TWI319913B - Optoelectronic component with radiation-transparent electrical contact-layer - Google Patents
Optoelectronic component with radiation-transparent electrical contact-layerInfo
- Publication number
- TWI319913B TWI319913B TW092137032A TW92137032A TWI319913B TW I319913 B TWI319913 B TW I319913B TW 092137032 A TW092137032 A TW 092137032A TW 92137032 A TW92137032 A TW 92137032A TW I319913 B TWI319913 B TW I319913B
- Authority
- TW
- Taiwan
- Prior art keywords
- radiation
- layer
- electrical contact
- optoelectronic component
- transparent electrical
- Prior art date
Links
- 230000005693 optoelectronics Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10261675A DE10261675B4 (de) | 2002-12-31 | 2002-12-31 | Optoelektronisches Bauelement mit strahlungsdurchlässiger elektrischer Kontaktschicht |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200423435A TW200423435A (en) | 2004-11-01 |
| TWI319913B true TWI319913B (en) | 2010-01-21 |
Family
ID=32519514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092137032A TWI319913B (en) | 2002-12-31 | 2003-12-26 | Optoelectronic component with radiation-transparent electrical contact-layer |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6979842B2 (zh) |
| JP (1) | JP2004214680A (zh) |
| DE (1) | DE10261675B4 (zh) |
| TW (1) | TWI319913B (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005008056A1 (de) * | 2004-12-30 | 2006-07-13 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip und Verfahren zur Herstellung eines solchen Halbleiterchips |
| EP2259346B1 (en) * | 2008-03-27 | 2019-07-03 | LG Innotek Co., Ltd. | Light-emitting element and a production method therefor |
| DE102015116865B4 (de) | 2015-10-05 | 2025-07-10 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung eines Halbleiterchips und Halbleiterchip |
| DE102016103342A1 (de) * | 2016-02-25 | 2017-08-31 | Aesculap Ag | Gasdurchlässige Filterkassette für einen Sterilbehälter |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA920285A (en) * | 1970-11-30 | 1973-01-30 | L. Hartman Robert | Extending the operating life of light emitting p-n junction devices |
| JPH01265495A (ja) | 1988-04-15 | 1989-10-23 | Gunze Ltd | エレクトロルミネッセンス素子 |
| JP2752423B2 (ja) | 1989-03-31 | 1998-05-18 | 三菱電機株式会社 | 化合物半導体へのZn拡散方法 |
| JP2817590B2 (ja) * | 1993-09-24 | 1998-10-30 | 信越半導体株式会社 | 発光素子の製造方法 |
| JPH07263751A (ja) * | 1994-03-24 | 1995-10-13 | Sharp Corp | Ii−vi族化合物半導体装置及びその製造方法 |
| JPH07307490A (ja) | 1994-05-10 | 1995-11-21 | Daido Steel Co Ltd | 半導体光電素子に対するZnO膜形成方法 |
| US5889295A (en) * | 1996-02-26 | 1999-03-30 | Kabushiki Kaisha Toshiba | Semiconductor device |
| US5789768A (en) | 1997-06-23 | 1998-08-04 | Epistar Corporation | Light emitting diode having transparent conductive oxide formed on the contact layer |
| JPH11135834A (ja) * | 1997-10-27 | 1999-05-21 | Matsushita Electric Ind Co Ltd | 発光ダイオード装置及びその製造方法 |
| DE19829197C2 (de) * | 1998-06-30 | 2002-06-20 | Siemens Ag | Strahlungsaussendendes und/oder -empfangendes Bauelement |
| US6207972B1 (en) | 1999-01-12 | 2001-03-27 | Super Epitaxial Products, Inc. | Light emitting diode with transparent window layer |
| JP4285837B2 (ja) | 1999-06-14 | 2009-06-24 | 昭和電工株式会社 | 窓層を備えたAlGaInP発光素子 |
| JP4376361B2 (ja) * | 1999-07-21 | 2009-12-02 | 昭和電工株式会社 | AlGaInP発光ダイオード |
| JP4298861B2 (ja) * | 1999-08-04 | 2009-07-22 | 昭和電工株式会社 | AlGaInP発光ダイオード |
| JP4232281B2 (ja) | 1999-08-04 | 2009-03-04 | 昭和電工株式会社 | AlGaInP発光ダイオード |
| DE19955747A1 (de) | 1999-11-19 | 2001-05-23 | Osram Opto Semiconductors Gmbh | Optische Halbleitervorrichtung mit Mehrfach-Quantentopf-Struktur |
| JP2002016287A (ja) | 2000-04-28 | 2002-01-18 | Stanley Electric Co Ltd | 半導体素子及び光半導体素子 |
| US6255129B1 (en) * | 2000-09-07 | 2001-07-03 | Highlink Technology Corporation | Light-emitting diode device and method of manufacturing the same |
| JP2002105625A (ja) | 2000-09-27 | 2002-04-10 | Japan Science & Technology Corp | 低抵抗p型酸化亜鉛薄膜の製造方法 |
| US6724013B2 (en) * | 2001-12-21 | 2004-04-20 | Xerox Corporation | Edge-emitting nitride-based laser diode with p-n tunnel junction current injection |
-
2002
- 2002-12-31 DE DE10261675A patent/DE10261675B4/de not_active Expired - Lifetime
-
2003
- 2003-12-26 JP JP2003435310A patent/JP2004214680A/ja active Pending
- 2003-12-26 TW TW092137032A patent/TWI319913B/zh not_active IP Right Cessation
- 2003-12-31 US US10/749,433 patent/US6979842B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE10261675B4 (de) | 2013-08-14 |
| US6979842B2 (en) | 2005-12-27 |
| US20040256629A1 (en) | 2004-12-23 |
| DE10261675A1 (de) | 2004-07-22 |
| JP2004214680A (ja) | 2004-07-29 |
| TW200423435A (en) | 2004-11-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |