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TWI339875B - An interconnect structure, a method for fabricating the same and a wafer - Google Patents

An interconnect structure, a method for fabricating the same and a wafer

Info

Publication number
TWI339875B
TWI339875B TW095148767A TW95148767A TWI339875B TW I339875 B TWI339875 B TW I339875B TW 095148767 A TW095148767 A TW 095148767A TW 95148767 A TW95148767 A TW 95148767A TW I339875 B TWI339875 B TW I339875B
Authority
TW
Taiwan
Prior art keywords
fabricating
wafer
same
interconnect structure
interconnect
Prior art date
Application number
TW095148767A
Other languages
English (en)
Other versions
TW200807622A (en
Inventor
Hsien Wei Chen
Anbiarshy Wu
Shih Hsun Hsu
Shangyun Hou
Hsueh Chung Chen
Shin Puu Jeng
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Publication of TW200807622A publication Critical patent/TW200807622A/zh
Application granted granted Critical
Publication of TWI339875B publication Critical patent/TWI339875B/zh

Links

Classifications

    • H10W20/0698—
    • H10W72/019—
    • H10P74/277—
    • H10W20/42—
    • H10W72/9232—
    • H10W72/932—
    • H10W72/934—
    • H10W72/952—
TW095148767A 2006-07-19 2006-12-25 An interconnect structure, a method for fabricating the same and a wafer TWI339875B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/458,501 US7714443B2 (en) 2006-07-19 2006-07-19 Pad structure design with reduced density

Publications (2)

Publication Number Publication Date
TW200807622A TW200807622A (en) 2008-02-01
TWI339875B true TWI339875B (en) 2011-04-01

Family

ID=38971966

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095148767A TWI339875B (en) 2006-07-19 2006-12-25 An interconnect structure, a method for fabricating the same and a wafer

Country Status (2)

Country Link
US (1) US7714443B2 (zh)
TW (1) TWI339875B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8013333B2 (en) 2008-11-07 2011-09-06 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor test pad structures
US8309957B2 (en) * 2009-04-16 2012-11-13 Texas Instruments Incorporated Replacement of scribeline padframe with saw-friendly design
US8723325B2 (en) * 2009-05-06 2014-05-13 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method of forming a pad structure having enhanced reliability
US8294276B1 (en) * 2010-05-27 2012-10-23 Amkor Technology, Inc. Semiconductor device and fabricating method thereof
US9632109B2 (en) 2011-06-30 2017-04-25 Advantest Corporation Methods, apparatus, and systems for contacting semiconductor dies that are electrically coupled to test access interface positioned in scribe lines of a wafer
JP5953974B2 (ja) * 2011-09-15 2016-07-20 富士通セミコンダクター株式会社 半導体装置及び半導体装置の製造方法
US10090214B2 (en) * 2012-10-15 2018-10-02 Infineon Technologies Ag Wafer and method for processing a wafer
US9768221B2 (en) 2013-06-27 2017-09-19 Taiwan Semiconductor Manufacturing Company, Ltd. Pad structure layout for semiconductor device
US9859265B2 (en) 2014-06-06 2018-01-02 Taiwan Semiconductor Manufacturing Company, Ltd. Package structure and methods of forming the same
US9748187B2 (en) * 2014-12-19 2017-08-29 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer structure and method for wafer dicing
CN107680954B (zh) * 2016-08-01 2019-12-10 中芯国际集成电路制造(北京)有限公司 半导体测试单元及半导体测试结构
TWI637462B (zh) * 2017-11-15 2018-10-01 奕力科技股份有限公司 晶圓結構
US11443991B2 (en) 2020-05-29 2022-09-13 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor structure and method of manufacture

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6365967B1 (en) 1999-05-25 2002-04-02 Micron Technology, Inc. Interconnect structure
US6306750B1 (en) 2000-01-18 2001-10-23 Taiwan Semiconductor Manufacturing Company Bonding pad structure to prevent inter-metal dielectric cracking and to improve bondability
US6373137B1 (en) 2000-03-21 2002-04-16 Micron Technology, Inc. Copper interconnect for an integrated circuit and methods for its fabrication
US6909196B2 (en) 2002-06-21 2005-06-21 Micron Technology, Inc. Method and structures for reduced parasitic capacitance in integrated circuit metallizations
US6908841B2 (en) * 2002-09-20 2005-06-21 Infineon Technologies Ag Support structures for wirebond regions of contact pads over low modulus materials
US6709965B1 (en) 2002-10-02 2004-03-23 Taiwan Semiconductor Manufacturing Company Aluminum-copper bond pad design and method of fabrication
US6890828B2 (en) 2003-06-05 2005-05-10 International Business Machines Corporation Method for supporting a bond pad in a multilevel interconnect structure and support structure formed thereby
US7057296B2 (en) * 2003-10-29 2006-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Bonding pad structure
US7924131B2 (en) * 2006-05-19 2011-04-12 Freescale Semiconductor, Inc. Electrical component having an inductor and a method of formation

Also Published As

Publication number Publication date
US7714443B2 (en) 2010-05-11
US20080020559A1 (en) 2008-01-24
TW200807622A (en) 2008-02-01

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