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TWI493544B - Method and device for accessing a two-way memory - Google Patents

Method and device for accessing a two-way memory Download PDF

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TWI493544B
TWI493544B TW098105200A TW98105200A TWI493544B TW I493544 B TWI493544 B TW I493544B TW 098105200 A TW098105200 A TW 098105200A TW 98105200 A TW98105200 A TW 98105200A TW I493544 B TWI493544 B TW I493544B
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memory
voltage
ots
bidirectional
current
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TW200951951A (en
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Ward Parkinson
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Ovonyx Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C8/00Arrangements for selecting an address in a digital store
    • G11C8/16Multiple access memory array, e.g. addressing one storage element via at least two independent addressing line groups
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0004Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0011RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0014RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009RRAM elements whose operation depends upon chemical change
    • G11C13/0014RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
    • G11C13/0016RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material comprising polymers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/003Cell access
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C8/00Arrangements for selecting an address in a digital store
    • G11C8/20Address safety or protection circuits, i.e. arrangements for preventing unauthorized or accidental access
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0021Auxiliary circuits
    • G11C13/0069Writing or programming circuits or methods
    • G11C2013/0073Write using bi-directional cell biasing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2213/00Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70Resistive array aspects
    • G11C2213/76Array using an access device for each cell which being not a transistor and not a diode

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Security & Cryptography (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Memories (AREA)
  • Mram Or Spin Memory Techniques (AREA)

Description

用於存取一雙向記憶體之方法及裝置Method and device for accessing a two-way memory

本發明關於存取雙向記憶體裝置。The present invention relates to accessing a two-way memory device.

隨著電子記憶體方式限制而不再能產生摩爾定律著名提出之密度/成本/性能改進,刻正研究記憶體主機技術作為習知矽互補金屬氧化物半導體(CMOS)積體電路記憶體之可能替代。With the limitation of electronic memory, it is no longer able to produce the well-known density/cost/performance improvement of Moore's Law. It is possible to study the memory host technology as a well-known complementary metal oxide semiconductor (CMOS) integrated circuit memory. Alternative.

刻正研究之記憶體技術中為大量的雙向記憶體技術:利用用於程控或讀取記憶體裝置之材料的方向特徵之記憶體。即,習知記憶體裝置典型地結合例如具電荷與否或具高或低電壓之兩記憶體狀態之一。在例如此等之習知記憶體中,記憶體狀態係與單方向特徵、電荷存在與否(例如DRAM、FLASH)或節點係保持高或低電壓(例如SRAM)相結合。對該等機構而言,"方向"是無意義的。相反地,雙向記憶體利用其記憶體材料的一些方向觀點以儲存二進制資訊。例如,一記憶體狀態可經由使電流以一方向流經雙向記憶體裝置或施予一極性之電壓而予寫入,及另一記憶體狀態可經由使電流以相反方向流經相同裝置或施予相反極性之電壓而予寫入。接著可經由例如施用電壓予記憶體裝置而測量相關於記憶體狀態之電流,或使電流流經並測量相關於記憶體狀態之電壓而感測程控記憶體狀態。Among the memory technologies being studied is a large number of two-way memory technologies: memory that utilizes directional characteristics of materials used to program or read memory devices. That is, conventional memory devices typically incorporate one of two memory states, for example, with or without charge or with high or low voltage. In conventional memory such as these, the memory state is combined with a unidirectional feature, the presence or absence of charge (e.g., DRAM, FLASH), or a node system that maintains a high or low voltage (e.g., SRAM). For these institutions, "direction" is meaningless. Conversely, two-way memory utilizes some directional views of its memory material to store binary information. For example, a memory state can be written by flowing a current through the bidirectional memory device in one direction or by applying a voltage of one polarity, and another memory state can be caused by flowing the current through the same device or in the opposite direction. Write to the opposite polarity voltage. The programmed memory state can then be sensed by, for example, applying a voltage to the memory device to measure the current associated with the state of the memory, or by flowing a current through and measuring the voltage associated with the state of the memory.

雙向記憶體類型包括電阻性隨機存取記憶體和磁電阻性隨機存取記憶體(二者稱為RRAM)、可程控金屬化單元、磷族元素化物相位改變記憶體、聚合物記憶體、鐵電隨機存取記憶體(FeRAM)、離子記憶體裝置及金屬奈米粒子記憶體單元。Two-way memory types include resistive random access memory and magnetoresistive random access memory (both called RRAM), programmable metallization units, phosphorous element phase change memory, polymer memory, iron Electrical random access memory (FeRAM), ion memory device, and metal nanoparticle memory unit.

RRAM單元(cell)可經由施用相反極性之電脈衝予單元而分別程控為高電阻值或低電阻值。使用單元的高和低電阻值以代表二種不同的記憶體狀態。RRAM記憶體為已知及被描述的,例如,在W. W. Zhuang等人於2002年國際電子裝置會議(IEDM)中所提出之標題為"Novell Colossal Magnetoresistive Thin Film Nonvolatile Resistance Random Access Memory(RRAM)"之文獻中,其內容係併入本文作為參考。The RRAM cell can be separately programmed to a high resistance value or a low resistance value by applying an electrical pulse of opposite polarity to the cell. The high and low resistance values of the cells are used to represent two different memory states. RRAM memory is known and described, for example, in the "Novell Colossal Magnetoresistive Thin Film Nonvolatile Resistance Random Access Memory (RRAM)" proposed by WW Zhuang et al. at the 2002 International Electron Devices Conference (IEDM). In the literature, the contents are incorporated herein by reference.

可程控金屬化單元使用固體電解質之薄膜中奈米級金屬數量的電氣化學控制。資訊係經由固體電解質中金屬之氧化和金屬離子之減少所引發之電性改變而予儲存。該等電性改變可經由針對一單元施予小的電偏壓而予引發。相反的偏壓將使氧化反向直至電沈積或電鍍金屬被移除為止,藉以使該單元返回至最初記憶體狀態。可程控金屬化單元為已知及被討論的,例如,在Michael N. Kozicki等之標題為"Non-Volatile Memory Based on Solid Electrolytes"之文獻中,和標題為"Bipolar and Unipolar Resistive Switching in Cu-Doped SiO2 "之文章中,在Christina Schindler等人之IEEE Transactions on Electron Devices 54:2762-2768中,及來自IEEE之Michael N. Kozicki等人的"Programmable Metallization Cell Memory Based on Ag-Ge-S and Cu-Ge-S Solid Electrolytes"之文獻中,各文獻係併入本文作為參考。The programmable metallization unit uses the electrochemical control of the amount of nanoscale metal in the film of the solid electrolyte. Information is stored via electrical changes caused by oxidation of metals in the solid electrolyte and reduction of metal ions. The electrical changes can be initiated by applying a small electrical bias to a unit. The opposite bias will reverse the oxidation until the electrodeposition or plating metal is removed, thereby returning the unit to the original memory state. Programmable metallization units are known and discussed, for example, in the literature entitled "Non-Volatile Memory Based on Solid Electrolytes" by Michael N. Kozicki et al., and under the heading "Bipolar and Unipolar Resistive Switching in Cu- In the article "Doped SiO 2 ", in Christina Schindler et al. IEEE Transactions on Electron Devices 54:2762-2768, and from IEEE Michael N. Kozicki et al. "Programmable Metallization Cell Memory Based on Ag-Ge-S and In the literature of Cu-Ge-S Solid Electrolytes, each of the documents is incorporated herein by reference.

當充分份量之偏壓施予一單元時,聚合物記憶體展現電的雙穩定性,包含傳導性的增加。該單元可經由施用相反極性之偏壓予該裝置而返回至低傳導性狀態。聚合物記憶體為已知及被描述的,例如,在2006年American Institute of Physics之Ankita Prakash等人之"Polymer Memory Device Based on Conjugated Polymer and Gold Nanoparticles"中,其係併入本文作為參考。When a sufficient portion of the bias is applied to a unit, the polymer memory exhibits electrical bi-stability, including an increase in conductivity. The unit can be returned to a low conductivity state by applying a bias of opposite polarity to the device. Polymeric memory is known and described, for example, in "Polymer Memory Device Based on Conjugated Polymer and Gold Nanoparticles" by Ankita Prakash et al., 2006, American Institute of Physics, which is incorporated herein by reference.

鐵電隨機存取記憶體(FeRAM)使用鐵電電容器以儲存資料。一極性之電壓脈衝被用於程控一單元為一記憶體狀態,及相反極性之電壓脈衝被用於程控該單元為另一記憶體狀態。FeRAM為已知及被描述的,例如,在The Proceedings of the IEEE,Vol. 88,No.5,May 2000由Ali Sheikholeslami等人所著之"A Survey of Circuit Innovations in Ferroelectric Random-Access Memories"中,其係併入本文作為參考。Ferroelectric random access memory (FeRAM) uses ferroelectric capacitors to store data. A voltage pulse of one polarity is used to program a cell into a memory state, and a voltage pulse of the opposite polarity is used to program the cell to another memory state. FeRAM is known and described, for example, in The Proceedings of the IEEE, Vol. 88, No. 5, May 2000 by Ali Sheikholeslami et al. "A Survey of Circuit Innovations in Ferroelectric Random-Access Memories" , which is incorporated herein by reference.

雙向記憶體單元可以矩形陣列配置,其中個別記憶體單元係置於列和行位址線路之交點,此處一線路係設於另一線路之上。個別單元係經由確立陣列中獨特定義單元之位置的列位址線路和行位址線路而予存取(即自該處讀取或寫入至該處)。或對較大的頻寬而言,可平行於一列線路而選擇一行以上,此處每一行線路具有個別的讀取和寫入電路。儘管個別單元可經由確立列和行位址線路對而獨特地定址,但因為複數記憶體單元共用一列位址線路,及複數單元共用一行位址線路(單元並不共用列和行位址線路),複數單元可經由確立列或行位址線路而予"部分地"選擇。The bidirectional memory cells can be arranged in a rectangular array in which individual memory cells are placed at the intersection of the column and row address lines, where one line is placed on top of the other. Individual cells are accessed (i.e., read from or written thereto) via column address lines and row address lines that establish the location of uniquely defined cells in the array. Or for larger bandwidths, more than one row can be selected in parallel with a column of lines, where each row of lines has individual read and write circuits. Although individual cells can be uniquely addressed by establishing a column and row address pair, the complex memory cells share a column of address lines, and the complex cells share a row of address lines (the cells do not share column and row address lines) The complex unit can be "partially" selected by establishing a column or row address line.

即,若例如,記憶體單元係經由提升其行位址線路之電壓並降低其列位址線路之電壓而予選擇,共用所選擇之行位址線路的所有單元將具有其提升之行位址線路的電壓,及共用所選擇之列位址線路的所有單元將具有其降低之列位址線路的電壓,意即該些未被選擇之單元將被部分選擇。That is, if, for example, the memory cell is selected by raising the voltage of its row address line and lowering the voltage of its column address line, all cells sharing the selected row address line will have their enhanced row address. The voltage of the line, and all cells sharing the selected column address line, will have their reduced column address line voltage, meaning that the unselected cells will be partially selected.

該等部分選擇造成除了目標記憶體單元外疏忽存取一或多個記憶體單元之風險。該等疏忽存取將損害經由非法讀取或寫入作業之記憶體之資料的有效性,有時其特徵為錯誤讀取或錯誤寫入。電流洩漏路徑可加重疏忽存取之風險。該等部分選擇、洩漏路徑及疏忽單元存取之伴隨風險可實質上予以排除,例如,經由於每一單元位置使用一電晶體對以獨特地存取每一記憶體單元。然而,於每一記憶體單元之該等選擇電晶體的附加造成了增加記憶體單元區域的顯著損失。因而將高度需要一種方法和裝置,可提供雙向寫入存取以獨特地選擇陣列中之記憶體單元,亦可避免雙向記憶體單元之疏忽存取而不顯著增加該記憶體單元之區域。These partial selections pose a risk of inadvertent access to one or more memory cells in addition to the target memory cells. Such inadvertent access will compromise the validity of the data of the memory via an illegal read or write operation, sometimes characterized by erroneous or erroneous writes. The current leakage path can increase the risk of inadvertent access. The attendant risks associated with such partial selection, leakage paths, and negligence unit access may be substantially eliminated, for example, by using a pair of transistors at each unit location to uniquely access each memory unit. However, the addition of such selective transistors to each memory cell results in a significant loss of memory cell area. Thus, there is a high need for a method and apparatus that provides bidirectional write access to uniquely select memory cells in an array, as well as avoid inadvertent access of bidirectional memory cells without significantly increasing the area of the memory cells.

依據本發明之原理的雙向記憶體單元包括例如一雙向定限開關(OTS)之一雙向定限裝置和一雙向記憶體元件。該雙向定限裝置係與記憶體元件串聯,隔離雙向記憶體元件與周圍電路,並藉以避免針對記憶體元件之用以讀取或寫入之疏忽存取。一個以上之OTS可串聯記憶體元件地插入以達成較大的隔離電壓或降低的回彈,例如經由使用接近VH 之較低的電壓,並經由使用一個以上串聯而達成適當的總電壓。A two-way memory unit in accordance with the principles of the present invention includes, for example, a bidirectional limiting device of a bidirectional limit switch (OTS) and a bidirectional memory element. The bidirectional limiting device is in series with the memory component to isolate the bidirectional memory component from the surrounding circuitry and to avoid inadvertent access to the memory component for reading or writing. OTS in series of more than one memory device is inserted to achieve greater isolation voltage rebound or decreased, for example via the use of proximity of a lower voltage V H, and by using more than one in series to achieve a suitable total voltage.

雙向記憶體元件包括利用用於形成記憶體裝置之材料的方向特徵之記憶體元件。例如,可經由使電流以一方向經過雙向記憶體單元而寫入一記憶體狀態,並經由使電流以相反方向經過該相同單元而寫入另一記憶體狀態。另一方面,例如可施用一極性之電壓予一記憶體單元以程控該單元為一記憶體狀態,並可施用相反極性之電壓予該相同單元而程控另一記憶體狀態。程控記憶體狀態接著例如可施予電壓和感測電流或使電流經過該單元並測量電壓而予感測。依據本發明之原理,例如OTS之雙向定限裝置提供雙向記憶體單元內之電路隔離,藉以避免雙向記憶體裝置之疏忽存取。The two-way memory component includes a memory component that utilizes directional features of the material used to form the memory device. For example, a memory state can be written by passing a current through the bidirectional memory cell in one direction, and another memory state can be written by passing a current through the same cell in the opposite direction. Alternatively, for example, a voltage of a polarity can be applied to a memory cell to program the cell to a memory state, and a voltage of the opposite polarity can be applied to the same cell to program another memory state. The programmed memory state is then sensed, for example, by applying a voltage and sensing current or passing a current through the unit and measuring the voltage. In accordance with the principles of the present invention, a bidirectional limiting device such as OTS provides circuit isolation within a bidirectional memory unit to avoid inadvertent access by the bidirectional memory device.

