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TWI460743B - Image display system employing a touch panel and method for fabricating the touch panel - Google Patents

Image display system employing a touch panel and method for fabricating the touch panel Download PDF

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TWI460743B
TWI460743B TW101101197A TW101101197A TWI460743B TW I460743 B TWI460743 B TW I460743B TW 101101197 A TW101101197 A TW 101101197A TW 101101197 A TW101101197 A TW 101101197A TW I460743 B TWI460743 B TW I460743B
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touch panel
sensing
image display
decorative layer
display system
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TW101101197A
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Chinese (zh)
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TW201330016A (en
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Wen Chi Chen
Chia Lung Lin
Yu Cheng Lin
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Innolux Corp
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Description

包含觸控面板之影像顯示系統及觸控面板之製造方法Image display system including touch panel and manufacturing method of touch panel

本發明係有關於一種影像顯示系統,特別是關於一種具有觸控面板的影像顯示系統。The present invention relates to an image display system, and more particularly to an image display system having a touch panel.

觸控板目前已被廣泛應在行動電話手機、數位相機以及衛星導航器等一般的消費性電子商品上,用以改善使用介面,提升輸入效率;通常,觸控板是透明的且被配置於這些電子商品的顯示幕前使用,讓使用者可依據顯示幕上指示訊息以進行互動式輸入操作,進而大幅改善人與機器之間溝通介面的親善性。The touchpad has been widely used in general consumer electronic products such as mobile phone handsets, digital cameras and satellite navigators to improve the user interface and improve input efficiency; usually, the touchpad is transparent and configured The display of these electronic products is used in front of the display, so that the user can perform interactive input operations according to the indication information on the display screen, thereby greatly improving the goodwill of the communication interface between the human and the machine.

典型的觸控板構造係在觸控板的四周緣部位設置裝飾層,用來完全遮蔽周緣部位的訊號導線,以達保護訊號導線及美化版面的效果。在以往,裝飾層一般係利用油墨或有機色阻材料以印刷或微影蝕刻方式來形成。然而,由於油墨(包含有機染料)或有機色阻材料所形成的裝飾層對溫度的耐受性較差,在高溫的狀態下(約200℃以上)變得較不穩定(易使得裝飾層變形),甚至會受熱分解。因此,為避免對有機材料構成之裝飾層造成破壞,必需限定後續製程的最高製程溫度,這使得後續形成於觸控板表面之ITO(氧化銦鍚)導電膜的成膜溫度受到限制。然而,當ITO導電膜的成膜溫度愈低,則所得之ITO導電膜的電阻值就愈高,舉例如說,在200℃下成膜之ITO導電膜其電阻即為在400℃下成膜之ITO導電膜電阻值兩倍以上(請參照論文”Properties of Co-deposited indium tin oxide and zinc oxide films using a bipolar pulse power supply and a dual magnetron sputter source”,J. Vac. Sci. Technol. A21(2003) 1399-1403,Man-Soo Hwang)。此外,即使發展出對溫度耐受性較高的油墨或有機色阻材料,由於以高溫形成的ITO導電膜需以高腐蝕性藥劑(例如王水)進行蝕刻來達到圖形化,而有機材料抗腐蝕能力較差,使得有機材料裝飾層同時遭破壞。A typical touchpad structure is provided with a decorative layer on the peripheral edge of the touchpad for completely shielding the signal wires of the peripheral portion to protect the signal wires and beautify the layout. In the past, the decorative layer was generally formed by printing or lithographic etching using an ink or an organic color resist material. However, since the decorative layer formed by the ink (including the organic dye) or the organic color resist material is poor in temperature resistance, it becomes unstable at a high temperature (about 200 ° C or more) (it is easy to deform the decorative layer) It will even be decomposed by heat. Therefore, in order to avoid damage to the decorative layer composed of the organic material, it is necessary to define the highest process temperature of the subsequent process, which limits the film formation temperature of the ITO (Indium Oxide) conductive film which is subsequently formed on the surface of the touch panel. However, the lower the film formation temperature of the ITO conductive film, the higher the resistance value of the obtained ITO conductive film. For example, the ITO conductive film formed at 200 ° C has a resistance of film formation at 400 ° C. ITO conductive film resistance value is more than twice (refer to the paper "Properties of Co-deposited indium tin oxide and zinc oxide films using a bipolar pulse power supply and a dual magnetron sputter source", J. Vac. Sci. Technol. A21 ( 2003) 1399-1403, Man-Soo Hwang). In addition, even if an ink or an organic color resist material having high temperature resistance is developed, the ITO conductive film formed at a high temperature needs to be etched with a highly corrosive agent (for example, aqua regia) to achieve patterning, and the organic material is resistant. Corrosion ability is poor, so that the decorative layer of organic materials is destroyed at the same time.

雖然業界有提出在低溫下(例如室溫)形成ITO導電膜後,再以一退火製程使ITO導電膜結晶化來降低電阻值的方法,不過該方法所使用之退火製程的溫度同樣亦不能太高(避免影響到有機材料裝飾層)。此外,利用該製程所得之ITO導電膜其表面均勻性較差(舉例如說:在室溫下成膜並在220℃下退火之ITO導電膜其U%(均勻性;uniform percentage)大於30%;而在230℃下成膜的ITO導電膜其U%約為12%),而較差的ITO導電膜均勻性將使得觸控板各處表現出不同的觸控靈敏度,降低產品良率。Although the industry has proposed to form an ITO conductive film at a low temperature (for example, room temperature), and then crystallization of the ITO conductive film by an annealing process to reduce the resistance value, the annealing process used in the method may not be too temperature. High (avoid to affect the decorative layer of organic materials). In addition, the ITO conductive film obtained by the process has poor surface uniformity (for example, an ITO conductive film formed at room temperature and annealed at 220 ° C has a U% (uniform percentage) greater than 30%; The ITO conductive film formed at 230 ° C has a U% of about 12%, and the poor uniformity of the ITO conductive film will cause different touch sensitivity and reduce the yield of the touch panel.

