TWI484886B - Multilayer circuit board manufacturing method - Google Patents
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- TWI484886B TWI484886B TW102131064A TW102131064A TWI484886B TW I484886 B TWI484886 B TW I484886B TW 102131064 A TW102131064 A TW 102131064A TW 102131064 A TW102131064 A TW 102131064A TW I484886 B TWI484886 B TW I484886B
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- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 239000010410 layer Substances 0.000 claims description 200
- 238000000034 method Methods 0.000 claims description 58
- 239000000758 substrate Substances 0.000 claims description 53
- 239000012792 core layer Substances 0.000 claims description 26
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 22
- 238000005553 drilling Methods 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 14
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 11
- 239000001569 carbon dioxide Substances 0.000 claims description 11
- 238000003825 pressing Methods 0.000 claims description 6
- 238000000059 patterning Methods 0.000 claims description 5
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 238000001459 lithography Methods 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Description
本發明是有關於一種電路板的製作方法,且特別是有關於一種多層電路板的製作方法。The present invention relates to a method of fabricating a circuit board, and more particularly to a method of fabricating a multilayer circuit board.
由於電子產品的積集度(integration)越來越高,應用於高積集度之電子產品的電路板,其線路層也由單層、2層而變為6層、8層,甚至到10層以上,以使電子元件能夠更密集的裝設於印刷電路板上。一般而言,最常見之電路板製程係為疊層法(lamination process),當利用疊層法來製作電路板時,各個線路層及絕緣層之間的對位精度必須獲得良好的控制。因此,在電路板製程中,通常是在前一疊層透過微影製程形成多個對位標靶,並再增層之後,藉由X光找到前一疊層的對位標靶並進行銑靶製程以形成後續製程的另一對位標靶。As the integration of electronic products is getting higher and higher, the circuit boards used in high-accumulation electronic products have also changed from single layer and 2 layers to 6 layers, 8 layers, and even 10 Above the layer, the electronic components can be more densely mounted on the printed circuit board. In general, the most common circuit board process is a lamination process. When a circuit board is fabricated by a lamination method, the alignment accuracy between each circuit layer and the insulating layer must be well controlled. Therefore, in the circuit board process, usually, a plurality of alignment targets are formed by the lithography process in the previous stack, and after the layers are further added, the alignment targets of the previous stack are found by X-ray and milled. The target process is to form another alignment target for subsequent processes.
然而,由於前一疊層的對位標靶是透過微影製程所形成,其本身已存在有製程誤差,而使用X光進行銑靶時,亦會產生銑靶製程上的誤差。如此,各層的對位標靶所產生的對位誤差 將不斷地累積。若電路板的線路層數目增加,則這些對位標靶所累積的誤差也會增加,造成層間對準度偏移過大且導通孔與底層接墊的設計無法微型化。However, since the alignment target of the previous stack is formed by the lithography process, there is already a process error in itself, and when the X-ray is used for milling the target, an error in the milling target process is also generated. Thus, the alignment error generated by the alignment targets of each layer Will continue to accumulate. If the number of circuit layers of the board increases, the error accumulated by these alignment targets also increases, causing the interlayer alignment to be excessively shifted and the design of the via holes and the underlying pads cannot be miniaturized.
本發明提供一種多層電路板的製作方法,其可提升多層電路板的層間對位精準度,提升線路層的佈線密度與能力,且導通孔與底層接墊的設計因對位精準度的提高而可走向微型化,更可製作單邊對準度小於50μm的圖案設計。The invention provides a manufacturing method of a multilayer circuit board, which can improve the interlayer alignment precision of the multilayer circuit board, improve the wiring density and capability of the circuit layer, and the design of the via hole and the bottom layer pad is improved due to the alignment accuracy. It can be miniaturized, and it can make pattern designs with unilateral alignment less than 50μm.
本發明的一種多層電路板的製作方法包括下列步驟:首先,壓合兩核心層以形成一基材。基材具有相對兩表面。接著,形成一第一通孔,其連通兩表面。接著,以第一通孔為對位標靶各形成第一圖案化線路層於兩表面上。各第一圖案化線路層包括環繞第一通孔的一第一同心圓圖案。接著,各形成一第一堆疊層於兩表面上,其包括一第一介電層以及覆蓋第一介電層的一第一線路層。接著,形成一第一貫孔,其貫穿第一同心圓圖案由中心向外第一個同心圓的內徑正投影至第一堆疊層以及基材的區域。接著,各形成一第二堆疊層於第一堆疊層上。各第二堆疊層包括一第二介電層以及覆蓋第二介電層的一第二線路層。之後,形成一第二貫孔,其貫穿第一同心圓圖案由中心向外第二個同心圓的內徑正投影至第二堆疊層、第一堆疊層及基材的區域。A method of fabricating a multilayer circuit board of the present invention comprises the steps of: first, pressing two core layers to form a substrate. The substrate has opposite surfaces. Next, a first through hole is formed which communicates both surfaces. Then, the first through holes are used as the alignment targets to form the first patterned circuit layer on both surfaces. Each of the first patterned circuit layers includes a first concentric pattern surrounding the first via. Next, each of the first stacked layers is formed on both surfaces, and includes a first dielectric layer and a first wiring layer covering the first dielectric layer. Next, a first through hole is formed which is projected through the first concentric circle pattern from the center to the inner diameter of the first concentric circle to the first stacked layer and the region of the substrate. Then, a second stacked layer is formed on each of the first stacked layers. Each of the second stacked layers includes a second dielectric layer and a second wiring layer covering the second dielectric layer. Thereafter, a second through hole is formed which is projected from the inner diameter of the second concentric circle to the second stacked layer, the first stacked layer and the region of the substrate through the first concentric pattern.
