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TWI480537B - Substrate for raman spectroscopy and method of manufacturing the same - Google Patents

Substrate for raman spectroscopy and method of manufacturing the same Download PDF

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TWI480537B
TWI480537B TW100111487A TW100111487A TWI480537B TW I480537 B TWI480537 B TW I480537B TW 100111487 A TW100111487 A TW 100111487A TW 100111487 A TW100111487 A TW 100111487A TW I480537 B TWI480537 B TW I480537B
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substrate
raman spectroscopy
graphene
graphene layer
layer
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TW201241423A (en
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Yon Hua Tzeng
Wai-Leong Chen
Chia Hao Tu
Keng Chih Liang
Chih Yi Liu
Chuan Pu Liu
Shih Tse Chen
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Univ Nat Cheng Kung
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65Raman scattering
    • G01N21/658Raman scattering enhancement Raman, e.g. surface plasmons

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Description

拉曼光譜技術用之基材及其製造方法Substrate for Raman spectroscopy and manufacturing method thereof

本發明係關於一種拉曼光譜技術用之基材及其製造方法,其中,該拉曼光譜技術用之基材尤指一種表面增強拉曼光譜技術用之基材。The present invention relates to a substrate for Raman spectroscopy and a method for producing the same, wherein the substrate for the Raman spectroscopy technique is especially a substrate for surface enhanced Raman spectroscopy.

拉曼光譜技術因具有不需額外複雜的樣品製備、非破壞性偵測實驗以及可直接對各類氣態、液態、固態分子進行偵測等特點,可快速地對各種樣品進行偵測,包括:蛋白質、核酸、核蛋白、細胞膜或脂質等。Raman spectroscopy enables rapid detection of a wide range of samples, including the need for additional complex sample preparation, non-destructive detection, and direct detection of all types of gaseous, liquid, and solid molecules, including: Protein, nucleic acid, nuclear protein, cell membrane or lipid.

拉曼光譜技術透過分子和光子能量間的交互作用鑑定分子的結構,為一種快速又簡易的檢測方法。拉曼光譜技術中更包括一種表面增強拉曼光譜技術(SERS),當互相靠近之惰性金屬奈米顆粒受到適當的入射光照射時,金屬奈米顆粒表面會誘發表面電漿共振(surface plasmon resonance)與金屬奈米顆粒周圍的電漿偶合,透過表面電漿子的集體震盪會顯著地增強奈米顆粒吸收/散射的截面積,並且同時提高局部金屬奈米顆粒表面的電場大小。由於拉曼光譜訊號強度與電場強度成比例關係,當金屬奈米顆粒表面產生的電場越強時,產生的拉曼訊號強度越強,因而能夠提高拉曼光譜技術的偵測敏感度,進而使表面增強拉曼光譜技術成為一種具有極高潛力的應用技術,可快速地進行各種微量樣品之偵測,並且大幅應用至生物分子之辨識、藥物檢測、醫學診斷、分析鑑定等領域。Raman spectroscopy identifies the structure of a molecule through the interaction between molecular and photon energy, making it a fast and easy method of detection. Raman spectroscopy also includes a surface-enhanced Raman spectroscopy (SERS) technique. When inert metal nanoparticles close to each other are exposed to appropriate incident light, the surface of the metal nanoparticles induces surface plasmon resonance. Coupling with the plasma around the metal nanoparticles, the collective oscillation of the surface plasmons significantly enhances the cross-sectional area of the absorption/scattering of the nanoparticles, and at the same time increases the electric field at the surface of the local metal nanoparticles. Since the intensity of the Raman spectral signal is proportional to the electric field strength, the stronger the electric field generated on the surface of the metal nanoparticle, the stronger the intensity of the Raman signal generated, thereby improving the detection sensitivity of the Raman spectroscopy technique, thereby enabling Surface-enhanced Raman spectroscopy has become an application technology with extremely high potential, which can quickly detect various trace samples and apply it to biomolecule identification, drug detection, medical diagnosis, analysis and identification.

然而,在進行拉曼光譜實驗之測定時,基材中的奈米顆粒可能受到環境或分析物的破壞。因此,為了克服上述之問題,本發明提供一種拉曼光譜技術用之基材可保護奈米顆粒免於受到破壞,並且提供基材的重複利用性。However, when performing the Raman spectroscopy test, the nanoparticles in the substrate may be damaged by the environment or the analyte. Therefore, in order to overcome the above problems, the present invention provides a substrate for Raman spectroscopy which protects the nanoparticles from damage and provides recyclability of the substrate.

本發明之主要目的係在提供一種拉曼光譜技術用之基材及其製造方法,俾能增強分析物(如生物分子或藥物)的拉曼訊號強度,提升拉曼光譜技術之偵測能力。The main object of the present invention is to provide a substrate for Raman spectroscopy and a method for fabricating the same, which can enhance the Raman signal intensity of an analyte (such as a biomolecule or a drug) and enhance the detection capability of Raman spectroscopy.

本發明之另一目的係在提供一種拉曼光譜技術用之基材之製造方法,俾能保護拉曼光譜技術用之基材中金屬奈米顆粒受到環境或分析物的污染或破壞,使其基材可具有重複使用之優點,並且製做出一種具化學惰性與生物相容性之拉曼光譜用之基材。Another object of the present invention is to provide a method for producing a substrate for Raman spectroscopy, which can protect a metal nanoparticle in a substrate for Raman spectroscopy from environmental or analyte contamination or damage. The substrate can have the advantage of being reused and a substrate for chemically inert and biocompatible Raman spectroscopy can be made.

為達成上述目的,本發明提供一種拉曼光譜技術用之基材之製造方法,係包括下列步驟:(A)提供一基板;(B)形成複數個金屬奈米顆粒;以及(C)設置一層或以上之石墨烯層於該些金屬奈米顆粒上,並且表面處理該些石墨烯層,形成一層或以上之經過表面處理之石墨烯層。In order to achieve the above object, the present invention provides a method for producing a substrate for Raman spectroscopy, comprising the steps of: (A) providing a substrate; (B) forming a plurality of metal nanoparticles; and (C) providing a layer Or a graphene layer on the metal nanoparticles, and surface-treating the graphene layers to form one or more surface-treated graphene layers.

其中,於步驟(B)中,可直接設置已合成製造之金屬奈米顆粒;或者,可先形成一金屬薄膜於該基板上,再處理該金屬薄膜以形成金屬奈米顆粒設置於基板上。於此,處理金屬薄膜之方法可選用退火法,將金屬薄膜轉變為金屬奈米顆粒。Wherein, in step (B), the synthetic metal nanoparticle can be directly disposed; or, a metal film can be formed on the substrate, and the metal film is processed to form metal nanoparticles disposed on the substrate. Herein, the method of treating the metal thin film may be an annealing method to convert the metal thin film into metal nano particles.

