TWI472393B - Method for surface cleaning of electrical discharge machining mold - Google Patents
Method for surface cleaning of electrical discharge machining mold Download PDFInfo
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- TWI472393B TWI472393B TW100147432A TW100147432A TWI472393B TW I472393 B TWI472393 B TW I472393B TW 100147432 A TW100147432 A TW 100147432A TW 100147432 A TW100147432 A TW 100147432A TW I472393 B TWI472393 B TW I472393B
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- 238000004140 cleaning Methods 0.000 title claims description 102
- 238000000034 method Methods 0.000 title claims description 37
- 238000009760 electrical discharge machining Methods 0.000 title description 9
- 238000003754 machining Methods 0.000 claims description 86
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 20
- 229910052799 carbon Inorganic materials 0.000 claims description 20
- 238000006073 displacement reaction Methods 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 238000005542 laser surface treatment Methods 0.000 claims description 14
- 230000003749 cleanliness Effects 0.000 claims description 13
- 239000007789 gas Substances 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 238000005238 degreasing Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 4
- 239000003570 air Substances 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 claims description 2
- 238000009832 plasma treatment Methods 0.000 description 8
- 206010028197 multiple epiphyseal dysplasia Diseases 0.000 description 7
- 239000002131 composite material Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000005012 migration Effects 0.000 description 3
- 238000013508 migration Methods 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005237 degreasing agent Methods 0.000 description 2
- 239000013527 degreasing agent Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- Moulds For Moulding Plastics Or The Like (AREA)
Description
本發明係關於一種放電加工模具表面清潔方法,尤其是一種用以清潔放電加工模具,使放電加工模具表面活化以維持產品精度的放電加工模具表面清潔方法。The invention relates to a method for cleaning the surface of an electric discharge machining mold, in particular to an electric discharge machining surface cleaning method for cleaning an electric discharge machining mold and activating the surface of the electric discharge machining mold to maintain product precision.
「真空電漿」及「大氣電漿」皆為已廣泛應用於各產業的物品表面清潔方法;其中,針對放電加工模具表面之清潔方法而言,真空電漿清潔的效果雖然很好,但能夠處理的工件受限於真空電漿清潔裝置之真空腔體的形式與尺寸大小,使得製程相容性低,且又有產率低及設備昂貴等因素,均間接增加了產品的製造成本,因此並不適合以真空電漿清潔的方法清潔放電加工模具之表面。"Vacuum Plasma" and "Atmospheric Plasma" are all surface cleaning methods that have been widely used in various industries. Among them, for the cleaning method of the surface of the electric discharge machining mold, the effect of vacuum plasma cleaning is good, but it can The processed workpiece is limited by the form and size of the vacuum chamber of the vacuum plasma cleaning device, so that the process compatibility is low, and the yield is low and the equipment is expensive, which indirectly increases the manufacturing cost of the product. It is not suitable to clean the surface of the EDM mold by vacuum plasma cleaning.
相對地,大氣電漿是在常壓環境中,利用高能電場作用,使中性氣體解離而成為電漿態,無須使用價格昂貴的真空腔體及真空系統;因此,目前清潔放電加工模具表面的方法,多係以具有高製程相容性、快速簡便、低溫及低成本等優點的大氣電漿清潔方式為之。In contrast, atmospheric plasma is in a normal pressure environment, using a high-energy electric field to dissociate the neutral gas into a plasma state, without the use of expensive vacuum chambers and vacuum systems; therefore, the surface of the current cleaning die is cleaned. The method is mainly based on the atmospheric plasma cleaning method with high process compatibility, fast and simple, low temperature and low cost.
然而,大氣電漿清潔的能量較低,對於放電加工模具上有嚴重積碳的地方,並無法達到完全清除積碳的作用;在一次次積碳累積的情況下,導致產品的鍍膜良率漸漸變差,使得該放電加工模具在使用一定次數後就需被淘汰,不僅不易維持產品的品質,同時也增加了製造的成本。However, the energy of atmospheric plasma cleaning is low. For the place where there is serious carbon deposit on the electric discharge machining mold, the effect of completely removing carbon deposit cannot be achieved; in the case of accumulated carbon accumulation, the coating yield of the product gradually increases. The deterioration causes the electric discharge machining mold to be eliminated after being used for a certain number of times, which is not only difficult to maintain the quality of the product, but also increases the manufacturing cost.
