TWI481938B - In-cell touch display panel - Google Patents
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- TWI481938B TWI481938B TW102121164A TW102121164A TWI481938B TW I481938 B TWI481938 B TW I481938B TW 102121164 A TW102121164 A TW 102121164A TW 102121164 A TW102121164 A TW 102121164A TW I481938 B TWI481938 B TW I481938B
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Description
本發明是有關於一種觸控顯示面板,且特別是有關於一種內嵌式觸控顯示面板。The present invention relates to a touch display panel, and more particularly to an in-cell touch display panel.
隨著資訊技術、無線行動通訊和資訊家電的快速發展與應用,為了達到攜帶便利、體積輕巧化以及操作人性化的目的,許多資訊產品已由傳統之鍵盤或滑鼠等輸入裝置,轉變為使用觸控面板作為輸入裝置。With the rapid development and application of information technology, wireless mobile communication and information appliances, many information products have been transformed from traditional keyboards or mouse input devices to use for the convenience of portability, light weight and user-friendly operation. The touch panel is used as an input device.
目前,觸控面板大致可區分為電阻式、電容式、紅外線式及超音波式等觸控面板,其中以電阻式觸控面板與電容式觸控面板為最常見的產品。就電容式觸控面板而言,多點觸控的特性提供更人性化的操作模式而使得電容式觸控面板受到市場青睞。Currently, touch panels can be roughly classified into resistive, capacitive, infrared, and ultrasonic touch panels. Among them, resistive touch panels and capacitive touch panels are the most common products. In the case of a capacitive touch panel, the multi-touch feature provides a more user-friendly operating mode, making the capacitive touch panel popular in the market.
一般而言,觸控顯示面板具有顯示區以及周邊區,其中顯示區會設置有感測陣列以感測觸控事件的發生。在此,周邊區中會設置有與感測陣列連接的多條訊號傳遞線,訊號傳遞線可將 感測陣列感測到的訊號傳遞至後端處理單元。然而,為了設置數量眾多的訊號傳遞線,觸控顯示面板的周邊區將佔據一定的面積。如此一來,將很難滿足觸控顯示面板的窄邊框設計需求。Generally, the touch display panel has a display area and a peripheral area, wherein the display area is provided with a sensing array to sense the occurrence of a touch event. Here, a plurality of signal transmission lines connected to the sensing array are disposed in the peripheral area, and the signal transmission line can be The signal sensed by the sensing array is passed to the backend processing unit. However, in order to set a large number of signal transmission lines, the peripheral area of the touch display panel will occupy a certain area. As a result, it will be difficult to meet the narrow bezel design requirements of the touch display panel.
本發明提供一種內嵌式觸控顯示面板,其符合窄邊框設計需求。The invention provides an in-cell touch display panel which meets the requirements of a narrow bezel design.
本發明的內嵌式觸控顯示面板包括主動元件陣列基板、對向基板以及顯示介質層。主動元件陣列基板具有顯示區,主動元件陣列基板包括多個主動元件、多個畫素電極、第一絕緣層、第二絕緣層以及多個共用電極。主動元件陣列排列於顯示區內。畫素電極位於顯示區內,並且分別耦接到相應的主動元件。第一絕緣層覆蓋主動元件以及畫素電極。導電層配置於第一絕緣層上。導電層包括多個接墊以及多條第一連接線。接墊鄰近主動元件陣列基板的一側。第一連接線分別沿第一方向延伸,並且位於顯示區內。第一連接線分別連接相應的接墊。第二絕緣層配置於導電層上並且具有多個接觸窗。共用電極配置於第二絕緣層上,並且分別對應於畫素電極設置。共用電極排列成沿第二方向延伸的多個共用電極串列,其中每兩個以上的共用電極串列相連以形成第一電極線,使主動元件陣列基板的所有共用電極形成沿第一方向依序排列的N條第一電極線。第J條第一連接線與第K~N條第一電極線相交,並且經由相應的接觸窗連接至第K條第一電極 線,J、K、N為正整數。對向基板對應於主動元件陣列基板。對向基板的表面上具有多條第二電極線。第二電極線分別沿第一方向延伸,且第一電極線與第二電極線共同構成一感測陣列。顯示介質層夾置於主動元件陣列基板與對向基板之間。The in-cell touch display panel of the present invention includes an active device array substrate, an opposite substrate, and a display medium layer. The active device array substrate has a display area, and the active device array substrate includes a plurality of active elements, a plurality of pixel electrodes, a first insulating layer, a second insulating layer, and a plurality of common electrodes. The array of active components is arranged in the display area. The pixel electrodes are located within the display area and are respectively coupled to respective active components. The first insulating layer covers the active device and the pixel electrode. The conductive layer is disposed on the first insulating layer. The conductive layer includes a plurality of pads and a plurality of first connecting lines. The pad is adjacent to one side of the active device array substrate. The first connecting lines respectively extend in the first direction and are located in the display area. The first connecting lines are respectively connected to the corresponding pads. The second insulating layer is disposed on the conductive layer and has a plurality of contact windows. The common electrodes are disposed on the second insulating layer and respectively correspond to the pixel electrodes. The common electrodes are arranged in a plurality of common electrode series extending in the second direction, wherein each two or more common electrode series are connected to form a first electrode line, so that all common electrodes of the active device array substrate are formed along the first direction N first electrode lines arranged in sequence. The Jth first connecting line intersects the Kth to Nth first electrode lines, and is connected to the Kth first electrode via a corresponding contact window Line, J, K, N are positive integers. The opposite substrate corresponds to the active device array substrate. There are a plurality of second electrode lines on the surface of the opposite substrate. The second electrode lines respectively extend in the first direction, and the first electrode lines and the second electrode lines together form a sensing array. The display medium layer is sandwiched between the active device array substrate and the opposite substrate.
本發明的內嵌式觸控顯示面板包括主動元件陣列基板、對向基板以及顯示介質層。主動元件陣列基板具有顯示區。主動元件陣列基板包括多個主動元件、多個共用電極、第一絕緣層、導電層、第二絕緣層以及多個畫素電極。主動元件陣列排列於示區內。共用電極位於顯示區內,並且分別對應於主動元件設置,共用電極排列成沿第二方向延伸的多個共用電極串列,其中每兩個以上的共用電極串列相互連接,以形成第一電極線,使主動元件陣列基板的所有共用電極形成沿第一方向依序排列的N條第一電極線,N為正整數。第一絕緣層覆蓋主動元件以及共用電極,並且具有多個接觸窗。導電層配置於第一絕緣層上。導電層包括多個接墊以及多條第一連接線。接墊鄰近主動元件陣列基板的一側。第一連接線分別沿第二方向延伸,並且位於顯示區內。第一連接線分別連接的該些接墊,其中第J條第一連接線與第K~N條第一電極線相交,並且經由相應的接觸窗連接至第K條第一電極線,J、K為正整數。第二絕緣層配置於導電層上。畫素電極配置於第二絕緣層上,並且位於顯示區內,畫素電極分別耦接到相應的主動元件。對向基板對應於主動元件陣列基板。對向基板的表面上具有多條第二電極線,第二電極線分別沿第二方向延伸,且 第一電極線與第二電極線共同構成感測陣列。顯示介質層夾置於主動元件陣列基板與對向基板之間。The in-cell touch display panel of the present invention includes an active device array substrate, an opposite substrate, and a display medium layer. The active device array substrate has a display area. The active device array substrate includes a plurality of active elements, a plurality of common electrodes, a first insulating layer, a conductive layer, a second insulating layer, and a plurality of pixel electrodes. The array of active components is arranged in the display area. The common electrodes are located in the display area and respectively correspond to the active element arrangement, and the common electrodes are arranged in a plurality of common electrode series extending in the second direction, wherein each two or more common electrode series are connected to each other to form the first electrode The wires are such that all the common electrodes of the active device array substrate form N first electrode lines arranged in the first direction, and N is a positive integer. The first insulating layer covers the active device and the common electrode and has a plurality of contact windows. The conductive layer is disposed on the first insulating layer. The conductive layer includes a plurality of pads and a plurality of first connecting lines. The pad is adjacent to one side of the active device array substrate. The first connecting lines respectively extend in the second direction and are located in the display area. The first connecting lines are respectively connected to the pads, wherein the Jth first connecting lines intersect the Kth to Nth first electrode lines, and are connected to the Kth first electrode lines via corresponding contact windows, J. K is a positive integer. The second insulating layer is disposed on the conductive layer. The pixel electrodes are disposed on the second insulating layer and are located in the display area, and the pixel electrodes are respectively coupled to the corresponding active components. The opposite substrate corresponds to the active device array substrate. a plurality of second electrode lines on the surface of the opposite substrate, the second electrode lines respectively extending in the second direction, and The first electrode line and the second electrode line together form a sensing array. The display medium layer is sandwiched between the active device array substrate and the opposite substrate.
基於上述,本發明於主動元件陣列基板的顯示區中設置第一連接線,且第一連接線可傳遞第一電極線之訊號至接墊,因此可以減少周邊區的面積,進而滿足觸控顯示面板的窄邊框設計需求。Based on the above, the first connection line is disposed in the display area of the active device array substrate, and the first connection line can transmit the signal of the first electrode line to the pad, thereby reducing the area of the peripheral area, thereby satisfying the touch display. The narrow bezel design needs of the panel.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.
10‧‧‧內嵌式觸控顯示面板10‧‧‧In-cell touch display panel
100、100a、100b‧‧‧主動元件陣列基板100, 100a, 100b‧‧‧ active device array substrate
102d‧‧‧顯示區102d‧‧‧ display area
102p‧‧‧周邊區102p‧‧‧ surrounding area
103、105‧‧‧導體層103, 105‧‧‧ conductor layer
104、106‧‧‧絕緣層104, 106‧‧‧Insulation
110‧‧‧主動元件110‧‧‧Active components
120‧‧‧畫素電極120‧‧‧pixel electrodes
120a‧‧‧主部120a‧‧‧ Main Department
120b‧‧‧支部120b‧‧‧ Branch
120c‧‧‧導電圖案120c‧‧‧ conductive pattern
130‧‧‧第一絕緣層130‧‧‧First insulation
140‧‧‧導電層140‧‧‧ Conductive layer
142‧‧‧接墊142‧‧‧ pads
144a、144a(1)‧‧‧第一連接線144a, 144a (1) ‧ ‧ first cable
144b‧‧‧第二連接線144b‧‧‧second cable
144c‧‧‧第三連接線144c‧‧‧ third cable
146‧‧‧導電配線146‧‧‧Electrical wiring
150‧‧‧第二絕緣層150‧‧‧Second insulation
160‧‧‧共用電極160‧‧‧Common electrode
160a‧‧‧共用電極圖案160a‧‧‧Common electrode pattern
160s‧‧‧共用電極串列160s‧‧‧Common electrode series
170‧‧‧輔助連接線170‧‧‧Auxiliary cable
200‧‧‧對向基板200‧‧‧ opposite substrate
202‧‧‧基板202‧‧‧Substrate
202a‧‧‧外表面202a‧‧‧Outer surface
202b‧‧‧內表面202b‧‧‧ inner surface
300‧‧‧顯示介質層300‧‧‧Display media layer
A-A’、B-B’、C-C’、D-D’‧‧‧剖線A-A’, B-B’, C-C’, D-D’‧‧‧
C1、C3、C4、C5‧‧‧連接部C1, C3, C4, C5‧‧‧ Connections
C2‧‧‧導電圖案C2‧‧‧ conductive pattern
COM‧‧‧共用配線COM‧‧‧Shared wiring
D1‧‧‧第一方向D1‧‧‧ first direction
D2‧‧‧第二方向D2‧‧‧ second direction
E‧‧‧感測陣列E‧‧‧Sensor array
E1、E1(1)、E1(2)、E1(3)、E1(4)‧‧‧第一電極線E1, E1 (1), E1 (2), E1 (3), E1 (4) ‧ ‧ first electrode line
E2‧‧‧第二電極線E2‧‧‧Second electrode line
d1‧‧‧第一間距D1‧‧‧first spacing
d2‧‧‧第二間距D2‧‧‧second spacing
d3‧‧‧第三間距D3‧‧‧ third spacing
L‧‧‧斷差L‧‧‧断差
G‧‧‧閘極G‧‧‧ gate
S‧‧‧源極S‧‧‧ source
SL‧‧‧掃描線SL‧‧‧ scan line
DL‧‧‧資料線DL‧‧‧ data line
CH‧‧‧通道層CH‧‧‧ channel layer
D‧‧‧汲極D‧‧‧汲
P‧‧‧子畫素單元P‧‧‧ sub-pixel unit
R1‧‧‧第一區R1‧‧‧ first district
R2‧‧‧第二區R2‧‧‧Second District
R3‧‧‧第三區R3‧‧‧ Third District
H、H1、H2‧‧‧接觸窗H, H1, H2‧‧‧ contact window
圖1A為本發明一實施例的內嵌式觸控顯示面板的剖面示意圖。FIG. 1A is a schematic cross-sectional view of an in-cell touch display panel according to an embodiment of the invention.
圖1B為本發明另一實施例的內嵌式觸控顯示面板的剖面示意圖。FIG. 1B is a schematic cross-sectional view of an in-cell touch display panel according to another embodiment of the invention.
圖2為一實施例的主動元件陣列基板的上視示意圖。2 is a top plan view of an active device array substrate of an embodiment.
圖3為畫素結構的上視示意圖。Figure 3 is a top plan view of the pixel structure.
圖4A為圖2之主動元件陣列基板的局部放大示意圖。4A is a partially enlarged schematic view of the active device array substrate of FIG. 2.
圖4B為圖4A之共用電極與共用電極圖案的上視示意圖。4B is a top view of the common electrode and common electrode pattern of FIG. 4A.
圖5A為一實施例的主動元件陣列基板的局部剖面示意圖。5A is a partial cross-sectional view showing an active device array substrate of an embodiment.
圖5B為一實施例的主動元件陣列基板的局部剖面示意圖。FIG. 5B is a partial cross-sectional view showing an active device array substrate according to an embodiment.
圖6繪示第三區的局部放大示意圖。FIG. 6 is a partially enlarged schematic view showing the third zone.
圖7A為另一實施例的主動元件陣列基板的局部剖面示意圖。7A is a partial cross-sectional view showing an active device array substrate of another embodiment.
圖7B為另一實施例的主動元件陣列基板的局部剖面示意圖。7B is a partial cross-sectional view showing an active device array substrate of another embodiment.
圖7C為另一實施例的主動元件陣列基板的局部剖面示意圖。7C is a partial cross-sectional view showing an active device array substrate of another embodiment.
圖8A至圖8C分別為本發明另一實施例的主動元件陣列基板的第一區、第二區以及第三區的上視示意圖。8A to 8C are top plan views of a first region, a second region, and a third region of an active device array substrate according to another embodiment of the present invention.
圖8D為圖8A至圖8C之共用電極、共用電極圖案、掃描線以及共用配線的上視示意圖。8D is a top plan view of the common electrode, the common electrode pattern, the scan line, and the common wiring of FIGS. 8A to 8C.
圖9A至圖9B分別為沿圖8A之剖線C-C’以及剖線D-D’的剖面示意圖。9A to 9B are schematic cross-sectional views taken along line C-C' and line D-D' of Fig. 8A, respectively.
圖10為本發明另一實施例的主動元件陣列基板的上視示意圖。FIG. 10 is a top plan view of an active device array substrate according to another embodiment of the present invention.
圖11為本發明另一實施例的主動元件陣列基板的上視示意圖。FIG. 11 is a top plan view of an active device array substrate according to another embodiment of the present invention.
圖1A為本發明一實施例之內嵌式觸控顯示面板(In-cell touch display panel)的剖面示意圖。請參照圖1A,內嵌式觸控顯示面板10包括主動元件陣列基板100、對向基板200以及顯示介質層300。對向基板200對應主動陣列基板100設置,其中顯示介質層300夾置於主動元件陣列基板100與對向基板200之間。FIG. 1A is a schematic cross-sectional view of an in-cell touch display panel according to an embodiment of the invention. Referring to FIG. 1A , the in-cell touch display panel 10 includes an active device array substrate 100 , a counter substrate 200 , and a display medium layer 300 . The opposite substrate 200 is disposed corresponding to the active array substrate 100, wherein the display medium layer 300 is sandwiched between the active device array substrate 100 and the opposite substrate 200.
圖2為主動元件陣列基板100的上視示意圖。請參照圖2,主動元件陣列基板100具有顯示區102d以及周邊區102p,其 中周邊區102p環繞顯示區102d設置。主動元件陣列基板100上具有多個子畫素單元P,圖3繪示了其中一個子畫素單元P的放大示意圖。請參照圖2以及圖3,主動元件陣列基板100包括多個主動元件110、多個畫素電極120、第一絕緣層130、導電層140、第二絕緣層150以及多個共用電極160。須說明的是,為了清楚繪示各構件的配置關係,圖2以及圖3省略繪示第一絕緣層130以及第二絕緣層150。關於第一絕緣層130以及第二絕緣層150的膜層位置,可參照後續圖5A至圖5B的剖面示意圖。2 is a top plan view of the active device array substrate 100. Referring to FIG. 2, the active device array substrate 100 has a display area 102d and a peripheral area 102p. The middle peripheral area 102p is disposed around the display area 102d. The active device array substrate 100 has a plurality of sub-pixel units P thereon, and FIG. 3 illustrates an enlarged schematic view of one of the sub-pixel units P. Referring to FIG. 2 and FIG. 3 , the active device array substrate 100 includes a plurality of active devices 110 , a plurality of pixel electrodes 120 , a first insulating layer 130 , a conductive layer 140 , a second insulating layer 150 , and a plurality of common electrodes 160 . It should be noted that, in order to clearly illustrate the arrangement relationship of the members, the first insulating layer 130 and the second insulating layer 150 are omitted from FIGS. 2 and 3 . Regarding the film layer positions of the first insulating layer 130 and the second insulating layer 150, reference may be made to the cross-sectional schematic views of FIGS. 5A to 5B.
請參照圖2以及圖3,主動元件110陣列地排列於顯示區102d內。如圖3所示,主動元件110包括閘極G、通道層CH、源極S以及汲極D,其中主動元件110的閘極G以及源極S分別連接至不同的訊號線。舉例而言,閘極G連接至對應的掃描線SL以及源極S連接至對應的資料線DL。本實施例的主動元件110以底部閘極型薄膜電晶體為例說明。然而,在其他實施例中,主動元件110也可以是頂部閘極型薄膜電晶體或其它合適類型的薄膜電晶體,本發明不限於此。此外,通道層CH可為單層或多層結構,且其材料包含非晶矽、多晶矽、單晶矽、微晶矽、奈米矽、有機半導體材料、氧化物半導體材料、或其它合適的材料、或上述至少二種材料之組合。Referring to FIG. 2 and FIG. 3, the active elements 110 are arrayed in the display area 102d. As shown in FIG. 3, the active device 110 includes a gate G, a channel layer CH, a source S, and a drain D. The gate G and the source S of the active device 110 are respectively connected to different signal lines. For example, the gate G is connected to the corresponding scan line SL and the source S is connected to the corresponding data line DL. The active device 110 of this embodiment is exemplified by a bottom gate type thin film transistor. However, in other embodiments, the active device 110 can also be a top gate type thin film transistor or other suitable type of thin film transistor, and the invention is not limited thereto. In addition, the channel layer CH may be a single layer or a multilayer structure, and the material thereof comprises amorphous germanium, polycrystalline germanium, single crystal germanium, microcrystalline germanium, nano germanium, organic semiconductor material, oxide semiconductor material, or other suitable materials, Or a combination of at least two of the above materials.
畫素電極120位於顯示區102d內,且各個畫素電極120分別耦接至對應的主動元件110之汲極D。畫素電極120例如是具有分枝狀圖案。具體而言,畫素電極120包括主部120a與多個 支部120b,支部120b一端與主部120a連接,而支部120b就不連接其它的電極,其中支部120b由主部120a沿第一方向D1延伸至子畫素單元P的邊緣。支部120b之間彼此平行且具有間距以形成至少一個狹縫(未標示)。畫素電極120可為單層或多層結構,且其材質包括透明導電材料,例如:銦錫氧化物(ITO)、銦鋅氧化物(IZO)、透明有機導電材料、或其他適合的透明導電材料、或其他適合的導電材料、或上述至少二種導電材料的組合。The pixel electrodes 120 are located in the display area 102d, and the respective pixel electrodes 120 are respectively coupled to the drains D of the corresponding active elements 110. The pixel electrode 120 has, for example, a branched pattern. Specifically, the pixel electrode 120 includes a main portion 120a and a plurality of The branch portion 120b, one end of the branch portion 120b is connected to the main portion 120a, and the branch portion 120b is not connected to other electrodes, wherein the branch portion 120b is extended by the main portion 120a in the first direction D1 to the edge of the sub-pixel unit P. The branches 120b are parallel to each other and have a spacing to form at least one slit (not labeled). The pixel electrode 120 may be a single layer or a multilayer structure, and the material thereof includes a transparent conductive material such as indium tin oxide (ITO), indium zinc oxide (IZO), transparent organic conductive material, or other suitable transparent conductive material. Or other suitable electrically conductive material, or a combination of at least two of the above electrically conductive materials.
第一絕緣層130(繪示於圖5A以及圖5B中)覆蓋上述主動元件110與畫素電極120。第一絕緣層130可為單層或多層結構,且其材質包括無機介電材料(例如是氧化矽、氮化矽、氮氧化矽或其它合適的無機介電材料)或有機介電材料(例如:苯並環丁烯(benzocyclobutene,BCB)、聚亞醯氨(polyimide,PI)、聚苯并唑(polybenzoxazole,PBO)、聚苯酚喹啉(polyphenylquinoxaline,PPQ)、聚苯乙烯(polystyrene,PS)或其它合適的有機介電材料)。The first insulating layer 130 (shown in FIGS. 5A and 5B ) covers the active device 110 and the pixel electrode 120 described above. The first insulating layer 130 may be a single layer or a multilayer structure, and the material thereof includes an inorganic dielectric material (for example, hafnium oxide, tantalum nitride, hafnium oxynitride or other suitable inorganic dielectric material) or an organic dielectric material (for example) : benzocyclobutene (BCB), polyimide (PI), polybenzoxazole (PBO), polyphenylquinoxaline (PPQ), polystyrene (PS) Or other suitable organic dielectric material).
圖4A為圖2之主動元件陣列基板的局部放大示意圖。圖4B為圖4A之共用電極與共用電極圖案的上視示意圖。須說明的是,為了清楚繪示各構件的配置關係,圖4A省略繪示部分構件(例如掃描線SL、資料線DL、主動元件110與畫素電極120),其中主動元件陣列基板100上的不同子畫素單元P中的主動元件110與畫素電極120的結構設計大致相同,本領域具有通常知識者在參考圖3的子畫素單元後應可了解其他子畫素單元P中的主動元件110與畫素電極120的設計方式。4A is a partially enlarged schematic view of the active device array substrate of FIG. 2. 4B is a top view of the common electrode and common electrode pattern of FIG. 4A. It should be noted that, in order to clearly illustrate the arrangement relationship of the components, FIG. 4A omits part of the components (for example, the scan line SL, the data line DL, the active device 110, and the pixel electrode 120), wherein the active device array substrate 100 The active elements 110 in the different sub-pixel units P are substantially identical in structure to the pixel electrodes 120. Those skilled in the art should understand the actives in the other sub-pixel units P after referring to the sub-pixel elements of FIG. The design of the element 110 and the pixel electrode 120.
請參照圖2、圖4A以及圖4B,導電層140配置於第一絕緣層130(繪示於圖5A以及圖5B中)上。導電層140包括多個接墊142以及多條第一連接線144a。接墊142位於周邊區102p中。第一連接線144a位於顯示區102d中,且每一條第一連接線144a沿第一方向D1延伸。第一連接線144a連接至對應的接墊142。須說明的是,前述訊號線(如掃描線SL以及資料線DL)亦分別連接至對應的訊號線接墊(未繪示)。在此,訊號線接墊(未繪示)與前述的接墊142為不同的接墊。導電層140為單層或多層結構,且其材質包括金屬材料、合金、金屬材料的氮化物、金屬材料的氧化物、金屬材料的氮氧化物、合金的氮化物、合金的氧化物、合金的氮氧化物、有機導電材料、或是其它合適的材料。Referring to FIG. 2, FIG. 4A and FIG. 4B, the conductive layer 140 is disposed on the first insulating layer 130 (shown in FIGS. 5A and 5B). The conductive layer 140 includes a plurality of pads 142 and a plurality of first connecting lines 144a. The pads 142 are located in the peripheral region 102p. The first connection line 144a is located in the display area 102d, and each of the first connection lines 144a extends in the first direction D1. The first connection line 144a is connected to the corresponding pad 142. It should be noted that the signal lines (such as the scan line SL and the data line DL) are also respectively connected to corresponding signal line pads (not shown). Here, the signal line pads (not shown) are different pads from the aforementioned pads 142. The conductive layer 140 is a single layer or a multilayer structure, and the material thereof includes a metal material, an alloy, a nitride of a metal material, an oxide of a metal material, an oxynitride of a metal material, a nitride of an alloy, an oxide of an alloy, and an alloy. Nitrogen oxides, organic conductive materials, or other suitable materials.
第二絕緣層150(繪示於圖5A以及圖5B中)覆蓋於上述導電層140與第一絕緣層130上。第二絕緣層150可為單層或多層結構,且其材質包括無機介電材料(例如是氧化矽、氮化矽、氮氧化矽或其它合適的無機介電材料)或有機介電材料(例如:苯並環丁烯(benzocyclobutene,BCB)、聚亞醯氨(polyimide,PI)、聚苯并唑(polybenzoxazole,PBO)、聚苯酚喹啉(polyphenylquinoxaline,PPQ)、聚苯乙烯(polystyrene,PS)或其它合適的有機介電材料)。The second insulating layer 150 (shown in FIGS. 5A and 5B ) covers the conductive layer 140 and the first insulating layer 130 . The second insulating layer 150 may be a single layer or a multilayer structure, and the material thereof includes an inorganic dielectric material (for example, hafnium oxide, tantalum nitride, hafnium oxynitride or other suitable inorganic dielectric material) or an organic dielectric material (for example) : benzocyclobutene (BCB), polyimide (PI), polybenzoxazole (PBO), polyphenylquinoxaline (PPQ), polystyrene (PS) Or other suitable organic dielectric material).
共用電極160配置於第二絕緣層150上。請參考圖3來說明共用電極160與畫素電極120的設置關係,在圖3的子畫素單元P中,每一個共用電極160對應一個畫素電極120設置,共用電極160部分覆蓋畫素電極120。共用電極160例如是具有多個 狹縫(未標示),由上視圖來看,畫素電極120設置於共用電極160的狹縫間,且共用電極160設置於畫素電極120的狹縫間。如此一來,當畫素電極120與共用電極160被施加不同電壓時,畫素電極120與共用電極160之間會產生電場以驅動顯示介質。換言之,本實施例之顯示介質的驅動模式實質上為一種橫向電場驅動模式。The common electrode 160 is disposed on the second insulating layer 150. Referring to FIG. 3, the arrangement relationship between the common electrode 160 and the pixel electrode 120 is illustrated. In the sub-pixel unit P of FIG. 3, each common electrode 160 is disposed corresponding to one pixel electrode 120, and the common electrode 160 partially covers the pixel electrode. 120. The common electrode 160 has, for example, a plurality of In the slit (not shown), the pixel electrodes 120 are disposed between the slits of the common electrode 160, and the common electrode 160 is disposed between the slits of the pixel electrode 120. As a result, when the pixel electrode 120 and the common electrode 160 are applied with different voltages, an electric field is generated between the pixel electrode 120 and the common electrode 160 to drive the display medium. In other words, the driving mode of the display medium of the present embodiment is substantially a transverse electric field driving mode.
請再參考圖2、圖4A以及圖4B,共用電極160排列成多個共用電極串列160s,其中每一個共用電極串列160s沿第二方向D2延伸,且這些共用電極串列160s沿第一方向D1排列,其中,第二方向D2與第一方向D1交錯,本發明以上述二方向實質上垂直為較佳實施例,但不限於此。每兩個以上的共用電極串列160s相連以形成一條第一電極線E1(1)~E1(4)。本實施例是以四個共用電極串列160s相連以形成其中一條第一電極線E1(1)~E1(4)。當然,本發明不限於此。在其他實施例中,每一條第一電極線E1(1)~E1(4)包括互相連接的三個、四個或更多個的共用電極串列160s。Referring to FIG. 2, FIG. 4A and FIG. 4B, the common electrode 160 is arranged in a plurality of common electrode serials 160s, wherein each of the common electrode serials 160s extends in the second direction D2, and the common electrode serials 160s are along the first The direction D1 is arranged, wherein the second direction D2 is interlaced with the first direction D1, and the present invention is substantially perpendicular to the above two directions, but is not limited thereto. Each of the two or more common electrode serials 160s is connected to form one first electrode line E1(1) to E1(4). In this embodiment, four common electrode serials 160s are connected to form one of the first electrode lines E1(1) to E1(4). Of course, the invention is not limited thereto. In other embodiments, each of the first electrode lines E1(1) to E1(4) includes three, four or more common electrode strings 160s connected to each other.
