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TWI493063B - Coating, articles coated with the coating, and method for manufacturing the articles - Google Patents

Coating, articles coated with the coating, and method for manufacturing the articles Download PDF

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TWI493063B
TWI493063B TW099127677A TW99127677A TWI493063B TW I493063 B TWI493063 B TW I493063B TW 099127677 A TW099127677 A TW 099127677A TW 99127677 A TW99127677 A TW 99127677A TW I493063 B TWI493063 B TW I493063B
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film layer
layer
gradient film
coating
hard substrate
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TW099127677A
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Chinese (zh)
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TW201209200A (en
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Hsin Pei Chang
wen rong Chen
Huan Wu Chiang
Cheng Shi Chen
Zhi-Jie Hu
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Hon Hai Prec Ind Co Ltd
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Description

塗層、具有該塗層的被覆件及該被覆件的製備方法 Coating, covering member having the coating, and preparation method of the coated member

本發明涉及一種塗層、具有該塗層的被覆件及該被覆件的製備方法,特別涉及一種以真空鍍膜的方式形成的塗層、具有該塗層的被覆件及該被覆件的製備方法。 The present invention relates to a coating, a coated article having the same, and a method of preparing the coated member, and more particularly to a coating formed by vacuum coating, a coated member having the coating, and a method of preparing the coated member.

真空鍍膜工藝在工業領域有著廣泛的應用,其中,TiN薄膜鍍覆在刀具或模具表面能大幅提高刀具和模具的使用壽命。然而,隨著金屬切削加工朝高切削速度、高進給速度、高可靠性、長壽命、高精度和良好的切削控制性方面發展,對表面塗層的性能提出了更高的要求。傳統的TiN塗層在硬度、韌性等方面已經不能滿足要求。 The vacuum coating process has a wide range of applications in the industrial field. Among them, the coating of TiN film on the surface of the tool or mold can greatly improve the service life of the tool and the mold. However, as metal cutting progresses toward high cutting speeds, high feed rates, high reliability, long life, high precision, and good cutting control, higher demands are placed on the performance of surface coatings. Conventional TiN coatings have been unable to meet the requirements in terms of hardness and toughness.

ZrN薄膜由於其硬度與韌性均優於TiN薄膜而受到人們的廣泛關注。但單一的ZrN薄膜在硬度、耐磨性等方面幾乎已經沒有提高的空間,很難滿足現代工業的需求。 ZrN films have attracted much attention due to their hardness and toughness being superior to those of TiN films. However, the single ZrN film has almost no room for improvement in hardness and wear resistance, and it is difficult to meet the needs of modern industry.

中國專利CN100480043C中提到在金屬、硬質合金或陶瓷的硬質基體上沉積ZrN/Al2(O1-xNX)3奈米複合塗層,這種奈米複合塗層的硬度超過30GPa,但其耐磨性並沒有提高。 Chinese patent CN100480043C mentions the deposition of a ZrN/Al 2 (O 1-x N X ) 3 nanocomposite coating on a hard substrate of metal, cemented carbide or ceramic. The hardness of this nanocomposite coating exceeds 30 GPa, but Its wear resistance has not improved.

有研究發現ZrB2薄膜具有高硬度、高耐腐蝕性等優點,可作為超 硬工具材料及表面保護材料。但由於ZrB2本身係一種易碎材料,其韌性及耐磨性差,使其在刀具或模具塗層上的應用受到了限制。 Studies have found that ZrB 2 film has the advantages of high hardness, high corrosion resistance, etc., and can be used as a superhard tool material and a surface protection material. However, since ZrB 2 itself is a friable material, its toughness and wear resistance are poor, which limits its application to tool or mold coating.

有鑒於此,有必要提供一種具有高硬度、良好的耐腐蝕性及耐磨性的塗層。 In view of this, it is necessary to provide a coating having high hardness, good corrosion resistance, and abrasion resistance.

