TWI460005B - Surface treatment of wet process cleaning fluid recycling system - Google Patents
Surface treatment of wet process cleaning fluid recycling system Download PDFInfo
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- TWI460005B TWI460005B TW101120010A TW101120010A TWI460005B TW I460005 B TWI460005 B TW I460005B TW 101120010 A TW101120010 A TW 101120010A TW 101120010 A TW101120010 A TW 101120010A TW I460005 B TWI460005 B TW I460005B
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- 238000004140 cleaning Methods 0.000 title claims description 128
- 238000000034 method Methods 0.000 title claims description 41
- 238000004381 surface treatment Methods 0.000 title claims description 32
- 238000004064 recycling Methods 0.000 title claims description 28
- 239000012530 fluid Substances 0.000 title description 3
- 239000007788 liquid Substances 0.000 claims description 193
- 238000003860 storage Methods 0.000 claims description 119
- 238000000926 separation method Methods 0.000 claims description 86
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 74
- 238000000909 electrodialysis Methods 0.000 claims description 69
- 238000001223 reverse osmosis Methods 0.000 claims description 54
- 239000012141 concentrate Substances 0.000 claims description 46
- 238000000502 dialysis Methods 0.000 claims description 41
- 239000012466 permeate Substances 0.000 claims description 39
- 238000001179 sorption measurement Methods 0.000 claims description 33
- 150000001768 cations Chemical class 0.000 claims description 31
- 150000001450 anions Chemical class 0.000 claims description 30
- 239000011347 resin Substances 0.000 claims description 26
- 229920005989 resin Polymers 0.000 claims description 26
- 239000012528 membrane Substances 0.000 claims description 23
- 239000000126 substance Substances 0.000 claims description 22
- 239000008367 deionised water Substances 0.000 claims description 21
- 229910021641 deionized water Inorganic materials 0.000 claims description 21
- 239000002738 chelating agent Substances 0.000 claims description 17
- 239000012535 impurity Substances 0.000 claims description 17
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 16
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 12
- 230000002378 acidificating effect Effects 0.000 claims description 12
- 239000004917 carbon fiber Substances 0.000 claims description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 238000002203 pretreatment Methods 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 229910001385 heavy metal Inorganic materials 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims description 2
- 239000010419 fine particle Substances 0.000 claims description 2
- 239000003456 ion exchange resin Substances 0.000 claims description 2
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 2
- 229910001415 sodium ion Inorganic materials 0.000 claims description 2
- 150000002825 nitriles Chemical class 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 238000007747 plating Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 241001227124 Dialytes Species 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
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- Water Treatment By Electricity Or Magnetism (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Description
本發明係有關於一種表面處理濕製程清洗液循環利用系統，尤其是利用樹脂的吸附作用、逆滲透膜的過濾濃縮作用以及雙極電解液透析單元的分離作用以達到清洗液回收再生及零排放的目的。The invention relates to a surface treatment wet process cleaning liquid recycling system, in particular to utilizing adsorption of a resin, filtration and concentration of a reverse osmosis membrane, and separation of a bipolar electrolyte dialysis unit to achieve recovery and zero discharge of the cleaning liquid. the goal of.
表面處理濕製程已廣泛應用於許多產品的製造，比如印刷電路板(PCB)或半導體元件，藉以在絕緣基板上形成電氣連接線路或圖案，同時形成保護層以提供防濕氣、抗刮傷的保護作用，其中表面處理濕製程常包括多道次的電鍍、化學敷鍍、清洗、烘乾、塗佈、硬化等處理，藉以形成層疊結構的產品。Surface treatment wet processes have been widely used in the manufacture of many products, such as printed circuit boards (PCBs) or semiconductor components, to form electrical connections or patterns on insulating substrates, while forming a protective layer to provide moisture and scratch resistance. The protective effect, wherein the surface treatment wet process often includes multiple passes of electroplating, chemical plating, cleaning, drying, coating, hardening, etc., thereby forming a product of a laminated structure.
