TWI328142B - - Google Patents
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- TWI328142B TWI328142B TW095110566A TW95110566A TWI328142B TW I328142 B TWI328142 B TW I328142B TW 095110566 A TW095110566 A TW 095110566A TW 95110566 A TW95110566 A TW 95110566A TW I328142 B TWI328142 B TW I328142B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- weight
- parts
- film
- Prior art date
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- 239000011342 resin composition Substances 0.000 claims description 66
- 229920005989 resin Polymers 0.000 claims description 50
- 239000011347 resin Substances 0.000 claims description 50
- 239000002253 acid Substances 0.000 claims description 43
- -1 aromatic tetracarboxylic acid Chemical class 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000470 constituent Substances 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 11
- 239000003999 initiator Substances 0.000 claims description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 238000011161 development Methods 0.000 claims description 5
- 125000004427 diamine group Chemical group 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims description 2
- 239000003505 polymerization initiator Substances 0.000 claims description 2
- 229920002125 Sokalan® Polymers 0.000 claims 1
- 239000004584 polyacrylic acid Substances 0.000 claims 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 25
- 239000010408 film Substances 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 15
- 239000000243 solution Substances 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 150000004985 diamines Chemical class 0.000 description 7
- 239000012299 nitrogen atmosphere Substances 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 150000002923 oximes Chemical class 0.000 description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 6
- 229920000768 polyamine Polymers 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229940113088 dimethylacetamide Drugs 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 150000000000 tetracarboxylic acids Chemical group 0.000 description 3
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- QWQFVUQPHUKAMY-UHFFFAOYSA-N 1,2-diphenyl-2-propoxyethanone Chemical compound C=1C=CC=CC=1C(OCCC)C(=O)C1=CC=CC=C1 QWQFVUQPHUKAMY-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- HUDYANRNMZDQGA-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]ethanone Chemical compound CN(C)C1=CC=C(C(C)=O)C=C1 HUDYANRNMZDQGA-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- LNBMZFHIYRDKNS-UHFFFAOYSA-N 2,2-dimethoxy-1-phenylethanone Chemical compound COC(OC)C(=O)C1=CC=CC=C1 LNBMZFHIYRDKNS-UHFFFAOYSA-N 0.000 description 1
- JZWGLBCZWLGCDT-UHFFFAOYSA-N 2,7-dichloronaphthalene-1,4,5,8-tetracarboxylic acid Chemical compound ClC1=CC(C(O)=O)=C2C(C(=O)O)=CC(Cl)=C(C(O)=O)C2=C1C(O)=O JZWGLBCZWLGCDT-UHFFFAOYSA-N 0.000 description 1
- UOFDVLCOMURSTA-UHFFFAOYSA-N 2-(2-carboxyphenoxy)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1OC1=CC=CC=C1C(O)=O UOFDVLCOMURSTA-UHFFFAOYSA-N 0.000 description 1
- RWXMAAYKJDQVTF-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl prop-2-enoate Chemical compound OCCOCCOC(=O)C=C RWXMAAYKJDQVTF-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- HZMXJTJBSWOCQB-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl prop-2-enoate Chemical compound COCCOCCOC(=O)C=C HZMXJTJBSWOCQB-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- KFXLXEQCRFGDRU-UHFFFAOYSA-N 2-methylbenzohydrazide Chemical compound CC1=CC=CC=C1C(=O)NN KFXLXEQCRFGDRU-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- OWKVONYXJNKQRG-UHFFFAOYSA-N 2-phenoxyethyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCCOC1=CC=CC=C1 OWKVONYXJNKQRG-UHFFFAOYSA-N 0.000 description 1
- TWBPWBPGNQWFSJ-UHFFFAOYSA-N 2-phenylaniline Chemical group NC1=CC=CC=C1C1=CC=CC=C1 TWBPWBPGNQWFSJ-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical group C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- SMDGQEQWSSYZKX-UHFFFAOYSA-N 3-(2,3-dicarboxyphenoxy)phthalic acid Chemical compound OC(=O)C1=CC=CC(OC=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O SMDGQEQWSSYZKX-UHFFFAOYSA-N 0.000 description 1
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- HGQASDIBBJWJMZ-UHFFFAOYSA-N 4-(4-amino-2-chlorophenyl)-3-chloro-2,6-dimethoxyaniline Chemical group COC1=C(N)C(OC)=CC(C=2C(=CC(N)=CC=2)Cl)=C1Cl HGQASDIBBJWJMZ-UHFFFAOYSA-N 0.000 description 1
- QGYPADVOHRLQJM-UHFFFAOYSA-N 4-(4-amino-2-ethenylphenyl)-3-ethenylaniline Chemical group C=CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C=C QGYPADVOHRLQJM-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- WJMQNPAEXWNWMD-UHFFFAOYSA-N 4-[9-(4-aminophenyl)-10h-anthracen-9-yl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)C2=CC=CC=C2CC2=CC=CC=C21 WJMQNPAEXWNWMD-UHFFFAOYSA-N 0.000 description 1
- ZHOYKXCSULIMNR-UHFFFAOYSA-N 4-ethylcyclohexa-2,4-diene-1,1-diamine Chemical compound CCC1=CCC(N)(N)C=C1 ZHOYKXCSULIMNR-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- IZSHZLKNFQAAKX-UHFFFAOYSA-N 5-cyclopenta-2,4-dien-1-ylcyclopenta-1,3-diene Chemical group C1=CC=CC1C1C=CC=C1 IZSHZLKNFQAAKX-UHFFFAOYSA-N 0.000 description 1
- LVGFPWDANALGOY-UHFFFAOYSA-N 8-methylnonyl prop-2-enoate Chemical compound CC(C)CCCCCCCOC(=O)C=C LVGFPWDANALGOY-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- ONIBWKKTOPOVIA-BYPYZUCNSA-N L-Proline Chemical compound OC(=O)[C@@H]1CCCN1 ONIBWKKTOPOVIA-BYPYZUCNSA-N 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- TUNFSRHWOTWDNC-UHFFFAOYSA-N Myristic acid Natural products CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- RWYRPCWCYUBFSU-UHFFFAOYSA-N P(=O)(OCCCCCCCCCC)(O)O.OCCC=CC Chemical compound P(=O)(OCCCCCCCCCC)(O)O.OCCC=CC RWYRPCWCYUBFSU-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 229920000037 Polyproline Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- ONIBWKKTOPOVIA-UHFFFAOYSA-N Proline Natural products OC(=O)C1CCCN1 ONIBWKKTOPOVIA-UHFFFAOYSA-N 0.000 description 1
- 101001012040 Pseudomonas aeruginosa (strain ATCC 15692 / DSM 22644 / CIP 104116 / JCM 14847 / LMG 12228 / 1C / PRS 101 / PAO1) Immunomodulating metalloprotease Proteins 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- INXWLSDYDXPENO-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CO)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C INXWLSDYDXPENO-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- IPZJQDSFZGZEOY-UHFFFAOYSA-N dimethylmethylene Chemical compound C[C]C IPZJQDSFZGZEOY-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- BSDQITJYKQHXQR-UHFFFAOYSA-N methyl prop-2-eneperoxoate Chemical compound COOC(=O)C=C BSDQITJYKQHXQR-UHFFFAOYSA-N 0.000 description 1
- LUCXVPAZUDVVBT-UHFFFAOYSA-N methyl-[3-(2-methylphenoxy)-3-phenylpropyl]azanium;chloride Chemical compound Cl.C=1C=CC=CC=1C(CCNC)OC1=CC=CC=C1C LUCXVPAZUDVVBT-UHFFFAOYSA-N 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- FSAJWMJJORKPKS-UHFFFAOYSA-N octadecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C=C FSAJWMJJORKPKS-UHFFFAOYSA-N 0.000 description 1
- FSUXYWPILZJGCC-UHFFFAOYSA-N pent-3-en-1-ol Chemical group CC=CCCO FSUXYWPILZJGCC-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229940113115 polyethylene glycol 200 Drugs 0.000 description 1
- 229940068918 polyethylene glycol 400 Drugs 0.000 description 1
- 229940057847 polyethylene glycol 600 Drugs 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 108010094020 polyglycine Proteins 0.000 description 1
- 229920000232 polyglycine polymer Polymers 0.000 description 1
- 108010026466 polyproline Proteins 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- ZSLKNYNUPNHOLY-UHFFFAOYSA-N purine-2,7-diamine Chemical compound NC1=NC=C2N(C=NC2=N1)N ZSLKNYNUPNHOLY-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- RSVDRWTUCMTKBV-UHFFFAOYSA-N sbb057044 Chemical compound C12CC=CC2C2CC(OCCOC(=O)C=C)C1C2 RSVDRWTUCMTKBV-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- RYYWUUFWQRZTIU-UHFFFAOYSA-K thiophosphate Chemical compound [O-]P([O-])([O-])=S RYYWUUFWQRZTIU-UHFFFAOYSA-K 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 230000017105 transposition Effects 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1075—Partially aromatic polyimides
- C08G73/1082—Partially aromatic polyimides wholly aromatic in the tetracarboxylic moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