另外,有必要提供一種具有上述塗層的被覆件。 In addition, it is necessary to provide a covering having the above coating.

還有必要提供一種上述被覆件的製備方法。 It is also necessary to provide a method of preparing the above-mentioned covering member.

一種塗層,形成於一硬質基體表面上,該塗層包括一梯度膜層,.該梯度膜層為一ZrBN層,該梯度膜層中N原子及B原子的個數含量由靠近該硬質基體至遠離該硬質基體的方向呈梯度增加,該塗層還包括一形成於該梯度膜層上的顏色層。 a coating formed on a surface of a hard substrate, the coating comprising a gradient film layer, wherein the gradient film layer is a ZrBN layer, and the number of N atoms and B atoms in the gradient film layer is close to the hard matrix The gradient increases in a direction away from the hard substrate, and the coating further includes a color layer formed on the gradient film layer.

一種被覆件,包括一硬質基體及形成在該硬質基體上的一塗層,該塗層包括形成於該硬質基體上的一梯度膜層,該梯度膜層為一ZrBN層,該梯度膜層中N原子及B原子的個數含量由靠近該硬質基體至遠離該硬質基體的方向呈梯度增加,該塗層還包括一形成於該梯度膜層上的顏色層。 A coated member comprising a hard substrate and a coating formed on the hard substrate, the coating comprising a gradient film layer formed on the hard substrate, the gradient film layer being a ZrBN layer, wherein the gradient film layer The number of N atoms and B atoms increases in a gradient from the hard matrix to a direction away from the hard matrix, and the coating further includes a color layer formed on the gradient film layer.

一種被覆件的製備方法,包括以下步驟:提供一硬質基體;在該硬質基體的表面磁控濺射一梯度膜層,該梯度膜層為一ZrBN層,該梯度膜層中N原子及B原子的個數含量由靠近該硬質基體至遠離該硬質基體的方向呈梯度增加; 在該梯度膜層的表面鍍覆一顏色層。 A method for preparing a coated member, comprising the steps of: providing a hard substrate; magnetron sputtering a gradient film layer on the surface of the hard substrate, the gradient film layer being a ZrBN layer, and the N and B atoms in the gradient film layer The amount of the content increases in a gradient from the hard matrix to a direction away from the hard matrix; A color layer is plated on the surface of the gradient film layer.

相較於習知技術,所述梯度膜層與硬質基體結合處N原子及B原子的含量較低,梯度膜層主要表現為Zr的金屬相,具有與硬質基體較相近的熱膨脹係數,因此介面處內應力小,從而使所述梯度膜層的結合力強、韌性高;該梯度膜層的表層N原子及B原子的含量較高,梯度膜層主要表現為BN相、ZrB2相及ZrN相,避免了單一ZrB2相易脆而導致的塗層韌性及耐磨性差的缺點,同時由於BN及ZrB2的具有硬度高及耐腐蝕性高的優點,顯著提高了梯度膜層硬度及耐腐蝕性。所述梯度膜層的硬度、韌性的提高及梯度膜層與結合層之間結合力的增強,可顯著地提高所述塗層的耐磨性。 Compared with the prior art, the content of the N atom and the B atom in the junction of the gradient film layer and the hard matrix is relatively low, and the gradient film layer mainly exhibits a metal phase of Zr, and has a thermal expansion coefficient similar to that of the hard matrix, so the interface The internal stress is small, so that the gradient film layer has strong bonding force and high toughness; the gradient film layer has a high content of surface N atoms and B atoms, and the gradient film layer mainly exhibits BN phase, ZrB 2 phase and ZrN. The phase avoids the disadvantages of poor toughness and wear resistance of the coating due to the brittleness of a single ZrB 2 phase. At the same time, due to the high hardness and high corrosion resistance of BN and ZrB 2 , the hardness and resistance of the gradient layer are significantly improved. Corrosive. The improvement of the hardness and toughness of the gradient film layer and the enhancement of the bonding force between the gradient film layer and the bonding layer can significantly improve the wear resistance of the coating layer.

10‧‧‧塗層 10‧‧‧ Coating

11‧‧‧梯度膜層 11‧‧‧ Gradient film

13‧‧‧顏色層 13‧‧‧ color layer

20‧‧‧結合層 20‧‧‧bonding layer

30‧‧‧硬質基體 30‧‧‧hard substrate

40‧‧‧被覆件 40‧‧‧Cladding

圖1為本發明較佳實施例的塗層的剖視圖;圖2為本發明較佳實施例的被覆件的剖視圖;圖3為本發明較佳實施例的被覆件的製備方法的流程圖。 1 is a cross-sectional view of a coating according to a preferred embodiment of the present invention; FIG. 2 is a cross-sectional view of a coated member in accordance with a preferred embodiment of the present invention; and FIG. 3 is a flow chart showing a method of preparing a coated member in accordance with a preferred embodiment of the present invention.

為了使本發明的目的、技術方案及優點更加清楚明白,以下結合附圖與實施例對本發明進行進一步詳細說明。 The present invention will be further described in detail below with reference to the accompanying drawings and embodiments.

請參閱圖1,本發明一較佳實施例的塗層10包括一梯度膜層11,該塗層10形成於一硬質基體30的表面。該硬質基體30的材質可為高速鋼、硬質合金及不銹鋼等。 Referring to FIG. 1, a coating 10 according to a preferred embodiment of the present invention includes a gradient film layer 11 formed on a surface of a rigid substrate 30. The material of the hard substrate 30 may be high speed steel, hard alloy, stainless steel or the like.

該梯度膜層11為一ZrBN層,其厚度為0.5~2μm。該梯度膜層11藉由磁控濺射法沉積形成。在該梯度膜層11中,N原子及B原子的個數含量均隨著該梯度膜層11厚度的增加而增加,即N原子及B原子 在該梯度膜層11中的個數含量由靠近硬質基體30至遠離硬質基體30的方向均呈梯度增加。 The gradient film layer 11 is a ZrBN layer having a thickness of 0.5 to 2 μm. The gradient film layer 11 is formed by magnetron sputtering deposition. In the gradient film layer 11, the number of N atoms and B atoms increases as the thickness of the gradient film layer 11 increases, that is, N atoms and B atoms. The number of contents in the gradient film layer 11 increases in a gradient from the hard substrate 30 to the direction away from the hard substrate 30.

可以理解的,在該梯度膜層11的表面還可鍍覆一顏色層13,以增強該塗層10的美觀性。 It can be understood that a color layer 13 can also be plated on the surface of the gradient film layer 11 to enhance the aesthetic appearance of the coating layer 10.

請參閱圖2,本發明一較佳實施例的被覆件40包括一硬質基體30、形成於該硬質基體30的一結合層20及形成於該結合層20上的塗層10。該被覆件40可為各類切削刀具、精密量具或模具。 Referring to FIG. 2, a covering member 40 according to a preferred embodiment of the present invention includes a rigid substrate 30, a bonding layer 20 formed on the rigid substrate 30, and a coating layer 10 formed on the bonding layer 20. The covering member 40 can be any type of cutting tool, precision measuring tool or mold.

該結合層20用以提高塗層10與硬質基體30之間的結合力。本實施例中,該結合層20為一Zr層,其厚度為100~200nm。該結合層20藉由磁控濺射法沉積形成。 The bonding layer 20 serves to increase the bonding force between the coating 10 and the hard substrate 30. In this embodiment, the bonding layer 20 is a Zr layer having a thickness of 100 to 200 nm. The bonding layer 20 is formed by magnetron sputtering deposition.

請進一步參見圖3,製作所述被覆件40的方法主要包括如下步驟: Referring to FIG. 3, the method for fabricating the covering member 40 mainly includes the following steps:

S1:提供一硬質基體30。 S1: A rigid substrate 30 is provided.

S2:對該硬質基體30進行前處理。 S2: Pre-treating the hard substrate 30.

依次用去離子水和無水乙醇對該硬質基體30表面進行擦拭,將擦拭後的硬質基體30放入盛裝有丙酮溶液的超聲波清洗器中進行震動清洗,以除去硬質基體30表面的雜質和油污等。清洗完畢後吹幹備用。 The surface of the hard substrate 30 is wiped with deionized water and absolute ethanol in this order, and the wiped hard substrate 30 is placed in an ultrasonic cleaner containing an acetone solution for vibration cleaning to remove impurities and oil on the surface of the hard substrate 30. . After cleaning, blow dry and set aside.

對經上述處理後的硬質基體30的表面進行電漿清洗,以去除硬質基體30表面的雜質,同時增加硬質基體30表面的粗糙度,以改善硬質基體30表面與後續塗層的結合力。對硬質基體30的表面進行電漿清洗的方法包括如下步驟:將硬質基體30放入一射頻磁控濺 射鍍膜機的鍍膜室內,抽真空至真空度為1.0×10-3Pa,以250~600sccm的流量向鍍膜室中通入純度為99.999%的氬氣,並施加-300~-800V的偏壓於硬質基體30,對硬質基體30表面進行電漿清洗,清洗時間為10~15min。 The surface of the hard substrate 30 subjected to the above treatment is subjected to plasma cleaning to remove impurities on the surface of the hard substrate 30 while increasing the roughness of the surface of the hard substrate 30 to improve the bonding force between the surface of the hard substrate 30 and the subsequent coating. The method for plasma cleaning the surface of the hard substrate 30 comprises the steps of: placing the hard substrate 30 in a coating chamber of a radio frequency magnetron sputtering coating machine, and evacuating to a vacuum of 1.0×10 -3 Pa to 250~ A flow rate of 600 sccm was passed through the coating chamber to an argon gas having a purity of 99.999%, and a bias of -300 to -800 V was applied to the hard substrate 30, and the surface of the hard substrate 30 was plasma-cleaned for 10 to 15 minutes.

S3:於該硬質基體30上形成一結合層20。 S3: A bonding layer 20 is formed on the hard substrate 30.

該結合層20為一Zr層。本實施例中,製備該結合層20包括如下步驟:在對硬質基體30進行電漿清洗後,開啟一安裝於磁控濺射鍍膜機的鍍膜室內的鋯靶的電源,設置其功率為150~200W,並對硬質基體30施加-100~-250V的偏壓,調節氬氣流量至100~200sccm,加熱鍍膜室至150~300℃(即濺射溫度為150~300℃),沉積結合層20。沉積該結合層20的時間為5~10min。 The bonding layer 20 is a Zr layer. In this embodiment, the bonding layer 20 is prepared by the following steps: after the plasma cleaning of the hard substrate 30, the power supply of the zirconium target installed in the coating chamber of the magnetron sputtering coating machine is turned on, and the power is set to 150~ 200W, apply a bias voltage of -100~-250V to the hard substrate 30, adjust the flow rate of argon gas to 100~200sccm, heat the coating chamber to 150~300 °C (ie, the sputtering temperature is 150~300 °C), and deposit the bonding layer 20 . The time for depositing the bonding layer 20 is 5 to 10 minutes.

S4:於該結合層20上形成一梯度膜層11。 S4: forming a gradient film layer 11 on the bonding layer 20.