清洗處理一般使用去離子水當作清洗液，並以浸泡方式清洗目標物件的表面，以去除雜質或化學品，因此，清洗後的清洗液中會含有不需要的雜質或化學品，而這類雜質或化學品通常是有害物質或有再利用價值的資源，因此需要進行適當的處理，以符合環保法規的排放標準，或回收可再利用的資源。The cleaning process generally uses deionized water as the cleaning solution, and the surface of the target object is cleaned by immersion to remove impurities or chemicals. Therefore, the cleaning liquid after cleaning may contain unnecessary impurities or chemicals. Impurities or chemicals are often hazardous or recyclable resources and therefore need to be properly disposed of to comply with environmental regulations or to recycle reusable resources.
在習用技術中，不同製程中所產生的鍍液、清洗液或廢水，會先集中再由污染處理設備或資源回收處理設備進行除污或回收處理，而一般污染處理設備或資源回收處理設備的構造相當昂貴且操作複雜，保養不易，尤其是待處理液體包含太多不同的雜質，比如污染性的顆粒、重金屬、陰離子及陽離子，或特殊化學藥劑，如螯合劑，因而增加整體處理難度。In the conventional technology, the plating solution, cleaning solution or waste water generated in different processes will be concentrated and then decontaminated or recycled by the pollution treatment equipment or resource recycling treatment equipment, while the general pollution treatment equipment or resource recycling treatment equipment The construction is quite expensive and complicated to operate, and maintenance is not easy. In particular, the liquid to be treated contains too many different impurities, such as contaminating particles, heavy metals, anions and cations, or special chemicals such as chelating agents, thereby increasing the overall processing difficulty.
因此，需要一種表面處理濕製程清洗液循環利用系統，可直接連結至鍍槽、清洗槽，藉逆滲單元、雙極電透析單元以及吸附 單元實現回收再利用及零排放的環保處理方式，解決上述習用技術的問題。Therefore, there is a need for a surface treatment wet process cleaning liquid recycling system that can be directly connected to a plating tank, a cleaning tank, a reverse osmosis unit, a bipolar electrodialysis unit, and adsorption. The unit realizes environmental protection treatment methods of recycling and zero-discharge, and solves the problems of the above-mentioned conventional technologies.
本發明之主要目的在提供一種表面處理濕製程清洗液循環利用系統，包括清洗液儲存槽、碳纖維過濾器、臭氧產生器、高壓幫浦、逆滲透分離單元、濃縮液儲存槽、雙極電透析單元、吸附分離單元以及後級樹脂吸附單元，用以回收並再利用表面處理濕製程中具污染性陰離子及陽離子的待處理清洗液，其中清洗液儲存槽收集待處理清洗液以形成儲存清洗液，碳纖維過濾器將清洗液儲存槽中的儲存清洗液進行過濾處理；臭氧產生器產生臭氧以氧化儲存清洗液中的羥基有機物，形成預先處理液，回送至清洗液儲存槽；高壓幫浦將清洗液儲存槽中的儲存清洗液加壓而形成並傳送高壓清洗液；逆滲透分離單元接收高壓幫浦所傳送的高壓清洗液，並經逆滲透分離而形成濃縮液以及滲透液；濃縮液儲存槽接收逆滲透單元的濃縮液以形成儲存濃縮液；雙極電透析單元接收濃縮液儲存槽的儲存濃縮液，並經電透析分離產生透析濃縮液、酸性水、鹼性水、電極液及透析水，透析濃縮液回送至濃縮液儲存槽，透析水回送至逆滲透分離單元；吸附分離單元接收酸性水、鹼性水、電極液，並吸附陰離子、陽離子及螯合劑後回送至濃縮液儲存槽；後級處理單元接收逆滲透分離單元一部分的滲透液，並吸附其中的陰離子及陽離子，產生具有去離子水等級的再生去離子水，以供再利用。The main object of the present invention is to provide a surface treatment wet process cleaning liquid recycling system, including a cleaning liquid storage tank, a carbon fiber filter, an ozone generator, a high pressure pump, a reverse osmosis separation unit, a concentrate storage tank, and a bipolar electrodialysis. a unit, an adsorption separation unit and a post-stage resin adsorption unit for recovering and reusing a cleaning liquid to be treated with a contaminated anion and a cation in a surface treatment wet process, wherein the cleaning liquid storage tank collects the cleaning liquid to be treated to form a storage cleaning liquid The carbon fiber filter filters the storage cleaning liquid in the cleaning liquid storage tank; the ozone generator generates ozone to oxidize the hydroxyl organic substance in the cleaning liquid to form a pre-treatment liquid, which is sent back to the cleaning liquid storage tank; the high pressure pump will clean The storage cleaning liquid in the liquid storage tank is pressurized to form and deliver the