依據本發明之原理,包括一雙向記憶體和一OTS之雙向記憶體單元可以矩形陣列配置,其中個別記憶體單元係置於列和行位址線路之交點。個別單元係經由確立陣列中獨特定義單元之位置的列位址線路和行位址線路而予存取(即自該處讀取或寫入至該處)。該等陣列可包括用於將程控雙向單元所需之電流及/或電壓施予不同記憶體狀態的雙極(以前進或相反方向施用)電流及/或電壓源。依據本發明之原理的雙向記憶體陣列亦可包括雙向開關,其致能針對記憶體陣列內各單元存取任一極性之電壓及/或電流的應用。依據本發明之原理,例如OTS之雙向定限裝置可與每一雙向記憶體單元串聯地插入。雙向定限裝置(OTS)可如此裝設並在規模和序列上配置偏壓,以確保無針對未選擇之記憶體單元的疏忽存取是允許的。In accordance with the principles of the present invention, a bidirectional memory cell comprising a bidirectional memory and an OTS can be arranged in a rectangular array wherein individual memory cells are placed at the intersection of column and row address lines. Individual cells are accessed (i.e., read from or written thereto) via column address lines and row address lines that establish the location of uniquely defined cells in the array. The arrays may include bipolar (applied in either forward or reverse direction) current and/or voltage sources for applying the current and/or voltage required to program the bidirectional cells to different memory states. A bidirectional memory array in accordance with the principles of the present invention may also include a bidirectional switch that enables access to voltages and/or currents of any polarity for each cell within the memory array. In accordance with the principles of the present invention, a bidirectional limiting device such as an OTS can be inserted in series with each bidirectional memory unit. The bidirectional limiting device (OTS) can be configured such that the bias is configured in size and sequence to ensure that no inadvertent access to unselected memory cells is permitted.

依據本發明之原理的雙向記憶體特別適於各類電子裝置之作業,包括行動電話、無線射頻識別裝置(RFID)、電腦(可攜式及其他)、定位裝置(例如全球定位系統(GPS)裝置,特別是該些儲存和更新位置具體資訊之裝置),及手持式電子裝置,包括個人數位助理(PDA)和例如MP3播放器之娛樂裝置。The two-way memory according to the principles of the present invention is particularly suitable for the operation of various electronic devices, including mobile phones, radio frequency identification devices (RFID), computers (portable and others), and positioning devices (such as the Global Positioning System (GPS)). Devices, particularly those that store and update location specific information, and handheld electronic devices, including personal digital assistants (PDAs) and entertainment devices such as MP3 players.

儘管本發明將以某些較佳實施例而予描述,對本技藝中一般技術人員而言顯而易見的是包括未提供文中所提出之所有利益及特徵之實施例的其他實施例亦處於本發明之範圍內。在不偏離本發明之精神和範圍下,可進行各式結構、邏輯、程序步驟、化學及電性改變。裝置和電源之極性和類型可以對本技藝中合理技術之人士而言明顯之方式予以替代。例如,場效電晶體(FET)可取代雙極接面電晶體(BJT),n通道裝置可取代p通道裝置,npn裝置可取代pnp裝置,上述各具例如電源電壓和偏壓之適當調整。儘管文中之說明實施例的描述將以OTS提供,但將考量其他電子雙向定限裝置並落於本發明之範圍內。Although the present invention will be described in terms of certain preferred embodiments, it will be apparent to those skilled in the art that other embodiments, which are not intended to provide an Inside. Various structural, logical, procedural steps, chemical and electrical changes can be made without departing from the spirit and scope of the invention. The polarity and type of device and power source can be replaced in a manner that is apparent to those skilled in the art. For example, a field effect transistor (FET) can replace a bipolar junction transistor (BJT), an n-channel device can replace a p-channel device, and an npn device can replace a pnp device, each having appropriate adjustments such as supply voltage and bias voltage. Although the description of the illustrated embodiments will be provided in the OTS, other electronic bidirectional limiting devices will be considered and fall within the scope of the present invention.

為求描述之清晰和簡潔,下列詳細描述中之範例說明實施例可聚焦於雙向記憶體,其回應相反極性之信號的應用而展現電阻變化,但依據本發明之原理的方法和裝置可應用於使用其他屬性以區別記憶體狀態之單向或雙向記憶體。因此,本發明之範圍僅參照申請專利範圍所界定。For clarity and conciseness of the description, the examples in the following detailed description illustrate embodiments that can focus on two-way memory that exhibit resistance changes in response to the application of signals of opposite polarity, but methods and apparatus in accordance with the principles of the present invention are applicable. Use other attributes to distinguish one-way or two-way memory of the memory state. Accordingly, the scope of the invention is defined only by the scope of the claims.

一雙向記憶體單元選擇裝置,即雙向定限開關(OTS),適於應用作為依據本發明之原理的單向或雙向記憶體單元之雙向定限裝置。OTS裝置利用硫族化物材料之特徵以提供電信號之切換。展現其中從"關閉(OFF)"電阻性狀態切換為"開啟(ON)"傳導狀態之電切換行為的硫族化物裝置中之早期工作,係於等於或高於活性的硫族化物材料之定限電壓的電壓應用時引發,或於等於或高於活性的硫族化物材料之定限電流的電流應用時引發。此效果為OTS之基礎,並保留硫族化物材料之重要實際特性。OTS提供快切換速度之可再生切換。OTS之基本原理和作業特性係於在下列文獻中呈現,例如,在其揭露以提及的方式併入之美國專利文獻No. 3,271,591、No. 5,543,737、No. 5,694,146及No. 5,757,446中;以及在許多期刊文章中,包括以提及的方式併入之S.R. Ovshinsky的「Physical Review Letters」vol. 21,p.1450-1453(1969)之"Reversible Electrical Switching Phenomena in Disordered Structures";及S.R. Ovshinsky和H. Fritzsche所著的IEEE Transactions on Electron Devices,vol. ED-20,p.91-105(1973)之"Amorphous Semiconductors for Switching,Memory,and Imaging Applications"。三端子OTS裝置係於例如以提及的方式併入之美國專利文獻No. 6,969,867和No. 6,967,344中揭露。三端子OTS裝置可用作用於單向或雙向讀取及/或寫入之2端子OTS的替代品,其對於本技藝中之合理技術將是明顯的(例如,連接至由連接至第三端子之列線路判斷開啟/關閉之電源,此處電源係連接至用於以一方向寫入之較高電壓,及連接至用於以相反方向寫入之較負電源)。A bidirectional memory cell selection device, i.e., a bidirectional limit switch (OTS), is suitable for use as a bidirectional limiting device for a unidirectional or bidirectional memory cell in accordance with the principles of the present invention. The OTS device utilizes the characteristics of the chalcogenide material to provide switching of electrical signals. Early work in a chalcogenide device exhibiting an electrical switching behavior in which the "OFF" resistive state is switched to the "ON" conducting state is determined by a chalcogenide material equal to or higher than the active The voltage-limited voltage is induced when applied, or when a current equal to or higher than the limiting current of the active chalcogenide material is applied. This effect is the basis of the OTS and retains important practical properties of the chalcogenide material. OTS provides regenerative switching of fast switching speeds. The basic principles and operational characteristics of the OTS are presented in the following documents, for example, in U.S. Patent Nos. 3,271,591, 5,543,737, 5,694,146, and 5,757,446, each incorporated by reference. Many journal articles include SR Ovshinsky's "Physical Review Letters" vol. 21, p. 1450-1453 (1969) "Reversible Electrical Switching Phenomena in Disordered Structures"; and SR Ovshinsky and H Fritzsche, IEEE Transactions on Electron Devices, vol. ED-20, p. 91-105 (1973) "Amorphous Semiconductors for Switching, Memory, and Imaging Applications". A three-terminal OTS device is disclosed in, for example, U.S. Patent Nos. 6,969,867 and 6,967,344, each incorporated by reference. A three terminal OTS device can be used as an alternative to a 2-terminal OTS for unidirectional or bidirectional read and/or write, which will be apparent to the art of the art (e.g., connected to the third terminal) The column line determines the power to be turned on/off, where the power source is connected to a higher voltage for writing in one direction and to a more negative power source for writing in the opposite direction.

例如Te、S或Se之週期表之VI族元素的合金被稱為硫族化物或硫族材料,有利地可用於定限切換裝置。Alloys of Group VI elements of the periodic table such as Te, S or Se are referred to as chalcogenides or chalcogenides and are advantageously used to limit the switching device.

已致力於研究硫族化物成分之寬廣範圍以使硫族裝置之性能特徵最佳化。硫族化物材料通常包括硫族元素及一或多種化學或結構修改元素。硫族元素(例如Te、Se、S)係選自週期表之VI行,修改元素則可選自例如週期表之III行(例如Ga、Al、In)、IV行(例如Si、Ge、Sn)或V行(例如P、As、Sb)。修改元素之角色包括提供包含硫族元素之鏈間的分支或交聯點。IV行修飾劑可作為四配位修飾劑,其包括硫族化物鏈內的兩配位位置及允許遠離硫族化物鏈之分支或交聯的兩配位位置。III和V行修飾劑可作為三配位修飾劑,其包括硫族化物鏈內的一配位位置及允許遠離硫族化物鏈之分支或交聯的一配位位置。依據本發明之原理的實施例可包括二進制、三進制、四進制及更高階之硫族化物合金。硫族化物材料之範例係於美國專利文獻No. 5,166,758、No. 5,296,716、No. 5,414,271、No. 5,359,205、No. 5,341,328、No. 5,536,947、No. 5,534,712、No. 5,687,112及No. 5,825,046中描述,渠等揭露均以提及的方式併入本文。硫族化物材料亦可為反應性噴濺程序的結果:例如硫族化物氮化物或氧化物,且硫族化物亦可經由離子注入或其他程序而予修改。A wide range of chalcogenide compositions has been investigated to optimize the performance characteristics of chalcogenide devices. Chalcogenide materials typically include a chalcogenide element and one or more chemical or structural modifying elements. The chalcogen element (for example, Te, Se, S) is selected from the VI row of the periodic table, and the modified element may be selected, for example, from the III row of the periodic table (for example, Ga, Al, In), and the IV row (for example, Si, Ge, Sn). ) or V lines (for example, P, As, Sb). The role of modifying elements includes providing branches or cross-linking points between chains containing chalcogen elements. The IV row modifier can act as a tetracoordination modifier comprising two coordinating sites within the chalcogenide chain and two coordinating sites that allow branching or crosslinking away from the chalcogenide chain. The III and V line modifiers act as a tricoordinate modifier comprising a coordination site within the chalcogenide chain and a coordination site that allows branching or crosslinking away from the chalcogenide chain. Embodiments in accordance with the principles of the invention may include binary, ternary, quaternary, and higher order chalcogenide alloys. Examples of chalcogenide materials are described in U.S. Patent Nos. 5,166,758, 5,296,716, 5,414,271, 5,359,205, 5,341,328, 5,536,947, 5,534,712, 5,687,112, and 5,825,046. The disclosures are hereby incorporated by reference. The chalcogenide material can also be the result of a reactive sputtering process: for example, a chalcogenide nitride or oxide, and the chalcogenide can also be modified via ion implantation or other procedures.

在圖1之概念方塊圖中,依據本發明之原理的雙向寫入記憶體單元100包括與雙向記憶體元件104串聯之OTS 102。單向寫入記憶體單元之使用對於本技藝中合理技術之人士而言將是明顯的。一或多個OTS 102於第一端子106耦合至第一電源SUPPLY1,及於第二端子108耦合至雙向記憶體元件104之第一端子110。此處雙向係指記憶體元件之寫入;然而,某些記憶體亦可以兩方向之任一方向讀取。雙向記憶體元件經由第二端子112而耦合至第二電源SUPPLY2。In the conceptual block diagram of FIG. 1, a bidirectional write memory unit 100 in accordance with the principles of the present invention includes an OTS 102 in series with a bidirectional memory element 104. The use of a one-way write memory unit will be apparent to those skilled in the art. One or more OTSs 102 are coupled to the first power source SUPPLY1 at the first terminal 106 and to the first terminal 110 of the bidirectional memory device 104 at the second terminal 108. Bidirectional here refers to the writing of memory components; however, some memories can also be read in either direction. The bidirectional memory element is coupled to the second power source SUPPLY2 via the second terminal 112.

依據本發明之原理,電源SUPPLY1和SUPPLY2可經由並在電路之控制下耦合至記憶體單元100之各個端子,該電路例如解碼電路,其將於圖2和3之相關討論中更詳細地描述。電源SUPPLY1和SUPPLY2可配置為電流電源或電壓電源,並可包括電流和電壓電源。In accordance with the principles of the present invention, power supplies SUPPLY1 and SUPPLY2 can be coupled to respective terminals of memory unit 100 via and under the control of circuitry, such as decoding circuitry, which will be described in greater detail in the related discussion of Figures 2 and 3. The power supplies SUPPLY1 and SUPPLY2 can be configured as current or voltage supplies and can include both current and voltage supplies.

此外,為滿足雙向記憶體元件104之需要,每一電源SUPPLY1和SUPPLY2為雙向。即,每一電源可為"正"或"負"電壓(極性為習知之問題),或每一電源例如可提供或接收電流。在不同實施例中,電源之雙向觀點可經由將各式正元件(例如相應於正電壓或提供電流)和負元件(例如相應於負電壓或接收電流)切換進入或離開電源電路而予實施。In addition, to meet the needs of the bidirectional memory component 104, each of the power supplies SUPPLY1 and SUPPLY2 is bidirectional. That is, each power source can be a "positive" or "negative" voltage (polarity is a matter of conventional interest), or each power source can, for example, provide or receive current. In various embodiments, the two-way view of the power supply can be implemented by switching various positive elements (eg, corresponding to a positive voltage or current supply) and negative elements (eg, corresponding to a negative voltage or a receiving current) into or out of the power supply circuit.

圖2之概念方塊圖提供依據本發明之原理的雙向陣列之概觀。該陣列可使用本技藝中合理技術之人士已知之技術而用作例如嵌入記憶體電路中之記憶體陣列,或場可程控陣列。雙向記憶體陣列200包括以交叉點陣列配置之複數雙向記憶體單元202。如圖1之相關討論中所描述的,每一單元202包括串聯之雙向記憶體元件和OTS。兩電源SUPPLY1和SUPPLY2係配置以提供正和負電壓及/或電流予陣列200內之選擇的單元202。如將於圖3之相關討論中更詳細之描述,電源SUPPLY1和SUPPLY2之一或二者可包括直接指向特定記憶體作業之部分。例如,電源可包括設定為不同位準之特定電流源,用以自記憶體單元讀取和寫入至記憶體單元。選擇電路201和203操作以於電源SUPPLY1和SUPPLY2所個別提供之不同極性電源之間選擇。The conceptual block diagram of Figure 2 provides an overview of a bidirectional array in accordance with the principles of the present invention. The array can be used, for example, as a memory array embedded in a memory circuit, or as a field programmable array, using techniques known to those skilled in the art. The bidirectional memory array 200 includes a plurality of bidirectional memory cells 202 configured in a cross-point array. As described in the related discussion of FIG. 1, each unit 202 includes a bidirectional memory element and an OTS in series. The two power supplies SUPPLY1 and SUPPLY2 are configured to provide positive and negative voltages and/or currents to selected cells 202 within array 200. As will be described in more detail in the related discussion of FIG. 3, one or both of the power supplies SUPPLY1 and SUPPLY2 may include portions directed to a particular memory job. For example, the power supply can include a particular current source that is set to a different level for reading and writing from the memory unit to the memory unit. Selection circuits 201 and 203 operate to select between different polarity power supplies individually provided by power supplies SUPPLY1 and SUPPLY2.

