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TWI330660B - Halogen-free, thermal resistant composition - Google Patents

Halogen-free, thermal resistant composition Download PDF

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Publication number
TWI330660B
TWI330660B TW095146836A TW95146836A TWI330660B TW I330660 B TWI330660 B TW I330660B TW 095146836 A TW095146836 A TW 095146836A TW 95146836 A TW95146836 A TW 95146836A TW I330660 B TWI330660 B TW I330660B
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Taiwan
Prior art keywords
halogen
temperature resistant
maleimide
high temperature
epoxy resin
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TW095146836A
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English (en)
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TW200825159A (en
Inventor
Feng Po Tseng
Jung Mu Hsu
Jing Pin Pan
Tzong Ming Lee
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Ind Tech Res Inst
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Priority to TW095146836A priority Critical patent/TWI330660B/zh
Priority to US11/878,099 priority patent/US7834070B2/en
Publication of TW200825159A publication Critical patent/TW200825159A/zh
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415Five-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4014Nitrogen containing compounds
    • C08G59/4042Imines; Imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3462Six-membered rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0373Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0209Inorganic, non-metallic particles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Epoxy Resins (AREA)

Description

1330660 九、發明說明: 【發明所屬之技術領域】 本發明係關於-種無由耐高溫級成物,更特別關於應 用於硬式I路板、軟式電路板、封裝、封裝、或 .LED封裝等領域之無函奈高溫組成物。 【先前技#f】 • 近成年來’全世界光電產業的大量投資加速了消費市 場對質與量的需求’特別是在輕薄短小的尺寸要求上。由 於電子產品的開發主軸之一為高密度封裝,多種封裝材料 與封裝技術已被開發如下:捲帶式自動接合(Tape
Automated Bonding,TAB)與薄膜覆晶(chip 〇n Film,c〇F) 可應用於消費性電子3C產品、大型電腦、液晶顯示器、 A 1C 卡,了撓式印刷電路板(Fiexibie Printed Circuit Board,FPC)可應用於筆記型電腦、汽車工業、通信工業、 # 或引線膠 T(lead frame tape)。上述之 tab、COF、或 FPC 均需焊錫製程將電子元件黏著於印刷電路板之銅鉑上,而 焊錫的瞬間高熱可達288°C以上,故封裝材料的耐熱性可 .提高尺寸穩定性,同時減少電子線路在對準上的誤差《此 外,由於積體電路層數的增加,在通電時產生的熱量亦會 造成電子兀件溫度提高,故接著劑與封裝材料需具有高耐 熱性如南Tg以提高電子元件操作時的穩定度。 一般多層軟性印刷電路板或多層卷帶式自動接合所用 之接著劑多為壓克力或環氧樹脂,但兩者之耐熱性及抗藥 0954-A21849TWF(N2);P54950035TW;hsuhuche 5 1.330660 縮水甘油峻(diglycidyl ether of bisphenol A)、或環氧曱苯盼 醛(epoxy cresol novolac)。在此,環氧樹脂的作用如同溶 劑,可避免使用高沸點的溶劑如T -丁基内酯的缺點。將上 述的混合物以110〜130°C反應約2〜7小時,藉以形成馬 * 來亞醯胺改質之環氧樹脂。本組成物將來在聚合反應後可 * 交聯形成互穿式共聚物。