high-pressure cleaning liquid; the reverse osmosis separation unit receives the high-pressure cleaning liquid delivered by the high-pressure pump, and is separated by reverse osmosis to form a concentrated liquid and a permeate; the concentrated liquid storage tank Receiving a concentrate of the reverse osmosis unit to form a storage concentrate; a bipolar electrodialysis unit Receiving the stored concentrated liquid in the concentrated solution storage tank, and separating the dialysis concentrated liquid, acidic water, alkaline water, electrode liquid and dialysis water by electrodialysis, the dialysis concentrated liquid is sent back to the concentrated liquid storage tank, and the dialysis water is sent back to the reverse osmosis separation. The adsorption separation unit receives the acidic water, the alkaline water, the electrode liquid, and adsorbs the anion, the cation and the chelating agent, and then sends it back to the concentrate storage tank; the latter processing unit receives the permeate of a part of the reverse osmosis separation unit, and adsorbs the same Anions and cations produce regenerated deionized water with deionized water levels for reuse.
因此，本發明的系統可提高表面處理濕製程中水資源的循環再利用，進而達到減廢及零排放的目的。Therefore, the system of the invention can improve the recycling of water resources in the surface treatment wet process, thereby achieving the purpose of reducing waste and zero discharge.
以下配合圖式及元件符號對本發明之實施方式做更詳細的說明，俾使熟習該項技藝者在研讀本說明書後能據以實施。The embodiments of the present invention will be described in more detail below with reference to the drawings and the <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt;
參閱第一圖，本發明表面處理濕製程清洗液循環利用系統的示意圖。如第一圖所示，本發明的表面處理濕製程清洗液循環利用系統係包括清洗液儲存槽10、碳纖維過濾器20、臭氧產生器22、高壓幫浦(圖中未顯示)、逆滲透分離單元30、濃縮液儲存槽40、雙極電透析單元50、電透析儲存單元60、吸附分離單元70以及後級樹脂吸附單元80。Referring to the first figure, a schematic diagram of the surface treatment wet process cleaning liquid recycling system of the present invention. As shown in the first figure, the surface treatment wet process cleaning liquid recycling system of the present invention includes a cleaning liquid storage tank 10, a carbon fiber filter 20, an ozone generator 22, a high pressure pump (not shown), and reverse osmosis separation. The unit 30, the concentrate storage tank 40, the bipolar electrodialysis unit 50, the electrodialysis storage unit 60, the adsorption separation unit 70, and the subsequent resin adsorption unit 80.
上述表面處理濕製程的實例可包括用以製造或處理印刷電路板或半導體元件所需的製程，比如塗佈、蝕刻、清洗的工序，其中在清洗時，亦即利用適當清洗液，一般為去離子水，以清洗殘留在表面上的雜質、鍍液或化學物質，因而產生包含雜質、羥基有機物、分子級顆粒、螯合劑、陰離子以及陽離子的待處理清洗液L1，可藉本發明實現循環利用其中可再利用的資源，比如水資源。待處理清洗液L1中的陰離子可包括至少硫酸根離子，且待處理清洗液L1的陽離子可包括至少鈉離子。Examples of the surface treatment wet process described above may include processes required for manufacturing or processing printed circuit boards or semiconductor components, such as coating, etching, and cleaning processes, wherein in cleaning, that is, using a suitable cleaning solution, generally Ionized water to clean impurities, plating solution or chemical substances remaining on the surface, thereby producing a cleaning liquid L1 to be treated containing impurities, hydroxy organic substances, molecular-grade particles, chelating agents, anions and cations, which can be recycled by the present invention Among the resources that can be reused, such as water resources. The anion in the cleaning liquid L1 to be treated may include at least sulfate ions, and the cation of the cleaning liquid L1 to be treated may include at least sodium ions.
清洗液儲存槽10收集待處理清洗液L1，形成儲存清洗液L2。碳纖維過濾器20接收清洗液儲存槽10中的儲存清洗液L2，並過濾以去除儲存清洗液L2中的雜質，其中雜質可包括微小顆粒、重金屬、氰化物(cyanide)、化學需氧量(Chemical Oxygen Demand，COD)物、含氯物質。臭氧產生器22，可產生臭氧，用以氧化儲存清洗液L2中的羥基有機物，並形成預先處理液L3而回送至清洗液儲存槽10。The cleaning liquid storage tank 10 collects the cleaning liquid L1 to be treated to form a storage cleaning liquid L2. The carbon fiber filter 20 receives the stored cleaning liquid L2 in the cleaning liquid storage tank 10, and is filtered to remove impurities stored in the cleaning liquid L2, wherein the impurities may include fine particles, heavy metals, cyanide, chemical oxygen demand (Chemical Oxygen Demand, COD), chlorine-containing substances. The ozone generator 22 generates ozone for oxidizing the hydroxy organic substance stored in the cleaning liquid L2, and forms the pre-treatment liquid L3 to be returned to the cleaning liquid storage tank 10.
高壓幫浦可抽取清洗液儲存槽10中的儲存清洗液L2並加壓，形成高壓清洗液，傳送至逆滲透分離單元30，而逆滲透分離 單元30具有奈米分子級的逆滲透膜(圖中未顯示)，可將高壓清洗液經逆滲透分離而形成未滲透過逆滲透膜的濃縮液L4以及滲透過逆滲透膜的滲透液L5，其中滲透液L5不含螯合劑，且濃縮液L4所包含的陰離子以及陽離子之濃度係高於滲透液L5所包含的陰離子以及陽離子之濃度。此外，一部分的滲透液L5被回送至清洗液儲存槽10，而另一部分的滲透液L5則傳送至後級樹脂吸附單元80。The high pressure pump can extract the storage cleaning liquid L2 in the cleaning liquid storage tank 10 and pressurize it to form a high pressure cleaning liquid, which is sent to the reverse osmosis separation unit 30, and the reverse osmosis separation is performed. The unit 30 has a nano-level reverse osmosis membrane (not shown), and the high-pressure washing liquid can be separated by reverse osmosis to form a concentrated liquid L4 that has not penetrated the reverse osmosis membrane and a permeate L5 that has permeated the reverse osmosis membrane. The permeate L5 does not contain a chelating agent, and the concentration of the anion and the cation contained in the concentrated liquid L4 is higher than the concentration of the anion and the cation contained in the permeate L5. Further, a part of the permeate L5 is sent back to the cleaning liquid storage tank 10, and another portion of the permeate L5 is sent to the subsequent-stage resin adsorption unit 80.
濃縮液儲存槽40接收並儲存來自逆滲透分離單元30的濃縮液L4，形成儲存濃縮液L6。雙極電透析單元50接收濃縮液儲存槽40的儲存濃縮液L6，並經雙極電透析單元50的電透析分離而產生透析濃縮液L7、分離液L8及透析水L9，其中透析濃縮液L7回送至濃縮液儲存槽40，而分離液L8包括相互分離的酸性水、鹼性水及電極液，且分離液L8及透析水L9係傳送至電透析儲存單元60。The concentrate storage tank 40 receives and stores the concentrated liquid L4 from the reverse osmosis separation unit 30 to form a storage concentrate L6. The bipolar electrodialysis unit 50 receives the stored concentrate L6 of the concentrate storage tank 40, and is subjected to electrodialysis separation of the bipolar electrodialysis unit 50 to generate a dialysis concentrate L7, a separation liquid L8, and a dialysis water L9, wherein the dialysis concentrate L7 The mixture is returned to the concentrate storage tank 40, and the separation liquid L8 includes acidic water, alkaline water, and electrode liquid separated from each other, and the separation liquid L8 and the dialysis water L9 are sent to the electrodialysis storage unit 60.