依據本發明之原理,選擇電路201和203於任一特定存取作業(READ作業、WRITE 0作業或WRITE 1作業)期間典型地選擇相反極性之電源。即,例如於WRITE 1作業期間,選擇電路203可選擇正電源,同時選擇電路201選擇負電源,以便以適於寫入邏輯"1"之方向使電流通過記憶體單元流至所選擇之記憶體單元。在WRITE 0作業期間,選擇電路203可接著選擇負電源,同時選擇電路201選擇正電源,藉此以WRITE 1作業所需之相反方向提供電流流經所選擇之記憶體單元。選擇電路201和203將其選擇基於包括下列信號之輸入信號上:ADDRESS、READ、WRITE 0和WRITE 1信號。在說明實施例選擇電路中包括例如開關204、206、208和210之雙向開關。雙向開關204、206、208和210係用於選擇於陣列200內選擇個別記憶體單元之列和行線路組合。雙向開關係用於調適記憶體單元202內之記憶體元件的雙向特性。In accordance with the principles of the present invention, selection circuits 201 and 203 typically select power supplies of opposite polarity during any particular access operation (READ job, WRITE 0 job, or WRITE 1 job). That is, for example, during the WRITE 1 operation, the selection circuit 203 can select the positive power supply while the selection circuit 201 selects the negative power supply to cause current to flow through the memory unit to the selected memory in a direction suitable for writing logic "1". unit. During WRITE 0 operation, selection circuit 203 can then select a negative supply while selection circuit 201 selects a positive supply, thereby providing current through the selected memory cell in the opposite direction required for WRITE 1 operation. Selection circuits 201 and 203 select their selection based on the input signals including the following signals: ADDRESS, READ, WRITE 0, and WRITE 1 signals. Bidirectional switches such as switches 204, 206, 208, and 210 are included in the illustrative embodiment selection circuit. Bidirectional switches 204, 206, 208, and 210 are used to select a column and row line combination for selecting individual memory cells within array 200. The bidirectional open relationship is used to adapt the bidirectional characteristics of the memory elements within the memory unit 202.

圖3之示意圖提供依據本發明之原理的雙向記憶體陣列之說明實施例的更詳細檢視。在本說明實施例中,如前述,交叉點記憶體陣列300包括經由各列和行線路之確立所選擇之雙向記憶體單元(例如單元2,2係經由行2和列2線路之確立而被選擇)。在本說明實施例中,SUPPLY1包括READ、WRITE 1和WRITE 0電路。READ電路包括一對串聯p通道FET 302和304,其係於302之源極連接至正電源電壓V+,並通過FET 304之汲極而連接至共同電源輸出,其係選擇地耦合至所有供電予陣列300之行線路。在本說明實施例中,p通道FET 304之閘極係由帶間隙調節器所產生之調節的電壓信號VREGP控制,其供應穩定的溫度補償控制電壓予p通道FET 304。p通道FET 302之閘極係由READ信號控制。當READ信號相對於電源電壓V+為低時,便於p-通道FET 304之汲極與電源電壓V+之間組建低電阻路徑。每當READ信號以此方式啟動p通道FET 302時,流經FET 304之電流便由FET 304之閘極的電壓VREGP控制。3 is a schematic diagram showing a more detailed view of an illustrative embodiment of a two-way memory array in accordance with the principles of the present invention. In the illustrated embodiment, as described above, the cross-point memory array 300 includes two-way memory cells selected via the establishment of columns and row lines (eg, cells 2, 2 are asserted via row 2 and column 2 lines). select). In the illustrated embodiment, SUPPLY1 includes READ, WRITE 1, and WRITE 0 circuits. The READ circuit includes a pair of series p-channel FETs 302 and 304 connected to the positive supply voltage V+ at source 302 and to the common supply output through the drain of FET 304, which is selectively coupled to all of the supply. The line of the array 300. In the illustrated embodiment, the gate of p-channel FET 304 is controlled by a regulated voltage signal VREGP generated by a lash adjuster that supplies a stable temperature compensated control voltage to p-channel FET 304. The gate of p-channel FET 302 is controlled by a READ signal. When the READ signal is low relative to the supply voltage V+, a low resistance path is established between the drain of the p-channel FET 304 and the supply voltage V+. Whenever the READ signal activates p-channel FET 302 in this manner, the current flowing through FET 304 is controlled by the voltage VREGP of the gate of FET 304.

相似地,WRITE 1電路包括一對串聯p通道FET 306和308,其係連接至正電源電壓V+之一端,並通過FET 308之汲極而於另一端連接至共同電源輸出,其係選擇地耦合至所有供電予陣列300之行線路。Similarly, the WRITE 1 circuit includes a pair of series p-channel FETs 306 and 308 connected to one of the positive supply voltages V+ and connected to the common supply output through the drain of the FET 308 and selectively coupled at the other end. To all lines of power to the array 300.

在本說明實施例中,p通道FET 308之閘極係由帶間隙調節器所產生之調節的電壓信號VREGP控制,其供應穩定的溫度補償控制電壓予p通道FET 308。p通道FET 306之閘極係由WRITE 1信號控制。當WRITE 1信號相對於電源電壓V+為低時,便於p-通道FET 308之汲極與電源電壓V+之間組建低電阻路徑。每當WRITE 1信號以此方式啟動p通道FET 306時,流經FET 308之電流便由FET 308之閘極的電壓VREGP控制。由於READ和WRITE 1作業之電流需求可以不同(例如,將記憶體元件寫入至低電阻狀態所需電流可大於讀取相同記憶體元件所需電流),用於產生寫入脈衝之p通道FET 308可大於用於產生READ脈衝之p通道FET 304,藉此以相同閘極電壓VREGP提供較大電流。In the illustrated embodiment, the gate of p-channel FET 308 is controlled by a regulated voltage signal VREGP generated by a lash adjuster that supplies a stable temperature compensated control voltage to p-channel FET 308. The gate of p-channel FET 306 is controlled by the WRITE 1 signal. When the WRITE 1 signal is low relative to the supply voltage V+, a low resistance path is established between the drain of the p-channel FET 308 and the supply voltage V+. Whenever the WRITE 1 signal activates the p-channel FET 306 in this manner, the current flowing through the FET 308 is controlled by the voltage of the gate of the FET 308, VREGP. Since the current requirements for READ and WRITE 1 operations can be different (for example, the current required to write a memory device to a low resistance state can be greater than the current required to read the same memory device), the p-channel FET used to generate the write pulse 308 may be larger than p-channel FET 304 for generating a READ pulse, thereby providing a larger current at the same gate voltage VREGP.

在本說明實施例中,WRITE 0作業與READ和WRITE 1作業為相反極性。即,在本範例中,READ電流極性可與WRITE 1相同。接著,為讀取陣列300中之記憶體單元之一之內容,或為將邏輯"1"寫入該單元,電流係以一方向流動,且為將邏輯"0"寫入該單元,電流則係以相反方向流動。在本實施例中,WRITE 0電路包括一對串聯n通道FET 310和312,其係於一端通過FET 310之源極而連接至負電源電壓V-,並於另一端通過FET 312之汲極而連接至共同電源節點,其係選擇地耦合至從陣列300選擇之行線路,因而為WRITE 0而將相反極性電流耦合至所選擇之記憶體單元。In the illustrated embodiment, the WRITE 0 job is of opposite polarity to the READ and WRITE 1 jobs. That is, in this example, the READ current polarity can be the same as WRITE 1. Then, to read the contents of one of the memory cells in the array 300, or to write a logic "1" to the cell, the current flows in one direction, and to write a logic "0" to the cell, the current is Flow in the opposite direction. In the present embodiment, the WRITE 0 circuit includes a pair of series n-channel FETs 310 and 312 that are connected at one end to the negative supply voltage V- through the source of FET 310 and at the other end through the drain of FET 312. Connected to a common power supply node, which is selectively coupled to the row selected from array 300, thereby coupling the opposite polarity current to the selected memory cell for WRITE 0.

n通道FET 312之閘極係由帶間隙調節器所產生之調節的電壓信號VREGN控制,其供應穩定的溫度補償控制電壓予n通道FET 312。n通道FET 310之閘極係由WRITE 0信號控制。當WRITE 0相對於電源電壓V-為高時,便於n通道FET 312之源極與電源電壓V-之間組建低電阻路徑。每當WRITE 0信號以此方式啟動n-通道FET 310時,流經FET 312之電流振幅便由施予FET 312之閘極的電壓VREGN控制。The gate of n-channel FET 312 is controlled by a regulated voltage signal VREGN generated by a lash adjuster that supplies a stable temperature compensated control voltage to n-channel FET 312. The gate of n-channel FET 310 is controlled by the WRITE 0 signal. When WRITE 0 is high relative to the supply voltage V-, a low resistance path is established between the source of the n-channel FET 312 and the supply voltage V-. Whenever the WRITE 0 signal activates the n-channel FET 310 in this manner, the magnitude of the current flowing through the FET 312 is controlled by the voltage VREGN applied to the gate of the FET 312.

如前所述,在本說明實施例中,READ、WRITE 1和WRITE 0電路之輸出可繫於行線路之共同節點;或一個以上之集合可個別驅動行線路之一或子集(所以一個以上之行線路係平行作用,因而改善頻寬)。除了判斷將實施之功能及經由READ、WRITE 1和WRITE 0等控制信號實施之電源的選擇外,每一行線路可具有一控制輸入,其係由位址解碼電路支配。即,行線路係由位址線路所驅動之解碼器提供之解碼信號輸入所選擇。在圖3之說明實施例中,解碼電路314接收位址線路ADDRESS,並依據位址線路ADDRESS上出現之位址信號而產生行選擇控制信號CS1、CS2、...、CSn。行選擇信號CS1、CS2、...、CSn控制提供存取相應行線路之各個雙向開關BISW1、BISW2、...、BISWn。以此方式,READ、WRITE 1和WRITE 0信號判斷存取信號之大小和極性,且位址線路ADDRESS判斷將接收存取信號之行線路。As previously mentioned, in the illustrated embodiment, the outputs of the READ, WRITE 1, and WRITE 0 circuits may be tied to a common node of the line lines; or more than one set may individually drive one or a subset of the line lines (so more than one The line of travel is parallel, thus improving the bandwidth). In addition to determining the functions to be implemented and the selection of power supplies implemented via control signals such as READ, WRITE 1 and WRITE 0, each row of lines may have a control input that is governed by the address decoding circuitry. That is, the line circuit is selected by the decoded signal input provided by the decoder driven by the address line. In the illustrated embodiment of FIG. 3, decoding circuit 314 receives address line ADDRESS and generates row select control signals CS1, CS2, ..., CSn based on the address signals appearing on address line ADDRESS. The row select signals CS1, CS2, ..., CSn control the respective bidirectional switches BISW1, BISW2, ..., BISWn providing access to the respective row lines. In this manner, the READ, WRITE 1, and WRITE 0 signals determine the magnitude and polarity of the access signal, and the address line ADDRESS determines that the access signal will be received.

在本說明實施例中,雙向開關BISW1、BISW2、...、BISWn被完成為CMOS類比開關。CMOS類比開關在本技藝中為已知的。由於使用p通道和n通道FET,CMOS類比開關可提供極低電阻信號路徑,無關乎跨越信號之極性或電壓。即,當"啟動"時p通道和n通道裝置彼此互補,使得隨著n通道裝置之電阻因跨越裝置之信號電壓中之變化而增加,p通道裝置之電阻便減少。反之亦然。基於較低性能和較受限之電壓範圍,可使用單一n或p通道裝置取代所說明之並列的p通道和n通道裝置。In the illustrated embodiment, the bidirectional switches BISW1, BISW2, ..., BISWn are completed as CMOS analog switches. CMOS analog switches are known in the art. Due to the use of p-channel and n-channel FETs, CMOS analog switches provide a very low-resistance signal path regardless of the polarity or voltage across the signal. That is, when "on", the p-channel and n-channel devices are complementary to each other such that as the resistance of the n-channel device increases due to variations in the signal voltage across the device, the resistance of the p-channel device decreases. vice versa. Based on lower performance and limited voltage ranges, a single n- or p-channel device can be used in place of the illustrated parallel p-channel and n-channel devices.

一或多個感測放大器SENSEAMP可耦合至行線路之共同節點。在包括READ和CLOCK信號之信號的控制下。感測放大器SENSEAMP於讀取作業期間感測並調適存取之記憶體單元的內容。來自感測放大器SENSEAMP之輸出可暫時儲存於例如緩衝器BUFFER中。其他感測放大器組態係於本發明之範圍內考量。One or more sense amplifiers SENSEAMP can be coupled to a common node of the line lines. Under the control of signals including READ and CLOCK signals. The sense amplifier SENSEAMP senses and adapts the contents of the accessed memory cells during a read operation. The output from the sense amplifier SENSEAMP can be temporarily stored, for example, in the buffer BUFFER. Other sense amplifier configurations are contemplated within the scope of the present invention.

在本說明實施例中,每一列線路依據各列是否被選擇或是否將執行READ、WRITE 0或WRITE 1作業,而被連接至分別將列線路耦合至正或負電源之p通道FET 316、328、332和n通道FET 318、330、334。基於n通道FET 330、334及p通道FET 328、332關閉,各列線路可"浮動"。依據本發明之原理,列線路可預先充電至例如V+/2之電壓。在本說明實施例中,列和行線路在信號PRECHARGE的控制下被耦合通過n通道FET至V+/2。此外,當列線路未被選擇時可被迫為中間電壓,例如V+/2。In the illustrated embodiment, each column of lines is connected to p-channel FETs 316, 328 that respectively couple column lines to positive or negative supplies, depending on whether each column is selected or whether a READ, WRITE 0 or WRITE 1 job will be performed. , 332 and n-channel FETs 318, 330, 334. Based on the n-channel FETs 330, 334 and the p-channel FETs 328, 332 are turned off, the columns of the lines can be "floating". In accordance with the principles of the present invention, the column lines can be precharged to a voltage of, for example, V+/2. In the illustrated embodiment, the column and row lines are coupled through the n-channel FET to V+/2 under the control of the signal PRECHARGE. Furthermore, the column voltage can be forced to an intermediate voltage, such as V+/2, when it is not selected.

