1306802 九、發明說明： 【發明所屬之技術領域】 發明背景 更特定言 圖案狀基 之 本發明的領域係概括有關結構之奈米製造。 ，本發明係有關一供壓印微影術使用以填充— 材的一凹部之方法 奈米製造係包含譬如具有奈米級數或更小的特性之極 小結構的製造。奈米製造具有可觀影響之_領域係位於積 10體電路的處理。隨著半導體處理業持續努力高的生產良率 且同時增加一基材上所形成之每單位面積的電路，奈米製 造變得益加重要。奈米製造提供較大的程序控制且可進一 步降低所形成結構之最小特性尺寸。已經採用奈米製造之 其他發展特性係包括生物科技、光學科技、機械系統及類 15 似物。 一示範性奈米製造技術係常稱為壓印微影術且詳細地 描述於許多公開案中，諸如名稱為“將特性配置於一基材上 以複製具有極小尺寸變異性的特性之方法及模子’，的以美 國專利申請案10/264,960號提交的美國公開專利申請案 20 2004/0065976號；名稱為“用以形成一層於一基材上以利製 造度量標準”的以美國專利申請案10/264,926號提交的美國 公開專利申請案2004/0065252號；及名稱為“將特性配置於 /基材上以複製具有極小尺寸變異性的特性之方法及模 孑”的以美國專利申請案10/235,314號提交的美國公開專利 5 1306802 申請案2004/0046271號；上述各案皆讓渡予本發明的受讓 人。各上述公開專利申請案所示的基礎壓印微影術技術係 包括形成一浮雕圖案於一可聚合層中及將一對應於浮雕圖 案的圖案轉移至一下方基材内。因此，一具有一模板主動 5 區域之模板係與基材隔開地使用且在模板與基材之間出現 有一可成形液體。液體係被固體化以形成一經固體化層， 其中記錄有一順應於模板主動區域的表面形狀之圖案。基 材及經固體化層隨後係受到將一對應於經固體化層中的圖 案之浮雕圖案轉移至基材内之程序。 10 一將可聚合液體設置於模板與基材之間的方式係藉由 將液體沉積在基材上。其後’可聚合液體同時與模板及基 材接觸以將可聚合液體分散至基材表面上方及填充模板的 特性。需要盡量降低填充模板的特性所需要之時間，亦稱 為填充時間。因此，需要提供經改良之填充一模板的特性 15 之技術。 C 明内】 發明概要 ㈣料_在—基材上之方法及祕之特性係 20 一 ；X液體來填充—基材的凹部以及利用流體亦即施加 2空或-流體纽來移除位於凹部外之基材上所出現的 二Λ I發明的—方法係包括將液體的-分量沉積 中形成有—凹部之基材的—表面上以液體的一部分 來入凹部的一宠薅 ^ 積。一數量的液體係配置在緊鄰於凹部 之表面的區域上。复饴 /、灸該數S的液體係被移除同時使該 6 1306802 部分維持在該容積内。利用此方式，該部分可被轉移至一 額外基材上。更確切言之，該部分可放置成接觸一層可流 動材料且藉由使液體及可流動材料曝露於光化輻射而與其 交聯。這些及其他實施例更進一步討論於下文。 5 圖式簡單說明 第1圖為根據本發明之一微影系統的立體圖； 第2圖為第1圖所示的一微影系統之簡化正視圖，其根 據本發明的一實施例用以生成一圖案狀壓印層； 第3圖為顯示根據本發明的第一實施例包括在第1圖所 10 示的系統中之流體分配機構的詳細側視圖； 第4圖為顯示根據本發明的第二實施例包括在第1圖所 示的系統中之流體分配機構的詳細側視圖； 第5圖為一其上設有一模子之第1圖所示的模板之仰視 圖； 15 第6圖為其上配置有液體可聚合材料之第5圖所示的模 板之簡化側視圖，其中根據本發明採用一真空擦抹件來移 除一數量的液體可聚合材料； 第7圖為一被包括在第6圖所示的真空擦拭件中之孔口 的細部圖； 20 第8圖為耦合至一泵系統之第6圖所示的真空擦抹件之 體部的詳細仰視圖； 第9圖為第8圖所示的一空氣軸承元件之詳細平面圖； 第10圖為第9圖所示的空氣軸承元件沿線10-10所取之 橫剖視圖； 7 1306802 第11圖為顯示與第5圖所示的模板呈疊置之第6圖所示 的體部之簡化平面圖； 第12圖為顯示根據本發明的第一替代性實施例之一真 空擦抹件的簡化平面圖； 5 第13圖為顯示根據本發明的第二替代性實施例之一真 空擦抹件的簡化平面圖； 第14圖為第5圖所示的模板沿線14-14所取之橫剖視 圖， 第15圖為其上配置有一層材料之第1圖所示的一基材 10 之橫剖視圖； 第16圖為根據本發明的一實施例之第15圖所示的基材 藉由第14圖所示的模板將其圖案化之後的橫剖視圖； 第17圖為根據本發明的第一替代性實施例藉由第14圖 所示的模板予以圖案化之第15圖所示的基材之橫剖視圖； 15 第18圖為根據本發明的一實施例其上配置有液體可聚 合層之第14圖所示的模板之橫剖視圖； 第19圖為根據本發明的第二實施例之第1圖所示的基 材藉由第18圖所示的模板將其圖案化之後的橫剖視圖；及 第2 0圖為根據本發明的第三替代性實施例之第15圖所 20 示的基材藉由第18圖所示的模板將其圖案化之後的橫剖視 圖。 【實施方式3 發明的詳細描述 第1圖描繪根據本發明的一實施例之一微影系統10，其 8 1306802 包括-對隔開的橋支揮件12，該對橋支樓件12係具有一橋 14及-延伸於其間的㈣切件16。橋14及階台支撐件16 係分隔開來。一從橋14往階台支撐件16延伸之壓印頭_ 编合至橋14。-動作階台2〇配置於階台支擇件^以面對 5塵印頭18。動作階台20係構形為沿著X及Y轴線相對於階台 支樓件16移動且亦可提供沿著Z轴的運動。-示範性動作階 合裝置係揭露於讓渡予本發明的受讓人且以引用方式併入 本文中之2002年7月11曰提交名稱為“步進及重覆壓印微影 術系統，，的美國專利申請案聊4,414號。一轄射源2咖 合至系統10以將光化輻射衝擊於動作階台2〇上。 參,、.、第1及2圖，其上設有一模子26之模板係連接 至壓印頭18，模板係可界定一平坦或平面性表面或在其中 形成有-圖案。如圖所示，模子26係包括一具有由複數個 隔開的凹部28及突部30所界定的複數個特性之圖案。突部 15 3〇係具有-寬度W，而凹部28具有—寬度％，兩者皆在與 Z轴呈橫向延伸之-方向中測量。複數個特性係界定一原始 圖案’該原始圖案係形成一將轉移至一位於動作階台2〇上 的基材32内之圖案的基礎。因此，壓印頭18適可沿著z轴線 移動且改變模子26與基材32之間的一距離“d，，。或者，戋連 2〇同壓印頭18，動作階台20可使模板24沿著Z軸線移動。利用 此方式’模子26上的特性可壓印至—可流動區域内以將基 材32圖案化，如下文更完整地討論。 輕射源22的設置方式可使模子26定位在輻射源22與基 材32之間，其中由輻射源22產生的光化輕射係傳播經過模 9 1306802 子26。結果，模子26理想上係由大致對於光化輕射呈透明 的材料製造。可用來製造模子26之示範性材料係依據所採 用光化輻射而定包括溶合矽石、石英、矽、有機聚合物、 矽氧烷聚合物、硼矽酸玻璃、氟碳聚合物、金屬及上述各 5物的組合。一示範性系統可得自營業地址位於i8〇7_c1306802 IX. Description of the Invention: [Technical Field of the Invention] Background of the Invention More specifically, the field of the present invention is the field of nanostructures relating to the structure. The present invention relates to a method for using a embossing lithography to fill a recess of a material. The nanofabrication system comprises a fabrication of a very small structure having characteristics such as nanometers or less. Nano-manufacturing has a considerable impact on the field of processing. Nanomanufacturing has become increasingly important as the semiconductor processing industry continues to strive for high production yields while simultaneously increasing the circuit per unit area formed on a substrate. Nanomanufacturing provides greater program control and can further reduce the minimum feature size of the resulting structure. Other developmental characteristics that have been manufactured using nanotechnology include biotechnology, optical technology, mechanical systems, and the like. An exemplary nanofabrication technique is often referred to as imprint lithography and is described in detail in a number of publications, such as the method of "characterizing a property on a substrate to replicate characteristics having minimal dimensional variability and U.S. Patent Application Serial No. 20 2004/0065976, filed on U.S. Patent Application Serial No. Serial No. No. No. No. No. No. No. No. No. No. No. No. U.S. Patent Application Serial No. 2004/0065252 filed on Jun. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. No. U.S. Patent No. 5, 306, 802, filed on Jun. No. No. No. No. No. No. No. No. No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No No An embossed pattern is transferred into a polymerizable layer and a pattern corresponding to the embossed pattern is transferred into a lower substrate. Therefore, a template system having a template active 5 region Separately used and a formable liquid is present between the template and the substrate. The liquid system is solidified to form a solidified layer in which a pattern conforming to the surface shape of the active region of the template is recorded. Substrate and solidified The layer is then subjected to a procedure for transferring a relief pattern corresponding to the pattern in the solidified layer into the substrate. 