TWI468543B - Substrate transfer and processing system and substrate transfer and processing methods - Google Patents

Description

Substrate transfer and processing system and substrate transfer and processing method

The invention relates to a substrate transfer and processing system and a substrate transfer and processing method, in particular to a substrate transfer and processing system and a substrate transfer and processing method which can greatly reduce the supply of chemical liquid, improve the uniformity of film deposition and increase the productivity.

Nowadays, the electronics industry is developing rapidly, and many electronic products need to be applied to physical deposition technology or chemical deposition technology. In addition, the world faces the problems of petroleum energy depletion, high cost and environmental protection, which has led to an increase in the demand for solar and hydrogen energy fuel cells. Since solar cells are manufactured, it is necessary to form a plurality of deposition layers (films) on a substrate. Effectively exerting its functions, it shows that the deposition process is an extremely important key technology for the electronics industry and the civilian production industry.

The conventional chemical bath deposition (CBD) process is also one of the deposition techniques, which immerses a substrate (such as a solar cell substrate) which is pretreated on the surface into a chemical liquid for a certain period of time. The surface of the substrate is deposited to form a semiconductor film. However, conventional chemical bath deposition equipment completely immerses the substrate in the chemical liquid, which will result in the formation of a semiconductor film on a plurality of surfaces of the substrate. However, the substrate only needs to form a semiconductor film on one surface. The semiconductor film formed on the remaining surface of the multi-substrate wastes manufacturing costs and process time.

Therefore, how to create an electroless plating bath deposition apparatus to make electroless plating bath deposition on one side of a flexible substrate is an important issue.

The main object of the present invention is to provide a substrate transfer and processing system capable of load-continuous filming and simultaneous processing of a plurality of substrate substrates, which can greatly increase productivity and manufacturing efficiency, and further utilize a chemical liquid cover and a substrate sealing cover. The liquid medicine box with the sealed space is arranged, so that only a small amount of liquid medicine is needed, so that the amount of the liquid medicine can be greatly reduced, and the liquid medicine is always in contact with the single surface of the substrate in the liquid medicine box.

Another object of the present invention is to provide a substrate transfer and processing method, the method comprising: moving a substrate on a transport path by a substrate transfer device; and carrying the substrate by at least one hot plate device disposed on the transport path; And driving a liquid chemical device disposed on the conveying path to the substrate carried by the hot plate device, the liquid chemical device forming a closed space with the upper surface of the substrate, the closed space providing a chemical liquid to contact the upper surface of the substrate to generate a Chemical reaction; the substrate is heated by a hot plate device to accelerate the chemical reaction between the substrate and the chemical solution; the reciprocating obliquely oscillating hot plate device, the liquid chemical device and the substrate are within an angle range for uniformly aligning the upper surface of the substrate with the chemical solution reaction.

Therefore, the present invention can solve the above-mentioned drawbacks of the conventional technology, and not only reduce the amount of the chemical liquid used, but also increase the uniformity of the film thickness, and can also increase the productivity and yield of the substrate such as a solar cell.

100, 100A‧‧‧Substrate transfer and processing system

10, 10A‧‧‧ substrate transfer device

11, 11A‧‧‧ entrance end

12, 12A‧‧‧export end

13, 13A‧‧‧First cleaning device

14, 14A‧‧‧Second cleaning device

15A‧‧‧First conveyor

16A‧‧‧Second conveyor

20, 20A‧‧‧ hot plate device

30, 30A‧‧‧ liquid medicine device

31‧‧‧ Cover

311‧‧‧ first opening

312‧‧‧ second opening

313‧‧‧ third opening

32‧‧‧cover body fixture

33‧‧‧Enclosed space

40, 40A‧‧‧ tilting device

41‧‧‧ platform

42‧‧‧Fixed shaft

43‧‧‧ lifting device

50‧‧‧Substrate

60‧‧‧ liquid

70‧‧‧ film

L, LA‧‧‧ transport path

S10~S50‧‧‧Steps

Θ‧‧‧ angle

1 is a schematic view of a first embodiment of a substrate transfer and processing system of the present invention.

2 is a schematic view of a liquid chemical cap fixing mechanism of the substrate transfer and processing system of the present invention.

Figure 3 is a schematic view of the present invention in which the hot plate apparatus is tilted to remove the chemical liquid.

4 is a schematic view showing a second embodiment of the substrate transfer and processing system of the present invention.

FIG. 5 is a schematic flow chart of a substrate transfer and substrate processing method according to the present invention.

The embodiments of the present invention will be described in more detail below with reference to the drawings and the <RTIgt;

The invention relates to a substrate transfer and processing system and a substrate transfer and processing method, which can continuously input a plurality of substrates, and sequentially transfer a plurality of substrates onto a plurality of hot plate devices to perform film deposition on each substrate. After processing, the processed substrate is transferred and transferred, so that a plurality of substrates can be processed at the same time, and the throughput and manufacturing efficiency can be greatly increased due to continuous filming and simultaneous processing of a plurality of substrates.

Please refer to FIG. 1 for a schematic diagram of a first embodiment of a substrate transfer and processing system of the present invention, and a schematic diagram of a liquid chemical cap fixing mechanism of the substrate transfer and processing system of the present invention shown in FIG.

The substrate transfer and processing system 100 includes a substrate transfer device 10, a plurality of hot plate devices 20, a chemical solution device 30, and a tilt device 40. The substrate transfer and processing system 100 can be used to transfer and process a substrate 50, which can be at least one of an amorphous germanium substrate, a single crystal germanium substrate, a polycrystalline germanium substrate, a microcrystalline germanium substrate, or a gallium arsenide substrate.

The substrate transfer device 10 has a transport path L. The substrate transfer device 10 can be moved back and forth at both ends of the transport path L, and the substrate 50 can be picked up and transferred to move the substrate 50 on the transport path L. The form of the substrate transfer device 10 is not For example, a vacuum suction type robot arm can be used. An inlet end 11 and an outlet end 12 are respectively disposed at two ends of the conveying path L. The inlet end 11 provides the substrate 50 not in contact with the chemical liquid into the conveying path, and the outlet end 12 provides the substrate 50 for completing the chemical reaction by the conveying path. Diameter output. In this embodiment, a first cleaning device 13 is disposed at the inlet end 11, and a second cleaning device 14 is disposed at the outlet end 12. The substrate 50 has been washed and dried by the first cleaning device 13 when being transferred to the inlet end 11. Then, the substrate 50 is taken from the inlet end 11, and then the substrate 50 is transferred to any of the hot plate devices 20 for subsequent thin film deposition processing, and the substrate 50 on which the thin film has been deposited is taken back from the hot plate device 20, and then deposited. The substrate 50 from which the film is discharged is transferred to the outlet end 12, and the substrate 50 fed out from the outlet end 12 is cleaned and dried by the second cleaning device 14. Whether or not the first cleaning device 13 and the second cleaning device 14 are provided may be determined as needed.

The hot plate device 20 is disposed on the transport path L and is fixed to the tilt device 40. Each of the hot plate devices 20 can carry the substrate 50 transferred by the substrate transfer device 10, and each of the hot plate devices 20 can be heated to a predetermined temperature, and the substrate 50 is heated by the hot plate device 20 to make the substrate 50 and the liquid medicine 60. Accelerate the chemical reaction. The range area of the hot plate device 20 must be larger than the range area of the substrate 50. As shown in FIG. 1 , the present embodiment is provided with four hot plate devices 20 and arranged separately from each other. However, it should be noted that the number of configurations and the arrangement of the hot plate devices 20 are determined according to actual needs, and only The examples used are not intended to limit the scope of the invention.

The chemical solution device 30 is disposed on the transport path L and is disposed on the tilting device 40. The medical solution device 30 includes a cover 31, a cover fixing device 32, a chemical supply device, and a rinsing device (not shown).

The cover body 31 is transferred to the substrate 50 carried by the hot plate device 20 by the cover fixing device 32. The cover 31 is pressed against the substrate 50, and the cover 31 and the upper surface of the substrate 50 are formed together to form A structure of a closed space 33. The chemical supply device is used to inject the chemical solution 60 into the enclosed space 33. A rinsing device can be used to rinse the substrate 50 and the lid 31.

In this embodiment, the cover body 31 has a first opening 311, a second opening 312, and a third opening 313. The first opening 311 is disposed at the center of the cover 31 to allow the liquid medicine 60 to be injected into the closed space 33, and the second opening 312 and the third opening 313 are respectively disposed on opposite sides of the cover 31. The first opening 311 and the second opening 312 are respectively injected into the closed space 33 as the liquid medicine 60 and the liquid medicine 60 is discharged outside the closed space 33. The third opening 313 can be used to provide the flushing device to rinse the substrate 50 or the cover 31.

In addition, the first opening 311 may be provided in the cover 31, the liquid medicine 60 is supplied from the first opening 311 into the closed space 33, or the medical liquid 60 is discharged outside the closed space 33, or a flushing device is provided. The substrate 50 or the lid 31 is washed. Alternatively, the first opening 311 and the second opening 312 may be provided only in the lid body 31, and the first opening 311 and the second opening 312 are respectively injected into the closed space 33 as the liquid medicine 60 and the medicine liquid 60 is discharged. Outside the space 33, one of the first opening 311 and the second opening 312 is available for the flushing device to rinse the substrate 50 or the cover 31.

The chemical solution 60 is injected into the lid body 31 through the first opening 311 by the chemical solution supply device so that the upper surface of the substrate 50 can be uniformly covered by the chemical solution 60. After the chemical solution 60 is in contact with the upper surface of the substrate 50, a chemical reaction (such as chemical bath deposition) is generated between the chemical solution 60 and the upper surface of the substrate 50 to form a film 70 on the upper surface of the substrate 50. After the upper surface of the substrate 50 is covered with the chemical liquid 60, the hot plate device 20 can heat the substrate 50 to a predetermined temperature to accelerate the chemical reaction between the substrate 50 and the chemical solution 60.

The tilting device 40 includes a platform 41, a fixed rotating shaft 42 and a lifting device 43. The platform 41 is used to carry the hot plate device 20 and the liquid chemical device 30. The fixed rotating shaft 42 is disposed on one side of the bottom of the platform 41. The lifting device 43 is disposed at the bottom of the platform 41 with respect to one side on which the fixed rotating shaft 42 is provided. The lifting device 43 is fixed with the fixed rotating shaft 42 as a fulcrum When the reciprocating motion is performed, the hot plate device 20, the chemical solution device 30, and the substrate 50 can be tilted to an angle, or the hot plate device 20, the chemical solution device 30, and the substrate 50 can be returned from the inclined state to the horizontal state. The lifting device 43 can employ a pneumatic device or a hydraulic device.

Please refer to FIG. 3 for a schematic diagram of the invention for tilting the hot plate device to remove the liquid. When the lifting device 43 is moved up and down with the fixed rotating shaft 42 as a fulcrum, the hot plate device 20, the chemical solution device 30, and the substrate 50 can be tilted to an angle θ, and the chemical liquid 60 can be removed from the second opening 312. Then, the rinsing device rinses and dilutes the chemical solution 60 remaining on the substrate 50 through the third opening 313. After the substrate 50 is processed by the rinsing device, the cover fixing device 32 can move the cover 31 from the substrate 50 upward. The substrate transfer device 10 is removed from the substrate 50, and the substrate 50 is sent to the outlet end 12. The substrate 50 conveyed by the outlet end 12 can be cleaned and dried by the second cleaning device 14 before being sent to the lower portion. A process is processed.