此外,所有的共用電極串列160s相連後可形成沿第一方向D1依序排列的N條第一電極線E1(1)~E1(4),相鄰的第一電極線E1(1)~E1(4)之間具有斷差L(請參閱圖4A與圖4B),例如:二相鄰的第一電極線E1(1)、E(2)係彼此分離並不互相連接。本實施例之主動元件陣列基板100是以繪示四條第一電極線E1(1)~E1(4)為例說明,當然,本發明不限於此。在其他實施例中,主動元件 陣列基板100可以包括更多數量的第一電極線。In addition, all the common electrode serials 160s are connected to form N first electrode lines E1(1) to E1(4) arranged in the first direction D1, and the adjacent first electrode lines E1(1)~ There is a gap L between E1(4) (see FIG. 4A and FIG. 4B), for example, two adjacent first electrode lines E1(1), E(2) are separated from each other and are not connected to each other. The active device array substrate 100 of the present embodiment is illustrated by taking four first electrode lines E1(1) to E1(4) as an example. Of course, the present invention is not limited thereto. In other embodiments, the active component The array substrate 100 may include a greater number of first electrode lines.
在本實施例中,第J條第一連接線144a與第K~N條第一電極線相交,並且經由相應的接觸窗H連接至第K條第一電極線E1,J、K、N為正整數。舉例而言,第1條第一連接線144a(1)與第1~4條第一電極線E1(1)~E1(4)相交,其中第1條第一連接線144a(1)經由相應的接觸窗H連接至第1條第一電極線E1(1),第1條第一連接線144a(1)跨越第2條第一電極線E1(2)至第4條第一電極線E1(4),且不與第2條第一電極線E1(2)至第4條第一電極線E1(4)連接,如圖2所示。In this embodiment, the Jth first connection line 144a intersects the Kth to Nth first electrode lines, and is connected to the Kth first electrode line E1 via the corresponding contact window H, J, K, N are A positive integer. For example, the first first connection line 144a(1) intersects the first to fourth first electrode lines E1(1) to E1(4), wherein the first first connection line 144a(1) is correspondingly The contact window H is connected to the first first electrode line E1(1), and the first first connection line 144a(1) spans the second first electrode line E1(2) to the fourth first electrode line E1 (4), and is not connected to the second first electrode line E1(2) to the fourth first electrode line E1(4), as shown in FIG.
在本實施例中,4條第一連接線144a僅有連接至第1條第一電極線E1(1),3條第一連接線144a僅有連接至第2條第一電極線E1(2),2條第一連接線144a僅有連接至第3條第一電極線E1(3),1條第一連接線144a僅有連接至第4條第一電極線E1(4)。具體而言,第1條第一電極線E1(1)與接墊142的距離較遠,因此用以連接第1條第一電極線E1(1)以及對應的接墊142(最左邊的接墊)的第一連接線144a具有較長的長度因而具有較高的傳導阻抗。相對地,用以連接第4條第一電極線E1(4)以及對應的接墊142(於圖2中從左邊數過來的第四個)的第一連接線144a的長度較短因而具有較低的傳導阻抗。據此,可設置較多條的連接第1條第一電極線E1(1)的第一連接線144a以減少其整體傳導阻抗,並且依序遞減連接至第2~4條第一電極線E1(2)~E1(4)的第一連接線144a的數量,如此一來,可以降低第1~4條第一電極線E1(1)~E1(4) 之間的阻抗差異(較佳是維持在約10%以內),進而提高觸控感測的精確性。In this embodiment, the four first connection lines 144a are only connected to the first first electrode line E1(1), and the three first connection lines 144a are only connected to the second first electrode line E1 (2). The two first connection lines 144a are connected only to the third first electrode line E1(3), and the one first connection line 144a is connected only to the fourth first electrode line E1(4). Specifically, the first first electrode line E1(1) is far away from the pad 142, and thus is used to connect the first first electrode line E1(1) and the corresponding pad 142 (the leftmost connection) The first connection line 144a of the pad has a longer length and thus a higher conductive impedance. In contrast, the first connection line 144a for connecting the fourth first electrode line E1 (4) and the corresponding pad 142 (the fourth from the left in FIG. 2) has a shorter length and thus has a shorter Low conduction impedance. Accordingly, a plurality of strips of the first connection line 144a connected to the first first electrode line E1(1) may be disposed to reduce the overall conduction resistance thereof, and sequentially connected to the second to fourth first electrode lines E1. (2) The number of the first connection lines 144a of ~E1(4), so that the first to fourth first electrode lines E1(1) to E1(4) can be lowered. The difference in impedance (preferably maintained within about 10%), thereby improving the accuracy of touch sensing.
須說明的是,本發明不限定第一電極線以及連接至各條第一電極線的第一連接線的數量。舉例而言,主動元件陣列基板100可具有26條第一電極線,其中第1條第一電極線可連接26條第一連接線144a,第2條第一電極線可連接25條第一連接線144a,以此類推,第26條第一電極線可連接1條第一連接線144a。本領域具有通常知識者可依設計需求調整不同的第一電極線連接的第一連接線144a的數量。It should be noted that the present invention does not limit the number of first electrode lines and the first connection lines connected to the respective first electrode lines. For example, the active device array substrate 100 can have 26 first electrode lines, wherein the first first electrode line can connect 26 first connection lines 144a, and the second first electrode line can connect 25 first connections. Line 144a, and so on, the 26th first electrode line can be connected to one first connection line 144a. Those skilled in the art can adjust the number of first connection lines 144a connected by different first electrode lines according to design requirements.
以另一方面來看,主動元件陣列基板100的顯示區102d可畫分成第一區R1以及第二區R2。位於第一區R1中的第一連接線144a透過接觸窗H與第一電極線E1(1)~E1(4)連接。位於第二區R2中的第一連接線144a不與第一電極線E1(1)~E1(4)連接。圖5A繪示沿圖4A的剖線A-A’的剖面示意圖,圖5B繪示沿圖4A的剖線B-B’的剖面示意圖。請同時請參照圖2、圖4A、圖5A以及圖5B以詳細說明第一區R1與第二區R2的結構。在第一區R1中,第一連接線144a例如是具有連接部C1,且與同一條第一電極線E1(1)~E1(4)相連的第一連接線144a透過連接部C1與相鄰的第一連接線144a連接在一起。此外,與同一條第一電極線E1(1)~E1(4)相連的第一連接線144a延伸至周邊區102p且連接至同一個接墊142。On the other hand, the display area 102d of the active device array substrate 100 can be divided into a first region R1 and a second region R2. The first connection line 144a located in the first region R1 is connected to the first electrode lines E1(1) to E1(4) through the contact window H. The first connection line 144a located in the second region R2 is not connected to the first electrode lines E1(1) to E1(4). 5A is a cross-sectional view taken along line A-A' of FIG. 4A, and FIG. 5B is a cross-sectional view taken along line B-B' of FIG. 4A. Please also refer to FIG. 2, FIG. 4A, FIG. 5A and FIG. 5B to explain the structure of the first region R1 and the second region R2 in detail. In the first region R1, the first connection line 144a has, for example, a connection portion C1, and the first connection line 144a connected to the same first electrode line E1(1) to E1(4) is connected to the adjacent portion through the connection portion C1. The first connection lines 144a are connected together. Further, the first connection line 144a connected to the same first electrode line E1(1) to E1(4) extends to the peripheral area 102p and is connected to the same pad 142.
此外,在本實施例中,每一條第一連接線144a由第1條 第一電極線E1(1)延伸至第4條第一電極線E1(4)而與所有的第一電極線E1(1)~E1(4)相交。然而,本發明不限於此。在其他實施例中,與第2條第一電極線E1(2)連接的第一連接線144a可以僅由第2條第一電極線E1(2)延伸至第4條第一電極線E1(4),因此與第2條第一電極線E1(2)連接的第一連接線144a不與第1條第一電極線E1(1)相交。In addition, in the embodiment, each of the first connecting lines 144a is made of the first strip. The first electrode line E1(1) extends to the fourth first electrode line E1(4) and intersects all of the first electrode lines E1(1) to E1(4). However, the invention is not limited thereto. In other embodiments, the first connection line 144a connected to the second first electrode line E1(2) may extend only from the second first electrode line E1(2) to the fourth first electrode line E1 ( 4) Therefore, the first connection line 144a connected to the second first electrode line E1(2) does not intersect the first first electrode line E1(1).
在第一區R1中,連接部C1透過接觸窗H與共用電極160連接。此外,主動元件陣列基板100的第一區R1更設置有共用電極圖案160a,且第一連接線144a透過接觸窗H與共用電極圖案160a連接。共用電極160在時序控制上分為顯示週期(display cycle)以及觸控週期(touch cycle)。在顯示週期時,第一連接線144a提供共用電壓訊號至共用電極160(所有的第一電極線E1(1)~E1(4))。在觸控週期時,第一連接線144a依序提供觸控掃描訊號至第一電極線E1(1)~E1(4),此時,第一電極線E1(1)~E1(4)可為觸控感測電極。詳言之,共用電極160以及共用電極圖案160a可作為投射式電容感測的觸控感測電極。In the first region R1, the connection portion C1 is connected to the common electrode 160 through the contact window H. In addition, the first region R1 of the active device array substrate 100 is further provided with a common electrode pattern 160a, and the first connection line 144a is connected to the common electrode pattern 160a through the contact window H. The common electrode 160 is divided into a display cycle and a touch cycle in timing control. During the display period, the first connection line 144a provides a common voltage signal to the common electrode 160 (all of the first electrode lines E1(1) to E1(4)). During the touch cycle, the first connection line 144a sequentially supplies the touch scan signal to the first electrode line E1(1)~E1(4). At this time, the first electrode line E1(1)~E1(4) can be It is a touch sensing electrode. In detail, the common electrode 160 and the common electrode pattern 160a can be used as a touch sensing electrode for projected capacitive sensing.