10 A method of placing the polymerizable liquid between the template and the substrate is by depositing a liquid on the substrate. On the material, the 'polymerizable liquid is simultaneously contacted with the template and the substrate to disperse the polymerizable liquid above the surface of the substrate and fill the template. The time required to fill the template is also minimized, also known as the filling time. Therefore, there is a need to provide an improved technique for filling the characteristics of a template. 15 C. Inventive Summary (4) Material_On-Substrate Method and Secret Characteristics 20; X Liquid to Fill - Substrate Concave And the use of a fluid, i.e., the application of a 2 or -fluid bond to remove the second enamel present on the substrate outside the recess. The method comprises depositing a liquid-component. A portion of the surface of the substrate having the recessed portion is filled with a portion of the liquid into the concave portion. A quantity of the liquid system is disposed on a region adjacent to the surface of the concave portion. The liquid system is removed while maintaining the portion of the 6 1306802 within the volume. In this manner, the portion can be transferred to an additional substrate. More specifically, the portion can be placed in contact with a layer of flowable material and borrowed The liquid and flowable material are crosslinked by exposure to actinic radiation. These and other embodiments are discussed further below. 5 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view of a lithography system in accordance with the present invention; 1 is a simplified front view of a lithography system shown in FIG. 1 for generating a patterned embossed layer in accordance with an embodiment of the present invention; and FIG. 3 is a view showing a first embodiment included in accordance with the present invention. 1 is a detailed side view of a fluid dispensing mechanism in the system shown in FIG. 1; FIG. 4 is a detailed side view showing a fluid dispensing mechanism included in the system shown in FIG. 1 according to a second embodiment of the present invention; Figure 5 a bottom view of the template shown in Fig. 1 having a mold thereon; 15 Fig. 6 is a simplified side view of the template shown in Fig. 5 on which the liquid polymerizable material is disposed, wherein the invention is employed in accordance with the present invention a vacuum wiper to remove a quantity of liquid polymerizable material; Figure 7 is a detail view of an orifice included in the vacuum wiper shown in Figure 6; 20 Figure 8 is coupled to a pump A detailed bottom view of the body of the vacuum wiper shown in Fig. 6 of the system; Fig. 9 is a detailed plan view of an air bearing component shown in Fig. 8; Fig. 10 is an air bearing shown in Fig. 9. A cross-sectional view of the element taken along line 10-10; 7 1306802 Figure 11 is a simplified plan view showing the body shown in Fig. 6 overlapping the template shown in Fig. 5; Fig. 12 is a view showing the body according to the present invention A simplified plan view of a vacuum wiper of a first alternative embodiment; 5 FIG. 13 is a simplified plan view showing a vacuum wiper according to a second alternative embodiment of the present invention; FIG. 14 is a fifth diagram The cross-sectional view of the template shown taken along line 14-14, Figure 15 is for the top A cross-sectional view of a substrate 10 shown in Fig. 1 in which a layer of material is placed; Fig. 16 is a view of the substrate shown in Fig. 15 according to an embodiment of the present invention, which is illustrated by the template shown in Fig. 14. 17 is a cross-sectional view of the substrate shown in FIG. 15 patterned by the template shown in FIG. 14 according to the first alternative embodiment of the present invention; 15 FIG. A cross-sectional view of a template shown in Fig. 14 in which a liquid polymerizable layer is disposed according to an embodiment of the present invention; and Fig. 19 is a substrate borrowed in Fig. 1 according to a second embodiment of the present invention. a cross-sectional view after patterning the template shown in FIG. 18; and FIG. 20 is a substrate shown in FIG. 18 according to a fifth alternative embodiment of the present invention. The cross-sectional view of the template after it is patterned. Embodiment 3 Detailed Description of the Invention FIG. 1 depicts a lithography system 10 according to an embodiment of the present invention, wherein 8 1306802 includes a pair of spaced bridge supports 12 having A bridge 14 and a (four) cut piece 16 extending therebetween. The bridge 14 and the step support 16 are separated. An embossing head _ extending from the bridge 14 to the step support 16 is coupled to the bridge 14. - The action stage 2 is arranged on the stage support member ^ to face the 5 dust print head 18. The action stage 20 is configured to move relative to the stepped member 16 along the X and Y axes and also to provide motion along the Z axis. The exemplary action timing device is disclosed in the assignee of the present invention and is incorporated herein by reference. U.S. Patent Application Serial No. 4,414. A source 2 is coupled to the system 10 to cause actinic radiation to impinge on the action stage 2 。. 