Please refer to FIG. 4 for a schematic diagram of a second embodiment of the substrate transfer and processing system of the present invention. The substrate transfer and processing system 100A can be used to transfer and process a plurality of substrates 50 including a plurality of substrate transfer devices 10A, a plurality of hot plate devices 20A, a plurality of chemical liquid devices 30A, and a plurality of tilt devices 40A. It uses four sets of substrate transfer devices 10A, and the substrate transfer devices 10A are arranged side by side. Each substrate transfer device 10A has a transport path LA, and each substrate transfer device 10A can move back and forth at both ends of the transport path LA. And a substrate 50 can be picked up and transferred to move the substrate 50 on the transport path LA. Each substrate transfer device 10A includes an inlet end 11A and an outlet end 12A. The inlet end 11A provides the substrate 50 into the transport path LA. . At least one hot plate device 20A is disposed on each of the transport paths LA for carrying and heating the substrate; each of the substrate transfer devices 10A is correspondingly provided with a plurality of hot plate devices 20A, and the same hot plate device 20A is disposed along each of the substrates Transfer path of transfer device 10A LA is disposed below the transport path LA, and each of the hot plate devices 20A can carry the substrate 50 transferred from the substrate transfer device 10A.

A liquid chemical device 30A is disposed on each of the transport paths LA, and the liquid chemical device 30A is driven to move to the substrate 50 carried by the hot plate device 20A on the transport path LA disposed therein, and is disposed on each transport path LA. There is a tilting device 40A for tilting the hot plate device 20A, the liquid chemical device 30A and the substrate 50 on the transport path LA provided thereto to an angle. The functions of the hot plate device 20A, the chemical solution device 30A, and the tilting device 40A of the present embodiment for the substrate 50 are the same as those of the hot plate device 20, the chemical solution device 30, and the tilting device 40 shown in FIGS. 1 to 3 for the substrate 50, The liquid chemical device 30A and the upper surface of the substrate 50 can form a closed space to provide a chemical reaction between the injected chemical solution and the upper surface of the substrate 50, and the substrate 50 is heated by the hot plate device 20A to accelerate the substrate 50 and the chemical solution. The chemical reaction is carried out and will not be described here.

Further, a first transfer device 15A is connected between the inlet ends of the adjacent substrate transfer devices 10A so that the plurality of inlet ends are formed in series so that the substrate 50 can be transported from between the substrate transfer devices 10A. A second transfer device 16A is connected between the outlet ends of the adjacent substrate transfer devices to form a plurality of outlet ends in series. In this embodiment, one end of the plurality of inlet ends 11A connected in series is provided with a first cleaning device 13A for cleaning and drying the substrate 50 not in contact with the chemical liquid, and the substrate 50 is fed into the first cleaning device 13A. Adjacent inlet end 11A. One end of the plurality of outlet ends 12A connected in series is provided with a second cleaning device 14A, and the substrate 50 for performing the chemical reaction is sent out from the delivery path by the outlet end 14A, and the substrate 50 can be cleaned and dried by the second cleaning device 14A. Whether or not the first cleaning device 13A and the second cleaning device 14A are provided may be determined as needed.

Referring to FIG. 5, a schematic diagram of the process of the substrate transfer and processing method of the present invention, and 1 to 3: Step S10: moving the substrate 50 over the transport path L by the substrate transfer device 10.

Step S20: The substrate is carried by the hot plate device disposed on the transport path; preferably, the substrate 50 has been subjected to the washing and drying process of the first cleaning device 13 before being transferred to the hot plate device 20.

Step S30: driving the liquid chemical device 30 disposed on the transport path L to the substrate 50 carried by the hot plate device 20, the liquid chemical device 30 and the upper surface of the substrate 30 form a closed space 33, and the closed space 33 can provide the liquid medicine 60 is in contact with the upper surface of the substrate 50 to generate a chemical reaction for forming a film 70 on the upper surface of the substrate 50.

Step S40: The substrate 50 is heated by the hot plate device 20 to accelerate the chemical reaction between the substrate 50 and the chemical solution 60. The hot plate device 20 is heated to a predetermined temperature to accelerate the chemical reaction between the substrate 50 and the chemical solution 60.