基於上述,本發明的多層電路板製作方法是先以兩個核 心層壓合成一基材,在於基材的表面形成同心圓圖案,而之後的各層堆疊層皆是以此最內層基材上的同心圓圖案做對位標靶來形成對應的對位貫孔,再以各層的對位貫孔分別進行對應的堆疊層的後續製程。並且,在基板上重覆增層至其具有一定的結構強度後,即可使基材的兩核心層彼此分離,以形成兩個獨立的多層電路板,之後再分別對兩獨立的多層電路板進行後續的增層製程。因此,本發明的製作方法可一次形成兩個獨立的多層電路板,且可減少習知中多層電路板的各層間對位誤差的累積,更可減少習知的多層電路板有層偏的問題產生。因此,本發明確實能提升線路層的佈線密度與能力,且導通孔與底層接墊的設計因對位精準度的提高而可走向微型化,更可製作單邊對準度小於50μm的圖案設計。Based on the above, the method for fabricating the multilayer circuit board of the present invention is to first use two cores. The core laminates a substrate by forming a concentric pattern on the surface of the substrate, and the subsequent stacked layers are aligned with the concentric pattern on the innermost substrate to form a corresponding alignment. The holes are then subjected to subsequent processes of the corresponding stacked layers by the opposite holes of the respective layers. Moreover, after the substrate is repeatedly layered to have a certain structural strength, the two core layers of the substrate can be separated from each other to form two independent multilayer circuit boards, and then the two independent multilayer circuit boards are respectively separated. Carry out the subsequent layering process. Therefore, the manufacturing method of the present invention can form two independent multilayer circuit boards at a time, and can reduce the accumulation of alignment errors between layers of the conventional multilayer circuit board, and can reduce the problem of layering of the conventional multilayer circuit board. produce. Therefore, the present invention can improve the wiring density and capability of the circuit layer, and the design of the via hole and the underlying pad can be miniaturized due to the improvement of the alignment accuracy, and the pattern design with a single side alignment of less than 50 μm can be produced. .
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.
100a、100b‧‧‧多層電路板100a, 100b‧‧‧ multilayer board
110‧‧‧基材110‧‧‧Substrate
110a、110b‧‧‧核心層110a, 110b‧‧‧ core layer
111‧‧‧週邊區111‧‧‧The surrounding area
112、114‧‧‧表面112, 114‧‧‧ surface
113‧‧‧核心區113‧‧‧ core area
113a‧‧‧核心區基板113a‧‧‧ core area substrate
116‧‧‧第一通孔116‧‧‧First through hole
118‧‧‧第二通孔118‧‧‧Second through hole
119‧‧‧結合材119‧‧‧Combined materials
120‧‧‧第一圖案化線路層120‧‧‧First patterned circuit layer
122‧‧‧第一同心圓圖案122‧‧‧First concentric pattern
122a、124a‧‧‧第一個同心圓122a, 124a‧‧‧ first concentric circle
122b、124b‧‧‧第二個同心圓122b, 124b‧‧‧Second concentric circle
124‧‧‧第二同心圓圖案124‧‧‧Second concentric pattern
130‧‧‧第一堆疊層130‧‧‧First stacking layer
132‧‧‧第一介電層132‧‧‧First dielectric layer
134‧‧‧第一線路層134‧‧‧First line layer
134a‧‧‧第一開口134a‧‧‧first opening
140‧‧‧第一貫孔140‧‧‧first through hole
150‧‧‧第二堆疊層150‧‧‧Second stacking layer
152‧‧‧第二介電層152‧‧‧Second dielectric layer
154‧‧‧第二線路層154‧‧‧Second circuit layer
154a‧‧‧第二開口154a‧‧‧second opening
160‧‧‧第二貫孔160‧‧‧second through hole
170‧‧‧第六堆疊層170‧‧‧ sixth stacking layer
172‧‧‧第六介電層172‧‧‧ sixth dielectric layer
174‧‧‧第六線路層174‧‧‧ sixth circuit layer
174a、194a‧‧‧開口174a, 194a‧‧
180‧‧‧第六貫孔180‧‧‧six through hole
182‧‧‧盲孔182‧‧‧Blind hole
190‧‧‧第七堆疊層190‧‧‧ seventh stack
192‧‧‧第七介電層192‧‧‧ seventh dielectric layer
194‧‧‧第七線路層194‧‧‧ seventh circuit layer
195‧‧‧第七貫孔195‧‧‧ seventh through hole
D1‧‧‧通孔外徑D1‧‧‧through hole outer diameter
D2‧‧‧同心圓圖案外徑D2‧‧‧ concentric pattern outer diameter
G1‧‧‧間距G1‧‧‧ spacing
圖1A至圖1N是依照本發明的一實施例的一種多層電路板的製作方法的流程示意圖。1A-1N are schematic flow diagrams of a method of fabricating a multilayer circuit board in accordance with an embodiment of the invention.
圖2是圖1D的基材及第一圖案化線路層的俯視示意圖及其區域A的局部放大圖。2 is a top plan view of the substrate and the first patterned circuit layer of FIG. 1D and a partial enlarged view of the region A thereof.
圖3是圖1G的第一同心圓圖案的俯視示意圖。3 is a top plan view of the first concentric pattern of FIG. 1G.
圖4是圖1I的第一同心圓圖案的俯視示意圖。4 is a top plan view of the first concentric pattern of FIG. 1I.
圖5是圖1D的基材及第一圖案化線路層的俯視示意圖及其區域B的局部放大圖。5 is a top plan view of the substrate and the first patterned circuit layer of FIG. 1D and a partial enlarged view of the region B thereof.