為避免上述有機材料裝飾層所造成的問題,一作法係使用鉻酸鹽黑矩陣(black matrix)材料來形成裝飾層。雖然鉻酸鹽具有高的溫度耐受性及抗腐蝕性,然而鉻酸鹽的價格昂貴,會造成觸控面板的成本上昇,且鉻會造成重金屬污染,因此目前平面顯示器業界已不使用此種材料。In order to avoid the problems caused by the above-mentioned decorative layer of the organic material, a method uses a chromate black matrix material to form a decorative layer. Although chromate has high temperature resistance and corrosion resistance, the price of chromate is expensive, which causes the cost of the touch panel to rise, and chromium causes heavy metal pollution. Therefore, the flat panel display industry does not use this. material.

另一方面,由於觸控面板之便利性以及實用性,使得除小尺寸的攜帶型電子產品外,大尺寸平面顯示器對於觸控功能的需求且日漸增加。當平面顯示器的面積增加,觸控面板整體ITO導電膜面積也會增加,如果所使用的ITO導電膜具有較大的阻值及較差的均勻性,會使得阻容負載(RC loading)增大,當觸控面板各區域之ITO導電膜阻容負載差異過大時,會造成觸控面板IC對於訊號不易判讀,對觸控面板的靈敏度造成影響。傳統觸控面板為避免上述阻容負載差異過大的問題,會增加觸控面板的IC數目,或是改變電路設計,不過,如此一來會使得製程成本增加,並提高製程複雜度。On the other hand, due to the convenience and practicality of the touch panel, in addition to small-sized portable electronic products, the demand for touch functions of large-sized flat-panel displays is increasing. When the area of the flat panel display increases, the area of the ITO conductive film of the touch panel as a whole increases. If the ITO conductive film used has a large resistance value and poor uniformity, the RC loading is increased. When the ITO conductive film's resistance load difference is too large in each area of the touch panel, the touch panel IC is difficult to interpret the signal and affects the sensitivity of the touch panel. In order to avoid the problem that the above-mentioned resistance load difference is too large, the conventional touch panel may increase the number of ICs of the touch panel or change the circuit design. However, this will increase the process cost and increase the process complexity.

基於上述,改善大尺寸觸控面板因ITO導電膜阻值及均勻性不佳所造成的問題,是目前薄膜電晶體液晶顯示器製程中一個非常重要的課題之一。Based on the above, improving the problem caused by the poor resistance and uniformity of the ITO conductive film of the large-sized touch panel is one of the most important topics in the current process of the thin film transistor liquid crystal display.

有鑑於此,本發明提供一種具有觸控面板之影像顯示系統,其中該觸控面板包含一無機色釉層作為裝飾層,藉由該無機色釉層之高溫度耐受性及高抗腐蝕性,可使得後續形成之透明導電層可在較高的成膜溫度下形成,改善透明導電層之導電性及均勻性,可避免大尺寸觸控面板各區域之阻容負載差異過大。In view of the above, the present invention provides an image display system having a touch panel, wherein the touch panel comprises an inorganic glaze layer as a decorative layer, and the inorganic glaze layer has high temperature resistance and high corrosion resistance. The transparent conductive layer formed later can be formed at a higher film forming temperature, improving the conductivity and uniformity of the transparent conductive layer, and avoiding excessive difference in the resistance load of each area of the large-sized touch panel.

該影像顯示系統包括一觸控面板,而該觸控面板包括:一基板,其中一透明基板,具有一感應區及圍繞該感應區之一週邊區;一裝飾層設置於該週邊區內,其中該裝飾層係為一無機色釉層;以及,一感測單元,設置於該感應區內。其中,該感測單元包括複數個排列成行的第一感測電極及複數個排列成列的第二感測電極,且該些第一感測電極互相分開,該些第二感測電極互相連接;一跨接線,電性連接任兩個相鄰的該些第一感測電極;以及,一介電層,設置於該第二感測電極與該跨接線之間。此外,該觸控面板更包含一保護層,覆蓋於該感測單元之上。The image display system includes a touch panel, and the touch panel includes: a substrate, wherein a transparent substrate has a sensing area and a peripheral area surrounding the sensing area; a decorative layer is disposed in the peripheral area, wherein The decorative layer is an inorganic glaze layer; and a sensing unit is disposed in the sensing area. The sensing unit includes a plurality of first sensing electrodes arranged in a row and a plurality of second sensing electrodes arranged in a row, and the first sensing electrodes are separated from each other, and the second sensing electrodes are connected to each other. a jumper wire electrically connecting any two adjacent first sensing electrodes; and a dielectric layer disposed between the second sensing electrode and the jumper wire. In addition, the touch panel further includes a protective layer covering the sensing unit.

根據本發明一實施例,該影像顯示系統更包括一顯示面板,具有一影像顯示面,其中該觸控面板直接配置於該顯示面板之影像顯示面上;以及一控制單元,與該顯示面板耦接,其中該控制單元接收觸控面板產生的一第一訊號,並傳輸一第二訊號至該顯示面板,以使該顯示面板顯示一影像。According to an embodiment of the present invention, the image display system further includes a display panel having an image display surface, wherein the touch panel is directly disposed on the image display surface of the display panel, and a control unit coupled to the display panel The control unit receives a first signal generated by the touch panel and transmits a second signal to the display panel to cause the display panel to display an image.