在一說明實施例中,當未被選擇時,可將進一步驅動器附加至每一列和行,使其為V/2。該等驅動器可為N-FET,其汲極至例如V/2(V+ + V-/2)之電壓,其源極至列(或行)。當列(或行)未被選擇時,閘極為高並可從解碼器予以控制。In an illustrative embodiment, when not selected, a further driver can be attached to each column and row to be V/2. The drivers can be N-FETs with a drain to a voltage of, for example, V/2 (V+ + V-/2), with a source to column (or row). When the column (or row) is not selected, the gate is extremely high and can be controlled from the decoder.

在該說明實施例中,解碼電路314接收信號,包括:ADDRESS、DATA、READ、WRITE、CLOCK及ENABLE。解碼電路314使用該些信號以發展控制信號,包括:READ、WRITE 0、WRITE 1、PRECHARGE、RP1...RPn、RN1...RNn及CS1...CSn,其如前述地被分配予陣列並予使用。即,例如信號RP1-n控制p通道FET之閘極與受信號RN1-n控制之n通道FET之閘極結合,而發展列選擇信號ROW1-n。信號CS1-n控制發展行選擇信號COL1-n之類比通過多重開關。PRECHARGE信號控制串聯之n通道FET,通過端子PRECOL1-n和PREROW1-n,而將列和行線路帶至預充電電壓(本說明實施例中為V/2)。In the illustrated embodiment, decoding circuit 314 receives signals including: ADDRESS, DATA, READ, WRITE, CLOCK, and ENABLE. Decoding circuit 314 uses the signals to develop control signals including: READ, WRITE 0, WRITE 1, PRECHARGE, RP1 ... RPn, RN1 ... RNn and CS1 ... CSn, which are assigned to the array as previously described And use it. That is, for example, the signal RP1-n controls the gate of the p-channel FET to be coupled to the gate of the n-channel FET controlled by the signal RN1-n, and the column select signal ROW1-n is developed. The signal CS1-n controls the analog line selection signal COL1-n analogy through multiple switches. The PRECHARGE signal controls the n-channel FETs in series, passing the column and row lines to the precharge voltage (V/2 in the illustrated embodiment) through the terminals PRECOL1-n and PREROW1-n.

經由使用範例,可更加理解本說明實施例中之讀取和寫入作業的雙向特性。在本說明實施例中,當解碼器314將WRITE、ADDRESS和DATA信號解譯為將"1"寫入至記憶體單元CELL 1,1(即經由確立列1和行1之組合而獨特定址之記憶體單元)之指令時,便確立WRITE 1信號(WRITE 1被驅動為相對於V+為"低"),和確立CS1(被驅動為相對於V+為"低"),以允許WRITE 1所發展之脈衝(文中習慣上稱為"正"脈衝)從V+通過適當寫入電流至行線路COL1。此外,確立ROW1信號(為WRITE 1作業,經由將RN1和RP1驅動為"高",而將ROW1驅動為"低"至V-)。另一方面,為將"0"寫入至記憶體單元CELL 1,1,便確立WRITE 0信號(WRITE 0被驅動為相對於V-為"高"),和確立CS1(被驅動為相對於V+為"低"),以允許WRITE 0所發展之負脈衝通過至行線路COL1,並確立ROW1信號。即,為WRITE 0作業,經由將RN1和RP1驅動為"低",而將ROW1驅動為"高"至V+。The bidirectional characteristics of the read and write operations in the embodiment of the present description can be more understood through the use of examples. In the illustrated embodiment, decoder 314 interprets WRITE, ADDRESS, and DATA signals to write "1" to memory cell CELL 1,1 (ie, uniquely addressed by establishing a combination of column 1 and row 1) When the memory unit is commanded, the WRITE 1 signal is asserted (WRITE 1 is driven "low" relative to V+), and CS1 (driven to "low" relative to V+) is established to allow WRITE 1 to be developed. The pulse (commonly referred to herein as a "positive" pulse) is applied from V+ to the line COL1 by appropriate writing. In addition, the ROW1 signal is asserted (for WRITE 1 operations, ROW1 is driven "low" to V-) by driving RN1 and RP1 to "high". On the other hand, to write "0" to the memory cell CELL 1,1, the WRITE 0 signal is asserted (WRITE 0 is driven "high" with respect to V-), and CS1 is asserted (driven relative to V+ is "low") to allow the negative pulse developed by WRITE 0 to pass to line COL1 and establish the ROW1 signal. That is, for the WRITE 0 job, ROW1 is driven to "high" to V+ by driving RN1 and RP1 to "low".

圖4A-4D之時序圖描繪依據本發明之原理的雙向記憶體單元之存取程序(即讀取、寫入邏輯"1",和寫入邏輯"0")。在本說明實施例中,記憶體單元之雙向特性係於使用正電流脈衝(如前述"正"和"負"係習慣用法)而寫入邏輯"1"之需求中顯示,導致極高電阻值,且使用負電流脈衝而寫入邏輯"0",導致極低電阻值。讀取作業亦使用正電流脈衝,但取決於有關文中所描述之範例電路的單元內所使用之OTS選擇裝置及其方位的記憶體技術而可為負電流脈衝。4A-4D are timing diagrams depicting access procedures (i.e., read, write logic "1", and write logic "0") of a bidirectional memory cell in accordance with the principles of the present invention. In the illustrated embodiment, the bidirectional characteristic of the memory cell is shown in the requirement to write a logic "1" using a positive current pulse (such as the "positive" and "negative" system idioms described above), resulting in an extremely high resistance value. And a negative current pulse is used to write a logic "0", resulting in an extremely low resistance value. The read operation also uses a positive current pulse, but may be a negative current pulse depending on the memory technology of the OTS selection device used in the unit of the example circuit described herein and its orientation.

如有關圖3之討論中所描述的,且如圖4A-4D之時序圖中所表示的,當未存取相關記憶體單元時,列和行選擇信號係保持於中間電壓(本說明實施例中為V/2),以進一步確保預防陣列300內之單元的疏忽存取。即,當特定列上無單元時,便選擇ROWn,各列解碼輸出RPn和RNn可均為"關閉(OFF)"(如其各p通道FET 316和n通道FET 318之狀態),且相應列線路ROWn可為中間值偏左,例如經由預充電電路之V/2,如有關圖3之更詳細描述(例如RPn、RNn和CSn為關閉,允許列和行線路經由產生PRECOLn和PREROWn之預充電電路,而於例如終止週期之預充電期間,將列和行線路驅動為V/2)。將列和行線路保持於中間電壓亦限制作業期間的電壓搖擺量,藉以允許更快、降低雜訊之作業和電流洩漏-藉以減少電力損耗,且在可攜式的應用中,提升了裝置於充電之間的操作時間。此外,基於列和行處於相等電壓,(未選擇之)列和行之間的洩漏降低,進一步改善電池壽命。在另一說明實施例中,未選擇之列可處於V/3(當寫入0時)或2V/3(當讀取或寫入1時),藉以產生邊限改進而預防錯誤選擇。As described in relation to the discussion of FIG. 3, and as represented in the timing diagrams of FIGS. 4A-4D, the column and row select signals are maintained at an intermediate voltage when the associated memory cells are not accessed (in this illustrative embodiment) Medium V/2) to further ensure inadvertent access to prevent units within array 300. That is, when there is no cell on a particular column, ROWn is selected, and each column decoding output RPn and RNn may be "OFF" (as in the state of each of its p-channel FET 316 and n-channel FET 318), and the corresponding column line ROWn may be left to the left, for example via V/2 of the precharge circuit, as described in more detail with respect to Figure 3 (eg, RPn, RNn, and CSn are off, allowing column and row lines to pass precharge circuits that generate PRECOLn and PREROWn) And, for example, during the precharge period of the termination period, the column and row lines are driven to V/2). Maintaining the column and row lines at intermediate voltages also limits the amount of voltage swing during operation, allowing for faster, reduced noise handling and current leakage - thereby reducing power loss, and in portable applications, the device is Operating time between charges. In addition, based on the fact that the columns and rows are at equal voltages, the leakage between the (unselected) columns and rows is reduced, further improving battery life. In another illustrative embodiment, the unselected column may be at V/3 (when writing 0) or 2V/3 (when reading or writing 1), thereby creating margin improvements to prevent erroneous selection.

圖4A之時序圖描繪依據本發明之原理的讀取作業,其中讀取之雙向記憶體單元(例如CELL 1,1)為處於高電阻、邏輯"0"、RESET(重置)狀態。The timing diagram of Figure 4A depicts a read operation in accordance with the principles of the present invention in which the read bidirectional memory cells (e.g., CELL 1, 1) are in a high resistance, logic "0", RESET (reset) state.

在時間t0,列一選擇信號ROW1和行一選擇信號COL1如陣列300內所有列和行信號,均處於"預充電"電壓V/2。在本說明範例中,讀取程序於時間t1時經由將與記憶體單元CELL 1,1相關之行線路COL1驅動為高(朝向具電流源之V+)及將與記憶體單元CELL 1,1相關之列線路ROW1驅動為低(至0V)而予啟動。在本說明實施例中,行線路COL1經由於時間t0藉確立READ信號和類比開關控制信號CS1產生之電流脈衝而充電為正電壓。即,陣列300內之記憶體單元CELL 1,1於時間t1經由分別確立列一和行一選擇信號ROW1和COL1而予存取。At time t0, column one select signal ROW1 and row one select signal COL1, such as all column and row signals in array 300, are at "precharge" voltage V/2. In the illustrated example, the read program drives the row line COL1 associated with the memory cell CELL 1,1 high (toward V+ with current source) and will be associated with the memory cell CELL 1,1 at time t1. The line ROW1 is driven low (to 0V) to start. In the illustrated embodiment, the line line COL1 is charged to a positive voltage via the current pulse generated by the assertion READ signal and the analog switch control signal CS1 at time t0. That is, the memory cells CELL 1,1 in the array 300 are accessed at time t1 by establishing column one and row one select signals ROW1 and COL1, respectively.

如有關圖3之討論中的更詳細描述,在本說明實施例中,經由驅動p通道FET 302之閘極為"低"電壓(說明範例中為0V)而確立讀取信號READ,藉以將正脈衝(其量係由VREGP調節)提供予行存取電路。因而產生之脈衝經由啟動(或不啟動)相應雙向開關(例如開關208)而被限制--即,允許通過(或封鎖)--至適當行。在本說明範例中,雙向開關控制信號CS1係經由將信號驅動為"低"電壓V-而予確立。As described in more detail in the discussion of FIG. 3, in the illustrated embodiment, the read signal READ is asserted by driving the gate of the p-channel FET 302 to a very "low" voltage (0V in the illustrated example), thereby providing a positive pulse. (The amount is adjusted by VREGP) is provided to the line access circuit. The resulting pulses are then limited (i.e., allowed to pass (or block)) to the appropriate row by activating (or not activating) a corresponding bidirectional switch (e.g., switch 208). In the illustrated example, the bidirectional switch control signal CS1 is asserted by driving the signal to a "low" voltage V-.

在本說明實施例中,行選擇信號COL1因而為電流脈衝(經由啟動READ p通道FET 302而予產生),其允許通過雙向類比開關208至連接至陣列300之行1中所有記憶體單元之行輸入的行線路。如有關圖3之討論中更詳細描述,列選擇信號ROW1係經由位址解碼電路314而予產生,位址解碼電路314係使用ADDRESS、READ、WRITE和DATA輸入而產生該等列(RP1和RN1)控制信號。在本說明實施例中,由於記憶體單元之極性或雙向特性係經由將流經裝置之電流以相反方向驅動以寫入"1"或"0"之需求而予顯示,解碼之列輸出RPn和RNn,以產生列控制信號ROWn,其係用於依據將執行之存取(READ、WRITE 0或WRITE 1)作業的類型而接收或提供電流。In the illustrated embodiment, row select signal COL1 is thus a current pulse (generated via activation of READ p-channel FET 302) which allows passage of bidirectional analog switch 208 to all of the memory cells in row 1 of array 300. The line of the line entered. As described in more detail in relation to the discussion of FIG. 3, column select signal ROW1 is generated via address decode circuit 314, which generates the columns using ADDRESS, READ, WRITE, and DATA inputs (RP1 and RN1). )control signal. In the illustrated embodiment, since the polarity or bidirectional characteristic of the memory cell is displayed by driving the current flowing through the device in the opposite direction to write "1" or "0", the decoded column outputs RPn and RNn, to generate a column control signal ROWn, which is used to receive or provide current depending on the type of access (READ, WRITE 0 or WRITE 1) that will be performed.

接著,在時間T1,列線路ROW1經由將RN1驅動為高而被驅動為低至V-(本說明實施例中為0V),並藉以啟動n通道FET RN1(RP1仍為高且p通道FET 316"關閉");行線路COL1係經由藉驅動讀取信號為低(啟動p通道FET 302)並藉驅動CS1為低以啟動雙向類比開關208所產生之電流脈衝而予充電。在本說明實施例中,用於將列線路驅動為低之n通道FET(例如n通道FET 318)的特徵在於低導通電阻(Ron),並因而可快速地將列線路驅動為0V。另一方面,行線路係經由具有由閘極電壓VREGP決定之振幅的電流源予以充電,且因而如圖4A之逐漸向上和急遽向下之曲線所分別表示的,行線路COLn之充電逐漸地大於列線路ROWn之放電。在本說明實施例中,選擇p通道FET 304之尺寸以確保基於所應用之閘極電壓VREGP,所流經之電流於READ作業期間不會干擾陣列300內任一記憶體單元之記憶體狀態。如同對於熟悉本技術之人士將顯而易見的,以電壓源將使記憶體單元技術較佳地讀取(或寫入),(具電壓順應性之)讀取或寫入電流源可由(具電流順應性或內部電阻之)電壓取代。Next, at time T1, column line ROW1 is driven low to V- (0V in the illustrated embodiment) by driving RN1 high, and thereby initiates n-channel FET RN1 (RP1 is still high and p-channel FET 316 "OFF"); the line line COL1 is precharged by driving the read signal low (starting the p-channel FET 302) and driving CS1 low to initiate the current pulse generated by the bidirectional analog switch 208. In the illustrated embodiment, the n-channel FET (e.g., n-channel FET 318) for driving the column lines to be low is characterized by a low on-resistance (Ron) and thus can quickly drive the column lines to 0V. On the other hand, the line circuit is charged via a current source having an amplitude determined by the gate voltage VREGP, and thus the charging of the line line COLn is gradually greater than that indicated by the gradual upward and sharp downward curves of FIG. 4A, respectively. The discharge of the column line ROWn. In the illustrated embodiment, the size of the p-channel FET 304 is selected to ensure that the current flowing through does not interfere with the memory state of any of the memory cells in the array 300 during the READ operation based on the applied gate voltage VREGP. As will be apparent to those skilled in the art, a voltage source will enable memory cell technology to be better read (or written), and (with voltage compliance) read or write current sources may be (with current compliance) Voltage or internal resistance).