Step S50: The reciprocating tilt 40 swing hot plate device 20, the liquid chemical device 30 and the substrate 50 are within an angle range for uniformly chemically reacting the upper surface of the substrate 50 with the chemical solution 60. After the film 70 is formed, the hot plate device 20 is tilted by the reciprocating tilt 40 to cause the liquid medicine 60 to flow out from the second opening 312, as shown in FIG. Then, the hot plate device 2 is returned to the horizontal state, and the lid body 31 is separated from above the substrate 50, so that the substrate 50 on the hot plate device 20 can be transferred out.

In summary, the substrate transfer and processing system of the present invention can continuously input a plurality of substrates, and if a plurality of substrate transfer devices are used, a continuous filming effect can be maintained for a longer period of time, thereby shortening the front and rear substrate projections. Interval.

And the substrate transfer device can transfer the plurality of substrates to different hot plate devices for thin film deposition processing, so that the opposite substrate can be simultaneously deposited, and the substrate transfer device transfers the substrate on which the thin film has been deposited to the output end. From this It is known that the present invention provides a continuous uninterrupted substrate transfer and processing substrate system and method, and can also be equipped with an idle hot plate device for use in experiments, maintenance or machine table modification, etc., not only to improve the utilization rate of the machine, but also to be specific Increase production capacity and production yield.

The above is only a preferred embodiment for explaining the present invention, and is not intended to limit the present invention in any way, and any modifications or alterations to the present invention made in the spirit of the same invention. All should still be included in the scope of the intention of the present invention.

100‧‧‧Substrate Transfer and Processing System

10‧‧‧Substrate transfer device

11‧‧‧ entrance end

12‧‧‧export end

13‧‧‧First cleaning device

14‧‧‧Second cleaning device

20‧‧‧ hot plate installation

30‧‧‧Drug device

31‧‧‧ Cover

32‧‧‧cover body fixture

50‧‧‧Substrate

L‧‧‧Transportation path

Claims (20)