参,,., 1 and 2, with a mold on it The template of 26 is attached to an imprint head 18 which defines a flat or planar surface or has a pattern formed therein. As shown, the mold 26 includes a recess 28 and a plurality of recesses 28 The pattern of the plurality of characteristics defined by the portion 30. The protrusion 15 has a width W and the recess 28 has a width %, both of which are measured in a direction extending transversely to the Z axis. Defining an original pattern 'this original pattern forms a basis for a pattern that will be transferred to a substrate 32 located on the action stage 2' 。. Thus, the embossing head 18 is adapted to move along the z-axis and change the mold 26 A distance "d," from the substrate 32. Alternatively, the splicing head 18, the action stage 20, can move the stencil 24 along the Z axis. In this manner, the characteristics on the mold 26 can be embossed into the flowable region to pattern the substrate 32, as discussed more fully below. The light source 22 is arranged in such a way that the mold 26 is positioned between the radiation source 22 and the substrate 32, wherein the actinic light system generated by the radiation source 22 propagates through the modulo 9 1306802. As a result, the mold 26 is desirably made of a material that is substantially transparent to actinic light shots. Exemplary materials that can be used to make mold 26 include fused vermiculite, quartz, tantalum, organic polymers, siloxane polymers, borosilicate glass, fluorocarbon polymers, metals, and the like depending on the actinic radiation employed. A combination of the above five substances. An exemplary system is available from the business address at i8〇7_c
Braker Lane，Suite 100，德州奥斯丁78758的分子壓印公司 (Molecular Imprints)之品名IMPRIO 1〇〇ΤΜ。IMPRIO l〇〇TM 的系統描述可得自www.molecularimprints.com且以引用方 式併入本文中。 10 系統10係利於在基材32上形成一具有與模子26形狀呈 現互補形狀之圖案狀層40。結果，圖案狀層4〇係包括與凹 部28形狀呈現互補之突部46及與突件30形狀呈現互補之凹 部48。圖案狀層40係藉由將可聚合材料放置在基材32與模 子26之間及盡量減少距離“d”而產生，留下具有厚度^的突 15部46及具有厚度h的凹部48。厚度h稱為殘留厚度。“tl，，及 “V’可依應用而身為所需要的任何厚度。 已經達到距離“d”之後，輻射源22產生用以聚合及交聯 圖案層40材料之光化輻射。此程序可重覆數次以順序性圖 案化基材32的不同區域(未圖示），稱為一步進及重覆程序。 20或者，模子26可設定尺寸以使基材32的一表面之整體區域 同時被圖案化，亦即藉由模子26的單一壓印。 根據本發明，藉由將可聚合材料沉積在模子26上來形 成圖案狀層。確切言之，處於可流動/液體狀態之一分量的 可聚合材料係沉積在模子26上。該分量的一部分係侵入一 10 1306802 $多個凹部28内’而填充其容積…數量的該可流動可聚 σ材料刀里係出現在緊鄰於該凹部的一或多個凹部Μ之模 子26的表面區域上’亦即所出現的所有凹部28之容積外。 —般而言，可流動可聚合材料的該部分係填充所出現的各 5凹部28之整體容積。其後，自模子26移除位於凹部28的容 ^外之全部或大致全部錄量的可流動可聚合材料。利用 此方式，換子26之所有或一次群組的凹部Μ係完全地填充 有可流動可聚合材料。 、 、>…、第1及3圖，可利用數種技術來達成可流動可聚人 1〇材料的沉積。譬如，系統H)可包括一或多個可包括―或^ 2噴灑喷嘴之A體分配機構41，其中—個魏噴嘴顯示為 、嘴42。喷嘴42係與—供應部43、可流動可聚合材料及一 泵45呈流體導通。泵Μ提供流體壓力以利材料仙自喷嘴Μ 投射，而確保—充分數量的滴粒(未圖示）累積在模子26上以 主要使其淹溢有一塗層38的可流動壓印材料來確保所有特 性皆被覆蓋及填充。噴嘴42係安裝至動作階台2〇以利使噴 嘴42選擇性地放置成與模子26的任何部分呈現疊置。利用 此方式，塗層38可以所需要的任何圖案沉積在模子％上。 參照第1及4圖’將可流動可聚合材料沉積至模子26之 20另-方式係採用-流體分配機構141，其中流體分配機構 141之一轉移平台47係含有可流動可聚合材料。平台47可選 擇性地配置於模子26與基材32之間，或定位成與純似目 鄰’其中模子26選擇性歧位成狀疊置。财％係放置 成接觸平台47中所包含的可流動可聚合材料。將平台47的 11 1306802 區域建構為可使模子26的整體區域放置成為接觸平台47中 所包含的材料40。可想見可採用此沾塗技術來在模子26上 生成不同於LB(Langmiur-Blodgette)單層之一自我組裝式單 層的可流動可聚合材料。然而，只生成一覆蓋及/或填充模 5 子26之圖案的特性之鄰接塗層38即已足夠。 參照第5圖’可藉由使其受到一諸如氣體等流體物流來 達成位於凹部容積外之該數量的可流動可聚合材料之移 除。因此，可採用一真空擦抹技術、一空氣刀技術或兩者。 兩案例中，模子26係在一諸如X等第一方向中曝露至鄰接於 10 模子26的相對側62及64之間的流體60物流，且在一與第一 方向呈橫向延伸的諸如Y等第二方向中比模子26顯著地更 小。譬如發生沿著γ方向之流體6 〇物流及模子2 6之間的相對 運動，藉以發生從侧66到侧68之運動。這使模子26的整體 區域曝露於流體物流60。 15 參照第5及6圖，一實施例中’流體60物流係由一真空 擦抹件70產生，真空擦抹件70係包括一用以界定一容積74 之體部72，且該體部72具有一用以將該容積置於與一環室 78呈流體導通之孔口 76，該環室78中配置有真空擦抹件 70。容積74被放置成經由一進給線82而與一泵系統8〇呈流 20體導通。泵系統80係在容積74與環室78之間生成一壓力差 異以使容積74被加壓至小於環室78壓力之一位準，譬如， 泵系統80可在容積74内生成一負壓力。上述壓力差異係導 致未配置於凹部28中的液體可聚合材料量自模子26抽離且 進入泵系統80的一貯槽（未圖示）内。然而，壓力差異係經選 12 1306802 擇可使配置於凹部28容積内之液體可聚合材料的部分仍留 存或者薄層的可聚合材料仍覆蓋住凹部28。相對於凹 部128、228及328顯示此作用。 因此，如第7及8圖所示，孔口 76係設有一具有在相對 5端77及79之間沿著X方向測量的長度认沿著γ方向測量的 寬度w之大致呈長方形組態。長度j係在與體部72及模子％ 之間的相對動作呈橫向之—方向中延伸，而寬度胃顯著地小 於長度1。一般而言’長度1係至少比寬度w更大五倍。本範 例中，長度1通常係大於約為25至30公厘之模子26的尺寸， 1〇而寬度界係經選擇可在約〇·49公厘使可聚合標記物具有最 佳化之移除。體部72係配置為可使孔口 74面對模子％且與 其隔開一距離h，其更清楚地顯示於第6圖中。距離h係以數 項因素作為基礎加以選擇，包括配置於模子26上的可聚合 材料之黏度、可聚合材料對於模子26之黏附特徵、及容積 15 74與環室78之間的壓力差異。 參照第6、8及9圖’為了辅助控制高度h，體部72係包 括位於孔口 76侧腹之兩組隔開的空氣軸承且其顯示為8〇及 90。確切言之，孔口 76係延伸於空氣軸承8〇與90之間，其 中端點77定位成緊鄰於空氣軸承8〇且與其隔開。端點79定 20位成緊鄰於空氣軸承90且與其隔開譬如2公厘。空氣轴承8〇 及90係與一可構形為提供所需要的流體流之泵系統1〇〇呈 流體導通。因此’各空氣軸承80及90係包括複數個輪承元 件’其顯示為81-88及91-98。各元件81-88係定位成與其相 鄰的各軸承元件81-88呈抵靠關係以形成在與沿其測量長 13 1306802 度1的方向呈橫向的-方向中呈現共線之-系列的軸承元 件。如圖所*，沿著配置有轴承元件81_88之系列係沿著γ 方向。和用类員似方式，轴承元件91_98係配置於該體部Μ 的一相對側上。 5 參照第9、1〇及11圖，各軸承元件81-88及91-98通常係 與體部72形成-體，且包括體部72的複數個共面區域99、 108及11G。如圖所示，三個多角形區域係同心、地形成為凹 入區域102、104及1〇6。雖然各區域1〇2、1〇4及1〇6具有長 方形’可採用任何形狀，區域1〇2的面積顯著地大於區域1〇4 1〇或是區域106的面積，其中區域106係大於區域104的面積。 區域102係由圍繞區域1〇2之岸面1〇8與區域1〇4分離且約有 1公厘寬度。一額外的岸面11〇係分離區域104及106。岸面 108、110的頂點表面及表面99係位於一共同平面中。一通 徑112係沿著與終止於該體部72中的一開孔（未圖示）中呈現 15橫向之一方向平行於平面Ρ自區域104延伸。一通徑112亦出 現於區域102中’將其置於與泵系統1〇〇流體導通。類似地， 一通徑116係出現在區域106中，將其置於與泵系統100流體 導通。 操作中，在區域102、104及106之間生成一壓力差異， 20其中區域106具有比區域102及104任一者更大的一壓力。一 般而言’泵系統100係將一正流體流導入通徑116内使區域 106加麼成大於環室壓力。泵系統1〇〇通常將一真空施加至 通徑114 ’而在區域102中生成一真空。區域104通常係維持 在環室壓力位準且操作以穩定化出現在區域102及106中之 14 1306802 壓力差異。 參照第6及11圖，體部係放置成與模板％疊置以使孔口 76延伸橫越模子26的—範圍且其中空錄祕及_盘模 ' 子26外之模板24區域呈疊置。採行沿著單-方向之模板24 .5肖體部72之間的相對動作(稱為—通行(pass))來移除液體可 聚合液體，如上文所討論。然而，可依需要藉由將模㈣ 及體部72的一者相對於另一者旋轉90。來簡單地重新定向 • 使得額外通行發生於與第—通行相同的方向中、或是相對 或正交方向中。 —可看出，空氣軸承80及9〇係排列成生成一正流體流以 擊於模板24上將體部72自其推離來維持所需要的間隔 h已經發現，獨立地控制傳播經過泵系統100與通徑114及 之間的流體將是有益的方式。利用此方式，諸如81-83 及91~93所示當一或多個空氣軸承元件不再與模板24疊置 - 夺壓力的驟然改變並未改變與仍和模板24疊置的諸如 _ 4 88及94-98等其餘空氣軸承元件的區域102、104及106相 關耳外之壓力。除了對於空氣軸承元件81-88及91-98之流體流 的獨立控制之外，可藉由將更多空氣軸承元件包括在各空 氣轴承中||以延伸其在移行方向之長度來達成模子％及孔 2〇 口 76之間位置之改良的穩定度。 參照第12圖，替代性實施例中，真空擦抹件17〇可形成 有體部丨72且其中孔口 m配置於一區域175上，而與模子 26隔開—距離h。面對模板74之體部72表面的其餘部分係與 模板74隔開一顯著大於距離h之距離d。利用此方式，區域 15 1306802 175形成一島部。 參照第13圖，另一實施例中’體部272的區域275係凹 入藉以與模子26隔開一距離h。然而，空氣軸承80及9〇係與 模子26外之模板24區域隔開一可能等於或小於距離h之距 5 離s。利用此方式，模子26若如圖所示形成為一台面29，模 子26可定位於空氣軸承80及90之間藉以與其共面。 參照第6圖，一替代性實施例中，真空擦抹件可運作作 為氣體刀。利用此方式，栗系統80在容積74中生成一正壓 力以產生自孔口 76驅排之一高速氣體“片，，(未圖示）。此氣體 10 “片”係移除未填充凹部128、228及328容積之流體數量，而 有效地將其吹去。這可連同真空擦抹件使用以使氣體片自 模子26推動不需要的液體可聚合材料而真空擦抹件係收集 由該片吹去之不需要的液體可聚合材料。可依需要在單一 通行期間發生氣體刀與真空擦抹件之間的交替或在接連的 15 通行之間進行。此外，可建立容積74中的正壓力藉以作為 配置於模子26上且譬如位於凹部128、228及328内之流體的 一乾燥器。利用此方式，將建立氣體“片，’的速度以降低在 乾燥之同時移除模子26上的流體之機率。 本沉積技術係在將基材圖案化時提供增加的彈性。譬 20 如’如第丨4-16圖所示，模子26可設有可流動壓印材料且其 沉積成只留存其出現在凹部28中之如2〇〇、202、204及206 所示的部分。未配置於凹部28内之該數量（未圖示）的可流動 壓印材料並不存在亦即被移除。結果，部分200、202、204 及206可配置於基材32上，基材上可具有一如300所示的既 16 1306802 存層。預存的層可能為數層的一者。譬如，層300可為利用 包括旋塗及滴配技術等任何數量的沉積技術所沉積之可许 動可聚合材料。層300右由一被相同光化輕射所聚合的材料 形成’譬如藉由熱輕射的改變、及紫外光韓射的改變，如 5部分200、202、204及206所示，可以在用以形成層3〇〇的可 流動材料聚合之前沉積部分200、202、204及2〇6。利用此 方式’部分200、202、204及206可與用以形成層3〇〇之材料 同時地聚合以使部分200、202、204及206的材料可與層3〇〇 的材料交聯，而形成一整體的圖案狀層400。結果，層3〇〇 10係界定第2圖所示的殘留厚度k。易言之，圖案狀層4〇的殘 留厚度h係可與被分配以由圖案狀模子26壓印之流體呈現 獨立。或者，可以在層300固體化之後將部分2〇〇、202、204 及206沉積在一層上。利用此方式，部分係在沉積於其上之 後被聚合及交聯。這使得用以形成部分200、202、204及206 15 之經聚合及交聯材料的黏著需展現出對於經固體化層3〇〇 之適當的優先黏著藉以當模子26與之分離時將部分2〇〇、 202、204及206扣持其上。上述優先黏著中，可對於沉積層 300採用額外的沉積技術，包括但不限於原子層沉積、化學 氣相沉積、物理氣相沉積、物理氣相沉旋覆及類似技術。 20 結果，形成了圖案狀層400且其中部分2〇〇、202、204及206 未與層300形成一體而是只與其黏著。此外，可以在部分 200、202、204及206沉積於層300之前完全或部分地固化部 分200、202、204及206。譬如，利用上述乾燥器功能（未圖 示）來達成此作用。隨後，層300係被聚合及交聯。應注意， 17 1306802 可用以形成層300之物係包括與用以形成部分200、202、204 及206者不同之成份組件。譬如，層300可由一有機材料形 成而部分200、202、204及206可由一無機材料形成，且反 之亦成立。 5 參照第18至20圖’然而，應注意當留下未出現於凹部Braker Lane, Suite 100, Molecular Imprints, Austin, Texas 78758, named IMPRIO 1〇〇ΤΜ. A systematic description of IMPRIO lTM is available from www.molecularimprints.com and is incorporated herein by reference. The system 10 facilitates the formation of a patterned layer 40 having a complementary shape to the shape of the mold 26 on the substrate 32. As a result, the patterned layer 4 includes a projection 46 that is complementary in shape to the recess 28 and a recess 48 that is complementary to the shape of the projection 30. The patterned layer 40 is created by placing a polymerizable material between the substrate 32 and the mold 26 and minimizing the distance "d", leaving a protrusion 15 having a thickness ^ and a recess 48 having a thickness h. The thickness h is referred to as the residual thickness. "tl," and "V' can be any thickness desired depending on the application. After the distance "d" has been reached, the radiation source 22 produces actinic radiation for polymerizing and crosslinking the material of the pattern layer 40. This procedure can be repeated several times to sequentially pattern different regions (not shown) of substrate 32, referred to as a step and repeat procedure. Alternatively, the mold 26 can be sized such that the entire area of one surface of the substrate 32 is simultaneously patterned, i.e., by a single embossing of the mold 26. In accordance with the present invention, a patterned layer is formed by depositing a polymerizable material on mold 26. Specifically, a polymerizable material in one of the flowable/liquid states is deposited on the mold 26. A portion of the component is invaded into a 10 1306802 $ plurality of recesses 28 and the volume of the flowable polymerizable σ material is filled in the mold 26 adjacent to the one or more recesses of the recess. On the surface area, that is, the volume of all the recesses 28 that appear. In general, the portion of the flowable polymerizable material fills the overall volume of each of the 5 recesses 28 that are present. Thereafter, all or substantially all of the flowable polymerizable material located outside of the cavity 28 is removed from the mold 26. In this manner, all or a group of recessed tethers of the changer 26 are completely filled with flowable polymerizable material. , , >, Figures 1 and 3, several techniques can be used to achieve the deposition of flowable polymerizable materials. For example, system H) may include one or more A-body dispensing mechanisms 41 that may include - or 2 spray nozzles, wherein - Wei nozzles are shown as mouth 42. The nozzle 42 is in fluid communication with the supply portion 43, the flowable polymerizable material, and a pump 45. The pump Μ provides fluid pressure to facilitate projection of the material from the nozzle , while ensuring that a sufficient amount of granules (not shown) accumulate on the mold 26 to primarily flood the flowable embossing material with a coating 38 to ensure All features are overwritten and populated. Nozzle 42 is attached to the operating stage 2 to facilitate selective placement of the nozzle 42 to overlap any portion of the mold 26. In this manner, the coating 38 can be deposited on the mold % in any pattern desired. Referring to Figures 1 and 4, the flowable polymerizable material is deposited into mold 26. Another way is to employ a fluid distribution mechanism 141, wherein one of the fluid distribution mechanisms 141 has a flowable polymerizable material. The platform 47 is optionally disposed between the mold 26 and the substrate 32, or positioned to be in a form of a purely adjacent 'where the mold 26 is selectively positioned. The % is placed in contact with the flowable polymerizable material contained in the platform 47. The 11 1306802 region of the platform 47 is constructed such that the entire area of the mold 26 is placed into the material 40 contained in the contact platform 47. It is envisioned that this dip coating technique can be used to create a flowable polymerizable material on mold 26 that is a self-assembled monolayer that is different from a single layer of LB (Langmiur-Blodgette). However, it is sufficient to create only a contiguous coating 38 that covers the characteristics of the pattern of the molds 26. Referring to Figure 5, the removal of the quantity of flowable polymerizable material outside the volume of the recess can be achieved by subjecting it to a fluid stream such as a gas. Thus, a vacuum wiping technique, an air knife technique, or both can be employed. In both cases, the mold 26 is exposed to a stream of fluid 60 adjacent the opposite sides 62 and 64 of the 10 mold 26 in a first direction, such as X, and is such as Y extending laterally in a first direction. The second direction is significantly smaller than the mold 26. For example, a relative movement between the fluid 6 〇 flow in the gamma direction and the mold 26 occurs, whereby movement from side 66 to side 68 occurs. This exposes the entire area of the mold 26 to the fluid stream 60. 15 Referring to Figures 5 and 6, in one embodiment the 'fluid 60 stream is produced by a vacuum wipe 70, which includes a body 72 defining a volume 74, and the body 72 There is a port 76 for placing the volume in fluid communication with a ring chamber 78 in which a vacuum wipe 70 is disposed. The volume 74 is placed to be in fluid communication with a pump system 8 through a feed line 82. Pump system 80 creates a pressure differential between volume 74 and annular chamber 78 to cause volume 74 to be pressurized to less than one of the pressures of annular chamber 78. For example, pump system 80 can generate a negative pressure within volume 74. The above pressure difference causes the amount of liquid polymerizable material not disposed in the recess 28 to be withdrawn from the mold 26 and into a sump (not shown) of the pump system 80. However, the pressure difference is selected 12 1306802 such that a portion of the liquid polymerizable material disposed within the volume of the recess 28 remains or the thin layer of polymerizable material still covers the recess 28. This effect is shown with respect to the recesses 128, 228 and 328. Therefore, as shown in Figs. 7 and 8, the orifice 76 is provided with a substantially rectangular configuration having a width w measured along the γ direction between the opposite ends 77 and 79 along the length measured in the X direction. The length j extends in a transverse direction with respect to the relative motion between the body 72 and the mold %, while the width stomach is significantly smaller than the length 1. In general, 'length 1 is at least five times larger than width w. In this example, the length 1 is typically greater than about 25 to 30 mm of the size of the mold 26, and the width is selected to optimize the removal of the polymerizable label at about 〇49 mm. . The body 72 is configured such that the aperture 74 faces the mold % and is spaced a distance h therefrom, which is more clearly shown in Figure 6. The distance h is selected based on a number of factors, including the viscosity of the polymerizable material disposed on the mold 26, the adhesion characteristics of the polymerizable material to the mold 26, and the pressure difference between the volume 15 74 and the annular chamber 78. Referring to Figures 6, 8 and 9', in order to assist in controlling the height h, the body 72 includes two sets of spaced apart air bearings on the flank of the orifice 76 and are shown as 8 and 90. Specifically, the aperture 76 extends between the air bearings 8A and 90, with the end point 77 positioned adjacent to and spaced from the air bearing 8A. End point 79 is positioned 20 immediately adjacent to and spaced apart from air bearing 90, such as 2 mm. The air bearings 8 and 90 are in fluid communication with a pump system 1 that can be configured to provide the desired fluid flow. Thus, 'each air bearing 80 and 90 includes a plurality of wheel bearing members' which are shown as 81-88 and 91-98. Each of the members 81-88 is positioned in an abutting relationship with its adjacent bearing members 81-88 to form a series of bearings that exhibit collinearity in a direction transverse to the direction in which they are measured 13 1306802 degrees 1. element. As shown in the figure, along the γ direction along the series in which the bearing elements 81_88 are arranged. And in a class-like manner, the bearing elements 91_98 are disposed on an opposite side of the body Μ. 5 Referring to Figures 9, 1 and 11, each of the bearing elements 81-88 and 91-98 is generally formed integrally