跨越記憶體單元CELL 1,1之電壓Vcell為行和列電壓之間之差。如同本範例中,若記憶體元件處於高電阻狀態,通過"接地"列線路ROW1和行線路COL1之電流限制充電的組合,應用至記憶體單元Vcell之電壓將分佈跨越串聯OTS 102和雙向記憶體元件104。對於第一近似值而言,電壓之分佈將與OTS 102和記憶體元件104之電阻成比例。若其電阻相等,電壓將相等地分佈;若例如裝置(OTS或記憶體元件)之一展現總串聯電阻之三分之一,便將面臨電壓之三分之一等。在本說明實施例中,基於處於高電阻狀態之記憶體,面臨OTS之(到達時間t2之)峰值讀取電壓之比例不足以觸發OTS。依據本發明之原理,選擇例如峰值讀取電壓、記憶體元件和OTS之相對電阻及OTS定限電壓等參數,使得若該單元處於其低電阻狀態,便於READ作業期間t2時觸發OTS,但若該單元處於其高電阻狀態(例如,2/3(峰值READ)大於或等於OTS之定限電壓,但較小之量1/2(峰值READ)則小於OTS之定限電壓),OTS便不於READ作業期間被觸發。當OTS被觸發時,行上之電壓便落至較低電壓,且記憶體處於低電阻狀態(具有跨越OTS之低電壓)。若OTS之轉折對記憶體必要之所需定限電壓VTH 而言是過度的,便經由使用一或多個串聯之OTS(各具較低VTH )而減少轉折同時保持較高VTH ,例如經由串聯堆疊較薄之OTS。例如,在美國專利No. 7,280,390中討論定限和轉折電壓之調整,該文獻係併入本文作為參考。The voltage Vcell across the memory cell CELL 1,1 is the difference between the row and column voltages. As in this example, if the memory component is in a high resistance state, the voltage applied to the memory cell Vcell will be distributed across the serial OTS 102 and the bidirectional memory through a combination of current limited charging of the "ground" column line ROW1 and the row line COL1. Element 104. For the first approximation, the voltage distribution will be proportional to the resistance of the OTS 102 and the memory component 104. If their resistances are equal, the voltages will be equally distributed; if, for example, one of the devices (OTS or memory components) exhibits one-third of the total series resistance, it will face one-third of the voltage. In the illustrated embodiment, based on the memory in the high resistance state, the ratio of the peak read voltage facing the OTS (at the arrival time t2) is insufficient to trigger the OTS. According to the principle of the present invention, parameters such as a peak read voltage, a relative resistance of the memory element and the OTS, and an OTS limit voltage are selected such that if the unit is in its low resistance state, the OTS is triggered during the READ operation period t2, but if The unit is in its high resistance state (for example, 2/3 (peak READ) is greater than or equal to the limit voltage of OTS, but the smaller amount 1/2 (peak READ) is less than the limit voltage of OTS), OTS does not Triggered during a READ job. When the OTS is triggered, the voltage on the line drops to a lower voltage and the memory is in a low resistance state (having a low voltage across the OTS). If the transition of the OTS is excessive for the required threshold voltage V TH necessary for the memory, the transition is reduced while maintaining a higher V TH by using one or more OTSs in series (each having a lower V TH ). For example, thinner OTSs are stacked in series. Adjustments to the limits and transition voltages are discussed, for example, in U.S. Patent No. 7,280,390, the disclosure of which is incorporated herein by reference.

在時間t3,讀取輸出被閂鎖。t2與t3之間的延遲為將被存取之輸出感測放大器和為所選擇單元之行的電壓提供處理時間(例如,若記憶體元件處於低電阻狀態,OTS便有時間觸發及將行線路拉下至將被識別為低電阻狀態之位準,即"設定(SET)"或邏輯"1"狀態)。在本說明實施例中,READ信號之正向邊緣可用於閂鎖該時間(t3)為有效之資料。如標記DATA OUT之痕跡所描繪的,輸出資料為未定義直至t3(斜線部分),此時DATA OUT是有效的(在本說明實施例中為邏輯"0"),且READ信號之上升邊緣閂鎖該有效輸出。在本說明實施例中,輸入DATA IN為未定義,如斜線所表示的,並可處於自DATA OUT分離之信號線路上。At time t3, the read output is latched. The delay between t2 and t3 provides processing time for the output sense amplifier to be accessed and for the voltage of the row of selected cells (eg, if the memory component is in a low resistance state, the OTS has time to trigger and line the line) Pull down to the level that will be recognized as the low resistance state, ie "SET (SET)" or logic "1" state). In the illustrated embodiment, the forward edge of the READ signal can be used to latch the time (t3) to be valid. As depicted by the trace of the mark DATA OUT, the output data is undefined until t3 (hatched portion), at which time DATA OUT is valid (logic "0" in the illustrated embodiment), and the rising edge latch of the READ signal Lock the valid output. In the illustrated embodiment, the input DATA IN is undefined, as indicated by the slanted line, and may be on a signal line separated from the DATA OUT.

圖4B之時序圖描繪依據本發明之原理的讀取作業,其中被讀取之雙向記憶體單元(CELL 1,1)係處於低電阻、邏輯"1"、SET狀態。The timing diagram of Figure 4B depicts a read operation in accordance with the principles of the present invention in which the read bidirectional memory cells (CELL 1, 1) are in a low resistance, logic "1", SET state.

在時間t0,列一選擇信號ROW1和行一選擇信號COL1如陣列300內所有列和行信號,均處於"預充電"電壓V/2。如上列更詳細之描述,在時間t1時經由將RN1驅動為高並藉以開啟n通道FET RN1(RP1保持高且p通道FET 316"關閉"),列線路ROW1被驅動為0V;行線路COL1係經由藉將READ信號驅動為低(啟動p通道FET 302)並藉將CS1驅動為低而開啟雙向類比開關208所產生之電流脈衝而予充電。基於所應用之閘極電壓VREGP,調整通過p通道FET 304之電流以避免於READ作業期間干擾陣列300內所選擇之記憶體單元的記憶體狀態;必要時於過度電壓或電流流入記憶體單元中之前和發展適當信號而可靠地讀取記憶體之後,輔以關閉脈衝並停止讀取週期。At time t0, column one select signal ROW1 and row one select signal COL1, such as all column and row signals in array 300, are at "precharge" voltage V/2. As described in more detail above, at time t1, by driving RN1 high and thereby turning on n-channel FET RN1 (RP1 remains high and p-channel FET 316 "off"), column line ROW1 is driven to 0V; row line COL1 is The precharge is initiated by driving the READ signal low (starting p-channel FET 302) and turning CS1 low to turn on the current pulse generated by bidirectional analog switch 208. Adjusting the current through the p-channel FET 304 based on the applied gate voltage VREGP to avoid interfering with the memory state of the selected memory cell within the array 300 during READ operation; if necessary, excessive voltage or current flows into the memory cell After the memory is reliably read and the appropriate signal is developed, the shutdown pulse is applied and the read cycle is stopped.

跨越記憶體單元CELL 1,1之電壓Vcell為行與列電壓之間之差。通過"接地"列線路ROW1和行線路COL1之電流限制充電的組合之應用至記憶體單元Vcell之電壓將分佈跨越串聯OTS 102和雙向記憶體元件104。在本說明實施例中,記憶體元件104展現低電阻且大部分電壓Vcell下降跨越OTS 102。在時間t2,跨越OTS 102之電壓到達OTS 102之定限電壓,且OTS回應地觸發(即,進入低電阻狀態)。由於OTS 102和記憶體元件104現在係處於低電阻狀態,跨越記憶體單元之電壓Vcell便下降,如圖4B之Vcell痕跡中所表示的。The voltage Vcell across the memory cell CELL 1,1 is the difference between the row and column voltages. The voltage applied to the memory cell Vcell by the combination of current limited charging of the "ground" column line ROW1 and the row line COL1 will be distributed across the series OTS 102 and the bidirectional memory element 104. In the illustrated embodiment, memory element 104 exhibits low resistance and most of the voltage Vcell drops across OTS 102. At time t2, the voltage across OTS 102 reaches the threshold voltage of OTS 102, and the OTS responds to ground (ie, enters a low resistance state). Since the OTS 102 and the memory component 104 are now in a low resistance state, the voltage Vcell across the memory cell drops, as indicated by the Vcell trace in Figure 4B.

在本說明實施例中,供應電流至行線路COL1之p通道FET的導通電阻大於放電列線路ROW1之n通道FET的導通電阻,因此,行線路電壓COL1下降,同時列線路電壓實質上保持在0V。跨越e記憶體單元之電壓Vcell約下降至OTS保持電壓(VH )約1V與記憶體單元之電阻和流經之電流之總和,如圖4B中標記Vcell之痕跡所描繪的。較低電壓可於時間t3被感應,並適當地解譯為低電阻、"SET"、"1"狀態。如前所述,設計參數可調整,使得當記憶體元件處於低電阻狀態時OTS觸發,當記憶體元件處於高電阻狀態時OTS未觸發。另一方面,基於對較高電阻記憶體之相稱地較高之電壓,OTS對於任一記憶體狀態均觸發。在時間t3,讀取輸出被閂鎖,如有關圖4A之討論中更詳細之描述。In the illustrated embodiment, the on-resistance of the p-channel FET supplying current to the row line COL1 is greater than the on-resistance of the n-channel FET of the discharge column line ROW1, and therefore, the line line voltage COL1 is decreased, and the column line voltage is substantially maintained at 0V. . The voltage Vcell across the e-memory cell drops approximately to about the sum of the OTS hold voltage ( VH ) of about 1 V and the resistance of the memory cell and the current flowing therethrough, as depicted by the trace of the mark Vcell in Figure 4B. The lower voltage can be sensed at time t3 and properly interpreted as a low resistance, "SET", "1" state. As previously mentioned, the design parameters can be adjusted such that the OTS triggers when the memory component is in a low resistance state and the OTS is not triggered when the memory component is in a high resistance state. On the other hand, OTS is triggered for any memory state based on a relatively high voltage for a relatively high resistance memory. At time t3, the read output is latched as described in more detail in the discussion of Figure 4A.

圖4C之時序圖描繪依據本發明之原理的寫入"1"(低電阻)"SET"作業之序列。在本說明實施例中,程控記憶體單元為低電阻狀態(即,將邏輯"1"寫入記憶體)係經由以相同方向使電流流經記憶體單元而予完成,如前述讀取電流被迫流經一單元。如前述,用於程控一單元為低電阻狀態之脈衝產生電路,例如可使用較用於讀取該單元更多之電流。The timing diagram of Figure 4C depicts the sequence of writing a "1" (low resistance) "SET" operation in accordance with the principles of the present invention. In the illustrated embodiment, the programmable memory cell is in a low resistance state (ie, writing a logic "1" to the memory) is accomplished by flowing a current through the memory cell in the same direction, as described above. Forced to flow through a unit. As described above, a pulse generating circuit for programming a cell in a low resistance state, for example, can use more current for reading the cell.

在時間t0,列一選擇信號ROW1和行一選擇信號COL1均處於"預充電"電壓V/2。另一方面,V/3方法可用於改進寫入邊限。在本說明範例中,WRITE 1程序係經由於時間t1時將與記憶體單元CELL 1,1相關之行線路COL1驅動為高(朝向V+)及將與記憶體單元CELL 1,1相關之列線路ROW1驅動為低(至0V)而予啟動。在本說明實施例中,行線路COL1係於時間t1時經由藉確立WRITE 1信號和類比開關控制信號CS1所產生之電流脈衝而被充電為正電壓。At time t0, column one select signal ROW1 and row one select signal COL1 are both at "precharge" voltage V/2. On the other hand, the V/3 method can be used to improve the write margin. In the illustrated example, the WRITE 1 program drives the row line COL1 associated with the memory cell CELL 1,1 to be high (toward V+) and the column associated with the memory cell CELL 1,1 via time t1. The ROW1 driver is enabled low (to 0V). In the illustrated embodiment, the line line COL1 is charged to a positive voltage via the current pulse generated by the assertion of the WRITE 1 signal and the analog switch control signal CS1 at time t1.

如標記COL1之痕跡所表示的,所選擇之記憶體單元CELL 1,1之行線路開始而充電至高於V/2之正電壓。在相同時間,由標記ROW1之痕跡所代表之列線路被快速地從V/2放電至0V。由標記Vcell之痕跡所代表之記憶體單元電壓為行與列電壓之間之差。As indicated by the trace of mark COL1, the selected memory cell CELL 1,1 line begins to charge to a positive voltage above V/2. At the same time, the column line represented by the trace of the mark ROW1 is quickly discharged from V/2 to 0V. The memory cell voltage represented by the trace of the mark Vcell is the difference between the row and column voltages.

若記憶體元件104已處於低電阻狀態,大部分單元電壓Vcell將下降跨越OTS 102。結果,OTS將以極低單元電壓觸發,如COL1和Vcell圖中之標記LowR之虛線痕跡所表示。另一方面,若記憶體元件104處於高電阻狀態,單元電壓Vcell將依據OTS 102和記憶體元件104之相對電阻而分佈跨越OTS 102和記憶體元件104之串聯組合,且OTS 102將以較高單元電壓觸發,如COL1和Vcell痕跡中之標記high-R之虛線痕跡所表示。在兩狀況下,即記憶體單元之現有狀態為低電阻處及記憶體單元之現有狀態為高電阻處,OTS 102被觸發且充分電流被傳送至記憶體元件104,以於OTS觸發之後將其程控為邏輯"1"低電阻狀態。If the memory element 104 is already in a low resistance state, most of the cell voltage Vcell will fall across the OTS 102. As a result, the OTS will be triggered with very low cell voltages, as indicated by the dashed traces of the labeled LowR in the COL1 and Vcell plots. On the other hand, if the memory device 104 is in a high resistance state, the cell voltage Vcell will be distributed across the series combination of the OTS 102 and the memory device 104 depending on the relative resistance of the OTS 102 and the memory device 104, and the OTS 102 will be higher. The cell voltage is triggered, as indicated by the dashed trace of the mark high-R in the COL1 and Vcell traces. In both cases, where the existing state of the memory cell is low resistance and the existing state of the memory cell is high resistance, the OTS 102 is triggered and sufficient current is transferred to the memory component 104 to be used after the OTS trigger Program control is a logic "1" low resistance state.

圖4D之時序圖描繪依據本發明之原理的寫入"0"(高電阻)"重置"作業之序列。在本說明實施例中,程控記憶體單元為高電阻狀態(即,將邏輯"0"寫入記憶體)係經由以相反方向使電流流經記憶體單元而予完成,如前述寫入"1"電流被迫流經一單元。The timing diagram of Figure 4D depicts a sequence of writing a "0" (high resistance) "reset" job in accordance with the principles of the present invention. In the illustrated embodiment, the program-controlled memory cell is in a high-resistance state (ie, writing a logic "0" to the memory) by completing the current flowing through the memory cell in the opposite direction, as described above. "The current is forced to flow through a unit.