該梯度膜層11為一ZrBN層。製備該梯度膜層11時,以氮氣為反應氣體,藉由調節氮氣的流量及硼靶的功率隨沉積時間呈梯度變化,而使N原子及B原子在該梯度膜層11中的個數含量由靠近硬質基體30至遠離硬質基體30的方向均呈梯度變化。本實施例中,製備該梯度膜層11包括如下步驟:形成所述結合層20後,以5~25sccm的流量向鍍膜室中通入純度為99.999%的氮氣,同時開啟鋯靶和硼靶的電源,設置鋯靶的功率為150~200W、硼靶的功率為100~200W,沉積梯度膜層11。在沉積梯度膜層11的過程中,每沉積15min將氮氣的流量增大5~25sccm、硼靶的功率增加20~40W。沉積該梯度膜層11的時間為45~90min 。 The gradient film layer 11 is a ZrBN layer. When the gradient film layer 11 is prepared, the number of N atoms and B atoms in the gradient film layer 11 is adjusted by adjusting the flow rate of the nitrogen gas and the power of the boron target according to the deposition time with nitrogen as the reaction gas. The gradient changes from a direction close to the hard substrate 30 to away from the hard substrate 30. In this embodiment, the preparation of the gradient film layer 11 includes the following steps: after forming the bonding layer 20, a nitrogen gas having a purity of 99.999% is introduced into the coating chamber at a flow rate of 5 to 25 sccm, and the zirconium target and the boron target are simultaneously turned on. The power source is set to have a power of 150 to 200 W for the zirconium target and 100 to 200 W for the boron target, and a gradient film layer 11 is deposited. In the process of depositing the gradient film layer 11, the flow rate of the nitrogen gas is increased by 5 to 25 sccm and the power of the boron target is increased by 20 to 40 W for every 15 minutes of deposition. The time for depositing the gradient film layer 11 is 45 to 90 minutes. .

關閉偏壓及鋯靶、硼靶的電流,停止通入氬氣及氮氣,待所述梯度膜層11冷卻後,向鍍膜室內通入空氣,打開鍍膜室門,取出鍍覆有結合層20及梯度膜層11的硬質基體30。 The bias voltage and the current of the zirconium target and the boron target are turned off, and the argon gas and the nitrogen gas are stopped. After the gradient film layer 11 is cooled, air is introduced into the coating chamber, the coating chamber door is opened, and the plating layer 20 is removed and plated. The hard substrate 30 of the gradient film layer 11.

可以理解的,製備所述被覆件40的方法還可包括在該梯度膜層11的表面鍍覆一顏色層13,以增強被覆件40的美觀性。 It is to be understood that the method of preparing the covering member 40 may further include plating a color layer 13 on the surface of the gradient film layer 11 to enhance the aesthetics of the covering member 40.

上述被覆件40的製備方法藉由調節氮氣的流量及硼靶的功率在沉積過程中遞增,而使N原子及B原子在該梯度膜層11中的個數含量由靠近硬質基體30至遠離硬質基體30的方向均呈梯度增加,與結合層20結合處N原子及B原子的含量較低,梯度膜層11主要表現為Zr的金屬相,具有與硬質基體30、結合層20較相近的熱膨脹係數,因此介面處內應力小,使得梯度膜層11與結合層20之間的結合力增強。該梯度膜層11的表層N原子及B原子含量較高,梯度膜層11主要表現為BN相、ZrB2相及ZrN相,避免了單一ZrB2相易脆而導致的塗層韌性及耐磨性差的缺點,同時由於BN相及ZrB2相具有硬度高、耐腐蝕性高的優點,顯著提高了梯度膜層硬度及耐腐蝕性。 The preparation method of the above-mentioned covering member 40 is made by increasing the flow rate of the nitrogen gas and the power of the boron target during the deposition process, so that the number of N atoms and B atoms in the gradient film layer 11 is close to the hard matrix 30 to be far from the hard material. The direction of the substrate 30 increases in a gradient, and the content of the N atom and the B atom in the junction with the bonding layer 20 is relatively low. The gradient film layer 11 mainly exhibits a metal phase of Zr and has thermal expansion similar to that of the hard substrate 30 and the bonding layer 20. The coefficient, and thus the internal stress at the interface, is small, so that the bonding force between the gradient film layer 11 and the bonding layer 20 is enhanced. The gradient film layer 11 has a high content of N atoms and B atoms, and the gradient film layer 11 mainly exhibits a BN phase, a ZrB 2 phase and a ZrN phase, thereby avoiding coating toughness and wear resistance caused by a single ZrB 2 phase being brittle. The disadvantage of poor performance, and the BN phase and ZrB 2 phase have the advantages of high hardness and high corrosion resistance, which significantly improves the hardness and corrosion resistance of the gradient film layer.

