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TWI456038B - Composition for antistatic coating - Google Patents

Composition for antistatic coating Download PDF

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Publication number
TWI456038B
TWI456038B TW100106161A TW100106161A TWI456038B TW I456038 B TWI456038 B TW I456038B TW 100106161 A TW100106161 A TW 100106161A TW 100106161 A TW100106161 A TW 100106161A TW I456038 B TWI456038 B TW I456038B
Authority
TW
Taiwan
Prior art keywords
solvent
weight
group
antistatic
antistatic coating
Prior art date
Application number
TW100106161A
Other languages
Chinese (zh)
Other versions
TW201137102A (en
Inventor
Kana Okazaki
Gosuke Kikutsuji
Toru Oya
Original Assignee
Toyo Ink Mfg Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2010119958A external-priority patent/JP4600605B1/en
Priority claimed from JP2010249073A external-priority patent/JP4678451B1/en
Application filed by Toyo Ink Mfg Co filed Critical Toyo Ink Mfg Co
Publication of TW201137102A publication Critical patent/TW201137102A/en
Application granted granted Critical
Publication of TWI456038B publication Critical patent/TWI456038B/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24—Electrically-conducting paints
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C08K5/053—Polyhydroxylic alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/24—Homopolymers or copolymers of amides or imides
    • C09D133/26—Homopolymers or copolymers of acrylamide or methacrylamide
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)

Claims (5)