本發明亦提供上述觸控面板之製造方法,包括:提供一透明基板,其中該透明基板具有一感應區及圍繞該感應區之一週邊區;形成一裝飾層於該週邊區內,其中該裝飾層係為一無機色釉層;以及,形成一感測單元於該感應區內。其中該感測單元的製程包含:形成複數個排列成行的第一感測電極,其中該些第一感測電極互相分開;形成複數個排列成列的第二感測電極,其中該些第二感測電極互相連接;形成一介電層於任兩相鄰的該些第一感測電極之間;以及,形成一跨接線,電性連接任兩相鄰的該些第一感測電極,並以該介電層與該第二感測電極相隔。The present invention also provides a method for manufacturing the touch panel, comprising: providing a transparent substrate, wherein the transparent substrate has a sensing area and a peripheral area surrounding the sensing area; forming a decorative layer in the peripheral area, wherein the decoration The layer is an inorganic glaze layer; and a sensing unit is formed in the sensing region. The process of the sensing unit includes: forming a plurality of first sensing electrodes arranged in a row, wherein the first sensing electrodes are separated from each other; forming a plurality of second sensing electrodes arranged in columns, wherein the second The sensing electrodes are connected to each other; a dielectric layer is formed between any two adjacent first sensing electrodes; and a jumper wire is formed to electrically connect any two adjacent first sensing electrodes. The dielectric layer is spaced apart from the second sensing electrode.

為使本發明之上述目的、特徵能更明顯易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下:In order to make the above objects and features of the present invention more comprehensible, the following detailed description of the preferred embodiments and the accompanying drawings

參照第1圖,其顯示本發明一實施例的觸控面板之上視圖。觸控面板50,例如可為一電容式觸控裝置,具有一透明基板10,該透明基板10可分為一感應區14及圍繞該感應區14之一週邊區12。一裝飾層22設置於該週邊區12內(例如填滿整個週邊區12),若由上視之角度觀之,其可為第1圖中所示之環形。該透明基板10可為一玻璃基板,較佳係為一強化玻璃基板,並具有一應變點(strain point)。值得注意的是,本發明為使後續所形成之透明導電層具有較高的成膜溫度,在此所使用作為裝飾層22的材質係為一無機色釉層,利用該無機色釉層其高的溫度耐受性(高於600℃)及抗腐蝕性,可允許後續製程使用超過250℃的溫度來形成具有高度結晶化的透明導電層(較佳為300℃以上),並能承受用來圖形化高度結晶透明導電層之高腐蝕性藥劑(例如王水)。根據本發明一實施例,該無機色釉層係將一無機色釉組合物形成於該透明基板10之週邊區12上,並經一燒結製程所製備而成。在此,該燒結製程的溫度可維持在500-660℃的範圍內,以使得該無機色釉組合物熔化,而部分熔化的色釉可進一步擴散滲透到玻璃表面,如此一來可避免因為裝飾層厚度太厚,造成後續形成之透明導電層需要爬坡的問題,而且當色釉散滲透到玻璃表面時,可增加與玻璃貼附性,故該裝飾層不易脫落且耐刮。此外,該燒結製程的製程溫度需低於該玻璃基板的應變點(strain point),確保該玻璃基板在燒結製程時,玻璃表面頂多開始軟化(幫助色釉滲透進入玻璃)但不會變形。該無機色釉組合物可包含一陶瓷材料、以及一著色劑。該陶瓷材料可包含氧化物、碳化物、氮化物、或其組合,例如氧化鈦、氧化鋁、氮化鈦、氮化鋁、碳化鈦、氮化鋁鈦、氮化鈦、或其組合,而著色劑可包含金屬氧化物、或碳黑。舉例來說,若所欲形成的裝飾層顏色為黑色,所使用的著色劑可為碳黑;欲形成的顏色為綠色,所使用的著色劑可為氧化銅;欲形成的顏色為赭黃色,所使用的著色劑可為氧化鐵;欲形成的顏色為紫色,所使用的著色劑可為氧化錳;欲形成的顏色為藍色,所使用的著色劑可為氧化鈷;欲形成的顏色為淺黃色,所使用的著色劑可為氧化銻;而欲形成的顏色為白色,所使用的著色劑可為氧化鋇。此外,為調整該無機色釉組合物的燒結溫度,可進一步添加一助熔劑(可為鹼金屬之氧化物,例如:矽氟化鈉(Na2 SiF6 )、冰晶石(Na4A lF6 )、硝酸鹼(鹼金屬));為使無機色釉組合物可短暫附著於玻璃表面,可進一步包含一黏著劑(例如:丙烯酸酯)。Referring to Fig. 1, there is shown a top view of a touch panel in accordance with an embodiment of the present invention. The touch panel 50 can be, for example, a capacitive touch device having a transparent substrate 10 , and the transparent substrate 10 can be divided into a sensing area 14 and a peripheral area 12 surrounding the sensing area 14 . A decorative layer 22 is disposed within the peripheral region 12 (e.g., fills the entire peripheral region 12), which may be annular as shown in Figure 1 from the perspective of the top view. The transparent substrate 10 can be a glass substrate, preferably a tempered glass substrate, and has a strain point. It should be noted that, in order to make the transparent conductive layer formed later have a higher film forming temperature, the material used as the decorative layer 22 is an inorganic glaze layer, and the inorganic glaze layer is high. Temperature resistance (higher than 600 ° C) and corrosion resistance, allowing subsequent processes to use a temperature of more than 250 ° C to form a highly crystalline transparent conductive layer (preferably above 300 ° C), and can withstand A highly corrosive agent (such as aqua regia) that graphically crystallizes a transparent conductive layer. According to an embodiment of the invention, the inorganic glaze layer is formed on the peripheral region 12 of the transparent substrate 10 by an inorganic glaze composition and is prepared through a sintering process. Here, the temperature of the sintering process can be maintained in the range of 500-660 ° C, so that the inorganic glaze composition is melted, and the partially melted glaze can further diffuse and penetrate into the glass surface, thereby avoiding decoration The thickness of the layer is too thick, causing the problem that the subsequently formed transparent conductive layer needs to climb, and when the colored glaze penetrates into the surface of the glass, the adhesion to the glass can be increased, so that the decorative layer is not easily peeled off and scratch resistant. In addition, the process temperature of the sintering process needs to be lower than the strain point of the glass substrate, ensuring that the glass substrate begins to soften at the beginning of the sintering process (helping the color glaze penetrate into the glass) without deformation. The inorganic glaze composition can comprise a ceramic material and a colorant. The ceramic material may comprise an oxide, a carbide, a nitride, or a combination thereof, such as titanium oxide, aluminum oxide, titanium nitride, aluminum nitride, titanium carbide, titanium aluminum nitride, titanium nitride, or combinations thereof. The colorant may comprise a metal oxide, or carbon black. For example, if the color of the decorative layer to be formed is black, the coloring agent used may be carbon black; the color to be formed is green, the coloring agent used may be copper oxide; the color to be formed is yellowish yellow. The coloring agent used may be iron oxide; the color to be formed is purple, the coloring agent used may be manganese oxide; the color to be formed is blue, and the coloring agent used may be cobalt oxide; the color to be formed is Light yellow, the coloring agent used may be cerium oxide; the color to be formed is white, and the coloring agent used may be cerium oxide. Further, in order to adjust the sintering temperature of the inorganic glaze composition, a flux (which may be an alkali metal oxide such as sodium argon fluoride (Na 2 SiF 6 ), cryolite (Na 4A lF 6 ), or the like) may be further added. The alkali nitrate (alkali metal)) may further comprise an adhesive (for example, an acrylate) for allowing the inorganic glaze composition to be temporarily attached to the surface of the glass.

仍請參照第1圖,一感測單元30配置於該透明基板10之感應區14內,該感測單元30包含圖形化的透明導電層16、跨接線20、及介電層18。其中,該透明導電層16包含複數個排列成行的第一感測電極16Y、以及複數個排列成列的第二感測電極16X。這些排列成行的第一感測電極16Y係互相分開,而排列成列的第二感測電極16X係相互連接,且任兩相鄰之第一感測電極16Y係藉由跨接線20(例如為一金屬層)電性連接。該介電層18係用來避免該第二感測電極16X與該跨接線20電性連結。該透明導電層16之材質可包含銦錫氧化物(ITO)、銦鋅氧化物(IZO)、鋅鋁氧化物(AZO)、氧化鋅(ZnO)、或其組合。值得注意的是,為使該第一感測電極16Y及第二感測電極具有較低之電阻值及較高的均勻性,該透明導電層16的成膜溫度必需大於250℃,成膜方式可為濺鍍、電子束蒸鍍、熱蒸鍍、或是化學氣相沉積。信號傳送線24設置於裝飾層22之上,並可延伸至第一感測電極16Y、以及第二感測電極16X上與其相連接。Still referring to FIG. 1 , a sensing unit 30 is disposed in the sensing region 14 of the transparent substrate 10 . The sensing unit 30 includes a patterned transparent conductive layer 16 , a jumper 20 , and a dielectric layer 18 . The transparent conductive layer 16 includes a plurality of first sensing electrodes 16Y arranged in a row, and a plurality of second sensing electrodes 16X arranged in a row. The first sensing electrodes 16Y arranged in a row are separated from each other, and the second sensing electrodes 16X arranged in a row are connected to each other, and any two adjacent first sensing electrodes 16Y are connected by a jumper 20 (for example, A metal layer) is electrically connected. The dielectric layer 18 is used to prevent the second sensing electrode 16X from being electrically connected to the jumper wire 20 . The material of the transparent conductive layer 16 may include indium tin oxide (ITO), indium zinc oxide (IZO), zinc aluminum oxide (AZO), zinc oxide (ZnO), or a combination thereof. It should be noted that in order to make the first sensing electrode 16Y and the second sensing electrode have a lower resistance value and higher uniformity, the film forming temperature of the transparent conductive layer 16 must be greater than 250 ° C, and the film forming method is adopted. It can be sputtering, electron beam evaporation, thermal evaporation, or chemical vapor deposition. The signal transmission line 24 is disposed on the decorative layer 22 and is extendable to the first sensing electrode 16Y and the second sensing electrode 16X.

值得注意的是,本發明所述之觸控面板50,與傳統雙基板貼合型的觸控面板不同,僅包含一透明基板10,且所有元件皆形成於該透明基板之上,可降低整體觸控面板50厚度及降低製程步驟及成本。本發明所述之觸控面板可進一步配置於一顯示面板(未圖示)之影像顯示面上,而該顯示面板可與一控制單元(未圖示)耦接。觸控面板之第一感測電極16Y及第二感測電極16X可將感應得到的電性變化傳送至一控制單元以進行觸控信號的計算,並且將觸控信號傳送至顯示面板,使得顯示面板依據觸控信號顯示影像。It should be noted that the touch panel 50 of the present invention is different from the conventional two-substrate bonding type touch panel, and only includes a transparent substrate 10, and all components are formed on the transparent substrate to reduce the overall The thickness of the touch panel 50 is reduced and the process steps and costs are reduced. The touch panel of the present invention can be further disposed on an image display surface of a display panel (not shown), and the display panel can be coupled to a control unit (not shown). The first sensing electrode 16Y and the second sensing electrode 16X of the touch panel can transmit the induced electrical changes to a control unit to perform calculation of the touch signal, and transmit the touch signal to the display panel to display The panel displays images according to the touch signal.

參見第2圖,係將上述觸控面板50進一步與一顯示面板40組裝形成一影像顯示系統100,沿著第1圖剖面線Y-Y’所得之剖面示意圖。顯示面板40可例如為液晶顯示面板、有機發光二極體面板、或其他顯示元件,觸控面板50可藉由黏著層(未繪示)貼附於示面板40之顯示面之上。觸控面板50之透明基板10具有感應區14及週邊區12,裝飾層(無機色釉層)22配置於週邊區12,第一感測電極16Y與第二感測電極16X係形成於該透明基板10之感應區14上,介電層18係包含該第二感測電極16X,以避免第二感測電極16X與跨接線20電性接觸。跨接線20係形成於該介電層18之上,用以電性連結該分隔之第一感測電極16Y。信號傳送線24設置於裝飾層22之上,並可延伸至第一感測電極16Y上與其相連接,該信號傳送線24可與該跨接線20以同樣材質(導電金屬)並在同一步驟中形成。值得注意的是,除了週邊區12外,裝飾層22也亦可配置於感應區14,用以作為設計圖案(例如:鍵盤等功能鍵圖案),請參照第3圖。舉例來說,該裝飾層22可包含一第一裝飾層22a配置於週邊區12內,以及一第二裝飾層22b配置於感應區14內。此外,配置於週邊區12及感應區14之第一裝飾層22a及第二裝飾層22b係由相同材料並在同一製程所形成,再形成感測電極於裝飾層上。此外,該觸控面板50可包含一保護層26全面性地覆蓋設置於透明基板10上的所有元件,以保護上述元件並提供一平坦表面供顯示面板40貼附。Referring to Fig. 2, the touch panel 50 is further assembled with a display panel 40 to form an image display system 100, which is a cross-sectional view taken along line Y-Y' of Fig. 1. The display panel 40 can be, for example, a liquid crystal display panel, an organic light emitting diode panel, or other display elements. The touch panel 50 can be attached to the display surface of the display panel 40 by an adhesive layer (not shown). The transparent substrate 10 of the touch panel 50 has a sensing area 14 and a peripheral area 12, and a decorative layer (inorganic glaze layer) 22 is disposed in the peripheral area 12, and the first sensing electrode 16Y and the second sensing electrode 16X are formed in the transparent On the sensing region 14 of the substrate 10, the dielectric layer 18 includes the second sensing electrode 16X to prevent the second sensing electrode 16X from being in electrical contact with the jumper wire 20. A jumper 20 is formed on the dielectric layer 18 for electrically connecting the separated first sensing electrodes 16Y. The signal transmission line 24 is disposed on the decorative layer 22 and can be connected to the first sensing electrode 16Y. The signal transmission line 24 can be made of the same material (conductive metal) as the jumper 20 and in the same step. form. It should be noted that, in addition to the peripheral area 12, the decorative layer 22 may also be disposed in the sensing area 14 for use as a design pattern (for example, a function key pattern such as a keyboard). Please refer to FIG. For example, the decorative layer 22 may include a first decorative layer 22a disposed in the peripheral region 12, and a second decorative layer 22b disposed in the sensing region 14. In addition, the first decorative layer 22a and the second decorative layer 22b disposed in the peripheral region 12 and the sensing region 14 are formed of the same material and formed in the same process, and then the sensing electrodes are formed on the decorative layer. In addition, the touch panel 50 can include a protective layer 26 that comprehensively covers all of the components disposed on the transparent substrate 10 to protect the components and provide a flat surface for the display panel 40 to attach.

根據本發明其他實施例,跨接線亦可直接形成於透明基板之上、介電層形成於跨接線之上、而第一感測電極與第二感測電極係形成於介電層之上,不過,第二感測電極仍需利用介電層來避免與跨接線電性接觸,而跨接線則仍用來連性連接第一感測電極。According to other embodiments of the present invention, the jumper wire may be formed directly on the transparent substrate, the dielectric layer is formed on the jumper, and the first sensing electrode and the second sensing electrode are formed on the dielectric layer. However, the second sensing electrode still needs to utilize a dielectric layer to avoid electrical contact with the jumper, and the jumper is still used to connect the first sensing electrode in a continuous manner.

以下請參照第4A至4E圖,用以說明本發明所述之觸控面板之製造流程。Please refer to FIG. 4A to FIG. 4E for explaining the manufacturing process of the touch panel of the present invention.

首先,如第4A圖所示,提供透明基板10,其中該透明基板10具有一第一表面11及相對的第二表面13,此第一表面11係作為觸控面板的觸控面,且第二表面13上定義有一感應區14及週邊區12。在對該第二表面13進行一清潔整理後,以網印、轉印(熱壓或水壓)、或噴墨方式將一無機色釉組合物(組成如上所述)形成並填滿於該週邊區12內,接著利用一強化爐對該透明基板10進行一燒結製程,以形成一具有高溫度耐受性及抗腐蝕性的無機色釉層,以作為裝飾層22。該裝飾層22的顏色可為黑色、白色、或是其他顏色,可藉由添加一著色劑至該無機色釉組合物中來達到所需的顏色。值得注意的是,裝飾層也可配置於感應區,用以作為設計圖案(例如:鍵盤等功能鍵圖案),且配置於週邊區及感應區之裝飾層係由相同材料並在同一製程所形成。此外,為使無機色釉組合物可短暫附著於玻璃表面以方面進行燒結,可進一步添加一黏著劑至該無機色釉組合物中。該燒結製程的溫度可介於500-660℃,燒結時間可介於1-60分鐘。上述燒結溫度的上限需低於該透明玻璃基板的應變點(strain point),使透明玻璃基板軟化但不變形,而該無機色釉組合物所需的燒結溫度可藉由添加一助熔劑來加以調整。請參照表1,係列出目前業界常用於平面顯示器之玻璃基板特性溫度,皆具有高於500℃的應變點。First, as shown in FIG. 4A, a transparent substrate 10 is provided. The transparent substrate 10 has a first surface 11 and an opposite second surface 13. The first surface 11 serves as a touch surface of the touch panel. A sensing area 14 and a peripheral area 12 are defined on the two surfaces 13. After the second surface 13 is cleaned, an inorganic glaze composition (composed as described above) is formed and filled in by screen printing, transfer (hot pressing or water pressure), or ink jet. In the peripheral region 12, the transparent substrate 10 is then subjected to a sintering process using a strengthening furnace to form an inorganic glaze layer having high temperature resistance and corrosion resistance as the decorative layer 22. The decorative layer 22 can be black, white, or other color, and a desired color can be achieved by adding a colorant to the inorganic glaze composition. It should be noted that the decorative layer can also be disposed in the sensing area as a design pattern (for example, a function key pattern such as a keyboard), and the decorative layer disposed in the peripheral area and the sensing area is formed by the same material and in the same process. . Further, in order to allow the inorganic glaze composition to be temporarily attached to the surface of the glass to be sintered, an adhesive may be further added to the inorganic glaze composition. The sintering process can have a temperature between 500 and 660 ° C and a sintering time of between 1 and 60 minutes. The upper limit of the sintering temperature is lower than the strain point of the transparent glass substrate, so that the transparent glass substrate is softened but not deformed, and the sintering temperature required for the inorganic glaze composition can be adjusted by adding a flux. . Please refer to Table 1 for a series of temperature characteristics of glass substrates commonly used in flat panel displays in the industry, all having strain points higher than 500 °C.