雙極電透析單元50及電透析儲存單元60的功能示意圖係如第二圖所示，其中雙極電透析單元50包括多個電透析膜F以及多個電透析腔體C，且相鄰的電透析腔體C之間係由相對應的電透析膜F隔開，因此雙極電透析單元50可由外部電源施加電壓，以使得電透析膜F對儲存濃縮液L6產生電透析作用。此外，電透析儲存單元60包括酸性水儲存槽61、鹼性水儲存槽63、電極液儲存槽65、透析水儲存槽67，用以分別接收並儲存雙極電透析單元50所產生的酸性水、鹼性水、電極液及透析水L9。The function diagram of the bipolar electrodialysis unit 50 and the electrodialysis storage unit 60 is as shown in the second figure, wherein the bipolar electrodialysis unit 50 includes a plurality of electrodialysis membranes F and a plurality of electrodialysis chambers C, and adjacent The electrodialysis chambers C are separated by corresponding electrodialysis membranes F, so that the bipolar electrodialysis unit 50 can be applied with a voltage from an external power source to cause the electrodialysis membrane F to produce an electrodialysis effect on the storage concentrate L6. In addition, the electrodialysis storage unit 60 includes an acidic water storage tank 61, an alkaline water storage tank 63, an electrode liquid storage tank 65, and a dialysis water storage tank 67 for respectively receiving and storing the acidic water generated by the bipolar electrodialysis unit 50. , alkaline water, electrode solution and dialysis water L9.
要注意的是，第二圖只是用以說明本發明特徵的實例而已，並非用以限定本發明範圍，亦即電透析膜、電透析腔體的數目以及配置排列方式可視實務需求而改變，比如也可利用圓形套管的電透析腔體而實現。It should be noted that the second figure is only an example for illustrating the features of the present invention, and is not intended to limit the scope of the present invention, that is, the number of electrodialysis membranes, the number of electrodialysis chambers, and the arrangement arrangement may vary depending on practical needs, such as It can also be realized with an electrodialysis chamber of a circular cannula.
電透析儲存單元60接收雙極電透析單元50的透析水L9及分離液L8，且透析水L9被回送至逆滲透分離單元30，而一部分的分離液L8被回送至雙極電透析單元50，另一部分的分離液L8則傳送至吸附分離單元70，其中回送至逆滲透分離單元30及傳送至吸附分離單元70的分離液L8之流量比例可利用流控制器、幫浦或控制閥(圖中未顯示)而控制，藉以達到穩定狀態。The electrodialysis storage unit 60 receives the dialysis water L9 and the separation liquid L8 of the bipolar electrodialysis unit 50, and the dialysis water L9 is sent back to the reverse osmosis separation unit 30, and a part of the separation liquid L8 is sent back to the bipolar electrodialysis unit 50. Another portion of the separation liquid L8 is sent to the adsorption separation unit 70, wherein the flow ratio of the separation liquid L8 fed back to the reverse osmosis separation unit 30 and to the adsorption separation unit 70 can be measured by a flow controller, a pump or a control valve (in the figure) Not shown) and controlled to achieve a steady state.
吸附分離單元70接收電透析儲存單元60的分離液L8，且吸附分離單元70包括樹脂，可用以吸附分離液L8中的陰離子、陽離子及螯合劑，並回送至濃縮液儲存槽40。The adsorption separation unit 70 receives the separation liquid L8 of the electrodialysis storage unit 60, and the adsorption separation unit 70 includes a resin that can be used to adsorb the anions, cations, and chelating agents in the separation liquid L8, and is sent back to the concentrate storage tank 40.
後級樹脂吸附單元80接收逆滲透分離單元30中另一部分的滲透液L5，其中後級樹脂吸附單元80可包含樹脂，用以吸附滲透液L5中殘餘的陰離子以及陽離子，產生具有去離子水等級的再生去離子水L10，並可排出以供其他製程再利用。The post-stage resin adsorption unit 80 receives the permeate L5 of another portion of the reverse osmosis separation unit 30, wherein the post-stage resin adsorption unit 80 may contain a resin for adsorbing residual anions and cations in the permeate L5 to produce a deionized water level. The deionized water L10 is regenerated and can be discharged for reuse in other processes.
