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TWI498544B - Defect inspection method and defect inspection device - Google Patents

Defect inspection method and defect inspection device Download PDF

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TWI498544B
TWI498544B TW102125479A TW102125479A TWI498544B TW I498544 B TWI498544 B TW I498544B TW 102125479 A TW102125479 A TW 102125479A TW 102125479 A TW102125479 A TW 102125479A TW I498544 B TWI498544 B TW I498544B
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defect
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TW201411120A (en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection

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Description

缺陷檢查方法及缺陷檢查裝置Defect inspection method and defect inspection device

本發明係有關於檢查被檢查物之缺陷的方法及裝置。The present invention relates to a method and apparatus for inspecting defects of an object to be inspected.

已知一種技術(例如,參照專利文獻1),該技術係使用以相機拍攝片狀物品所得之RGB影像,可判定片狀物品的缺陷。而且,從通過具有複數個相異之顏色區域的檢查板上之片狀物品的RGB影像資料,取得由R成分影像、G成分影像、B成分影像所合成的合成影像,並根據該合成影像之變色區域的顏色是否屬於預先記憶之缺陷種類之設定參數的範圍來判別缺陷的種類。若依據本技術,在顏色之重現性具有範圍(不均、顏色不均及/或顏色褪色)的片狀物品之污物、破裂、形狀不良等的缺陷檢查時,可不會將花樣判定為缺陷,而且可判別黑污物、非黑污物及破裂。A technique is known (for example, refer to Patent Document 1) which determines the defect of a sheet-like article using an RGB image obtained by photographing a sheet-like article with a camera. Further, the synthesized image synthesized by the R component image, the G component image, and the B component image is obtained from the RGB image data of the sheet-like article on the inspection board having a plurality of different color regions, and based on the composite image Whether the color of the color-changing area belongs to the range of the setting parameters of the defect type that is memorized in advance determines the type of the defect. According to the present technology, when the defect of color has a range (unevenness, color unevenness, and/or color fading), the defect of the sheet-like article, such as dirt, crack, shape, and the like, may not be judged as Defects, and can distinguish black dirt, non-black dirt and cracks.

可是,因為根據可見光區域之RGB影像資料來判定缺陷,所以顏色與片狀材料相似之缺陷、或透明之缺陷係難檢測出。例如,附著於暗色之紙上之金屬粉的檢測、或者水或油等透明之液體的檢測係困難。However, since the defect is determined based on the RGB image data of the visible light region, the defect similar to the sheet material or the transparent defect is difficult to detect. For example, detection of metal powder adhering to a dark paper or detection of a transparent liquid such as water or oil is difficult.

又,根據可見光區域之RGR影像資料來判定缺陷時,區別顏色相似之缺陷係困難。例如,要判別鐵 等之黑色金屬粉與深色之油係困難。又,鋁等之亮的金屬粉與淺色之油的判別亦困難。進而,水與透明之油的判別亦困難。Further, when the defect is determined based on the RGR image data of the visible light region, it is difficult to distinguish the defect having a similar color. For example, to discriminate iron It is difficult to wait for black metal powder and dark oil. Moreover, the discrimination between the bright metal powder such as aluminum and the light oil is also difficult. Furthermore, the discrimination between water and transparent oil is also difficult.

另一方面,即使是看起來相似的情況,亦有對被檢查物的功能造成之影響相異的情況。例如,在二次電池所使用之隔板,即使有些許污物也不會有問題,但是有金屬混入時,可能有電性導通之虞。因此,污物係不必判定為缺陷,但是金屬係需要判定為缺陷,因此,有判別顏色相似之金屬粉與污物的要求。又,即使水附著於被檢查物,在以後若蒸發就不成問題的情況,即使水附著亦不必判定為缺陷。可是,在難蒸發之油附著於被檢查物的情況,需要判定為缺陷。因此,亦有判別顏色相似之水與透明之油的要求。On the other hand, even in the case of similar appearance, there is a case where the influence of the function of the object to be inspected is different. For example, in the separator used in the secondary battery, even if there is some dirt, there is no problem, but when metal is mixed, there may be electrical conduction. Therefore, the dirt system does not have to be determined as a defect, but the metal system needs to be judged as a defect, and therefore, there is a demand for discriminating metal powder and dirt having similar colors. Further, even if water adheres to the test object, it will not be a problem if it evaporates later, and it is not necessary to determine that it is a defect even if water adheres. However, in the case where the oil which is difficult to evaporate adheres to the test object, it is necessary to determine that it is a defect. Therefore, there are also requirements for discriminating water of similar color and transparent oil.

於是,因為根據被檢查物之缺陷的種類亦有被容許的情況,所以判別缺陷的種類較佳。可是,僅靠可見光區域之RGB影像資料,則難以進行此判別。因此,即使是亦可不當作缺陷檢測出的情況,亦可能有被檢測為缺陷之虞。Therefore, since the type of the defect according to the object to be inspected is also allowed, it is preferable to determine the type of the defect. However, it is difficult to perform this discrimination only by the RGB image data in the visible light region. Therefore, even if it is not detected as a defect, there may be a flaw detected as a defect.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]日本特開2008-256402號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-256402

本發明係鑑於如上述之問題點而開發者,其 目的在於提高缺陷之檢測精度。The present invention has been developed in view of the above problems, and The purpose is to improve the detection accuracy of defects.

為了達成該課題,本發明之缺陷檢查方法係在構成上包含以下的步驟:照射步驟,係從光源對被檢查物照射可見光與不可見光;資料產生步驟,係分別接受被檢查物所反射或透過被檢查物的可見光及不可見光,並分別產生因應於各個之受光量的攝像資料;及判定步驟,係在以可見光與不可見光比較在該攝像資料所變動的區域中該攝像資料變動的程度的結果係屬於所預先記憶之當作缺陷之範圍內的情況,判定為缺陷。In order to achieve the problem, the defect inspection method of the present invention includes the following steps: an irradiation step of irradiating visible light and invisible light to the test object from the light source; and a data generation step of respectively receiving or reflecting the test object. The visible light and the invisible light of the object to be inspected are respectively generated with image data corresponding to the respective amounts of received light; and the determining step is to compare the degree of change of the image data in the region where the image data is changed by comparing visible light and invisible light. The result is a case in which the pre-memory is regarded as a defect, and it is judged as a defect.

在此,將可見光區域之波長的光及不可見光區域之波長的光照射於物質時之各波長之光的吸收率係因各物質而異。因此,在將可見光區域之波長的光及不可見光區域之波長的光照射於物質時之反射光或透過光的強度係因各物質及光之各波長而異。即,在將可見光區域之波長的光及不可見光區域之波長的光照射於被檢查物時之反射光或透過光的強度係在缺陷存在時,成為與該缺陷相對應的強度。因此,被檢查物缺陷不存在之情況的攝像資料、與在被檢查物缺陷存在之情況的攝像資料產生差。即,在被檢查物有缺陷存在時,攝像資料變動。而且,該攝像資料之變動的程度係因各物質及光之各波長而異。因此,比較可見光區域之波長的光之攝像資料之變動的程度及不可見光區域之波長的光之攝像資料之變動的程度的結果係隨著於缺陷之有無及缺陷的種類而改變。因此,若預先因應於缺陷的種類來記憶比 較各波長之光的攝像資料之變動的程度的結果,就可判別缺陷之有無及缺陷的種類。又,例如藉由併用不可見光,可判別是顏色與被檢查物之顏色相似的缺陷並僅靠可見光無法判別之缺陷的種類。因此,在即使有缺陷但可容許的情況,亦可判定缺陷不存在。Here, the absorption rate of light of each wavelength when the light of the wavelength of the visible light region and the light of the wavelength of the invisible region are irradiated to the substance differs depending on each substance. Therefore, the intensity of the reflected light or the transmitted light when the light of the wavelength of the visible light region and the light of the wavelength of the invisible region are irradiated to the substance differs depending on the wavelength of each substance and light. In other words, when the intensity of the reflected light or the transmitted light when the light of the wavelength of the visible light region and the wavelength of the invisible light are irradiated onto the test object is in the presence of the defect, the strength corresponding to the defect is obtained. Therefore, the image pickup data in the case where the inspection object defect does not exist is inferior to the image pickup data in the case where the inspection object defect exists. That is, when the object to be inspected has a defect, the image data changes. Moreover, the degree of variation of the image data varies depending on the wavelength of each substance and light. Therefore, the result of comparing the degree of fluctuation of the imaging data of the light of the wavelength of the visible light region and the degree of fluctuation of the imaging data of the light of the wavelength of the invisible light region changes depending on the presence or absence of the defect and the type of the defect. Therefore, if the memory ratio is determined in advance in response to the type of defect As a result of the degree of change in the imaging data of the light of each wavelength, it is possible to discriminate the presence or absence of the defect and the type of the defect. Further, for example, by using invisible light in combination, it is possible to discriminate the type of defect in which the color is similar to the color of the object to be inspected and which cannot be discriminated by visible light alone. Therefore, it is possible to determine that the defect does not exist even if there is a defect but it is tolerable.

又,在本發明,亦可該不可見光係紅外光或紫外光之至少一方。若使用這些波長的光,因為根據物質之種類,攝像資料更顯著地變動,所以可更正確地檢測出無法以外觀來判斷的缺陷。Further, in the present invention, at least one of the invisible light may be infrared light or ultraviolet light. When light of these wavelengths is used, since the image data changes more remarkably depending on the type of the substance, it is possible to more accurately detect a defect that cannot be judged by the appearance.

又,在本發明,亦可以可見光及不可見光分別求得除法值,作為該攝像資料變動的程度,該除法值係將在該資料產生步驟所產生之攝像資料除以預先拍攝之無缺陷之被檢查物的攝像資料之值;在該判定步驟,藉由將可見光之該除法值與不可見光之該除法值的差和預先記憶之各缺陷之種類的值比較,判別缺陷的種類。Further, in the present invention, the division value may be obtained by the visible light and the invisible light, respectively, and the division value is the division of the image data generated in the data generation step by the pre-shooting defect-free one. The value of the image data of the inspection object; in the determination step, the type of the defect is determined by comparing the difference between the division value of the visible light and the division value of the invisible light and the value of the type of each of the defects memorized in advance.

藉由依此方式以無缺陷之攝像資料為基準比較所求得之各個的比(除法值),可減少光源之光量變動、各缺陷之透過率或反射率的差異、被檢查物之透過率或反射率的差異所造成之誤差。因此,因為不易受到擾亂之影響、或者缺陷或被檢查物之變化的影響,所以可提高缺陷的判定精度。By comparing the ratios (division values) obtained by using the non-defective imaging data as a reference, the variation in the amount of light of the light source, the difference in transmittance or reflectance of each defect, the transmittance of the object to be inspected, or The error caused by the difference in reflectivity. Therefore, since it is not easily affected by the disturbance or the influence of the defect or the change of the object to be inspected, the accuracy of the determination of the defect can be improved.

又,在本發明,亦可在該照射步驟照射該紅外光的情況,照射比長波長側波長更短的短波長側之可見光。Further, in the present invention, when the infrared light is irradiated in the irradiation step, visible light on the short-wavelength side shorter than the wavelength on the long wavelength side may be irradiated.

又,在本發明,亦可在該照射步驟照射該紫 外光的情況,照射比短波長側波長更長的長波長側之可見光。Moreover, in the present invention, the purple light may be irradiated in the irradiation step. In the case of external light, visible light on the long wavelength side longer than the short wavelength side is irradiated.

即,若依據波長之差更大的光,因為攝像資料對缺陷的變動程度的差更顯著地顯現出來,所以可可提高缺陷的判定精度。此外,比長波長側波長更短的短波長側之可見光係亦可採用比可見光區域之中心的波長更短之波長的可見光,亦可採用可見光中之B成分。又,比短波長側波長更長的長波長側之可見光係亦可採用比可見光區域之中心的波長更長之波長的可見光,亦可採用可見光中之R成分。In other words, if the light having a larger difference in wavelength is more prominently displayed due to the difference in the degree of change in the defect of the image data, the accuracy of the determination of the defect can be improved. Further, the visible light system on the short-wavelength side shorter than the long-wavelength side wavelength may be visible light having a wavelength shorter than the wavelength of the center of the visible light region, or a B component in visible light. Further, the visible light of the long-wavelength side longer than the short-wavelength side wavelength may be visible light of a wavelength longer than the wavelength of the center of the visible light region, or may be an R component of visible light.

又,在本發明,亦可在可見光之該除法值與不可見光之該除法值的差是臨限值以下的情況,判定是含有金屬的缺陷。Further, in the present invention, it is also possible to determine that the metal is a defect when the difference between the division value of visible light and the division value of invisible light is equal to or less than the threshold value.

在此,不論所照射之光是可見光區域或不可見光區域之波長的光,只要是金屬,則攝像資料一樣地變動。即,攝像資料之變動的程度小。因此,在攝像資料之變動之程度的差是臨限值以下的情況,可判定是含有金屬的缺陷。該臨限值係在缺陷含有金屬時之攝像資料的變動之程度的差之上限值。又,因為根據金屬的種類的不同,攝像資料之變動的程度會變化,所以可因應於攝像資料之變動的程度來判別金屬的種類。Here, regardless of whether the light to be irradiated is a wavelength of a visible light region or an invisible light region, the image pickup data fluctuates as long as it is a metal. That is, the degree of change in the image data is small. Therefore, when the difference in the degree of change in the image data is equal to or less than the threshold value, it can be determined that the metal contains a defect. The threshold value is a limit value above the difference in the degree of change in the image data when the defect contains metal. Further, since the degree of fluctuation of the image data varies depending on the type of the metal, the type of the metal can be determined in accordance with the degree of change in the image data.

又,在本發明,能以Si系之半導體受光元件分別接受可見光及不可見光。若依據Si系之半導體受光元件,可接受紅外光、可見光、紫外光。又,因為可以低價進行多像素化,所以可進行廣範圍或高速之測量。Moreover, in the present invention, visible light and invisible light can be respectively received by the Si-based semiconductor light-receiving elements. According to the Si-based semiconductor light-receiving element, infrared light, visible light, and ultraviolet light can be received. Moreover, since multi-pixelization can be performed at a low price, measurement over a wide range or at a high speed can be performed.

又,在本發明,亦可在一台相機分別具備接受可見光及不可見光的元件。藉由作成依此方式,裝置可小形化。Further, in the present invention, it is also possible to provide an element for receiving visible light and invisible light in one camera. In this way, the device can be miniaturized.

又,在本發明,亦可以分光元件將可見光與不可見光分光後,分別接受可見光及不可見光。藉由作成依此方式,因為不需要用以修正各波長之光的攝像位置之差異的位置對準,所以可簡化處理。Further, in the present invention, the visible light and the invisible light may be split by the spectral element, and the visible light and the invisible light may be respectively received. According to this configuration, since the alignment for correcting the difference in the imaging positions of the lights of the respective wavelengths is not required, the processing can be simplified.

又,在本發明,亦可該光源是在波長區域受到限制的光源。Further, in the present invention, the light source may be a light source that is limited in the wavelength region.

又,在本發明,亦可使從該光源所照射之光通過波長濾波器,而限制波長區域。Further, in the present invention, the light irradiated from the light source may be passed through the wavelength filter to restrict the wavelength region.

依此方式,藉由限制波長區域,因為可使用與物質之交互作用更為顯著之波長的光,所以可提高缺陷的判定精度。In this way, by limiting the wavelength region, since the light of a wavelength more prominent in interaction with the substance can be used, the accuracy of the determination of the defect can be improved.

又,為了達成該課題,本發明之缺陷檢查裝置係包括:照射部,係從光源對被檢查物照射可見光與不可見光;資料產生部,係分別接受被檢查物所反射或透過被檢查物的可見光及不可見光,並分別產生因應於各個之受光量的攝像資料;及判定部,係在以可見光與不可見光比較在該攝像資料所變動的區域中該攝像資料變動的程度的結果係屬於所預先記憶之當作缺陷之範圍內的情況下,判定為缺陷。Moreover, in order to achieve the problem, the defect inspection apparatus of the present invention includes an illuminating unit that illuminates the object to be inspected with visible light and invisible light from a light source, and the data generating unit receives the object to be inspected or transmitted through the object to be inspected. The visible light and the invisible light respectively generate image data corresponding to the respective amounts of received light; and the determination unit is a result of the degree of change of the image data in the region where the image data is changed by comparing visible light and invisible light. In the case where the pre-memory is within the range of the defect, it is determined to be a defect.

若依據本發明,可提高缺陷的檢測精度。According to the present invention, the detection accuracy of defects can be improved.

1‧‧‧缺陷檢查裝置1‧‧‧ Defect inspection device

2‧‧‧被檢查物2‧‧‧Inspected objects

5‧‧‧處理裝置5‧‧‧Processing device

31‧‧‧可見光源31‧‧‧ Visible light source

32‧‧‧IR/UV光源32‧‧‧IR/UV light source

41‧‧‧可見光相機41‧‧‧ Visible light camera

42‧‧‧IR/UV光相機42‧‧‧IR/UV light camera

43‧‧‧分光元件43‧‧‧Spectral components

51‧‧‧R信號處理部51‧‧‧R Signal Processing Department

52‧‧‧G信號處理部52‧‧‧G Signal Processing Department

53‧‧‧B信號處理部53‧‧‧B Signal Processing Department

54‧‧‧IR/UV信號處理部54‧‧‧IR/UV Signal Processing Department

55‧‧‧位置對準處理部55‧‧‧ Position Alignment Processing Department

56‧‧‧缺陷檢測部56‧‧‧Defect Detection Department

56A‧‧‧檢測臨限值記憶部56A‧‧‧Detection threshold memory

57‧‧‧判定部57‧‧‧Decision Department

57A‧‧‧判定臨限值記憶部57A‧‧‧Determined Threshold Memory

58‧‧‧輸出部58‧‧‧Output Department

第1圖係第1實施例之缺陷檢查裝置的方塊圖。Fig. 1 is a block diagram of a defect inspection device of the first embodiment.

第2圖係表示在各信號處理部處理後之像素與反射比之關係的圖。Fig. 2 is a view showing the relationship between the pixel and the reflectance after processing by each signal processing unit.

第3圖係使第2圖所示之各信號重疊的圖。Fig. 3 is a diagram in which the signals shown in Fig. 2 are superimposed.

第4圖係表示缺陷是水之情況的像素與反射比之關係的圖。Fig. 4 is a view showing the relationship between the pixel and the reflectance in the case where the defect is water.

第5圖係表示缺陷是金屬之情況的像素與反射比之關係的圖。Fig. 5 is a view showing the relationship between the pixel and the reflectance in the case where the defect is a metal.

第6圖係表示判別第1實施例之缺陷的種類之流程的流程圖。Fig. 6 is a flow chart showing the flow of determining the type of the defect of the first embodiment.

第7圖係第2實施例之缺陷檢查裝置的方塊圖。Fig. 7 is a block diagram of the defect inspection device of the second embodiment.

第8圖係第3實施例之缺陷檢查裝置的方塊圖。Figure 8 is a block diagram of a defect inspection device of the third embodiment.

第9圖係表示第3實施例之感測器之配置的圖。Fig. 9 is a view showing the configuration of the sensor of the third embodiment.

第10圖係第4實施例之缺陷檢查裝置的方塊圖。Figure 10 is a block diagram of a defect inspection device of the fourth embodiment.

第11圖係表示第4實施例之相機之內部構造的圖。Fig. 11 is a view showing the internal structure of the camera of the fourth embodiment.

[實施發明之形態][Formation of the Invention]

以下,參照圖面,並根據實施例舉例詳細說明本發明之實施形態。其中,在本實施例所記載之構成元件的尺寸、材質、形狀、其相對配置等,只要無特別記載,該等的主要目的不是用來限定本發明之範圍。Hereinafter, embodiments of the present invention will be described in detail by way of examples with reference to the drawings. However, the dimensions, materials, shapes, relative arrangements, and the like of the constituent elements described in the examples are not intended to limit the scope of the invention unless otherwise specified.

(第1實施例)(First embodiment)

第1圖係本實施例之缺陷檢查裝置1的方塊圖。缺陷檢查裝置1係在構成上包括:可見光源31,係將可見光照 射於被檢查物2;IR/UV光源32,係將紫外光或紅外光之至少一方照射於被檢查物2;可見光相機41,係接受被檢查物2所反射的可見光;IR/UV光相機42,係接受被檢查物2所反射的紫外光或紅外光;及處理裝置5,係處理可見光相機41及IR/UV光相機42所受光之光,並檢測出缺陷及判別缺陷的種類。Fig. 1 is a block diagram of the defect inspection apparatus 1 of the present embodiment. The defect inspection device 1 includes a visible light source 31 and a visible light source. The IR/UV light source 32 emits at least one of ultraviolet light or infrared light to the test object 2; the visible light camera 41 receives visible light reflected by the test object 2; and the IR/UV light camera 42. The ultraviolet light or the infrared light reflected by the test object 2 is received; and the processing device 5 processes the light received by the visible light camera 41 and the IR/UV light camera 42, and detects the defect and the type of the defect.

被檢查物2係例如形成片狀,並在第1圖之箭號方向搬運。此外,被檢查物2係不必是片狀。舉例而言,檢查物2亦可為紙、薄膜、樹脂、纖維素等。又,被檢查物2係亦可為二次電池所使用之隔板、液晶所使用之光學片等。此外,在本實施例,固定光源3及相機4,並使被檢查物2移動,但是亦可固定被檢查物2,並使光源3及相機4移動來取代上述做法。The test object 2 is formed, for example, in a sheet shape, and is conveyed in the direction of the arrow in the first drawing. Further, the object 2 to be inspected does not have to be in the form of a sheet. For example, the inspection object 2 may also be paper, film, resin, cellulose, or the like. Further, the test object 2 may be a separator used for a secondary battery, an optical sheet used for a liquid crystal, or the like. Further, in the present embodiment, the light source 3 and the camera 4 are fixed and the object 2 is moved, but the object 2 to be inspected can be fixed, and the light source 3 and the camera 4 can be moved instead of the above.

缺陷檢查裝置1係根據藉由以可見光相機41及IR/UV光相機42接受從可見光源31及IR/UV光源32照射於被檢查物2之光的反射光所得之影像,抽出缺陷。進而,判別缺陷的種類。缺陷檢查裝置1係可檢測出異物、孔、皺紋、斑駁等,作為缺陷。The defect inspection device 1 extracts a defect by receiving an image of the reflected light of the light of the object 2 to be inspected from the visible light source 31 and the IR/UV light source 32 by the visible light camera 41 and the IR/UV light camera 42. Further, the type of the defect is determined. The defect inspection device 1 can detect foreign matter, holes, wrinkles, mottles, and the like as defects.

此外,在不區別可見光源31與IR/UV光源32的情況,僅稱為「光源3」。又,在不區別可見光相機41與IR/UV光相機42的情況,僅稱為「相機4」。光源3可使用LED等之波長區域受到限制者,或使用波長濾波器來限制波長區域者。而且,藉由使用與物質之交互作用更顯著之波長,以提高缺陷之檢測或缺陷之種類的判定精度。此外,在本實施例,可見光源31與IR/UV光源32相當 於本發明的照射部。又,在本實施例,藉可見光源31與IR/UV光源32將光照射於被檢查物2,這相當於本發明的照射步驟。Further, in the case where the visible light source 31 and the IR/UV light source 32 are not distinguished, it is simply referred to as "light source 3". Further, the case where the visible light camera 41 and the IR/UV light camera 42 are not distinguished is referred to simply as "camera 4". The light source 3 can be limited to a wavelength region using an LED or the like, or a wavelength filter can be used to limit the wavelength region. Moreover, by using a wavelength that is more remarkable in interaction with the substance, the accuracy of the detection of the defect or the type of the defect is improved. Further, in the present embodiment, the visible light source 31 is equivalent to the IR/UV light source 32. In the irradiation unit of the present invention. Further, in the present embodiment, light is irradiated onto the test object 2 by the visible light source 31 and the IR/UV light source 32, which corresponds to the irradiation step of the present invention.

相機4係在構成上具備例如串聯配置4096個受光元件的CCD影像感測器。在各個受光元件,因應於受光量將光變換成電荷。因此,在缺陷所反射的光成像之位置的受光元件,相對其他的受光元件,電荷量變小。此外,在本實施例,可見光相機41具備R、G、B之各成分用的3個CCD影像感測器。又,IR/UV光相機42具備檢測出紫外光或紅外光之至少一方的CCD影像感測器。從各受光元件所輸出之電荷係作為攝像資料,輸入至處理裝置5。而且,在本實施形態,可見光相機41、IR/UV光相機42相當於本發明的資料產生部。又,在本實施例,藉可見光相機41、IR/UV光相機42產生攝像資料,這相當於本發明之資料產生步驟。The camera 4 is configured to include, for example, a CCD image sensor in which 4096 light receiving elements are arranged in series. In each of the light receiving elements, light is converted into electric charges in accordance with the amount of received light. Therefore, the light receiving element at the position where the light reflected by the defect is imaged has a smaller amount of charge than the other light receiving elements. Further, in the present embodiment, the visible light camera 41 includes three CCD image sensors for each of the components R, G, and B. Further, the IR/UV optical camera 42 includes a CCD image sensor that detects at least one of ultraviolet light and infrared light. The electric charge output from each light receiving element is input to the processing device 5 as imaging data. Further, in the present embodiment, the visible light camera 41 and the IR/UV optical camera 42 correspond to the data generating unit of the present invention. Further, in the present embodiment, the image data is generated by the visible light camera 41 and the IR/UV light camera 42, which corresponds to the data generating step of the present invention.

此外,在本實施例,為了能以相機4拍攝被檢查物2之整個寬度,可配合被檢查物2的寬度,在被檢查物2之寬度方向具備複數台相機4。又,可見光相機41與IR/UV光相機42係配置成在搬運方向錯開。Further, in the present embodiment, in order to capture the entire width of the inspection object 2 by the camera 4, a plurality of cameras 4 can be provided in the width direction of the inspection object 2 in accordance with the width of the inspection object 2. Further, the visible light camera 41 and the IR/UV optical camera 42 are arranged to be shifted in the conveyance direction.

又,在處理裝置5,具備對R、G、B之各成分分別處理從可見光相機41所輸出之攝像資料的R信號處理部51、G信號處理部52及B信號處理部53、以及處理從IR/UV光相機42所輸出之攝像資料的IR/UV信號處理部54。R信號處理部51係處理R成分的信號(R信號),G信號處理部52係處理G成分的信號(G信號),B信號處理部53 係處理B成分的信號(B信號),IR/UV信號處理部54係處理紫外光或紅外光的信號(IR/UV光信號)。藉該處理,求得各受光元件(像素)的反射比。Further, the processing device 5 includes an R signal processing unit 51, a G signal processing unit 52, a B signal processing unit 53, and processing for processing the imaging data output from the visible light camera 41 for each of the components R, G, and B. The IR/UV signal processing unit 54 of the imaging data output from the IR/UV optical camera 42. The R signal processing unit 51 processes the signal (R signal) of the R component, and the G signal processing unit 52 processes the signal (G signal) of the G component, and the B signal processing unit 53 The signal of the component B (B signal) is processed, and the IR/UV signal processing unit 54 processes a signal (IR/UV light signal) of ultraviolet light or infrared light. By this processing, the reflectance of each light receiving element (pixel) is obtained.

在此,反射比係將各受光元件之電荷(攝像資料)除以預先求得之無缺陷時之各受光元件的電荷(攝像資料)的值。即,預先求得無缺陷之被檢查物2的攝像資料,將缺陷判定時之攝像資料對於該值的比設為反射比。「預先求得之無缺陷時之各受光元件的電荷」係亦可採用進行複數次攝像時之各受光元件的電荷的平均值。該反射比係受光量之減少程度愈大,其值變得越小,與攝像資料變動之程度具有相關關係。而且,在無缺陷的情況,反射比成為接近1之值。對於R信號、G信號、B信號及IR/UV光信號,算出各自的反射比。此外,在本實施例,反射比相當於本發明的除法值。Here, the reflectance is a value obtained by dividing the electric charge (imaging material) of each of the light receiving elements by the electric charge (imaging material) of each of the light receiving elements when the defect is obtained in advance. In other words, the image data of the object 2 to be inspected without defects is obtained in advance, and the ratio of the image data at the time of the defect determination to the value is set as the reflectance. The "charge of each light-receiving element when there is no defect in advance" may be an average value of charges of the respective light-receiving elements when performing plural imaging. The larger the degree of decrease in the amount of received light, the smaller the value becomes, and the correlation with the degree of change in the image data. Moreover, in the case of no defect, the reflectance becomes a value close to 1. The respective reflectances were calculated for the R signal, the G signal, the B signal, and the IR/UV optical signal. Further, in the present embodiment, the reflectance corresponds to the division value of the present invention.

在此,第2圖係表示在各信號處理部51、52、53及54處理後之像素與反射比之關係的圖。橫軸係像素,縱軸係反射比。在缺陷所成像之位置的像素,反射比降低。而且,其降低之程度係因R信號、G信號、B信號及IR/UV光信號而各自相異。此外,即使是在被檢查物2不存在缺陷的情況,亦因被檢查物2的表面之凹凸等的影響,反射板係在各像素稍微相異。Here, Fig. 2 is a view showing the relationship between the pixel and the reflectance after the processing by each of the signal processing units 51, 52, 53, and 54. The horizontal axis is a pixel, and the vertical axis is a reflection ratio. At the pixel where the defect is imaged, the reflectance is reduced. Moreover, the degree of reduction is different for each of the R signal, the G signal, the B signal, and the IR/UV optical signal. Further, even in the case where there is no defect in the test object 2, the reflection plate is slightly different in each pixel due to the influence of the unevenness or the like on the surface of the test object 2.

又,處理裝置5係具備位置對準處理部55,該位置對準處理部55係進行從可見光相機41所得之反射比與從IR/UV光相機42所得之反射比的位置對準。在此,因為可見光相機41與IR/UV光相機42係配置成在被檢查物2 之搬運方向錯開,所以以可見光相機41所拍攝之位置到達以IR/UV光相機42所拍攝之位置前係費時。為了比較從可見光相機41與IR/UV光相機42所得之相同之位置的反射比,位置對準處理部55進行可見光相機41之反射比與IR/UV光相機42之反射比的位置對準。Further, the processing device 5 includes a position alignment processing unit 55 that aligns the reflectance obtained from the visible light camera 41 with the reflectance obtained from the IR/UV optical camera 42. Here, since the visible light camera 41 and the IR/UV light camera 42 are configured to be in the object 2 to be inspected Since the conveyance direction is shifted, it takes time to reach the position photographed by the IR/UV light camera 42 at the position where the visible light camera 41 is photographed. In order to compare the reflectances from the same position obtained by the visible light camera 41 and the IR/UV light camera 42, the alignment processing unit 55 performs the alignment of the reflectance of the visible light camera 41 with the reflectance of the IR/UV light camera 42.

在此,因為被檢查物2之搬運速度與從可見光相機41至IR/UV光相機42的距離係預先設定,所以根據這些值,可算出以可見光相機41所拍攝之位置至被IR/UV光相機42拍攝的時間延遲。即,可藉由將資料僅挪移該時間延遲量來進行位置對準。一樣地,在以R信號、G信號、B信號分別拍攝別的位置的情況、或以紫外光及紅外光分別拍攝別的位置的情況,進行這些之位置對準。Here, since the conveyance speed of the inspection object 2 and the distance from the visible light camera 41 to the IR/UV light camera 42 are set in advance, based on these values, the position captured by the visible light camera 41 can be calculated to be IR/UV light. The time taken by the camera 42 is delayed. That is, the alignment can be performed by shifting the data only by the amount of time delay. Similarly, when the other positions are taken by the R signal, the G signal, and the B signal, or when the other positions are captured by the ultraviolet light and the infrared light, the alignment is performed.

又,處理裝置5包括:缺陷檢測部56,係檢測出缺陷;及檢測臨限值記憶部56A,係記憶缺陷之大小的臨限值。該臨限值係被預先記憶為需要檢測為缺陷之大小的下限值,並預先記憶。該臨限值係根據被檢查物2之種類或使用者之需求等所決定。Further, the processing device 5 includes a defect detecting unit 56 that detects a defect, and a detection threshold memory unit 56A that is a threshold value for the size of the memory defect. The threshold value is previously memorized as a lower limit value that needs to be detected as the size of the defect, and is memorized in advance. The threshold value is determined according to the type of the object 2 to be inspected, the needs of the user, and the like.

此外,在即使有缺陷但缺陷小的情況,亦有被容許的情況。設定超過該容許之範圍時之缺陷的大小,作為臨限值。即,缺陷檢測部56係在缺陷之大小為臨限值以上的情況判定缺陷存在,而在缺陷之大小未滿臨限值的情況判定無缺陷。缺陷之大小係以反射比之降低量、或反射比降低之像素數來表示。例如,可根據第2圖所示之波形,求得缺陷之大小。此外,亦可在某些反射比成為臨限值以下的情況,當作缺陷檢測出。又,亦 可在某些反射比成為臨限值以下之像素為臨限值以上的情況,當作缺陷檢測出。In addition, there are cases where the defect is small even if there is a defect. The size of the defect when the allowable range is exceeded is set as the threshold. In other words, the defect detecting unit 56 determines that the defect exists when the size of the defect is equal to or greater than the threshold value, and determines that there is no defect when the size of the defect is less than the threshold value. The size of the defect is represented by the amount of decrease in reflectance or the number of pixels in which the reflectance is reduced. For example, the size of the defect can be found from the waveform shown in Fig. 2. In addition, it may be detected as a defect when some of the reflectance is below the threshold. Also It can be detected as a defect when some of the pixels whose reflectance is below the threshold are above the threshold.

又,處理裝置5包括:判定部57,係在檢測出缺陷時判別缺陷的種類;及判定臨限值記憶部57A,係記憶用以判別缺陷之種類的臨限值。判定部57係根據在各信號處理部51、52、53及54所處理之像素與反射比的關係,判別缺陷的種類。然後,從輸出部58輸出有無缺陷及缺陷的種類。此外,在本實施例,藉判定部57判別缺陷的種類,這相當於本發明的判定步驟。Further, the processing device 5 includes a determination unit 57 that discriminates the type of the defect when the defect is detected, and a determination threshold storage unit 57A that stores the threshold value for determining the type of the defect. The determination unit 57 determines the type of the defect based on the relationship between the pixel processed by each of the signal processing units 51, 52, 53, and 54 and the reflectance. Then, the type of presence or absence of defects and defects is output from the output unit 58. Further, in the present embodiment, the determination unit 57 determines the type of the defect, which corresponds to the determination step of the present invention.

在此,第3圖係使第2圖所示之各信號重疊的圖。依此方式,各信號之反射比之降低的程度係各自相異。而且,各信號之反射比之降低的程度係在各物質成為特有的值。在此,例如,紫外光之波長係因為接近分子或原子的鍵能,所以易被物質吸收。又,因為紫外光之波長係比較短,所以易散射。另一方面,紅外光之波長係因為接近分子的振動能量,所以易被物質吸收。又,因為紅外光之波長比較長,所以難以散射。藉由利用這些各波長之光與物質的交互作用,可判別缺陷的種類。Here, Fig. 3 is a view in which the signals shown in Fig. 2 are superimposed. In this way, the degree to which the reflectance of each signal decreases is different. Further, the degree to which the reflectance of each signal is lowered is a value unique to each substance. Here, for example, the wavelength of the ultraviolet light is easily absorbed by the substance because it is close to the bond energy of the molecule or the atom. Moreover, since the wavelength of the ultraviolet light is relatively short, it is easy to scatter. On the other hand, the wavelength of infrared light is easily absorbed by the substance because it is close to the vibrational energy of the molecule. Moreover, since the wavelength of the infrared light is relatively long, it is difficult to scatter. By using the interaction of light and matter at these wavelengths, the type of defect can be discriminated.

例如,第4圖係表示缺陷是水時像素與反射比之關係的圖。缺陷所成像之像素的反射比係比其他的像素的反射比低,但是該降低量(亦可當作降低率)係因可見光與紅外光或紫外光(以下亦稱為IR/UV光)而異。因此,在水所成像之像素,在可見光之反射比與紅外光(IR光)之反射比產生差。For example, Figure 4 is a graph showing the relationship between the pixel and the reflectance when the defect is water. The reflectance of the pixel imaged by the defect is lower than that of other pixels, but the amount of reduction (which can also be regarded as the rate of decrease) is due to visible light and infrared light or ultraviolet light (hereinafter also referred to as IR/UV light). different. Therefore, in the pixel imaged by water, the reflectance in visible light is inferior to the reflectance of infrared light (IR light).

該可見光之反射比與IR/UV光之反射比的差係物質所特有的。即,在將可見光與IR/UV光分別照射於物質時,因為各個之光的吸收率因各物質而異,所以各個光被物質反射的比例及各個光透過物質的比例因各物質而異。因此,在缺陷所成像之像素,可見光及IR/UV光的反射比的值係因應於形成缺陷之物質。This visible light reflectance is unique to the difference between the reflectance of IR/UV light. In other words, when the visible light and the IR/UV light are respectively irradiated to the substance, since the absorption rate of each light varies depending on each substance, the ratio of each light to be reflected by the substance and the ratio of each light-transmitting substance vary depending on the respective substances. Therefore, the value of the reflectance of visible light and IR/UV light in the pixel imaged by the defect is due to the substance forming the defect.

因此,若預先藉實驗或計算等對每個可能混入之物質求得可見光之反射比與IR/UV光之反射比的差,則可根據該反射比的差,判別缺陷的種類。Therefore, if the difference between the reflectance of the visible light and the reflectance of the IR/UV light is obtained for each of the substances that may be mixed by an experiment or calculation, the type of the defect can be determined based on the difference in the reflectance.

又,第5圖係表示缺陷是金屬時像素與反射比之關係的圖。在缺陷為金屬的情況,因為可見光之反射比與IR/UV光之反射比幾乎相同,所以兩反射比的差小。因此,在可見光之反射比與IR/UV光之反射比的差(亦可採用差的絕對值)為臨限值以下的情況,可判別缺陷是金屬。該臨限值係可預先藉實驗等求得。又,因為反射比隨著金屬的種類而改變,所以可根據反射比判別金屬的種類。例如,在被檢查物2為將電絕緣片的情況,即使有污物,亦只要可遮斷電導通,就無問題,但是若金屬混入片時,因為電導通,所以有問題。因此,只要可判別缺陷是否是金屬,就可容許污物,而可僅檢測出金屬,作為缺陷。Further, Fig. 5 is a view showing the relationship between the pixel and the reflectance when the defect is metal. In the case where the defect is a metal, since the reflectance of visible light is almost the same as the reflectance of IR/UV light, the difference between the two reflectances is small. Therefore, in the case where the difference between the reflectance of visible light and the reflectance of IR/UV light (which may also be the absolute value of the difference) is equal to or less than the threshold value, it is possible to discriminate that the defect is a metal. The threshold can be obtained by experiments or the like in advance. Further, since the reflectance changes depending on the type of the metal, the type of the metal can be determined based on the reflectance. For example, in the case where the test object 2 is an electrically insulating sheet, even if there is dirt, there is no problem as long as the electrical conduction can be blocked. However, when the metal is mixed into the sheet, it is electrically conductive, which is problematic. Therefore, as long as it is possible to discriminate whether or not the defect is a metal, dirt can be allowed, and only the metal can be detected as a defect.

依此方式,可因應於可見光之反射比與IR/UV光之反射比的差來判別缺陷的種類。在此,藉由使用反射比之差,可使被檢查物2或缺陷之狀態的影響、或光量變動的影響變小。例如,受光元件之受光量會因被 檢查物2之顏色或缺陷之顏色而變化。又,只要光量變動受光元件之受光量亦會改變,所以即使無缺陷,反射比亦變動。依此方式,可見光及IR/UV光之反射比係即使無缺陷,亦會變化。相對地,藉由取可見光之反射比與IR/UV光之反射比的差,可消除光量的變動等所造成之各受光元件之受光量的變化量。即,因為可使被檢查物2之顏色或表面之狀態的影響、及光量變動的影響變小,所以可提高缺陷之檢測精度及缺陷之種類的判定精度。In this way, the type of defect can be determined in response to the difference between the reflectance of visible light and the reflectance of IR/UV light. Here, by using the difference in reflectance, the influence of the state of the object 2 or the defect or the influence of the variation in the amount of light can be made small. For example, the amount of light received by the light-receiving element may be The color of the object 2 or the color of the defect changes. Further, as long as the amount of light varies, the amount of light received by the light-receiving element also changes, so that the reflectance does not change even if there is no defect. In this way, the reflectance of visible light and IR/UV light changes even without defects. In contrast, by taking the difference between the reflectance of visible light and the reflectance of IR/UV light, the amount of change in the amount of light received by each light-receiving element due to fluctuations in the amount of light or the like can be eliminated. In other words, since the influence of the state of the color or surface of the test object 2 and the influence of the fluctuation of the light amount can be reduced, the accuracy of detecting the defect and the accuracy of determining the type of the defect can be improved.

此外,亦可使用可見光之反射比與IR/UV光之反射比的比取代兩者之差,來判別缺陷的種類。Further, the difference between the reflectance of visible light and the reflectance of IR/UV light may be used instead of the difference between the two to determine the type of the defect.

又,亦可可見光係僅使用R成分、G成分、B成分中之任一個或2個來判別缺陷的種類。又,亦可使用紅外光或紫外光之一方或雙方來判別缺陷的種類。又,亦可在選擇R成分、G成分、B成分中之任一個、與紅外光或紫外光之一方時,選擇波長之差變大的組合。例如,與波長短之紫外光組合時係採用在可見光中波長長的R成分,與波長長之紅外光組合時係採用在可見光中波長短的B成分。藉此,因為缺陷之反射比的差更顯著地顯現出來,所以可提高判定精度。Further, in the visible light system, only one of the R component, the G component, and the B component may be used to determine the type of the defect. Further, one or both of infrared light or ultraviolet light may be used to determine the type of the defect. Further, when one of the R component, the G component, and the B component is selected and one of infrared light or ultraviolet light is selected, a combination in which the difference in wavelength is large may be selected. For example, when combined with ultraviolet light having a short wavelength, an R component having a long wavelength in visible light is used, and when combined with a long-wavelength infrared light, a B component having a short wavelength in visible light is used. Thereby, since the difference in the reflectance of the defect is more prominent, the determination accuracy can be improved.

又,相機4之受光元件,亦可使用Si(矽)系的半導體。若使用Si系之半導體受光元件,紫外光、可見光、紅外光皆可檢測出來。又,可多像素化,而可進行廣範圍或高速之測量,亦可壓低成本。Further, a Si (tantalum)-based semiconductor can be used as the light receiving element of the camera 4. When a Si-based semiconductor light-receiving element is used, ultraviolet light, visible light, and infrared light can be detected. Moreover, it can be multi-pixelized, and can perform measurement in a wide range or high speed, and can also be low in cost.

其次,第6圖係表示判別本實施例之缺陷的種類之流程的流程圖。Next, Fig. 6 is a flow chart showing the flow of discriminating the kind of the defect of the embodiment.

在步驟S101,藉相機4拍攝被檢查物2,並將該資料取入處理裝置5。In step S101, the object 2 is photographed by the camera 4, and the data is taken into the processing device 5.

在步驟S102,分別在R信號處理部51、G信號處理部52、B信號處理部53及IR/UV信號處理部54將從相機4所輸出之信號進行處理。而且,各信號處理部算出對於各像素的反射比。In step S102, the signals output from the camera 4 are processed by the R signal processing unit 51, the G signal processing unit 52, the B signal processing unit 53, and the IR/UV signal processing unit 54, respectively. Further, each signal processing unit calculates a reflection ratio for each pixel.

在步驟S103,進行藉各信號處理部所處理之.資料的位置對準。位置對準處理部55係根據被檢查物2之搬運速度、各相機4的距離,進行位置對準。In step S103, the positional alignment of the data processed by each of the signal processing sections is performed. The alignment processing unit 55 performs alignment based on the conveyance speed of the inspection object 2 and the distance between the cameras 4.

在步驟S104,藉缺陷檢測部56進行缺陷之檢測。例如,缺陷檢測部56係在缺陷之大小為藉檢測臨限值記憶部56A所記憶之臨限值以上時,當作缺陷檢測出。又,例如,亦可在某些反射比為藉檢測臨限值記憶部56A所記憶之臨限值以下時,當作缺陷檢測出。In step S104, the defect detection unit 56 performs detection of the defect. For example, when the size of the defect is equal to or greater than the threshold value stored in the detection threshold storage unit 56A, the defect detecting unit 56 detects the defect as a defect. Further, for example, when some of the reflectances are below the threshold value stored by the detection threshold storage unit 56A, it may be detected as a defect.

在步驟S105,判定在步驟S104是否檢測出缺陷。在步驟S105的判定結果為肯定的情況下,移往步驟S106。另一方面,在步驟S105的判定結果為否定的情況下,當作無缺陷,並結束本流程。In step S105, it is determined whether or not a defect is detected in step S104. If the result of the determination in step S105 is affirmative, the process proceeds to step S106. On the other hand, if the result of the determination in step S105 is negative, it is regarded as no defect, and the flow is ended.

在步驟S106,藉判定部57判別缺陷的種類。判定部57係藉由比較可見光之反射比與IR/UV光之反射比的差、和判定臨限值記憶部57A所記憶之臨限值,區別缺陷的種類。例如,在可見光之反射比與IR/UV光之反射比的差為臨限值以下的情況,判定缺陷是金屬。然後,根據所預先記憶之各金屬的反射比,判別金屬的種類,又,例如,因為水比油易吸收紅外光,所以利用可見光 之B成分的反射比與紅外光之反射比的差變得比較大,可判別油與水。又,亦可預先使判定臨限值記憶部57A記憶可見光與IR/UV光之反射比的差、和物質的關係,並根據該關係鎖定物質。In step S106, the borrowing unit 57 determines the type of the defect. The determination unit 57 distinguishes the type of the defect by comparing the difference between the reflectance of the visible light and the reflectance of the IR/UV light and the threshold value stored in the determination threshold storage unit 57A. For example, when the difference between the reflectance of visible light and the reflectance of IR/UV light is equal to or less than the threshold value, it is determined that the defect is a metal. Then, based on the reflectance of each metal that is memorized in advance, the type of the metal is discriminated, and, for example, since water absorbs infrared light more easily than oil, visible light is utilized. The difference between the reflectance of the component B and the reflectance of the infrared light is relatively large, and oil and water can be discriminated. Further, the determination threshold storage unit 57A may store the difference between the reflectance of the visible light and the IR/UV light and the substance in advance, and lock the substance based on the relationship.

在步驟S107,從輸出部58輸出檢測到缺陷及缺陷的種類。在此時,例如,亦可輸出缺陷的影像。又,亦可記憶缺陷所存在之位置及缺陷的種類,或對缺陷所存在之位置附加記號。進而,亦可在缺陷存在時發出警報,或將缺陷的存在或缺陷的種類顯示於顯示器。又,若在步驟S106所判別之缺陷的種類係可被容許者,則輸出無缺陷。In step S107, the type of the defect and the defect detected is output from the output unit 58. At this time, for example, a defective image can also be output. Further, it is also possible to memorize the location of the defect and the type of the defect, or to add a mark to the position where the defect exists. Further, an alarm may be issued when the defect is present, or the presence of the defect or the type of the defect may be displayed on the display. Further, if the type of the defect determined in step S106 is acceptable, the output is free from defects.

如以上之說明所示,若依據本實施例,可檢測出被檢查物2之缺陷,而且可判別缺陷的種類。而且,可利用紅外光或紫外光所造成之與物質的交互作用,檢測出僅靠可見光無法檢測出的缺陷。又,藉由併用不可見光,可判別顏色與投光元件2相似之缺陷並僅靠可見光無法判別之缺陷的種類。進而,藉由使用Si系之半導體受光元件,紫外光、可見光、紅外光都可檢測出。又,可多像素化,而可進行廣範圍或高速之測量,亦可壓低成本。又,以正常之位置為基準算出反射比,藉由以可見光與IR/UV光比較該反射比,可減少光量變動或各缺陷之反射比的差異所造成之誤差。因此,不易受到擾亂或缺陷之狀態的影響。As described above, according to the present embodiment, the defect of the inspection object 2 can be detected, and the type of the defect can be discriminated. Moreover, the interaction with the substance caused by infrared light or ultraviolet light can be utilized to detect defects that cannot be detected by visible light alone. Further, by using the invisible light in combination, it is possible to discriminate the type of defect in which the color is similar to that of the light projecting element 2 and is determined only by visible light. Further, by using a Si-based semiconductor light-receiving element, ultraviolet light, visible light, and infrared light can be detected. Moreover, it can be multi-pixelized, and can perform measurement in a wide range or high speed, and can also be low in cost. Further, by calculating the reflectance based on the normal position, by comparing the reflectance with visible light and IR/UV light, it is possible to reduce the error caused by the variation in the amount of light or the difference in the reflectance of each defect. Therefore, it is not susceptible to the state of disturbance or defects.

(第2實施例)(Second embodiment)

第7圖係本實施例之缺陷檢查裝置1的方塊圖。本實 施例係在相對相機4之被檢查物2的相反側具備光源3這一點上,與第1實施例相異。因為其他的裝置等係與第1實施例相同,所以省略說明。Fig. 7 is a block diagram of the defect inspection apparatus 1 of the present embodiment. Real The embodiment is different from the first embodiment in that the light source 3 is provided on the side opposite to the inspection object 2 of the camera 4. Since other devices and the like are the same as those of the first embodiment, the description thereof is omitted.

在本實施例,根據在被檢查物2中可見光、與紅外光或紫外光的透過比,實施缺陷之檢測及缺陷種類的判定。在此,透過比係將各受光元件之電荷(攝像資料)除以預先求得之無缺陷時各受光元件的電荷(攝像資料)的值。即,預先求得之無缺陷之被檢查物2的攝像資料,並將缺陷判定時之攝像資料對於該值的比作為透過比。「預先求得之無缺陷時各受光元件的電荷」係亦可採用拍攝複數次時各受光元件之電荷的平均值。受光量之減少程度愈大,該透過比係成為愈小的值,與攝像資料變動之程度具有相關關係。而且,在無缺陷的情況,透過比成為接近1之值。對於R信號、G信號、B信號及IR/UV光信號,算出各自的透過比。此外,在本實施例,透過比相當於本發明的除法值。In the present embodiment, the detection of defects and the determination of the type of defects are performed based on the transmittance of visible light, infrared light, or ultraviolet light in the test object 2. Here, the charge ratio (imaging material) of each light-receiving element is divided by the value of the electric charge (imaging material) of each light-receiving element when the defect is obtained in advance. In other words, the image data of the inspection object 2 without defects is obtained in advance, and the ratio of the image data at the time of defect determination to the value is used as the transmission ratio. The "charge of each light-receiving element when there is no defect in advance" may be an average value of the charges of the respective light-receiving elements when the image is taken a plurality of times. The greater the degree of decrease in the amount of received light, the smaller the transmission ratio is, and the correlation with the degree of change in the image data. Moreover, in the case of no defect, the transmission ratio becomes a value close to 1. The respective transmittances were calculated for the R signal, the G signal, the B signal, and the IR/UV optical signal. Further, in the present embodiment, the transmission ratio corresponds to the division value of the present invention.

可見光、紫外光、紅外光的透過比係與在第1實施例所說明之反射比相同,因各物質而異。因此,在缺陷所成像之位置的像素,因可見光與IR/UV光而在透過比產生差。該差係在物質成為特有的值。即,在將可見光與IR/UV光照射於物質時,因為在該物質中各個的光之吸收率因各物質而異,所以各個光透過物質的比例因各物質而異。The transmittance of visible light, ultraviolet light, and infrared light is the same as the reflectance described in the first embodiment, and varies depending on each substance. Therefore, the pixel at the position where the defect is imaged is inferior in the transmittance ratio due to visible light and IR/UV light. This difference is a value unique to the substance. That is, when the visible light and the IR/UV light are irradiated to the substance, since the light absorption rate of each of the substances varies depending on each substance, the ratio of each light-transmitting substance varies depending on each substance.

因此,若預先藉實驗或計算等對可能混入之各物質求得可見光之透過比與IR/UV光之透過比的差,則 可根據該透過比的差,判別缺陷的種類。Therefore, if the difference between the transmittance of visible light and the transmittance of IR/UV light is obtained by experiments or calculations for each substance that may be mixed in advance, The type of the defect can be determined based on the difference in the transmittance.

此外,亦可因應於被檢查物2之種類或可能混入之物質的種類,決定根據透過比或反射比之哪一種來判別缺陷的種類。例如,亦可藉實驗等求得使用哪一種更適合。又,例如,亦可以在被檢查物2薄的情況使用透過比,在被檢查物2厚之情況使用反射比的方式,因應於被檢查物2的厚度來選擇,又,亦可使用透過光及反射光之雙方。Further, depending on the type of the object to be inspected 2 or the type of the substance to be mixed, it is also possible to determine which type of defect is to be determined depending on which of the transmittance ratio or the reflection ratio. For example, it is also possible to find out which one is more suitable by experiment or the like. Further, for example, a transmission ratio may be used when the inspection object 2 is thin, and a reflection ratio may be used when the inspection object 2 is thick, depending on the thickness of the inspection object 2, and translucent light may be used. And both sides of the reflected light.

(第3實施例)(Third embodiment)

第8圖係第3實施例之缺陷檢查裝置1的方塊圖。在本實施例,僅具備一台相機4。該一台相機4兼具第1實施例之可見光相機41與IR/UV光相機42。即,本實施例之相機4係包括測量R、G、B之至少一成分的受光元件及測量紅外光或紫外光之至少一方的受光元件。而且,可見光源31與IR/UV光源32係將光照射於相同之位置。因為其他的裝置等係與第1實施例相同,所以省略說明。Fig. 8 is a block diagram of the defect inspection apparatus 1 of the third embodiment. In the present embodiment, only one camera 4 is provided. The one camera 4 has both the visible light camera 41 and the IR/UV light camera 42 of the first embodiment. That is, the camera 4 of the present embodiment includes a light receiving element that measures at least one of R, G, and B, and a light receiving element that measures at least one of infrared light and ultraviolet light. Further, the visible light source 31 and the IR/UV light source 32 illuminate the same position. Since other devices and the like are the same as those of the first embodiment, the description thereof is omitted.

在此,第9圖係表示感測器之配置的圖。R係檢測出可見光中之R成分的感測器,G係檢測出可見光中之G成分的感測器,B係係檢測出可見光中之B成分的感測器,IR/UV係檢測出紅外光或紫外光的感測器。R、G、B及IR/UV之各感測器係配置成在搬運方向錯開。因此,與第1實施例一樣,需要將各感測器之輸出信號的位置進行對準。藉由使用這種相機4,裝置可小形化。Here, Fig. 9 is a view showing the configuration of the sensor. R is a sensor that detects the R component in visible light, G is a sensor that detects the G component in visible light, B is a sensor that detects the B component in visible light, and IR/UV detects infrared. Light or ultraviolet sensor. Each of the R, G, B, and IR/UV sensors is configured to be staggered in the direction of transport. Therefore, as in the first embodiment, it is necessary to align the positions of the output signals of the respective sensors. By using such a camera 4, the device can be miniaturized.

(第4實施例)(Fourth embodiment)

第10圖係本實施例之缺陷檢查裝置1的方塊圖。又, 第11圖係表示相機4之內部構造的圖。R係檢測出可見光中之R成分的感測器,G係檢測出可見光中之G成分的感測器,B係係檢測出可見光中之B成分的感測器,IR/UV係檢測出紅外光或紫外光的感測器。本實施例係在具備一台相機4這一點上與第3實施例相同,但是在使用分光元件43將可見光及IR/UV光分光後,以各個受光元件測量這一點上與第3實施例相異。Fig. 10 is a block diagram of the defect inspection apparatus 1 of the present embodiment. also, Fig. 11 is a view showing the internal structure of the camera 4. R is a sensor that detects the R component in visible light, G is a sensor that detects the G component in visible light, B is a sensor that detects the B component in visible light, and IR/UV detects infrared. Light or ultraviolet sensor. This embodiment is the same as the third embodiment except that one camera 4 is provided. However, the spectroscopic element 43 is used to separate visible light and IR/UV light, and is measured by each light-receiving element. This is in contrast to the third embodiment. different.

即,在本實施例,因為以分光元件43將在相同之方向前進的光分光後以各感測器受光,所以能以一台相機4拍攝從被檢查物2之相同的位置所反射的可見光及IR/UV光。而且,因為可同時得到相同之位置的資料,所以不需要位置對準。因此,不需要在第1~第3實施例中所需要之位置對準處理部55。因為其他的裝置等係與第3實施例相同,所以省略說明。In other words, in the present embodiment, since the light beams traveling in the same direction are split by the spectroscopic element 43 and then received by the respective sensors, the visible light reflected from the same position of the object 2 can be imaged by one camera 4. And IR/UV light. Moreover, since the same position of the data can be obtained at the same time, no alignment is required. Therefore, the alignment processing unit 55 required in the first to third embodiments is not required. Since other devices and the like are the same as those of the third embodiment, the description thereof is omitted.

藉由使用這種相機4,因為不需要位置對準,所以可簡化處理。又,不會受到位置對準之精度的影響。By using such a camera 4, since the alignment is not required, the processing can be simplified. Moreover, it is not affected by the accuracy of the positional alignment.

1‧‧‧缺陷檢查裝置1‧‧‧ Defect inspection device

2‧‧‧被檢查物2‧‧‧Inspected objects

5‧‧‧處理裝置5‧‧‧Processing device

31‧‧‧可見光源31‧‧‧ Visible light source

32‧‧‧IR/UV光源32‧‧‧IR/UV light source

41‧‧‧可見光相機41‧‧‧ Visible light camera

42‧‧‧IR/UV光相機42‧‧‧IR/UV light camera

51‧‧‧R信號處理部51‧‧‧R Signal Processing Department

52‧‧‧G信號處理部52‧‧‧G Signal Processing Department

53‧‧‧B信號處理部53‧‧‧B Signal Processing Department

54‧‧‧IR/UV信號處理部54‧‧‧IR/UV Signal Processing Department

55‧‧‧位置對準處理部55‧‧‧ Position Alignment Processing Department

56‧‧‧缺陷檢測部56‧‧‧Defect Detection Department

56A‧‧‧檢測臨限值記憶部56A‧‧‧Detection threshold memory

57‧‧‧判定部57‧‧‧Decision Department

57A‧‧‧判定臨限值記憶部57A‧‧‧Determined Threshold Memory

58‧‧‧輸出部58‧‧‧Output Department

Claims (12)

一種缺陷檢查方法,係將被搬運的片狀物品當作被檢查物而檢查被檢查物之缺陷的缺陷檢查方法,包含:照射步驟,係從光源對被檢查物照射可見光與紅外光;資料產生步驟,係分別接受被檢查物所反射之可見光及紅外光,並分別產生因應於各個受光量的攝像資料;缺陷檢測步驟,係可見光的該攝像資料及紅外光的該攝像資料的至少任一者與無缺陷的狀態相比,檢測變動的區域作為缺陷;及判定步驟,係關於該缺陷檢測步驟所檢出之缺陷,在可見光的該攝像資料變動程度與紅外光的該攝像資料變動程度相同時,將該缺陷的種類判定為是有金屬附著或有金屬混入之缺陷。 A defect inspection method is a defect inspection method for inspecting a defect of an inspection object by using the conveyed sheet-like article as an inspection object, comprising: an irradiation step of irradiating the inspection object with visible light and infrared light from a light source; a step of respectively receiving visible light and infrared light reflected by the object to be inspected, and respectively generating image data corresponding to each light receiving amount; and a defect detecting step of at least any of the image data of visible light and the image data of infrared light Compared with the defect-free state, the region in which the change is detected is regarded as a defect; and the determination step is related to the defect detected in the defect detecting step, when the degree of change in the image data of the visible light is the same as the degree of variation of the image data of the infrared light. The type of the defect is determined to be a defect in which metal adheres or metal is mixed. 如申請專利範圍第1項之缺陷檢查方法,其中於該判定步驟中,在可見光的該攝像資料變動的程度與紅外光的該攝像資料變動的程度之差是臨限值以下的情況,判定為可見光的該攝像資料變動的程度與紅外光的該攝像資料變動的程度是相同的。 The defect inspection method according to the first aspect of the invention, wherein in the determining step, the difference between the degree of change in the image data of visible light and the degree of fluctuation of the image data of the infrared light is less than a threshold value, and is determined as The degree of variation of the image data of the visible light is the same as the degree of variation of the image data of the infrared light. 如申請專利範圍第1或2項之缺陷檢查方法,其中於該缺陷檢測步驟中,在該攝像資料變動的程度之大小是既定值以上的情況,判定該攝像資料相較於無缺陷的狀態是變動的。 The defect inspection method of claim 1 or 2, wherein in the defect detection step, when the magnitude of the change in the image data is greater than or equal to a predetermined value, it is determined that the image data is compared to the defect-free state. changing. 如申請專利範圍第1或2項之缺陷檢查方法,其中於該判定步驟中,基於該攝像資料變動的程度之大小,判 別附著或混入之金屬的種類。 For example, in the defect inspection method of claim 1 or 2, in the determining step, based on the degree of change of the image data, The type of metal that is not attached or mixed. 如申請專利範圍第1或2項之缺陷檢查方法,其中在該攝像資料變動的程度方面是使用除法值,該除法值是在該資料產生步驟中所產生的攝像資料除以預先攝像之無缺陷的被檢查物的攝像資料所得之值。 For example, in the defect inspection method of claim 1 or 2, wherein the division value is used in the degree of variation of the image data, the division value is the image data generated in the data generation step divided by the pre-image-free defect The value obtained by the camera data of the object to be inspected. 如申請專利範圍第1或2項之缺陷檢查方法,其中該被檢查物為紙、薄膜、樹脂、纖維素、二次電池所使用之隔板、或光學片。 The defect inspection method according to claim 1 or 2, wherein the object to be inspected is a paper, a film, a resin, a cellulose, a separator used for a secondary battery, or an optical sheet. 如申請專利範圍第1或2項之缺陷檢查方法,其中以Si系之半導體受光元件分別接受可見光及紅外光。 The defect inspection method according to claim 1 or 2, wherein the Si-based semiconductor light-receiving element receives visible light and infrared light, respectively. 如申請專利範圍第1或2項之缺陷檢查方法,其中在一台相機分別具備接受可見光及紅外光的元件。 For example, in the defect inspection method of claim 1 or 2, wherein one camera separately has components for receiving visible light and infrared light. 如申請專利範圍第1或2項之缺陷檢查方法,其中以分光元件將可見光與紅外光分光後,分別接受可見光及紅外光。 The defect inspection method according to claim 1 or 2, wherein the visible light and the infrared light are split by the light splitting element, and the visible light and the infrared light are respectively received. 如申請專利範圍第1或2項之缺陷檢查方法,其中該光源是有限制波長區域的光源。 A defect inspection method according to claim 1 or 2, wherein the light source is a light source having a wavelength-limited region. 如申請專利範圍第1或2項之缺陷檢查方法,其中使從該光源所照射之光通過波長濾波器,而限制波長區域。 The defect inspection method of claim 1 or 2, wherein the light irradiated from the light source is passed through a wavelength filter to limit the wavelength region. 一種缺陷檢查裝置,係將被搬運的片狀物品當作被檢查物而檢查被檢查物之缺陷的缺陷檢查裝置,其包括:照射部,係從光源對被檢查物照射可見光與紅外光; 資料產生部,係分別接受在檢查物反射之可見光及紅外光,並分別產生因應於各個受光量的攝像資料;缺陷檢測部,係可見光的該攝像資料及紅外光的該攝像資料的至少任一者與無缺陷的狀態相比,檢測變動的區域作為缺陷;及判定部,係關於該缺陷檢測部所檢出之缺陷,在可見光的該攝像資料變動程度與紅外光的該攝像資料變動程度相同時,將該缺陷的種類判定為是有附著或混入金屬之缺陷。A defect inspection device is a defect inspection device that inspects a defect of an inspection object by using the conveyed sheet-like article as an inspection object, and includes an irradiation portion that irradiates the inspection object with visible light and infrared light from a light source; The data generating unit receives the visible light and the infrared light reflected by the inspection object, and generates imaging data corresponding to each of the received light amounts; and the defect detecting unit is at least one of the image data of the visible light and the image data of the infrared light. The detection region is detected as a defect as compared with the defect-free state, and the determination unit detects the defect detected by the defect detection unit, and the degree of fluctuation of the image data in visible light is the same as the degree of variation of the image data of the infrared light. At the time, the type of the defect was judged to be a defect in which metal was adhered or mixed.
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