接著,如第4B圖所示,在250℃以上的成膜溫度下(較佳係300℃以上),形成一高度結晶化的透明導電層(例如ITO)於該透明基板10之感應區14內,並以一高腐蝕性藥劑(例如王水)對該高度結晶化透明導電層進行圖形化,得到一圖形化透明導電層16。圖形化透明導電層16包含分開的第一感測電極16Y、以及第二感測電極16X,其中第一感測電極16Y及第二感測電極16X並沒有互相接觸。換言之,該第一感測電極16Y與該第二感測電極16X係由相同材料並在同一製程所形成,其中該製程具有一製程溫度大於250℃。值得注意的是,由於作為該裝飾層22的無機色釉層具有高耐熱性,故不需限定後續製程的最高製程溫度,因此在此步驟可提高透明導電層成膜溫度至250℃以上(不會破壞到該裝飾層),可使透明導電層具有較佳之導電性及均勻性。此外,本發明所述之裝飾層22具有高抗腐蝕性,因此在以高腐蝕性藥劑圖形化該高度結晶化透明導電層時,並不會對該裝飾層造成破壞。再者,本發明直接利用高於250℃的成膜溫度來形成透明導電層,與習知技術相比,不需再以一退火製程對透明導電層進行結晶化,可節省製程步驟。Next, as shown in FIG. 4B, a highly crystalline transparent conductive layer (for example, ITO) is formed in the sensing region 14 of the transparent substrate 10 at a film forming temperature of 250 ° C or higher (preferably, 300 ° C or higher). And patterning the highly crystalline transparent conductive layer with a highly corrosive agent such as aqua regia to obtain a patterned transparent conductive layer 16. The patterned transparent conductive layer 16 includes a first first sensing electrode 16Y and a second sensing electrode 16X, wherein the first sensing electrode 16Y and the second sensing electrode 16X are not in contact with each other. In other words, the first sensing electrode 16Y and the second sensing electrode 16X are formed of the same material and in the same process, wherein the process has a process temperature greater than 250 ° C. It is worth noting that since the inorganic glaze layer as the decorative layer 22 has high heat resistance, it is not necessary to limit the maximum process temperature of the subsequent process, so that the film formation temperature of the transparent conductive layer can be increased to 250 ° C or higher in this step (No Will damage the decorative layer), the transparent conductive layer can have better conductivity and uniformity. In addition, the decorative layer 22 of the present invention has high corrosion resistance, so that when the highly crystalline transparent conductive layer is patterned with a highly corrosive agent, the decorative layer is not damaged. Furthermore, the present invention directly forms a transparent conductive layer by using a film forming temperature higher than 250 ° C. Compared with the prior art, the transparent conductive layer is not crystallized by an annealing process, which saves the process steps.

接著,如第4C圖所示,形成一介電層18覆蓋該第二感測電極16X,以避免該第二感測電極16X與後續形成之跨接線20電性連結。該介電層可例如為氧化矽、氮化矽、氮氧化矽、或其組合。Next, as shown in FIG. 4C, a dielectric layer 18 is formed to cover the second sensing electrode 16X to prevent the second sensing electrode 16X from being electrically connected to the subsequently formed jumper wire 20. The dielectric layer can be, for example, hafnium oxide, tantalum nitride, hafnium oxynitride, or a combination thereof.

接著,如第4D圖所示,形成一金屬導電層於該裝飾層22、該第一感測電極16Y、及該介電層18之上,並對該金屬導電層進行一圖形化製程(可例如為微影蝕刻製程),以同時形成該跨接線20及信號傳送線24。該金屬導電層適合之材料可為鉬(Mo)、鎢(W)、鋁(Al)、鈦(Ti)、鉻(Cr)或其合金。Next, as shown in FIG. 4D, a metal conductive layer is formed on the decorative layer 22, the first sensing electrode 16Y, and the dielectric layer 18, and a patterned process is performed on the metal conductive layer. For example, a lithography process) to simultaneously form the jumper 20 and the signal transmission line 24. Suitable materials for the metal conductive layer may be molybdenum (Mo), tungsten (W), aluminum (Al), titanium (Ti), chromium (Cr) or alloys thereof.

最後,如第4E圖所示,形成一保護層26覆蓋第二表面13上的所有元件(包含第一感測電極16Y、第二感測電極16X、介電層18、跨接線20、及信號傳送線24),並提供一實質上平坦的表面。在完成上述觸控面板50之製作後,可以貼附方式將一顯示面板40配置於保護層26上,形成本發明第2圖實施例所述之影像影示系統100。Finally, as shown in FIG. 4E, a protective layer 26 is formed to cover all of the elements on the second surface 13 (including the first sensing electrode 16Y, the second sensing electrode 16X, the dielectric layer 18, the jumper 20, and the signal). Transfer line 24) and provide a substantially flat surface. After the touch panel 50 is completed, a display panel 40 can be placed on the protective layer 26 in an attached manner to form the image display system 100 according to the second embodiment of the present invention.