圖6是依照本發明的一實施例的多層電路板的剖面示意圖及其局部放大示意圖。6 is a cross-sectional view of a multilayer circuit board and a partially enlarged schematic view thereof in accordance with an embodiment of the present invention.
圖1A至圖1N是依照本發明的一實施例的一種多層電路板的製作方法的流程示意圖。圖2是圖1D的基材及第一圖案化線路層的俯視示意圖及其區域A的局部放大圖。在此需說明的是,圖1A至圖1J所繪示的製作流程為圖2中區域A的製作流程之剖面圖。本實施例的多層電路板的製作方法包括下列步驟:首先,請同時參照圖1A及圖1B,將兩核心層110a、110b壓合而形成一基材110。基材110如圖1B所示包括相對兩表面112、114。在本實施例中,核心層110a、110b的厚度各約小於50微米(μm)。接著,再如圖1C所示,形成一第一通孔116,且第一通孔116貫穿基材110。1A-1N are schematic flow diagrams of a method of fabricating a multilayer circuit board in accordance with an embodiment of the invention. 2 is a top plan view of the substrate and the first patterned circuit layer of FIG. 1D and a partial enlarged view of the region A thereof. It should be noted that the manufacturing process illustrated in FIG. 1A to FIG. 1J is a cross-sectional view of the manufacturing process of the area A in FIG. 2 . The manufacturing method of the multilayer circuit board of this embodiment includes the following steps. First, referring to FIG. 1A and FIG. 1B, the two core layers 110a and 110b are pressed together to form a substrate 110. Substrate 110 includes opposing surfaces 112, 114 as shown in FIG. 1B. In the present embodiment, the core layers 110a, 110b each have a thickness of less than about 50 micrometers (μm). Next, as shown in FIG. 1C , a first through hole 116 is formed, and the first through hole 116 penetrates through the substrate 110 .
在本實施例中,壓合兩核心層110a、110b的方法例如為將一結合材119壓合於兩核心層110a、110b之間,以結合兩核心層110a、110b而形成基材110。結合材119的材料例如為樹脂,而第一通孔116分別貫穿基材110以及結合材119。在此需說明的是,本實施例的第一通孔116是形成於核心層110a、110b透過結 合材119結合之結合處,以防止第一通孔116破壞兩核心層110a、110b間的氣密狀態,或是導致濕式製程(wet process)的藥液經由第一通孔116滲流至兩核心層110a、110b之間。在本實施例中,第一通孔116的外徑實質上介於0.5毫米至0.8毫米之間。In the present embodiment, the method of pressing the two core layers 110a, 110b is, for example, pressing a bonding material 119 between the two core layers 110a, 110b to bond the two core layers 110a, 110b to form the substrate 110. The material of the bonding material 119 is, for example, a resin, and the first through holes 116 penetrate the substrate 110 and the bonding material 119, respectively. It should be noted that the first via hole 116 of the embodiment is formed on the core layer 110a, 110b through the junction. The joint of the composite material 119 is combined to prevent the first through hole 116 from breaking the airtight state between the two core layers 110a, 110b, or the chemical liquid causing the wet process to seep through the first through hole 116 to the two Between the core layers 110a, 110b. In the present embodiment, the outer diameter of the first through hole 116 is substantially between 0.5 mm and 0.8 mm.
請同時參照圖1D以及圖2,接著,以第一通孔116為對位標靶分別圖案化兩表面112、114上的金屬層,以分別形成第一圖案化線路層120於表面112、114上。在本實施例中,如圖2所示,第一通孔116的外徑D1實質上介於0.5毫米(mm)至0.8毫米之間。第一圖案化線路層120如圖2所示具有環繞第一通孔116的一第一同心圓圖案122。第一同心圓圖案122包括多個同心圓,而同心圓彼此間的間距G1實質上介於50微米(μm)至100微米之間,當然,本發明並不以此為限,本領域具通常知識者當可依實際產品的設計及佈局需求自行做調整。Referring to FIG. 1D and FIG. 2 simultaneously, the metal layers on the two surfaces 112, 114 are respectively patterned by using the first via holes 116 as alignment targets to form the first patterned circuit layer 120 on the surfaces 112, 114, respectively. on. In the present embodiment, as shown in FIG. 2, the outer diameter D1 of the first through hole 116 is substantially between 0.5 mm (mm) and 0.8 mm. The first patterned circuit layer 120 has a first concentric pattern 122 surrounding the first via 116 as shown in FIG. The first concentric circle pattern 122 includes a plurality of concentric circles, and the distance G1 between the concentric circles is substantially between 50 micrometers (μm) and 100 micrometers. Of course, the invention is not limited thereto, and the field generally has Knowledgers can make adjustments according to the actual product design and layout requirements.
接著,如圖1E所示,分別形成第一堆疊層130於兩表面112、114上,其中,第一堆疊層130包括一第一介電層132以及第一線路層134,且第一線路層134覆蓋第一介電層132。之後,請同時參照圖1F及圖1G,利用例如二氧化碳雷射(CO2 laser)鑽孔的方式形成第一貫孔140。第一貫孔140如圖1G所示貫穿第一同心圓圖案122由中心向外第一個同心圓122a的內徑正投影至第一堆疊層130以及基材110的區域。圖3即繪示了被第一貫孔140貫穿後的第一同心圓圖案122的俯視圖。Next, as shown in FIG. 1E, a first stacked layer 130 is formed on the two surfaces 112, 114, respectively, wherein the first stacked layer 130 includes a first dielectric layer 132 and a first wiring layer 134, and the first circuit layer 134 covers the first dielectric layer 132. Thereafter, referring to FIG. 1F and FIG. 1G simultaneously, the first through hole 140 is formed by, for example, drilling with a CO 2 laser. The first uniform hole 140 is orthographically projected from the center to the inner diameter of the first concentric circle 122a through the first concentric circle pattern 122 as shown in FIG. 1G to the region of the first stacked layer 130 and the substrate 110. FIG. 3 is a plan view showing the first concentric pattern 122 penetrated by the first through hole 140.