在時間t0,列一選擇信號ROW1和行一選擇信號COL1均處於"預充電"電壓V/2。在本說明範例中,WRITE 0程序係經由於時間t1時將與記憶體單元CELL 1,1相關之行線路COL1驅動為低(朝向V-,例如0V)及將與記憶體單元CELL 1,1相關之列線路ROW1驅動為高(至V+)而予啟動。此偏壓計畫產生電流以與READ或WRITE 1作業中使用之相反方向通過記憶體元件104。在本說明實施例中,行線路COL1經由於時間t1時藉確立WRITE 0信號和類比開關控制信號CS1所產生之電流脈衝而從V/2放電至0V。於時間t1時藉確立(驅動為低)信號RP1,而從通過p通道電晶體316之V+電源供應電流通過記憶體元件104。信號RN1保持"低",因此n通道FET 318保持"關閉"。At time t0, column one select signal ROW1 and row one select signal COL1 are both at "precharge" voltage V/2. In the illustrated example, the WRITE 0 program drives the line COL1 associated with the memory cell CELL 1,1 to be low (toward V-, eg, 0V) and to the memory cell CELL 1,1 via time t1. The associated column ROW1 is driven high (to V+) to start. This bias meter generates current to pass through the memory element 104 in the opposite direction as used in the READ or WRITE 1 operation. In the illustrated embodiment, row line COL1 is discharged from V/2 to 0V by establishing a WRITE 0 signal and a current pulse generated by analog switch control signal CS1 at time t1. The signal RP1 is asserted (driven low) at time t1, while current is supplied from the V+ supply through p-channel transistor 316 through memory element 104. Signal RN1 remains "low", so n-channel FET 318 remains "off."

如標記COL1之痕跡中所表示的,所選擇之記憶體單元CELL 1,1的行線路從V/2開始朝向0V放電。同時,由標記ROW1之痕跡中所代表之列線路快速地從V/2朝向V+充電。由標記Vcell之痕跡中所代表之記憶體單元電壓為行與列電壓之間之差。若記憶體元件104已處於低電阻狀態,大部分單元電壓Vcell將下降跨越OTS 102。結果,OTS將以極低的單元電壓觸發,如COL1和Vcell圖中之標記LowR之虛線痕跡所表示的。另一方面,若記憶體元件104處於高電阻狀態,如先前所描述的,單元電壓Vcell將依據OTS 102和記憶體元件104之相對電阻而分佈跨越OTS 102和記憶體元件104之串聯組合,且如COL1和Vcell痕跡中標記high-R之虛線痕跡所表示的,OTS 102將以較高單元電壓觸發。在兩狀況下,即記憶體單元之現有狀態為低電阻處及記憶體單元之現有狀態為高電阻處,OTS 102被觸發且充分電流被傳送至記憶體元件104,以於OTS觸發之後將其程控為邏輯"0"高電阻狀態。As indicated in the trace of the mark COL1, the row line of the selected memory cell CELL 1,1 is discharged from V/2 toward 0V. At the same time, the line represented by the trace of the mark ROW1 is quickly charged from V/2 toward V+. The memory cell voltage represented by the trace of the mark Vcell is the difference between the row and column voltages. If the memory element 104 is already in a low resistance state, most of the cell voltage Vcell will fall across the OTS 102. As a result, the OTS will be triggered with very low cell voltages, as indicated by the dashed traces of the labeled LowR in the COL1 and Vcell plots. On the other hand, if the memory component 104 is in a high resistance state, as previously described, the cell voltage Vcell will be distributed across the series combination of the OTS 102 and the memory component 104 depending on the relative resistance of the OTS 102 and the memory component 104, and As indicated by the dashed traces marked high-R in the COL1 and Vcell traces, the OTS 102 will trigger at a higher cell voltage. In both cases, where the existing state of the memory cell is low resistance and the existing state of the memory cell is high resistance, the OTS 102 is triggered and sufficient current is transferred to the memory component 104 to be used after the OTS trigger Program control is logic "0" high resistance state.

如先前所討論的,例如OTS觸發電壓之量的各式參數可加以調整以適於特定記憶體技術之需求。例如,與離子記憶體單元相關之讀取和寫入電壓為極低位準,典型地低於1V。用作該離子記憶體單元之陣列中之隔離裝置的OTS裝置可適於以例如2V觸發。As previously discussed, various parameters such as the amount of OTS trigger voltage can be adjusted to suit the needs of a particular memory technology. For example, the read and write voltages associated with ion memory cells are extremely low, typically below 1V. The OTS device used as an isolation device in the array of ion memory cells can be adapted to be triggered, for example, at 2V.

參照圖5,單元500可以耦合至裝置556和元件558之傳導字元線路552而於基板536上形成。層際介電質548可區隔積體電路組件546與雙向記憶體550。組件546可包括任一各類組件,例如邏輯閘、微處理器或記憶體。Referring to FIG. 5, unit 500 can be coupled to device 556 and conductive word line 552 of element 558 to form on substrate 536. The interlayer dielectric 548 can separate the integrated circuit component 546 from the bidirectional memory 550. Component 546 can include any of a variety of components, such as a logic gate, a microprocessor, or a memory.

在本說明實施例中,選擇裝置556為以非可程控硫族化物材料形成之OTS。該OTS包括頂電極571、硫族化物材料572及底電極570。選擇裝置556在一實施例中可永久處於非結晶狀態。雖然在一實施例中描繪選擇裝置556係設於雙向記憶體元件558之上,但亦可使用相反方位。具對稱電極之典型OTS具有相當對稱之特徵。其可經由例如改變電極而予調整。為了較佳的持久性可使用一或兩個鎢電極作為吸熱裝置。In the illustrated embodiment, selection device 556 is an OTS formed from a non-programmable chalcogenide material. The OTS includes a top electrode 571, a chalcogenide material 572, and a bottom electrode 570. The selection device 556 can be permanently in an amorphous state in one embodiment. Although the depiction device 556 is depicted on the bi-directional memory component 558 in one embodiment, the opposite orientation can also be used. A typical OTS with a symmetrical electrode is quite symmetrical. It can be adjusted, for example, by changing the electrodes. For better durability, one or two tungsten electrodes can be used as the heat sink.

如前述,雙向記憶體元件558可採用設定或重置狀態。在本發明之一實施例中,雙向記憶體元件558可包括絕緣體562、雙向記憶體材料564、頂電極566及屏障膜568。在本發明之一實施例中,下電極560可定義於絕緣體562內。As previously mentioned, the bidirectional memory element 558 can assume a set or reset state. In one embodiment of the invention, the bidirectional memory component 558 can include an insulator 562, a bidirectional memory material 564, a top electrode 566, and a barrier film 568. In an embodiment of the invention, the lower electrode 560 can be defined within the insulator 562.

雙向材料564可為適於特徵為兩狀態之非揮發性記憶體資料儲存之雙向材料。如前述,該材料可經由以一方向之電壓或電流的應用而程控為一狀態,及經由以相反方向之電壓或電流的應用而程控為另一狀態。該記憶體可經由類似電壓或電流信號或者較少量者,例如作為相同方向之寫入信號之一之應用而予讀取。The bi-directional material 564 can be a bi-directional material suitable for non-volatile memory data storage characterized by two states. As previously mentioned, the material can be programmed to a state via application of a voltage or current in one direction, and programmed to another state via application of a voltage or current in the opposite direction. The memory can be read via a similar voltage or current signal or a smaller amount, for example, as one of the write signals in the same direction.

記憶體材料之程控以改變材料之狀態,可經由施用電壓電位予線路552和554藉以產生跨越記憶體材料564之電壓電位而予完成。電流可回應施用之電壓電位而流經一部分記憶體材料564。Programmization of the memory material to change the state of the material can be accomplished by applying a voltage potential to lines 552 and 554 to create a voltage potential across memory material 564. Current can flow through a portion of the memory material 564 in response to the applied voltage potential.

在一說明實施例中,經由施用約0伏至線路552並供應約0.5至3.0伏至上方線路554,可施用約0.5至1.5伏之電壓電位差跨越一部分記憶體材料。回應所施用之電壓電位而流經記憶體材料564的電流可用於讀取或改變材料之狀態。In an illustrative embodiment, a voltage potential difference of about 0.5 to 1.5 volts may be applied across a portion of the memory material via application of about 0 volts to line 552 and supply of about 0.5 to 3.0 volts to upper line 554. The current flowing through the memory material 564 in response to the applied voltage potential can be used to read or change the state of the material.

例如經由測量記憶體材料之電阻,可讀取儲存於記憶體材料564中之資訊。例如,讀取電流可使用相對之線路554、552而提供予記憶體材料,且跨越記憶體材料之最終讀取電壓可使用例如感測放大器而與參考電壓比較。讀取電壓可與記憶體儲存元件所展現之電阻成比例。The information stored in the memory material 564 can be read, for example, by measuring the resistance of the memory material. For example, the read current can be supplied to the memory material using lines 554, 552, and the final read voltage across the memory material can be compared to the reference voltage using, for example, a sense amplifier. The read voltage can be proportional to the resistance exhibited by the memory storage element.

為選擇行554和列552之交點所定義之單元550,可觸發所選擇之單元550的OTS 556以便提供雙向存取。當啟動時,選擇裝置556允許電流以偏壓應用跨越單元550所決定之方向流經記憶體元件558,並實現READ、WRITE 0或WRITE 1作業。To select the cell 550 defined by the intersection of row 554 and column 552, the OTS 556 of the selected cell 550 can be triggered to provide bidirectional access. When activated, the selection device 556 allows current to flow through the memory element 558 in a direction determined by the biasing unit 550 and achieves a READ, WRITE 0 or WRITE 1 job.

在一些實施例中,當應用低電壓跨越OTS裝置556時,OTS裝置556便被關閉並展現極高電阻。此不論所應用電場之方向均為真。以定限電壓一半之偏壓,關閉電阻可介於例如105 歐姆至大於109 歐姆之範圍。經由例如硫族化物材料572之成分調整、硫族化物材料572之厚度調整或OTS裝置之"堆疊",例如定限電壓之OTS裝置特徵可適於個別應用。In some embodiments, when a low voltage is applied across the OTS device 556, the OTS device 556 is turned off and exhibits a very high resistance. This is true regardless of the direction of the applied electric field. The biasing resistance may be in the range of, for example, 10 5 ohms to more than 10 9 ohms with a bias voltage of half the limiting voltage. The OTS device features, such as the thresholding of the chalcogenide material 572, the thickness adjustment of the chalcogenide material 572, or the "stacking" of the OTS device, such as a threshold voltage, may be suitable for individual applications.

OTS裝置556可保持其關閉狀態直至定限電壓VTH 或定限電流ITH 將OTS裝置556切換為傳導、低電阻開啟狀態為止。在一說明實施例中,跨越裝置556之電壓於開啟之後降至較低電壓或動態電阻,稱為保持電壓VH ,只要充分電流IH 供應予該裝置,便保持VH 。定限電壓VTH 與保持電壓VH 之間之差共同稱為"轉折(snapback)"電壓,且電流/電壓圖之相應區域稱為轉折區域。基於低VTH ,轉折可為零。The OTS device 556 can maintain its off state until the threshold voltage VTH or the limiting current I TH switches the OTS device 556 to a conducting, low resistance open state. In one illustrative embodiment, the voltage across the device 556 is to the dynamic resistance to a lower voltage or after turning, called the holding voltage V H, as long as sufficient supply current I H to the apparatus, it remains V H. Given threshold voltage V TH and the difference between the holding voltage V H collectively as "transition (the snapback)" corresponding region voltage, and the current / voltage graph is called the transition region. Based on the low V TH , the transition can be zero.

作業中,依據本發明之原理施予記憶體單元500之存取信號並不即刻轉換單元電壓。即,在記憶體存取作業的時間段,存取信號逐漸朝目標存取電壓充電單元500及相關列和行線路。在充電程序期間,一部分跨越單元500之電壓增加而跨越OTS裝置556。隨著施予單元500之電壓增加,跨越OTS裝置556之電壓便到達OTS裝置556之定限電壓,此時OTS裝置556觸發並成為高度傳導,轉折為具低動態電阻之VH ,例如低於1000歐姆(取決於電極之選擇和電阻)。In operation, the access signal applied to the memory unit 500 in accordance with the principles of the present invention does not instantaneously convert the cell voltage. That is, during the time period of the memory access operation, the access signal gradually accesses the voltage charging unit 500 and the associated column and row lines toward the target. During the charging process, a portion of the voltage across cell 500 increases across OTS device 556. With the increase of the voltage administration unit 500, the voltage across the OTS device 556 will reach the predetermined threshold voltage OTS device 556, the OTS device 556 triggers at this time and becomes highly conductive, with a transition to a low dynamic resistance of V H, for example less than 1000 ohms (depending on electrode selection and resistance).

對第一近似值而言,於充電程序期間,下降而跨越OTS 556之單元電壓的比例係由"關閉"狀態之OTS 556的電阻對記憶體元件558的電阻之比例決定,其可經由改變每一跨越電壓而予改變。如前述,OTS 556之"OFF"電阻範圍上至109 歐姆或更高,結果,分析通常假設只要OTS 556保持處於關閉狀態,僅施用小部分單元電壓跨越記憶體元件558,大部分施予單元500之電壓便下降而跨越OTS 556。For the first approximation, the ratio of the cell voltage falling across the OTS 556 during the charging process is determined by the ratio of the resistance of the OTS 556 to the resistance of the memory element 558 in the "off" state, which can be varied by changing each Change across voltage. As previously mentioned, the "OFF" resistance of the OTS 556 ranges up to 109 ohms or higher. As a result, the analysis generally assumes that as long as the OTS 556 remains off, only a small portion of the cell voltage is applied across the memory element 558, most of the donor unit The voltage of 500 drops across the OTS 556.

此外,對第一近似值而言,分析通常假設一旦OTS裝置556觸發,跨越OTS裝置556之電壓便實質上保持在裝置的保持電壓VH ,且剩餘的單元電壓(Vcell-VH )下降而跨越記憶體元件558。如前述,最小電流IH 必須保持通過OTS以便電壓跨越OTS裝置556而下降至並保持在保持電壓VH 。通過OTS 556之電流應限制(例如經由記憶體元件558之電阻)為低於保持電流IH 之值,OTS裝置556將保持在"OFF"狀態,電壓降大於VH 且小於VTH ,而非約等於VHMoreover, for the first approximation, the analysis typically assumes that once the OTS device 556 triggers, the voltage across the OTS device 556 remains substantially at the device's holding voltage VH , and the remaining cell voltage (Vcell- VH ) drops across Memory element 558. As before, the minimum current I H must remain through the OTS so that the voltage drops across the OTS device 556 and remains at the hold voltage V H . The current through the OTS 556 should be limited (eg, via the resistance of the memory element 558) to a value below the holding current IH , and the OTS device 556 will remain in the "OFF" state with a voltage drop greater than VH and less than VTH , rather than Approximately equal to V H .