此外,於步驟(C)中,石墨烯層之表面處理較佳可透過將該些石墨烯層暴露於一含氫原子、一含氧原子、一含氫自由基、或一含氧自由基之環境中完成表面處理步驟;或者,較佳係經由電漿處理石墨烯層之表面,更佳為經由微波電漿處理石墨烯層之表面,形成氧化石墨烯層(oxygenated graphene)或氫化石墨烯層(hydrogenated graphene)。Further, in the step (C), the surface treatment of the graphene layer is preferably performed by exposing the graphene layers to a hydrogen-containing atom, an oxygen-containing atom, a hydrogen-containing radical, or an oxygen-containing radical. The surface treatment step is completed in the environment; or, preferably, the surface of the graphene layer is treated by plasma, and more preferably, the surface of the graphene layer is treated by microwave plasma to form an oxide graphene layer or a hydrogenated graphene layer. (hydrogenated graphene).

此外,為達成上述目的,本發明亦提供一種拉曼光譜技術用之基材,包括:一基板;複數個金屬奈米顆粒,該些金屬奈米顆粒係設置於該基板上,且該些金屬奈米顆粒間係相距一距離設置;以及一層或以上之經過表面處理之石墨烯層,該經過表面處理之石墨烯層係設置於該些金屬奈米顆粒之上方。In addition, in order to achieve the above object, the present invention also provides a substrate for Raman spectroscopy, comprising: a substrate; a plurality of metal nanoparticles, wherein the metal nanoparticles are disposed on the substrate, and the metals The nanoparticles are disposed at a distance from each other; and one or more surface-treated graphene layers are disposed above the metal nanoparticles.

其中,金屬奈米顆粒之材質可為銀、金、銅、鎳、鈷、鐵、鉑、鈀或鋁,較佳為銀、金、銅、鎳或鉑,更佳為銀、金或鉑。金屬奈米顆粒之粒徑可為2 nm至400 nm,較佳為5 nm至400 nm,更佳為40nm至125 nm。此外,金屬奈米顆粒間可相距5 nm至400 nm設置,較佳為5 nm至150 nm,更佳為20 nm至150 nm。另外,經過表面處理之單層石墨烯層之厚度約為0.4 nm至3 nm,較佳為0.5 nm至2 nm。其中,亦可重疊設置複數層經過處理之石墨烯層於金屬奈米顆粒上,以增加厚度。偵測一分析物之拉曼光譜圖時,可將分析物於拉曼光譜用之基材之石墨烯層上方,其分析物之濃度約為1 nM至1 M,較佳為1 nM至0.01 M,更佳為1 μM至0.01M,再更佳為10 μM至0.01M。The material of the metal nanoparticle may be silver, gold, copper, nickel, cobalt, iron, platinum, palladium or aluminum, preferably silver, gold, copper, nickel or platinum, more preferably silver, gold or platinum. The metal nanoparticles may have a particle diameter of from 2 nm to 400 nm, preferably from 5 nm to 400 nm, more preferably from 40 nm to 125 nm. Further, the metal nanoparticles may be disposed between 5 nm and 400 nm, preferably 5 nm to 150 nm, more preferably 20 nm to 150 nm. Further, the surface-treated single-layer graphene layer has a thickness of about 0.4 nm to 3 nm, preferably 0.5 nm to 2 nm. Wherein, a plurality of layers of the treated graphene layer may be additionally disposed on the metal nanoparticles to increase the thickness. When detecting the Raman spectrum of an analyte, the analyte can be applied to the graphene layer of the substrate for Raman spectroscopy, and the concentration of the analyte is about 1 nM to 1 M, preferably 1 nM to 0.01. M, more preferably from 1 μM to 0.01 M, still more preferably from 10 μM to 0.01 M.

本發明提供之拉曼光譜技術用之基材可適用於各種拉曼光譜技術,如表面增強拉曼光譜技術(surface enhanced Raman spectroscopy,SERS)、表面增強拉曼共振光譜技術(surface enhanced resonance Raman spectroscopy,SERRS)、相干反-斯托克斯拉曼光譜技術(coherent anti-Stokes Raman Spectroscopy)。The substrate for Raman spectroscopy provided by the invention can be applied to various Raman spectroscopy techniques, such as surface enhanced Raman spectroscopy (SERS) and surface enhanced resonance Raman spectroscopy. , SERRS), coherent anti-Stokes Raman Spectroscopy.

本發明另提供一種拉曼光譜技術之測定方法,包括下列步驟:(A)提供一拉曼光譜技術用之基材,該拉曼光譜技術用之基材包括:一基板;複數個金屬奈米顆粒,該些金屬奈米顆粒層係設置於該基板上,且該些金屬奈米顆粒間係相距一距離設置;以及一層或以上之石墨烯層,該石墨烯層係設置於該些金屬奈米顆粒之上方;(B)設置一分析物於該拉曼光譜技術用之基材之上方;(C)激發一雷射光,以產生拉曼訊號;(D)偵測一拉曼訊號,該拉曼訊號係由一拉曼偵測器偵測。The invention further provides a method for determining Raman spectroscopy, comprising the following steps: (A) providing a substrate for a Raman spectroscopy technique, the substrate for the Raman spectroscopy technique comprising: a substrate; a plurality of metal nanoparticles a particle, the metal nanoparticle layer is disposed on the substrate, and the metal nanoparticles are disposed at a distance from each other; and one or more graphene layers are disposed on the metal naphthalene layer Above the rice particles; (B) placing an analyte above the substrate for the Raman spectroscopy technique; (C) exciting a laser beam to generate a Raman signal; (D) detecting a Raman signal, The Raman signal is detected by a Raman detector.

其中,將雷射光照射拉曼光譜技術用之基材,使複數個金屬奈米顆粒間產生局部電場,並且透過該分析物與金屬奈米顆粒間之電場的偶合作用產生一拉曼訊號。Wherein, the laser light is irradiated to the substrate for the Raman spectroscopy technique to generate a local electric field between the plurality of metal nanoparticles, and a Raman signal is generated by the coupling of the electric field between the analyte and the metal nanoparticle.

經過包括電漿氫化或氧化處理之石墨烯層可形成氧化石墨烯或氫化石墨烯層,透過電漿處理可提高石墨烯之電阻率,且不同的微波電漿處理時間對石墨烯的影響也不盡相同。本發明設置一經過微波電漿處理的石墨烯層於基材上,可使基材上的分析物與金屬奈米顆粒間更強的局部電場偶合,以此得到較強的拉曼散射強度,提升拉曼光譜技術的偵測能力。因此,本發明提供一種簡單的拉曼訊號強度提高之方法,利用在金屬奈米顆粒上設置一層薄的氧化或氫化石墨烯層,即可以大幅提升拉曼光譜中分析物的訊號強度,使拉曼光譜技術可更廣泛地應用於偵測微量的分子。The graphene layer including the plasma hydrogenation or oxidation treatment can form a graphene oxide or a hydrogenated graphene layer, and the resistivity of the graphene can be improved by plasma treatment, and the influence of different microwave plasma treatment time on the graphene is not Do the same. The invention provides a microwave plasma treated graphene layer on the substrate, which can make a stronger local electric field coupling between the analyte on the substrate and the metal nanoparticle, thereby obtaining strong Raman scattering intensity. Improve the detection capability of Raman spectroscopy. Therefore, the present invention provides a simple method for improving the intensity of Raman signals by using a thin layer of oxidized or hydrogenated graphene on the metal nanoparticles to substantially increase the signal intensity of the analyte in the Raman spectrum. Mann spectroscopy is more widely used to detect trace amounts of molecules.

此外,本發明提供之拉曼光譜技術用之基材中,石墨烯層亦可作為此基材之保護層,將分析物與金屬奈米顆粒利用極薄的石墨烯層隔開,保護金屬奈米顆粒免於受到環境或分析物的污染或破壞,降低使用拉曼光譜技術偵測各種分子所需耗費之成本。因此,本發明提供拉曼光譜技術能廣泛地應用至生物分子的偵測,並且使拉曼光譜技術用之基材可具有重複使用且能得到穩定拉曼訊號之優點,提供一個更為環保又經濟的基材。In addition, in the substrate for Raman spectroscopy provided by the present invention, the graphene layer can also serve as a protective layer of the substrate, and the analyte and the metal nanoparticle are separated by an extremely thin graphene layer to protect the metal naphthalene. Rice particles are protected from environmental or analyte contamination or damage, reducing the cost of detecting various molecules using Raman spectroscopy. Therefore, the present invention provides that Raman spectroscopy technology can be widely applied to the detection of biomolecules, and the substrate for Raman spectroscopy technology can be reused and can obtain the advantages of stable Raman signals, thereby providing a more environmentally friendly Economical substrate.

<第一實施例><First Embodiment>

請參閱圖1A至圖1D,係本發明提供之拉曼光譜技術用之基材之製造方法流程圖,其製造方法包括下列步驟:首先,提供一氧化的矽晶圓基板11,此矽晶圓基板11具有矽基板111以及設置於矽基板111上方之二氧化矽層112,如圖1A所示。Please refer to FIG. 1A to FIG. 1D , which are flowcharts of a method for manufacturing a substrate for Raman spectroscopy provided by the present invention. The manufacturing method includes the following steps: First, an oxidized germanium wafer substrate 11 is provided. The substrate 11 has a ruthenium substrate 111 and a ruthenium dioxide layer 112 disposed above the ruthenium substrate 111, as shown in FIG. 1A.

接著,於高真空之環境中,透過熱蒸鍍(thermal evaporation)法在基板11上形成一銀金屬薄膜121,銀金屬薄膜121之厚度為5 nm,如圖1B所示。Next, a silver metal film 121 is formed on the substrate 11 by a thermal evaporation method in a high vacuum environment, and the thickness of the silver metal film 121 is 5 nm as shown in FIG. 1B.

之後,透過熱退火(thermal annealing)方法處理銀金屬薄膜121,將銀金屬薄膜121分開藉此形成複數個金屬奈米顆粒122。其中,奈米銀顆粒係均勻分佈於矽晶圓基板11上,奈米銀顆粒間之間距約為20 nm至120 nm,且其奈米銀顆粒之粒徑約為20 nm至120 nm,如圖1C所示。Thereafter, the silver metal thin film 121 is processed by a thermal annealing method, and the silver metal thin film 121 is separated to form a plurality of metal nanoparticles 122. Wherein, the nano silver particles are uniformly distributed on the germanium wafer substrate 11, the distance between the nano silver particles is about 20 nm to 120 nm, and the diameter of the nano silver particles is about 20 nm to 120 nm, such as Figure 1C shows.

另外,透過低壓熱化學氣相沉積法(low-pressure thermal Chemical vapor deposition),通入甲烷與氫氣之混合氣體於銅鉑上製備單層之石墨烯層(圖未示)。其中,通入之氣體壓力約為0.1至100 torr,且其反應溫度約為900至1035℃。待石墨烯於銅箔上成長完成後,可透過拉曼光譜檢驗合成的單層石墨烯之特徵峰D-帶(D-band)、G-帶(G-band)及2D-帶(2D-band),以確認石墨烯結構。透過濕化學蝕刻法(wet chemical etching)可將合成之石墨烯由銅箔上移除,並且將此石墨烯層13轉移至設置於基板11上的金屬奈米顆粒122之上方。此外,本發明提供拉曼光譜技術用之基材之製造方法,可再利用微波電漿處理此石墨烯層13,以含氧之環境空氣為1-5 torr,微波功率為400 W,微波頻率為2.45GHz,持續反應2至5秒,藉此對合成之石墨烯層13進行氧化,得到一氧化之石墨烯層13,完成拉曼光譜技術用之基材1之製作,如圖1D所示。於此,微波電漿處理石墨烯係不需額外的加熱處理步驟。Further, a single layer of graphene layer (not shown) was prepared by electrolyzing a mixed gas of methane and hydrogen on copper platinum by low-pressure thermal chemical vapor deposition. Among them, the gas pressure is about 0.1 to 100 torr, and the reaction temperature is about 900 to 1035 °C. After the graphene is grown on the copper foil, the characteristic peaks D-band, G-band and 2D-band of the synthesized single-layer graphene can be examined by Raman spectroscopy. Band) to confirm the graphene structure. The synthesized graphene can be removed from the copper foil by wet chemical etching, and the graphene layer 13 is transferred over the metal nanoparticles 122 disposed on the substrate 11. In addition, the present invention provides a method for manufacturing a substrate for Raman spectroscopy, which can be further treated by microwave plasma treatment, with an oxygen-containing ambient air of 1-5 torr, a microwave power of 400 W, and a microwave frequency. At 2.45 GHz, the reaction is continued for 2 to 5 seconds, whereby the synthesized graphene layer 13 is oxidized to obtain an oxidized graphene layer 13, and the substrate 1 for Raman spectroscopy is completed, as shown in FIG. 1D. . Here, the microwave plasma treatment of graphene does not require an additional heat treatment step.

據此,請參閱圖2,本發明之第一實施例中製得之拉曼光譜技術用之基材1,其基材包括:一二氧化之矽基板11,此基板具有一矽基板111與位於矽基板111上方之二氧化矽層112;複數個金屬奈米顆粒122,此金屬奈米顆粒122係設置於基板11上,且其金屬奈米顆粒122間係互相相距一距離而設置;以及一層或以上之氧化之石墨烯層13,此氧化之石墨烯層13係設置於這些金屬奈米顆粒122之上方,形成拉曼光譜技術用之基材1。Accordingly, referring to FIG. 2, a substrate 1 for Raman spectroscopy technology obtained in the first embodiment of the present invention has a substrate comprising: a germanium dioxide substrate 11 having a germanium substrate 111 and a ruthenium dioxide layer 112 located above the ruthenium substrate 111; a plurality of metal nanoparticles 122 disposed on the substrate 11 and disposed between the metal nanoparticles 122 at a distance from each other; One or more oxidized graphene layers 13 are disposed above the metal nanoparticles 122 to form a substrate 1 for Raman spectroscopy.

<第二實施例><Second embodiment>

本發明第二實施例中拉曼光譜技術用之基材係使用如第一實施例之方法製作,其不同之處僅在於如何以微波電漿處理石墨烯層之方法。The substrate for the Raman spectroscopy technique of the second embodiment of the present invention is produced by the method of the first embodiment, and differs only in the method of how to treat the graphene layer by microwave plasma.

於第二實施例中,係待石墨烯於銅箔上成長完成,並且將此石墨烯層13轉移至設置於基板11上的金屬奈米顆粒122之上方後,以氫氣氣體為1-5 torr,微波功率為500 W,微波頻率為2.45GHz,以微波電漿處理石墨烯層持續反應5至10秒,藉此對合成之石墨烯層進行氫化,得到一氫化石墨烯層。之後,如同第一實施例所述之方法,得到一具有氫化石墨烯層的拉曼光譜技術用之基材。In the second embodiment, after the graphene is grown on the copper foil, and the graphene layer 13 is transferred to the metal nanoparticle 122 disposed on the substrate 11, the hydrogen gas is 1-5 torr. The microwave power is 500 W, the microwave frequency is 2.45 GHz, and the graphene layer is treated by microwave plasma for 5 to 10 seconds, thereby hydrogenating the synthesized graphene layer to obtain a hydrogenated graphene layer. Thereafter, as in the method described in the first embodiment, a substrate for a Raman spectroscopy technique having a hydrogenated graphene layer was obtained.

<第三實施例><Third embodiment>

本發明第三實施例中係使用如同第二實施例之方法製作具有氫化石墨烯層的拉曼光譜技術用之基材,其不同之處僅在於以微波電漿處理石墨烯層之實驗參數。In the third embodiment of the present invention, a substrate for a Raman spectroscopy technique having a hydrogenated graphene layer was produced by the method of the second embodiment, except that the experimental parameters of the graphene layer were treated by microwave plasma.

於本實施例中,氫氣氣體為1 torr,微波功率為200 W,微波頻率為2.45GHz,電漿球係設置於距離石墨烯層約10 cm處,並且以含複數孔洞之金屬膜分離電漿球及石墨烯層,持續反應5至60分鐘,藉此對石墨烯層進行較緩慢的氫化,得到一氫化石墨烯層。最後,如同第一實施例所述之方法,得到一具有氫化石墨烯層的拉曼光譜技術用之基材。In this embodiment, the hydrogen gas is 1 torr, the microwave power is 200 W, the microwave frequency is 2.45 GHz, the plasma ball system is disposed at a distance of about 10 cm from the graphene layer, and the plasma is separated by a metal film containing a plurality of holes. The ball and the graphene layer are continuously reacted for 5 to 60 minutes, whereby the graphene layer is slowly hydrogenated to obtain a hydrogenated graphene layer. Finally, as in the method described in the first embodiment, a substrate for a Raman spectroscopy technique having a hydrogenated graphene layer is obtained.

<第四實施例><Fourth embodiment>

請參閱圖3,本發明第四實施例中係將分析物設置於拉曼光譜技術用之基材1之石墨烯層13之上方,以進行拉曼光譜之測量。Referring to FIG. 3, in the fourth embodiment of the present invention, the analyte is placed above the graphene layer 13 of the substrate 1 for Raman spectroscopy for measurement of Raman spectroscopy.

首先,可使用第一實施例至第三實施例中製作之拉曼光譜技術用之基材1。First, the substrate 1 for the Raman spectroscopy technique fabricated in the first to third embodiments can be used.

之後,將此拉曼光譜技術用之基材1浸入0.0001M至0.01 M之腺嘌呤(adenine)溶液,持續30分鐘至1小時,以去離子水清洗,使其分析物14(即,腺嘌呤分子)設置於拉曼光譜技術用之基材1之石墨烯層13之上方。Thereafter, the substrate 1 for this Raman spectroscopy technique is immersed in a 0.001 M to 0.01 M adenine solution for 30 minutes to 1 hour, and washed with deionized water to make the analyte 14 (ie, adenine). The molecule is disposed above the graphene layer 13 of the substrate 1 for Raman spectroscopy.

據此,此拉曼光譜技術用之基材,包括:二氧化矽基板11,此基板具有矽基板111與位於矽基板111上方之二氧化矽層112;複數個金屬奈米顆粒122,此金屬奈米顆粒122係設置於基板11上,且其金屬奈米顆粒122間係互相相距一距離而設置;以及一石墨烯層13,此石墨烯層13係設置於這些金屬奈米顆粒122之上方。此外,拉曼光譜技術用之基材1之上方係具有複數個欲分析物14(腺嘌呤分子)設置於此基材1之石墨烯層13之上方(如圖3所示)。Accordingly, the substrate for the Raman spectroscopy technique comprises: a ruthenium dioxide substrate 11 having a ruthenium substrate 111 and a ruthenium dioxide layer 112 above the ruthenium substrate 111; and a plurality of metal nanoparticles 122, the metal The nanoparticle 122 is disposed on the substrate 11 and disposed between the metal nanoparticles 122 at a distance from each other; and a graphene layer 13 disposed above the metal nanoparticles 122 . Further, above the substrate 1 for Raman spectroscopy, a plurality of analytes 14 (adenine molecules) are disposed above the graphene layer 13 of the substrate 1 (as shown in FIG. 3).

<比較例><Comparative example>

本發明之比較例中係使用類似於本發明第一實施例之方法製作拉曼光譜技術用之基材,其不同之處僅在於該石墨烯層係未經其他微波電漿處理之單層石墨烯層。In the comparative example of the present invention, a substrate for Raman spectroscopy is produced similarly to the method of the first embodiment of the present invention, except that the graphene layer is a single layer of graphite which has not been treated by other microwave plasma. Ene layer.

<第一試驗例><First Test Example>

第一試驗例係量測第三實施例與比較例之基材中石墨烯層之電阻值。本試驗例中,基材中奈米銀顆粒係相互間隔100 nm設置,並且分別在5 mm×5 mm的石墨烯層之末端沉積兩金電極,以量測第三實施例及比較例之石墨烯層的電阻值。The first test example measures the resistance value of the graphene layer in the substrate of the third embodiment and the comparative example. In this test example, the nano silver particles in the substrate are arranged at intervals of 100 nm, and two gold electrodes are deposited at the ends of the 5 mm × 5 mm graphene layers to measure the graphite of the third embodiment and the comparative examples. The resistance value of the olefin layer.

如圖4所示,未經微波電漿處理的石墨烯層(比較例)之電阻值為2.5 kΩ,隨著微波電漿處理的時間拉長,當以氫氣微波電漿處理長達60分鐘後,氫化石墨烯層之電阻值將提高至50 kΩ。實驗結果顯示,經由微波電漿處理石墨烯層可將電阻提高20倍以上。As shown in FIG. 4, the graphene layer (comparative example) which has not been subjected to microwave plasma treatment has a resistance value of 2.5 kΩ, and the microwave plasma treatment time is extended for 60 minutes after being treated with microwave microwave plasma for 60 minutes. The resistance of the hydrogenated graphene layer will increase to 50 kΩ. The experimental results show that the resistance of the graphene layer by microwave plasma can increase the electrical resistance by more than 20 times.

因此,設置一經過微波電漿處理之石墨烯層於金屬奈米顆粒之上方,可使較高的電場形成於石墨烯層上方,使更多的分析物被激發,達到增強分析物之拉曼訊號強度功效。Therefore, by setting a graphene layer treated by microwave plasma on top of the metal nanoparticle, a higher electric field can be formed on the graphene layer, so that more analytes are excited to achieve Raman enhancement of the analyte. Signal strength efficiency.

<第二試驗例><Second test example>

本發明中拉曼光譜技術之測定方法,係包括下列步驟:首先,分別使用第一實施例至第二實施例製作之拉曼光譜技術用之基材作為本試驗例中表面增強拉曼光譜技術用之基材。The method for determining the Raman spectroscopy technique of the present invention comprises the following steps: First, the substrate for the Raman spectroscopy technique prepared by the first embodiment to the second embodiment is used as the surface enhanced Raman spectroscopy technique in the test example. The substrate used.

之後,激發一波長為532 nm之雷射光,此雷射光將照射於此拉曼光譜技術用之基材,使這些金屬奈米顆粒間產生電場,產生一拉曼訊號。Thereafter, a laser light having a wavelength of 532 nm is excited, and the laser light is irradiated to the substrate for Raman spectroscopy to generate an electric field between the metal nanoparticles to generate a Raman signal.

最後,透過一拉曼偵測器偵測產生的拉曼訊號,並且透過計算轉換成一表面增強拉曼光譜圖。Finally, the generated Raman signal is detected by a Raman detector and converted into a surface enhanced Raman spectrum by calculation.

請參閱圖5,係為拉曼光譜技術用之基材之表面增強拉曼光譜圖,此基材中石墨烯層係分別經過微波電漿處理之單層氧化石墨烯層(a)、經過微波電漿處理之單層氫化石墨烯層(b)及未經微波電漿處理之單層石墨烯層(c)。Referring to FIG. 5, it is a surface-enhanced Raman spectrum of a substrate for Raman spectroscopy, in which a graphene layer is subjected to microwave plasma treatment of a single layer of graphene oxide layer (a), passing through a microwave. The plasma treated single layer hydrogenated graphene layer (b) and the single layer graphene layer (c) which has not been subjected to microwave plasma treatment.

於比較例(未經過微波電漿處理的石墨烯層)之表面增強拉曼光譜圖中石墨烯之特徵峰分別為D-帶(D-band)、G-帶(G-band)及2D-帶(2D-band),D-band強度微弱,G-band具有很強的訊號,而2D-band具有對稱形的訊號(如圖5所示),顯示未經電漿處理之單層石墨烯層具有良好之結晶性。The characteristic peaks of graphene in the surface-enhanced Raman spectrum of the comparative example (the graphene layer not subjected to microwave plasma treatment) are D-band, G-band and 2D-, respectively. With 2D-band, the D-band is weak, the G-band has a strong signal, and the 2D-band has a symmetrical signal (as shown in Figure 5), showing the unprocessed single-layer graphene. The layer has good crystallinity.

而第一實施例(氧化石墨烯層)中之基材的表面增強拉曼光譜圖中,2D-band的訊號強度顯著比D-band及G-band弱(如圖5所示),此拉曼光譜圖之結果與習知的石墨烯層氧化物之拉曼光譜圖相同,顯示第一實施例中之基材,該石墨烯層確實透過微波電漿處理達到部份氧化石墨烯層之效果。In the surface-enhanced Raman spectrum of the substrate in the first embodiment (graphene oxide layer), the signal intensity of 2D-band is significantly weaker than that of D-band and G-band (as shown in FIG. 5). The result of the spectroscopy is the same as the Raman spectrum of the conventional graphene layer oxide, showing the substrate in the first embodiment, and the graphene layer is actually treated by microwave plasma to achieve a partial graphene oxide layer effect. .

而第二實施例(氫化之石墨烯層)中之基材的表面增強拉曼光譜圖中,D-band的訊號強度顯著比未經處理之石墨烯層強,且2D-band的訊號強度為三個訊號中最弱的一個(如圖5所示),此拉曼光譜圖之結果與習知的石墨烷(氫化之石墨烯層)之拉曼光譜圖相同,顯示第二實施例中之基材,該石墨烯層確實透過微波電漿處理達到氫化石墨烯層之效果。In the surface-enhanced Raman spectrum of the substrate in the second embodiment (hydrogenated graphene layer), the signal intensity of D-band is significantly stronger than that of the untreated graphene layer, and the signal intensity of 2D-band is The weakest of the three signals (as shown in Figure 5), the result of this Raman spectrum is the same as the Raman spectrum of a conventional graphane (hydrogenated graphene layer), showing the second embodiment The substrate, the graphene layer does have the effect of hydrogenating the graphene layer by microwave plasma treatment.

<第三試驗例><Third test example>

本發明之第三試驗例係使用如同第二試驗例之實驗方法,進行分析物(腺嘌呤分子)設置於基材上之表面增強拉曼光譜實驗。The third test example of the present invention is a surface-enhanced Raman spectroscopy experiment in which an analyte (adenine molecule) is placed on a substrate using an experimental method as in the second test example.

首先,將分析物(腺嘌呤分子)分別設置於第一實施例與第二實施例製作之拉曼光譜技術用之基材。First, an analyte (adenine molecule) was separately provided to the substrate for the Raman spectroscopy technique produced in the first embodiment and the second embodiment.

之後,激發一波長為532 nm之雷射光,此雷射光將照射於此拉曼光譜技術用之基材,使這些金屬奈米顆粒間產生電場。接著,透過腺嘌呤分子與金屬奈米顆粒間之電場產生偶合作用,產生一拉曼訊號。於此,本發明提供之拉曼光譜技術用之基材可提高分析物的拉曼訊號強度。最後,透過一拉曼偵測器偵測產生的拉曼訊號,並且透過計算轉換成一表面增強拉曼光譜圖。Thereafter, a laser light having a wavelength of 532 nm is excited, and the laser light is irradiated to the substrate for Raman spectroscopy to generate an electric field between the metal nanoparticles. Next, an electric field is generated by the electric field between the adenine molecule and the metal nanoparticle to generate a Raman signal. Herein, the substrate for Raman spectroscopy provided by the present invention can increase the Raman signal intensity of the analyte. Finally, the generated Raman signal is detected by a Raman detector and converted into a surface enhanced Raman spectrum by calculation.

請參閱圖6,係比較使用不同拉曼光譜技術用之基材偵測腺嘌呤分子得到之拉曼光譜圖。於選用的基材中,石墨烯層係分別為經過微波電漿處理之單層氧化石墨烯層(a)、單層氫化石墨烯層(b)及未經微波電漿處理之單層石墨烯層(c)。於表面增強拉曼光譜圖中,可觀察到拉曼位移734 cm-1 為腺嘌呤分子(分析物)之訊號。比較未經處理之石墨烯層之基材與經過微波電漿處理之石墨烯層之基材,未經微波電漿處理的單層石墨烯層之基材中無法觀察到腺嘌呤分子的訊號;然而,在第一實施例(氧化石墨烯層)及第二實施例(氫化石墨烯層)之基材的拉曼光譜圖中,可明顯觀察到腺嘌呤分子的訊號。Referring to Figure 6, a comparison of Raman spectra obtained by detecting adenine molecules using a substrate using different Raman spectroscopy techniques. Among the selected substrates, the graphene layer is a single layer of graphene oxide layer (a) treated with microwave plasma, a single layer of hydrogenated graphene layer (b) and a single layer of graphene without microwave plasma treatment. Layer (c). In the surface-enhanced Raman spectrum, a signal of 734 cm -1 Raman shift is observed for adenine molecules (analytes). Comparing the substrate of the untreated graphene layer with the substrate of the graphene layer subjected to microwave plasma treatment, the signal of adenine molecules cannot be observed in the substrate of the monolayer graphene layer which is not subjected to microwave plasma treatment; However, in the Raman spectrum of the substrate of the first embodiment (the graphene oxide layer) and the second embodiment (the hydrogenated graphene layer), the signal of the adenine molecule was clearly observed.

由此可知,經過微波電漿處理法可將石墨烯中不定域的π電子定域化(localized),降低石墨烯的導電性。此種經過微波電漿處理之石墨烯,有利於作為拉曼光譜用之基材中良好的超薄保護層,並且使具有經過表面處理之石墨烯層的基材能夠提升金屬奈米顆粒偵測分析物之靈敏度,得到較強的分析物拉曼訊號強度。因此,本發明提供之拉曼光譜技術用之基材可提升拉曼光譜技術偵測分析物的能力,有效提升分析物的拉曼訊號強度。It can be seen that the microwave-plasma treatment method can localize the π-electron in the graphene, and reduce the conductivity of the graphene. The microwave-treated graphene is advantageous for use as a good ultra-thin protective layer in a substrate for Raman spectroscopy, and enables a substrate having a surface-treated graphene layer to enhance metal nanoparticle detection. The sensitivity of the analyte gives a strong analyte Raman signal intensity. Therefore, the substrate for Raman spectroscopy provided by the present invention can enhance the ability of Raman spectroscopy to detect analytes and effectively increase the Raman signal intensity of the analyte.

<第四試驗例><Fourth test example>

第四試驗例係比較不同拉曼光譜技術用之基材得到之拉曼光譜圖。於本試驗例中,分別將透過微波電漿處理5分鐘(a)或60分鐘(b)之氫化石墨烯層(第三實施例)及未經微波電漿處理之單層石墨烯層(c)(比較例)設置於金屬奈米顆粒上方,以波長為633 nm之雷射激發光照射上述之基材,比較得到的拉曼光譜訊號。The fourth test example compares Raman spectra obtained from substrates used in different Raman spectroscopy techniques. In this test example, the hydrogenated graphene layer (third embodiment) treated with microwave plasma for 5 minutes (a) or 60 minutes (b) and the single-layer graphene layer without microwave plasma treatment were respectively (Comparative Example) The Raman spectrum signal was compared between the metal nanoparticles and the laser excitation light having a wavelength of 633 nm to irradiate the substrate.

請參閱圖7,比較例之表面增強拉曼光譜圖中D-band、G-band及2D-band皆有明顯之訊號;經過微波電漿處理5分鐘之氫化石墨烯層中,D-band的訊號強度明顯變強,且2D-band的訊號強度為三個訊號中強度最弱的一個;而經過微波電漿處理60分鐘之氫化石墨烯層,該石墨烯層並非完全被氫化變成石墨烷,而是形成一個具有石墨烯與石墨烷混成的氫化石墨烯層。Referring to FIG. 7, the surface-enhanced Raman spectrum of the comparative example has obvious signals in D-band, G-band and 2D-band; in the hydrogenated graphene layer treated by microwave plasma for 5 minutes, D-band The intensity of the signal is significantly stronger, and the signal intensity of the 2D-band is the weakest of the three signals; while the hydrogenated graphene layer is treated by microwave plasma for 60 minutes, the graphene layer is not completely hydrogenated to graphane. Instead, a hydrogenated graphene layer having a mixture of graphene and graphane is formed.