在本實施例中,第一圖案化線路層120及第一線路層134 的材料為銅,由於銅只對紫外光區(<0.3μm)以下的短波長區吸收率較高,而二氧化碳雷射的光波長較長(約為10微米以上),屬於紅外光區,因此較不會被銅所吸收而將銅燒蝕成孔。因此,銅材質的同心圓圖案122可視為二氧化碳雷射的一個銅遮罩,用以限制二氧化碳雷射對第一堆疊層130以及基材110切割的範圍。也就是說,利用二氧化碳雷射由中心向外鑽孔,則會以第一個同心圓122a的內徑為邊界來鑽孔形成的第一貫孔140。需注意的是,若是使用二氧化碳雷射來形成第一貫孔140,需先形成如圖1F所示的第一開口134a於第一線路層134上,使第一開口134a暴露出第一同心圓圖案122正投影至第一介電層132的區域,再進行後續的鑽孔程序。In the embodiment, the first patterned circuit layer 120 and the first circuit layer 134 The material is copper. Since copper has a higher absorption rate in the short-wavelength region below the ultraviolet region (<0.3 μm), and the carbon dioxide laser has a longer wavelength of light (about 10 micrometers or more), it belongs to the infrared region. Copper is ablated into holes without being absorbed by copper. Therefore, the concentric pattern 122 of copper material can be regarded as a copper mask of the carbon dioxide laser to limit the range in which the carbon dioxide laser cuts the first stacked layer 130 and the substrate 110. That is to say, by drilling a hole outward from the center by using a carbon dioxide laser, the first through hole 140 formed by drilling the inner diameter of the first concentric circle 122a is drilled. It should be noted that if the first through hole 140 is formed by using a carbon dioxide laser, a first opening 134a as shown in FIG. 1F is first formed on the first circuit layer 134, so that the first opening 134a exposes the first concentric circle. The pattern 122 is projected onto the area of the first dielectric layer 132 for subsequent drilling procedures.
當然,本發明並不侷限於此。在本發明的其他實施例中,亦可利用直接雷射鑽孔(Direct Laser Drill,DLD)的方式形成第一貫孔140。若是使用直接雷射鑽孔的方式形成第一貫孔140,則無須形成如圖1F所示的第一開口134a,而可直接進行雷射鑽孔製程以形成第一貫孔140。在本實施例中,第一貫孔140的形成可例如分別由位於基材110兩側的第一堆疊層130的外表面同時往基材110的方向鑽孔。Of course, the invention is not limited thereto. In other embodiments of the present invention, the first through hole 140 may also be formed by direct laser drilling (DLD). If the first through hole 140 is formed by direct laser drilling, the first opening 134a as shown in FIG. 1F does not need to be formed, and the laser drilling process can be directly performed to form the first through hole 140. In the present embodiment, the first through holes 140 may be formed by, for example, simultaneously drilling the outer surfaces of the first stacked layers 130 on both sides of the substrate 110 toward the substrate 110.
之後,即可以第一貫孔140為對位標靶對第一堆疊層130進行後續製程,例如以第一貫孔140做為微影製程的對位標靶,對第一線路層134進行圖案化,以形成多層電路板的第二圖案化線路層,或是以第一貫孔140為對位標靶形成第一導通孔於第一 堆疊層130上。After that, the first through hole 140 can be used as a registration target to perform subsequent processing on the first stacked layer 130, for example, the first through hole 140 is used as a aligning target of the lithography process, and the first circuit layer 134 is patterned. Forming a second patterned circuit layer of the multilayer circuit board, or forming the first via hole with the first through hole 140 as an alignment target. Stacked on layer 130.
之後,再如圖1H所示,分別形成第二堆疊層150於對應的第一堆疊層130上。各第二堆疊層150包括一第二介電層152以及第二線路層154,且第二線路層154覆蓋第二介電層152。之後,再如圖1I所示形成第二貫孔160,且第二貫孔160貫穿第一同心圓圖案120由中心向外第二個同心圓122b的內徑正投影至第二堆疊層150、第一堆疊層130及基材110的區域。圖4即繪示了被第二貫孔160貫穿後的第一同心圓圖案122的俯視圖。Thereafter, as shown in FIG. 1H, a second stacked layer 150 is formed on the corresponding first stacked layer 130, respectively. Each of the second stacked layers 150 includes a second dielectric layer 152 and a second wiring layer 154 , and the second wiring layer 154 covers the second dielectric layer 152 . Thereafter, a second through hole 160 is formed as shown in FIG. 1I, and the second through hole 160 is projected through the first concentric circle pattern 120 from the center to the inner diameter of the second concentric circle 122b to the second stacked layer 150, The first stacked layer 130 and the region of the substrate 110. FIG. 4 is a plan view showing the first concentric pattern 122 penetrated by the second through hole 160.
如同第一貫孔的形成方法所述,第二貫孔160亦可利用二氧化碳雷射鑽孔的方式而形成。也就是說,利用二氧化碳雷射由中心向外鑽孔,燒蝕掉如圖3所示的第一個同心圓122a以及第二個同心圓122b間的基材110後,第一個同心圓122a即可自同心圓圖案120剝離,而形成如圖4所示的第二貫孔160。同樣的,若使用二氧化碳雷射來形成第二貫孔160,需先形成如圖1H所示的第二開口154a,使第二開口154a暴露出第一同心圓圖案122正投影至第二介電層152的區域,再進行後續的雷射鑽孔程序。As described in the method of forming the first through hole, the second through hole 160 may also be formed by means of carbon dioxide laser drilling. That is, after the carbon dioxide laser is bored outward from the center to ablate the substrate 110 between the first concentric circle 122a and the second concentric circle 122b as shown in FIG. 3, the first concentric circle 122a The self-concentric pattern 120 can be peeled off to form a second through hole 160 as shown in FIG. Similarly, if a carbon dioxide laser is used to form the second through hole 160, a second opening 154a as shown in FIG. 1H is formed to expose the second opening 154a to expose the first concentric pattern 122 to the second dielectric. The area of layer 152 is followed by a subsequent laser drilling procedure.
當然,在本發明的其他實施例中,亦可利用直接雷射鑽孔(Direct Laser Drill,DLD)的方式形成第二貫孔160,如此則無須形成如圖1H所示的第二開口154a,而可立即進行直接雷射鑽孔以形成第二貫孔160。在本實施例中,形成第二貫孔160的方法可分別由位於基材110兩側的第二堆疊層150的外表面同時往基材110的方向鑽孔。Of course, in other embodiments of the present invention, the second through hole 160 may be formed by using a direct laser Drill (DLD), so that the second opening 154a as shown in FIG. 1H does not need to be formed. A direct laser drilling can be performed immediately to form a second through hole 160. In the present embodiment, the method of forming the second through holes 160 may be simultaneously drilled into the direction of the substrate 110 by the outer surfaces of the second stacked layers 150 on both sides of the substrate 110.
之後,即可以第二貫孔160為對位標靶對第二堆疊層150進行後續製程,例如以第二貫孔160做為微影製程的對位標靶,對第二線路層154進行圖案化,以形成多層電路板的第三圖案化線路層,或是以第二貫孔160為對位標靶形成第二導通孔於第二堆疊層150上,其中,第二導通孔連接第一堆疊層130上的第一導通孔。After that, the second through hole 160 can be used as a registration target to perform subsequent processing on the second stacked layer 150, for example, the second through hole 160 is used as an alignment target of the lithography process, and the second circuit layer 154 is patterned. Forming a third patterned circuit layer of the multilayer circuit board, or forming a second via hole on the second stacked layer 150 by using the second through hole 160 as an alignment target, wherein the second via hole is connected to the first The first via holes on the stacked layer 130.
當然,本發明並不限制堆疊層、線路層的層數以及同心圓圖案的同心圓個數。本領域具通常知識者可自行依前述的製作方法於第二堆疊層上繼續堆疊其他堆疊層,並以同心圓圖案122為對位標靶形成各層的對位貫孔,再以各層的對位貫孔分別進行後續的對位製程,以形成各層的圖案化線路層及/或導通孔。Of course, the present invention does not limit the number of layers of the stacked layer, the wiring layer, and the number of concentric circles of the concentric pattern. Those skilled in the art can continue to stack other stacked layers on the second stacked layer according to the foregoing fabrication method, and form the alignment holes of the layers by using the concentric pattern 122 as the alignment target, and then the alignment of the layers. The through holes are respectively subjected to a subsequent alignment process to form patterned circuit layers and/or via holes of the respective layers.
在多層電路板的增層次數大於一個預定值(例如等於或大於5次),使其具有一定的結構強度後,即可進行拆板的動作,也就是在基板110上重覆增層至具有一定的結構強度後,使基材110的兩核心層110a、110b如圖1J所示地彼此分離,以形成兩個獨立的多層電路板100a、100b,再分別對多層電路板100a、100b進行後續的增層製程。在本實施例中,基於生產設備的影像感應器(Charge-Coupled Device,CCD)的影像擷取視窗可讀取的最大尺寸限制,第一同心圓圖案122的最大外徑D2實質上應小於或等於3.175毫米(mm)。在此之後所形成的堆疊層可例如利用另一同心圓圖案做對位標靶來進行對位製程。After the number of times of layering of the multi-layer circuit board is greater than a predetermined value (for example, equal to or greater than 5 times), so that it has a certain structural strength, the action of removing the board can be performed, that is, the layer is repeatedly layered on the substrate 110 to have After a certain structural strength, the two core layers 110a, 110b of the substrate 110 are separated from each other as shown in FIG. 1J to form two independent multilayer circuit boards 100a, 100b, and then the multilayer circuit boards 100a, 100b are respectively followed. The layering process. In this embodiment, based on the maximum size limit readable by the image capturing window of the image sensor (CCD) of the production device, the maximum outer diameter D2 of the first concentric pattern 122 should be substantially less than or Is equal to 3.175 mm (mm). The stacked layers formed thereafter can be aligned by, for example, using another concentric pattern as an alignment target.