此外，本發明的另一實施例係不包括碳纖維過濾器及/或臭氧產生器，尤其是對於具低含量之雜質及/或羥基有機物的待處理清洗液，進而可簡化整體操作，並節省運作成本。或者，也可利用其他過濾器及/或氧化裝置以分別取代碳纖維過濾器、臭氧產生器，藉以產生過濾、氧化的功能，比如以活性碳過濾器或離子交換樹脂過濾器取代碳纖維過濾器，而以低壓紫外線氧化裝置取代臭氧產生器。In addition, another embodiment of the present invention does not include a carbon fiber filter and/or an ozone generator, especially for a cleaning liquid to be treated with a low content of impurities and/or hydroxy organic substances, thereby simplifying the overall operation and saving operation. cost. Alternatively, other filters and/or oxidizing devices may be utilized to replace the carbon fiber filter and the ozone generator, respectively, thereby generating filtration and oxidation functions, such as replacing the carbon fiber filter with an activated carbon filter or an ion exchange resin filter. The ozone generator is replaced by a low pressure ultraviolet oxidation device.
上述本發明表面處理濕製程清洗液循環利用系統的特點在於，利用逆滲透單元以及雙極電透析單元，對包含不同雜質的待處理清洗液進行逆滲透、過濾、電透析、分離，以產生具有去離子水等級的再生去離子水，可供其他製程再利用，比如直接當作清洗液用於清洗製程中，或供調配鍍液用，進而實現降減廢棄物以及零污染排放的目的。The surface treatment wet process cleaning liquid recycling system of the present invention is characterized in that the reverse osmosis unit and the bipolar electrodialysis unit are used for reverse osmosis, filtration, electrodialysis and separation of the cleaning liquid to be treated containing different impurities to produce Deionized water grade deionized water can be reused in other processes, such as directly used as a cleaning solution for the cleaning process, or for the plating solution, thereby achieving the purpose of reducing waste and zero pollution.
本發明循環利用系統的另一特點在於，可直接連結至現有表面處理濕製程的鍍槽或清洗槽，形成具有即時處理廢棄液體的循環利用水資源功能，簡化處理程序，並提高操作處理效率，尤其是可實現連續式操作以取代非連續批次式操作，進一步增加整體操作的穩定性，並可實現全自動化控制，節省人力資源，減少人為疏失。Another feature of the recycling system of the present invention is that it can be directly connected to the existing surface treatment wet process plating tank or cleaning tank to form a recycling water resource function with instant disposal of waste liquid, simplify the processing procedure, and improve the operation processing efficiency. In particular, continuous operation can be implemented to replace non-continuous batch operations, further increasing the stability of the overall operation, and achieving full automation control, saving human resources and reducing human error.
以上所述者僅為用以解釋本發明之較佳實施例，並非企圖據以對本發明做任何形式上之限制，是以，凡有在相同之發明精神下所作有關本發明之任何修飾或變更，皆仍應包括在本發明意圖保護之範疇。The above is only a preferred embodiment for explaining the present invention, and is not intended to limit the present invention in any way, and any modifications or alterations to the present invention made in the spirit of the same invention. All should still be included in the scope of the intention of the present invention.