本發明目的乃解決上述習知技術之缺點,以提供一種放電加工模具表面清潔方法,係可利用雷射複合大氣電漿的清潔方法,將放電加工模具表面的積碳或髒污徹底清除,以提升表面清潔度者。The object of the present invention is to solve the above disadvantages of the prior art, and to provide a method for cleaning the surface of an electric discharge machining mold, which can completely remove carbon deposits or dirt on the surface of the electric discharge machining mold by using a cleaning method of the laser composite atmospheric plasma. Improve surface cleanliness.
為達到前述發明目的,本發明之放電加工模具表面清潔方法,包含:一初步清潔步驟,以濕式清洗的方式清洗一待清潔的放電加工模具,並於清洗後將該放電加工模具乾燥;一雷射表面處理步驟,將至少一完成該初步清潔步驟後的放電加工模具置放於一雙軸定位設備之工作平台,透過該雙軸定位設備設定一移行路徑,由該雙軸定位設備控制一雷射裝置及一攝像裝置沿該移行路徑相對於該工作平台產生位移,並於透過該攝像裝置發現該至少一放電加工模具表面有積碳或髒污時,以該雷射裝置產生一雷射光束去除該積碳或髒污;及一大氣電漿處理步驟,以一大氣電漿清潔裝置清潔該至少一放電加工模具之表面。In order to achieve the foregoing object, the surface cleaning method for an electric discharge machining mold of the present invention comprises: a preliminary cleaning step of cleaning an electric discharge machining mold to be cleaned by wet cleaning, and drying the electric discharge machining mold after cleaning; a laser surface treatment step of placing at least one electric discharge machining mold after the preliminary cleaning step on a working platform of a dual-axis positioning device, and setting a travel path through the biaxial positioning device, and controlling the two-axis positioning device a laser device and a camera device are displaced relative to the working platform along the traveling path, and a laser is generated by the laser device when the surface of the at least one electric discharge machining mold is found to be carbonized or dirty through the imaging device. The light beam removes the carbon deposit or dirt; and an atmospheric plasma processing step cleans the surface of the at least one electrical discharge machining mold with an atmospheric plasma cleaning device.
本發明之放電加工模具表面清潔方法,另包含一檢測步驟,該檢測步驟係檢查經該大氣電漿處理步驟清潔後之各該放電加工模具表面的清潔度是否已達合格標準。The method for cleaning the surface of the electric discharge machining mold of the present invention further comprises a detecting step of checking whether the cleanliness of the surface of each of the electric discharge machining molds after the cleaning by the atmospheric plasma treatment step has reached an eligibility standard.
本發明之放電加工模具表面清潔方法,其中,該移行路徑具有複數個停滯點,當該攝像裝置對位至各該停滯點時,該工作平台與攝像裝置之間的相對位移將暫停一預設時間,並隨後繼續沿該移行路徑位移。The method for cleaning the surface of an electric discharge machining die according to the present invention, wherein the travel path has a plurality of stagnation points, and when the camera device is aligned to each of the stagnation points, the relative displacement between the work platform and the camera device is suspended for a preset Time, and then continue to move along the migration path.
本發明之放電加工模具表面清潔方法,其中,該雷射光束的功率為3~100W。In the method for cleaning the surface of an electric discharge machining mold according to the present invention, the power of the laser beam is 3 to 100 W.
本發明之放電加工模具表面清潔方法,其中,該大氣電漿清潔裝置架設於該雙軸定位設備,並與該工作平台相對。In the electric discharge machining mold surface cleaning method of the present invention, the atmospheric plasma cleaning device is mounted on the biaxial positioning device and opposed to the working platform.
本發明之放電加工模具表面清潔方法,其中,該雙軸定位設備控制該大氣電漿清潔裝置與該工作平台產生相對位移,且同時由該大氣電漿清潔裝置向該至少一放電加工模具噴射大氣電漿。The electric discharge machining mold surface cleaning method of the present invention, wherein the biaxial positioning device controls the atmospheric plasma cleaning device to generate a relative displacement with the working platform, and at the same time, the atmospheric plasma cleaning device injects the atmosphere into the at least one electric discharge machining mold Plasma.
本發明之放電加工模具表面清潔方法,其中,該大氣電漿清潔裝置與該工作平台之間的相對位移速率為5~100 mm/second。The method for cleaning the surface of an electric discharge machining mold according to the present invention, wherein a relative displacement rate between the atmospheric plasma cleaning device and the working platform is 5 to 100 mm/second.
本發明之放電加工模具表面清潔方法,其中,該大氣電漿清潔裝置之工作氣體為空氣、氮氣、氧氣、氬氣或其混合氣體,工作電壓為100~500V。The surface cleaning method for the electric discharge machining mold of the present invention, wherein the working gas of the atmospheric plasma cleaning device is air, nitrogen, oxygen, argon or a mixed gas thereof, and the working voltage is 100 to 500V.
本發明之放電加工模具表面清潔方法,其中,由該檢測步驟檢出清潔度未達該合格標準之放電加工模具,則再次進行該雷射表面處理步驟及大氣電漿處理步驟,以清除表面之積碳或髒污,直至由該檢測步驟檢出之清潔度達合格標準為止。In the method for cleaning the surface of an electric discharge machining mold according to the present invention, wherein the electric discharge machining mold whose cleaning degree is not up to the qualified standard is detected by the detecting step, the laser surface treatment step and the atmospheric plasma treatment step are performed again to remove the surface. Carbon deposits or dirt until the cleanliness detected by this test step meets the eligibility criteria.
本發明之放電加工模具表面清潔方法,其中,該濕式清洗包含脫脂及水洗程序。The surface cleaning method for an electric discharge machining die according to the present invention, wherein the wet cleaning comprises a degreasing and water washing process.
為讓本發明之上述及其他目的、特徵及優點能更明顯易懂,下文特舉本發明之較佳實施例,並配合所附圖式,作詳細說明如下:The above and other objects, features and advantages of the present invention will become more <RTIgt;
本發明所述之「超音波清潔裝置」,係指設有清洗槽,且可透過超音波震動該清洗槽中的液體,以提升清洗效率者。The "ultrasonic cleaning device" as used in the present invention refers to a person who is provided with a cleaning tank and can vibrate the liquid in the cleaning tank by ultrasonic waves to improve the cleaning efficiency.
本發明所述之「烘箱」,係指具有一容室,且可利用電熱或燃燒熱等熱源升高該容室中氣體溫度者,可用以蒸發置放於該容室中物品的水分。The "oven" as used in the present invention refers to a person having a chamber and which can raise the temperature of the gas in the chamber by using a heat source such as electric heat or combustion heat, and can be used to evaporate the moisture of the articles placed in the chamber.
本發明所述之「雷射裝置」,係指可由一噴頭發射雷射光束,用以對物品表面進行雷射清潔者;其中,適用於本發明之雷射裝置,係可產生波長範圍在100~1200nm之雷射光束者,並可依據需求調整雷射光束之功率。The "laser device" as used in the present invention refers to a laser beam that can be emitted from a nozzle to perform laser cleaning on the surface of the article; wherein the laser device suitable for use in the present invention can generate a wavelength range of 100 The laser beam of ~1200nm can adjust the power of the laser beam according to the demand.
本發明所述之「雙軸定位設備」,係指具有一用以架設物品之工作平台,及一用以架設預設加工裝置之加工座,並可透過一控制單元設定一移行路徑,以驅動該工作平台與加工座在X-Y平面上沿該移行路徑產生相對位移者。The "two-axis positioning device" as used in the present invention refers to a working platform for erecting articles, and a processing base for erecting a preset processing device, and a moving path is set through a control unit to drive The working platform and the machining seat generate relative displacement along the travel path on the XY plane.
本發明所述之「攝像裝置」,係指可透過一鏡頭擷取預設範圍內之影像者。The "camera device" as used in the present invention refers to a person who can capture images in a preset range through a lens.
本發明所述之「大氣電漿清潔裝置」,係指可於常壓下,利用高能電場將中性氣體解離成電漿態,並透過一噴頭噴射出電漿態之工作流體以對物品表面進行清潔者。The "atmospheric plasma cleaning device" as used in the present invention means that the neutral gas can be dissociated into a plasma state by a high-energy electric field under normal pressure, and the working fluid is sprayed out of the plasma state through a nozzle to face the object. Carry out the cleaner.
本發明所述之「水滴接觸角量測儀」,係指可量測水滴與物件表面夾角者,可用以判斷該物件表面之清潔度。The "water droplet contact angle measuring instrument" according to the present invention means that the angle between the water drop and the surface of the object can be measured, and the cleanness of the surface of the object can be judged.
