TWI466333B - A method of manufacturing led - Google Patents
A method of manufacturing led Download PDFInfo
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- TWI466333B TWI466333B TW100147072A TW100147072A TWI466333B TW I466333 B TWI466333 B TW I466333B TW 100147072 A TW100147072 A TW 100147072A TW 100147072 A TW100147072 A TW 100147072A TW I466333 B TWI466333 B TW I466333B
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- light
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- emitting diode
- baffle
- manufacturing
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- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 239000000758 substrate Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 5
- 239000004033 plastic Substances 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 239000003822 epoxy resin Substances 0.000 claims description 2
- 229920000647 polyepoxide Polymers 0.000 claims description 2
- 239000000843 powder Substances 0.000 claims description 2
- 229920002379 silicone rubber Polymers 0.000 claims description 2
- 239000004945 silicone rubber Substances 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 238000003491 array Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 15
- 239000007789 gas Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000001788 irregular Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
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- Led Device Packages (AREA)
Description
本發明涉及半導體照明領域,尤指一種發光二極體製造方法。 The invention relates to the field of semiconductor illumination, in particular to a method for manufacturing a light-emitting diode.
作為一種新興光源,發光二極體憑藉其發光效率高、體積小、重量輕、環保等優點而被廣泛地應用到當前各個照明領域當中,大有取代傳統光源之趨勢。 As an emerging light source, the light-emitting diode is widely used in various current lighting fields due to its high luminous efficiency, small size, light weight, environmental protection, etc., and has a tendency to replace the traditional light source.
發光二極體通常包括基板、設於基板上的發光晶片及封裝於該發光晶片上的透明封裝體。該封裝體用於保護發光晶片及改變發光晶片的光場分佈。習知的該發光二極體的方法中,該封裝體係藉由在發光晶片上點膠,待膠液固化後形成。然而,這種封裝體的形成方法由於受點膠量不穩定及點膠後膠滴的形狀無法控制等諸多因素的影響,使得所形成的封裝體表面為不規整的凸狀結構,進而使所制得的發光二極體的色度圖(chromaticity diagram,CIE)分佈不一致,影響發光二極體的生產良率。 The light emitting diode generally includes a substrate, a light emitting chip disposed on the substrate, and a transparent package packaged on the light emitting wafer. The package is used to protect the light emitting wafer and to change the light field distribution of the light emitting wafer. In the conventional method of the LED, the encapsulation system is formed by dispensing on a light-emitting wafer and curing the glue. However, the method for forming such a package is affected by many factors such as the instability of the dispensing amount and the uncontrollable shape of the glue droplet after dispensing, so that the surface of the formed package is an irregular convex structure, thereby The chromaticity diagram (CIE) distribution of the obtained light-emitting diodes is inconsistent, which affects the production yield of the light-emitting diode.
有鑒於此,有必要提供一種可提高發光二極體的生產良率的發光二極體製造方法。 In view of the above, it is necessary to provide a method of manufacturing a light-emitting diode that can improve the production yield of a light-emitting diode.
一種發光二極體製造方法,包括以下步驟:提供一基板,於該基板上形成至少一對電極; 於該基板上設置至少一發光晶片,使該至少一發光晶片的兩極分別於該至少一對電極電連接;提供一擋板,該擋板上設有至少一凹槽,將該擋板安放於該基板上,使該至少一發光晶片收容於該至少一凹槽中,該擋板包圍於每一發光晶片周圍;於該至少一發光晶片上形成一封裝體,該封裝體的底部剛好收容於該至少一凹槽中,該封裝體的頂部凸出於該擋板的頂面;提供一電漿產生器,將該電漿產生器設置於該擋板的頂面的一側,該電漿產生器沿平行於該基板的方向向該封裝體凸出該擋板的頂部噴射電漿溶液,該電漿溶液對該封裝體的頂部進行幹蝕直至該封裝體的頂部形成平面狀的出光面。 A method for manufacturing a light emitting diode, comprising the steps of: providing a substrate, forming at least one pair of electrodes on the substrate; Providing at least one illuminating chip on the substrate, wherein the two poles of the at least one illuminating chip are respectively electrically connected to the at least one pair of electrodes; a baffle is provided, and the baffle is provided with at least one groove, and the baffle is placed on the baffle Disposing the at least one illuminating chip in the at least one recess, the baffle surrounding the illuminating wafer; forming a package on the at least one illuminating wafer, the bottom of the package being just received In the at least one recess, a top of the package protrudes from a top surface of the baffle; a plasma generator is provided, and the plasma generator is disposed on a side of the top surface of the baffle, the plasma The generator sprays a plasma solution to the top of the baffle in a direction parallel to the substrate, and the plasma solution dry-etches the top of the package until a top surface of the package forms a planar light-emitting surface. .
本發明中發光二極體製造方法中,該封裝體的底部由檔板的凹槽限定形狀從而與該凹槽的形狀相同,該封裝體的頂部採用電漿溶液幹蝕的方法進處理,以形成一平整的出光面,從而使所制得的發光二極體的封裝體均為統一規整的結構,避免了因封裝體的結構不規整而造成的發光二極體的色度圖分佈不一致,從而極大地提高了發光二極體的生產良率。 In the manufacturing method of the light-emitting diode of the present invention, the bottom of the package body is shaped by the groove of the baffle so as to be the same shape as the groove, and the top of the package body is treated by dry etching of the plasma solution to Forming a flat light-emitting surface, so that the package of the produced light-emitting diodes has a uniform structure, thereby avoiding the inconsistent distribution of the chromaticity diagram of the light-emitting diode due to the irregular structure of the package. Thereby, the production yield of the light-emitting diode is greatly improved.
100‧‧‧發光二極體 100‧‧‧Lighting diode
10‧‧‧基板 10‧‧‧Substrate
11‧‧‧電極 11‧‧‧Electrode
12‧‧‧發光晶片 12‧‧‧Lighting chip
13‧‧‧封裝體 13‧‧‧Package
131‧‧‧出光面 131‧‧‧Glossy surface
14‧‧‧通道 14‧‧‧ passage
20‧‧‧擋板 20‧‧ ‧Baffle
21‧‧‧凹槽 21‧‧‧ Groove
22‧‧‧頂面 22‧‧‧ top surface
30‧‧‧電漿產生器 30‧‧‧ Plasma generator
31‧‧‧電漿溶液 31‧‧‧Electrical slurry solution
圖1為本發明一實施例中的發光二極體製造方法的過程圖。 1 is a process diagram of a method of fabricating a light emitting diode according to an embodiment of the present invention.
圖2示出了圖1中的發光二極體製造方法的第一個步驟。 Fig. 2 shows the first step of the method of manufacturing the light-emitting diode of Fig. 1.
圖3示出了圖1中的發光二極體製造方法的第二個步驟。 FIG. 3 shows the second step of the method of fabricating the LED of FIG. 1.
圖4至圖5示出了圖1中的發光二極體製造方法的第三個步驟。 4 to 5 show the third step of the method of manufacturing the light emitting diode of Fig. 1.
圖6示出了圖1中的發光二極體製造方法的第四個步驟。 Fig. 6 shows the fourth step of the method of manufacturing the light-emitting diode of Fig. 1.
圖7至圖8示出了圖1中的發光二極體製造方法的第五個步驟。 7 to 8 show the fifth step of the method of manufacturing the light emitting diode of Fig. 1.
圖9示出了圖1中的發光二極體製造方法的第六個步驟。 Fig. 9 shows the sixth step of the method of manufacturing the light-emitting diode of Fig. 1.
圖10示出了圖1中的發光二極體製造方法的第七個步驟。 Fig. 10 shows the seventh step of the method of manufacturing the light-emitting diode of Fig. 1.
以下將結合附圖對本發明作進一步之詳細說明。 The invention will be further described in detail below with reference to the accompanying drawings.
請參閱圖1,所示為本發明一實施例中的發光二極體製造方法的各個步驟,該發光二極體製造方法主要包括S1-S7七個步驟,具體如下文所述。 Referring to FIG. 1 , various steps of a method for fabricating a light-emitting diode according to an embodiment of the present invention are shown. The method for manufacturing the light-emitting diode mainly includes seven steps S1-S7, as described in detail below.
步驟S1如圖2所示,提供一塊基板10,該基板10由塑膠或其他適合的材料所製成,其具有一呈平板狀的矩形構造,於該基板10上設置複數成對電極11。 Step S1 As shown in FIG. 2, a substrate 10 is provided which is made of plastic or other suitable material and has a rectangular structure in the form of a flat plate on which a plurality of pairs of electrodes 11 are disposed.
步驟S2如圖3所示,於該基板10上安裝複數發光晶片12,該等發光晶片12的材料可根據實際的發光需求進行選擇,比如發紅光的GaAsP,發黃光的InGaAlP,發藍光的GaN,發綠光的GaP等等。所述發光晶片12於該基板10上呈陣列排列,每一發光晶片12對應一對電極11,每一發光晶片12的正負極分別與對應的一對電極11電連接,本實施例中,該發光晶片12藉由倒裝方式使其正負極分別與對應的電極11電連接。習知技術中,共晶及打線的方式亦同樣適合本發明發光晶片的安裝。 Step S2 As shown in FIG. 3, a plurality of light-emitting chips 12 are mounted on the substrate 10. The materials of the light-emitting chips 12 can be selected according to actual light-emitting requirements, such as red-emitting GaAsP, yellow-emitting InGaAlP, and blue light. GaN, green light GaP, etc. The illuminating wafers 12 are arranged in an array on the substrate 10, and each of the illuminating wafers 12 corresponds to a pair of electrodes 11. The positive and negative electrodes of each illuminating wafer 12 are electrically connected to a corresponding pair of electrodes 11 respectively. In this embodiment, The light-emitting chip 12 is electrically connected to the corresponding electrode 11 by flip-chip bonding. In the prior art, the manner of eutectic and wire bonding is also suitable for the mounting of the luminescent wafer of the present invention.
步驟S3如圖4及圖5所示,提供一擋板20,該擋板20由塑膠或其他適合的材料所製成,其具有一呈平板狀的矩形構造,該擋板20上 設有複數凹槽21,所述凹槽均為矩形且呈陣列狀排列,每一凹槽21正對該基板10上的一發光晶片12,該凹槽21的尺寸大於該發光晶片12的尺寸。將該擋板20安裝於該基板10上,每一發光晶片12收容於對應的一凹槽21中,該擋板20包圍於每一發光晶片12周圍,使相鄰的發光晶片12相互間隔開來。 Step S3, as shown in FIG. 4 and FIG. 5, provides a baffle 20 made of plastic or other suitable material having a rectangular structure in the form of a flat plate. A plurality of grooves 21 are formed, and the grooves are rectangular and arranged in an array. Each groove 21 is opposite to an illuminating wafer 12 on the substrate 10. The size of the groove 21 is larger than the size of the luminescent wafer 12. . The baffle 20 is mounted on the substrate 10, and each of the illuminating wafers 12 is received in a corresponding recess 21, and the baffle 20 surrounds each of the illuminating wafers 12, so that adjacent illuminating wafers 12 are spaced apart from each other. Come.
步驟S4如圖6所示,於每一發光晶片12上形成一封裝體13,該封裝體13為環氧樹脂或矽膠,亦可同時於該封裝體中摻入螢光粉,此時該封裝體13相對於該基板10的高度大於該擋板20的厚度,該封裝體13的底部剛好收容於該擋板20的凹槽21中,頂部凸出於該擋板20的上表面,本實施例中,該封裝體13藉由點膠的方式形成,該封裝體13的頂部為一凸狀面。 Step S4, as shown in FIG. 6, a package body 13 is formed on each of the light-emitting chips 12. The package body 13 is made of epoxy resin or silicone rubber, and the phosphor powder may be simultaneously incorporated into the package body. The height of the body 13 relative to the substrate 10 is greater than the thickness of the baffle 20, and the bottom of the package body 13 is just received in the recess 21 of the baffle 20, and the top portion protrudes from the upper surface of the baffle 20, this embodiment In the example, the package body 13 is formed by dispensing, and the top of the package body 13 is a convex surface.
步驟S5如圖7及圖8所示,提供一電漿產生器30對該封裝體13的頂部進行幹蝕。該電漿產生器30的工作原理係以壓縮氣體為工作氣體,以高溫高速的電漿溶液為熱源將該封裝體13的頂部熔化,同時用高速氣流將已熔化的部分吹走,從而在該封裝體13的頂部形成光潔出光面131。本實施例中,該工作氣體為空氣,實際應用時,可以根據該封裝體13的具體材質選擇工作氣體為氬、氫、氮、氧及其混合氣體等。 Step S5, as shown in FIGS. 7 and 8, provides a plasma generator 30 for dry etching the top of the package 13. The working principle of the plasma generator 30 is to use a compressed gas as a working gas, and to melt the top of the package 13 with a high-temperature and high-speed plasma solution as a heat source, while blowing the melted portion with a high-speed air stream, thereby The top of the package 13 forms a smooth light exit surface 131. In this embodiment, the working gas is air. In practical applications, the working gas may be selected from the specific materials of the package 13 as argon, hydrogen, nitrogen, oxygen, a mixed gas thereof, and the like.
該電漿產生器30設置於該擋板20的頂面22的一側且位於其一側邊的外側,該電漿產生器30沿平行於該基板10的方向向該封裝體13凸出該擋板20的頂部噴射電漿溶液31,該電漿溶液對該封裝體13的頂部進行幹蝕直至該封裝體13的頂部形成平面狀的出光面131。 The plasma generator 30 is disposed on one side of the top surface 22 of the baffle 20 and on the outer side of one side thereof, and the plasma generator 30 protrudes toward the package 13 in a direction parallel to the substrate 10. The top of the baffle 20 ejects a plasma solution 31 which dry-etches the top of the package 13 until a top surface of the package 13 forms a planar light-emitting surface 131.
步驟S6如圖9所示,將該擋板20從該基板10上移除,該擋板20移 除後,相鄰的封裝體13之間形成相互貫通的通道14。 Step S6, as shown in FIG. 9, the baffle 20 is removed from the substrate 10, and the baffle 20 is moved. After the separation, adjacent channels 13 form mutually intersecting channels 14.
步驟S7如圖10所示,沿相鄰兩封裝體13之間的通道14對該基板10進行切割,使其分成多個獨立的發光二極體100。 Step S7 As shown in FIG. 10, the substrate 10 is cut along the channel 14 between the adjacent two packages 13 to be divided into a plurality of independent light-emitting diodes 100.
上述發光二極體製造方法中,該封裝體13的底部由擋板20的凹槽21限定形狀從而與該凹槽21的形狀相同,該封裝體13的頂部採用電漿溶液幹蝕的方法進處理,以形成一平整的出光面131,從而使所制得的發光二極體100的封裝體13均為統一規整的結構,避免了因封裝體13的結構不規整而造成的發光二極體100的色度圖分佈不一致,從而極大地提高了發光二極體100的生產良率。 In the above method for manufacturing the light-emitting diode, the bottom of the package body 13 is shaped by the groove 21 of the baffle 20 so as to be the same shape as the groove 21, and the top of the package body 13 is dry-etched by a plasma solution. The processing is performed to form a flat light-emitting surface 131, so that the package 13 of the obtained light-emitting diode 100 is uniformly structured, and the light-emitting diode caused by the irregular structure of the package 13 is avoided. The chromaticity diagram distribution of 100 is inconsistent, thereby greatly improving the production yield of the light-emitting diode 100.
另外,本領域技術人員還可在本發明精神內做其他變化,當然,該等依據本發明精神所做之變化,都應包含在本發明所要求保護之範圍之內。 In addition, those skilled in the art can make other changes in the spirit of the present invention. Of course, such changes in accordance with the spirit of the present invention should be included in the scope of the present invention.
Claims (10)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110423658XA CN103165765A (en) | 2011-12-17 | 2011-12-17 | Light-emitting diode manufacturing method |
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| TW201327921A TW201327921A (en) | 2013-07-01 |
| TWI466333B true TWI466333B (en) | 2014-12-21 |
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| CN104425672A (en) * | 2013-08-23 | 2015-03-18 | 展晶科技(深圳)有限公司 | Method for manufacturing light emitting diode |
| CN115663096A (en) * | 2022-11-03 | 2023-01-31 | 深圳市中美欧光电科技有限公司 | CSP technology and packaging structure of a five-sided light-emitting product |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1065219A (en) * | 1996-08-15 | 1998-03-06 | Nippon Retsuku Kk | Optoelectronic component manufacturing method |
| TW552724B (en) * | 2001-06-11 | 2003-09-11 | Lumileds Lighting Llc | Phosphor-converted light emitting device |
| EP1659641A1 (en) * | 2004-11-23 | 2006-05-24 | Centro Ricerche Plast-Optica S.r.l. | Process for manufacturing light emitting devices and device thereof |
| US20090236686A1 (en) * | 2006-04-19 | 2009-09-24 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming UBM Fixed Relative to Interconnect Structure for Alignment of Semiconductor Die |
| US20110062482A1 (en) * | 2010-01-20 | 2011-03-17 | Bridgelux, Inc. | Apparatus And Method For Enhancing Connectability In LED Array Using Metal Traces |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3819574B2 (en) * | 1997-12-25 | 2006-09-13 | 三洋電機株式会社 | Manufacturing method of semiconductor device |
| KR100621154B1 (en) * | 2005-08-26 | 2006-09-07 | 서울반도체 주식회사 | Light emitting diode manufacturing method |
| KR100877221B1 (en) * | 2007-03-12 | 2009-01-09 | (주) 아모엘이디 | Manufacturing method of semiconductor package |
| CN101550334A (en) * | 2009-05-12 | 2009-10-07 | 奇瑞汽车股份有限公司 | Fluorescent powder coating method of white light-emitting diode |
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2011
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1065219A (en) * | 1996-08-15 | 1998-03-06 | Nippon Retsuku Kk | Optoelectronic component manufacturing method |
| TW552724B (en) * | 2001-06-11 | 2003-09-11 | Lumileds Lighting Llc | Phosphor-converted light emitting device |
| EP1659641A1 (en) * | 2004-11-23 | 2006-05-24 | Centro Ricerche Plast-Optica S.r.l. | Process for manufacturing light emitting devices and device thereof |
| US20090236686A1 (en) * | 2006-04-19 | 2009-09-24 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming UBM Fixed Relative to Interconnect Structure for Alignment of Semiconductor Die |
| US20110062482A1 (en) * | 2010-01-20 | 2011-03-17 | Bridgelux, Inc. | Apparatus And Method For Enhancing Connectability In LED Array Using Metal Traces |
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| TW201327921A (en) | 2013-07-01 |
| CN103165765A (en) | 2013-06-19 |
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