第二區R2中的第一連接線144a不與共用電極160連接,因此第二區R2中不設置共用電極圖案160a。在第二區R2中,相鄰的第一連接線144a之間可設置導電圖案C2。導電圖案C2與第一連接線144a彼此分離。導電圖案C2透過接觸窗H與共用電極160連接。換言之,由於導電圖案C2為導電材質,因此透過導電圖案C2與共用電極160相連可以進一步減少共用電極160的傳導 阻抗。The first connection line 144a in the second region R2 is not connected to the common electrode 160, and thus the common electrode pattern 160a is not provided in the second region R2. In the second region R2, a conductive pattern C2 may be disposed between the adjacent first connection lines 144a. The conductive pattern C2 and the first connection line 144a are separated from each other. The conductive pattern C2 is connected to the common electrode 160 through the contact window H. In other words, since the conductive pattern C2 is a conductive material, the conduction of the common electrode 160 can be further reduced by connecting the conductive pattern C2 to the common electrode 160. impedance.
在其他實施例中,與同一條第一電極線E1(1)~E1(4)相連的第一連接線144a之間也可以不具有連接部C1,其中與同一條第一電極線E1(1)~E1(4)相連的第一連接線144a在顯示區102d中彼此分離,且於周邊區102p中連接至同一個接墊142。第一連接線144a與第一電極線E1(1)~E1(4)重疊之處設置有接觸窗,且第一連接線144a與第一電極線E1(1)~E1(4)透過接觸窗連接。In other embodiments, the first connecting line 144a connected to the same first electrode line E1(1)~E1(4) may not have a connecting portion C1, wherein the same first electrode line E1 (1) The first connection lines 144a connected to ~E1(4) are separated from each other in the display area 102d, and are connected to the same pad 142 in the peripheral area 102p. A contact window is disposed at a position where the first connection line 144a overlaps the first electrode lines E1(1) to E1(4), and the first connection line 144a and the first electrode line E1(1) to E1(4) pass through the contact window. connection.
請參照圖5A以及圖5B,主動元件陣列基板100可包括導體層103、絕緣層104、導體層105以及絕緣層106,其中導體層103例如是形成圖3的主動元件110中的閘極G與掃描線SL。絕緣層104覆蓋導體層103。導體層105例如是形成圖3的主動元件110中的源極S、汲極D以及資料線DL。其中,絕緣層104與絕緣層106可為單層或多層結構,且上述絕緣層的材質可選自第一絕緣層130或第二絕緣層150所述的材料,導體層103與導體層105可為單層或多層結構,且上述導體層的材質可選自導電層140所述的材料。Referring to FIG. 5A and FIG. 5B, the active device array substrate 100 may include a conductor layer 103, an insulating layer 104, a conductor layer 105, and an insulating layer 106, wherein the conductor layer 103 is, for example, a gate G formed in the active device 110 of FIG. Scan line SL. The insulating layer 104 covers the conductor layer 103. The conductor layer 105 is, for example, the source S, the drain D, and the data line DL in the active device 110 of FIG. The insulating layer 104 and the insulating layer 106 may be a single layer or a multi-layer structure, and the material of the insulating layer may be selected from the materials described in the first insulating layer 130 or the second insulating layer 150, and the conductive layer 103 and the conductive layer 105 may be It is a single layer or a multilayer structure, and the material of the above conductor layer may be selected from the materials described in the conductive layer 140.
具體而言,對向基板200的基板表面上設置有多條第二電極線E2,第二電極線E2沿第一方向D1延伸。由共用電極160所形成的第一電極線E1(1)~E1(4)例如是第一感測電極,而位於對向基板200上的第二電極線E2例如是第二感測電極,其中第一電極線E1(1)~E1(4)與第二電極線E2可構成感測陣列E。第一電極線E1(1)~E1(4)例如是作為投射式電容感測的發送電極(transmitter), 第二電極線E2例如是作為投射式電容感測的接收電極(receiver)。當觸碰事件發生時,感測陣列E可以將訊號傳遞至後端處理器,以計算出觸碰發生的位置,藉此達成觸控感測的功用。參照圖1A,本實施例之第二電極線E2例如是設置於基板202的外表面202a上,然而,本發明不限於此。在其他實施例中,第二電極線E2也可以設置於基板202的內表面202b上,如圖1B所示。其中,第二電極線E2與第一電極線E1皆不會連接在一起。Specifically, a plurality of second electrode lines E2 are disposed on the surface of the substrate of the counter substrate 200, and the second electrode lines E2 extend in the first direction D1. The first electrode lines E1(1) to E1(4) formed by the common electrode 160 are, for example, first sensing electrodes, and the second electrode lines E2 on the opposite substrate 200 are, for example, second sensing electrodes, wherein The first electrode lines E1(1) to E1(4) and the second electrode line E2 may constitute the sensing array E. The first electrode lines E1(1) to E1(4) are, for example, transmission electrodes that are projected capacitive sensing, The second electrode line E2 is, for example, a receiver as a projected capacitive sensing. When a touch event occurs, the sensing array E can pass the signal to the backend processor to calculate the location where the touch occurs, thereby achieving the function of touch sensing. Referring to FIG. 1A, the second electrode line E2 of the present embodiment is disposed, for example, on the outer surface 202a of the substrate 202, however, the present invention is not limited thereto. In other embodiments, the second electrode line E2 may also be disposed on the inner surface 202b of the substrate 202, as shown in FIG. 1B. The second electrode line E2 and the first electrode line E1 are not connected together.
具體而言,由於用來傳遞第一電極線E1(1)~E1(4)的訊號的第一連接線144a設置於顯示區102d中,因此可以減少周邊區102所需面積,進而滿足觸控顯示面板的窄邊框設計需求。如圖3所示,由於第一連接線144a例如是與掃描線SL重疊設置,因此第一連接線144a的設置對於子畫素單元P的開口率不會有太大影響。此外,第一連接線144a不接觸掃描線SL且其也與掃描線SL電性絕緣。再者,連接線144a亦不接觸資料線DL且其也與資料線DL電性絕緣Specifically, since the first connection line 144a for transmitting the signals of the first electrode lines E1(1) to E1(4) is disposed in the display area 102d, the required area of the peripheral area 102 can be reduced, thereby satisfying the touch. The narrow bezel design requirements of the display panel. As shown in FIG. 3, since the first connection line 144a is disposed, for example, overlapping with the scanning line SL, the arrangement of the first connection line 144a does not have much influence on the aperture ratio of the sub-pixel unit P. Further, the first connection line 144a does not contact the scan line SL and it is also electrically insulated from the scan line SL. Moreover, the connection line 144a also does not contact the data line DL and is also electrically insulated from the data line DL.
請再參考圖2,導電層140更包括多條第二連接線144b。第二連接線144b分別沿第一方向D1延伸,並且位於顯示區102D內。第一連接線144a與第二連接線144b相互對稱設置,其中第J條第二連接線144b與第K~N條第一電極線E1(1)~E1(4)相交,並且經由相應的接觸窗H連接至第K條第一電極線E1(1)~E1(4)。換言之,第二連接線144b與第一連接線144a有相似的連接關係,因此第二連接線144b與第一電極線E1(1)~E1(4)的連接關係可參 考第一連接線144a。在本實施例中,第一電極線E1(1)~E1(4)可以透過連接至同一條第一電極線E1(1)~E1(4)的第一連接線144a與第二連接線144b來驅動。具體而言,顯示週期與觸控週期輪流替換,其中觸控週期的時間較短。此時,第二連接線144b的設置可以減少第一連接線144a的傳導阻抗,因而減少第一電極線E1(1)~E1(4)的充放電時間。其中,第二連接線144b分別與掃描線SL以及資料線DL的設置關係,請參閱上述第一連接線144a分別與掃描線SL以及資料線DL的設置關係,在此不再贅述。Referring to FIG. 2 again, the conductive layer 140 further includes a plurality of second connecting lines 144b. The second connection lines 144b extend in the first direction D1, respectively, and are located in the display area 102D. The first connection line 144a and the second connection line 144b are symmetrically disposed with each other, wherein the Jth second connection line 144b intersects with the Kth to Nth first electrode lines E1(1) to E1(4), and via corresponding contacts The window H is connected to the Kth first electrode line E1(1) to E1(4). In other words, the second connection line 144b has a similar connection relationship with the first connection line 144a, so the connection relationship between the second connection line 144b and the first electrode line E1(1)~E1(4) can be referred to. The first connection line 144a is tested. In this embodiment, the first electrode lines E1(1) to E1(4) may pass through the first connection line 144a and the second connection line 144b connected to the same first electrode line E1(1) to E1(4). To drive. Specifically, the display period and the touch period are alternately replaced, wherein the touch period is shorter. At this time, the arrangement of the second connection line 144b can reduce the conduction resistance of the first connection line 144a, thereby reducing the charge and discharge time of the first electrode lines E1(1) to E1(4). For the relationship between the second connection line 144b and the scan line SL and the data line DL, please refer to the relationship between the first connection line 144a and the scan line SL and the data line DL, and details are not described herein.