- C08K5/101—Esters; Ether-esters of monocarboxylic acids
- C08K5/103—Esters; Ether-esters of monocarboxylic acids with polyalcohols
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
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13281,42 (1) 九、發明說明 【發明所屬之技術領域】 本發明係有新穎的含有含矽氧烷之聚醯胺酸樹脂所成 物的感光性樹脂組成物,及使用其形成絕緣皮膜之電路基 板者。詳細而言’係有關適合於印刷配線板用光阻組成物 或形成其硬化膜之新穎的含有含矽氧烷之聚醯胺酸樹脂的 感光性樹脂組成物,及使用其形成絕緣皮膜之電路基板者 【先前技術】 近年來’由於紫外線硬化型之感光性樹脂組成物的高 生產性、低公害性 '省能量性等各種原因,大量使用於塗 •料、黏著劑、光阻等廣範圍之領域。在印刷配線板加工領 域,焊劑光阻油墨等各種油墨方式之被覆材料,從已往之 網版印刷方式改變爲紫外線硬化型組成物。又,隨電子技 • 術之顯著進步而發展高密度化及輕量化,已往之剛性基板 亦以撓性基板替代。 通常使用油墨爲被覆材料時,硬化後之被覆材料的特 性,在剛性基板所使用之被覆材料中並不要求柔軟性;撓 性基板使用被覆材料時,爲顯現撓性基板之特性,要求被 覆材料之柔軟性更高者。 因此’特開7 — 2072 1 1號公報上有,含有環氧樹脂與 含不飽和基之單羧酸及羧酸酐的反應生成物之含不飽和基 的聚羧酸樹脂、與光聚合引發材料之硬化性感光材料的記 -6- (2) 1328142 \ 載。但是,如此之材料,不能確保充分的柔軟性或可動性 ,缺乏耐折性;又,加工後基板產生翹曲等不適之情況, 多方面要求其改善。因此,特開2004 - 294882號公報上有 ’以顯現低彈性之成份的矽氧烷聚醯胺爲主成份之組成物 的提案。如此之組成物,雖可減低加工後之基板翹曲,但 有高價、組成物之室溫儲存穩定性不良之問題。 專利文獻1 :特開平7-207211號公報 • 專利文獻2:特開2004 — 294882號公報 【發明內容】 [發明所欲解決之課題] 本發明提供賦予硬化物可動性之感光性樹脂組成物, _ 同時以提供具有耐折性或彎曲性優越之柔軟性,於室溫下 - 之儲存穩定性優異、硬化或加工之際不必高溫處理之絕緣 皮膜爲目的。 [課題之解決手段] 本發明的工作同仁,爲解決上述課題,經深入探討不 斷硏究之結果發現,含有含具有特定之矽氧烷部位及不飽 和基之芳香族部位的聚醯胺酸樹脂所成之感光性樹脂組成 物,能解決上述課題’完成本發明。 即,本發明係一種感光性樹脂組成物,其特徵爲相對 於含有含: 下述式(1)所示之構成單位30〜9 5莫耳%、 (3) 1328142 式(2)所示之構成單位5〜7〇莫耳%、及 式(3)所示之構成單位0〜5〇莫耳%, 的矽氧烷之聚醯胺酸樹脂100重量份,配合卜2〇重量份之 光聚合引發劑作爲必要成份所成。 【化1】
(式中,Ar爲由芳香族四羧酸去除羧基之4 一價四錢酸 殘基;R!爲碳數1〜6之烷基或苯基;R2爲碳數2~6之伸院基 或伸苯基; <爲〇~1〇之數;R3爲2價之基或直鍵;R4爲 CH2 = CH- R6 —所示之基;R6爲直鍵、碳數1〜6之伸烷基或 伸苯基;R5爲由二胺化合物去除胺基之2價殘基;惟一般 式(1)及(2)中所含之二胺殘基者除外;又,m、η及〇爲各 構成單位之存在莫耳比,m爲0.3〜0.95、η爲0.05〜0.7及〇爲 -8- (4) 1328142 0〜0.5之範圍。還有,式(1)~ (3)中之Ar,可爲相同或相異 者)。 上述感光性樹脂組成物係’相對於含矽氧烷之聚醯胺 酸樹脂100重量份,配合卜20重量份之光聚合引發劑及 5〜60重量份之單官能或多官能的丙烯酸酯作爲必要成份所 成。 又,本發明,係將上述感光性樹脂組成物,溶解於溶 φ 劑所成之清漆狀感光性樹脂組成物。進而,本發明,係將 上述清漆狀感光性樹脂組成物,塗佈於基板薄膜上,經乾 燥所成之薄膜狀感光性樹脂組成物。又,本發明,係將上 述感光性樹脂組成物,塗佈於導體層經圖型化之電路基板 上形成皮膜後,進行曝光、顯像、硬化而得之形成負型絕 ' 緣皮膜的電路基板。 [發明之實施形態] • 詳細說明本發明如下。 本發明之含矽氧烷的聚醯胺酸樹脂,具有上述式(1) 及(2)所示之構成單位,以具有式(3)所示之構成單位爲佳 。式(1)、(2)及(3)中,^爲由芳香族四羧酸去除羧基之4 價四羧酸殘基’可分別爲相同或相異者,可爲兩種以上者 〇 式(〗)中’ Ri爲碳數1〜6之烷基或苯基;以碳數1〜2 之烷基爲佳;R2爲碳數2〜6之伸烷基或伸苯基;以碳數 2〜4之伸烷基佳;ί爲〇〜〗〇之數; < 之平均値以7〜10爲 -9- ' (5) 1328142 佳。樹脂中’式(1)所示之構成單位的存在量爲3〇〜9 5莫 耳%之範圍,較佳爲40〜90莫耳%,更佳爲50〜80莫耳% 〇 式(2)中,R3爲2價之基或直鍵,以選自直鍵,ch2、 C(CH3)2及S02之任一爲佳。尺4爲CH2 = CH~R6—所示之 基;R6爲直鍵、碳數1〜6之伸烷基或伸苯基;從反應性 之點而言’ R4以乙烯基爲佳。樹脂中,式(2)所示之構成 φ 單位的存在量爲5~70莫耳%之範圍,較佳爲5〜30莫耳% 〇 式(3)中’ 115爲2價之二胺殘基,並非式(1)及式(2)中 所含之二胺殘基。樹脂中,式(3)所示之構成單位的存在 量爲〇〜50莫耳之範圍,較佳爲5〜30莫耳%。 - 上述式(1)〜(3)所示之構成單位,係二胺與芳香族四羧 酸類反應而得之醯胺酸鍵結’其一部份可爲醯亞胺化。但 是,爲確保良好之鹼顯像性,其醯亞胺化率以未達30%爲 φ 佳。 式(1)~(3)中之Ar,爲由芳香族四羧酸去除四羧酸之4 價殘基;大多使用芳香族四羧酸二酐作爲芳香族四竣酸類 之故,藉由芳香族四羧酸二酐說明Ar之例。芳香族四羧 • 酸二酐,有如下之化合物。均苯四甲酸二酐、2,2',3, 3,_、2,3,3',4'—或 3,3,,4,4,一二苯甲酮四羧酸 一酐 '2,3’ 6’ 7—、1 > 2 ' 4 > 5 —、1’4’5’8—、1 ,2,6,7—或 1,2,5,6 -萘四羧酸二酐 '4 ’8 —二甲 其 _],2,3,5,6,7— 六氫萘一1,2,5,6-四羧酸二
-10- (6) 1328142 酐、2,6 —或 2,7—二氯萘—1,4,5,8_四羧酸二酐 、2’ 3,6’ 7 —(或 1,4’ 5,8—)四氯案一1’ 4,5’ 8 — (2,3,6,7—)四羧酸二酐、3,3,,4,4’—、2,2',3, 3·-或 2,3,3,,4'一聯苯四羧酸二酐、3,3",4,4"— 、2,3 ’ 3",4 ” —或2,2 ”,3,3 ” 一對—三聯苯四羧酸二 酐、2,2-雙(2,3—或3, 4一二羧基苯基)丙烷二酐 '雙 (2,3 —二羧基苯基)醚二酐、雙(2,3 —或3,4一二羧基 苯基)甲烷二酐、隹(2,3_或3,4—二羧基苯基)颯二酐 ' 1,1 一雙(2,3 —或3,4一二羧基苯基)乙烷二酐、2,3 ,8 > 9— 、3,4,9,10 — 、4,5,10,11—或 5,6,11 ,12—茈四羧酸二酐、1,2,7,8—、1,2,6,7—或 1 ,2’ 9,10 —菲四竣酸二酐、環戊院—1,2,3,4 —四殘 - 酸二酐、卩比曉一2,3,5’ 6 —四殘酸二酐、卩比略院—2,3 . ’ 4’ 5 —四殘酸二酐、唾吩_2,3’ 4,5~四殘酸二酐、 4 ’ V —氧代二苯二甲酸二酐。又,此等可一種或兩種以 φ 上混合使用。較佳爲均苯四甲酸酐、4,4,_氧代二苯甲 酸二酐、二苯甲酮四羧酸二酐、聯苯四羧酸二肝、聯苯酸 四殘酸一酐等。此等之中’以一苯甲酮四殘酸二酐、聯苯 四羧酸二酐更佳。 式(3)中之Rs’爲由上述式(1)及(2)中所含之二胺化合 物除外的二胺化合物去除胺基之2價殘基;藉由以二胺化 合物說明Rs時,有下述之化合物 '對苯二胺、間苯二胺 、4, 4’一二胺基二苯基甲烷、4, 4·—二胺基苯基乙烷、4 ,4•一二胺基苯基酸、4, 4’-二(二胺基苯基)硫化物、4 -11 - (7) 1328142 ’ 4'—二(二胺基苯基)砸、1,5~二胺基萘、3,3_二甲 基一 4,4·—二胺基聯苯、5 —胺基—1一(41_胺基苯基)_ 1,3,3_三甲基茚滿、4,4'—二胺基苯甲醯苯胺、3,5 —二胺基_4·—三氟甲基苯甲酿苯胺、3,4,一二胺基二苯 基醚、2,7_二胺基芴、2,2 —雙(4 一胺基苯基)六氟丙 院、4,4'—亞甲基—雙(2 —氣苯胺)、2,2',5,5'—四氯 一4,4'—二胺基聯苯、2,2'—二氯一 4,4'—二胺基二甲 • 氧基聯苯、3,3'—二甲氧基一4,4’一二胺基聯苯、4,4· _二胺基_2’ 2·—雙(二氣甲基)聯苯、2,2_雙[4— (4_ 胺基苯氧基)苯基]丙烷、2’ 2 —雙[4一(4 一胺基苯氧基)苯 基]六氟丙院、1 ’ 4一雙(4 —胺基苯氧基)苯、4,4,一雙(4 -胺基苯氧基)聯苯、1,3'—雙(4一胺基苯氧基)苯、9,9 • —雙(4一胺基苯基)芴、4, 4’一(對—亞苯基異亞丙基)雙 - 苯胺、4’ 4'一(間一亞苯基異亞丙基)雙苯胺、2,2'_雙 [4 一(4 _胺基_2—三氟甲基)苯氧基]八氧聯苯、羥基胺基 • 聯苯等。 就本發明中所使用之含矽氧烷的聚醯胺酸樹脂製造方 法之一例說明如下。 首先’將芳香族酸二酐加入溶劑中予以溶解。將其攪 拌’同時在冰冷下於氮氣氣體環境中,徐徐加入含有兩種 以上矽氧烷二胺之二胺。其後藉由2〜8小時之攪拌進行反 應’即得含砂氧院之聚醯胺酸樹脂。以此方法所得之含矽 氧院的聚醒胺酸樹脂,爲聚合度相異之混合物。還有,將 二胺之添加方法改變等’可作爲無規聚合型或嵌段聚合型 -12- (8) 1328142 之聚醯胺酸樹脂。 進行上述反應之溶劑,可使用三乙二醇二甲醚、二乙 二醇二甲醚、二甲基乙醯胺、N_甲基吡咯烷酮等有機溶 劑或此等之混合溶劑。 酸二酐與二胺以大略等莫耳量加入爲佳。又,反應藉 由在室溫以下,較佳爲Ot附近進行,可不進行醯亞胺化 而聚合。藉由改變二胺與芳香族酸二酐之使用比例,可改 B 變聚合度。 如此而得之含矽氧烷的聚醯胺酸樹脂,與光聚合引發 劑混合即得感光性樹脂組成物。此含矽氧烷之聚醯胺酸樹 脂,可使用於要求硬化後亦具有可動性之柔軟性的用途, 適合爲感光性樹脂組成物中所使用的樹脂成份。又,側鏈 具有羧基之故,亦適合於以鹼水溶液顯像。 - 本發明之感光性樹脂組成物,以含矽氧烷之聚醯胺酸 樹脂與光聚合引發劑爲必要成份,因應需求可添加其他樹 • 脂、由丙烯酸酯等單體所成之樹脂成份(樹脂成份包含單 體)、增感劑、溶劑。藉由如此之組成物,不僅具有更優 越之作爲感光性樹脂組成物的特性,且擴大其用途。還有 ,加入溶劑成清漆狀之感光性樹脂組成物,雖稱爲清漆狀 之感光性樹脂組成物,在沒必要特別區分時,代表感光性 樹脂組成物。又,就各成份(溶劑除外)之配合量或配合比 例的說明中,係以不含溶劑之狀態加以說明。 調製感光性樹脂組成物之際,配合丙烯酸酯時,所使 用之單官能丙烯酸酯有,例如丙烯酸2 -乙基己基酯、丙 -13- (9) 1328142 烯酸2—羥基乙基酯、丙烯酸2—羥基丙基酯、2—羥基乙 基丙烯醯基磷酸酯、丙烯酸2—甲氧基乙氧基乙基酯、丙 燒酸2 -乙氧基乙氧基乙基酿、丙靖酸四氣糠基醋、丙燒 酸苯氧基乙基酯、丙烯酸異癸基酯、丙烯酸(十八)烷基酯 、丙烯酸(十二)烷基酯 '丙烯酸環氧丙基酯、丙烯酸烯丙 基酯、丙烯酸乙氧基酯、丙烯酸甲氧基酯' 丙烯酸N,N, -二甲基胺基乙基酯、丙烯酸苄基酯、2_羥基乙基丙烯 # 醯基磷酸酯'丙烯酸二環戊二烯基酯'丙烯酸二環戊二烯 乙氧基酯等。多官能丙烯酸酯有,丙烯酸二環戊烯基酯、 丙烯酸二環戊烯基氧乙基酯、1,3- 丁二醇二丙烯酸酯、 1 ’ 4一 丁二醇一丙烯酸酯、1,6— 丁二醇二丙烯酸酯、二 乙二醇一丙烯酸酯、季戊二醇二丙烯酸酯 '聚乙二醇200 - 二丙烯酸酯、聚乙二醇400二丙烯酸酯、聚乙二醇600二 - 丙烯酸酯、羥基三甲基乙酸酯季戊二醇二丙烯酸酯、三乙 二醇二丙烯酸酯、雙(丙烯氧基乙氧基)雙酚A、雙(丙烯氧 9 基乙氧基)四溴雙酚A、三丙二醇二丙烯酸酯、三羥甲基 丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、三(2 —羥基乙基 )三聚異氰酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙 烯酸酯、二季戊四醇單羥基五丙烯酸酯等。本發明之感光 性樹脂組成物中,配合丙烯酸酯時,丙烯酸酯可使用一種 以上;相對於含矽氧烷之聚醯胺酸樹脂1 00重量份,可添 加5〜60重量份,較佳爲10〜30重量份。 光聚合引發劑有,例如苯乙酮、2,2 —二甲氧基苯乙 酮 '對—二甲基胺基苯乙酮、米希勒酮 '二苯基乙二酮、 -14- 1328142 do) 、苯偶姻、苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻異丙基 醚、苯偶姻正丙醚、苯偶姻正丁基醚、苄基二甲基縮酮、 噻噸酮、2_氯噻噸酮、2 —甲基噻噸酮、2—羥基—2 —甲 基—1 一苯基—1—酮、1 一(4 —異丙基苯基)_2_羥基—2 一甲基丙烷_1_酮、甲基苯甲醯基甲酸酯' 1_羥基環己 基苯基酮等各種光聚合引發劑可使用。光聚合引發劑之較 佳使用量,相對於含矽氧烷之聚醯胺酸樹脂100重量份, φ 爲1〜20重量份,更佳爲1〜10重量份。 又,亦適合配合增感劑,此情況,增感劑可使用二苯 甲酮等。增感劑,相對於含矽氧烷之聚醯胺酸樹脂100重 量份,可添加0.01〜2重量份,較佳爲0.05〜0.5重量份。 本發明之感光性樹脂組成物,可藉由各種有機溶劑調 ' 整黏度等。所使用之較佳有機溶劑有,三乙二醇二甲醚、 - 二乙二醇二甲醚、二甲基乙醯胺、N—甲基吡略烷酮、丙 二醇單甲醚乙酸酯、乳酸乙酯或此等之混合溶劑。溶劑之 # 使用量,相對於感光性樹脂組成物之固形份1 00重量份, 以10〜2 00重量份之範圍爲佳。還有,含1〇重量%以上之 溶劑在常溫爲液狀的感光性樹脂組成物,稱爲清漆狀感光 性樹脂組成物。又,在製造聚醯胺酸樹脂之際,殘留使用 爲反應溶劑之有機溶劑時,以溶劑計算。 感光性樹脂組成物,可加入具有與環氧羧基反應之官 能基的成份,其添加量在不損及室溫儲存穩定性之範圍, 相對於感光性樹脂組成物100重量份,可添加未達10重 量份,較佳爲未達5重量份。 -15- (11) 1328142 又,感光性樹脂組成物中,因應需求在不損及焊劑光 阻之諸特性的範圍可添加酞菁綠、酞菁藍等眾所周知的顏 料。此情況顏料之較佳添加量,相對於感光性樹脂組成物 (固形份)爲1〜20重量%。進而,本發明之感光性樹脂組成 物中,因應需求可添加眾所周知的塡料,亦可應用爲感光 性塗料。 本發明之感光性樹脂組成物的固形份(包含單體,溶 φ 劑除外)之較佳組成如下。 含矽氧烷之聚醯胺酸樹脂:50〜99wt%,較佳爲 6 0 〜9 0 w t %、 光聚合引發劑:1〜20wt%,較佳爲2〜20wt%、 增感劑:〇~2wt%,較佳爲0.05〜0.5wt%、 - 其他之樹脂,由丙烯酸酯等單體所成之樹脂成份: . 0~45wt%,較佳爲 10〜30wt%。 本發明之感光性樹脂組成物,在樹脂成份中以較佳之 • 上述比率配合上述各種添加物或溶劑,藉由均勻混合,可 顯現柔軟性及諸特性。又,可爲黏性液體、清漆狀、油墨 狀或將其塗佈於基材薄膜上經乾燥而得之薄膜狀等。 本發明之感光性樹脂組成物,可依通常之使用方法使 用;使用於配線基板(電路基板)時,可採用網版印刷機或 塗佈機直接塗佈於基板上至5~10 0yra之厚度,較佳爲 10〜4 Oyra之厚度。經塗佈之組成物,於50〜12 0°C予以適度 乾燥,其後採用形成所定之光罩圖型的光罩,進行選擇性 曝光,以鹼水溶液使未曝光部份顯像,可藉由於120〜200 -16- (12) 1328142 °C之溫度進行20〜120分鐘之熱處理而硬化。又,亦可採 用預先將感光性樹脂組成物形成薄膜狀,使其層壓於配線 基板之方法。由層壓所得之電路基板,可採用與上述同樣 之曝光、顯像、熱硬化的方法。 如此,由塗佈或層壓而得之配線基板/感光性樹脂層 所成的層合體,由於本發明之感光性樹脂組成物的柔軟性 優越之故,特別適合於撓性配線基板之加工使用。其他, φ 使用本發明之感光性樹脂組成物的配線基板,由於感光性 樹脂組成物之硬化物特性爲耐熱性、耐電鍍性、耐濕性等 的平衡良好之故,適合於要求此等特性之用途。 使本發明之感光性樹脂組成物形成薄膜狀感光性樹脂 組成物時,藉由將感光性樹脂組成物之溶液塗佈於預先經 ' 脫模處理的PET薄膜等基材上至5~100μιη之厚度,較佳 - 爲1〇〜50ym之厚度;於50〜210°C,較佳爲80〜14(TC進行 假乾燥,可形成薄膜狀感光性樹脂組成物。還有,使用薄 • 膜狀感光性樹脂組成物於配線基板時,一般採用層壓機在 配線基板上予以熱壓黏之方法,其情況之層壓溫度以 2 0~1 00 °C的範圍爲佳。本發明之矽氧烷改性聚醯胺酸樹脂 ,具有雙鍵與羧酸基類之故,以光或熱等進行聚合,形成 具有三維結構之硬化物,由於含矽氧烷單位可保持柔軟性 。藉此,與通常之感光性樹脂單獨或其混合物比較,可賦 予優越之耐熱性、耐濕性、耐電鍍性、可撓性。 本發明之薄膜狀感光性樹脂組成物,不僅微影特性優 越,硬化後具有適度的撓性,耐折性優異。其硬化薄膜之 -17- (13) 1328142 較佳彈性率範圍爲0.1〜lGPa,以0.2〜0.8GPa之範圍更佳 。薄膜之彈性率超過lGPa時,基板之翹曲嚴重,加工特 性降低;另一方面,未達O.IGPa時,耐熱性或強度有容 易下降之傾向。 [產業上利用性] 本發明之感光性樹脂組成物,儲存穩定性高,在使用 紫外線之電路加工後,能以稀鹼水溶液顯像,可在200°C 以下的低溫區域硬化之故,適合於撓性印刷配線板製造時 之焊劑光阻或電鍍光阻時。進而,其硬化物具有高柔軟性 、耐曲折性,彎曲性優越之故,適合使用爲要求此等柔軟 特性之撓性印刷配線板用光阻。 . 【實施方式】 就本發明之實施例具體說明如下。 # 首先,說明本發明所使用之含矽氧烷的聚醯胺酸樹脂 之合成例。 [合成例1 ] 在裝備氮氣注入管之反應器中,將二苯甲酮四殘酸二 酐(BTDA)102.2g溶解於二甲基乙酿胺460g,將反應器冰冷 。於其中加入式(2)之R3爲直鍵、對位爲胺基、間位爲乙 燃基之二胺的2,2’一一乙稀基—4,4'—二胺基聯苯i5〇g ;進而,在氮氣氣體環境下以1小時滴下式(1)中
-18- (14) 1328142 、R2爲(CH2)3、且 < 爲7〜8、數平均分子量約750之矽氧烷 二胺(東麗•陶康寧·西利控公司製,ΒΥ16— 853Χ)188.4§ 。滴下完成後,使反應器內之溫度恢復至室溫’藉由在氮 氣氣體環境下攪拌5小時,即得目標之含矽氧烷的聚醯胺 酸樹脂溶液。由GPC(聚苯乙烯標準品換算)之測定結果’ 所得含矽氧烷聚醯胺酸之數平均分子量:3.3x1 〇4、分子 量分佈:2.64。又,此含矽氧烷聚醯胺酸樹脂之二甲基乙 φ 醯胺溶液(樹脂濃度:40.4wt%)的25°C黏度,使用E型黏度 計測定之結果爲7 5 8 9 c P a * s。 [合成例2] 在裝備氮氣注入管之反應器中,將聯苯四羧酸二酐 • (BPDA) 93.3g溶解於二甲基乙醯胺450g,將反應器冰冷。於 . 其中加入上述2,2'-二乙烯基一4,4'-二胺基聯苯5.0g ; 進而,在氮氣氣體環境下以1小時滴下188.4g之BY — 16 — φ 853X。滴下完成後,使反應器內之溫度恢復至室溫,藉由 在氮氣氣體環境下攪拌5小時,即得含矽氧烷聚醯胺酸樹 脂溶液。 [合成例3] 在裝備氮氣注入管之反應器中,將BTDA 102.2g溶 解於二甲基乙醯胺4 5 0g ’將反應器冰冷。在氮氣氣體環境下 以1小時於其中滴下237.8g之BY — 16 — 853X。滴下完成後, 使反應器內之溫度恢復至室溫,藉由在氮氣氣體環境下攪拌 -19- (15) 1328142 5小時,即得含矽氧烷聚醯胺酸樹脂溶液。 [合成例4]
在裝備氮氣注入管之反應器中,將BTDA 102.2g溶解於 二甲基乙醯胺460g,將反應器冰冷。於其中加入2,2^ —二 乙烯基一4,4’_二胺基聯苯15.0g、與二胺基二苯基醚 (DAPE)38.1g;進而,在氮氣氣體環境下以1小時滴下47.1g之 BY - 16 - 853X。滴下完成後,使反應器內之溫度恢復至室 溫’藉由在氮氣氣體環境下攪拌5小時,即得含矽氧烷聚酿 胺酸樹脂溶液。 [實施例1] ' 相對於合成例1所得之含矽氧烷聚醯胺酸樹脂溶液(含 - 矽氧烷聚醯胺酸樹脂100重量份。以下均同),配合三羥甲 基丙烷三甲基丙烯酸酯(日本化藥公司製SR-350)30重量 • 份、光聚合引發劑(吉巴特殊化學品公司製CGI 124)5重量 份,將其塗佈於預先經脫模處理之PET薄膜上至乾燥後的 膜厚爲25pm;於110 °C乾燥10分鐘,形成薄膜狀感光性樹 脂組成物。薄膜狀感光性樹脂組成物之硬化後的彈性率爲 0.2GPa。還有,彈性率係使薄膜狀感光性樹月旨組成物曝光 、顯像 '硬化後,採用動態黏彈性測定裝置(D Μ A ),以基 本頻率1 1Hz測定時在室溫區域之E'(儲存彈性率)之値。 [實施例2] -20- (16) 1328142 除相對於合成例1所得之含矽氧烷聚醯胺酸樹脂溶液 ,配合1分子中具有6個丙烯基之二季戊四醇六丙烯酸酯( 日本化學公司製DPHA)30重量份’替代三羥甲基丙烷三甲 基丙烯酸酯以外,與實施例1同樣進行’即得薄膜狀感光 性樹脂組成物。薄膜狀感光性樹脂組成物之硬化後的彈性 率爲 0.2GPa。
[實施例3] 相對於合成例2所得之含矽氧烷聚醯胺酸樹脂溶液, 配合SR- 3 5 0(3 0重量份)、CGI 124(5重量份),將其塗佈 於預先經脫模處理之PET薄膜上,於ll〇°C乾燥10分鐘,形 成薄膜狀感光性樹脂組成物。薄膜狀感光性樹脂組成物之 硬化後的彈性率爲〇.3GPa。 [比較例1] # 除使用合成例3所得之含矽氧烷聚醯胺酸樹脂溶液作 爲含矽氧烷聚醯胺酸樹脂以外,進行與實施例1同樣之配 合及薄膜化操作,形成薄膜狀感光性樹脂組成物。薄膜狀 感光性樹脂組成物組成物之硬化後的彈性率爲〇.〇8 GPa。 [比較例2 ] 除使用合成例4所得之含矽氧烷聚醯胺酸樹脂溶液作 爲含矽氧烷聚醯胺酸樹脂以外,進行與實施例1同樣之配 合及薄膜化操作,形成薄膜狀感光性樹脂組成物。薄膜狀
-21 - (17) 1328142 感光性樹脂組成物組成物之硬化後的彈性率爲1.2GPa。 就上述實施例及比較例所得之薄膜狀感光性樹脂組成 物,以下述之評估方法進行微影性能、顯像後之翹曲、耐 折性、室溫儲存穩定性之評估。配合比例與特性之評估結 果如表1所示。還有表中之部爲重量部。 微影性能,係以1%碳酸鈉水溶液評估直徑5〇〇pm之Via 能否解像。詳細而言,係將膜厚25ym之薄膜狀感光性樹脂 φ 組成物,以壓力IMPa、80°C之條件’藉由熱壓黏式滾筒 層壓機,層壓於撓性基板(新日鐵化學公司製耶斯帕內庫 斯:MCI 2 — 20 — 00 CEM)之銅箔面側。於其上使用評估用 光罩,藉由曝光機(哈依鐵庫公司製高壓水銀燈)進行約 4 0 0mJ之曝光。顯像係採用1%碳酸鈉水溶液,於30°C進行 * 150〜200秒鐘,以純水洗淨。表面無雜亂、直徑5 00um之 . Via可解像時爲〇,不能者爲X。 翹曲之評估係採用上述之撓性基板’藉由圓頂之高度 φ 予以評估。詳細而言,係以上述條件將膜厚2 5 u m之薄膜狀 感光性樹脂組成物層壓於上述撓性基板,經曝光、顯像’ 其後於160 t進行60分鐘硬化。將所得形成絕緣皮膜之撓 性基板剪切成40mm x40mm之形狀’測定頂之高度。圓頂 之高度未達5mm者爲〇,其以上者爲X。 耐折性試驗,係評估在1 80°之伸折試驗中至試片斷裂 止的次數。詳細而言,係以上述條件將膜厚25^之薄膜狀 感光性樹脂組成物層壓於厚度12^之銅箔(三井金屬礦山 公司製:3EC — III)之光澤面側,經曝光、顯像、硬化後 -22- (18) 1328142 ,藉由蝕刻完全去除銅箔。將所得薄膜硬化物剪切成寬 8 mm、長100mm,評估在180°之伸折試驗中至試片斷裂止的 次數。10次以上爲〇、未達10次者爲X。 儲存穩定性,係將薄膜狀感光性樹脂組成物,在23 t ,遮光下靜置2星期後,進行該微影之評估,微影性良好之 情況爲〇、不良之情況爲X。
[表1] 實施例1 實施例2 實施例3 比較例1 比較例2 聚醯胺酸樹脂 合成例1 合成例1 合成例2 合成例3 合成例4 100重量份 100重量份 1〇〇重量份 100雷量份 100重量份 丙烯酸酯化合物 30重量份 30重量份 30重量份 30重量份 30重量份 (SR-350) (DPHA) (SR-350) (SR-350) (SR-350) 光引發劑(CGI124) 5重量份 5重量份 5重量份 5重量份 5重量份 微影性能 〇 〇 〇 X 〇 翹曲 〇 〇 〇 〇 X 耐折性 〇 〇 〇 〇 X 儲存穩定性 〇 〇 〇 X 〇 -23-
Claims (1)
- (1) 1328142 十、申請專利範圍 1. 一種感光性樹脂組成物,其特徵爲相對於含有矽 氧烷之含下述: 式(1)所不之構成單位30〜95莫耳:%、 式(2)所示之構成單位5〜70莫耳%、及 式(3)所示之構成單位0〜50莫写;%, 之聚酿胺酸樹脂100重量份,配合卜20重量份之光聚合引 發劑作爲必要成份所成。【化1】⑶ HOOC _N W HV \C〇〇H Rs- II Ο 於此,Ar爲由芳香族四羧酸去除羧基之4價四殘酸殘 基;R,爲碳數之烷基或苯基;h爲碳數2〜6之伸院基或 伸苯基;< 爲〇〜10之數;R3爲2價之基或直鍵;R4爲 -24- (2) 1328142 CH2 = CH-R6—所示之基;R6爲直鍵、碳數1〜6之伸烷基或 伸苯基;R5爲由二胺化合物去除胺基之2價二胺殘基;惟 —般式(1)及(2)中所含之二胺殘基者除外;又’ m、n及0 爲各構成單位之存在莫耳比,m爲0.3 ~0.95、η爲0.05〜0.7 及0爲0〜0.5之範圍。 2. 如申請專利範圍第1項之感光性樹脂組成物,其係 相對於含矽氧烷之聚醯胺酸樹脂100重量份,配合1~20重量 Β 份之光聚合引發劑、及5~60重量份之單官能或多官能丙烯 酸酯作爲必要成份所成。 3. —種清漆狀之感光性樹脂組成物,其特徵爲在申 請專利範圍第1或2項之感光性樹脂組成物中,加入溶劑所成 〇 < 4. 一種薄膜狀之感光性樹脂組成物,其特徵爲將申請 . 專利範圍第3項之清漆狀之感光性樹脂組成物,塗佈於基板 薄膜上經乾燥所成。 鲁 5.—種電路基板,其特徵爲將申請專利範圍第1至第3 項中任一項之感光性樹脂組成物,塗佈於導體層經圖型化之 電路基板上形成皮膜後,進行曝光、顯像、硬化而得之形成 負型絕緣皮膜之電路基板。 -25-
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| JPH09100350A (ja) * | 1995-07-28 | 1997-04-15 | Ube Ind Ltd | 感光性ポリイミドシロキサン、組成物および絶縁膜 |
| JPH09110350A (ja) | 1995-10-18 | 1997-04-28 | Kenji Hasegawa | 複数レーン型エスカレーター(速いエスカレーター) |
| US5914354A (en) * | 1996-08-12 | 1999-06-22 | Shin-Etsu Chemical Co., Ltd. | Radiation-sensitive resin composition |
| US5962113A (en) * | 1996-10-28 | 1999-10-05 | International Business Machines Corporation | Integrated circuit device and process for its manufacture |
| JP3366859B2 (ja) * | 1998-03-05 | 2003-01-14 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性ポリイミド前駆体用現像液及びこれを用いたパターン製造法 |
| JP2000221681A (ja) | 1999-01-28 | 2000-08-11 | Hitachi Chemical Dupont Microsystems Ltd | 感光性樹脂組成物、パターンの製造法及び電子部品 |
| JP4476417B2 (ja) * | 2000-02-29 | 2010-06-09 | 新日鐵化学株式会社 | 赤色カラーレジストインキ及びカラーフィルター |
| US6686106B2 (en) * | 2000-06-26 | 2004-02-03 | Ube Industries, Ltd. | Photosensitive resin compositions, insulating films, and processes for formation of the films |
| JP2002006490A (ja) | 2000-06-26 | 2002-01-09 | Ube Ind Ltd | イミド系感光性樹脂組成物、絶縁膜およびその形成法 |
| JP2002162736A (ja) | 2000-11-22 | 2002-06-07 | Kanegafuchi Chem Ind Co Ltd | 感光性ドライフィルム |
| JP2004294882A (ja) | 2003-03-27 | 2004-10-21 | Nippon Steel Chem Co Ltd | 感光性樹脂組成物及び硬化物 |
| JP4300921B2 (ja) | 2003-07-22 | 2009-07-22 | 富士ゼロックス株式会社 | プリントヘッド |
| JP3995253B2 (ja) * | 2004-09-28 | 2007-10-24 | Tdk株式会社 | 感光性ポリイミドパターンの形成方法及び該パターンを有する電子素子 |
-
2006
- 2006-03-24 US US11/887,420 patent/US8026036B2/en not_active Expired - Fee Related
- 2006-03-24 WO PCT/JP2006/305937 patent/WO2006109514A1/ja not_active Ceased
- 2006-03-24 JP JP2007512486A patent/JP4199294B2/ja not_active Expired - Fee Related
- 2006-03-24 KR KR1020077025163A patent/KR100921149B1/ko not_active Expired - Fee Related
- 2006-03-24 CN CN200680010866.4A patent/CN101151579B/zh not_active Expired - Fee Related
- 2006-03-27 TW TW095110566A patent/TW200705100A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR100921149B1 (ko) | 2009-10-12 |
| TW200705100A (en) | 2007-02-01 |
| KR20080002907A (ko) | 2008-01-04 |
| WO2006109514A1 (ja) | 2006-10-19 |
| US8026036B2 (en) | 2011-09-27 |
| JP4199294B2 (ja) | 2008-12-17 |
| US20090202786A1 (en) | 2009-08-13 |
| CN101151579A (zh) | 2008-03-26 |
| JPWO2006109514A1 (ja) | 2008-10-23 |
| CN101151579B (zh) | 2010-10-06 |
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