請參閱第1圖所示,係本發明之較佳實施例,該放電加工模具表面清潔方法係包含一初步清潔步驟S1、一雷射表面處理步驟S2及一大氣電漿處理步驟S3,以清潔至少一放電加工模具1(如第2圖所示)表面之積碳和/或髒污。Referring to FIG. 1, in a preferred embodiment of the present invention, the surface of the EDM mold cleaning method includes a preliminary cleaning step S1, a laser surface treatment step S2, and an atmospheric plasma treatment step S3 for cleaning. At least one of the surface of the electric discharge machining die 1 (shown in Fig. 2) is carbonaceous and/or dirty.
本發明的初步清潔步驟S1,係以濕式清洗的方式清洗一待清潔的放電加工模具1,並於清洗後將該放電加工模具1乾燥。更詳言之,為提升清潔效率,可透過一超音波清潔裝置,於一清洗槽中依序對該放電加工模具1進行脫脂及水洗等濕式清洗的程序,藉由超音波震動該清洗槽中的液體,使濕式清洗的清潔效果提升。其中,該脫脂程序係利用脫脂劑將該放電加工模具1表面附著的油脂、髒污及附著物去除,該水洗程序則是將該放電加工模具1表面殘留的脫脂劑洗淨。In the preliminary cleaning step S1 of the present invention, an electric discharge machining mold 1 to be cleaned is cleaned by wet cleaning, and the electric discharge machining mold 1 is dried after cleaning. More specifically, in order to improve the cleaning efficiency, the ultrasonic cleaning device may be subjected to a wet cleaning process such as degreasing and water washing in a cleaning tank through an ultrasonic cleaning device, and the cleaning tank is vibrated by ultrasonic waves. The liquid in the liquid improves the cleaning effect of the wet cleaning. In the degreasing process, the grease, the dirt, and the adhering matter adhering to the surface of the electric discharge machining die 1 are removed by a degreasing agent, and the degreasing agent remaining on the surface of the electric discharge machining die 1 is washed.
該放電加工模具1完成濕式清洗後,可選擇自然風乾或加熱烘烤等方式,去除該放電加工模具1上的水分;在本實施例中,為提升乾燥該放電加工模具1之效率,可將該放電加工模具1置入一烘箱中,並較佳以不超過250℃的溫度加熱適當時間,使該放電加工模具1乾燥,以完成初步清潔該放電加工模具1的步驟。After the electric discharge machining die 1 is subjected to wet cleaning, the moisture on the electric discharge machining die 1 may be removed by means of natural air drying or heating baking; in this embodiment, in order to improve the efficiency of drying the electric discharge machining die 1, The electric discharge machining die 1 is placed in an oven, and is preferably heated at a temperature not exceeding 250 ° C for a suitable time to dry the electric discharge machining die 1 to complete the preliminary cleaning of the electric discharge machining die 1.
請參閱第1及2圖所示,本發明的雷射表面處理步驟S2,係針對該至少一放電加工模具1表面之積碳或髒污處,以一雷射裝置2進行雷射表面處理。更詳言之,可將至少一完成該初步清潔步驟S1後的放電加工模具1,定位置放於一雙軸定位設備3之工作平台31上;該雷射裝置2係架設於該雙軸定位設備3之加工座(圖未繪示),且該雷射裝置2旁另架設有一高倍率的攝像裝置4,該攝像裝置4電性連接一顯示器(圖未繪示),該雷射裝置2之噴頭21以及該攝像裝置4之鏡頭41,均與該工作平台31相對,並與該工作平台31間隔預設距離。其中,本實施例中之雷射裝置2可選用能夠發出波長為532nm之雷射光束者。Referring to FIGS. 1 and 2, the laser surface treatment step S2 of the present invention performs laser surface treatment with a laser device 2 for carbon deposits or dirt on the surface of the at least one electric discharge machining mold 1. In more detail, at least one of the electric discharge machining molds 1 after the preliminary cleaning step S1 is placed on the working platform 31 of a biaxial positioning device 3; the laser device 2 is erected on the biaxial positioning a processing unit (not shown) of the device 3, and a high-magnification camera device 4 is disposed on the side of the laser device 2, and the camera device 4 is electrically connected to a display (not shown). The laser device 2 is electrically connected to the display device (not shown). The nozzle 21 and the lens 41 of the camera 4 are opposite to the working platform 31 and spaced apart from the working platform 31 by a predetermined distance. Wherein, the laser device 2 in this embodiment can be selected to emit a laser beam having a wavelength of 532 nm.
再者,還可依據定位置放於該工作平台31上的放電加工模具1數量,透過該雙軸定位設備3之控制單元設定一合適的移行路徑R1。舉例而言,當定位置放於該工作平台31上的放電加工模具1數量為單一個時,較佳將該移行路徑R1設定成繞行於該放電加工模具1的各式連續路徑,例如第3a、3b圖所示,但不以此為限;當定位置放於該工作平台31上的放電加工模具1數量為複數個時,除了可以將該移行路徑R1設定成個別針對各放電加工模具1完成繞行,也可以將該移行路徑R1設定成橫跨該複數個放電加工模具1的各式連續路徑,例如第2、3c圖所示,但不以此為限。Furthermore, an appropriate travel path R1 can be set by the control unit of the biaxial positioning device 3 according to the number of EDMs 1 placed on the work platform 31. For example, when the number of the electric discharge machining molds 1 placed on the work platform 31 is a single one, it is preferable to set the travel path R1 to a continuous path around the electric discharge machining mold 1, for example, 3a, 3b, but not limited to this; when the number of electric discharge machining dies 1 placed on the working platform 31 is plural, the travel path R1 can be set to be individually for each electric discharge machining mold. 1 The bypass is completed, and the transition path R1 may be set as a continuous path spanning the plurality of electric discharge machining dies 1, for example, as shown in FIGS. 2 and 3c, but not limited thereto.
該雷射表面處理步驟S2的操作溫度可選擇為室溫即可,並透過前述結構,由該雙軸定位設備3精確控制該雷射裝置2及攝像裝置4,與該工作平台31之間在X-Y平面上沿預設之移行路徑R1產生相對位移;其中,可以使該工作平台31保持不動,驅動該雷射裝置2及攝像裝置4產生位移,或者是使該雷射裝置2及攝像裝置4保持不動,驅動該工作平台31產生位移。The operation temperature of the laser surface treatment step S2 can be selected as room temperature, and the laser device 2 and the camera device 4 are precisely controlled by the biaxial positioning device 3 through the foregoing structure, and the working platform 31 is A relative displacement is generated along the preset travel path R1 on the XY plane; wherein the work platform 31 can be kept stationary, the laser device 2 and the camera device 4 are driven to generate displacement, or the laser device 2 and the camera device 4 are caused to be displaced. Staying still, driving the work platform 31 to produce displacement.
此外,由於該攝像裝置4之鏡頭41僅能擷取預設範圍內之影像,因此可透過該雙軸定位設備3之控制單元,在該移行路徑R1上設複數個停滯點P,當該攝像裝置4對位至各停滯點P時,該工作平台31與攝像裝置4之間的相對位移將暫停一停留時間,並隨後繼續沿該移行路徑R1位移;其中,該停留時間可以為0.5~5秒,較佳為1秒。In addition, since the lens 41 of the camera device 4 can only capture images within a preset range, a plurality of stagnation points P can be set on the travel path R1 through the control unit of the dual-axis positioning device 3. When the device 4 is aligned to each stagnation point P, the relative displacement between the working platform 31 and the camera device 4 will pause for a dwell time, and then continue to be displaced along the travel path R1; wherein the dwell time may be 0.5~5 Seconds, preferably 1 second.
據此,使用者可透過該攝像裝置4,即時地由該顯示器觀察該放電加工模具1表面被拍攝到的位置;若在一停滯點P上看到嚴重積碳或髒污處,則可對該雙軸定位設備3之控制單元下一暫停指令,使該工作平台31與攝像裝置4之間的相對位移暫停,並控制該雷射裝置2發出功率為3~100W(較佳為35W)的雷射光束,針對該嚴重積碳或髒污處進行清潔,以局部清除該放電加工模具1上的積碳或髒污。其中,透過該攝像裝置4之設置,令該雷射裝置2可精確地僅針對積碳或髒污處進行清潔,使得高能量的雷射光束不會掃過沒有積碳或髒污的地方,可有效避免該放電加工模具1之表面受損,從而得以延長該放電加工模具1之使用壽命。According to this, the user can immediately observe the position where the surface of the electric discharge machining mold 1 is photographed by the display device 4; if a serious carbon deposit or dirt is seen at a stagnation point P, the pair can be The control unit of the biaxial positioning device 3 pauses the command to pause the relative displacement between the working platform 31 and the camera device 4, and controls the laser device 2 to emit power of 3 to 100 W (preferably 35 W). The laser beam is cleaned against the severe carbon deposit or dirt to locally remove carbon deposits or dirt on the electric discharge machining die 1. Through the arrangement of the camera device 4, the laser device 2 can be precisely cleaned only for carbon deposits or dirt, so that the high-energy laser beam does not sweep through places where there is no carbon deposit or dirt. The surface of the electric discharge machining die 1 can be effectively prevented from being damaged, thereby prolonging the service life of the electric discharge machining die 1.
在該停滯點P上清除該放電加工模具1上的積碳或髒污後,可解除該暫停指令,使該工作平台31與攝像裝置4之間繼續沿該移行路徑R1產生相對位移,而該攝像裝置4對位至下一個停滯點P時,將再短暫地停滯以供觀察是否有需要進行雷射清潔的地方,如此重複直至完成該移行路徑R1上所有停滯點P之檢查。After the carbon deposit or the dirt on the electric discharge machining die 1 is removed at the stagnation point P, the pause command can be released, and the relative displacement between the working platform 31 and the image pickup device 4 along the travel path R1 can be continued. When the camera unit 4 is aligned to the next stagnation point P, it will be temporarily stopped for observation to see if there is a need for laser cleaning, and so on until the check of all the stagnation points P on the travel path R1 is completed.
請參閱第1及4圖所示,本發明的大氣電漿處理步驟S3,係以一大氣電漿清潔裝置5清潔該至少一放電加工模具1之表面。更詳言之,該大氣電漿清潔裝置5同樣可被架設於該雙軸定位設備3之加工座,且該大氣電漿清潔裝置5之噴頭51亦與該工作平台31相對並間隔預設距離,以及可透過該雙軸定位設備3之控制單元設定一合適的移行路徑R2,該移行路徑R2可與該移行路徑R1相同,亦可不同。Referring to FIGS. 1 and 4, the atmospheric plasma processing step S3 of the present invention cleans the surface of the at least one electric discharge machining die 1 with an atmospheric plasma cleaning device 5. In more detail, the atmospheric plasma cleaning device 5 can also be mounted on the processing seat of the biaxial positioning device 3, and the nozzle 51 of the atmospheric plasma cleaning device 5 is also opposite to the working platform 31 and spaced apart by a predetermined distance. And a suitable travel path R2 can be set by the control unit of the biaxial positioning device 3, and the travel path R2 can be the same as or different from the travel path R1.
據此,該至少一放電加工模具1表面在經過該雷射表面處理步驟S2,以局部清除嚴重積碳或髒污處後,可由該雙軸定位設備3精確控制該大氣電漿清潔裝置5與該工作平台31之間在X-Y平面上沿預設之移行路徑R2產生相對位移,並同步地由該大氣電漿清潔裝置5向該工作平台31上的該至少一放電加工模具1噴射大氣電漿,以全面性地清除該至少一放電加工模具1表面的殘留積碳或髒污。According to this, after the surface of the at least one electric discharge machining die 1 passes through the laser surface treatment step S2 to partially remove the serious carbon deposit or dirt, the atmospheric plasma cleaning device 5 can be precisely controlled by the biaxial positioning device 3 and The working platforms 31 are relatively displaced along the predetermined travel path R2 on the XY plane, and the atmospheric plasma cleaning device 5 simultaneously injects atmospheric plasma into the at least one electric discharge machining die 1 on the working platform 31. To comprehensively remove residual carbon deposits or dirt on the surface of the at least one electric discharge machining mold 1.
在本實施例中,該大氣電漿處理步驟S3的操作溫度亦可選擇為室溫即可,該大氣電漿清潔裝置5之工作氣體可以為空氣、氮氣、氧氣、氬氣或其混合氣體等,工作電壓可以為100~500V(較佳為250V),該大氣電漿清潔裝置5與工作平台31之間的相對位移速率可以為5~100 mm/second(較佳為20 mm/second)。In this embodiment, the operating temperature of the atmospheric plasma processing step S3 may also be selected as room temperature, and the working gas of the atmospheric plasma cleaning device 5 may be air, nitrogen, oxygen, argon or a mixed gas thereof. The working voltage may be 100~500V (preferably 250V), and the relative displacement rate between the atmospheric plasma cleaning device 5 and the working platform 31 may be 5~100 mm/second (preferably 20 mm/second).