此外,主動元件陣列基板100更具有第三區R3。圖6繪示第三區R3的局部放大示意圖。請參照圖2以及圖6,具體而言,導電層140更可包括多條第三連接線144c。每一條第三連接線144c沿第一方向D1延伸。在第三區R3中,第三連接線144c具有連接部C3以連接相鄰的第三連接線144c,且第三連接線144c的連接部C3透過接觸窗H與共用電極160連接。如圖2及圖6所示,每一第三連接線144c經由相應的接觸窗H連接至同一共用電極串列160S中的數個共用電極160。值得一提的是,與同一條第一電極線E1(1)~E1(4)連接的第三連接線144c可全部相連在一起。由於,第三連接線144c是由導電材質製成,因此以第三連接線144c與共用電極160可進一步減少共用電極160的傳導阻抗。此外,第三連接線144c與第一連接線144a以及第二連接線144b彼此分離並不互相連接,且連接至不同第一電極線E1(1)~E1(4)的第三連接線144c之間彼此分離並不互相連接。此外,在第三區 R3中也設置有共用電極圖案160a,且共用電極圖案160a與第三連接線144c透過接觸窗H連接。其中,第三連接線144c分別與掃描線SL以及資料線DL的設置關係,請參閱上述第一連接線144a分別與掃描線SL以及資料線DL的設置關係,在此不再贅述。Further, the active device array substrate 100 further has a third region R3. FIG. 6 is a partially enlarged schematic view of the third region R3. Referring to FIG. 2 and FIG. 6 , specifically, the conductive layer 140 may further include a plurality of third connecting lines 144 c . Each of the third connecting lines 144c extends in the first direction D1. In the third region R3, the third connection line 144c has a connection portion C3 to connect the adjacent third connection line 144c, and the connection portion C3 of the third connection line 144c is connected to the common electrode 160 through the contact window H. As shown in FIGS. 2 and 6, each of the third connection lines 144c is connected to a plurality of common electrodes 160 in the same common electrode serial array 160S via respective contact windows H. It is worth mentioning that the third connection lines 144c connected to the same first electrode line E1(1)~E1(4) may all be connected together. Since the third connection line 144c is made of a conductive material, the conduction impedance of the common electrode 160 can be further reduced by the third connection line 144c and the common electrode 160. In addition, the third connection line 144c and the first connection line 144a and the second connection line 144b are separated from each other and are not connected to each other, and are connected to the third connection line 144c of the different first electrode lines E1(1) to E1(4). They are separated from each other and are not connected to each other. Also in the third zone The common electrode pattern 160a is also provided in R3, and the common electrode pattern 160a and the third connection line 144c are connected through the contact window H. For the relationship between the third connection line 144c and the scan line SL and the data line DL, please refer to the relationship between the first connection line 144a and the scan line SL and the data line DL, and details are not described herein.
由圖5A以及圖5B可知,本實施例是先製作畫素電極120後再製作共用電極160,因此共用電極160覆蓋畫素電極120上方而形成頂部為共用電極(common electrode top)的結構。然而,本發明不限於此。在圖7A與圖7B所繪示的實施例中,也可以先製作共用電極160再製作畫素電極120,以形成畫素電極120覆蓋共用電極160上方的結構,即頂部為畫素電極(pixel electrode top)的結構。其中,共用電極160可為單層或多層結構,且其材質較佳地的可選自畫素電極120所述的材料,或其它合適的導電材料。As can be seen from FIG. 5A and FIG. 5B, in the present embodiment, the pixel electrode 120 is first formed and then the common electrode 160 is formed. Therefore, the common electrode 160 covers the upper surface of the pixel electrode 120 to form a common electrode top. However, the invention is not limited thereto. In the embodiment illustrated in FIG. 7A and FIG. 7B, the common electrode 160 may be fabricated first to reproduce the pixel electrode 120 to form a structure in which the pixel electrode 120 covers the upper surface of the common electrode 160, that is, the top is a pixel electrode (pixel). The structure of the electrode top). The common electrode 160 may be a single layer or a multi-layer structure, and the material thereof may preferably be selected from the materials described in the pixel electrode 120, or other suitable conductive materials.
圖7A與圖7B所示的主動元件陣列基板100的上視示意圖與圖2以及圖4A相似,而可一起參照圖2以及圖4A。請參照圖7A與圖7B,在本實施例的主動元件陣列基板100a中,是先於絕緣層106上形成共用電極160之後,再於第二絕緣層150上形成畫素電極120,其中共用電極160以及畫素電極120的圖案與第一實施例的共用電極160以及畫素電極120的圖案相同。詳細而言,第一絕緣層130覆蓋共用電極160上且第一絕緣層130中具有多個接觸窗H。導電層140的第一連接線144a以及連接部C1透過接觸窗H連接至共用電極160。第二絕緣層150覆蓋導電層140與第一絕緣層130上。畫素電極120位於第二絕緣層150上。 此外,在圖7C的實施例中,也可以先形成一層未經圖案化的第一絕緣材料層(未標示)以覆蓋共用電極160。接著,再形成導電層140於未經圖案化的第一絕緣材料層(未標示)上以及未經圖案化的第二絕緣材料層(未標示)覆蓋導電層140與未經圖案化的第一絕緣材料層(未標示)上。然後,透過同一道圖案化製程形成深度不同的接觸窗H1與接觸窗H2,而可將第一絕緣材料層(未標示)製作出第一絕緣層130以及可將第二絕緣材料層(未標示)製作出第二絕緣層150。接觸窗H1位於第二絕緣層150中,接觸窗H2位於第一絕緣層130與第二絕緣層150中。之後,再形成導電圖案120c。導電圖案120c填入接觸窗H1與接觸窗H2以使共用電極160與導電層140連接。導電圖案120c可與畫素電極120以同一道製程製作,但是,導電圖案120c與畫素電極120彼此分離且不互相連接。The top view of the active device array substrate 100 shown in FIGS. 7A and 7B is similar to FIG. 2 and FIG. 4A, and FIG. 2 and FIG. 4A may be referred to together. Referring to FIG. 7A and FIG. 7B, in the active device array substrate 100a of the present embodiment, after the common electrode 160 is formed on the insulating layer 106, the pixel electrode 120 is formed on the second insulating layer 150, wherein the common electrode is formed. The pattern of the 160 and the pixel electrode 120 is the same as that of the common electrode 160 and the pixel electrode 120 of the first embodiment. In detail, the first insulating layer 130 covers the common electrode 160 and has a plurality of contact windows H in the first insulating layer 130. The first connection line 144a of the conductive layer 140 and the connection portion C1 are connected to the common electrode 160 through the contact window H. The second insulating layer 150 covers the conductive layer 140 and the first insulating layer 130. The pixel electrode 120 is located on the second insulating layer 150. In addition, in the embodiment of FIG. 7C, an unpatterned first insulating material layer (not labeled) may be formed to cover the common electrode 160. Then, the conductive layer 140 is further formed on the unpatterned first insulating material layer (not labeled) and the unpatterned second insulating material layer (not labeled) covers the conductive layer 140 and the unpatterned first On the layer of insulating material (not shown). Then, the contact window H1 and the contact window H2 having different depths are formed through the same patterning process, and the first insulating material layer (not labeled) can be made into the first insulating layer 130 and the second insulating material layer can be formed (not labeled) A second insulating layer 150 is formed. The contact window H1 is located in the second insulating layer 150, and the contact window H2 is located in the first insulating layer 130 and the second insulating layer 150. Thereafter, the conductive pattern 120c is formed again. The conductive pattern 120c fills the contact window H1 and the contact window H2 to connect the common electrode 160 with the conductive layer 140. The conductive pattern 120c may be fabricated in the same process as the pixel electrode 120, but the conductive pattern 120c and the pixel electrode 120 are separated from each other and are not connected to each other.
此外,在頂部為畫素電極(pixel electrode top)的架構下,上述導電層140、共用電極160以及畫素電極120也可以有其他不同的佈局,以下另舉其他實施例來說明。In addition, in the structure in which the top is a pixel electrode top, the conductive layer 140, the common electrode 160, and the pixel electrode 120 may have other different layouts, which will be described below by other embodiments.
圖8A至圖8C分別為本發明另一實施例的主動元件陣列基板的第一區、第二區以及第三區的上視示意圖。圖9A至圖9B分別為沿圖8A之剖線C-C’以及剖線D-D’的剖面示意圖。此外,圖8D更繪示圖8A至圖8C的共用電極160、共用電極圖案160a、掃描線SL以及共用配線COM以清楚說明共用電極160的佈局。而且,為了清楚繪示各構件的配置關係,圖8A至圖8C省略繪示部分構件。8A to 8C are top plan views of a first region, a second region, and a third region of an active device array substrate according to another embodiment of the present invention. 9A to 9B are schematic cross-sectional views taken along line C-C' and line D-D' of Fig. 8A, respectively. In addition, FIG. 8D further illustrates the common electrode 160, the common electrode pattern 160a, the scan line SL, and the common wiring COM of FIGS. 8A to 8C to clearly illustrate the layout of the common electrode 160. Moreover, in order to clearly illustrate the arrangement relationship of the respective members, FIGS. 8A to 8C omits the partial members.
在圖4B的實施例中,每一個共用電極160例如是具有多個狹縫。請參照圖8A、圖8D、圖9A以及圖9B,共用電極160例如是不具有狹縫的連續圖案。主動元件陣列基板100b包括多個共用配線COM。每一個共用配線COM沿第二方向D2延伸,且共用配線COM連接數個共用電極160以形成其中一個共用電極串列160s。In the embodiment of FIG. 4B, each of the common electrodes 160 has, for example, a plurality of slits. Referring to FIGS. 8A, 8D, 9A, and 9B, the common electrode 160 is, for example, a continuous pattern having no slits. The active device array substrate 100b includes a plurality of common wirings COM. Each of the common wirings COM extends in the second direction D2, and the common wiring COM connects the plurality of common electrodes 160 to form one of the common electrode serials 160s.
