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TWI497533B - Method for fabricating patterned transparent electrodes with low surface roughness - Google Patents

Method for fabricating patterned transparent electrodes with low surface roughness Download PDF

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TWI497533B
TWI497533B TW103143036A TW103143036A TWI497533B TW I497533 B TWI497533 B TW I497533B TW 103143036 A TW103143036 A TW 103143036A TW 103143036 A TW103143036 A TW 103143036A TW I497533 B TWI497533 B TW I497533B
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patterned
conductive ink
transparent electrode
substrate
technique
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TW103143036A
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Chinese (zh)
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TW201621921A (en
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Jeng Rong Ho
Yu Wei Lian
Chien Jung Chen
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Univ Nat Central
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Publication of TW201621921A publication Critical patent/TW201621921A/en

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Description

具有低表面粗糙度之圖案化透明電極製造方法Method for manufacturing patterned transparent electrode with low surface roughness

本發明為一種圖案化透明電極製造方法,特別是一種能降低表面粗糙度之圖案化透明電極製造方法。The invention relates to a method for manufacturing a patterned transparent electrode, in particular to a method for manufacturing a patterned transparent electrode capable of reducing surface roughness.

透明電極使用的範圍相當的廣,例如可被應用於製作各種光電元件,如液晶面板、觸控螢幕及太陽能電池等。配合各種使用的需求,可以透過各種不同的製造方法製作透明電極,舉例來說,可使用網版印刷或噴墨印刷的方式將導電墨水填入基板上圖案化的墨水槽中,然而以這種方式製成的透明電極與基板之間常常會有表面平整度不佳的問題。Transparent electrodes are used in a wide range of applications, such as liquid crystal panels, touch screens, and solar cells. In order to meet the needs of various uses, transparent electrodes can be fabricated by various manufacturing methods. For example, conductive ink can be filled into the patterned ink tank on the substrate by screen printing or inkjet printing. There is often a problem that the surface of the transparent electrode and the substrate are not flat.

舉例來說,若未能精確控導電墨水的注射量,常常會導致導電墨水外溢或是噴濺至基板表面上,此時便需要再使用刮刀移除殘留在基板表面的導電墨水,又或是需要再使用墨水用捲筒紙吸附殘留在基板表面多餘的導電墨水,才能維持基板表面的平整度。For example, if the injection amount of conductive ink is not precisely controlled, it often causes the conductive ink to overflow or splash on the surface of the substrate. At this time, it is necessary to use a doctor blade to remove the conductive ink remaining on the surface of the substrate, or It is necessary to use ink to absorb excess conductive ink remaining on the surface of the substrate to maintain the flatness of the substrate surface.

綜合以上所述,根據現有的透明電極製造方法,即 便在基板表面上形成圖案化墨水結構後,仍需要利用各種後處理方式例如刮除或是表面吸附等處理,才能夠有效降低基板表面的表面粗糙度。然而,這些方式皆無法在一次製程中達成所需的表面平整度,對於製造透明電極的過程來說需要耗費相當多的製程時間及成本。In summary, according to the conventional transparent electrode manufacturing method, After the patterned ink structure is formed on the surface of the substrate, it is still necessary to use various post-treatment methods such as scraping or surface adsorption to effectively reduce the surface roughness of the substrate surface. However, none of these methods can achieve the desired surface flatness in a single process, and it takes a considerable amount of process time and cost for the process of manufacturing a transparent electrode.

本發明為一種具有低表面粗糙度之圖案化透明電極製造方法,藉由控制導電墨水的墨水量並配合精準對位的方式,可以使導電墨水完全填充於基板的凹槽中,並且不需額外清除非凹槽部分的墨水,因此能減少製程時間並降低透明電極與基板之間的表面粗糙度,另外使用簡易的表面修飾處理,可在單一製程中改善表面粗糙度至數十奈米下,能達到降低成本且簡化製程之目的。The invention relates to a method for manufacturing a patterned transparent electrode with low surface roughness. By controlling the amount of ink of the conductive ink and matching the precise alignment, the conductive ink can be completely filled in the groove of the substrate without additional The ink in the non-groove portion is removed, thereby reducing the processing time and reducing the surface roughness between the transparent electrode and the substrate, and using a simple surface modification process to improve the surface roughness to several tens of nanometers in a single process. Can achieve the purpose of reducing costs and simplifying the process.