A substrate transfer and processing system for transferring and processing a substrate, the substrate transfer and processing system comprising: a substrate transfer device for moving the substrate on a transport path; at least one hot plate device disposed on the transport a path for carrying and heating the substrate; a liquid chemical device disposed on the transport path, the liquid chemical device being driven to move to the substrate carried by the hot plate device, the liquid chemical device and the substrate Forming a closed space on the upper surface, providing a chemical solution in contact with the upper surface of the substrate to generate a chemical reaction; and tilting means for tilting the hot plate device, the liquid chemical device and the substrate to An angle; wherein the hot plate device heats the substrate to accelerate the chemical reaction between the substrate and the chemical solution. The substrate transfer and processing system of claim 1, wherein the substrate transfer device comprises: an inlet end for providing the substrate not in contact with the chemical solution to enter the transport path; and an outlet end for providing the The substrate of the chemical reaction is output by the transport path. The substrate transfer and processing system of claim 2, wherein the inlet end is provided with a first cleaning device for cleaning the substrate that is not in contact with the chemical solution. The substrate transfer and processing system of claim 2, wherein the A second cleaning device is provided at the mouth for cleaning the substrate fed from the outlet end. The substrate transfer and processing system of claim 1, wherein the tilting device comprises: a platform for carrying the hot plate device; a fixed rotating shaft disposed on one side of the bottom of the platform; and a lifting device The bottom of the platform is disposed at an angle with respect to one side of the fixed rotating shaft, and the lifting device reciprocates with the fixed rotating shaft as a fulcrum for tilting the hot plate device, the liquid chemical device and the substrate to an angle. The substrate transfer and processing system of claim 5, wherein the liquid medicine device is driven to tilt to an angle, the liquid medicine can be discharged from the liquid chemical device. The substrate transfer and processing system of claim 5, wherein the lifting device is a pneumatic device or a hydraulic device. The substrate transfer and processing system of claim 1, wherein the liquid chemical device comprises: a cover body; and a cover fixing device for transferring the cover body to the hot plate device The substrate is such that the cover forms a closed space with the upper surface of the substrate. The substrate transfer and processing system of claim 8, wherein the cover fixing device is provided with a chemical supply device for injecting the chemical into the closed space. The substrate transfer and processing system of claim 8, further comprising a rinsing device for rinsing the substrate and the cover. The substrate transfer and processing system according to claim 10, wherein the The cover body has a first opening for providing the liquid medicine to be injected into the closed space, or providing the liquid medicine to be discharged outside the closed space, or providing the flushing device to rinse the substrate or the cover body. The substrate transfer and processing system of claim 11, wherein the cover has a second opening, and the first opening and the second opening respectively serve as the liquid medicine to be injected into the closed space and The liquid medicine is discharged outside the closed space, and one of the first opening and the second opening is available for the flushing device to rinse the substrate or the cover. The substrate transfer and processing system of claim 12, wherein the cover has a third opening for providing the flushing device to rinse the substrate or the cover, the first opening and the second opening respectively The liquid medicine is injected into the closed space and the chemical liquid is supplied to be discharged outside the closed space. The substrate transfer and processing system of claim 13, wherein the first opening is disposed at a center of the cover body to inject the medical solution into the closed space, and the second opening and the third opening The openings are respectively disposed on opposite sides of the cover body. The substrate transfer and processing system according to claim 1, wherein the substrate is at least one of an amorphous germanium substrate, a single crystal germanium substrate, a polycrystalline germanium substrate, a microcrystalline germanium substrate, or a gallium arsenide substrate. The substrate transfer and processing system of claim 1, wherein the substrate transfer device is a vacuum adsorption robot. A substrate transfer and processing system for transferring and processing a plurality of substrates, the substrate transfer and processing system comprising: a plurality of substrate transfer devices, each of the substrate transfer devices having a transport path Each of the substrate transfer devices is configured to move at least one of the substrates on the transport path; each of the substrate transfer devices includes an inlet end and an outlet end, the inlet end providing the substrate to enter the transport path; a hot plate device, wherein at least one hot plate device is disposed on each of the transport paths for carrying and heating the substrate; and a plurality of liquid chemical devices are disposed on each of the transport paths, the liquid chemical device The liquid chemical device is driven to move to the substrate carried by the hot plate device disposed on the transport path, and the liquid chemical device forms a closed space with the upper surface of the substrate, and provides a liquid medicine in the closed space. Contacting the upper surface of the substrate to generate a chemical reaction; and a plurality of tilting means, each of the conveying paths is provided with the tilting means for tilting the hot plate means disposed on the conveying path, The liquid chemical device and the substrate are at an angle; wherein the hot plate device heats the substrate to accelerate the chemical reaction between the substrate and the chemical solution, and the substrate is completed by the chemical reaction The end is sent out of the conveying path; a first conveying device is connected between the inlet ends of the adjacent substrate transfer device, such that the plurality of inlet ends are connected in series, and adjacent to the substrate transfer device A second transfer device is connected between the outlet ends to connect the plurality of outlet ends in series. The substrate transfer and processing system of claim 17, wherein one of the plurality of inlet ends of the series is provided with a first cleaning device for cleaning the substrate not in contact with the chemical solution. The substrate transfer and processing system of claim 17, wherein one of the plurality of outlet ends of the series is provided with a second cleaning device for clearing The substrate that is fed out from the outlet end is washed. A substrate transfer and processing method, the method comprising: moving a substrate on a transport path by a substrate transfer device; carrying the substrate by at least one hot plate device disposed on the transport path; and driving a device disposed on the transport a liquid chemical device on the path to the substrate carried by the hot plate device, the liquid chemical device forming a closed space with the upper surface of the substrate, the closed space providing a chemical liquid to contact the upper surface of the substrate to generate a chemical reaction; heating the substrate by a hot plate device to accelerate the chemical reaction between the substrate and the chemical solution; and reciprocating the hot plate device, the liquid chemical device and the substrate within an angle range for The upper surface of the substrate is chemically reacted uniformly with the chemical solution.