一種防靜電用塗層組成物，其係含有：防靜電性共聚物(A)、具有3個以上乙烯性不飽和基之化合物(B)、光聚合引發劑(C)及溶劑(D)的防靜電用塗層組成物，該防靜電性共聚物(A)係將下述通式(1)所示具有四級銨鹽基之化合物(a-1)、及下述通式(2)所示具有氧化烯鏈之化合物(a-2)作為必需構成成分之共聚物，該溶劑(D)含有下述任一種：(i)醇系溶劑(d-1)及碳數3至5之乙酸酯系溶劑(d-2)；(ii)醇系溶劑(d-1)及選自碳酸酯類、或者環狀醚類的溶劑(d-3)，相對於該化合物(B)100重量份，該防靜電性共聚物(A)含有1至20重量份、該光聚合引發劑(C)含有0.1至20重量份，在該(i)之情形，在該(A)至(D)之合計100重量%中，含有溶劑(D)30至80重量%，在該溶劑(D)之100重量%中，醇系溶劑(d-1)之含量為5至25重量%、碳數3至5之乙酸酯系溶劑(d-2)之含量為55至90重量%，在該(ii)之情形，在該(A)至(D)之合計100重量%中，含有溶劑(D)20至80重量%，在該溶劑(D)之100重量%中，醇系溶劑(d-1)之含量為5至30重量%，選自碳酸酯類、或者環狀醚類的溶劑(d-3)之含量為20至95%：通式(1)CH2 =C(R1 )COZ(CH2 )k N+ (R2 )(R3 )R4 ‧X- (式中，R1 表示H或CH3 ；R2 至R4 表示各自獨立地碳數1至9之烴基；Z表示氧原子或NH基；k表示1至10之整數；X- 表示1價陰離子)通式(2)CH2 =C(R5 )COO(AO)n R6 (式中，R5 表示H或CH3 ；R6 表示氫或碳數1至22之烴基；n表示2至200之整數、A表示碳數2至4之伸烷基)。An antistatic coating composition comprising: an antistatic copolymer (A), a compound (B) having three or more ethylenically unsaturated groups, a photopolymerization initiator (C), and a solvent (D) The antistatic coating composition, which is a compound (a-1) having a quaternary ammonium salt group represented by the following formula (1), and the following formula (2) A compound (a-2) having an oxyalkylene chain as an essential constituent component, and the solvent (D) contains any one of the following: (i) an alcohol solvent (d-1) and a carbon number of 3 to 5 Acetic acid solvent (d-2); (ii) alcohol solvent (d-1) and solvent (d-3) selected from carbonates or cyclic ethers, relative to the compound (B) 100 The antistatic copolymer (A) contains 1 to 20 parts by weight, and the photopolymerization initiator (C) contains 0.1 to 20 parts by weight, in the case of (i), in the (A) to (D) parts by weight The total amount of 100% by weight of the solvent (D) is 30 to 80% by weight, and the content of the alcohol-based solvent (d-1) is 5 to 25% by weight and the carbon number in 100% by weight of the solvent (D). The content of the acetate solvent (d-2) of 3 to 5 is 55 to 90% by weight, and in the case of (ii), the total of 100 (A) to (D) The amount % contains 20 to 80% by weight of the solvent (D), and the content of the alcohol solvent (d-1) is 5 to 30% by weight in 100% by weight of the solvent (D), which is selected from the group consisting of carbonates, Or the content of the solvent (d-3) of the cyclic ether is 20 to 95%: general formula (1) CH2 =C(R1 )COZ(CH2) )k N+ (R2 ) (R3 )R4 ‧X- (in the formula, R1 Indicates H or CH3 ;R2 To R4 Representing a hydrocarbon group independently having a carbon number of 1 to 9; Z represents an oxygen atom or an NH group; k represents an integer of 1 to 10; X- Represents a monovalent anion) formula (2) CH2 =C(R5 )COO(AO)n R6 (where, R5 Indicates H or CH3 ;R6 Represents hydrogen or a hydrocarbon group having 1 to 22 carbon atoms; n represents an integer of 2 to 200, and A represents an alkylene group having 2 to 4 carbon atoms). 如申請專利範圍第1項之防靜電用塗層組成物，其中通式(1)中R2 至R4 係各自獨立，無取代之碳數為1至9之烷基，通式(2)中R6 係氫或無取代之碳數1至22之烷基。For example, the antistatic coating composition of the first application of the patent scope, wherein R2 in the general formula (1) To R4 Individually independent, unsubstituted alkyl having 1 to 9 carbon atoms, and R6 in the general formula (2) Hydrogen or unsubstituted alkyl having 1 to 22 carbon atoms. 如申請專利範圍第1或2項之防靜電用塗層組成物，其中醇系溶劑(d-1)係選自由甲醇、乙醇、異丙醇、正丁醇、異丁醇、環己醇；2-甲氧基乙醇、2-乙氧基乙醇、2-丙氧基乙醇、2-丁氧基乙醇；1-甲氧基-2-丙醇、3-甲氧基-1-丙醇、1-乙氧基-2-丙醇、2-乙氧基-1-丙醇及3-乙氧基-1-丙醇所構成群組。The antistatic coating composition according to claim 1 or 2, wherein the alcohol solvent (d-1) is selected from the group consisting of methanol, ethanol, isopropanol, n-butanol, isobutanol, and cyclohexanol; 2-methoxyethanol, 2-ethoxyethanol, 2-propoxyethanol, 2-butoxyethanol; 1-methoxy-2-propanol, 3-methoxy-1-propanol, A group consisting of 1-ethoxy-2-propanol, 2-ethoxy-1-propanol and 3-ethoxy-1-propanol. 如申請專利範圍第1或2項之防靜電用塗層組成物，其中選自碳酸酯類、或者環狀醚類的溶劑(d-3)，係選自由碳酸二甲酯、碳酸二乙酯、碳酸甲乙酯、1,3-二噁戊烷(dioxolane)、1,4-二氧陸圜(dioxane)、四氫呋喃、四氫哌喃所構成群組。The antistatic coating composition according to claim 1 or 2, wherein the solvent (d-3) selected from the group consisting of carbonates or cyclic ethers is selected from the group consisting of dimethyl carbonate and diethyl carbonate. A group consisting of ethyl methyl carbonate, 1,3-dioxolane, 1,4-dioxane, tetrahydrofuran, and tetrahydropyran. 一種防靜電薄膜，其特徵為將使用到如申請專利範圍第1至4項中任一項之防靜電塗層用組成物的防靜電層，形成於三乙醯基纖維素透明支持體之至少一面而成。An antistatic film characterized in that an antistatic layer using the composition for an antistatic coating according to any one of claims 1 to 4 is formed on at least a triacetyl cellulose transparent support. Made from one side.
TW100106161A 2010-04-01 2011-02-24 Composition for antistatic coating TWI456038B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010085013 2010-04-01
JP2010119958A JP4600605B1 (en) 2010-04-01 2010-05-26 Antistatic coating composition
JP2010249073A JP4678451B1 (en) 2010-11-05 2010-11-05 Antistatic coating composition

Publications (2)

Publication Number Publication Date
TW201137102A TW201137102A (en) 2011-11-01
TWI456038B true TWI456038B (en) 2014-10-11

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KR (1) KR101050748B1 (en)
CN (1) CN102212280B (en)
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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101471629B1 (en) * 2013-08-30 2014-12-11 주식회사 서현케미칼 Organic solvent composition and paint composition comprising the same
CN104341914A (en) * 2014-10-14 2015-02-11 凤阳徽亨商贸有限公司 Dirt-resistant mold-resistant paint for glass doors and preparation method thereof
KR20190011755A (en) * 2016-06-27 2019-02-07 디아이씨 가부시끼가이샤 Active energy ray curable composition and film using the same
CN107687722A (en) * 2017-07-18 2018-02-13 浦江县顺光科技有限公司 A kind of multifunctional efficient air source heat pump
CN107525305A (en) * 2017-07-18 2017-12-29 兰溪市拜瑞珂科技服务有限公司 Low energy consumption air source heat pump
KR102289974B1 (en) * 2019-12-06 2021-08-13 주식회사 두산 Adhesive film

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6363739A (en) * 1986-09-04 1988-03-22 Mitsubishi Rayon Co Ltd Resin composition excellent in antistatic property and transparency
TWI302161B (en) * 2001-07-30 2008-10-21 Sanko Chemical Co Ltd
CN101370654A (en) * 2006-02-22 2009-02-18 木本股份有限公司 Antistatic hard-coated film

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0673305A (en) * 1991-03-26 1994-03-15 Mitsubishi Rayon Co Ltd Coating composition for synthetic resin moldings having excellent scratch resistance and antistatic properties
JPH08311366A (en) * 1995-05-24 1996-11-26 Mitsubishi Rayon Co Ltd Coating resin composition, synthetic resin molded article excellent in antistatic property, and method for producing the same
JP4382963B2 (en) 2000-05-16 2009-12-16 三菱レイヨン株式会社 Photo-curable resin composition, laminate and display front plate
JP2005103922A (en) * 2003-09-30 2005-04-21 Nippon Paper Industries Co Ltd Hard coat film and its production method
JP4670745B2 (en) * 2006-06-12 2011-04-13 日本化成株式会社 Antistatic composition, antistatic layer and antistatic film
KR101414461B1 (en) * 2007-06-25 2014-07-03 주식회사 동진쎄미켐 Antistatic coating composition and method for producing antistatic coating film using the same
JP5359137B2 (en) * 2007-09-12 2013-12-04 大日本印刷株式会社 OPTICAL LAMINATE, ITS MANUFACTURING METHOD, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE
JP5338126B2 (en) * 2008-04-28 2013-11-13 住友大阪セメント株式会社 Antistatic hard coat film-forming coating material, antistatic hard coat film, plastic substrate with antistatic hard coat film, and method for producing plastic substrate with antistatic hard coat film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6363739A (en) * 1986-09-04 1988-03-22 Mitsubishi Rayon Co Ltd Resin composition excellent in antistatic property and transparency
TWI302161B (en) * 2001-07-30 2008-10-21 Sanko Chemical Co Ltd
CN101370654A (en) * 2006-02-22 2009-02-18 木本股份有限公司 Antistatic hard-coated film

Also Published As

Publication number Publication date
CN102212280B (en) 2015-10-14
CN102212280A (en) 2011-10-12
KR101050748B1 (en) 2011-07-20
TW201137102A (en) 2011-11-01

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