間進行階段性地切換,可維持高回收效率,同時減小原料空氣量。產生量比率Ri 之區段以及相對應之吸附脫附週期Ti 可對其設定值進行變更,從而可根據實用時之狀況,以最佳之狀態實現節能運轉。As described above, according to the nitrogen generating apparatus of the present embodiment, when the gas is operated at a product gas flow rate Lp smaller than the maximum amount of production Lm, the adsorption desorption time is performed in accordance with the product gas flow rate Lp by maintaining the purity of the nitrogen gas. Switching in stages ensures high recovery efficiency while reducing the amount of feed air. The section in which the amount ratio R i is generated and the corresponding adsorption desorption period T i can be changed in accordance with the set value, so that the energy-saving operation can be realized in an optimum state according to the situation at the time of practical use.

圖4以及圖5表示藉由使用本實施形態之氮氣產生裝置而產生之效果。圖4表示於將吸附脫附週期T設為固定之標準運轉之情形、及基於圖3所示之設定之本實施形態之運轉之情形中,對原料空氣消耗率進行比較所得之數值。圖5係以圖表之方式來表示圖4之表之圖。4 and 5 show the effects produced by using the nitrogen gas generating apparatus of the present embodiment. Fig. 4 shows numerical values obtained by comparing the raw material air consumption rates in the case where the adsorption/desorption cycle T is set to a fixed standard operation and the operation based on the present embodiment set as shown in Fig. 3 . Fig. 5 is a diagram showing the table of Fig. 4 in a graph form.

(實施形態2)(Embodiment 2)

圖6係表示本發明之實施形態2中之氮氣產生裝置之構成之概要圖。該裝置基本上具有與圖1所示之實施形態1之裝置相同之構成。因此,對相同要素標記相同之參照符號,並簡化重複之說明。Fig. 6 is a schematic view showing the configuration of a nitrogen generating device in the second embodiment of the present invention. This apparatus basically has the same configuration as that of the apparatus of the first embodiment shown in Fig. 1. Therefore, the same elements are denoted by the same reference numerals, and the description of the repetition is simplified.

於實施形態1之裝置中,接受自氮氣產生裝置之外部所供給之原料空氣,相對於此,於本實施形態中,自原料空氣入口4導入且經由空氣過濾器15之空氣,被壓縮機16(例如使用無油渦卷式壓縮機)壓縮之後,供給作為原料空氣。In the apparatus of the first embodiment, the raw material air supplied from the outside of the nitrogen generating device is received. In contrast, in the present embodiment, the air introduced from the raw material air inlet 4 and passing through the air filter 15 is supplied to the compressor 16 . After being compressed (for example, using an oil-free scroll compressor), it is supplied as raw material air.

藉由壓縮機16進行壓縮,將原料空氣暫時儲存於原料空氣槽17之後,供給至第1吸附槽1或第2吸附槽2。原料空氣槽17中設置有對槽內之壓力進行檢測之原料空氣壓力感應器P01。由相同之符號P01來表示由原料空氣壓力感應器P01所檢測之壓力值。The raw material air is temporarily stored in the raw material air tank 17 after being compressed by the compressor 16, and then supplied to the first adsorption tank 1 or the second adsorption tank 2. A raw material air pressure sensor P01 that detects the pressure in the tank is provided in the raw material air tank 17. The pressure value detected by the raw material air pressure sensor P01 is indicated by the same symbol P01.

控制裝置10中設置有壓縮機驅動控制部18。壓縮機驅動控制部18根據原料空氣壓感應器P01之檢測壓力P01之大小而選擇壓縮機16之驅動與停止,以此方式進行控制(啟動停止控制)。亦即,當檢測壓力P01相對於既定之基準值Pt為P01<Pt時,對壓縮機16進行驅動,而當P01≧Pt時,使壓縮機16停止。The compressor drive control unit 18 is provided in the control device 10. The compressor drive control unit 18 selects the drive (stop start control) by selecting the drive and stop of the compressor 16 based on the magnitude of the detected pressure P01 of the raw material air pressure sensor P01. That is, when the detected pressure P01 is P01 < Pt with respect to the predetermined reference value Pt, the compressor 16 is driven, and when P01 ≧ Pt, the compressor 16 is stopped.

然而,實際上為了確保運轉之穩定性,進行與檢測壓力P01之歷程相對應之控制。亦即,對下基準值Pt1與上基準值Pth(Pt1<Pth)進行設定。繼而,在對壓縮機16進行驅動而使檢測壓力P01上升之過程中,當P01≧Pth時使壓縮機16停止。另一方面,在使壓縮機16停止而使檢測壓力P01減小之過程中,當P01≦Pt1時開始驅動壓縮機16。藉此,避免頻繁地使壓縮機16啟動與停止。下基準值Pt1以及上基準值Pth例如被分別設定為0.75MP以及0.85MP。However, actually, in order to ensure the stability of the operation, control corresponding to the history of the detection pressure P01 is performed. That is, the lower reference value Pt1 and the upper reference value Pth (Pt1 < Pth) are set. Then, in the process of driving the compressor 16 to increase the detected pressure P01, the compressor 16 is stopped when P01 ≧ Pth. On the other hand, in the process of stopping the compressor 16 and decreasing the detection pressure P01, the compressor 16 is started to be driven when P01 ≦ Pt1. Thereby, it is avoided to frequently start and stop the compressor 16. The lower reference value Pt1 and the upper reference value Pth are set to, for example, 0.75 MP and 0.85 MP, respectively.

如此,根據原料空氣槽17之壓力P01,對內置之壓縮機16進行啟動停止控制,藉此,可減小壓縮機16之消耗電力。又,可大幅度地延長壓縮機16之壽命。如上述可藉由壓縮機16之啟動停止控制而有效地減小消耗電力,其與實施形態1同樣地必須以藉由使吸附脫附週期T產生變化而減小原料空氣消耗率之構成為前提。In this manner, the built-in compressor 16 is started and stopped based on the pressure P01 of the raw material air tank 17, whereby the power consumption of the compressor 16 can be reduced. Moreover, the life of the compressor 16 can be greatly extended. As described above, the power consumption can be effectively reduced by the start-stop control of the compressor 16. As in the first embodiment, it is necessary to reduce the adsorption/desorption cycle T to reduce the material air consumption rate. .

亦即,自原料空氣槽17供給之受到壓縮之原料空氣之流量係根據產品氣體之使用狀態,即根據產品氣體流量Lp(氮氣放出量)之多少而產生變動。若產品氣體流量Lp較少,則自原料空氣槽17流出之流量較少。That is, the flow rate of the compressed raw material air supplied from the raw material air tank 17 varies depending on the state of use of the product gas, that is, according to the product gas flow rate Lp (nitrogen release amount). If the product gas flow rate Lp is small, the flow rate from the raw material air tank 17 is small.

此處,若使壓縮機16連續地運轉,則於來自原料空氣槽17之流出流量較少之情形時,即便原料空氣槽17之壓力P01已達到必需之水準,壓縮機16亦會徒勞地驅動。於該情形時,即便如上所述,以當P01≧Pt時使壓縮機16停止之方式進行控制,亦不會對第1吸附槽1以及第2吸附槽2中之吸附脫附動作造成影響。因此,若使壓縮機16停止,則可減小消耗電力。又,採用藉由使吸附脫附週期T產生變化而減小原料空氣消耗率之構成,藉此,可延長壓縮機16之停止時間,從而更有效地減小消耗電力。Here, when the compressor 16 is continuously operated, when the flow rate from the raw material air tank 17 is small, even if the pressure P01 of the raw material air tank 17 has reached the necessary level, the compressor 16 is driven in vain. . In this case, even if the compressor 16 is stopped when P01 ≧ Pt as described above, the adsorption/desorption operation in the first adsorption tank 1 and the second adsorption tank 2 is not affected. Therefore, if the compressor 16 is stopped, the power consumption can be reduced. Further, by adopting a configuration in which the adsorption desorption cycle T is changed to reduce the raw material air consumption rate, the stop time of the compressor 16 can be extended, and the power consumption can be more effectively reduced.

