TWI319233B - Phase change memory cell and manufacturing method - Google Patents
Phase change memory cell and manufacturing methodInfo
- Publication number
- TWI319233B TWI319233B TW95147744A TW95147744A TWI319233B TW I319233 B TWI319233 B TW I319233B TW 95147744 A TW95147744 A TW 95147744A TW 95147744 A TW95147744 A TW 95147744A TW I319233 B TWI319233 B TW I319233B
- Authority
- TW
- Taiwan
- Prior art keywords
- manufacturing
- memory cell
- phase change
- change memory
- phase
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US75213805P | 2005-12-19 | 2005-12-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200731515A TW200731515A (en) | 2007-08-16 |
| TWI319233B true TWI319233B (en) | 2010-01-01 |
Family
ID=38251629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW95147744A TWI319233B (en) | 2005-12-19 | 2006-12-19 | Phase change memory cell and manufacturing method |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN100583483C (en) |
| TW (1) | TWI319233B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7535756B2 (en) * | 2007-01-31 | 2009-05-19 | Macronix International Co., Ltd. | Method to tighten set distribution for PCRAM |
| JP4846813B2 (en) * | 2009-03-12 | 2011-12-28 | 株式会社東芝 | Nonvolatile semiconductor memory device |
| US20130299884A1 (en) * | 2012-05-10 | 2013-11-14 | Nanya Technology Corporation | Memory device and method for manufacturing memory device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5687112A (en) * | 1996-04-19 | 1997-11-11 | Energy Conversion Devices, Inc. | Multibit single cell memory element having tapered contact |
| US5789277A (en) * | 1996-07-22 | 1998-08-04 | Micron Technology, Inc. | Method of making chalogenide memory device |
| US6147395A (en) * | 1996-10-02 | 2000-11-14 | Micron Technology, Inc. | Method for fabricating a small area of contact between electrodes |
| WO2004008535A1 (en) * | 2002-07-11 | 2004-01-22 | Matsushita Electric Industrial Co., Ltd. | Nonvolatile memory and its manufacturing method |
| KR100979710B1 (en) * | 2003-05-23 | 2010-09-02 | 삼성전자주식회사 | Semiconductor memory device and manufacturing method |
-
2006
- 2006-12-19 CN CN200610168985A patent/CN100583483C/en active Active
- 2006-12-19 TW TW95147744A patent/TWI319233B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| CN100583483C (en) | 2010-01-20 |
| TW200731515A (en) | 2007-08-16 |
| CN1996635A (en) | 2007-07-11 |
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