請參閱第1圖所示,本發明較佳另包含一檢測步驟S4,該檢測步驟S4係用以檢查經該大氣電漿處理步驟S3清潔後之各該放電加工模具1表面的清潔度是否已達合格標準。更詳言之,可選擇透過「水滴接觸角測試法」,檢測該放電加工模具1之表面,在經過該雷射表面處理步驟S2及大氣電漿處理步驟S3之清潔處理後,是否已達到合格的清潔度標準;亦即,可將固定體積的液態去離子水滴灑在該放電加工模具1之表面,並透過一水滴接觸角量測儀,量測水滴與該放電加工模具1表面的夾角,藉「清潔度越高,水滴接觸角越小」之準則,判斷該放電加工模具1表面之清潔度。Referring to FIG. 1 , the present invention preferably further includes a detecting step S4 for checking whether the cleanliness of the surface of each of the EDM 1 after cleaning by the atmospheric plasma processing step S3 has been Meet the eligibility criteria. More specifically, it is optional to detect the surface of the electric discharge machining die 1 by the "water droplet contact angle test method", and whether it has passed the cleaning process after the laser surface treatment step S2 and the atmospheric plasma treatment step S3. a cleanliness standard; that is, a fixed volume of liquid deionized water droplets may be sprinkled on the surface of the electric discharge machining die 1 and measured by a water droplet contact angle measuring instrument to measure the angle between the water drop and the surface of the electric discharge machining die 1. The cleanliness of the surface of the electric discharge machining die 1 is judged by the criterion of "the higher the degree of cleanliness, the smaller the contact angle of the water droplets".
另外,對於清潔度未達該合格標準之放電加工模具1,則可再次進行該雷射表面處理步驟S2及大氣電漿處理步驟S3,清除表面之積碳或髒污,直至由該檢測步驟S4檢測出清潔度達合格標準為止。In addition, for the electric discharge machining die 1 whose cleaning degree is not up to the qualified standard, the laser surface treatment step S2 and the atmospheric plasma treatment step S3 may be performed again to remove carbon deposits or dirt on the surface until the detection step S4 is performed. The cleanliness is tested to the eligibility criteria.
請參閱附照1~3所示,附照1~3分別為「清潔前」、「僅以大氣電漿清潔處理過」及「以雷射複合大氣電漿清潔處理過」三種情況,於同一放電加工模具的相同位置上進行水滴接觸角測試所得之測試結果。由附照1可知,清潔前的放電加工模具,其表面之水滴接觸角大於70度;僅以大氣電漿清潔處理過的放電加工模具,其表面之水滴接觸角已降至小於20度左右;但以雷射複合大氣電漿清潔處理過的放電加工模具,其表面之水滴接觸角甚至可小於10度,故本發明之放電加工模具表面清潔方法係可有效提升放電加工模具之表面清潔度。Please refer to the attached pictures 1~3. The pictures 1~3 are respectively "before cleaning", "cleaning only with atmospheric plasma" and "cleaning with laser composite atmospheric plasma". The test results obtained by the water droplet contact angle test were performed at the same position of the electric discharge machining mold. It can be seen from the attachment 1 that the discharge machining mold before cleaning has a water droplet contact angle of more than 70 degrees on the surface; the discharge machining mold of the surface of the electric discharge machining mold which has been cleaned by the atmospheric plasma has been reduced to less than about 20 degrees; However, in the electric discharge machining mold which has been cleaned by the laser composite atmospheric plasma, the contact angle of the water droplet on the surface can be even less than 10 degrees. Therefore, the surface cleaning method of the electric discharge machining mold of the present invention can effectively improve the surface cleanliness of the electric discharge machining mold.