如此,第一圖案化線路層120則需如圖2及圖5所示包 括兩個同心圓圖案122、124,而基材210除了具有前述的第一通孔116外,更可具有貫穿基材110的一第二通孔118。接著,再以第一通孔116與第二通孔118為對位標靶分別形成如圖2及圖5所示的第一圖案化線路層120於表面112、114上。各第一圖案化線路層120除了包括如圖2所示的環繞第一通孔116的第一同心圓圖案122外,更包括如圖5所示的環繞第二通孔118的第二同心圓圖案124。在本實施例中,基板110可如圖2及圖5所示包括一週邊區111以及一核心區113,其中,週邊區111環繞並連接核心區113,第一通孔116與第二通孔118則分別設置於週邊區111以及核心區113內。如此,在以第一同心圓圖案122做對位標靶進行增層製程至具有一定的結構強度後,即可進行拆板的動作,並將基板110的週邊區111移除,以形成如圖5所示的核心區基板113a,再以第二同心圓圖案124做對位標靶對核心區基板113a進行後續的增層製程。Thus, the first patterned circuit layer 120 needs to be packaged as shown in FIG. 2 and FIG. The two concentric patterns 122 and 124 are included, and the substrate 210 may have a second through hole 118 penetrating through the substrate 110 in addition to the first through hole 116. Then, the first through-holes 116 and the second vias 118 are used as alignment targets to form the first patterned circuit layer 120 on the surfaces 112 and 114 as shown in FIGS. 2 and 5, respectively. Each of the first patterned circuit layers 120 includes, in addition to the first concentric circle pattern 122 surrounding the first through holes 116 as shown in FIG. 2, a second concentric circle surrounding the second through holes 118 as shown in FIG. Pattern 124. In this embodiment, the substrate 110 can include a peripheral region 111 and a core region 113 as shown in FIG. 2 and FIG. 5, wherein the peripheral region 111 surrounds and connects the core region 113, the first through hole 116 and the second through hole. 118 is disposed in the peripheral area 111 and the core area 113, respectively. In this way, after the first concentric pattern 122 is used as the alignment target to perform the layering process to have a certain structural strength, the stripping action can be performed, and the peripheral region 111 of the substrate 110 is removed to form a figure. The core area substrate 113a shown in FIG. 5 is further subjected to a subsequent layer build-up process of the core area substrate 113a by using the second concentric pattern 124 as an alignment target.
由於第一同心圓圖案122及第二同心圓圖案124是透過同一圖案化製程所形成的,因此可避免多道圖案化製程的對位誤差累積。如此,從拆板後分別於多層電路板100a、100b上形成的堆疊層皆可以第二同心圓圖案124做對位標靶來進行後續的對位製程,其製作流程可參照圖1K至圖1N。在此需注意的是,圖1K至圖1N所繪示的製作流程為拆板後的多層電路板100a為例,且為圖5中區域B的製作流程之剖面圖。Since the first concentric pattern 122 and the second concentric pattern 124 are formed by the same patterning process, the accumulation error of the multi-pass patterning process can be avoided. In this way, the stacked layers formed on the multilayer circuit boards 100a and 100b after the board is removed can be used as the alignment target by the second concentric pattern 124 for subsequent alignment process. The manufacturing process can be referred to FIG. 1K to FIG. 1N. . It should be noted that the manufacturing process illustrated in FIG. 1K to FIG. 1N is an example of the multi-layer circuit board 100a after the board is removed, and is a cross-sectional view of the manufacturing process of the area B in FIG.
請參照圖1K,在多層電路板的增層次數大於預定值(例 如大於M次,M為大於2的正整數),使其具有一定的結構強度後,可如圖1K所示接續形成第M堆疊層於第二堆疊層150的上方。在本實施例中,M例如為6,也就是說,多層電路板在拆板前已利用第一同心圓圖案122做對位標靶依序形成了第一至第五堆疊層,而第六堆疊層170(也就是第M堆疊層)對應包括第六介電層172以及覆蓋第六介電層172的第六線路層174。接著,如圖5及圖1L所示,形成第六貫孔180,其貫穿第二同心圓圖案124由中心向外第一個同心圓124a的內徑正投影至多層電路板100a的第一至第六堆疊層以及基材110的區域。Referring to FIG. 1K, the number of times of layering on the multilayer circuit board is greater than a predetermined value (example) If M is greater than 2, and M is a positive integer greater than 2, after having a certain structural strength, the Mth stacked layer may be formed over the second stacked layer 150 as shown in FIG. 1K. In this embodiment, M is, for example, 6, that is, the multi-layer circuit board has sequentially formed the first to fifth stacked layers by using the first concentric pattern 122 as the alignment target before the board is removed, and the sixth stack Layer 170 (ie, the Mth stack) corresponds to a sixth dielectric layer 172 and a sixth wiring layer 174 that covers the sixth dielectric layer 172. Next, as shown in FIG. 5 and FIG. 1L, a sixth through hole 180 is formed which is projected through the second concentric circle pattern 124 from the center to the inner diameter of the first concentric circle 124a to the first to the multilayer circuit board 100a. The sixth stacked layer and the region of the substrate 110.
需說明的是,在以第一同心圓圖案122做對位標靶形成各層介電層(例如第一至第五堆疊層)的貫孔的同時,可分別於第二同心圓圖案124的第二通孔118正投影至對應介電層的位置上形成盲孔182,也就是在各層介電層(例如第一至第五堆疊層)對應於第二通孔118的位置上分別形成盲孔182,其中,盲孔182的外徑小於第一個同心圓124a的內徑。如此,由於各堆疊層已預先形成盲孔,降低介電層的總厚度,因此,在後續的製程中,雷射即可無需一次燒穿總厚度較厚之介電層而形成第六貫孔180。It should be noted that, when the first concentric pattern 122 is used as the alignment target to form the through holes of the dielectric layers (for example, the first to fifth stacked layers), the second concentric pattern 124 may be respectively The two through holes 118 are projected onto the corresponding dielectric layer to form the blind holes 182, that is, the blind holes are respectively formed at the positions of the respective dielectric layers (for example, the first to fifth stacked layers) corresponding to the second through holes 118. 182, wherein the outer diameter of the blind hole 182 is smaller than the inner diameter of the first concentric circle 124a. In this way, since the stacked layers have been previously formed with blind holes, the total thickness of the dielectric layer is reduced. Therefore, in the subsequent process, the laser can form the sixth through hole without burning through the dielectric layer having a thick total thickness at one time. 180.