此外,由於梯度膜層11與結合層20介面處內應力小,當硬質基體30受力變形時難以形成裂紋,即使形成裂紋亦難以擴展,從而大大提高所述梯度膜層11的韌性。所述梯度膜層11的硬度、韌性的提高及梯度膜層11與結合層20之間結合力的增強,可顯著地提高所述塗層10的耐磨性。 In addition, since the internal stress at the interface between the gradient film layer 11 and the bonding layer 20 is small, it is difficult to form a crack when the hard substrate 30 is deformed by force, and it is difficult to expand even if a crack is formed, thereby greatly improving the toughness of the gradient film layer 11. The improvement of the hardness and toughness of the gradient film layer 11 and the enhancement of the bonding force between the gradient film layer 11 and the bonding layer 20 can significantly improve the wear resistance of the coating layer 10.

綜上所述,本發明符合發明專利要件,爰依法提出專利申請。惟 ,以上所述者僅為本發明之較佳實施方式,舉凡熟悉本案技藝之人士,於爰依本發明精神所作之等效修飾或變化,皆應涵蓋於以下之申請專利範圍內。 In summary, the present invention complies with the requirements of the invention patent and submits a patent application according to law. but The above description is only the preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art will be included in the following claims.

10‧‧‧塗層 10‧‧‧ Coating

11‧‧‧梯度膜層 11‧‧‧ Gradient film

13‧‧‧顏色層 13‧‧‧ color layer

20‧‧‧結合層 20‧‧‧bonding layer

30‧‧‧硬質基體 30‧‧‧hard substrate

40‧‧‧被覆件 40‧‧‧Cladding

Claims (9)