綜上所述,由於本發明的放電加工模具表面清潔方法,係可利用雷射複合大氣電漿的清潔方法,將放電加工模具表面的積碳或髒污徹底清除,以提升表面清潔度,從而提升產品的鍍膜良率,並延長該放電加工模具之使用壽命,不僅可維持產品的品質,同時也降低了製造的成本。In summary, the surface cleaning method of the electric discharge machining mold of the present invention can completely remove the carbon deposit or the dirt on the surface of the electric discharge machining mold by using a cleaning method of the laser composite atmospheric plasma to improve the surface cleanliness. Increasing the coating yield of the product and extending the service life of the EDM mold not only maintains the quality of the product, but also reduces the manufacturing cost.
雖然本發明已利用上述較佳實施例揭示,然其並非用以限定本發明,任何熟習此技藝者在不脫離本發明之精神和範圍之內,相對上述實施例進行各種更動與修改仍屬本發明所保護之技術範疇,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the invention has been described in connection with the preferred embodiments described above, it is not intended to limit the scope of the invention. The technical scope of the invention is protected, and therefore the scope of the invention is defined by the scope of the appended claims.
1...放電加工模具1. . . Electric discharge machining mold
2...雷射裝置2. . . Laser device
21...噴頭twenty one. . . Nozzle
3...雙軸定位設備3. . . Dual axis positioning device
31...工作平台31. . . Work platform
4...攝像裝置4. . . Camera
41...鏡頭41. . . Lens
5...大氣電漿清潔裝置5. . . Atmospheric plasma cleaning device
51...噴頭51. . . Nozzle
S1...初步清潔步驟S1. . . Initial cleaning step
S2...雷射表面處理步驟S2. . . Laser surface treatment steps
S3...大氣電漿處理步驟S3. . . Atmospheric plasma treatment steps
S4...檢測步驟S4. . . Detection step
R1...移行路徑R1. . . Migration path
R2...移行路徑R2. . . Migration path
P...停滯點P. . . Stagnation point
第1圖:本發明較佳實施例之流程方塊圖。Figure 1 is a block diagram showing the flow of a preferred embodiment of the present invention.
第2圖:本發明進行雷射表面處理步驟之示意圖。Figure 2: Schematic diagram of the laser surface treatment steps of the present invention.
第3a圖:本發明之攝像裝置與工作平台相對位移的路徑示意圖(一)。Figure 3a is a schematic view of the path of the relative displacement of the camera device of the present invention and the working platform (1).
第3b圖:本發明之攝像裝置與工作平台相對位移的路徑示意圖(二)。Figure 3b is a schematic diagram of the path of the relative displacement of the camera device of the present invention and the working platform (2).
第3c圖:本發明之攝像裝置與工作平台相對位移的路徑示意圖(三)。Figure 3c: Schematic diagram of the path of the relative displacement of the camera device of the present invention and the working platform (3).
第4圖:本發明進行大氣電漿處理步驟之示意圖。Figure 4: Schematic diagram of the atmospheric plasma treatment steps of the present invention.
附照1:一放電加工模具表面清潔前進行水滴接觸角測試之測試結果。Attachment 1: The test result of the water droplet contact angle test before the surface of the electric discharge machining mold is cleaned.
附照2:該放電加工模具表面僅以大氣電漿清潔處理過並進行水滴接觸角測試之測試結果。Attachment 2: The surface of the EDM mold was cleaned only by atmospheric plasma and tested for water droplet contact angle test.
附照3:該放電加工模具表面以雷射複合大氣電漿清潔處理過並進行水滴接觸角測試之測試結果。Attachment 3: The surface of the EDM mold was cleaned by a laser composite atmospheric plasma and tested for water droplet contact angle test.
S1...初步清潔步驟S1. . . Initial cleaning step
S2...雷射表面處理步驟S2. . . Laser surface treatment steps
S3...大氣電漿處理步驟S3. . . Atmospheric plasma treatment steps
S4...檢測步驟S4. . . Detection step
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| TW200822980A (en) * | 2006-11-16 | 2008-06-01 | Atomic Energy Council | Atmosphere plasma cleaning and treating device |
| TW201009345A (en) * | 2008-08-18 | 2010-03-01 | Fujitsu Ltd | Laser cleaning apparatus and laser cleaning method |
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| TW200822980A (en) * | 2006-11-16 | 2008-06-01 | Atomic Energy Council | Atmosphere plasma cleaning and treating device |
| TW201009345A (en) * | 2008-08-18 | 2010-03-01 | Fujitsu Ltd | Laser cleaning apparatus and laser cleaning method |
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