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TWI470811B - - Google Patents

Info

Publication number
TWI470811B
TWI470811B TW100127607A TW100127607A TWI470811B TW I470811 B TWI470811 B TW I470811B TW 100127607 A TW100127607 A TW 100127607A TW 100127607 A TW100127607 A TW 100127607A TW I470811 B TWI470811 B TW I470811B
Authority
TW
Taiwan
Application number
TW100127607A
Other languages
Chinese (zh)
Other versions
TW201308616A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW100127607A priority Critical patent/TW201308616A/en
Priority to CN201110310991XA priority patent/CN102916073A/en
Publication of TW201308616A publication Critical patent/TW201308616A/en
Application granted granted Critical
Publication of TWI470811B publication Critical patent/TWI470811B/zh

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
TW100127607A 2011-08-03 2011-08-03 Method of forming conductive pattern on substrate TW201308616A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW100127607A TW201308616A (en) 2011-08-03 2011-08-03 Method of forming conductive pattern on substrate
CN201110310991XA CN102916073A (en) 2011-08-03 2011-10-14 Method for forming conductive pattern on substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100127607A TW201308616A (en) 2011-08-03 2011-08-03 Method of forming conductive pattern on substrate

Publications (2)

Publication Number Publication Date
TW201308616A TW201308616A (en) 2013-02-16
TWI470811B true TWI470811B (en) 2015-01-21

Family

ID=47614377

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100127607A TW201308616A (en) 2011-08-03 2011-08-03 Method of forming conductive pattern on substrate

Country Status (2)

Country Link
CN (1) CN102916073A (en)
TW (1) TW201308616A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103839864A (en) * 2014-02-24 2014-06-04 合肥鑫晟光电科技有限公司 Coating alignment device and coating system
CN103966548B (en) * 2014-05-07 2015-07-01 京东方科技集团股份有限公司 Mask plate, manufacturing method of mask plate and mask assembly with mask plate
CN106206761B (en) * 2014-10-31 2018-06-26 比亚迪股份有限公司 Solar cell chip arrays, solar cell module and preparation method thereof
CN104733359A (en) * 2015-03-24 2015-06-24 王春 Efficient and energy-saving EPT for rapidly forming metal pattern circuit
CN106920894B (en) * 2017-04-28 2020-04-24 陕西科技大学 Transparent OLED device structure and preparation method thereof
SE1751265A1 (en) * 2017-10-13 2019-03-12 Stora Enso Oyj Method and arrangement for producing a label with integrated electrically conductive pattern
CN113036016B (en) * 2019-12-24 2022-10-11 群创光电股份有限公司 Electronic device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW503444B (en) * 2000-03-08 2002-09-21 Semiconductor Energy Lab Semiconductor device and manufacturing method thereof
TWI232543B (en) * 2003-03-17 2005-05-11 Seiko Epson Corp Method of forming contact holes and electronic device formed thereby
TWI263353B (en) * 2005-11-15 2006-10-01 Advanced Semiconductor Eng Chip structure and manufacturing method of the same
TWI275187B (en) * 2005-11-30 2007-03-01 Advanced Semiconductor Eng Flip chip package and manufacturing method of the same
TWI302921B (en) * 2004-02-26 2008-11-11 Taiwan Semiconductor Mfg Method of forming a polyimide layer and photo-sensitive polymer layer, and a chip having the polyimide layer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001322228A (en) * 2000-05-17 2001-11-20 Riso Kagaku Corp Thermosensitive stencil making method, thermosensitive stencil stencil making machine, and thermoplastic resin film of thermosensitive stencil stencil
JP2009516388A (en) * 2005-11-18 2009-04-16 レプリソールス テクノロジーズ アーベー Method for forming a multilayer structure
US7749883B2 (en) * 2007-09-20 2010-07-06 Fry's Metals, Inc. Electroformed stencils for solar cell front side metallization
DE102009024877A1 (en) * 2009-06-09 2010-12-23 Nb Technologies Gmbh screen printing forme

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW503444B (en) * 2000-03-08 2002-09-21 Semiconductor Energy Lab Semiconductor device and manufacturing method thereof
TWI232543B (en) * 2003-03-17 2005-05-11 Seiko Epson Corp Method of forming contact holes and electronic device formed thereby
TWI302921B (en) * 2004-02-26 2008-11-11 Taiwan Semiconductor Mfg Method of forming a polyimide layer and photo-sensitive polymer layer, and a chip having the polyimide layer
TWI263353B (en) * 2005-11-15 2006-10-01 Advanced Semiconductor Eng Chip structure and manufacturing method of the same
TWI275187B (en) * 2005-11-30 2007-03-01 Advanced Semiconductor Eng Flip chip package and manufacturing method of the same

Also Published As

Publication number Publication date
TW201308616A (en) 2013-02-16
CN102916073A (en) 2013-02-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees