TWI484579B - - Google Patents
Info
- Publication number
- TWI484579B TWI484579B TW101143728A TW101143728A TWI484579B TW I484579 B TWI484579 B TW I484579B TW 101143728 A TW101143728 A TW 101143728A TW 101143728 A TW101143728 A TW 101143728A TW I484579 B TWI484579 B TW I484579B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110448621.2A CN103187943B (en) | 2011-12-28 | 2011-12-28 | Radio-frequency filter for electrostatic chuck |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201342508A TW201342508A (en) | 2013-10-16 |
| TWI484579B true TWI484579B (en) | 2015-05-11 |
Family
ID=48678933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101143728A TW201342508A (en) | 2011-12-28 | 2012-11-22 | Radio frequency filter for electrostatic chuck |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103187943B (en) |
| TW (1) | TW201342508A (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104637838B (en) * | 2013-11-15 | 2018-06-26 | 中微半导体设备(上海)有限公司 | A kind of semiconductor processing device |
| CN104733363B (en) * | 2013-12-19 | 2017-07-14 | 中微半导体设备(上海)有限公司 | A kind of radio frequency filter circuit and electrostatic chuck |
| CN104753486B (en) * | 2013-12-31 | 2019-02-19 | 北京北方华创微电子装备有限公司 | A kind of radio-frequency filter and semiconductor processing equipment |
| US9312832B2 (en) * | 2014-07-23 | 2016-04-12 | Lam Research Corporation | High power filter with single adjust for multiple channels |
| CN105592674B (en) * | 2014-10-21 | 2018-08-28 | 深圳振华富电子有限公司 | Emi filter |
| US10044338B2 (en) * | 2015-10-15 | 2018-08-07 | Lam Research Corporation | Mutually induced filters |
| US11837446B2 (en) | 2017-07-31 | 2023-12-05 | Lam Research Corporation | High power cable for heated components in RF environment |
| CN111211029B (en) | 2018-11-21 | 2023-09-01 | 中微半导体设备(上海)股份有限公司 | A multi-zone temperature-controlled plasma reactor |
| CN111276381A (en) * | 2018-12-04 | 2020-06-12 | 江苏鲁汶仪器有限公司 | A device and method for adjusting wafer etching uniformity |
| CN111385915B (en) * | 2018-12-27 | 2022-04-26 | 中微半导体设备(上海)股份有限公司 | Plasma reactor and heating device thereof |
| CN111383894B (en) * | 2018-12-29 | 2022-12-30 | 中微半导体设备(上海)股份有限公司 | Plasma processor and electrostatic chuck heating method |
| US10985724B1 (en) * | 2020-06-10 | 2021-04-20 | Apple Inc. | Transformer-based wideband filter with ripple reduction |
| CN114975219A (en) * | 2022-05-24 | 2022-08-30 | 北京北方华创微电子装备有限公司 | Electrostatic chuck and semiconductor processing equipment |
| CN118971824A (en) * | 2023-05-15 | 2024-11-15 | 江苏鲁汶仪器股份有限公司 | A radio frequency filtering device and a radio frequency connecting device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200405443A (en) * | 2002-06-18 | 2004-04-01 | Anelva Corp | Electrostatic absorbing apparatus |
| TW200812226A (en) * | 2006-06-13 | 2008-03-01 | Applied Materials Inc | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3905870B2 (en) * | 2003-08-01 | 2007-04-18 | 東京エレクトロン株式会社 | Plasma processing equipment |
| JP5301812B2 (en) * | 2007-11-14 | 2013-09-25 | 東京エレクトロン株式会社 | Plasma processing equipment |
| CN101872733B (en) * | 2009-04-24 | 2012-06-27 | 中微半导体设备(上海)有限公司 | Systems and methods for sensing and removing residual charge from processed semiconductor process pieces |
-
2011
- 2011-12-28 CN CN201110448621.2A patent/CN103187943B/en active Active
-
2012
- 2012-11-22 TW TW101143728A patent/TW201342508A/en unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200405443A (en) * | 2002-06-18 | 2004-04-01 | Anelva Corp | Electrostatic absorbing apparatus |
| TW200812226A (en) * | 2006-06-13 | 2008-03-01 | Applied Materials Inc | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201342508A (en) | 2013-10-16 |
| CN103187943A (en) | 2013-07-03 |
| CN103187943B (en) | 2017-02-08 |