10‧‧‧清洗液儲存槽10‧‧‧cleaning fluid storage tank
20‧‧‧碳纖維過濾器20‧‧‧Carbon fiber filter
22‧‧‧臭氧產生器22‧‧Ozone generator
30‧‧‧逆滲透分離單元30‧‧‧ reverse osmosis separation unit
40‧‧‧濃縮液儲存槽40‧‧‧ Concentrate storage tank
50‧‧‧雙極電透析單元50‧‧‧Bipolar electrodialysis unit
60‧‧‧電透析儲存單元60‧‧‧Electric dialysis storage unit
61‧‧‧酸性水儲存槽61‧‧‧ acidic water storage tank
63‧‧‧鹼性水儲存槽63‧‧‧Alkaline water storage tank
65‧‧‧電極液儲存槽65‧‧‧electrode solution storage tank
67‧‧‧透析水儲存槽67‧‧‧dialysis water storage tank
70‧‧‧吸附分離單元70‧‧‧Adsorption separation unit
80‧‧‧後級樹脂吸附單元80‧‧‧After resin adsorption unit
C‧‧‧電透析腔體C‧‧‧Electric dialysis chamber
F‧‧‧電透析膜F‧‧‧Electrodialysis membrane
L1‧‧‧待處理清洗液L1‧‧‧Washing cleaning solution
L2‧‧‧儲存清洗液L2‧‧‧Storage cleaning solution
L3‧‧‧預先處理液L3‧‧‧Pre-treatment liquid
L4‧‧‧濃縮液L4‧‧‧ Concentrate
L5‧‧‧滲透液L5‧‧‧ Permeate
L6‧‧‧儲存濃縮液L6‧‧‧Storage concentrate
L7‧‧‧透析濃縮液L7‧‧‧Dialyte Concentrate
L8‧‧‧分離液L8‧‧‧Separation solution
L9‧‧‧透析水L9‧‧‧dialysis water
L10‧‧‧再生去離子水L10‧‧‧ Regenerated deionized water
第一圖為本發明表面處理濕製程清洗液循環利用系統的示意圖。The first figure is a schematic diagram of the surface treatment wet process cleaning liquid recycling system of the present invention.
第二圖為本發明系統中雙極電透析單元及電透析儲存單元的功能示意圖。The second figure is a functional diagram of the bipolar electrodialysis unit and the electrodialysis storage unit in the system of the present invention.
L1‧‧‧待處理清洗液L1‧‧‧Washing cleaning solution
L2‧‧‧儲存清洗液L2‧‧‧Storage cleaning solution
L3‧‧‧預先處理液L3‧‧‧Pre-treatment liquid
L4‧‧‧濃縮液L4‧‧‧ Concentrate
L5‧‧‧滲透液L5‧‧‧ Permeate
L6‧‧‧儲存濃縮液L6‧‧‧Storage concentrate
L7‧‧‧透析濃縮液L7‧‧‧Dialyte Concentrate
L8‧‧‧分離液L8‧‧‧Separation solution
L9‧‧‧透析水L9‧‧‧dialysis water
L10‧‧‧再生去離子水L10‧‧‧ Regenerated deionized water
10‧‧‧清洗液儲存槽10‧‧‧cleaning fluid storage tank
20‧‧‧碳纖維過濾器20‧‧‧Carbon fiber filter
22‧‧‧臭氧產生器22‧‧Ozone generator
30‧‧‧逆滲透分離單元30‧‧‧ reverse osmosis separation unit
40‧‧‧濃縮液儲存槽40‧‧‧ Concentrate storage tank
50‧‧‧雙極電透析單元50‧‧‧Bipolar electrodialysis unit
60‧‧‧電透析儲存單元60‧‧‧Electric dialysis storage unit
70‧‧‧吸附分離單元70‧‧‧Adsorption separation unit
80‧‧‧後級樹脂吸附單元80‧‧‧After resin adsorption unit
Claims (10)
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| TW101120010A TWI460005B (en) | 2012-06-04 | 2012-06-04 | Surface treatment of wet process cleaning fluid recycling system |
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| TWI285632B (en) * | 2005-01-18 | 2007-08-21 | Wei-Chun Huang | Sewage treatment-recycling system for PCB manufacturing process and method thereof |
| CN101193823A (en) * | 2005-06-09 | 2008-06-04 | 株式会社荏原制作所 | Electrodialysis device, wastewater treatment method and fluorine treatment system |
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| TWI285632B (en) * | 2005-01-18 | 2007-08-21 | Wei-Chun Huang | Sewage treatment-recycling system for PCB manufacturing process and method thereof |
| CN101193823A (en) * | 2005-06-09 | 2008-06-04 | 株式会社荏原制作所 | Electrodialysis device, wastewater treatment method and fluorine treatment system |
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