圖7表示藉由使用本實施形態之氮氣產生裝置而減小壓縮機之消耗電力之效果。根據圖7可知:與藉由先前之標準運轉方法來使壓縮機連續運轉之情形相比較,於藉由本實施形態而對壓縮機進行啟動停止控制之情形時,可根據放出空氣量而顯著地減小消耗電力。Fig. 7 shows an effect of reducing the power consumption of the compressor by using the nitrogen gas generating apparatus of the present embodiment. As can be seen from Fig. 7, when the compressor is started and stopped by the present embodiment, compared with the case where the compressor is continuously operated by the conventional standard operation method, it can be remarkably reduced according to the amount of released air. Small power consumption.

產業上之可利用性Industrial availability

根據本發明之變壓吸附式氣體產生裝置,可根據所消耗之產品氣體流量之增減而減小消耗電力,從而可有效地用作供給氮氣之系統。According to the pressure swing adsorption type gas generating apparatus of the present invention, the power consumption can be reduced in accordance with the increase or decrease of the flow rate of the consumed product gas, so that it can be effectively used as a system for supplying nitrogen gas.

1...第1吸附槽1. . . First adsorption tank

2...第2吸附槽2. . . Second adsorption tank

3...產品槽3. . . Product slot

4...原料空氣入口4. . . Raw material air inlet

5...產品氣體出口5. . . Product gas outlet

6、7...配管6, 7. . . Piping

8...流量調節閥8. . . Flow regulating valve

9...排氣口9. . . exhaust vent

10...控制裝置10. . . Control device

11...週期控制部11. . . Cycle control department

12...比率設定部12. . . Ratio setting unit

13‧‧‧週期設定部13‧‧‧Cycle setting department

14‧‧‧觸控面板14‧‧‧Touch panel

15‧‧‧空氣過濾器15‧‧‧Air filter

16‧‧‧壓縮機16‧‧‧Compressor

17‧‧‧原料空氣槽17‧‧‧Material air tank

18‧‧‧壓縮機驅動控制部18‧‧‧Compressor Drive Control Department

P0、P01‧‧‧原料空氣壓感應器P0, P01‧‧‧ raw material air pressure sensor

P1‧‧‧第1吸附槽壓力感應器P1‧‧‧1st adsorption tank pressure sensor

P2‧‧‧第2吸附槽壓力感應器P2‧‧‧2nd adsorption tank pressure sensor

P3‧‧‧產品槽壓力感應器P3‧‧‧Product tank pressure sensor

F‧‧‧產品氣體流量感應器F‧‧‧Product gas flow sensor

OC‧‧‧氧濃度感應器OC‧‧‧Oxygen concentration sensor

SV1‧‧‧第1吸附閥SV1‧‧‧1st adsorption valve

SV2‧‧‧第2吸附閥SV2‧‧‧2nd adsorption valve

SV3‧‧‧第1排氣閥SV3‧‧‧1st exhaust valve

SV4‧‧‧第2排氣閥SV4‧‧‧2nd exhaust valve

SV5‧‧‧均壓閥SV5‧‧‧pressure equalization valve

SV6‧‧‧第1出口閥SV6‧‧‧1st exit valve

SV7‧‧‧第2出口閥SV7‧‧‧2nd exit valve

圖1係表示本發明之實施形態1中之變壓吸附式氮氣產生裝置之概要圖。Fig. 1 is a schematic view showing a pressure swing adsorption type nitrogen generating apparatus in accordance with a first embodiment of the present invention.

圖2係表示圖1之氮氣產生裝置之動作中之壓力變化以及動作時序之圖。Fig. 2 is a view showing pressure changes and operation timings in the operation of the nitrogen generating device of Fig. 1.

圖3係表示成為上述氮氣產生裝置中之吸附脫附時間控制之基準之流量運轉程式的設定之形態之表。Fig. 3 is a table showing the setting of the flow rate operation program which is the basis of the adsorption/desorption time control in the above-described nitrogen gas generator.

圖4係表示藉由使用上述氮氣產生裝置而減小原料空氣消耗率之效果之表。Fig. 4 is a table showing the effect of reducing the air consumption rate of the raw material by using the above nitrogen generating device.

圖5係以圖表來表示圖4之效果之圖。Fig. 5 is a diagram showing the effect of Fig. 4 in a graph.

圖6係表示本發明之實施形態2中之變壓吸附式氮氣產生裝置之概要圖。Fig. 6 is a schematic view showing a pressure swing adsorption type nitrogen generating apparatus according to a second embodiment of the present invention.

圖7係表示藉由使用上述氮氣產生裝置而減小壓縮機之消耗電力之效果之圖。Fig. 7 is a view showing an effect of reducing the power consumption of the compressor by using the above nitrogen generating device.

1...第1吸附槽1. . . First adsorption tank

2...第2吸附槽2. . . Second adsorption tank

3...產品槽3. . . Product slot

4...原料空氣入口4. . . Raw material air inlet

5...產品氣體出口5. . . Product gas outlet

6、7...配管6, 7. . . Piping

8...流量調節閥8. . . Flow regulating valve

9...排氣口9. . . exhaust vent

10...控制裝置10. . . Control device

11...週期控制部11. . . Cycle control department

12...比率設定部12. . . Ratio setting unit

13...週期設定部13. . . Cycle setting unit

14...觸控面板14. . . Touch panel

P0、P01...原料空氣壓感應器P0, P01. . . Raw material air pressure sensor

P1...第1吸附槽壓力感應器P1. . . 1st adsorption tank pressure sensor

P2...第2吸附槽壓力感應器P2. . . 2nd adsorption tank pressure sensor

P3...產品槽壓力感應器P3. . . Product tank pressure sensor

F...產品氣體流量感應器F. . . Product gas flow sensor

OC...氧濃度感應器OC. . . Oxygen concentration sensor

SV1...第1吸附閥SV1. . . First adsorption valve

SV2...第2吸附閥SV2. . . Second adsorption valve

SV3...第1排氣閥SV3. . . First exhaust valve

SV4...第2排氣閥SV4. . . Second exhaust valve

SV5...均壓閥SV5. . . Pressure equalization valve

SV6...第1出口閥SV6. . . First outlet valve

SV7...第2出口閥SV7. . . 2nd outlet valve

Claims (4)