with the body 72 and includes a plurality of coplanar regions 99, 108 and 11G of the body 72. As shown, the three polygonal regions are concentric and are formed into recessed regions 102, 104 and 1-6. Although the regions 1〇2, 1〇4, and 1〇6 have a rectangular shape, any area may be used, and the area of the area 1〇2 is significantly larger than the area of the area 1〇4 1〇 or the area 106, wherein the area 106 is larger than the area. The area of 104. The region 102 is separated from the region 1〇4 by a land surface 1〇8 surrounding the region 1〇2 and has a width of about 1 mm. An additional land 11 is used to separate the regions 104 and 106. The apex surfaces and surfaces 99 of the banks 108, 110 are located in a common plane. A path 112 extends from the region 104 in a direction parallel to the plane from one of the openings 15 (not shown) terminating in the body 72. A path 112 also appears in region 102 to place it in fluid communication with pump system 1A. Similarly, a path 116 is present in region 106 that is placed in fluid communication with pump system 100. In operation, a pressure differential is created between regions 102, 104, and 106, wherein region 106 has a greater pressure than either of regions 102 and 104. In general, the pump system 100 directs a positive fluid flow into the passage 116 to cause the region 106 to be greater than the annular chamber pressure. The pump system 1A typically applies a vacuum to the passage 114' to create a vacuum in the region 102. Region 104 is typically maintained at the annular chamber pressure level and operates to stabilize the 14 1306802 pressure differential present in regions 102 and 106. Referring to Figures 6 and 11, the body is placed so as to overlap the template % so that the aperture 76 extends across the range of the mold 26 and the area of the template 24 outside the empty recording and the outer portion 26 is superposed. . The liquid polymerizable liquid is removed along a relative motion (referred to as a pass) between the single-direction template 24.5 shawl portion 72, as discussed above. However, one of the mold (4) and the body 72 can be rotated 90 relative to the other as desired. To simply reorient • Make additional traffic occur in the same direction as the first pass, or in a relative or orthogonal direction. - It can be seen that the air bearings 80 and 9 are arranged to generate a positive fluid flow to strike the template 24 from which the body 72 is pushed away to maintain the required spacing h. It has been found that the control propagates independently through the pump system. The fluid between 100 and the passage 114 and will be a beneficial way. In this manner, when one or more of the air bearing elements are no longer overlapped with the stencil 24 as indicated by 81-83 and 91-93 - the sudden change in pressure does not change and overlaps with the stencil 24, such as _ 4 88 And the regions 102, 104, and 106 of the remaining air bearing components, such as 94-98, are associated with pressures outside the ear. In addition to independent control of the fluid flow of the air bearing components 81-88 and 91-98, mold % can be achieved by including more air bearing components in each air bearing to extend its length in the direction of travel. And improved stability of the position between the orifices 2 and the orifices 76. Referring to Fig. 12, in an alternative embodiment, the vacuum wiper 17 can be formed with a body bore 72 and wherein the aperture m is disposed on a region 175 spaced apart from the mold 26 by a distance h. The remainder of the surface of the body portion 72 facing the template 74 is spaced from the template 74 by a distance d that is substantially greater than the distance h. In this manner, the area 15 1306802 175 forms an island. Referring to Fig. 13, in another embodiment, the region 275 of the body portion 272 is recessed to be spaced apart from the mold 26 by a distance h. However, the air bearings 80 and 9 are spaced apart from the template 24 region outside the mold 26 by a distance equal to or less than the distance h. In this manner, mold 26 is formed as a face 29 as shown, and mold 26 can be positioned between air bearings 80 and 90 to be coplanar therewith. Referring to Figure 6, in an alternative embodiment, the vacuum wiper can operate as a gas knife. In this manner, the pump system 80 generates a positive pressure in the volume 74 to produce a high velocity gas "slice," (not shown) from the orifice 76. This gas 10 "slice" removes the unfilled recess 128. The amount of fluid in the volume of 228 and 328 is effectively blown off. This can be used in conjunction with a vacuum wiper to cause the gas sheet to push unwanted liquid polymerizable material from the mold 26 while the vacuum wiper is collected by the sheet. An unnecessary liquid polymerizable material is removed. The alternating between the gas knife and the vacuum wiper can occur between a single pass during a single pass or between successive 15 passes. In addition, a positive pressure in the volume 74 can be established. As a dryer disposed on the mold 26 and, for example, within the recesses 128, 228, and 328. In this manner, the velocity of the gas "slices" will be established to reduce the removal of fluid from the mold 26 while drying. Probability. This deposition technique provides increased flexibility when patterning the substrate.