1302333 九、發明說明： 【發明所屬之技術領域】 技術領域1302333 IX. Description of the invention: [Technical field to which the invention pertains] Technical field
本發明係有關於-種將溶液以喷墨方式吐出並塗佈於 5 基板的溶液之塗佈裝置及塗佈方法。 ϋ 名餘]J 背景技術 舉例而言，在液晶顯示裝置的製造過程中，有一在玻 璃製基板上形成電路圖案的薄膜形成過程。在該薄膜形成 10過程中在基板板面上形成例如定向膜或抗蝕膜等功能性薄 膜。 /、 在基板上形成功能性薄膜時，使用將形成該功能性薄 膜之溶液由噴嘴吐出並塗佈在基板板面之噴墨方式的汾饰 裝置。 15 該塗佈裝置具有搬運基板之載置台，且在該載置台上 方’沿著約直交於基板搬運方向的方向設置有複數塗佈頭 部’其17前述喷嘴穿出裝設於該等塗佈頭部。 如此一來，由複數喷嘴所吐出之溶液係朝與搬運方向 交叉的方向以預定間隔塗佈於被搬運之基板表面。舉例而 20言，專利文獻1中揭示有用喷墨方式將溶液塗佈於基板上的 先前技術。 【專利文獻1】 特開平9-10593 7號公報 【發明内容3 發明揭示 1302333 液晶顯示裝置係主動矩陣方式者時，在塗佈有前述溶 液之别述基板板面上，藉由透明導電膜光學性地形成有格 子狀之電極。因此’在基板板面上形成有以設置有前述電 極之部分作為凸部，未設置之部分作為凹部之凹凸圖案。 5即’在基板板面上因前述電極形成有由規律地凹凸部所構 成之凹凸圖案。 另一方面’液滴由前述塗佈頭部的複數喷嘴以固定時 間對朝預定方向搬運之基板吐出。如此一來，可使液滴規 律地塗佈於前述基板上。塗佈於基板之液滴經流動後呈一 10體化，並形成具預定厚度的功能性薄膜。 基板上所形成之功能性薄膜被要求厚度均一。但是， 在形成有規律性凹凸部之基板板面，若將液滴由設置於塗 佈頭部内之複數噴頭以固定時間吐出並塗佈，則肇因於該 時間，會有由各噴嘴吐出並塗佈於基板上之液滴集中滴下 15於基板上規律地形成之凹凸部的凹部的情形。 滴下於凹部之液滴因被形成凸部的電極所阻擋故難以 流動至周圍。結果，會出現因為滴下於凹部之液滴無法在 電極上充分展開，而使電極上之該膜厚變薄，導致利用塗 佈於基板之液滴所形成之功能性薄膜對應凸部部分的膜厚 20比其他部分膜厚薄，進而對應基板所形成之凹凸部產生格 子狀條紋或斑點模樣等不均一部份，降低功能性薄膜之品 質的情形。 本發明之目的在於提供能夠避免在利用塗佈於基板之 溶液所形成之薄膜上產生不均一部份的溶液之塗佈裝置及 1302333 塗佈方法。 本發明係將溶㈣佈於財規律地形成有 凹凸部之凹 凸圖案板上之溶液之、塗佈|置，其包含有：塗佈頭部， ’、有A S且可由@述噴嘴將前述溶液滴下塗佈於前述基 5板；驅動機構，係可使前述基板與前述塗佈頭部相對地移 動者，及控制機構，係在利用前述驅動機構使前述基板與 月·]述土佈頭口P相對移動時進行控制，使其相對移動方向相 對於在前述基板上形成之前述凹凸圖案之凹凸部配置方向 錯開預定角度者。 10 15The present invention relates to a coating apparatus and a coating method for a solution in which a solution is ejected by an inkjet method and applied to a substrate. ϋ Background] For example, in the manufacturing process of a liquid crystal display device, there is a film forming process of forming a circuit pattern on a glass substrate. A functional film such as an alignment film or a resist film is formed on the surface of the substrate during the film formation 10. / When a functional film is formed on a substrate, an ink jet type inkjet device in which a solution for forming the functional film is discharged from a nozzle and applied to a surface of a substrate is used. 15 The coating apparatus has a mounting table for transporting a substrate, and a plurality of coating heads are provided above the mounting table in a direction approximately perpendicular to the substrate conveying direction. 17 The nozzle is vented and attached to the coating. head. In this manner, the solution discharged from the plurality of nozzles is applied to the surface of the substrate to be conveyed at a predetermined interval in a direction intersecting the conveyance direction. For example, Patent Document 1 discloses a prior art in which a solution is applied onto a substrate by an inkjet method. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 9-10593 (JP-A No. 9-10593). In the case of the active matrix method, the liquid crystal display device is optically transparent, and the substrate is coated with the solution. A lattice-shaped electrode is formed sexually. Therefore, a portion in which the electrode is provided as a convex portion and a portion which is not provided as a concave portion is formed on the surface of the substrate. 5 is that a concave-convex pattern composed of regularly uneven portions is formed on the surface of the substrate plate by the electrodes. On the other hand, the droplets are discharged by the plurality of nozzles of the coating head at a fixed time for the substrate conveyed in a predetermined direction. In this way, the droplets can be applied to the substrate in a conventional manner. The droplets applied to the substrate are flowed to form a body and form a functional film having a predetermined thickness. The functional film formed on the substrate is required to have a uniform thickness. However, when the droplets are ejected and coated by a plurality of heads provided in the coating head for a fixed period of time on the substrate surface on which the regular uneven portions are formed, the nozzles are ejected by the respective nozzles due to the time. The droplets coated on the substrate are concentrated by dropping 15 on the concave portion of the uneven portion which is regularly formed on the substrate. The droplets dropped in the concave portion are hard to flow to the surroundings due to being blocked by the electrodes forming the convex portions. As a result, there is a possibility that the droplets dropped on the concave portion cannot be sufficiently spread on the electrode, and the film thickness on the electrode is made thin, resulting in a film corresponding to the convex portion by the functional film formed by the droplets applied to the substrate. The thickness 20 is thinner than the thickness of the other portions, and the uneven portion formed by the substrate is unevenly formed in a lattice-like streak or a spot pattern, and the quality of the functional film is lowered. SUMMARY OF THE INVENTION An object of the present invention is to provide a coating apparatus and a 1302333 coating method which can avoid a solution which generates a non-uniform portion on a film formed by a solution applied to a substrate. In the present invention, the solution is disposed on a concave-convex pattern plate having a concave-convex portion, and is coated with a coating head, which has an AS and can be used to form the solution by a nozzle. Dropping the coating on the base 5 plate; the driving mechanism is configured to move the substrate relative to the coating head, and the control mechanism is to use the driving mechanism to make the substrate and the moon When the relative movement is performed, the relative movement direction is shifted by a predetermined angle with respect to the arrangement direction of the uneven portion of the uneven pattern formed on the substrate. 10 15
本發明係將溶液塗佈於具有規律地形成有凹凸部之凹 凸圖案的基板上之溶液之塗料置，其包含有：塗佈頭部’ 具有喷嘴，且可切述対將前述溶液滴下塗佈於前述基 板；驅動機構，係可使前述基板與前述塗佈頭部相對地移 動者，控㈣置’係可控制前述塗佈頭部與前述驅動機構 亚於上述基板形成液滴之塗佈圖案者1前述控制裝置係 控制前述塗佈頭部與前述驅動機構，使前述塗佈圖案中浪 滴的排列方向相對於前述凹凸圖案之凹凸部配置方向錯開 預定角度者。 本發明係將溶液塗佈於具有規律地形成有凹凸部之旧 2〇凸圖案的基板上之溶液之塗佈裝置，其包含冑：塗佈頭部， 具有呈列狀配置之複數噴嘴，且可由該等喷嘴將前述溶液 滴下塗佈於前述基板；驅動機構，係可使前述基板與前述 塗佈頭部相對地移動者；及控制裝置，係可控制前述蜜怖 頭部與前述驅動機構並於上述基板形成液滴之塗佈圖案 1302333 者。而前述塗佈頭部係配置為使前述喷嘴之配置方向相對 於前述基板所形成前述凹凸圖案之配置方向錯開預定角度 者。 本發明係將由塗佈頭部之喷嘴所吐出的溶液塗佈於具 5 有規律性地形成有凹凸部之凹凸圖案的基板上之溶液之塗 佈方法，其包含有以下步驟：使前述基板與前述塗佈頭部 相對地移動；在使前述基板與前述塗佈頭部相對地移動 時，使其相對移動方向相對於在前述基板上形成之前述凹 凸圖案之凹凸部配置方向錯開預定角度；及一邊使前述基 10 板與前述塗佈頭部之相對移動方向相對於前述凹凸圖案之 凹凸部配置方向錯開預定角度並移動，一邊由前述塗佈頭 部將溶液吐出塗佈於基板上。 圖式簡單說明 第1圖係顯示本發明實施型態之塗佈裝置之概略構造 15 的正視圖。 第2圖係第1圖所示之塗佈裝置的側視圖。 第3圖係塗佈頭部之縱截面圖。 第4圖係顯示形成有喷嘴之塗佈頭部底面的圖。 第5圖係顯示控制系統的方塊圖。 20 第6圖係顯示藉由透明導電膜形成於基板上之凹凸圖 案的說明圖。 第7圖係顯示旋轉Θ角度並朝X方向驅動之基板與塗佈 頭部的說明圖。 【實方方式】 8 1302333 實施發明之最佳型態 以下參照圖式說明本發明之實施型態。 第1圖與第2圖所示之本發明塗佈裝置具有約呈長方體 狀的底座1。在該底座1底面之預定位置分別設置有座腳2， 5 並水平地支撐住前述底座1。 如第2圖所示，分別在前述底座丨上面之寬方向兩端 部，沿著長方向設置有安裝板3，並分別在該等安裝板3上 面之寬方向一端部沿著長方向設有引導構件4。又，長方形 板狀之X台5由平行設置在其底面之寬方向兩側且截面大致 1〇呈倒11字型狀之一對支撐構件6可滑動地卡合支撐在該等引 導構件4的上面。即，X台5可沿著前述引導構件々朝^方向 移動。The present invention relates to a coating for applying a solution to a solution having a pattern on which a concave-convex pattern of irregularities is regularly formed, comprising: a coating head having a nozzle, and wherein the solution is dripped and coated The substrate; the driving mechanism is configured to move the substrate relative to the coating head, and control (4) to control the coating pattern of the coating head and the driving mechanism to form droplets on the substrate The control device controls the application head and the drive mechanism such that the arrangement direction of the droplets in the application pattern is shifted by a predetermined angle with respect to the arrangement direction of the concavo-convex portions of the concavo-convex pattern. The present invention relates to a coating apparatus for applying a solution to a solution having a conventional 2-sided convex pattern having irregularities formed thereon, comprising: a coating head having a plurality of nozzles arranged in a row, and The solution may be dripped onto the substrate by the nozzles; the driving mechanism may move the substrate relative to the coating head; and the control device may control the honey head and the driving mechanism A coating pattern 1302333 of droplets is formed on the substrate. Further, the coating head portion is disposed such that the arrangement direction of the nozzles is shifted by a predetermined angle with respect to the arrangement direction of the uneven pattern formed by the substrate. The present invention relates to a method of applying a solution discharged from a nozzle of a coating head to a solution having a substrate having a concavo-convex pattern in which irregularities are regularly formed, comprising the steps of: The coating head is relatively moved; when the substrate is moved relative to the coating head, the relative movement direction is shifted by a predetermined angle with respect to the arrangement direction of the uneven portion of the uneven pattern formed on the substrate; The solution is discharged and applied onto the substrate by the coating head while the relative movement direction of the base 10 sheet and the coating head is shifted by a predetermined angle with respect to the arrangement direction of the uneven portion of the uneven pattern. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front elevational view showing a schematic configuration 15 of a coating apparatus according to an embodiment of the present invention. Fig. 2 is a side view of the coating device shown in Fig. 1. Figure 3 is a longitudinal sectional view of the coating head. Fig. 4 is a view showing the bottom surface of the coating head on which the nozzle is formed. Figure 5 is a block diagram showing the control system. 20 Fig. 6 is an explanatory view showing a concavo-convex pattern formed on a substrate by a transparent conductive film. Fig. 7 is an explanatory view showing a substrate and a coating head which are rotated at an angle of X and driven in the X direction. [Solid mode] 8 1302333 BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the drawings. The coating apparatus of the present invention shown in Figs. 1 and 2 has a base 1 having a rectangular parallelepiped shape. The bases 2, 5 are respectively provided at predetermined positions on the bottom surface of the base 1, and the base 1 is horizontally supported. As shown in Fig. 2, mounting plates 3 are provided along the longitudinal direction at both end portions in the width direction of the upper surface of the base frame, and are provided along the longitudinal direction at one end portion in the width direction of the upper surface of the mounting plate 3, respectively. Guide member 4. Further, the rectangular plate-shaped X-stage 5 is slidably engaged and supported by the support member 6 by one of the two sides in the width direction of the bottom surface of the bottom surface and having a substantially one-inch cross section. Above. That is, the X stage 5 is movable in the direction of the ^ along the aforementioned guiding member.
在前述底座1之長方向-端設置有x驅動源7，而該χ驅 動源7可驅動螺旋軸8旋轉。該螺旋軸8沿著前述底户1的長 方向設置並受支持而可旋轉，並與設置於前述乂么5下面之 螺帽體9螺合。因此，若利用前述χ驅動源7旋轉驅 8，則可如第1圖之箭頭所示地沿著前述引導構件$ ' 驅動前述X台5。 %々 在前述X台5上面設有可以與水平面直交之輪線 旋轉的θ台11 ,且利用設置於前述又台5之0驅動源u 口 旋轉方向驅動該Θ台11。 、 可朝 在前述…丨上面設有載置扣，且用於#矩陣方式 之液晶顯示裝置的玻璃製基板冒可供給至該載置A1 並且該基板W可利用真空吸附或靜電吸附等方法將广吸 20 1302333 附並保持於前述載置An p 戰置口 13。因此，可藉由前述X台5與 朝X方向與θ方向驅動保持於載置台13之基板W。 如第6圖所示，在前述基板w表面設有呈格子狀之帶狀 透明導電膜14。如此一來，在基板W表面形成有凹凸圖案 5 15，而凹凸圖案15包含由透明導電膜14圍出之部分的凹部 …、及設置透明導電膜14之部分的凸部⑸。即，在基板 W上相對於基板贾之長方向及寬方向規律地形成有凹部以 與凸部15b。 在丽述底座1之長方向中間部直立設置有橫跨前述一 H)對引導構件4的門型支撐體n，且在該支撐體1?兩侧上部水 平地架設有由四方柱所構成之安裝構件18。 在前述絲構件18上設置有可沿著與前述奸5之驅動 方向即X方向直父之γ方向（第2圖之箭頭所示）移動之頭部 載台19。在蝻述支撐體π之寬方向一側設置有γ驅動源21， 15且该Υ驅動源21可沿著Υ方向驅動前述頭部載台19。 在前述頭部載台19的一側面上，沿著γ方向配置有複數 塗佈頭部22，且該等塗佈頭部22藉由噴墨方式點狀地吐出 可形成如定向膜等機能性薄膜之溶液。在本實施型態中， 配置有兩列例如7個呈雜齒狀之塗佈頭部22。 20 如第3圖與第4圖所示，前述各塗佈頭部22包含有頭部 本體28。頭部本體28形成為筒狀，並利用可撓板29封閉該 本體底面開口。該可彎板29被喷嘴板31覆蓋，並於該喷嘴 板31與前述可彎板29之間形成有複數液室32。 各液室32分別透過圖未示之支管連通至喷嘴板31内所 1302333 _ 形成的主管31A，且溶液由前述主管31A經由前述支管提供 • 至各液室32。又’主管31A-端與後述之給液孔33連接，另 一端則與後述之回收孔37連接。 在前述頭部本體28之長方向一端部形成有連通至前述 5液室32之前述給液孔33，並從該給液孔％對前述液室颂 供形成功能性薄臈之溶液。如此一來，可用溶液填滿前述 液室32。 • 如第4圖所不，在前述喷嘴板31沿著與基板W之搬運方 向直交之方向’即Y方向《狀地設有穿出之複數噴嘴34。 如第3圖所不，在前述可彎板Μ表面設置有分別與前述各噴 嘴34對向之複數壓電元件35。 利用設置於前述頭部本體28内之驅動部36供給各壓電 το件35驅動電壓。如此一來，在壓電元件^伸縮且使可彎 板29局部地變形後，溶液可由與該壓電元件對向位置之喷 15嘴34點狀地吐出，並塗佈至所搬運的基板w上面。因此， • 纟基板侧表面上可形成由點狀溶液呈矩陣狀排列而成之 凸部圖案。接著，藉著點狀之各溶液流動並濕潤擴大，該 塗佈圖案互相附著而成為一體的膜。 另外，右改變外加至壓電元件35的電壓控制壓電元件 20 35之動作量’射改變由與各壓電元件％對向之噴嘴州斤 吐出之溶液的吐出量，即液滴之大小。 在前述頭部本體28之長方向另一端形成有連通至前述 液室32之前述回收孔37，且從前述給液孔33提供至前述液 室32之溶液可由前述回收孔37進行回收。也就是說，各頭 1302333 僅僅由料34吐出供給至前述液室32之溶液， 、、二由刚^室32由前述时孔37進行回收。 ^第5圖所示，設置於各塗佈頭部_之驅動料的馬 動:透過控财置41來控制。即，在前述控姆_中， 、、匕有I成於複數塗佈頭部22之各噴嘴％的X、Υ座標。肯 处各貝、γ座標係，例如，在將各塗佈頭部22安裝至 頭β载台19後’依該塗佈頭部22的安裝位置為基準來惑 定。如此-來，可控制溶液相對基板w，沿著前述γ方向之 吐出位置。 10 裝置41^僅健制前述《_部36,亦控制將乂 台5朝X方向驅動之χ驅動源7、將方向轉之雜 動源u、及將設置有塗佈頭部22之頭部載台叫代方向驅動 之Υ驅動源21的驅動。 接下來，說明前述構造之塗佈裝置在基板|塗佈 15 /合液的f月形。首先’將基設置有透明導電膜μ的面朝 上後，吸附保持於載置台13上。然後，開動θ驅動源，將載 置台13與基板W相對於χ方向旋轉預定角度，且0台丨1的旋 轉角度以5〜45度的範圍為最佳。第7圖顯示旋轉了旋轉角^ Θ之基板W的狀態。 & 若使載置台13旋轉旋轉角度θ，則可致動又驅動源7而朝 X方向驅動載置台13。即，在將基板…旋轉了旋轉角度㊀的 狀態下朝第7圖箭頭所示之X方向進行驅動。 一旦朝X方向驅動基板W且該基板貿之塗佈溶液的涂 佈區域R(第7圖所示）到達塗佈頭部22下方後，則從對廡哆 12 1302333 k佈區域IUx (位置的複數塗佈頭部22之複數噴嘴％將溶 液朝基板财出。因此，可將溶缝佈於基_上，例如， 第7圖所示之4個塗佈區域R中。 在雨述基板W之溶液塗佈區域R中，如第6圖所示，設 5有呈格子狀之透明導電膜14，並藉著該透明導電购在基 板W板面著基板％各邊規律地形成由凹部1 &與凸部⑽ 所構成的凹凸圖案15。另一方面，溶液從各塗佈頭部22之 喷嘴36在一定之時點朝基板w點狀地吐出。 若在未旋轉基板_狀態下(旋轉角度為0度)朝X方向 10驅動，則於基板|所形成之凹部…與凸部⑽的配置方向 會與基板W搬運方向，即x方向姻。因此，會發生從喷嘴 34以-定時間吐出之液滴的吐出位置與前述凹部15卜致 的情形。 此時，因為吐出至基板w的液滴會受到凸部15b阻擋而 15不易流動，所以利用液滴流動而在塗佈區域R形成之功能性 薄膜的厚度會產生對應凹部ISa之部分與對應凸部说的不 均一現象。 但是，本發明之實施型態係在將溶液塗佈於基板w 時，將基板W旋轉5〜45度的範圍後朝X方向搬運。也就是 2〇 說，相對於基板W的搬運方向，即X方向，將沿著該其板〜 各邊規律地形成之凹部15a與凸部15b的配置方向傾斜預定 的角度Θ後進行搬運。 此處，角度Θ最好是設定為在基板w朝X方向搬運時， 一個噴嘴34所吐出而塗佈於基板W上之點狀的溶液列可橫 13 1302333 跨相鄰配置之2個以上凸部15b的角度θ。因為可由基板冒的 設計資料得到透明電極等凸部丨5 b的配置間隔d與塗佈區域 R之X方向的尺寸RX，因此，舉例而言，可由{tane>(d/Rx)} 的關係求出前述角度Θ。 5 因此，從沿著與前述X方向交叉之Y方向配置的複數塗 佈頭部22之喷嘴34朝基板W所吐出之液滴，以其排列方向 相對於在基板w規律地形成之凹凸圖案15中凹部15a與凸 部15b的配置方向為傾斜的塗佈圖案來進行塗佈。 如此一來’因為液滴不會只集中於規律地形成之凹凸 10圖案15中的凹部15a，而可塗佈至凹部i5a與凸部15b兩者部 分，所以可避免塗佈後液滴的流動受到凸部15b阻擋。因 此，進行塗佈後溶液可流經所有塗佈區域R，遂可形成得以 避免產生不均一部份之品質優良的功能性薄膜。 雖然可如前述般僅使基板w通過塗佈頭部22下方一次 15來塗佈溶液，但亦可往復移動前述基板W以塗佈溶液。在 往復移動基板W塗佈溶液的情況下，更可在往動時與復動 時改變基板w的旋轉角度，也就是載置台13的旋轉角度㊀。 在往動時與復動時，若改變載置台13的旋轉角度θ，則 可改變往動時與復動時對於塗部區域化的液滴塗佈圖案。也 20就疋說，於往動時未塗佈液滴之凹部15a與凸部15b，可在 復動時塗佈液滴。 口此由方、與僅單單往復移動基板W並塗佈溶液相 比’可使液滴對於基板…之塗部區域R之塗佈不會只集中於 凹部15a’結果，可避免在基板所形成之功能性薄膜產生不 14 1302333 均一，並提昇成品品質。 當基板w之旋轉角度θ過大時，會出現與基板界的义方 向直交之Y方向的最大寬尺寸大於喷嘴34沿著Y方向之配 置尺寸的情形。此時，將塗佈區域R平行γ方向分割為複數 5區域，再於每個分割好之區域塗佈溶液即可。舉例而言， 若為第7圖所示之基板W的狀況時，雖然喷嘴的配置尺寸小 於基板W之Y方向的隶大尺寸’但若大於前述最大尺寸的 1/2時，亦可將4個塗佈區域分割為以通過基板％中央且平行 X方向之直線為分界之2個塗佈區域，並將溶液塗佈於2個塗 10佈區域之其中一個塗佈區域後，再塗佈溶液於另一個塗佈 區域。 另一方面，亦可以0度作為基板w之旋轉角度θ並將該 基板W朝X方向驅動且同時塗佈溶液。此時，一邊將基板w 朝X方向驅動，一邊將設置有塗佈頭部22之頭部載台19朝丫 15 方向驅動。 如此一來，相對於基板貿所驅動之又方向，前述塗佈頭 部22之相對移動方向以對應前述頭部載台19之移動速度之 角度朝傾斜方向錯開。即，相對於基板貿上所形成之凹部 15a與凸部15b的配置方向，塗佈頭部22的移動方向將會相 2〇 對地錯開預定角度。 因此，可避免由塗佈頭部22之噴嘴34所吐出之液滴集 中塗佈於基板W之凹部I5a。此時，亦可往復移動基板w， 並在往動時及復動時分別塗佈溶液。 另外，亦可依序切換形成在塗佈頭部22之複數喷嘴34 15 1302333 中吐出〉谷液之噴嘴34，以代替使設有塗佈頭部22之頭部載 台19朝Y方向移動。 舉例來說，在塗佈頭部2 2中沿著Y方向以等距間隔形成 有2〇個唷嘴34，並將該等噴嘴34依照排列方向每4個一組共 5分成5組。接著，一邊朝X方向驅動基板W，一邊由位於各 組右側之1嘴3 4開始依序以所設定之設定時間間隔吐出溶 液此犄，若位於組内左端之喷嘴34吐出溶液後，即回到 _ 位於右糕之噴嘴34並重複進行吐出溶液之步驟。 藉由W述方式，對基板W之溶液的塗佈方向係以基板 1〇貨朝又方向之移動速度與設定時間間隔所決定之角度傾斜 的方向。因此’可使塗佈圖案中液滴的排列方向相對於基 板w上所規律地形成之凹凸圖案15中凹部i5a與凸部的 配置方向傾斜’所以可得到與前述實施型態相同的效果。 又，可相對於Y方向傾斜預定角度配置設有塗佈頭部22 5之支撐體17，亦可將塗佈頭部22之複數喷嘴34的排列方向 » 配置作為㈣於Y方向呈預定角度之傾斜方向，以代替前述 之順序切換複數噴嘴34中吐出溶液之噴嘴34的方法。也就 疋說，亦可將複數噴嘴34的配置方向配置成相對於前述基 板w上所形成之前述凹凸圖案15的配置方向錯開預定角 20度。 另外，亦可將安裝於支撐體17之塗佈頭部22的安裝角 度安裝成相對於Υ方向傾斜預定角度，以代替相對於¥方向 傾斜預定角度配置支撐體17。 此日守，可一适朝X方向驅動基板w，一邊在該基板w通 16 1302333 過各噴嘴34下方時’配合時點彳文位於對向基板W上塗佈區 域R之各噴嘴34吐出溶液。如此一來，塗佈於基板W之溶液 會以噴嘴34之配置間隔排列於以噴嘴34的排列方向決定之 角度傾斜的方向。 5 因此，因為在這種情況下亦可使液滴的排列方向相對 於基板W所規律地形成之凹凸圖案15中凹部15a及凸部15b 的配置方向傾斜，所以可得到與前述實施型態相同的效果。 另外，在第7圖所說明的例子中，可將基板W在事先旋 轉旋轉角度Θ的狀態下載置於載置台13上，以代替用旋轉角 1〇度Θ旋轉載置台13。此時，在使用作為控制機構之自動搬運 機械等搬運裝置提供基板W至載置台13時，亦可將該自動 搬運機械的保持臂旋轉預定之旋轉角度Θ等，再提供基板w 至載置台13。 在這種狀況下，因為亦可使液滴的排列方向相對於基 15板…所規律地形成之凹凸圖案15中凹部15a及凸部15b的排 列方向傾斜，所以可得到與第7圖所示之例同樣的效果。 在前述實施型態中將保持有基板之載置台朝X方向驅 動’但亦可將設有塗佈頭部之支撐體朝X方向驅動，只要係 可使基板與塗佈頭部相對地朝χ、γ方向驅動之構造即可。 2〇 另外，雖然本發明是以適用於用於主動矩陣方式之液 晶顯示裳置的玻璃製基板w為例進行說明，但不僅限於 此’舉例而言’亦可適用於用於單純矩陣方式之液晶顯示 叙置之玻璃製基板，只要係具有規律地形成有凹凸部之凹 凸圖案之基板W即可適用。 17 1302333 - #者，雖是以相對於基板％之長方向及寬方向規律地 形成凹凸圖案15之凹部15a與凸部15b之例進行說明，但不 僅限於此，亦可相對於與基板W之長方向與寬方向傾斜之 方向形成，或彳沿著基板W之長方向或寬方向的任_方向 5 形成。 又’本發明不僅限於完全規律性地形成有凹凸圖案15 之凹部15a與凸部15b者，即使一部分的凹部15a與凸部i5b 不規律’只要全體為規律性形成者即可適用。 •另外’在相對於基板W之長方向及寬方向規律地形成 10有凹凸圖案15之凹部15a與凸部15b之例子中，雖係將由一 個喷嘴34所吐出塗佈於基板W上之點狀溶液之列方向與凸 部15b之間的角度Θ設定在最大到45度的範圍内為例進行說 明，但角度Θ並不限定於最大到45度的範圍内，亦可大於該 角度。 μ 15產業上利用的可能性 • 根據本發明，可避免利用塗佈之溶液於基板上所形成 之薄膜產生不均一。 【圖式簡單說明】 第1圖係顯示本發明實施型態之塗佈裝置之概略構造 20 的正視圖。 σ 第2圖係第1圖所示之塗佈裝置的側視圖。 第3圖係塗佈頭部之縱截面圖。 第4圖係顯示形成有喷嘴之塗佈頭部底面的圖。 第5圖係顯示控制系統的方塊圖。 1302333 第6圖係顯示藉由透明導電膜形成於基板上之凹凸圖 案的說明圖。 第7圖係顯示旋轉Θ角度並朝X方向驅動之基板與塗佈 頭部的說明圖。 【主要元件符號說明】An x drive source 7 is provided at the long end of the base 1, and the turn drive source 7 can drive the screw shaft 8 to rotate. The screw shaft 8 is disposed along the longitudinal direction of the base unit 1 and is rotatably supported, and is screwed to the nut body 9 provided under the cymbal 5. Therefore, when the drive 8 is rotated by the above-described cymbal drive source 7, the X stage 5 can be driven along the guide member $' as indicated by the arrow in Fig. 1. % 々 The θ stage 11 on which the wheel line orthogonal to the horizontal plane is rotated is provided on the X stage 5, and the stage 11 is driven by the rotation direction of the 0 drive source port provided in the above-mentioned stage 5. A mounting substrate may be provided on the top surface of the substrate, and a glass substrate for a liquid crystal display device of the # matrix type may be supplied to the mounting surface A1, and the substrate W may be vacuum adsorbed or electrostatically adsorbed. The wide suction 20 1302333 is attached and held in the aforementioned placement of the An p battle opening 13. Therefore, the substrate W held by the mounting table 13 can be driven by the X stage 5 and in the X direction and the θ direction. As shown in Fig. 6, a strip-shaped transparent conductive film 14 having a lattice shape is provided on the surface of the substrate w. As a result, the concave-convex pattern 5 15 is formed on the surface of the substrate W, and the concave-convex pattern 15 includes a concave portion of the portion surrounded by the transparent conductive film 14 and a convex portion (5) of a portion where the transparent conductive film 14 is provided. That is, a concave portion and a convex portion 15b are regularly formed on the substrate W with respect to the longitudinal direction and the wide direction of the substrate. A gate-type support n that spans the pair of H) pairs of the guide members 4 is erected in the middle portion of the length of the base of the Liss, and a square column is horizontally placed on the upper sides of the support 1 Mounting member 18. The wire member 18 is provided with a head stage 19 which is movable in the gamma direction (indicated by an arrow in Fig. 2) which is a straight direction of the X direction in the driving direction of the above. A γ drive source 21, 15 is provided on the side of the width direction of the support body π, and the Υ drive source 21 can drive the head stage 19 in the Υ direction. On the one surface of the head stage 19, a plurality of coating heads 22 are disposed along the γ direction, and the coating heads 22 are spouted by an inkjet method to form a function such as an orientation film. A solution of the film. In the present embodiment, two rows, for example, seven coating heads 22 having a dentate shape are disposed. 20 As shown in Figs. 3 and 4, each of the application heads 22 includes a head body 28. The head body 28 is formed in a cylindrical shape, and the bottom surface opening of the body is closed by a flexible plate 29. The bendable plate 29 is covered by the nozzle plate 31, and a plurality of liquid chambers 32 are formed between the nozzle plate 31 and the aforementioned bendable plate 29. Each of the liquid chambers 32 is communicated to the main pipe 31A formed in the nozzle plate 31 through a branch pipe (not shown), and the solution is supplied from the main pipe 31A to the respective liquid chambers 32 via the aforementioned pipe branches. Further, the main pipe 31A-end is connected to a liquid supply hole 33 which will be described later, and the other end is connected to a recovery hole 37 which will be described later. The liquid supply hole 33 that communicates with the liquid chamber 32 is formed at one end portion of the head body 28 in the longitudinal direction, and a solution for forming a functional thin layer is supplied from the liquid supply hole % to the liquid chamber. As a result, the liquid chamber 32 can be filled with a solution. • As shown in Fig. 4, the nozzle plate 31 is provided with a plurality of nozzles 34 that are pierced in a direction orthogonal to the direction in which the substrate W is conveyed, i.e., in the Y direction. As shown in Fig. 3, a plurality of piezoelectric elements 35 respectively facing the respective nozzles 34 are provided on the surface of the bendable plate. The driving voltage of each of the piezoelectric elements 35 is supplied by the driving portion 36 provided in the head body 28. In this manner, after the piezoelectric element 2 expands and contracts and the bendable plate 29 is partially deformed, the solution can be ejected from the spray nozzles 34 at the position opposite to the piezoelectric element, and applied to the carried substrate w. Above. Therefore, a convex pattern in which the dot-like solutions are arranged in a matrix can be formed on the side surface of the substrate. Then, the respective coatings are flowed and moistened and expanded, and the coating patterns are adhered to each other to form an integrated film. Further, the right amount of the voltage applied to the piezoelectric element 35 is controlled to change the amount of discharge of the piezoelectric element 20 35 by the amount of discharge of the solution which is discharged from the nozzle of the piezoelectric element, i.e., the size of the droplet. The recovery hole 37 that communicates with the liquid chamber 32 is formed at the other end of the head body 28 in the longitudinal direction, and the solution supplied from the liquid supply hole 33 to the liquid chamber 32 can be recovered by the recovery hole 37. That is, each of the heads 1302333 discharges only the solution supplied to the liquid chamber 32 from the material 34, and the second chamber 32 is recovered from the time hole 37. As shown in Fig. 5, the horse's motion of the driving material set in each of the coating heads is controlled by the money control unit 41. That is, in the above-mentioned control, the X coordinates of the nozzles % of the plurality of coating heads 22 are formed. The respective gamma coordinates and the gamma coordinate system are clarified based on, for example, the attachment position of the application head 22 after the application head 22 is attached to the head β stage 19 . In this way, the discharge position of the solution with respect to the substrate w along the aforementioned γ direction can be controlled. 10 The device 41^ only manufactures the aforementioned "_ portion 36, and also controls the cymbal drive source 7 that drives the cymbal 5 in the X direction, the motive source u that turns the direction, and the head that will be provided with the coating head 22. The stage is called the drive of the drive source 21 driven by the direction. Next, the coating device of the above configuration will be described in the form of a substrate|coating 15 /liquid. First, the surface on which the transparent conductive film μ is provided is faced, and then adsorbed and held on the mounting table 13. Then, the θ drive source is turned on to rotate the stage 13 and the substrate W by a predetermined angle with respect to the χ direction, and the rotation angle of the 0 丨 1 is preferably in the range of 5 to 45 degrees. Fig. 7 shows the state of the substrate W rotated by the rotation angle ^. & When the mounting table 13 is rotated by the rotation angle θ, the drive source 7 can be actuated and the mounting table 13 can be driven in the X direction. In other words, the substrate is driven in the X direction indicated by the arrow in Fig. 7 in a state where the substrate is rotated by one rotation angle. Once the substrate W is driven in the X direction and the coated region R of the substrate coating solution (shown in FIG. 7) reaches below the coating head 22, the region IUx from the confrontation 12 1302333 k (positional The plurality of nozzles of the plurality of coating heads 22 deposit the solution toward the substrate. Therefore, the sew can be spread on the substrate, for example, in the four coating regions R shown in Fig. 7. In the solution coating region R, as shown in Fig. 6, a transparent conductive film 14 having a lattice shape is provided, and by the transparent conductive material, the substrate W is regularly formed on the substrate by the sides of the substrate. And the concave-convex pattern 15 formed by the convex portion (10). On the other hand, the solution is ejected from the nozzle 36 of each application head portion 22 at a predetermined point toward the substrate w. If the substrate is not rotated, the rotation is performed. When the angle is 0 degrees) driving in the X direction 10, the arrangement direction of the concave portion and the convex portion (10) formed on the substrate|seat is in the direction of the substrate W, that is, the x direction. Therefore, the time from the nozzle 34 is determined. The discharge position of the discharged liquid droplets is different from that of the concave portion 15. At this time, since the liquid droplets are discharged to the substrate w Since the convex portion 15b is blocked and 15 does not easily flow, the thickness of the functional film formed in the application region R by the flow of the droplets causes a phenomenon in which the portion corresponding to the concave portion ISa and the corresponding convex portion are uneven. However, the present invention In the embodiment, when the solution is applied to the substrate w, the substrate W is rotated in the range of 5 to 45 degrees and then transported in the X direction. That is, the direction of the substrate W, that is, the X direction, will be referred to. The arrangement direction of the concave portion 15a and the convex portion 15b which are regularly formed along the respective sides of the plate-to-side is inclined by a predetermined angle Θ. Here, the angle Θ is preferably set to be carried when the substrate w is conveyed in the X direction. The dot-shaped solution row which is ejected by the nozzle 34 and applied to the substrate W can traverse the angle θ of the two or more convex portions 15b which are disposed adjacent to each other in the horizontal direction 131302333. Since the convex portion such as the transparent electrode can be obtained from the design data of the substrate. The arrangement interval d of 5 b is the size RX of the application region R in the X direction. Therefore, for example, the aforementioned angle Θ can be obtained from the relationship of {tane>(d/Rx)}. Complex coating in the Y direction of the X-direction crossing The liquid droplets ejected from the nozzles 34 of the head portion 22 toward the substrate W are coated in a coating pattern in which the arrangement direction is inclined with respect to the arrangement direction of the concave portions 15a and the convex portions 15b in the concave-convex pattern 15 regularly formed on the substrate w. In this way, since the liquid droplets are not concentrated only on the concave portion 15a in the regularly formed unevenness 10 pattern 15, but can be applied to both the concave portion i5a and the convex portion 15b, the coated liquid droplet can be avoided. The flow is blocked by the convex portion 15b. Therefore, after the coating, the solution can flow through all the coating regions R, and the crucible can be formed to avoid the formation of a non-uniform portion of the functional film of excellent quality. w The solution is applied by applying 15 times under the coating head 22, but the substrate W may be reciprocally moved to coat the solution. In the case of reciprocating the substrate W coating solution, it is possible to change the rotation angle of the substrate w, that is, the rotation angle of the mounting table 13, at the time of the forward movement and the double movement. When the rotation angle θ of the mounting table 13 is changed during the forward movement and the double movement, the droplet application pattern for the coating portion in the forward movement and the double movement can be changed. In other words, it is said that the concave portion 15a and the convex portion 15b which are not coated with the droplets during the forward movement can be coated with droplets during the double movement. The mouth can be prevented from being merely formed on the substrate by the fact that the application of the liquid droplets to the coating portion region R of the substrate is not concentrated only on the concave portion 15a. The functional film produces a uniformity of 14 1302333 and improves the quality of the finished product. When the rotation angle θ of the substrate w is excessively large, the maximum width dimension in the Y direction orthogonal to the sense direction of the substrate boundary is larger than the arrangement size of the nozzle 34 in the Y direction. At this time, the coating region R is divided into a plurality of regions in the parallel γ direction, and the solution is applied to each of the divided regions. For example, in the case of the substrate W shown in FIG. 7, the arrangement size of the nozzle is smaller than the size of the substrate W in the Y direction, but if it is larger than 1/2 of the maximum size, 4 The coating area is divided into two coating areas which are defined by a straight line passing through the center of the substrate and parallel to the X direction, and the solution is applied to one of the two coated areas, and then the solution is applied. In another coating area. On the other hand, it is also possible to use 0 degree as the rotation angle θ of the substrate w and drive the substrate W in the X direction while applying the solution. At this time, the head stage 19 provided with the coating head portion 22 is driven in the direction of the 丫 15 while driving the substrate w in the X direction. In this manner, the relative moving direction of the coating head portion 22 is shifted in the oblique direction at an angle corresponding to the moving speed of the head stage 19 with respect to the direction in which the substrate is driven. That is, the moving direction of the coating head 22 will be shifted by a predetermined angle with respect to the arrangement direction of the concave portion 15a and the convex portion 15b formed on the substrate. Therefore, it is possible to prevent the droplets ejected from the nozzles 34 of the coating head portion 22 from being applied to the concave portion I5a of the substrate W. At this time, the substrate w may be reciprocated, and the solution may be applied separately during the forward movement and during the double movement. Alternatively, the nozzles 34 which are formed in the plurality of nozzles 34 15 1302333 of the coating head 22 may be sequentially switched to move the head stage 19 provided with the coating head 22 in the Y direction. For example, two nozzles 34 are formed at equidistant intervals in the Y direction in the coating head 22, and the nozzles 34 are divided into five groups of four groups in accordance with the arrangement direction. Next, while driving the substrate W in the X direction, the solution is discharged at a set time interval from the first nozzle 34 located on the right side of each group, and the nozzle 34 at the left end of the group is discharged after the solution is discharged. Go to the nozzle 34 of the right cake and repeat the step of discharging the solution. According to the method described above, the application direction of the solution of the substrate W is a direction in which the substrate 1 is tilted in the direction of the moving direction and the angle determined by the set time interval. Therefore, the arrangement direction of the liquid droplets in the coating pattern can be made inclined with respect to the arrangement direction of the concave portion i5a and the convex portion in the concave-convex pattern 15 regularly formed on the substrate w, so that the same effects as those of the above-described embodiment can be obtained. Further, the support body 17 provided with the application head portion 22 5 may be disposed at a predetermined angle with respect to the Y direction, or the arrangement direction of the plurality of nozzles 34 of the application head portion 22 may be arranged as (4) at a predetermined angle in the Y direction. The method of tilting the direction in which the nozzles 34 for discharging the solution in the plurality of nozzles 34 are switched in place of the aforementioned order. That is to say, the arrangement direction of the plurality of nozzles 34 may be arranged to be shifted by a predetermined angle by 20 degrees with respect to the arrangement direction of the above-mentioned concave-convex pattern 15 formed on the above-mentioned substrate w. Further, the mounting angle of the coating head portion 22 attached to the support body 17 may be mounted at a predetermined angle with respect to the Υ direction, instead of arranging the support body 17 at a predetermined angle with respect to the ¥ direction. In this case, the substrate w can be driven in the X direction, and when the substrate w passes 16 1302333 below each of the nozzles 34, the solution is discharged at the respective nozzles 34 of the coating region R on the counter substrate W. As a result, the solution applied to the substrate W is arranged at a position where the nozzles 34 are arranged at a direction inclined by an angle determined by the arrangement direction of the nozzles 34. Therefore, in this case, the arrangement direction of the liquid droplets can be inclined with respect to the arrangement direction of the concave portion 15a and the convex portion 15b in the concave-convex pattern 15 regularly formed by the substrate W, so that the same as the foregoing embodiment can be obtained. Effect. Further, in the example described in Fig. 7, the substrate W can be downloaded to the mounting table 13 in a state where the rotation angle Θ is rotated in advance, instead of rotating the mounting table 13 with a rotation angle of 1 degree. In this case, when the substrate W is supplied to the mounting table 13 by using a conveying device such as an automatic conveying machine as a control mechanism, the holding arm of the automatic conveying machine can be rotated by a predetermined rotation angle or the like, and the substrate w can be supplied to the mounting table 13 . . In this case, since the arrangement direction of the liquid droplets can be inclined with respect to the arrangement direction of the concave portion 15a and the convex portion 15b in the concave-convex pattern 15 regularly formed by the base 15 plate, it can be obtained as shown in FIG. The same effect as the example. In the above embodiment, the mounting table holding the substrate is driven in the X direction. However, the support having the coating head may be driven in the X direction as long as the substrate and the coating head are opposite to each other. The structure in the γ direction drive can be used. Further, although the present invention has been described with reference to a glass substrate w applied to a liquid crystal display panel for an active matrix method, it is not limited to this 'exemplary' and can be applied to a simple matrix method. The glass substrate to be liquid crystal display can be applied as long as it is a substrate W having a concave-convex pattern in which irregularities are regularly formed. 17 1302333 - Although the concave portion 15a and the convex portion 15b of the uneven pattern 15 are regularly formed in the longitudinal direction and the wide direction of the substrate %, the present invention is not limited thereto, and may be used with respect to the substrate W. The long direction is formed in a direction in which the width direction is inclined, or is formed along any of the longitudinal direction or the width direction of the substrate W. Further, the present invention is not limited to the case where the concave portion 15a and the convex portion 15b of the uneven pattern 15 are formed completely regularly, and even if a part of the concave portion 15a and the convex portion i5b are irregular, it is applicable as long as the whole is formed regularly. Further, in the example in which the concave portion 15a and the convex portion 15b having the uneven pattern 15 are regularly formed in the longitudinal direction and the wide direction of the substrate W, the dots are sprayed onto the substrate W by one nozzle 34. The angle Θ between the direction of the solution and the convex portion 15b is set to be in the range of up to 45 degrees, but the angle Θ is not limited to the range of up to 45 degrees, and may be larger than the angle. The possibility of utilization in the industry of μ 15 • According to the present invention, it is possible to avoid the occurrence of unevenness in the film formed on the substrate by the applied solution. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front elevational view showing a schematic structure 20 of a coating apparatus according to an embodiment of the present invention. σ Fig. 2 is a side view of the coating device shown in Fig. 1. Figure 3 is a longitudinal sectional view of the coating head. Fig. 4 is a view showing the bottom surface of the coating head on which the nozzle is formed. Figure 5 is a block diagram showing the control system. 1302333 Fig. 6 is an explanatory view showing a concavo-convex pattern formed on a substrate by a transparent conductive film. Fig. 7 is an explanatory view showing a substrate and a coating head which are rotated at an angle of X and driven in the X direction. [Main component symbol description]
1…底座 18.··安裝構件 2...座腳 19...頭部載台 3...安裝板 2L..Y驅動源 4...引導才冓件 22…塗佈頭部 5…X台 28…頭部本體 6…支撐構件 29…可撓板 7…X驅動源 31…喷嘴板 8…螺旋軸 31A···主管 9...螺帽體 32...液室 11…Θ台 33...給液孔 12. "Θ驅動源 34…喷嘴 13...載置台 35...壓電元件 14…透明導電膜 36···驅動部 15…凹凸圖案 37…回收孔 15a...凹部 41…控制裝置 15b..·凸部 W...基板 17··.支稽體 191... base 18... mounting member 2... seat leg 19... head carrier 3... mounting plate 2L..Y drive source 4... guiding member 22... coating head 5 ...X stage 28...Head body 6...Support member 29...Flexible plate 7...X drive source 31...Nozzle plate 8...Helical shaft 31A···Supervisor 9... Nut body 32...Liquid chamber 11... 33台33...feeding hole 12. "Θ drive source 34...nozzle 13...mounting table 35...piezoelectric element 14...transparent conductive film 36··drive unit 15...concave pattern 37...recycling Hole 15a... recess 41... control device 15b.. convex portion W... substrate 17··.