結果,若記憶體元件558處於高電阻狀態,且其在高電阻狀態展現限制通過OTS 556與記憶體元件558串聯之電流至低於OTS裝置556之保持電流IH 的電阻,OTS裝置556將保持OFF且跨越OTS裝置556之電壓將保持或低於裝置之定限電壓VTHOTS 。跨越記憶體裝置之電壓將為單元電壓與OTS電壓之間之差:Vcell-VOTSAs a result, if the memory element 558 is in a high resistance state and it exhibits a resistance in the high resistance state that limits the current in series with the memory element 558 through the OTS 556 to a lower current than the holding current I H of the OTS device 556, the OTS device 556 will remain OFF and the voltage across the OTS device 556 will remain at or below the device's threshold voltage V THOTS . The voltage across the memory device will be the difference between the cell voltage and the OTS voltage: Vcell-V OTS .

另一方面,若記憶體裝置處於高電阻狀態,且其在高電阻狀態展現足夠低之電阻而允許定限電流ITH 流動且跨越OTS之電壓超過VTH ,OTS 556將啟動且跨越OTS 556之電壓將下降至裝置之保持電壓,約為VH ,或更準確地:VH +Ixdv/di(VH +通過裝置之電流乘以處於觸發狀態時之動態電阻)。單元電壓之剩餘量將下降而跨越記憶體元件558。On the other hand, if the memory device is in a high resistance state and it exhibits a sufficiently low resistance in the high resistance state to allow the limiting current I TH to flow and the voltage across the OTS exceeds V TH , the OTS 556 will start and cross the OTS 556 The voltage will drop to the holding voltage of the device, approximately V H , or more accurately: V H +Ixdv/di (V H + current through the device multiplied by the dynamic resistance in the triggered state). The remaining amount of cell voltage will drop across memory element 558.

相似地,若記憶體元件558為其低電阻狀態,但低電阻狀態展現限制通過OTS 556與記憶體元件558串聯之電流至低於OTS裝置556之定限電流ITHH 的電阻,OTS裝置556將保持OFF且跨越OTS裝置556之電壓將保持低於或處於裝置之定限電壓VTHOTS 。跨越記憶體裝置之電壓將為單元電壓與OTS電壓之間之差:Vcell-VTHOTS 。若記憶體元件558為其低電阻狀態,且其在低電阻狀態展現足夠低之電阻而允許定限電流ITH 流動,OTS 556將啟動且跨越OTS 556之電壓將下降至裝置之保持電壓VH ,且單元電壓之剩餘量將下降而跨越記憶體元件558。OTS將保持啟動,除非通過裝置之電流下降而低於其保持電流IHSimilarly, if the memory element 558 is in its low resistance state, but the low resistance state exhibits a resistance that limits the current in series with the memory element 558 through the OTS 556 to a lower limit current ITH H than the OTS device 556, the OTS device 556 will The voltage that remains OFF and across the OTS device 556 will remain below or at the device's threshold voltage V THOTS . The voltage across the memory device will be the difference between the cell voltage and the OTS voltage: Vcell-V THOTS . If the memory element 558 is in its low resistance state and it exhibits a sufficiently low resistance in the low resistance state to allow the limiting current I TH to flow, the OTS 556 will start and the voltage across the OTS 556 will drop to the holding voltage of the device V H And the remaining amount of cell voltage will drop across memory element 558. The OTS will remain activated unless the current through the device drops below its holding current I H .

若OTS裝置556展現轉折(即,VTH >VH ),且記憶體元件558之電阻不夠達而可使OTS裝置556免於定限,在啟動狀態下,通過轉折區域之後,隨著通過裝置之電流增加直至極高電流位準,OTS裝置556電壓降便保持接近保持電壓。在定限電流位準之上,裝置觸發啟動且只要高於保持電流流動,裝置便保持啟動並顯示極低、有限的差動電阻,電壓降隨著增加之電流而增加,且處於投射在保持電壓VH 之截止零電流。OTS裝置556可保持啟動直至通過OTS裝置556之電流降至低於取決於尺寸和用於形成OTS裝置556之材料的特徵保持電流值。If the OTS device 556 exhibits a turning point (ie, V TH >V H ), and the resistance of the memory element 558 is insufficient to allow the OTS device 556 to be free from the limit, in the activated state, after passing through the turning region, the passing device The current increases until a very high current level, and the voltage drop of the OTS device 556 remains close to the hold voltage. Above the threshold current level, the device triggers the start and as long as the holding current flows, the device remains activated and displays a very low, finite differential resistance, the voltage drop increases with increasing current, and is projected to remain The cutoff zero current of the voltage V H . The OTS device 556 can remain activated until the current through the OTS device 556 drops below a characteristic retention current value that is dependent on the size and material used to form the OTS device 556.

在本發明的一些實施例中,OTS裝置556並未改變相位。其仍為永久非結晶且其電流-電壓特徵可於整個作業壽命期間保持相同的大體形狀和特徵。例如,在一實施例中,對以具16/13/15/1/55之各原子比例的TeAsGeSSe組成之0.5微米直徑裝置556而言,保持電流可約為0.1至100微安培。低於此保持電流,裝置556關閉並以低電壓、低電場返回至高電阻狀態。裝置556之定限電流通常約與保持電流相同。保持電流可經由改變程序變數而予改變,例如頂和底電極材料及硫族化物材料。相較於習知存取裝置例如金屬氧化物半導體場效電晶體或雙極接面電晶體,裝置556可提供裝置之特定區域的高"啟動電流密度"。In some embodiments of the invention, the OTS device 556 does not change phase. It is still permanently amorphous and its current-voltage characteristics can maintain the same general shape and characteristics throughout the life of the job. For example, in one embodiment, the holding current can be about 0.1 to 100 microamperes for a 0.5 micron diameter device 556 composed of TeAsGeSSe having a ratio of atoms of 16/13/15/1/55. Below this holding current, device 556 is turned off and returns to a high resistance state with a low voltage, low electric field. The limiting current of device 556 is typically about the same as the holding current. The holding current can be varied by changing the program variables, such as the top and bottom electrode materials and the chalcogenide material. Device 556 can provide a high "starting current density" for a particular region of the device as compared to conventional access devices such as metal oxide semiconductor field effect transistors or bipolar junction transistors.

在一些實施例中,"啟動"狀態之OTS裝置556的較高電流密度允許記憶體元件558可變之較高程控電流。其中記憶體元件558為雙向記憶體,此致能較大程控電流雙向記憶體裝置之使用,降低了配賦更多晶片區予配置單元區之需要,而具相當多的成本節省和改良的記憶體性能之電位。In some embodiments, the higher current density of the "on" state of the OTS device 556 allows the memory element 558 to have a variable higher program current. The memory component 558 is a bidirectional memory, which enables the use of a large program-controlled current bidirectional memory device, which reduces the need to allocate more wafer regions to the configuration unit region, and has considerable cost savings and improved memory. Performance potential.

一種用於定址雙向記憶體陣列之技術,使用施予所選擇之行的電壓V和施予所選擇之列的零電壓。對於元件558為雙向記憶體之狀況,所選擇之電壓V大於存取裝置556最大定限電壓加上記憶體元件558重置最大定限電壓,但小於兩倍的裝置556最大定限電壓。換言之,所有裝置556之最大定限電壓加上陣列內元件558之最大重置定限電壓,可小於V以確保所有單元均可選擇及程控。且在一些實施例中,V可小於兩倍的裝置556之最小定限電壓(加上定限OTS期間之最小記憶體單元元件電壓),以協助確保免於未選擇之記憶體單元的錯誤選擇。如前述,所有未選擇之列和行可偏壓V/2。基此方法,未選擇之列與未選擇之行之間沒有偏壓。此降低了背景洩漏電流。A technique for addressing a bidirectional memory array using a voltage V applied to a selected row and a zero voltage applied to the selected column. For the condition that component 558 is a bidirectional memory, the selected voltage V is greater than the maximum threshold voltage of access device 556 plus memory component 558 resets the maximum threshold voltage, but less than twice the maximum threshold voltage of device 556. In other words, the maximum threshold voltage of all devices 556 plus the maximum reset limit voltage of component 558 within the array can be less than V to ensure that all cells are selectable and programmable. And in some embodiments, V can be less than twice the minimum threshold voltage of device 556 (plus the minimum memory cell component voltage during the limited OTS period) to help ensure that the wrong selection of unselected memory cells is avoided. . As previously mentioned, all unselected columns and rows can be biased by V/2. By this method, there is no bias between the unselected column and the unselected row. This reduces the background leakage current.

在以此方式偏壓陣列之後,經由任何特定記憶體技術所需之裝置,記憶體元件558可被程控和讀取。例如經由驅使程控雙向記憶體元件所需之電流可程控使用雙向材料之記憶體元件558,或經由驅使下方電流可讀取記憶體陣列,以決定元件558之電阻。After biasing the array in this manner, memory element 558 can be programmed and read via the devices required by any particular memory technology. The resistance of element 558 can be determined, for example, by driving a current required to program the bidirectional memory element to program a memory element 558 using a bidirectional material, or by driving a lower current readable memory array.

依據本發明之原理的雙向記憶體陣列可使用周圍傳導線路以互連記憶體元件,及使用偏壓以連接設於雙向記憶體陣列之不同層的傳導線路和線路段。此外,該等記憶體陣列可使用"共用"位址線路。位址線路之共用和周圍互連線路之使用在本技藝中係已知的,並於例如公開號2006/0120136及申請號11/202,428之發明名稱為"Shared Address Lines For Crosspoint Memory"的美國專利申請案中揭露,其係併入本文作為參考。A bidirectional memory array in accordance with the principles of the present invention can use surrounding conductive traces to interconnect memory components and bias voltages to connect conductive traces and line segments disposed in different layers of the bidirectional memory array. In addition, the memory arrays can use "shared" address lines. The use of address lines and the use of surrounding interconnects are known in the art and are disclosed, for example, in the publication No. 2006/0120136 and the application No. 11/202,428, entitled "Shared Address Lines For Crosspoint Memory". It is disclosed in the application, which is incorporated herein by reference.

依據本發明之原理的雙向記憶體陣列亦可於各層中堆疊於彼此頂上。該等記憶體裝置之堆疊在本技藝中係已知的,並於例如發明名稱為"Memory Having Access Devices Using Phase Change Material Such As Chalcogenide"之美國專利6,795,338中揭露,其係併入本文作為參考。Bidirectional memory arrays in accordance with the principles of the present invention may also be stacked on top of one another in each layer. The stacking of such memory devices is known in the art and is disclosed, for example, in the U.S. Patent No. 6,795,338, the disclosure of which is incorporated herein by reference.

有關先前各圖之討論中所描述之雙向記憶體裝置,可用於廣泛各類系統之特別優點。圖6之示意圖將用於描繪少數該等系統中裝置的用途。圖6之示意圖包括許多組件和裝置,其中一些將用於依據本發明之原理的系統之特定實施例,其他則否。在其他實施例中,可使用其他類似系統、組件及裝置。通常,該等系統包括用於連同記憶體作業之邏輯電路。該等邏輯電路可為例如離散的、可程控的、具體應用的或為微處理器形式的。且文中實施例亦用於晶片內或連接至該等電路。The two-way memory device described in the discussion of the previous figures can be used for a particular advantage of a wide variety of systems. The schematic of Figure 6 will be used to depict the use of a device in a few such systems. The schematic of Figure 6 includes a number of components and devices, some of which will be used in particular embodiments of the system in accordance with the principles of the present invention, and others. In other embodiments, other similar systems, components, and devices may be used. Typically, such systems include logic circuitry for working with memory. The logic circuitry can be, for example, discrete, programmable, application specific, or in the form of a microprocessor. Embodiments herein are also used in or connected to the wafer.

圖6之示範系統僅係為說明之目的。儘管該描述可參照共用於描述特別電腦、通訊、追蹤及娛樂系統之術語,該描述和觀念等同地應用於其他系統,包括具有與圖6中所描繪之不同架構的系統。在各式實施例中,電子系統600可完成為例如通用電腦、路由器、大型資料儲存系統、可攜式電腦、個人數位助理、行動電話、例如音樂或視頻播放裝置或電子遊戲之電子娛樂裝置、微處理器、微控制器或音頻識別裝置。任一或所有圖6中所描繪之組件可使用具雙向硫族化物電子裝置選擇開關之記憶體,例如硫族化物基定限開關。The exemplary system of Figure 6 is for illustrative purposes only. Although the description may refer to terms commonly used to describe particular computer, communication, tracking, and entertainment systems, the description and concepts apply equally to other systems, including systems having different architectures than those depicted in FIG. In various embodiments, the electronic system 600 can be implemented as, for example, a general purpose computer, a router, a large data storage system, a portable computer, a personal digital assistant, a mobile phone, an electronic entertainment device such as a music or video playback device or a video game, A microprocessor, microcontroller or audio recognition device. Any or all of the components depicted in Figure 6 may enable the memory of the bi-directional chalcogenide electronics selection switch, such as a chalcogenide-based limit switch.

在一說明實施例中,系統600可包括可以一些或全部微處理器完成之中央處理單元(CPU)605、用於資訊之暫時儲存的隨機存取記憶體(RAM)610及用於資訊之永久儲存的唯讀記憶體(ROM)615。提供記憶體控制器620用以控制RAM 610。依據本發明之原理,任一記憶體元件(例如RAM或ROM)之所有或任一部分可完成為使用與雙向記憶體串聯之OTS的記憶體。In an illustrative embodiment, system 600 can include a central processing unit (CPU) 605 that can be implemented by some or all of the microprocessors, a random access memory (RAM) 610 for temporary storage of information, and permanent information for information. Stored read-only memory (ROM) 615. A memory controller 620 is provided for controlling the RAM 610. In accordance with the principles of the present invention, all or any portion of any memory component (e.g., RAM or ROM) can be implemented as a memory using an OTS in series with a two-way memory.

依據本發明之原理的電子系統600可為如CPU 605作業之微處理器,其與如RAM 610及/或ROM 615作業之記憶體組合,或作為其一部分。在本說明範例中,微處理器/硫族化物選擇開關組合可為獨立的電腦,或可與例如圖6尚未描述之其他組件作業。Electronic system 600 in accordance with the principles of the present invention may be a microprocessor operating as CPU 605, in combination with, or as part of, a memory such as RAM 610 and/or ROM 615. In the illustrated example, the microprocessor/chalcogenide selection switch combination can be a stand-alone computer or can operate with other components such as that not described in FIG.

在本發明之範圍內的完成中,匯流排630與系統600之組件互連。提供匯流排控制器625用以控制匯流排630。中斷控制器635可或不可用於接收及處理來自系統組件之各式中斷信號。例如匯流排630、匯流排控制器625及中斷控制器635之組件可用於依據本發明之原理之系統的大型完成,例如獨立的電腦、路由器、可攜式電腦或資料儲存系統。Busbar 630 is interconnected with components of system 600 in completion within the scope of the present invention. A bus bar controller 625 is provided for controlling the bus bar 630. Interrupt controller 635 may or may not be used to receive and process various interrupt signals from system components. Components such as bus 630, bus controller 625, and interrupt controller 635 can be used for large-scale completion of systems in accordance with the principles of the present invention, such as a stand-alone computer, router, portable computer, or data storage system.