更詳細而言,在第二方向D2上的數個子畫素單元P中的共用電極160連接在一起以形成一共用電極組。在此,以三個子畫素單元P中的共用電極160連接在一起以形成共用電極組為例說明。當然,本發明不限於此。在其他實施例中,可以是兩個或四個以上的子畫素單元P中的共用電極160連接在一起以形成共用電極組。在本實施例中,任兩組共用電極組之間彼此分離,且沿第二方向D2排列的多組共用電極組之間透過一條共用配線COM電性連接在一起,如圖8D所示。In more detail, the common electrodes 160 in the plurality of sub-pixel units P in the second direction D2 are connected together to form a common electrode group. Here, the common electrode 160 in the three sub-pixel units P is connected together to form a common electrode group as an example. Of course, the invention is not limited thereto. In other embodiments, the common electrodes 160 in two or more sub-pixel units P may be connected together to form a common electrode group. In this embodiment, any two sets of common electrode groups are separated from each other, and a plurality of sets of common electrode groups arranged in the second direction D2 are electrically connected together through a common wiring COM, as shown in FIG. 8D.
詳細而言,共用配線COM例如是與掃描線SL於同一道製程中形成,且共用配線COM沿第二方向D2延伸。其中,共用配線COM與掃描線SL彼此相分離且電性絕緣。共用電極組的其中一個共用電極160經由接觸窗H2與共用配線COM連接,如此一來,每一條共用配線COM可電性連接多組共用電極組以形成其中一個沿第二方向D2延伸的共用電極串列160s。再者,每兩個以上的共用電極串列160s相互連接可形成其中一條第一電極線E1。此外,任兩組共用電極組160之間更設置有與共用電極160 彼此分離的共用電極圖案160a。Specifically, the common wiring COM is formed, for example, in the same process as the scanning line SL, and the common wiring COM extends in the second direction D2. The common wiring COM and the scanning line SL are separated from each other and electrically insulated. One of the common electrodes 160 of the common electrode group is connected to the common wiring COM via the contact window H2. Thus, each of the common wirings COM can electrically connect the plurality of sets of the common electrode groups to form one of the common electrodes extending in the second direction D2. Tandem 160s. Furthermore, each of the two or more common electrode serials 160s is connected to each other to form one of the first electrode lines E1. In addition, between the two sets of the common electrode groups 160, the common electrode 160 is further disposed. The common electrode patterns 160a are separated from each other.
請參照圖9A與9B,在本實施例中,主動元件陣列基板100b上沒有設置如圖7A至圖7C所示的第一絕緣層130,因此導電層140直接設置於共用電極160上。詳細而言,導電層140包括多個接墊142(如圖2所繪示)、多條第一連接線144a以及多條導電配線146。第一連接線144a主要設置於共用電極圖案160a上,當第一連接線144a與預定之第一電極線E1電性連接時,第一連接線144a可經由連接部C4與共用電極160電性連接。導電配線146直接設置於共用電極160上,由於導電配線146為導電材質,因此可以增加共用電極160的導電性並降低共用電極160的傳導阻抗。進一步而言,第一連接線144a沿第一方向D1延伸以電性連接於第一電極線E1與接墊142之間,因此第一連接線144跨越多條第一電極線E1以形成一條連續導線。相對地,設置在不同第一電極線E1上的導電配線146之間不相互連接。Referring to FIGS. 9A and 9B, in the present embodiment, the first insulating layer 130 as shown in FIGS. 7A to 7C is not disposed on the active device array substrate 100b, and thus the conductive layer 140 is directly disposed on the common electrode 160. In detail, the conductive layer 140 includes a plurality of pads 142 (as shown in FIG. 2 ), a plurality of first connection lines 144 a , and a plurality of conductive wires 146 . The first connection line 144a is mainly disposed on the common electrode pattern 160a. When the first connection line 144a is electrically connected to the predetermined first electrode line E1, the first connection line 144a can be electrically connected to the common electrode 160 via the connection portion C4. . The conductive wiring 146 is directly disposed on the common electrode 160. Since the conductive wiring 146 is made of a conductive material, the conductivity of the common electrode 160 can be increased and the conduction resistance of the common electrode 160 can be lowered. Further, the first connection line 144a extends in the first direction D1 to be electrically connected between the first electrode line E1 and the pad 142, so the first connection line 144 spans the plurality of first electrode lines E1 to form a continuous wire. In contrast, the conductive wirings 146 disposed on the different first electrode lines E1 are not connected to each other.
畫素電極120設置於第二絕緣層150上,畫素電極120透過接觸窗H1與位於下方的汲極D(繪示於圖2中)電性連接。在本實施例中,畫素電極120具有多個狹縫,當畫素電極120與共用電極160被驅動之時,畫素電極120與共用電極160之間可形成電場來驅動位於主動元件陣列基板100b上方的顯示介質。The pixel electrode 120 is disposed on the second insulating layer 150, and the pixel electrode 120 is electrically connected to the lower drain D (shown in FIG. 2) through the contact window H1. In the embodiment, the pixel electrode 120 has a plurality of slits. When the pixel electrode 120 and the common electrode 160 are driven, an electric field can be formed between the pixel electrode 120 and the common electrode 160 to drive the active device array substrate. Display media above 100b.
請參照圖8B以及圖8D,在第二區R2中,第一連接線144a不與第一電極線E1電性連接。詳細而言,第二區R2中的第一連接線144a與共用電極160之間未設置如圖8A所示的連接部 C4,因此第一連接線144a僅是跨越多條第一電極線E1而不與第一電極線E1電性連接。Referring to FIG. 8B and FIG. 8D, in the second region R2, the first connection line 144a is not electrically connected to the first electrode line E1. In detail, a connection portion as shown in FIG. 8A is not provided between the first connection line 144a and the common electrode 160 in the second region R2. C4, therefore, the first connection line 144a is only electrically connected across the plurality of first electrode lines E1 and not to the first electrode line E1.
請參照圖8C以及圖8D,在第三區R3中,導電層140包括多條第三連接線144c。每一條第三連接線144c沿第一方向D1延伸。第三連接線144c經過連接部C5與共用電極160電性連接。此外,由於第三連接線144c是由導電材質製成,因此第三連接線144c可進一步減少共用電極160的傳導阻抗。第三連接線144c與第一連接線144a彼此分離並不互相連接,且連接至不同第一電極線E1的第三連接線144c之間彼此分離並不互相連接。此外,在第三區R3中也設置有共用電極圖案160a,且共用電極圖案160a與第三連接線144c直接連接。Referring to FIG. 8C and FIG. 8D, in the third region R3, the conductive layer 140 includes a plurality of third connection lines 144c. Each of the third connecting lines 144c extends in the first direction D1. The third connection line 144c is electrically connected to the common electrode 160 via the connection portion C5. Further, since the third connection line 144c is made of a conductive material, the third connection line 144c can further reduce the conduction resistance of the common electrode 160. The third connection line 144c and the first connection line 144a are separated from each other and are not connected to each other, and the third connection lines 144c connected to the different first electrode lines E1 are separated from each other and are not connected to each other. Further, a common electrode pattern 160a is also provided in the third region R3, and the common electrode pattern 160a is directly connected to the third connection line 144c.
請再參照圖2,位於顯示區102d最內側的第一連接線144a與位於顯示區102d最內側的第二連接線144b之間具有第一間距d1,任兩相鄰第一連接線144a之間具有第二間距d2,任兩相鄰第二連接線144b之間具有第三間距d3,其中第一間距d1實質上大於第二間距d2與第三間距d3。較佳地,第一連接線144a鄰近顯示區102d的邊緣設置,且第二連接線144b鄰近顯示區102d的另一邊緣設置。換言之,第一連接線144a與第二連接線144b集中設置在顯示區102d內的兩側。再者,於此實施例中,較佳地,第三連接線144c就位於第一連接線144a與第二連接線144b之間。Referring to FIG. 2 again, the first connecting line 144a located at the innermost side of the display area 102d and the second connecting line 144b located at the innermost side of the display area 102d have a first spacing d1 between any two adjacent first connecting lines 144a. There is a second spacing d2, and any two adjacent second connecting lines 144b have a third spacing d3, wherein the first spacing d1 is substantially greater than the second spacing d2 and the third spacing d3. Preferably, the first connection line 144a is disposed adjacent to the edge of the display area 102d, and the second connection line 144b is disposed adjacent to the other edge of the display area 102d. In other words, the first connection line 144a and the second connection line 144b are collectively disposed on both sides within the display area 102d. Moreover, in this embodiment, preferably, the third connection line 144c is located between the first connection line 144a and the second connection line 144b.
然而,本發明不限於此。在圖10的實施例中,位於主動元件陣列基板100a的顯示區102d最內側的第一連接線144a與位 於顯示區102d最內側的第二連接線144b之間具有第一間距d1,任兩相鄰第一連接線144a之間具有第二間距d2,任兩相鄰第二連接線144b之間具有第三間距d3,且第一間距d1、第二間距d2與第三間距d3實質上相等,如圖10所示。換言之,第一連接線144a與第二連接線144b均勻分散地設置在顯示區102d內。而且,兩相鄰的第一連接線144a之間、兩相鄰的第二連接線144b之間以及相鄰的第一連接線144a與第二連接線144b之間可設置第三連接線144c。此外,第三連接線144c與第一連接線144a以及第二連接線144b彼此分離並不互相連接。再者,連接至不同第一電極線E1(1)~E1(4)的第三連接線144c之間彼此分離並不互相連接。而第一連接線144a以及第二連接線144b的連接關係,請參閱圖2的相關描述,在此不再贅言。須說明的是,圖10之實施例所示的佈局中並不限定畫素電極120與共用電極160的製作順序。換言之,在圖10所示的實施例中,可以依序製作畫素電極120以及共用電極160,或者是依序製作共用電極160與畫素電極120。However, the invention is not limited thereto. In the embodiment of FIG. 10, the first connection line 144a located at the innermost side of the display area 102d of the active device array substrate 100a is in position There is a first spacing d1 between the second connecting lines 144b on the innermost side of the display area 102d, a second spacing d2 between any two adjacent first connecting lines 144a, and a spacing between any two adjacent second connecting lines 144b. The three pitches d3, and the first pitch d1, the second pitch d2 and the third pitch d3 are substantially equal, as shown in FIG. In other words, the first connection line 144a and the second connection line 144b are uniformly dispersed in the display area 102d. Moreover, a third connection line 144c may be disposed between the two adjacent first connection lines 144a, between the two adjacent second connection lines 144b, and between the adjacent first connection lines 144a and the second connection lines 144b. Further, the third connection line 144c and the first connection line 144a and the second connection line 144b are separated from each other and are not connected to each other. Furthermore, the third connection lines 144c connected to the different first electrode lines E1(1) to E1(4) are separated from each other and are not connected to each other. For the connection relationship between the first connection line 144a and the second connection line 144b, please refer to the related description of FIG. 2, and no further description is made here. It should be noted that the layout of the pixel electrode 120 and the common electrode 160 is not limited in the layout shown in the embodiment of FIG. In other words, in the embodiment shown in FIG. 10, the pixel electrode 120 and the common electrode 160 may be sequentially formed, or the common electrode 160 and the pixel electrode 120 may be sequentially formed.