一種變壓吸附式氣體產生裝置,其具備:填充有吸附劑之第1吸附槽及第2吸附槽;連接於該第1吸附槽及第2吸附槽之原料空氣導入流路;將在該第1吸附槽及第2吸附槽中自該原料空氣分離之氮氣加以儲存之產品槽;來自於該第1吸附槽及第2吸附槽之排氣用流路;使該第1吸附槽及第2吸附槽之間連通之均壓用流路;位於該第1吸附槽與該產品槽之間、以及第2吸附槽與該產品槽之間之產品氣體流路;設置於該各個流路之閥;對自該產品槽流出至外部之該產品氣體之流量Lp進行檢測之產品氣體流量感應器;以及對該各個閥之開閉進行控制之控制裝置;該控制裝置,係對該兩個吸附槽進行切換而重複地控制吸附脫附動作,該吸附脫附動作係於該均壓用流路開放之均壓步驟之後,在該第1吸附槽及第2吸附槽之一者,藉由該吸附劑而進行吸附步驟,而於另一個吸附槽,進行使氣體自該吸附劑脫附之脫附步驟,該變壓吸附式氣體產生裝置之特徵在於:定義相對於被設定為該產品氣體流量Lp之最大值之最大產生量Lm之已減小之產生量比率R=Lp/Lm;進一步具備: 比率設定部,其用以將針對該產生量比率R做階段性地設定之複數個產生量比率Ri =Li /Lm(i=0~n;n為正整數)之設定輸入值予以保持;以及週期設定部,針對該吸附脫附動作之一個週期持續之時間即該吸附脫附週期T,用以將與各個該產生量比率Ri 對應做階段性地設定之吸附脫附週期Ti 之設定輸入值予以保持;該產生量比率Ri 、以及該吸附脫附週期Ti 之值係依據下述之條件而設定:Ro =0,Rn =1,0<i<n之範圍中,0<Ri <1(其中,Ri <Ri+1 ),以及Ti >Ti+1 ;該控制裝置根據由該產品氣體流量感應器檢測之該產品氣體之流量Lp,依據下述之式(1)而選擇該吸附脫附週期T:當Ri-1 <(R=Lp/Lm)≦Ri 時,T=Ti (1);依據所選擇之該吸附脫附週期T,來對該吸附脫附動作進行控制。A pressure swing adsorption type gas generating device comprising: a first adsorption tank filled with an adsorbent and a second adsorption tank; and a raw material air introduction flow path connected to the first adsorption tank and the second adsorption tank; a product tank for storing nitrogen gas separated from the raw material air in the adsorption tank and the second adsorption tank; an exhaust gas flow path from the first adsorption tank and the second adsorption tank; and the first adsorption tank and the second adsorption tank a flow path for equalizing pressure that communicates between the adsorption tanks; a product gas flow path between the first adsorption tank and the product tank, and between the second adsorption tank and the product tank; a valve disposed in each of the flow paths a product gas flow sensor for detecting a flow rate Lp of the product gas flowing out from the product tank; and a control device for controlling opening and closing of the respective valves; the control device performs the two adsorption tanks The adsorption/desorption operation is repeatedly controlled by switching, and the adsorption and desorption operation is performed after the pressure equalization step of opening the pressure equalization flow path, and the adsorbent is used in one of the first adsorption tank and the second adsorption tank And the adsorption step is carried out while in another adsorption tank a desorption step of desorbing a gas from the adsorbent, the pressure swing adsorption gas generating device characterized in that the definition of the maximum generated amount Lm with respect to the maximum value of the gas flow rate Lp set to the product has been reduced The production amount ratio R=Lp/Lm; further comprising: a ratio setting unit for setting a plurality of generation amount ratios R i =L i /Lm (i=0~) for the generation amount ratio R in stages n; n is a positive integer) setting input value is maintained; and a period setting unit for the duration of one cycle of the adsorption desorption operation, that is, the adsorption desorption period T, for ratio R i to each of the production amounts The set input value corresponding to the stage of the adsorption desorption period T i is maintained; the value of the production amount R i and the value of the adsorption desorption period T i are set according to the following conditions: R o =0 , in the range of R n =1,0<i<n, 0<R i <1 (where R i <R i+1 ), and T i >T i+1 ; the control device is based on the gas from the product The flow rate Lp of the product gas detected by the flow sensor is selected according to the following formula (1): when R i-1 < (R = Lp / Lm) ≦ R i , T = T i (1); The adsorption desorption operation is controlled according to the selected adsorption desorption period T. 如申請專利範圍第1項之變壓吸附式氣體產生裝置,其中:該吸附脫附週期Ti 係設定為當產生量比率R=Lp/Lm=Ri 時,可維持所需之氮氣純度。The scope of the patent application pressure swing adsorption gas generating apparatus as item 1, wherein: the period T i based adsorption and desorption when the generation amount is set to the ratio R = Lp / Lm = when R i, can maintain the desired nitrogen purity. 如申請專利範圍第1項之變壓吸附式氣體產生裝置,其具備: 儲存並供給該原料空氣之原料空氣槽;對空氣進行壓縮並供給至該原料空氣槽之壓縮機;以及對該原料空氣槽內之壓力P01進行檢測之原料空氣壓感應器;該控制裝置進行下述控制:根據該原料空氣壓感應器之檢測壓力P01而重複地使該壓縮機驅動與停止,藉此將該檢測壓力P01維持於既定值以上。 The pressure swing adsorption gas generating device of claim 1, wherein: a raw material air tank for storing and supplying the raw material air; a compressor for compressing and supplying the air to the raw material air tank; and a raw material air pressure sensor for detecting the pressure P01 in the raw material air tank; the control device is performed Control: The compressor is repeatedly driven and stopped according to the detection pressure P01 of the raw material air pressure sensor, thereby maintaining the detection pressure P01 at a predetermined value or more. 如申請專利範圍第3項之變壓吸附式氣體產生裝置,其中:對下基準值Ptl以及上基準值Pth(Ptl<Pth)進行設定,該控制裝置進行下述控制:使得在對該壓縮機進行驅動而使檢測壓力P01上升之過程中,當P01≧Pth時使壓縮機停止;在使壓縮機停止而使檢測壓力P01減少之過程中,當P01≦Ptl時開始驅動壓縮機。 A pressure swing adsorption type gas generating apparatus according to claim 3, wherein: the lower reference value Ptl and the upper reference value Pth (Ptl < Pth) are set, and the control device performs control such that the compressor is In the process of driving to increase the detection pressure P01, the compressor is stopped when P01≧Pth, and the compressor is started to be driven when P01≦Ptl is stopped while the compressor is stopped to decrease the detection pressure P01.
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