本發明提供一種具有低表面粗糙度之圖案化透明電極製造方法,其包括下列步驟:提供一圖案化基板,圖案化基板上以複數個凹槽構成一圖案;提供一圖案化模板,圖案化模板具有與圖案形狀對應之至少一圖案開口;填入一導電墨水於該些凹槽中,其係將圖案化模板放置於圖案化基板之圖案面上並進行對位,導入導電墨水使導電墨水透過至少一圖案開口填入該些凹槽中;以及進行表面平整度修飾處理,其係利用熱壓技術或塗佈技術施作於圖案面,以降低導電墨水形成之一透明電極之表面粗糙度。The present invention provides a method for fabricating a patterned transparent electrode having a low surface roughness, comprising the steps of: providing a patterned substrate, forming a pattern on the patterned substrate by a plurality of grooves; providing a patterned template, patterning the template Having at least one pattern opening corresponding to the shape of the pattern; filling a conductive ink in the grooves, placing the patterned template on the pattern surface of the patterned substrate and performing alignment, introducing conductive ink to pass the conductive ink At least one pattern opening is filled in the grooves; and a surface flatness modification treatment is performed, which is applied to the pattern surface by a hot pressing technique or a coating technique to reduce the surface roughness of one of the transparent electrodes formed by the conductive ink.

藉由本發明的實施,至少可達到下列進步功效: 一、可使導電墨水完全充填於圖案化基板的凹槽中,再配合熱壓技術或塗佈技術進行簡易的表面修飾處理,可以進一步降低透明電極與基板之間的表面粗糙度;及二、不需清除非凹槽部分多餘的導電墨水,可縮短製程時間。With the implementation of the present invention, at least the following advancements can be achieved: 1. The conductive ink can be completely filled in the groove of the patterned substrate, and then subjected to a simple surface modification treatment by hot pressing technology or coating technology, which can further reduce the surface roughness between the transparent electrode and the substrate; The process time can be shortened by eliminating unnecessary conductive ink in the non-groove portion.

為了使任何熟習相關技藝者了解本發明之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易地理解本發明相關之目的及優點,因此將在實施方式中詳細敘述本發明之詳細特徵以及優點。In order to make those skilled in the art understand the technical content of the present invention and implement it, and according to the disclosure, the patent scope and the drawings, the related objects and advantages of the present invention can be easily understood by those skilled in the art. The detailed features and advantages of the present invention will be described in detail in the embodiments.

10‧‧‧圖案化基板10‧‧‧ patterned substrate

11‧‧‧凹槽11‧‧‧ Groove

20‧‧‧網版20‧‧‧Web Edition

21‧‧‧網格21‧‧‧Grid

22‧‧‧光罩22‧‧‧Photomask

23‧‧‧圖案開口23‧‧‧ pattern opening

30‧‧‧真空吸盤30‧‧‧vacuum suction cup

31‧‧‧對位裝置31‧‧‧ Alignment device

40‧‧‧導電墨水40‧‧‧Conductive ink

50‧‧‧刮刀50‧‧‧ scraper

61‧‧‧上平板61‧‧‧Upper plate

62‧‧‧下平板62‧‧‧ Lower plate

71‧‧‧上滾輪71‧‧‧Upper wheel

72‧‧‧下滾輪72‧‧‧Lower scroll

第1圖為本發明實施例之一種具有低表面粗糙度之圖案化透明電極製造方法流程圖;第2A圖為本發明實施例之一種圖案化基板之俯視圖;第2B圖為本發明實施例之一種圖案化基板之部份剖視圖;第3圖為本發明實施例之一種網版之示意圖;第4圖為本發明實施例之一種光罩之示意圖;第5圖為本發明實施例之一種使用光罩作為圖案化模板之示意圖;第6圖為本發明實施例之一種使用網版作為圖案化模板之示意圖;第7圖為本發明實施例之一種填充有導電墨水之圖案化基板示意圖;第8A圖為本發明實施例之一種使用平板熱壓技術進行表面平整度修飾處理之示意圖;及第8B圖為本發明實施例之一種滾輪熱壓技術進行表面平整度修飾 處理之示意圖。1 is a flow chart of a method for manufacturing a patterned transparent electrode having a low surface roughness according to an embodiment of the present invention; FIG. 2A is a plan view of a patterned substrate according to an embodiment of the present invention; FIG. 2B is a view of an embodiment of the present invention; A partial cross-sectional view of a patterned substrate; FIG. 3 is a schematic view of a screen of the embodiment of the present invention; FIG. 4 is a schematic view of a photomask according to an embodiment of the present invention; FIG. 6 is a schematic view showing a patterning template using a screen as an embodiment of the present invention; and FIG. 7 is a schematic diagram of a patterned substrate filled with conductive ink according to an embodiment of the present invention; 8A is a schematic view showing a surface flatness modification process using a flat plate hot pressing technique according to an embodiment of the present invention; and FIG. 8B is a roller flat heat modification technology for performing surface flatness modification according to an embodiment of the present invention; Schematic diagram of the process.

如第1圖所示,本實施例提供一種具有低表面粗糙度之圖案化透明電極製造方法,其包括下列步驟:提供圖案化基板(步驟S10);提供圖案化模板(步驟S20);填入導電墨水於凹槽中(步驟S30);以及進行表面平整度修飾處理(步驟S40)。As shown in FIG. 1, the embodiment provides a method for fabricating a patterned transparent electrode having a low surface roughness, comprising the steps of: providing a patterned substrate (step S10); providing a patterned template (step S20); filling in The conductive ink is in the groove (step S30); and the surface flatness modification process is performed (step S40).

提供圖案化基板(步驟S10):如第2A圖及第2B圖所示,其為一圖案化基板10,可預先利用曝光、顯影、蝕刻技術在基板上形成複數個凹槽11並構成一圖案,又或者可利用雷射或壓印等技術達到在基板上形成凹槽11的目的。圖案化基板10的材質可配合使用需求選用可撓性基板、玻璃或矽晶圓,其中可撓性基板例如是PET,但不僅限於此。Providing a patterned substrate (step S10): as shown in FIGS. 2A and 2B, which is a patterned substrate 10, a plurality of grooves 11 are formed on the substrate by exposure, development, and etching techniques in advance to form a pattern. Alternatively, the lens 11 may be formed on the substrate by techniques such as laser or imprint. The material of the patterned substrate 10 can be selected from a flexible substrate, a glass or a germanium wafer, and the flexible substrate is, for example, PET, but is not limited thereto.

提供圖案化模板(步驟S20):圖案化模板具有與圖案化基板10上圖案的形狀相對應的至少一圖案開口。如第3圖所示,圖案化模板可以是一網版20,其為一般用於網版印刷技術中之網版20。在網版20的圖案開口是由複數個網格21所構成。舉例來說,若是圖案化基板10上的凹槽11是構成如蜂巢狀的複數個六角形圖案,網版20上也會同樣以複數個網格21構成如蜂巢狀的複數個六角形圖案。A patterned template is provided (step S20): the patterned template has at least one pattern opening corresponding to the shape of the pattern on the patterned substrate 10. As shown in FIG. 3, the patterned template can be a screen 20, which is typically used in screen printing 20 in screen printing technology. The pattern opening in the screen 20 is composed of a plurality of grids 21. For example, if the groove 11 on the patterned substrate 10 is a plurality of hexagonal patterns formed in a honeycomb shape, the plurality of meshes 21 may also form a plurality of hexagonal patterns such as honeycombs.

又如第4圖所示,圖案化模板也可以是一光罩22,光罩22具有對應於圖案化基板10的圖案的圖案開口23。配合不同的技術製程,可選用網版20或光罩22作為圖案化模板。熟知該項技術領域者,應可輕易知悉能夠選用適當之材質或元件作為圖案化 模板。As also shown in FIG. 4, the patterned template may also be a mask 22 having a pattern opening 23 corresponding to the pattern of the patterned substrate 10. In combination with different technical processes, a screen 20 or a reticle 22 can be used as a patterning template. Those skilled in the art should be able to easily understand that they can use appropriate materials or components for patterning. template.

填入導電墨水於凹槽中(步驟S30):導電墨水可利用刮刀塗佈技術、網版印刷技術或噴墨印刷技術使導電墨水完全填入凹槽11中。The conductive ink is filled in the recess (step S30): the conductive ink can be completely filled into the recess 11 by a doctor blade coating technique, a screen printing technique or an inkjet printing technique.

如第4圖、第5圖及第6圖所示,可將具有圖案開口23的圖案化模板放置在圖案化基板10的圖案面上並進行對位,再導入導電墨水40使導電墨水40透過圖案開口23填入凹槽11中。圖案化模板與圖案化基板10之間的對位方式可以使用真空吸盤30來達成,例如將圖案化基板10放置於圖案化模板下方的真空吸盤30上,以利用真空吸附裝置真空吸附並固定圖案化基板10的位置,並且在真空吸盤30上圖案化基板10的周圍設置有一對位裝置31,以使得圖案化模板可以放置於圖案化基板10之圖案面上,並且與圖案化基板10進行對位。As shown in FIG. 4, FIG. 5, and FIG. 6, the patterned template having the pattern opening 23 can be placed on the pattern surface of the patterned substrate 10 and aligned, and the conductive ink 40 can be introduced to transmit the conductive ink 40. The pattern opening 23 is filled in the groove 11. The alignment between the patterned template and the patterned substrate 10 can be achieved using a vacuum chuck 30, such as placing the patterned substrate 10 on the vacuum chuck 30 below the patterned template to vacuum adsorb and fix the pattern using a vacuum adsorption device. The position of the substrate 10 is adjusted, and a pair of bit devices 31 are disposed around the patterned substrate 10 on the vacuum chuck 30 so that the patterned template can be placed on the pattern surface of the patterned substrate 10 and paired with the patterned substrate 10. Bit.

舉例來說,對位裝置31可以是在圖案化基板10的周圍設置凸起的定位桿,並在圖案化模板上於不影響圖案的位置設置定位孔(圖未示)。在進行定位時,僅需將定位桿插入定位孔,即能使圖案化模板的圖案開口23與圖案化基板10上的圖案進行對位。For example, the alignment device 31 may be a positioning rod provided with a protrusion around the patterned substrate 10, and a positioning hole (not shown) is disposed on the patterned template at a position that does not affect the pattern. When positioning is performed, only the positioning rod needs to be inserted into the positioning hole, that is, the pattern opening 23 of the patterned template can be aligned with the pattern on the patterned substrate 10.

於對位完成後,便能於圖案化模板的上方導入導電墨水40,使導電墨水40透過圖案開口23完全填入圖案化基板10的凹槽11中。舉例來說,當圖案化模板為光罩22時,可利用刮刀塗佈技術或噴墨印刷技術使導電墨水40穿過光罩22的圖案開口23而填入凹槽11中。由於可精確地計算凹槽11的容積,因此能控制導電墨水40的墨水量,並透過準確地對位技術,便可以達到避免導 電墨水40外溢至凹槽11外之功效。After the alignment is completed, the conductive ink 40 can be introduced over the patterned template, and the conductive ink 40 is completely filled into the recess 11 of the patterned substrate 10 through the pattern opening 23. For example, when the patterned template is the reticle 22, the conductive ink 40 can be filled into the recess 11 through the pattern opening 23 of the reticle 22 by a doctor blade coating technique or an inkjet printing technique. Since the volume of the groove 11 can be accurately calculated, the amount of ink of the conductive ink 40 can be controlled, and the accurate alignment technique can be used to avoid the guide. The effect of the electric ink 40 overflowing outside the groove 11.

如第6圖及第7圖所示,當圖案化模板為網版20時,網版20的圖案開口便是由多個網格21所構成(如第3圖所示),由於可利用對位裝置使得網版20上的圖案開口與圖案化基板10上的圖案相吻合,再利用表面張力的影響並控制刮刀50的下壓力及製程參數以及配合控制導電墨水40的墨水量,便能控制導電墨水40透過細緻的網格填入凹槽11。除了能填滿凹槽11外,還可避免導電墨水40外溢或濺出凹槽11之外,因此不需要耗費清除非凹槽11部份的墨水殘餘物的時間,可以達到減少製程時間的功效。As shown in FIGS. 6 and 7, when the patterned template is the screen 20, the pattern opening of the screen 20 is composed of a plurality of grids 21 (as shown in FIG. 3), since the pair can be utilized. The bit device makes the pattern opening on the screen 20 coincide with the pattern on the patterned substrate 10, and then controls the downforce of the blade 50 and the process parameters by controlling the influence of the surface tension and controlling the amount of ink of the conductive ink 40. The conductive ink 40 fills the recess 11 through a fine mesh. In addition to filling the recesses 11, the conductive ink 40 can be prevented from overflowing or spilling out of the recesses 11, so that it is not necessary to remove the ink residue of the non-groove 11 portions, thereby reducing the processing time. .

進行表面平整度修飾處理(步驟S40):表面平整度修飾處理可以利用熱壓技術或塗佈技術施作於圖案化基板10的圖案面,以降低導電墨水40所形成的透明電極的表面粗糙度。如第1圖、第8A圖及第8B圖所示,於進行步驟S30後,可以利用熱壓技術熱壓合填充有導電墨水40之圖案化基板10。於進行熱壓製程時,熱可以使得導電墨水40乾燥並於凹槽11處形成透明電極,同時下壓於圖案化基板10的壓力可以達到降低表面粗糙度之功效。The surface flatness modification treatment (step S40): the surface flatness modification treatment may be applied to the pattern surface of the patterned substrate 10 by a hot pressing technique or a coating technique to reduce the surface roughness of the transparent electrode formed by the conductive ink 40. . As shown in FIG. 1, FIG. 8A, and FIG. 8B, after performing step S30, the patterned substrate 10 filled with the conductive ink 40 can be thermocompression-bonded by a hot pressing technique. During the hot pressing process, the heat can cause the conductive ink 40 to dry and form a transparent electrode at the groove 11, while the pressure applied to the patterned substrate 10 can achieve the effect of reducing the surface roughness.

熱壓技術可例如是平板熱壓技術或滾輪熱壓技術。如第8A圖所示,平板熱壓技術是將充填有導電墨水40的圖案化基板10放置於熱壓機的一上平板61及一下平板62之間,再以上平板61及下平板62熱壓於圖案化基板10以形成透明電極。The hot pressing technique can be, for example, a flat plate hot pressing technique or a roller hot pressing technique. As shown in FIG. 8A, the flat plate hot pressing technique is to place the patterned substrate 10 filled with the conductive ink 40 between an upper plate 61 and a lower plate 62 of the hot press, and then pressurize the upper plate 61 and the lower plate 62. The substrate 10 is patterned to form a transparent electrode.

類似地,如第8B圖所示,滾輪熱壓技術則是將充填有導電墨水40的圖案化基板10放置於熱壓滾輪機的一上滾輪71及一下滾輪72之間,當圖案化基板10被輸送穿過上滾輪71及下滾輪72之間時,便以上滾輪71及下滾輪72熱壓於圖案化基板10以形成 透明電極。Similarly, as shown in FIG. 8B, the roller hot pressing technique places the patterned substrate 10 filled with the conductive ink 40 between an upper roller 71 and a lower roller 72 of the hot rolling roller machine, when the patterned substrate 10 is patterned. When being conveyed between the upper roller 71 and the lower roller 72, the upper roller 71 and the lower roller 72 are heat-pressed on the patterned substrate 10 to form Transparent electrode.

當使用塗佈技術進行表面平整度修飾處理時,可以使用具有導電性及透光性(如透光率為90%以上)的高分子材料塗佈於圖案化基板10的整個圖案面,以利用高分子材料填滿於導電墨水及/或圖案化基板10上凹凸不平的結構,進此降低以導電墨水製成之透明電極的表面粗糙度。塗佈技術可以選用旋轉塗佈技術、線棒塗佈技術或狹縫塗佈(slot die coating)技術。When the surface flatness modification treatment is performed using a coating technique, a polymer material having conductivity and light transmittance (for example, a light transmittance of 90% or more) may be applied to the entire pattern surface of the patterned substrate 10 to be utilized. The polymer material fills the uneven structure of the conductive ink and/or the patterned substrate 10, thereby reducing the surface roughness of the transparent electrode made of conductive ink. The coating technique can be selected from a spin coating technique, a wire bar coating technique or a slot die coating technique.

更佳的是,圖案化基板10上的凹槽11寬度可進行設計並優化,使得導電墨水40完全填充於凹槽11中,能提高圖案化基板10的表面平整度。當進行表面平整度修飾處理後,可以使得凹槽11中的導電墨水40與圖案化基板10之間具有相同的表面高度,並使表面粗糙度降低至數十奈米以下,能有效降低表面粗糙度。More preferably, the width of the recess 11 on the patterned substrate 10 can be designed and optimized such that the conductive ink 40 is completely filled in the recess 11 to improve the surface flatness of the patterned substrate 10. When the surface flatness modification treatment is performed, the conductive surface 40 in the groove 11 and the patterned substrate 10 can have the same surface height, and the surface roughness can be reduced to several tens of nanometers or less, which can effectively reduce the surface roughness. degree.

前述之導電墨水40可選用金屬奈米粒子膠(Metal Nanoparticle paste)或金屬奈米粒子墨水(Metal Nanoparticle ink)。另外可選用適當的基板材質及導電墨水40,以製成透明電極3D結構,又或是具可撓曲性的透明電極。又因為可利用熱壓技術或塗佈技術降低圖案化基板10表面的表面粗糙度,所以能在單一製程有效提高基板的表面平整度,以達到簡化製程、縮短製程時間之功效。The conductive ink 40 may be selected from a metal nanoparticle paste or a metal nanoparticle ink. Alternatively, a suitable substrate material and conductive ink 40 may be used to form a transparent electrode 3D structure or a flexible transparent electrode. Moreover, since the surface roughness of the surface of the patterned substrate 10 can be reduced by using a hot pressing technique or a coating technique, the surface flatness of the substrate can be effectively improved in a single process, thereby achieving the effects of simplifying the process and shortening the process time.

惟上述各實施例係用以說明本發明之特點,其目的在使熟習該技術者能瞭解本發明之內容並據以實施,而非限定本發明之專利範圍,故凡其他未脫離本發明所揭示之精神而完成之等效修飾或修改,仍應包含在以下所述之申請專利範圍中。The embodiments are described to illustrate the features of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the present invention and to implement the present invention without limiting the scope of the present invention. Equivalent modifications or modifications made by the spirit of the disclosure should still be included in the scope of the claims described below.

S10‧‧‧提供圖案化基板步驟S10‧‧‧ Provide patterned substrate steps

S20‧‧‧提供圖案化模板步驟S20‧‧‧ provides patterned template steps

S30‧‧‧填入導電墨水於凹槽中步驟S30‧‧‧Filling conductive ink into the groove

S40‧‧‧進行表面平整度修飾處理步驟S40‧‧‧ Surface smoothness modification processing steps

Claims (11)