此外,在圖11所示的實施例中,主動元件陣列基板100b更包括多條輔助連接線170。各輔助連接線170分別沿第一方向D1延伸。輔助連接線170位於周邊區102p中。各輔助連接線170與相應的第一連接線144a並聯而連接於對應的第一電極線E1(1)~E1(4)與接墊142之間,輔助連接線170的設置可以進一步降低對應的第一電極線E1(1)~E1(4)的傳導阻抗。其中,各輔助連接線170彼此分離並不互相連接。此外,本實施例的第一連接線 144a以及第二連接線144b的連接關係係以圖2為範本,但不限於此。於其它實施例中,多條輔助連接線170亦可運用於圖10中。須說明的是,圖11之實施例所示的佈局中並不限定畫素電極120與共用電極160的製作順序。換言之,在圖11所示的實施例中,可以依序製作畫素電極120以及共用電極160,或者是依序製作共用電極160與畫素電極120。Further, in the embodiment shown in FIG. 11, the active device array substrate 100b further includes a plurality of auxiliary connection lines 170. Each of the auxiliary connecting wires 170 extends in the first direction D1. The auxiliary connection line 170 is located in the peripheral area 102p. Each of the auxiliary connecting lines 170 is connected in parallel with the corresponding first connecting line 144a and connected between the corresponding first electrode lines E1(1) to E1(4) and the pad 142. The setting of the auxiliary connecting line 170 can further reduce the corresponding Conduction impedance of the first electrode lines E1(1) to E1(4). The auxiliary connecting lines 170 are separated from each other and are not connected to each other. In addition, the first connection line of this embodiment The connection relationship between the 144a and the second connection line 144b is shown in FIG. 2, but is not limited thereto. In other embodiments, a plurality of auxiliary connecting lines 170 can also be used in FIG. It should be noted that the layout of the pixel electrode 120 and the common electrode 160 is not limited in the layout shown in the embodiment of FIG. In other words, in the embodiment shown in FIG. 11, the pixel electrode 120 and the common electrode 160 may be sequentially formed, or the common electrode 160 and the pixel electrode 120 may be sequentially formed.
綜上所述,本發明於主動元件陣列基板的顯示區中設置可傳遞第一電極線之訊號至接墊的第一連接線,因此可以減少周邊區需要的面積,進而滿足觸控顯示面板的窄邊框設計需求。In summary, the present invention provides a first connection line for transmitting a signal of the first electrode line to the pad in the display area of the active device array substrate, thereby reducing the required area of the peripheral area, thereby satisfying the touch display panel. Narrow bezel design needs.
100‧‧‧主動元件陣列基板100‧‧‧Active component array substrate
102d‧‧‧顯示區102d‧‧‧ display area
102p‧‧‧周邊區102p‧‧‧ surrounding area
140‧‧‧導電層140‧‧‧ Conductive layer
142‧‧‧接墊142‧‧‧ pads
144a、144a(1)‧‧‧第一連接線144a, 144a (1) ‧ ‧ first cable
144b‧‧‧第二連接線144b‧‧‧second cable
144c‧‧‧第三連接線144c‧‧‧ third cable
160s‧‧‧共用電極串列160s‧‧‧Common electrode series
D1‧‧‧第一方向D1‧‧‧ first direction
D2‧‧‧第二方向D2‧‧‧ second direction
d1‧‧‧第一間距D1‧‧‧first spacing
d2‧‧‧第二間距D2‧‧‧second spacing
d3‧‧‧第三間距D3‧‧‧ third spacing
E1(1)、E1(2)、E1(3)、E1(4)‧‧‧第一電極線E1 (1), E1 (2), E1 (3), E1 (4) ‧ ‧ first electrode line
H‧‧‧接觸窗H‧‧‧Contact window
P‧‧‧子畫素單元P‧‧‧ sub-pixel unit
R1‧‧‧第一區R1‧‧‧ first district
R2‧‧‧第二區R2‧‧‧Second District
R3‧‧‧第三區R3‧‧‧ Third District
Claims (18)
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| TW102121164A TWI481938B (en) | 2013-06-14 | 2013-06-14 | In-cell touch display panel |
| CN201310335313.8A CN103488332B (en) | 2013-06-14 | 2013-08-05 | Embedded touch display panel |
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| TW102121164A TWI481938B (en) | 2013-06-14 | 2013-06-14 | In-cell touch display panel |
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| TWI481938B true TWI481938B (en) | 2015-04-21 |
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Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8749496B2 (en) | 2008-12-05 | 2014-06-10 | Apple Inc. | Integrated touch panel for a TFT display |
| US9395583B2 (en) | 2012-06-06 | 2016-07-19 | Apple Inc. | Column spacer design for a display incorporating a third metal layer |
| US10268295B2 (en) | 2014-04-16 | 2019-04-23 | Apple Inc. | Structure for pixelated self-capacitance |
| US9367188B2 (en) | 2014-05-23 | 2016-06-14 | Apple Inc. | RC matching in a touch screen |
| US10852876B2 (en) | 2014-05-28 | 2020-12-01 | Apple Inc. | Narrow border touch screen |
| CN104461135B (en) * | 2014-12-03 | 2017-12-08 | 京东方科技集团股份有限公司 | A kind of touch base plate, contact panel and display device |
| CN104571697A (en) * | 2014-12-24 | 2015-04-29 | 广东高鑫科技股份有限公司 | Narrow-frame touch panel |
| TWI569430B (en) * | 2015-01-21 | 2017-02-01 | 友達光電股份有限公司 | Sensing device |
| CN104951132B (en) * | 2015-06-02 | 2018-08-28 | 业成光电(深圳)有限公司 | Touch display panel structure |
| TWI581149B (en) * | 2015-11-02 | 2017-05-01 | 友達光電股份有限公司 | Touch display panel |
| KR102592972B1 (en) * | 2016-02-12 | 2023-10-24 | 삼성전자주식회사 | Sensing Module substrate and Sensing Module including the same |
| CN105607781B (en) * | 2016-03-16 | 2018-12-11 | 京东方科技集团股份有限公司 | A kind of array substrate, touch panel and display device |
| TWI588710B (en) * | 2016-07-05 | 2017-06-21 | 速博思股份有限公司 | In-cell Touch Display with transparent mesh-like touch electrodes |
| TWI630521B (en) * | 2016-08-12 | 2018-07-21 | 鴻海精密工業股份有限公司 | In-cell touch display apparatus |
| CN107065269B (en) * | 2017-05-27 | 2020-10-02 | 上海天马微电子有限公司 | Display panel and display device |
| CN108829285A (en) * | 2018-06-12 | 2018-11-16 | 武汉华星光电半导体显示技术有限公司 | Touch panel and preparation method thereof |
| US10895939B2 (en) * | 2018-06-29 | 2021-01-19 | Atmel Corporation | Segmented capacitive sensor, and related systems, methods and devices |
| US11301080B2 (en) | 2019-09-27 | 2022-04-12 | Atmel Corporation | Techniques for routing signals using inactive sensor regions of touch sensors and related systems and devices |
| CN110825264B (en) | 2019-10-31 | 2022-10-11 | 厦门天马微电子有限公司 | Display panel, driving method and touch display device |
| TWI726623B (en) * | 2020-02-18 | 2021-05-01 | 友達光電股份有限公司 | Touch panel |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201122646A (en) * | 2009-12-30 | 2011-07-01 | Innolux Display Corp | Touch panel and touch display device |
| TWI364697B (en) * | 2008-05-30 | 2012-05-21 | Chimei Innolux Corp | Touch-sensitive liquid crystal display device and method for fabricating same |
| TW201250355A (en) * | 2010-11-26 | 2012-12-16 | Integrated Digital Tech Inc | Pixel array and display panel having the same |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI520038B (en) * | 2008-08-12 | 2016-02-01 | 奇美電子股份有限公司 | In cell touch display panel, in cell touch display apparatus and touch control method |
| CN202887154U (en) * | 2012-11-02 | 2013-04-17 | 北京京东方光电科技有限公司 | Capacitive internally-embedded touch screen and display device |
-
2013
- 2013-06-14 TW TW102121164A patent/TWI481938B/en not_active IP Right Cessation
- 2013-08-05 CN CN201310335313.8A patent/CN103488332B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI364697B (en) * | 2008-05-30 | 2012-05-21 | Chimei Innolux Corp | Touch-sensitive liquid crystal display device and method for fabricating same |
| TW201122646A (en) * | 2009-12-30 | 2011-07-01 | Innolux Display Corp | Touch panel and touch display device |
| TW201250355A (en) * | 2010-11-26 | 2012-12-16 | Integrated Digital Tech Inc | Pixel array and display panel having the same |
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