之後,即可以第六貫孔180為對位標靶對第六堆疊層170進行後續製程,例如以第六貫孔180做為微影製程的對位標靶,對第六線路層174進行圖案化,以形成多層電路板的圖案化線路層,或是以第六貫孔180為對位標靶形成第六導通孔於第六堆疊層170上。After that, the sixth through hole 180 can be used as a registration target to perform subsequent processing on the sixth stacked layer 170, for example, the sixth through hole 180 is used as a aligning target of the lithography process, and the sixth circuit layer 174 is patterned. The patterning circuit layer is formed to form a multilayer circuit board, or the sixth via hole is formed on the sixth stacked layer 170 by using the sixth through hole 180 as an alignment target.
請接續參照圖1M,形成第七堆疊層190(也就是第M+1堆疊層)於第六堆疊層170上。第七堆疊層190包括第七介電層192以及覆蓋第七介電層192的第七線路層194。之後,再如圖5及圖1N所示,形成一第七貫孔195,其貫穿第二同心圓圖案124由中心向外第二個同心圓124b的內徑正投影至第一至第七堆疊層及基材110的區域。Referring to FIG. 1M, a seventh stacked layer 190 (that is, an M+1 stacked layer) is formed on the sixth stacked layer 170. The seventh stacked layer 190 includes a seventh dielectric layer 192 and a seventh wiring layer 194 covering the seventh dielectric layer 192. Then, as shown in FIG. 5 and FIG. 1N, a seventh through hole 195 is formed which is projected through the second concentric circle pattern 124 from the center to the inner diameter of the second concentric circle 124b to the first to seventh stacks. The layer and the area of the substrate 110.
之後,即可以第七貫孔195為對位標靶對第七堆疊層190進行後續製程,例如以第七貫孔195做為微影製程的對位標靶,對第七線路層194進行圖案化,以形成多層電路板的圖案化線路層,或是以第七貫孔195為對位標靶形成第七導通孔於第七堆疊層190上,其中,第七導通孔連接第六堆疊層170上的第六導通孔,且各層的導通孔皆彼此連接,以導通多層電路板的各層堆疊層。After that, the seventh via 195 can be used as a aligning target to perform the subsequent processing on the seventh stacked layer 190, for example, the seventh through hole 195 is used as a aligning target of the lithography process, and the seventh circuit layer 194 is patterned. Forming a patterned circuit layer of the multilayer circuit board, or forming a seventh via hole on the seventh stacked layer 190 by using the seventh through hole 195 as an alignment target, wherein the seventh via hole is connected to the sixth stacked layer The sixth via hole on the 170, and the via holes of each layer are connected to each other to turn on the stacked layers of the various layers of the multilayer circuit board.
如前所述,第六貫孔180及第七貫孔195亦可利用二氧化碳雷射鑽孔或是直接雷射鑽孔的方式而形成。同樣的,若使用二氧化碳雷射來形成第六貫孔180及第七貫孔195,需先形成如圖6A及圖6C所示的開口174a、194a,以分別暴露出第二同心圓圖案124正投影至第六介電層172及第二介電層192的區域,再進行鑽孔程序。若是利用直接雷射鑽孔的方式,則無須形成開口174a、194a,而可立即進行直接雷射鑽孔。As described above, the sixth through hole 180 and the seventh through hole 195 can also be formed by means of carbon dioxide laser drilling or direct laser drilling. Similarly, if a carbon dioxide laser is used to form the sixth through hole 180 and the seventh through hole 195, openings 174a and 194a as shown in FIGS. 6A and 6C are formed to expose the second concentric pattern 124, respectively. The area is projected to the sixth dielectric layer 172 and the second dielectric layer 192, and the drilling process is performed. If direct laser drilling is used, it is not necessary to form openings 174a, 194a, and direct laser drilling can be performed immediately.
圖6是依照本發明的一實施例的多層電路板的剖面示意圖及其局部放大示意圖。請參照圖6,在此須說明的是,本實施例 的多層電路板的結合材119設置於兩核心層110a、110b的周緣區域,以接合兩核心層110a、110b,並於兩核心層110a、110b的周緣形成一密合區,使兩核心層110a、110b暫時地接合在一起,以避免後續製程中所使用的藥劑滲入於兩核心層110a、110b之間。而第一同心圓圖案122以及第二同心圓圖案(如圖2所示的第二同心圓圖案124)則可對應結合材119設置,使第一通孔116可如圖6所示地形成於密合區內或是形成於密合區至多層電路板的外緣之間的區域,以防止第一通孔116破壞兩核心層110a、110b間的氣密狀態,甚而導致製程藥液經由第一通孔116滲流至兩核心層110a、110b之間。6 is a cross-sectional view of a multilayer circuit board and a partially enlarged schematic view thereof in accordance with an embodiment of the present invention. Please refer to FIG. 6 , it should be noted that the embodiment is The bonding material 119 of the multi-layer circuit board is disposed on the peripheral regions of the two core layers 110a, 110b to join the two core layers 110a, 110b, and form a close-up region on the periphery of the two core layers 110a, 110b, so that the two core layers 110a 110b is temporarily joined together to prevent the agent used in the subsequent process from infiltrating between the two core layers 110a, 110b. The first concentric pattern 122 and the second concentric pattern (such as the second concentric pattern 124 shown in FIG. 2) may be disposed corresponding to the bonding material 119, so that the first through hole 116 may be formed as shown in FIG. 6. The adhesion region is formed in a region between the adhesion region and the outer edge of the multilayer circuit board to prevent the first through hole 116 from breaking the airtight state between the two core layers 110a and 110b, and even causing the process liquid to pass through the first A through hole 116 seeps between the two core layers 110a, 110b.