一種塗層,形成於一硬質基體表面上,該塗層包括一梯度膜層,其改良在於:該梯度膜層為一ZrBN層,該梯度膜層中N原子及B原子的個數含量由靠近該硬質基體至遠離該硬質基體的方向呈梯度增加,該塗層還包括一形成於該梯度膜層上的顏色層。 A coating formed on a surface of a hard substrate, the coating comprising a gradient film layer, wherein the gradient film layer is a ZrBN layer, and the number of N atoms and B atoms in the gradient film layer is close to The hard matrix increases in a gradient away from the hard substrate, and the coating further includes a color layer formed on the gradient film layer. 如申請專利範圍第1項所述的塗層,其中該梯度膜層的厚度為0.5~2μm。 The coating of claim 1, wherein the gradient film layer has a thickness of 0.5 to 2 μm. 一種被覆件,包括一硬質基體及形成在該硬質基體上的一塗層,該塗層包括形成於該硬質基體上的一梯度膜層,其改良在於:該梯度膜層為一ZrBN層,該梯度膜層中N原子及B原子的個數含量由靠近該硬質基體至遠離該硬質基體的方向呈梯度增加,該塗層還包括一形成於該梯度膜層上的顏色層。 A coated member comprising a hard substrate and a coating formed on the hard substrate, the coating comprising a gradient film layer formed on the hard substrate, wherein the gradient film layer is a ZrBN layer, The number of N atoms and B atoms in the gradient film layer increases in a gradient from the hard matrix to a direction away from the hard matrix, and the coating further includes a color layer formed on the gradient film layer. 如申請專利範圍第3項所述的被覆件,其中該梯度膜層的厚度為0.5~2μm。 The covering member according to claim 3, wherein the gradient film layer has a thickness of 0.5 to 2 μm. 如申請專利範圍第3項所述的被覆件,其中該被覆件還包括一形成於硬質基體與塗層之間的結合層,該結合層為一Zr層,其厚度為100~200nm。 The covering member according to claim 3, wherein the covering member further comprises a bonding layer formed between the hard substrate and the coating layer, the bonding layer being a Zr layer having a thickness of 100 to 200 nm. 一種被覆件的製備方法,包括以下步驟:提供一硬質基體;在該硬質基體的表面磁控濺射一梯度膜層,該梯度膜層為一ZrBN層,該梯度膜層中N原子及B原子的個數含量由靠近該硬質基體至遠離該硬質基體的方向呈梯度增加;在該梯度膜層的表面鍍覆一顏色層。 A method for preparing a coated member, comprising the steps of: providing a hard substrate; magnetron sputtering a gradient film layer on the surface of the hard substrate, the gradient film layer being a ZrBN layer, and the N and B atoms in the gradient film layer The amount of the content increases in a gradient from the hard substrate to a direction away from the hard substrate; a color layer is plated on the surface of the gradient film layer. 如申請專利範圍第6項所述的被覆件的製備方法,其中磁控濺射所述梯度膜層時,以鋯靶和硼靶為靶材,以氮氣為反應性氣體,該氮氣的初始流 量為5~25sccm,每濺射15min將所述氮氣的流量增大5~25sccm,硼靶的初始功率為100~200W,每濺射15min將所述氮氣的流量增大20~40W。 The method for preparing a coated member according to claim 6, wherein when the gradient film layer is magnetron-sputtered, a zirconium target and a boron target are used as targets, and nitrogen is used as a reactive gas, and the initial flow of the nitrogen is used. The amount is 5~25sccm, the flow rate of the nitrogen gas is increased by 5~25sccm every 15min, and the initial power of the boron target is 100~200W. The flow rate of the nitrogen gas is increased by 20~40W every 15min. 如申請專利範圍第6項所述的被覆件的製備方法,其中該被覆件的製備方法還包括在形成梯度膜層前在硬質基體上磁控濺射一結合層的步驟,該結合層為一Zr層。 The method for preparing a coated member according to claim 6, wherein the method for preparing the coated member further comprises the step of magnetron sputtering a bonding layer on the hard substrate before forming the gradient film layer, the bonding layer being a Zr layer. 如申請專利範圍第8項所述的被覆件的製備方法,其中形成該結合層的工藝參數為:以鋯靶為靶材,設置鋯靶的功率為150~200W,施加於硬質基體的偏壓為-100~-250V,氬氣流量為100~200sccm,濺射溫度為150~300℃,濺射時間為5~10min。 The method for preparing a coated member according to claim 8, wherein the process parameter for forming the bonding layer is: using a zirconium target as a target, setting a power of the zirconium target to 150 to 200 W, and applying a bias voltage to the hard substrate It is -100~-250V, the flow rate of argon gas is 100~200sccm, the sputtering temperature is 150~300°C, and the sputtering time is 5~10min.
TW099127677A 2010-08-19 2010-08-19 Coating, articles coated with the coating, and method for manufacturing the articles TWI493063B (en)

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Publication number Priority date Publication date Assignee Title
TW200606276A (en) * 2004-05-21 2006-02-16 Ulvac Inc Vacuum film-forming apparatus
CN101536154A (en) * 2006-11-09 2009-09-16 株式会社爱发科 Barrier film forming method

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2006年出版,Surface and Coatings Technology,Vol. 200,Issues 22–23,p.6568~6571,「Effect of duplex treatments by plasma nitriding and triode sputtering on corrosion behaviour of 32CDV13 low alloy steel」,A. Chala等撰寫 *

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