譬20 as shown in Figures 4-16, the mold 26 may be provided with a flowable embossed material and deposited to retain only its appearance in the recess 28 as shown by 2, 202, 204 and 206. section. The number (not shown) of flowable embossed material that is not disposed within the recess 28 does not exist, i.e., is removed. As a result, portions 200, 202, 204, and 206 can be disposed on substrate 32, which can have a 16 1306802 reservoir as shown at 300. The pre-stored layer may be one of several layers. For example, layer 300 can be a permeable polymerizable material deposited using any number of deposition techniques, including spin coating and drop dispensing techniques. The layer 300 is formed by a material that is polymerized by the same actinic light shot, such as a change in thermal light and a change in ultraviolet light, as shown in the five parts 200, 202, 204, and 206, which can be used. The portions 200, 202, 204, and 2〇6 are deposited prior to polymerization of the flowable material forming the layer 3〇〇. In this manner, the portions 200, 202, 204, and 206 can be polymerized simultaneously with the material used to form the layer 3〇〇 such that the materials of the portions 200, 202, 204, and 206 can be crosslinked with the material of the layer 3〇〇, An integral patterned layer 400 is formed. As a result, the layer 3 〇〇 10 defines the residual thickness k shown in Fig. 2. In other words, the residual thickness h of the patterned layer 4 can be independent of the fluid that is dispensed to be imprinted by the patterned mold 26. Alternatively, portions 2, 202, 204, and 206 may be deposited on one layer after layer 300 is solidified. In this manner, portions are polymerized and crosslinked after deposition thereon. This allows the adhesion of the polymerized and crosslinked materials used to form portions 200, 202, 204, and 206 15 to exhibit a suitable preferential adhesion to the solidified layer 3 to allow portion 2 to be separated when mold 26 is separated therefrom. 〇〇, 202, 204 and 206 are held on it. In the above preferred adhesion, additional deposition techniques may be employed for the deposited layer 300, including but not limited to atomic layer deposition, chemical vapor deposition, physical vapor deposition, physical vapor deposition, and the like. As a result, the patterned layer 400 is formed and in which the portions 2, 202, 204, and 206 are not integrated with the layer 300 but are adhered only thereto. Additionally, portions 200, 202, 204, and 206 may be fully or partially cured before portions 200, 202, 204, and 206 are deposited on layer 300. For example, the above dryer function (not shown) is used to achieve this effect. Subsequently, layer 300 is polymerized and crosslinked. It should be noted that the system in which 17 1306802 can be used to form layer 300 includes component components that are different than those used to form portions 200, 202, 204, and 206. For example, layer 300 can be formed from an organic material and portions 200, 202, 204, and 206 can be formed from an inorganic material, and vice versa. 5 Refer to Figures 18 to 20' However, it should be noted that when left unapplied in the recess
28中之一數量599的可流動可聚合材料的一小部分（亦即， 未包括在部分600、602、604及606中之可流動可聚合材料 的部分）時將可能存在利益。利用此方式，數量599係界定 殘留厚度k，如第2圖所示。數量599及部分600、602、604 10及6〇6之組合係利於在基材32上製造一整體圖案狀層7〇()， 其中殘留厚度t2係依據沉積在模子26上的可流動可聚合材 料之出現而定。不需要將層700直接地沉積在基材32上。取 而代之，基材可具有一沉積於其上之預存的層8〇〇，且其可 具有上文對於層300所討論的任何性質。利用此方式，圖案 15狀層7〇0可與層_(未圖示)形成一體且可能只與其黏著，如 第20圖所示身為層900。 上述的本發明之實施例僅為示範性質。可對於上述揭 不作出許多改變及修改，同時仍位於本發明的範圍内。因 20 ::本發明的範圍不應限於上文描述，而是應參照申請專 利範圍及其完整均等範圍來決定。 【阖式簡單説明】 圖，其根 第1圖為根據本發明之-微影系統的立體圖； 第2圖為第1圖所示的-微影系統之簡化正視 據本發明的—實施例用以生成—圖案狀壓印層； 18 1306802 第3圖為顯示根據本發明的第一實施例包括在第1圖所 不的糸統中之流體分配機構的詳細側視圖， 第4圖為顯示根據本發明的第二實施例包括在第1圖所 示的系統中之流體分配機構的詳細側視圖； 5 第5圖為一其上設有一模子之第1圖所示的模板之仰視 圖； 第6圖為其上配置有液體可聚合材料之第5圖所示的模 板之簡化側視圖，其中根據本發明採用一真空擦抹件來移 除一數量的液體可聚合材料； 10 第7圖為一被包括在第6圖所示的真空擦拭件中之孔口 的細部圖； 第8圖為耦合至一泵系統之第6圖所示的真空擦抹件之 體部的詳細仰視圖； 第9圖為第8圖所示的一空氣軸承元件之詳細平面圖； 15 第10圖為第9圖所示的空氣軸承元件沿線10 -10所取之 橫剖視圖； 第11圖為顯示與第5圖所示的模板呈疊置之第6圖所示 的體部之簡化平面圖； 第12圖為顯示根據本發明的第一替代性實施例之一真 20 空擦抹件的簡化平面圖； 第13圖為顯示根據本發明的第二替代性實施例之一真 空擦抹件的簡化平面圖； 第14圖為第5圖所示的模板沿線14-14所取之橫剖視 圖； 19 1306802 第15圖為其上配置有一層材料之第1圖所示的一基材 之橫剖視圖， 第16圖為根據本發明的一實施例之第15圖所示的基材 藉由第14圖所示的模板將其圖案化之後的橫剖視圖； 5 第17圖為根據本發明的第一替代性實施例藉由第14圖 所示的模板予以圖案化之第15圖所示的基材之橫剖視圖； 第18圖為根據本發明的一實施例其上配置有液體可聚 合層之第14圖所示的模板之橫剖視圖； 第19圖為根據本發明的第二實施例之第1圖所示的基 10 材藉由第18圖所示的模板將其圖案化之後的橫剖視圖；及 第2 0圖為根據本發明的第三替代性實施例之第15圖所 示的基材藉由第18圖所示的模板將其圖案化之後的橫剖視 圖。 【主要元件符號說明】 10…微影系統 29···台面 12…橋支撐件 30,46…突部 14…橋 32…基材 16…階台支撐件 38…塗層 18…壓印頭 40,400…圖案狀層 20…動作階台 41,141…流體分配機構 22…輻射源 42…噴嘴 24…模板 43…供應部 26…模子 45…泵 28,48,128,228,328 …凹部 47···轉移平台 20 1306802 60…流體 62,64…模子的相對側 66,68…側 70，170…真空擦抹件 72,172,272 …體部 74…容積 76,174...孑1>口 77,79…端點 78…環室 80…泵系統，空氣軸承 81-88,91-98…軸承元件 82…進給線 90…空氣轴承 99…共面區域 100·..泵系統 102,104,106…凹入區域 108,110…岸面 112,114,116···通徑 175,275···區域 200,202,204,206···部分 300…既存層 599…數量 600,602,604,606〜部分 700···整體圖案狀層 800…預存的層 900···層 d…模子與基材間的距離 h…間隔 1···沿著X方向測量的長度 P…平面 s···距離 V··突部厚度 t2…凹部厚度，殘留厚度 w…沿著Y方向測量的寬度 …突部寬度 W2…凹部寬度 21There may be an advantage in one of 28 quantities of 599 of a portion of the flowable polymerizable material (i.e., portions of the flowable polymerizable material not included in portions 600, 602, 604, and 606). In this way, the number 599 defines the residual thickness k, as shown in Figure 2. The combination of the number 599 and the portions 600, 602, 604 10 and 6〇6 facilitates the fabrication of a unitary patterned layer 7() on the substrate 32, wherein the residual thickness t2 is based on flowable polymerizable deposition on the mold 26. The appearance of the material depends. It is not necessary to deposit layer 700 directly on substrate 32. Instead, the substrate can have a pre-existing layer 8 deposited thereon and it can have any of the properties discussed above for layer 300. In this manner, the pattern 15 layer 7 〇 0 can be integrated with the layer _ (not shown) and may only be adhered thereto, as shown in Fig. 20 as the layer 900. The above described embodiments of the invention are merely exemplary in nature. Many changes and modifications may be made without departing from the scope of the invention. The scope of the invention is not limited to the above description, but should be determined with reference to the scope of the patent application and its complete equal scope. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of a lithography system according to the present invention; FIG. 2 is a simplified front view of the lithography system shown in FIG. 1 according to the present invention. To create a pattern-like embossed layer; 18 1306802 FIG. 3 is a detailed side view showing a fluid dispensing mechanism included in the system of FIG. 1 according to the first embodiment of the present invention, and FIG. 4 is a view showing A second embodiment of the present invention includes a detailed side view of the fluid dispensing mechanism in the system shown in Fig. 1; 5 Fig. 5 is a bottom view of the template shown in Fig. 1 on which a mold is placed; Figure 6 is a simplified side elevational view of the template shown in Figure 5 with liquid polymerizable material disposed thereon, wherein a vacuum wiper is used to remove a quantity of liquid polymerizable material in accordance with the present invention; a detailed view of the orifice included in the vacuum wiper shown in Fig. 6; Fig. 8 is a detailed bottom view of the body of the vacuum wiper coupled to Fig. 6 of a pump system; Figure 9 is a detailed plan view of an air bearing component shown in Figure 8; Figure 10 is a cross-sectional view of the air bearing component shown in Figure 9 taken along line 10-10; Figure 11 is a simplified plan view showing the body shown in Figure 6 superimposed on the template shown in Figure 5. Figure 12 is a simplified plan view showing a true 20-empty wiper according to a first alternative embodiment of the present invention; Figure 13 is a view showing a vacuum wiper according to a second alternative embodiment of the present invention. Figure 14 is a cross-sectional view of the substrate shown in Figure 5 taken along line 14-14; 19 1306802 Figure 15 is a cross-sectional view of a substrate shown in Figure 1 with a layer of material disposed thereon, Figure 16 is a cross-sectional view showing the substrate shown in Figure 15 according to an embodiment of the present invention, which is patterned by the template shown in Figure 14; 5 Figure 17 is a first alternative according to the present invention. The cross-sectional view of the substrate shown in Fig. 15 patterned by the template shown in Fig. 14; Fig. 18 is the 14th embodiment of the liquid polymerizable layer disposed thereon according to an embodiment of the present invention. Figure 26 is a cross-sectional view of the template; Figure 19 is a second embodiment of the present invention A cross-sectional view of the base 10 shown in Fig. 1 after being patterned by the template shown in Fig. 18; and Fig. 20 is a 15th view of the third alternative embodiment according to the present invention. A cross-sectional view of the substrate shown by patterning it as shown in Fig. 18. [Major component symbol description] 10... lithography system 29··· countertop 12... bridge support 30, 46... projection 14... bridge 32... substrate 16... step support 38... coating 18... stamping head 40, 400 ...patterned layer 20...action stage 41,141...fluid distribution mechanism 22...radiation source 42...nozzle 24...template 43...supply 26...mold 45...pump 28,48,128,228,328 ...recess 47···transfer platform 20 1306802 60...fluid 62,64...opposite side 66,68...side 70,170...vacuum wiper 72,172,272 ...body 74...volume 76,174...孑1> port 77,79...end point 78...ring chamber 80...pump system , air bearing 81-88, 91-98... bearing element 82...feed line 90...air bearing 99...coplanar area 100·..pump system 102,104,106...recessed area 108,110...shore 112,114,116···through path 175,275· · Area 200, 202, 204, 206 · Part 300... Existing layer 599... Number 600, 602, 604, 606 ~ Part 700 · Overall pattern layer 800... Pre-stored layer 900··· Layer d... Distance between the mold and the substrate h... Interval 1· ··The length measured along the X direction P...plane s···distance V· Projection thickness T2 ... recess portion thickness, W ... residual thickness measured along the width direction Y ... width W2 of projecting portions 21 ... recess width