一種具有低表面粗糙度之圖案化透明電極製造方法,其包括下列步驟:提供一圖案化基板,該圖案化基板上以複數個凹槽構成一圖案;提供一圖案化模板,該圖案化模板具有與該圖案形狀對應之至少一圖案開口;填入一導電墨水於該些凹槽中,其係將該圖案化模板放置於該圖案化基板之圖案面上並進行對位,導入該導電墨水使該導電墨水透過該至少一圖案開口填入該些凹槽中;以及進行表面平整度修飾處理,其係利用熱壓技術或塗佈技術施作於該圖案面,以降低該導電墨水形成之一透明電極之表面粗糙度。A method for fabricating a patterned transparent electrode having a low surface roughness, comprising the steps of: providing a patterned substrate having a pattern formed by a plurality of grooves; providing a patterned template having a patterned template At least one pattern opening corresponding to the pattern shape; filling a conductive ink in the grooves, placing the patterned template on the pattern surface of the patterned substrate and aligning the conductive ink The conductive ink is filled into the recesses through the at least one pattern opening; and the surface flatness modification treatment is performed on the pattern surface by a hot pressing technique or a coating technique to reduce the formation of the conductive ink. The surface roughness of the transparent electrode. 如申請專利範圍第1項所述之圖案化透明電極製造方法,其中填入該導電墨水於該些凹槽中之步驟係使用刮刀塗佈技術、網版印刷技術或噴墨印刷技術使該導電墨水完全填入該些凹槽中。The method for manufacturing a patterned transparent electrode according to claim 1, wherein the step of filling the conductive ink into the grooves is performed by using a knife coating technique, a screen printing technique or an inkjet printing technique. The ink is completely filled in the grooves. 如申請專利範圍第1項所述之圖案化透明電極製造方法,其中該圖案化模板為一光罩,填入該導電墨水於該些凹槽時,係以刮刀塗佈技術或噴墨印刷技術使該導電墨水穿過該光罩之該至少一圖案開口填入該些凹槽中。The method for manufacturing a patterned transparent electrode according to claim 1, wherein the patterned template is a mask, and the conductive ink is filled in the grooves by a blade coating technique or an inkjet printing technique. The conductive ink is filled into the grooves through the at least one pattern opening of the reticle. 如申請專利範圍第1項所述之圖案化透明電極製造方法,其中該圖案化模板為一網版,該網版之該圖案開口係由複數個網格所構成,填入該導電墨水於該些凹槽時,該導電墨水係透過該 些網格填入該些凹槽中。The method for manufacturing a patterned transparent electrode according to claim 1, wherein the patterned template is a screen, and the pattern opening of the screen is composed of a plurality of grids, and the conductive ink is filled in the screen. When the grooves are formed, the conductive ink passes through the These grids fill in the grooves. 如申請專利範圍第1項所述之圖案化透明電極製造方法,其中該圖案化基板之材質為可撓性基板、玻璃或矽晶圓。The method for manufacturing a patterned transparent electrode according to claim 1, wherein the patterned substrate is made of a flexible substrate, a glass or a germanium wafer. 如申請專利範圍第1項所述之圖案化透明電極製造方法,其中該導電墨水為金屬奈米粒子膠(Metal Nanoparticle paste)或金屬奈米粒子墨水(Metal Nanoparticle ink)。The method for producing a patterned transparent electrode according to claim 1, wherein the conductive ink is a metal nanoparticle paste or a metal nanoparticle ink. 如申請專利範圍第1項至第6項中之任一項所述之圖案化透明電極製造方法,其中該圖案化模板與該圖案化基板進行對位時,該圖案化基板被真空吸附於一真空吸盤上,並且該圖案化基板之周圍設置有一對位裝置,以與該圖案化模板對位。The method for manufacturing a patterned transparent electrode according to any one of the preceding claims, wherein the patterned substrate is vacuum-adsorbed to the patterned substrate when the patterned template is aligned with the patterned substrate. A vacuum chuck is disposed, and a pair of positioning means is disposed around the patterned substrate to align with the patterned template. 如申請專利範圍第7項所述之圖案化透明電極製造方法,其中該熱壓技術為平板熱壓技術或滾輪熱壓技術,其係熱壓合於填充有該導電墨水之該圖案化基板。The method for manufacturing a patterned transparent electrode according to claim 7, wherein the hot pressing technique is a flat plate hot pressing technique or a roller hot pressing technique, which is thermocompression bonded to the patterned substrate filled with the conductive ink. 如申請專利範圍第8項所述之圖案化透明電極製造方法,其中該平板熱壓技術係將填充有該導電墨水之該圖案化基板放置於一熱壓機之一上平板及一下平板之間。The method for manufacturing a patterned transparent electrode according to claim 8, wherein the flat hot pressing technique places the patterned substrate filled with the conductive ink on a flat plate and a flat plate on one of the hot presses. . 如申請專利範圍第8項所述之圖案化透明電極製造方法,其中該滾輪熱壓技術係將填充有該導電墨水之該圖案化基板放置於一熱壓滾輪機之一上滾輪及一下滾輪之間。The method for manufacturing a patterned transparent electrode according to claim 8, wherein the roller hot pressing technology places the patterned substrate filled with the conductive ink on one of a hot rolling roller and a roller. between. 如申請專利範圍第7項所述之圖案化透明電極製造方法,其中該塗佈技術為旋轉塗佈技術、線棒塗佈技術或狹縫塗佈(slot die coating)技術,其係使用具有導電性及透光性之高分子材料塗佈於該圖案面上。The method for manufacturing a patterned transparent electrode according to claim 7, wherein the coating technique is a spin coating technique, a wire bar coating technique or a slot die coating technique, and the conductive coating is used. A polymer material that is transparent and translucent is applied to the pattern surface.
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