軟碟片642、光碟(CD ROM)647或硬碟652可提供大量儲存。資料和軟體可經由例如軟碟片642及CD ROM 647之抽取式媒體而與系統600交換。軟碟片642可插入依序經由控制器640而連接至匯流排630之軟碟機641中。相似地,CD ROM 647可插入依序經由控制器645而連接至匯流排630之光碟機646中。硬碟652為固定式磁碟機651的一部分,後者經由控制器650而連接至匯流排630。儘管在依據本發明之原理的系統之描述中使用用於儲存裝置(例如軟碟片)之習知術語,但任一或全部儲存裝置可使用OTS作為與依據本發明之原理的雙向記憶體串聯之選擇裝置而予完成。可經由非揮發性儲存組件而提供抽取式儲存體,例如使用具依據本發明之原理的雙向記憶體之OTS作為儲存媒體的隨身碟。使用該等記憶體作為例如碟片、CD ROM或隨身碟之習知抽取式記憶體之"即插即用"替代品的儲存系統,可模擬現有控制器以提供用於例如控制器640、645和650之控制器的透明介面。A floppy disk 642, a compact disc (CD ROM) 647 or a hard disk 652 can provide a large amount of storage. The data and software can be exchanged with system 600 via removable media such as floppy disk 642 and CD ROM 647. The floppy disk 642 can be inserted into the floppy disk drive 641 connected to the bus bar 630 via the controller 640 in sequence. Similarly, the CD ROM 647 can be inserted into the optical disk drive 646 connected to the bus bar 630 via the controller 645 in sequence. Hard disk 652 is part of a fixed disk drive 651 that is coupled to bus bar 630 via controller 650. Although conventional terms for storage devices (e.g., floppy disks) are used in the description of a system in accordance with the principles of the present invention, any or all of the storage devices may use OTS as a series in parallel with a two-way memory in accordance with the principles of the present invention. The selection device is completed. The removable storage can be provided via a non-volatile storage component, such as a USB flash drive having a two-way memory in accordance with the principles of the present invention as a storage medium. Using such memory as a storage system for a "plug and play" alternative to a conventional removable memory such as a disc, CD ROM or flash drive, an existing controller can be simulated to provide, for example, a controller 640, 645. And the transparent interface of the 650 controller.

可經由任一多個裝置而提供至系統600之使用者輸入。例如,鍵盤656和滑鼠657係經由控制器655而連接至匯流排630。如所描繪的,可作為麥克風及喇叭的音頻轉換器696係經由音頻控制器697而連接至匯流排630。其他輸入裝置,例如筆及/或觸控板可視需要而連接至匯流排630及適當控制器和軟體,作為輸入裝置。如前述,提供直接記憶體存取(DMA)控制器660以執行對於RAM 610之直接記憶體存取,其可完整或部分使用依據本發明之原理的該等記憶體而予完成。視覺顯示裝置係經由控制顯示裝置670之視頻控制器665而產生。顯示裝置670可為適於特定應用之任意尺寸或技術。User input to system 600 can be provided via any of a number of devices. For example, keyboard 656 and mouse 657 are connected to bus bar 630 via controller 655. As depicted, an audio converter 696, which can function as a microphone and speaker, is coupled to bus bar 630 via audio controller 697. Other input devices, such as pens and/or trackpads, may be coupled to bus bar 630 and appropriate controllers and software as needed as input devices. As previously described, a direct memory access (DMA) controller 660 is provided to perform direct memory access to RAM 610, which may be accomplished in whole or in part using such memory in accordance with the principles of the present invention. The visual display device is generated via a video controller 665 that controls display device 670. Display device 670 can be any size or technology suitable for a particular application.

在行動電話或可攜式娛樂系統實施例中,例如,顯示裝置670可包括一或多項相當小(例如每一邊數英吋大小)的LCD顯示裝置。在大型資料儲存系統中,顯示裝置可完成為大型多螢幕、液晶顯示裝置(LCD)或有機發光二極體(OLED),包括例如定量點OLED。In a mobile phone or portable entertainment system embodiment, for example, display device 670 can include one or more relatively small (e.g., each side sized) LCD display device. In large data storage systems, the display device can be implemented as a large multi-screen, liquid crystal display (LCD) or organic light emitting diode (OLED), including, for example, a point-of-sale OLED.

系統600可包括通訊適配器690,其允許系統互連至由匯流排691和網路695示意描繪之區域網路(LAN)或廣域網路(WAN)。輸入介面699與輸入裝置693共同作業以允許使用者傳送資訊予系統600,不論指令和控制、資料或其他類型之資訊。輸入裝置和介面可為任意多項共同介面裝置,例如搖桿、觸控板、觸控螢幕、語音識別裝置或其他已知之輸入裝置。在依據本發明之原理的系統之一些實施例中,適配器690可連同收發器673和天線675作業以提供用於例如行動電話、無線射頻識別(RFID)及無線寬帶(wifi)電腦實施之無線通訊。System 600 can include a communication adapter 690 that allows the system to be interconnected to a local area network (LAN) or wide area network (WAN) that is schematically depicted by bus 691 and network 695. Input interface 699 operates in conjunction with input device 693 to allow the user to transmit information to system 600 regardless of instructions and controls, data or other types of information. The input device and interface can be any number of common interface devices, such as a joystick, trackpad, touch screen, voice recognition device, or other known input device. In some embodiments of a system in accordance with the principles of the present invention, adapter 690 can operate in conjunction with transceiver 673 and antenna 675 to provide wireless communication for implementation, such as mobile phones, radio frequency identification (RFID), and wireless broadband (wifi) computers. .

系統600之作業通常係由作業系統軟體控制及配位。作業系統控制系統資源之配置並執行工作,例如事件之間的處理排程、記憶體管理、網路連線及輸入/輸出(I/O)服務。特別是,駐於系統記憶體中並於CPU 605上執行之作業系統配位系統600之其他元件的作業。The operation of system 600 is typically controlled and coordinated by the operating system software. The operating system controls the configuration and execution of system resources, such as processing schedules between events, memory management, network cabling, and input/output (I/O) services. In particular, the operation of other components of the operating system coordination system 600 resident in the system memory and executed on the CPU 605.

在依據本發明之原理的系統600之說明手持式電子裝置實施例中,例如行動電話、個人數位助理、電子行事曆、筆記型電腦、手持式資訊裝置、例如播放音樂及/或視頻之裝置的手持式娛樂裝置、及本技藝中已知之例如小鍵盤、功能鍵和軟鍵之小型輸入裝置,可用以替代例如控制器655、鍵盤656及滑鼠657。具發射器、記錄能力等之實施例亦可包括麥克風輸入(未顯示)。In a handheld electronic device embodiment in accordance with the principles of the present invention, for example, a mobile phone, a personal digital assistant, an electronic calendar, a notebook computer, a handheld information device, such as a device for playing music and/or video. Handheld entertainment devices, as well as small input devices such as keypads, function keys, and soft keys known in the art, may be substituted for, for example, controller 655, keyboard 656, and mouse 657. Embodiments with transmitters, recording capabilities, etc. may also include a microphone input (not shown).

在依據本發明之原理的系統600之說明RFID詢答機實施中,天線675可用以攔截來自基地台之頻率F1 的詢問信號。所攔截之詢問信號接著將用以引導調諧電路(未顯示)而接受信號F1 並拒絕所有其他信號。該信號接著傳送至收發器673,此處以已知的方式檢測、放大及定型包含詢問信號之載波F1 的調變。所檢測之詢問信號接著傳送至解碼器和邏輯電路,其可以例如低功率應用而完成為離散邏輯,或作為如前述之微處理器/記憶體組合。詢問信號調變可定義一碼予自依據本發明之原理的OTS選擇記憶體讀取資料或將資料寫入該OTS選擇記憶體。在本說明實施例中,自記憶體讀取之資料被轉移至收發器673作為第二或頻F2 之天線675上的"應答"信號。在被動RFID系統電力係源自於詢問信號,且依據本發明之原理的記憶體特別適於該等用途。In the RFID interrogator implementation of system 600 in accordance with the principles of the present invention, antenna 675 can be used to intercept interrogation signals from frequency F 1 of the base station. The intercepted interrogation signal is then used to guide the tuning circuit (not shown) receives the signal F 1 and rejects all other signals. This signal is then passed to a transceiver 673 where the modulation of the carrier F 1 containing the interrogation signal is detected, amplified and shaped in a known manner. The detected interrogation signal is then passed to a decoder and logic circuit, which may be implemented as discrete logic, such as a low power application, or as a microprocessor/memory combination as described above. The interrogation signal modulation can define a code from the OTS selection memory in accordance with the principles of the present invention to read data or to write data to the OTS selection memory. In the present illustrative embodiment, data read from the memory is transferred to the transceiver 673 or as a second frequency F "response" signal on the antenna 6752. The passive RFID system power system is derived from interrogation signals, and memory in accordance with the principles of the present invention is particularly well suited for such applications.

100...雙向寫入記憶體單元100. . . Bidirectional write memory unit

102...雙向定限開關(OTS)102. . . Bidirectional limit switch (OTS)

104...雙向記憶體元件104. . . Two-way memory component

106、110...第一端子106, 110. . . First terminal

108、112...第二端子108, 112. . . Second terminal

200...雙向記憶體陣列200. . . Two-way memory array

201、203...選擇電路201, 203. . . Selection circuit

202...雙向記憶體單元202. . . Two-way memory unit

204、206、208、210...雙向開關204, 206, 208, 210. . . Bidirectional switch

300...交叉點記憶體陣列300. . . Crosspoint memory array

302、304、306、308、316、328、332...p通道場效電晶體302, 304, 306, 308, 316, 328, 332. . . P-channel field effect transistor

310、312、318、330、334...n通道場效電晶體310, 312, 318, 330, 334. . . N-channel field effect transistor

314...解碼電路314. . . Decoding circuit

500...單元500. . . unit

536...基板536. . . Substrate

546...積體電路組件546. . . Integrated circuit component

548...層際介電質548. . . Interlayer dielectric

550...雙向記憶體550. . . Two-way memory

552...傳導字元線路552. . . Conducted word line

554...線路554. . . line

556...選擇裝置556. . . Selection device

558...雙向記憶體元件558. . . Two-way memory component

560...下電極560. . . Lower electrode

562...絕緣體562. . . Insulator

564...雙向記憶體材料564. . . Two-way memory material

566、571...頂電極566,571. . . Top electrode

568...屏障膜568. . . Barrier film

570...底電極570. . . Bottom electrode

572...硫族化物材料572. . . Chalcogenide material

600...電子系統600. . . electronic system

605...中央處理單元605. . . Central processing unit

610...隨機存取記憶體610. . . Random access memory

615...唯讀記憶體615. . . Read only memory

620...記憶體控制器620. . . Memory controller

625...匯流排控制器625. . . Bus controller

630、691...匯流排630, 691. . . Busbar

635...中斷控制器635. . . Interrupt controller

640、645、650、655...控制器640, 645, 650, 655. . . Controller

641...軟碟機641. . . Floppy disk player

642...軟碟片642. . . Soft disk

646...光碟機646. . . CD player

647...光碟647. . . Disc

651...固定式磁碟機651. . . Fixed disk drive

652...硬碟652. . . Hard disk

656...鍵盤656. . . keyboard

657...滑鼠657. . . mouse

660...直接記憶體存取控制器660. . . Direct memory access controller

665...視頻控制器665. . . Video controller

670...顯示裝置670. . . Display device

673...收發器673. . . transceiver

675...天線675. . . antenna

690...通訊適配器690. . . Communication adapter

693...輸入裝置693. . . Input device

695...網路695. . . network

696...音頻轉換器696. . . Audio converter

697...音頻控制器697. . . Audio controller

699...輸入介面699. . . Input interface

圖1為依據本發明之原理的雙向記憶體單元之概念方塊圖;1 is a conceptual block diagram of a two-way memory unit in accordance with the principles of the present invention;

圖2為依據本發明之原理的雙向記憶體陣列之概念方塊圖;2 is a conceptual block diagram of a bidirectional memory array in accordance with the principles of the present invention;

圖3為依據本發明之原理的雙向記憶體陣列之更詳細方塊圖;3 is a more detailed block diagram of a two-way memory array in accordance with the principles of the present invention;

圖4A至4D為依據本發明之原理的雙向記憶體之說明作業之時序圖;4A through 4D are timing diagrams illustrating the operation of the bidirectional memory in accordance with the principles of the present invention;

圖5為依據本發明之原理的說明雙向記憶體單元之透視圖;及Figure 5 is a perspective view showing a two-way memory unit in accordance with the principles of the present invention;

圖6為一電子系統的概念方塊圖,該電子系統包括依據本發明之原理的雙向記憶體陣列。6 is a conceptual block diagram of an electronic system including a two-way memory array in accordance with the principles of the present invention.

100...雙向寫入記憶體單元100. . . Bidirectional write memory unit

102...雙向定限開關(OTS)102. . . Bidirectional limit switch (OTS)

104...雙向記憶體元件104. . . Two-way memory component

106、110...第一端子106, 110. . . First terminal

108、112...第二端子108, 112. . . Second terminal

Claims (5)

一種用於存取一雙向記憶體之裝置,包含:以矩形陣列配置之複數雙向記憶體單元,具有提供存取每一單元之列和行存取線路,每一雙向記憶體單元包括一雙向定限開關和一雙向記憶體元件,該雙向定限開關係用於封鎖對於該雙向記憶體元件之疏忽存取;及複數電源,其中至少兩電源為相反的電流極性,該等電源係用於經由將相反指向之電流耦合至該些記憶體單元而存取一雙向記憶體單元。 An apparatus for accessing a bidirectional memory, comprising: a plurality of bidirectional memory cells arranged in a rectangular array, having a column for accessing each cell and a row access line, each bidirectional memory cell comprising a bidirectional a limit switch and a bidirectional memory element for blocking inadvertent access to the bidirectional memory element; and a plurality of power supplies, wherein at least two of the power supplies are opposite current polarities, the power supplies being used for A current directed opposite is coupled to the memory cells to access a two-way memory cell. 如申請專利範圍第1項之裝置,其中該雙向記憶體單元包含一電阻性隨機存取記憶體。 The device of claim 1, wherein the bidirectional memory unit comprises a resistive random access memory. 如申請專利範圍第1項之裝置,其中該雙向記憶體單元包含一磁電阻性隨機存取記憶體。 The device of claim 1, wherein the bidirectional memory unit comprises a magnetoresistive random access memory. 如申請專利範圍第1項之裝置,其中該雙向記憶體單元包含一鐵電隨機存取記憶體。 The device of claim 1, wherein the two-way memory unit comprises a ferroelectric random access memory. 如申請專利範圍第1項之裝置,其中該雙向記憶體單元包含一金屬奈米粒子記憶體。The device of claim 1, wherein the two-way memory unit comprises a metal nanoparticle memory.
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