綜上所述,本發明的多層電路板製作方法是先以兩個核心層壓合成一基材,在於基材的表面形成同心圓圖案,而之後的各層堆疊層皆是以此最內層基材上的同心圓圖案做對位標靶來形成對應的對位貫孔,再以各層的對位貫孔分別進行對應的堆疊層的後續製程,例如以對位貫孔為對位基準形成各層的圖案化線路層及導通孔等。並且,在基板上重覆增層至其具有一定的結構強度後,即可使基材的兩核心層彼此分離,以形成兩個獨立的多層電路板,之後再分別對兩獨立的多層電路板進行後續的增層製程。因此,本發明的製作方法可一次形成兩個獨立的多層電路板,且可減少習知中多層電路板的各層間對位誤差的累積,更可減少習知的多層電路板有層偏的問題產生。此外,由於各層的導通孔皆是以同一微影製程所形成的同心圓圖案來當作對位標靶而形 成,可減少導通孔因各層間的對位誤差累積而造成導通孔偏移甚至彼此無法銜接的情形。因此,本發明確實能提升線路層的佈線密度與能力,且導通孔與底層接墊的設計因對位精準度的提高而可走向微型化,更可製作單邊對準度小於50μm的圖案設計。In summary, the method for fabricating a multilayer circuit board of the present invention is to first laminate a substrate by two cores, and form a concentric pattern on the surface of the substrate, and then the stacked layers of each layer are the innermost layer. The concentric circles on the material are used as alignment targets to form corresponding pairs of through holes, and then the corresponding layers of the respective layers are respectively subjected to subsequent processes of the stacked layers, for example, the layers are formed by using the alignment holes as the alignment reference. Patterned circuit layers, vias, and the like. Moreover, after the substrate is repeatedly layered to have a certain structural strength, the two core layers of the substrate can be separated from each other to form two independent multilayer circuit boards, and then the two independent multilayer circuit boards are respectively separated. Carry out the subsequent layering process. Therefore, the manufacturing method of the present invention can form two independent multilayer circuit boards at a time, and can reduce the accumulation of alignment errors between layers of the conventional multilayer circuit board, and can reduce the problem of layering of the conventional multilayer circuit board. produce. In addition, since the via holes of each layer are formed by a concentric pattern formed by the same lithography process, they are shaped as alignment targets. In this way, it is possible to reduce the situation in which the via holes are displaced due to the accumulation error of the interlayers, and the via holes are not even connected to each other. Therefore, the present invention can improve the wiring density and capability of the circuit layer, and the design of the via hole and the underlying pad can be miniaturized due to the improvement of the alignment accuracy, and the pattern design with a single side alignment of less than 50 μm can be produced. .
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.
110‧‧‧基材110‧‧‧Substrate
111‧‧‧週邊區111‧‧‧The surrounding area
113‧‧‧核心區113‧‧‧ core area
116‧‧‧第一通孔116‧‧‧First through hole
118‧‧‧第二通孔118‧‧‧Second through hole
120‧‧‧第一圖案化線路層120‧‧‧First patterned circuit layer
122‧‧‧第一同心圓圖案122‧‧‧First concentric pattern
122a‧‧‧第一個同心圓122a‧‧‧The first concentric circle
122b‧‧‧第二個同心圓122b‧‧‧Second concentric circle
124‧‧‧第二同心圓圖案124‧‧‧Second concentric pattern
D1‧‧‧通孔外徑D1‧‧‧through hole outer diameter
D2‧‧‧同心圓圖案外徑D2‧‧‧ concentric pattern outer diameter
G1‧‧‧間距G1‧‧‧ spacing
Claims (16)
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| TW102131064A TWI484886B (en) | 2013-08-29 | 2013-08-29 | Multilayer circuit board manufacturing method |
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| TW102131064A TWI484886B (en) | 2013-08-29 | 2013-08-29 | Multilayer circuit board manufacturing method |
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| TWI484886B true TWI484886B (en) | 2015-05-11 |
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| TWI742915B (en) * | 2020-11-09 | 2021-10-11 | 健鼎科技股份有限公司 | Alignment metohd for circuit board manufacturing process and complexed target |
| CN114364167B (en) * | 2021-12-23 | 2023-11-07 | 江苏普诺威电子股份有限公司 | Double-layer packaging substrate alignment method suitable for laser through holes |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5078687B2 (en) * | 2007-03-22 | 2012-11-21 | 日本特殊陶業株式会社 | Manufacturing method of multilayer wiring board |
| TWM443360U (en) * | 2012-07-11 | 2012-12-11 | Flexium Interconnect Inc | Flexible printed circuit board of a monitor mark |
| CN102958291A (en) * | 2011-08-23 | 2013-03-06 | 北大方正集团有限公司 | Printed circuit board and manufacture method thereof |
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2013
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5078687B2 (en) * | 2007-03-22 | 2012-11-21 | 日本特殊陶業株式会社 | Manufacturing method of multilayer wiring board |
| CN102958291A (en) * | 2011-08-23 | 2013-03-06 | 北大方正集团有限公司 | Printed circuit board and manufacture method thereof |
| TWM443360U (en) * | 2012-07-11 | 2012-12-11 | Flexium Interconnect Inc | Flexible printed circuit board of a monitor mark |
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