雙馬來亞醯胺與馬來亞醯胺交聯 之共聚物與環氧樹脂之間不會產生交聯反應,各自獨立但 彼此交錯形成本發明之無鹵耐高溫組成物。 • 取100重量份上述之無鹵耐高溫組成物,配合添加 0.5〜1.5重量份之催化劑、30〜70重量份之硬化劑、或 100〜300重量份之無機粉體,可作為印刷電路板基板材 料。催化劑可加快環氧樹脂交聯速度,如三氟化硼單乙胺 (borontrifluoride monoethylamine,BF3.MEA)或 1-氰基乙 基-2-乙基-4-曱基口米 υ坐(i-cyanoethyl-2-ethyl-4-methyl-imidazole,2E4Mz-CN)。硬化劑可與環氧樹脂進行交聯反 應,增加環氧樹脂交聯度,如乙二胺、間二胺化苯、對二 春胺化笨、曱基四氫苯 Sf (methyl tetrahydrophthalic anhydride ’ ΜΤΗΡΑ)、甲基六氫苯酐(methyl hexahydrophthalic anhydride,MHHPA)、二胺基二苯基石風 (4,4’-Diamino-diphenyl sulfone,DDS)、或聚硫醇。為提高 . 組成物之難燃性質,可添加無機粉體如氫氧化鋁、氧化鋁、 . 二氧化矽或其混合物。 為提高上述組成物之韌度,可視情況添加50〜300重量 份 之叛化 丙稀猜 (carboxyl-terminated butadiene-acrylonitrile,CTBN)。羧化丙烯腈一般溶於低沸 0954-»A21849TWF(N2);P54950035TW;hsuhuche 9 L330660 著放至烘箱以12(TC/1小時、20(TC/2小時的條件硬化。 實施例3 將5g改質之環氧樹脂(SHELL CHEMICAL Co.所售之 EPON-828,含i〇%雙馬來亞醯胺與馬來亞醯胺混合物)、 1.5gDDS、以及〇.〇5gBF3*MEA加入100mL燒杯,於室溫 下攪拌均勻10分鐘後真空脫泡20分鐘,接著放至烘箱以 120°C/1小時、200°C/2小時的條件硬化。 實施例4 將5g改質之環氧樹脂(SHELL CHEMICAL Co·所售之 EPON-828’含15%雙馬來亞醯胺與馬來亞醯胺混合物)、 1.5gDDS、以及〇.〇5gBF3.MEA加入100mL燒杯,於室溫 下授拌均勻10分鐘後真空脫泡20分鐘,接著放至烘箱以 120°C/1小時、200°C/2小時的條件硬化。 比較例2
將5g環氧樹脂(SHELL CHEMICAL Co.所售之 EPON-828)、1.5g DDS、以及 〇.〇5g BF3.MEA 加入 l〇〇mL 燒杯’於室溫下攪拌均勻l〇分鐘後真空脫泡20分鐘,接 • 著放至烘箱以120°C/1小時、200°C/2小時的條件硬化。 實施例5 將5g改質之環氧樹脂(SHELL CHEMICAL Co.所售之 EPON-828’含5%雙馬來亞醯胺與馬來亞醯胺混合物)、3.5g MHHPA、以及 0_05g SA-l〇2(Air Products 所售之觸媒)加入 ' 1⑻mL燒杯,於室溫下攪拌均勻10分鐘後真空脫泡2〇分 鐘’接著放至烘箱以12CTC/1小時、180°C/2小時的條件硬 化。 實施例6 0954-A2 ί 849TWF(N2) ;P54950035TW;hsuhuche 13 1-330660 將5g改貝之每氣樹脂(SHELL CHEMICAL Co.所售之 EPON-828,含 1〇。/储 w °又馬來亞醯胺與馬來亞醯胺混合物)、 3.5g MHHPA、以及〇 〇5g sa_i〇2加入1〇〇此燒杯,於室 ,皿下授拌均句1G分鐘後真空脫、泡2Q >鐘,接著放至烘箱 以 120C/1 小時、 ^ 1⑽C/2小時的條件硬化。 實施例7 將5g改質气環氧樹脂(SHELL CHEMICAL Co.所售之 EPON-828 ’含15%雙馬來亞醯胺與馬來亞醯胺混合物)、 3.5g MHHPA、以及 0 〇5g SA_1〇2 加入 1〇〇mL 燒杯,於室 溫下授摔均勾10分鐘後真空脫泡2〇分鐘,接著放至烘箱 以120。(:/1小時、i8〇〇C/2小時的條件硬化。 比較例3 將5g環氧樹脂(ShELl CHEMICAL Co.所售之
EPON-828)、3.5g MHHPA、以及 0.05g SA-102 加入 i〇〇mL 燒杯’於室溫下攪拌均勻l〇分鐘後真空脫泡2〇分鐘,接 著放至烘箱以120。(:/1小時、180。(:/2小時的條件硬化。 第2表 改質之環 828 DDS MHHPA BF3.MEA SA-102 Tg(°C) Swt%裂解 371 實施例2 5g __ 1.5R 0.05g 205 實施例3 5g 1.5s 0.05g ___ 226 實施例4 5g — 1.5g .. 〇.〇5g 245 比較例2 •響 1.5g _ 0.05g 180 實施例5 5g — 3.5g _ _ _ 〇.〇5g 155 實施例6 5g 3.5g _ 0.05g 167 —----- —~—. 實施例7 5g 3.5g 0.05g 180 ------- 0954-A21849TWF(N2);P54950035TW;hsuhuche 14 1330660 比較例3 5g 3.5g — 0.05g 145 ____ 由第2表可知,以馬來亞醯胺改質之環氧樹脂具有較 高之裂解溫度與Tg,比未改質之環氧樹脂更適用於電子材 料的接著及絕緣。 • 雖然本發明已以數個較佳實施例揭露如上,然其並非 . 用以限定本發明,任何所屬技術領域中具有通常知識者, 在不脫離本發明之精神和範圍内,當可作任意之更動與潤 飾,因此本發明之保護範圍當視後附之申請專利範圍所界 φ 定者為準。
0954-A21849TWF(N2);P54950035TW:hsuhuche 15 L330660 【圖式簡單說明】 無。 【主要元件符號說明】 無0
0954-A21849TWF(N2);P54950035TW;hsuhuche 16

Claims (1)

1330660 f ,第 95146836 號十、申請專利範圍: 修正日期:9?
磨正本 1. 一種無鹵耐高溫組成物,包括: 一混合物,包括一雙馬來亞酸胺與一馬來亞醯胺,該 雙馬來亞醯胺與該馬來亞醯胺之莫耳比為99: 1〜50: 50; ' 一巴比土酸(Barbituric acid,BTA ),該混合物與該 . 巴比土酸之莫耳比為93 : 7〜80 : 20 ;以及 一環氧樹脂,其中(該混合物與該巴比土酸)對該環氧樹 脂之重量比為5 : 95 ~ 50 : 50 ; • 其中該無鹵耐高溫組成物不含環氧樹脂以外的溶劑。 2. 如申請專利範圍第1項所述之無鹵耐高溫組成物, 其中該雙馬來亞醯胺之結構式如下:
CH3 CH3 I I (CH2)i2一,一CH2—丫一CH2-CH—CH2—CH2—, ch3
3.如申請專利範圍第1項所述之無鹵耐高溫組成物, 其中該馬來亞醯胺包括N-苯基馬來亞醯胺、N-(鄰曱基苯 17 1330660 « ,第 95146836 號 矜年f月"Bnh楚,止替佚頁 修正日期:99·8^1-修i本 基)-馬來亞醯胺、N-(間曱基苯基)-馬來亞醯胺、N-(對甲基 苯基)-馬來亞醯胺、N-環己烷基馬來亞醯胺、馬來亞醯胺、 馬來亞醯胺基酚、馬來亞醯胺基苯并環丁烯、含磷馬來亞 醯胺、磷酸基馬來亞醯胺、氧矽烷基馬來亞醯胺、N-(四氫 吡喃基-氧基苯基)馬來亞醯胺、或2,6-二甲苯基馬來亞醯 胺。 4.如申請專利範圍第1項所述之無齒耐高溫組成物, 其中該巴比土酸之結構式如下:
HN NH
其中R!、Ri各自獨立,包括: 一Η , —ch3 ,—> 一CH(CH3)2,-ch2ch(ch3)2,一CH2CH2CH(CH3)2, 或一 ch(ch2)2ch3 。 • CH3 5.如申請專利範圍第1項所述之無鹵耐高溫組成物,其 中該環氧樹脂包括驗醒·縮水甘油醚、四縮水甘油基亞甲基 二苯胺、二縮水甘油鄰苯二酸、雙苯酚A縮水甘油醚、或 « 環氧甲苯酚醛。 ' 6. —種無鹵耐高溫接著劑,包括: 100重量份之無鹵耐高溫組成物,包括: 一混合物,包括一雙馬來亞醯胺與一馬來亞醯胺,該 雙馬來亞醯胺與該馬來亞醯胺之莫耳比為99: 1〜50: 50; 18 月"曰晗(更)i替換頁 "济正本j 1330660 ^ 第95146836號 修正日期:99.8.11 • 一巴比土酸(Barbituric acid,BTA ),該混合物與該 巴比土酸之莫耳比為93 : 7〜80 : 20 ;以及 一環氧樹脂,其中(該混合物與該巴比土酸)對該環氧樹 脂之重量比為5 : 95〜50 : 50 ; ' 其中該無鹵耐高溫組成物不含環氧樹脂以外的溶劑; , 30〜70重量份之硬化劑,包括乙二胺、間二胺化苯、 對二胺化苯、曱基四氫苯酐、曱基六氫苯酐、二胺基二苯 基砜、或聚硫醇; • 0.5-1.5重量份之催化劑,包括三氟化硼單乙胺、或1- 氰基乙基-2-乙基-4-曱基咪唑; 100〜300重量份之無機粉體,包括氫氧化鋁、氧化鋁、 • 二氧化矽或其混合物。 • 7.如申請專利範圍第6項所述之無鹵耐高溫接著劑, 係作為印刷電路板基板材料。 8.如申請專利範圍第6項所述之無鹵耐高溫接著劑,更包 括50〜300重量份之緩化丙稀腈。 ® 9.如申請專利範圍第8項所述之無鹵耐高溫接著劑, 係作為1C封裝、LCD封裝、LED封裝、或高分子聚合物 之接著劑。 . 10.如申請專利範圍第9項所述之無鹵耐高溫接著劑, 其中該高分子聚合物包括聚醯亞胺、聚醯亞胺醚、聚醯胺 酯、聚胺醯亞胺、液晶高分子、聚對苯二曱酸乙二醇酯、 或上述之組合。
TW095146836A 2006-12-14 2006-12-14 Halogen-free, thermal resistant composition TWI330660B (en)

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TW095146836A TWI330660B (en) 2006-12-14 2006-12-14 Halogen-free, thermal resistant composition
US11/878,099 US7834070B2 (en) 2006-12-14 2007-07-20 Halogen-free and thermal resistant composition

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