<第五試驗例><Fifth Test Example>

第五試驗例係比較使用不同拉曼光譜技術用之基材偵測腺嘌呤分子得到之拉曼光譜圖。於本試驗例中,使用之基材係分別為基板上僅有石墨烯層(無奈米銀顆粒)之基材(a)、基板上僅有奈米銀顆粒(奈米銀顆粒上方無石墨烯層)之基材(b)、基板上之奈米銀顆粒上方設置有一未經微波電漿處理之石墨烯層之基材(c)(比較例)以及以氫氣微波電漿處理60分鐘之拉曼光譜技術用之基材(d)(第三實施例)。拉曼位移在721 cm-1 及732 cm-1 為腺嘌呤分子之拉曼訊號。如圖8所示,當使用基板上僅有石墨烯層(無奈米銀顆粒)之基材時,無法偵測到任何腺嘌呤分子的拉曼訊號;當使用基板上僅有奈米銀顆粒(奈米銀顆粒上方無石墨烯層)之基材時,可觀察到微弱的腺嘌呤分子拉曼訊號;然而,使用經過微波電漿處理60分鐘之氫化石墨烯層作為拉曼光譜技術用之基材時,可明顯觀察到較強的分析物(腺嘌呤分子)拉曼訊號,顯示透過微波電漿處理60分鐘的石墨烯層,電阻值已提高至50 kΩ。電阻值提高的原因在於,使用該氫化石墨烯層作為拉曼光譜技術用之基材的保護層,可使設置於基材上的分析物與金屬奈米顆粒間產生更強的局部電場偶合效應,得到較強的拉曼散射強度,提升拉曼光譜技術的偵測能力。The fifth test example compares Raman spectra obtained by detecting adenine molecules using a substrate using different Raman spectroscopy techniques. In the test examples, the substrate used was a substrate (a) having only a graphene layer (non-nano silver particles) on the substrate, and only nano silver particles on the substrate (no graphene above the nano silver particles) a substrate (b) of the layer), a substrate (c) (Comparative Example) in which a graphene layer not subjected to microwave plasma treatment is disposed above the nano silver particles on the substrate, and a microwave plasma treatment with hydrogen for 60 minutes Substrate (d) for the spectroscopy technique (third embodiment). The Raman shift is 721 cm -1 and 732 cm -1 is the Raman signal of the adenine molecule. As shown in Fig. 8, when a substrate having only a graphene layer (non-nano silver particles) on the substrate is used, the Raman signal of any adenine molecule cannot be detected; when the substrate is used, only nano silver particles are used ( A weak adenine molecular Raman signal was observed on the substrate without the graphene layer above the nano silver particles; however, the hydrogenated graphene layer treated by microwave plasma for 60 minutes was used as the base for Raman spectroscopy. In the case of the material, a strong analyte (adenine molecule) Raman signal was observed, indicating that the graphene layer was treated by microwave plasma for 60 minutes, and the resistance value was increased to 50 kΩ. The reason why the resistance value is increased is that the use of the hydrogenated graphene layer as a protective layer for the substrate for Raman spectroscopy enables a stronger local electric field coupling effect between the analyte disposed on the substrate and the metal nanoparticle. , to obtain strong Raman scattering intensity, improve the detection ability of Raman spectroscopy technology.

由此可知,本發明製作之拉曼光譜技術用之基材,透過微波電漿處理石墨烯層可有效增強分析物的拉曼訊號,同時藉由石墨烯的化學惰性與生物相容性,使本發明之基材更佳適合作為表面增強拉曼光譜技術用之基材。It can be seen that the substrate for Raman spectroscopy manufactured by the present invention can effectively enhance the Raman signal of the analyte by treating the graphene layer through microwave plasma, and at the same time, by chemical inertness and biocompatibility of graphene. The substrate of the present invention is more suitable as a substrate for surface enhanced Raman spectroscopy.

上述實施例僅係為了方便說明而舉例而已,本發明所主張之權利範圍自應以申請專利範圍所述為準,而非僅限於上述實施例。The above-mentioned embodiments are merely examples for convenience of description, and the scope of the claims is intended to be limited to the above embodiments.

1...拉曼光譜技術用之基材1. . . Substrate for Raman spectroscopy

11...氧化之矽基板11. . . Oxidized tantalum substrate

111...矽基板111. . .矽 substrate

112...二氧化矽層112. . . Ceria layer

121...金屬薄膜121. . . Metal film

122...金屬奈米顆粒122. . . Metal nanoparticles

13...石墨烯層13. . . Graphene layer

14...分析物14. . . Analyte

圖1A至圖1D係本發明拉曼光譜技術用之基材之製造方法流程圖。1A to 1D are flow charts showing a method of manufacturing a substrate for Raman spectroscopy of the present invention.

圖2係本發明拉曼光譜技術用之基材之結構圖。Figure 2 is a structural view of a substrate for Raman spectroscopy of the present invention.

圖3係本發明第四實施例中設置分析物於拉曼光譜技術用之基材上方之結構圖。Fig. 3 is a structural view showing the arrangement of an analyte above a substrate for Raman spectroscopy in a fourth embodiment of the present invention.

圖4係量測不同微波電漿處理時間影響石墨烯層的電阻之電阻-時間關係圖。Figure 4 is a graph showing the resistance-time relationship of the resistance of the graphene layer to different microwave plasma treatment times.

圖5為本發明第二試驗例,其係比較不同拉曼光譜技術用之基材得到之拉曼光譜圖。Fig. 5 is a second test example of the present invention which is a Raman spectrum obtained by comparing substrates used in different Raman spectroscopy techniques.

圖6為本發明第三試驗例,其係比較使用不同拉曼光譜技術用之基材偵測腺嘌呤分子得到之拉曼光譜圖。Fig. 6 is a third test example of the present invention, which is a Raman spectrum obtained by comparing adenine molecules obtained using substrates of different Raman spectroscopy techniques.

圖7為本發明第四試驗例,其係比較不同拉曼光譜技術用之基材得到之拉曼光譜圖。Fig. 7 is a fourth test example of the present invention, which is a Raman spectrum obtained by comparing substrates used in different Raman spectroscopy techniques.

圖8為本發明第五試驗例,其係比較使用不同拉曼光譜技術用之基材偵測腺嘌呤分子得到之拉曼光譜圖。Fig. 8 is a fifth test example of the present invention, which is a Raman spectrum obtained by comparing adenine molecules obtained using substrates of different Raman spectroscopy techniques.

1...拉曼光譜技術用之基材1. . . Substrate for Raman spectroscopy

11...氧化之矽基板11. . . Oxidized tantalum substrate

111...矽基板111. . .矽 substrate

112...二氧化矽層112. . . Ceria layer

121...金屬薄膜121. . . Metal film

122...金屬奈米顆粒122. . . Metal nanoparticles

13...石墨烯層13. . . Graphene layer

Claims (16)

一種拉曼光譜技術用之基材之製造方法,係包括下列步驟:(A)提供一基板;(B)形成一金屬薄膜於該基板上,並且處理該金屬薄膜以形成複數個金屬奈米顆粒;以及(C)設置一層或以上之石墨烯層於該些金屬奈米顆粒上,並且表面處理該些石墨烯層,形成一層或以上之經過表面處理之石墨烯層,其中,該經過表面處理之石墨烯層係為一氧化石墨烯層或一氫化石墨烯層。 A method for manufacturing a substrate for Raman spectroscopy comprises the steps of: (A) providing a substrate; (B) forming a metal film on the substrate, and processing the metal film to form a plurality of metal nanoparticles. And (C) providing one or more graphene layers on the metal nanoparticles, and surface treating the graphene layers to form one or more surface-treated graphene layers, wherein the surface treatment The graphene layer is a graphene oxide layer or a hydrogenated graphene layer. 如申請專利範圍第1項所述之拉曼光譜技術用之基材之製造方法,其中,於步驟(C)中,係將該些石墨烯層暴露於一含氫原子、一含氧原子、一含氫自由基、或一含氧自由基之環境下,以表面處理該些石墨烯層。 The method for producing a substrate for Raman spectroscopy according to claim 1, wherein in the step (C), the graphene layer is exposed to a hydrogen atom, an oxygen atom, The graphene layers are surface treated in the presence of a hydrogen radical or an oxygen radical. 如申請專利範圍第1項所述之拉曼光譜技術用之基材之製造方法,其中,於步驟(C)中,係透過電漿處理對該些石墨烯層進行表面處理。 The method for producing a substrate for Raman spectroscopy according to claim 1, wherein in the step (C), the graphene layers are surface-treated by plasma treatment. 如申請專利範圍第1項所述之拉曼光譜技術用之基材之製造方法,其中,於步驟(B)中,係以退火法處理該金屬薄膜以形成該些金屬奈米顆粒。 The method for producing a substrate for Raman spectroscopy according to the first aspect of the invention, wherein in the step (B), the metal thin film is treated by an annealing method to form the metal nanoparticles. 如申請專利範圍第1項所述之拉曼光譜技術用之基材之製造方法,其中,該些金屬奈米顆粒之粒徑係為5nm至400nm。 The method for producing a substrate for Raman spectroscopy according to the first aspect of the invention, wherein the metal nanoparticles have a particle diameter of 5 nm to 400 nm. 如申請專利範圍第1項所述之拉曼光譜技術用之基材之製造方法,其中,該經過表面處理之石墨烯層之單層厚度係為0.4nm至3nm。 The method for producing a substrate for Raman spectroscopy according to claim 1, wherein the surface-treated graphene layer has a single layer thickness of 0.4 nm to 3 nm. 如申請專利範圍第1項所述之拉曼光譜技術用之基材之製造方法,其中,該金屬奈米顆粒之材質係為銀、金、銅、鎳、鈷、鐵、鉑、鈀或鋁。 The method for producing a substrate for Raman spectroscopy according to claim 1, wherein the material of the metal nanoparticle is silver, gold, copper, nickel, cobalt, iron, platinum, palladium or aluminum. . 一種拉曼光譜技術用之基材,包括:一基板;複數個金屬奈米顆粒,該些金屬奈米顆粒係設置於該基板上,且該些金屬奈米顆粒間係相距一距離設置;以及一層或以上之經過表面處理之石墨烯層,該經過表面處理之石墨烯層係設置於該些金屬奈米顆粒之上方,其中,該經過表面處理之石墨烯層係為一氧化石墨烯層或一氫化石墨烯層。 A substrate for Raman spectroscopy, comprising: a substrate; a plurality of metal nanoparticles, wherein the metal nanoparticles are disposed on the substrate, and the metal nanoparticles are disposed at a distance from each other; One or more surface-treated graphene layers, the surface-treated graphene layer being disposed above the metal nano-particles, wherein the surface-treated graphene layer is a graphene oxide layer or A hydrogenated graphene layer. 如申請專利範圍第8項所述之拉曼光譜技術用之基材,其中,該經過表面處理之石墨烯層係透過電漿處理所形成。 The substrate for Raman spectroscopy according to claim 8, wherein the surface-treated graphene layer is formed by plasma treatment. 如申請專利範圍第8項所述之拉曼光譜技術用之基材,其中,該些金屬奈米顆粒之粒徑係為5nm至400nm。 The substrate for Raman spectroscopy according to claim 8, wherein the metal nanoparticles have a particle diameter of 5 nm to 400 nm. 如申請專利範圍第8項所述之拉曼光譜技術用之基材,其中,該金屬奈米顆粒之材質係為銀、金、銅、鎳、鈷、鐵、鉑、鈀或鋁。 The substrate for Raman spectroscopy according to claim 8, wherein the metal nanoparticle is made of silver, gold, copper, nickel, cobalt, iron, platinum, palladium or aluminum. 如申請專利範圍第8項所述之拉曼光譜技術用之基材,其中,該些金屬奈米顆粒間係相距5nm至150nm。 The substrate for Raman spectroscopy according to claim 8, wherein the metal nanoparticles are separated by 5 nm to 150 nm. 如申請專利範圍第8項所述之拉曼光譜技術用之基材,其中,該經過表面處理之石墨烯層之單層厚度係為0.4nm至3nm。 The substrate for Raman spectroscopy according to claim 8, wherein the surface-treated graphene layer has a single layer thickness of 0.4 nm to 3 nm. 如申請專利範圍第8項所述之拉曼光譜技術用之基材,其中,該拉曼光譜技術用之基材係透過下列步驟所製成:提供一基板;於基板上形成複數個金屬奈米顆粒;以及設置一層或以上之石墨烯層於該些金屬奈米顆粒上,並且表面處理該些石墨烯層,形成一層或以上之經過表面處理之石墨烯層。 The substrate for Raman spectroscopy according to claim 8, wherein the substrate for the Raman spectroscopy is formed by: providing a substrate; forming a plurality of metal naphthalenes on the substrate And arranging one or more graphene layers on the metal nanoparticles, and surface treating the graphene layers to form one or more surface-treated graphene layers. 如申請專利範圍第8項所述之拉曼光譜技術之基材,其中,更包括設置一分析物於該拉曼光譜用之基材之石墨烯層上方。 The substrate of the Raman spectroscopy technique of claim 8, wherein the method further comprises disposing an analyte over the graphene layer of the substrate for the Raman spectroscopy. 如申請專利範圍第15項所述之拉曼光譜技術之基材,其中,該分析物之濃度係為1nM至1M。 The substrate of the Raman spectroscopy technique of claim 15, wherein the analyte has a concentration of from 1 nM to 1 M.
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