請參閱第5圖,其為依據本發明之包含觸控顯示面板之影像顯示系統100的配置示意圖,其中該影像顯示系統100包含一顯示面板40以及一觸控面板50配置於該顯示面板40之上。一般而言,影像顯示系統100更包一控制單元200,該控制單元200與顯示面板40耦接。控制單元200除了可傳輸訊號至顯示面板,使顯示面板顯示影像之外,還可以接收來自觸控面板產生的第一訊號,並傳輸對應於第一訊號之第二訊號至顯示面板,以使顯示面板依據觸控動作而顯示影像。上述之影像顯示系統100可為行動電話、數位相機、個人數位助理(PDA)、筆記型電腦、桌上型電腦、電視、車用顯示器或可攜式DVD播放機。FIG. 5 is a schematic diagram of a configuration of an image display system 100 including a touch display panel according to the present invention. The image display system 100 includes a display panel 40 and a touch panel 50 disposed on the display panel 40. on. In general, the image display system 100 further includes a control unit 200 coupled to the display panel 40. In addition to transmitting the signal to the display panel, the control unit 200 can display the image, and can receive the first signal generated by the touch panel and transmit the second signal corresponding to the first signal to the display panel for display. The panel displays images according to the touch action. The image display system 100 described above can be a mobile phone, a digital camera, a personal digital assistant (PDA), a notebook computer, a desktop computer, a television, a car display, or a portable DVD player.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為基準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope is based on the definition of the scope of the patent application attached.

10...透明基板10. . . Transparent substrate

11...第一表面11. . . First surface

12...週邊區12. . . Surrounding area

13...第二表面13. . . Second surface

14...感應區14. . . Sensing area

16...透明導電層16. . . Transparent conductive layer

16X...第二感測電極16X. . . Second sensing electrode

16Y...第一感測電極16Y. . . First sensing electrode

18...介電層18. . . Dielectric layer

20...跨接線20. . . Jumper

22...裝飾層twenty two. . . Decorative layer

24...信號傳送線twenty four. . . Signal transmission line

26...保護層26. . . The protective layer

30...感測單元30. . . Sensing unit

40...顯示面板40. . . Display panel

50...觸控面板50. . . Touch panel

100...影像顯示系統100. . . Image display system

200...控制單元200. . . control unit

以及as well as

Y-Y’...切線Y-Y’. . . Tangent

第1圖顯示根據本發明之一實施例所繪示的觸控面板的上視圖。FIG. 1 is a top view of a touch panel according to an embodiment of the invention.

第2圖顯示將第1圖所述之觸控面板進一步與一顯示面板組裝形成一影像顯示系統,沿著第1圖剖面線Y-Y’所得之剖面示意圖。Fig. 2 is a cross-sectional view showing the touch panel of Fig. 1 further assembled with a display panel to form an image display system, taken along the line Y-Y' of Fig. 1.

第3圖顯示根據本發明之一實施例所繪示的觸控面板示意圖,繪示該裝飾層同時形成於週邊區及感應區內。FIG. 3 is a schematic view showing a touch panel according to an embodiment of the invention, showing that the decorative layer is simultaneously formed in the peripheral area and the sensing area.

第4A至4E圖係一系列的剖面示意圖,用以說明根據本發明之一實施例所述觸控面板的製造流程。4A to 4E are a series of schematic cross-sectional views for explaining a manufacturing process of the touch panel according to an embodiment of the present invention.

第5圖係繪示根據本發明一實施例之影像顯示系統方塊示意圖。FIG. 5 is a block diagram showing an image display system according to an embodiment of the invention.

10...透明基板10. . . Transparent substrate

12...週邊區12. . . Surrounding area

14...感應區14. . . Sensing area

16...透明導電層16. . . Transparent conductive layer

16X...第二感測電極16X. . . Second sensing electrode

16Y...第一感測電極16Y. . . First sensing electrode

18...介電層18. . . Dielectric layer

20...跨接線20. . . Jumper

22...裝飾層twenty two. . . Decorative layer

24...信號傳送線twenty four. . . Signal transmission line

30...感測單元30. . . Sensing unit

50...觸控面板50. . . Touch panel

Claims (18)

一種包含觸控面板之影像顯示系統,包括:一觸控面板,包括:一透明基板,具有一感應區及圍繞該感應區之一週邊區;一第一裝飾層設置於該週邊區內以及一第二裝飾層設置於該感應區內,其中該第一裝飾層及第二裝飾層係為一無機色釉層;以及一感測單元,設置於該感應區內,其中該感測單元包含一第一感測電極及一第二感測電極,且該第一感測電極及第二感測電極係位於第二裝飾層之上。 An image display system including a touch panel includes: a touch panel comprising: a transparent substrate having a sensing area and a peripheral area surrounding the sensing area; a first decorative layer disposed in the peripheral area and a a second decorative layer is disposed in the sensing area, wherein the first decorative layer and the second decorative layer are an inorganic glaze layer; and a sensing unit is disposed in the sensing area, wherein the sensing unit comprises a a first sensing electrode and a second sensing electrode, and the first sensing electrode and the second sensing electrode are located above the second decorative layer. 如申請專利範圍第1項所述之包含觸控面板之影像顯示系統,其中該透明基板係為玻璃基板。 The image display system including the touch panel according to claim 1, wherein the transparent substrate is a glass substrate. 如申請專利範圍第1項所述之包含觸控面板之影像顯示系統,其中該無機色釉層係由一無機色釉組合物經一燒結製程所製備而成。 The image display system comprising the touch panel according to claim 1, wherein the inorganic glaze layer is prepared by a sintering process of an inorganic glaze composition. 如申請專利範圍第3項所述之包含觸控面板之影像顯示系統,其中該無機色釉組合物包含一陶瓷材料、以及一著色劑。 An image display system comprising a touch panel according to claim 3, wherein the inorganic glaze composition comprises a ceramic material and a colorant. 如申請專利範圍第4項所述之包含觸控面板之影像顯示系統,其中該陶瓷材料包含氧化物、碳化物、氮化物、或其組合。 An image display system comprising a touch panel according to claim 4, wherein the ceramic material comprises an oxide, a carbide, a nitride, or a combination thereof. 如申請專利範圍第4項所述之包含觸控面板之影像顯示系統,其中該陶瓷材料包含氧化鈦、氧化鋁、氮化 鈦、氮化鋁、碳化鈦、氮化鋁鈦、氮化鈦、或其組合。 An image display system comprising a touch panel according to claim 4, wherein the ceramic material comprises titanium oxide, aluminum oxide, and nitride. Titanium, aluminum nitride, titanium carbide, titanium aluminum nitride, titanium nitride, or a combination thereof. 如申請專利範圍第4項所述之包含觸控面板之影像顯示系統,其中該著色劑包含金屬氧化物、或碳黑。 An image display system comprising a touch panel according to claim 4, wherein the colorant comprises a metal oxide or carbon black. 如申請專利範圍第4項所述之包含觸控面板之影像顯示系統,其中該著色劑包含氧化銅、氧化鐵、氧化錳、氧化鈷、氧化銻、氧化鋇、或其混合。 An image display system comprising a touch panel according to claim 4, wherein the colorant comprises copper oxide, iron oxide, manganese oxide, cobalt oxide, cerium oxide, cerium oxide, or a mixture thereof. 如申請專利範圍第4項所述之包含觸控面板之影像顯示系統,其中該無機色釉組合物更包含一助熔劑、或黏著劑。 An image display system comprising a touch panel according to claim 4, wherein the inorganic glaze composition further comprises a flux or an adhesive. 如申請專利範圍第1項所述之包含觸控面板之影像顯示系統,更包括:一顯示面板,具有一影像顯示面,其中該觸控面板直接配置於該顯示面板之影像顯示面上。 The image display system including the touch panel of claim 1, further comprising: a display panel having an image display surface, wherein the touch panel is directly disposed on the image display surface of the display panel. 如申請專利範圍第10項所述之包含觸控面板之影像顯示系統,更包括:一控制單元,與該顯示面板耦接,其中該控制單元接收觸控面板產生的一第一訊號,並傳輸一第二訊號至該顯示面板,以使該顯示面板顯示一影像。 The image display system including the touch panel of claim 10, further comprising: a control unit coupled to the display panel, wherein the control unit receives a first signal generated by the touch panel and transmits A second signal is sent to the display panel to cause the display panel to display an image. 一種觸控面板的製造方法,包含:提供一透明基板,其中該透明基板具有一感應區及圍燒該感應區之一週邊區;形成一第一裝飾層於該週邊區內以及形成一第二裝飾層於該感應區內,其中該第一裝飾層及第二裝飾層係為一無機色釉層;以及 形成一感測單元於該感應區內,其中該感測單元包含一第一感測電極及一第二感測電極,且該第一感測電極及第二感測電極係位於第二裝飾層之上。 A method for manufacturing a touch panel, comprising: providing a transparent substrate, wherein the transparent substrate has a sensing area and surrounding a peripheral area of the sensing area; forming a first decorative layer in the peripheral area and forming a second a decorative layer in the sensing region, wherein the first decorative layer and the second decorative layer are an inorganic glaze layer; Forming a sensing unit in the sensing region, wherein the sensing unit includes a first sensing electrode and a second sensing electrode, and the first sensing electrode and the second sensing electrode are located in the second decorative layer Above. 如申請專利範圍第12項所述之觸控面板的製造方法,其中該第一裝飾層與該第二裝飾層係由相同材料並在同一製程所形成。 The method of manufacturing a touch panel according to claim 12, wherein the first decorative layer and the second decorative layer are formed of the same material and in the same process. 如申請專利範圍第12項所述之觸控面板的製造方法,其中該無機色釉層係由一無機色釉組合物經一燒結製程所製備而成。 The method for manufacturing a touch panel according to claim 12, wherein the inorganic glaze layer is prepared by a sintering process of an inorganic glaze composition. 如申請專利範圍第14項所述之觸控面板的製造方法,其中該燒結製程的溫度係介於500-660℃之間。 The method of manufacturing a touch panel according to claim 14, wherein the temperature of the sintering process is between 500 and 660 °C. 如申請專利範圍第15項所述之觸控面板的製造方法,其中該燒結製程的溫度係小於該透明基板之應變點。 The method of manufacturing a touch panel according to claim 15, wherein the temperature of the sintering process is smaller than a strain point of the transparent substrate. 如申請專利範圍第12項所述之觸控面板的製造方法,其中形成該感測單元係包含形成複數個排列成行的第一感測電極及複數個排列成列的第二感測電極於該感應區內,且該些第一感測電極互相分開,該些第二感測電極互相連接。 The method of manufacturing a touch panel according to claim 12, wherein the forming the sensing unit comprises forming a plurality of first sensing electrodes arranged in a row and a plurality of second sensing electrodes arranged in a row. In the sensing region, the first sensing electrodes are separated from each other, and the second sensing electrodes are connected to each other. 如申請專利範圍第17項所述之觸控面板的製造方法,其中該第一感測電極與該第二感測電極係由相同材料並在同一製程所形成,其中該製程具有一製程溫度大於250℃。 The method of manufacturing a touch panel according to claim 17, wherein the first sensing electrode and the second sensing electrode are formed of the same material and formed in the same process, wherein the process has a process temperature greater than 250 ° C.
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