TWI395637B - Precision polishing device - Google Patents
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- TWI395637B TWI395637B TW98129670A TW98129670A TWI395637B TW I395637 B TWI395637 B TW I395637B TW 98129670 A TW98129670 A TW 98129670A TW 98129670 A TW98129670 A TW 98129670A TW I395637 B TWI395637 B TW I395637B
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Description
本發明是有關於一種加工機具,特別是指一種精密拋光裝置。The present invention relates to a processing tool, and more particularly to a precision polishing apparatus.
切削加工是一般最為常見的材料移除程序,一般工件的切削加工往往需經過多次的初切削、細切削與精切削,但是經切削加工後的工件往往都會在工件的表面上留下許多細小的切削紋路,因此,對於十分要求表面粗糙或表面精度的工件而言,工件在經過切削加工後還需經過研磨、拋光...等後續加工程序消除切削紋路,以獲得較為平整的工件表面。Machining is the most common material removal procedure. Generally, the workpiece is often subjected to multiple initial, fine and fine cutting operations, but the workpiece after cutting often leaves many small defects on the surface of the workpiece. The cutting lines, therefore, for workpieces that require surface roughness or surface accuracy, the workpieces need to be machined, polished, etc. after cutting to eliminate the cutting lines to obtain a smoother workpiece surface.
英國公告第GB2452091號專利中揭露一種電腦控制的加工機及控制方法,該加工機能的加工主軸可以沿兩立體交叉的圓弧形預定路徑移動,以研磨切削加工後的成品,但是一般的研磨或拋光加工程序與切削加工是相互分離的,所以,當切削加工完成後需將工件拆下,再裝設到如研磨或拋光的加工機上,進行研磨或拋光加工程序,所有的加工機操作人員都知道,拆裝工件不但影響加工效率,且工件的拆裝過程往往會伴隨產生夾持定位上的誤差,進而影響了工件的尺寸精度。A computer-controlled processing machine and a control method are disclosed in the British Patent Publication No. GB2452091. The processing spindle of the processing function can be moved along a two-dimensional intersecting arc-shaped predetermined path to grind the finished product after cutting, but the general grinding or The polishing process and the cutting process are separated from each other. Therefore, when the cutting process is completed, the workpiece needs to be removed, and then mounted on a processing machine such as grinding or polishing to perform grinding or polishing processing, and all processing machine operators It is known that the disassembly and assembly of the workpiece not only affects the processing efficiency, but also the disassembly and assembly process of the workpiece is often accompanied by the error in the clamping position, which in turn affects the dimensional accuracy of the workpiece.
為了克服上述缺點,相關業者研發出如中華民國公告第I230107號發明專利所揭露的技術,其主要改善之處在於:整合車削系統、化學機械拋光系統,及電解拋光系統成 為一精密複合加工裝置,減少拆裝工件的麻煩與拆裝工件時所可能產生的誤差。In order to overcome the above shortcomings, the related art has developed a technology disclosed in the invention patent of the Republic of China No. I230107, which mainly improves the integration of the turning system, the chemical mechanical polishing system, and the electrolytic polishing system. It is a precision compound processing device, which reduces the trouble of disassembling the workpiece and the error that may occur when disassembling the workpiece.
但是,該化學機械拋光系因拋光程序所產生的磨耗,或是車削系統的加工誤差皆會而影響拋光程序的準確度。However, the chemical mechanical polishing may affect the accuracy of the polishing process due to the abrasion caused by the polishing process or the machining error of the turning system.
因此,本發明之目的,即在提供一種可方便、快速,且拋光精密度高之精密拋光裝置。Accordingly, it is an object of the present invention to provide a precision polishing apparatus that is convenient, fast, and highly precise in polishing.
於是,本發明之精密拋光裝置適用於一加工機上以拋光一待拋光物件,該精密拋光裝置包含一與該加工機相間隔的支架、一設置該支架上的拋光單元,及一連接該支架與該拋光單元的連接單元。Thus, the precision polishing apparatus of the present invention is suitable for use in a processing machine for polishing a workpiece to be polished, the precision polishing apparatus comprising a bracket spaced from the processing machine, a polishing unit disposed on the bracket, and a connecting bracket A connection unit with the polishing unit.
該拋光單元能沿兩條圓弧形立體交叉的預定路徑相對該待拋光物件移動以拋光該待拋光物件;該連接單元包括一連設於該加工機上且界定出一安裝空間的基座、一設置於該基座之安裝空間中的緩衝座,及至少一設置於該基座上且能被控制地迫抵該緩衝座上的作動件,其中該緩衝座是部分突出於該安裝空間外,而連設於該支架上,當該緩衝座受到該作動件的迫抵時,會產生應力集中而連動該支架,而使設置於該支架上的拋光單元,改變與該待拋光物件之間的負載。The polishing unit is movable relative to the object to be polished along a predetermined path of two circular arc-shaped intersections to polish the object to be polished; the connecting unit includes a base connected to the processing machine and defining an installation space, a buffer seat disposed in the installation space of the base, and at least one actuating member disposed on the base and capable of being controlled to abut against the buffer seat, wherein the buffer seat is partially protruded outside the installation space And being connected to the bracket, when the buffer seat is pressed by the actuating member, stress concentration occurs to interlock the bracket, and the polishing unit disposed on the bracket is changed between the object to be polished and the object to be polished. load.
本發明之功效在於:利用該連接單元結合該拋光單元與該加工機,再配合該作動件能被控制地迫抵該緩衝座,而使該緩衝座因結構弱化而產生應力集中,同時造成該緩衝座產生微量變形與位移,連帶地使連接於該緩衝座的拋 光單元,相對該待拋光物件產生微量的位移變化,藉以調整該拋光單元與該待拋光物件間的負載與拋光加工率,進而使該拋光單元與該待拋光物件間的負載可以保持固定,以提高拋光該待拋光物件的拋光精密度。The utility model has the advantages that the connecting unit is combined with the processing unit and the processing machine, and the actuating member can be controlled to be pressed against the buffer seat, so that the buffer seat is concentrated due to structural weakening, and the The buffer seat generates a slight deformation and displacement, and the throwing connection to the buffer seat The light unit generates a slight displacement change relative to the object to be polished, thereby adjusting the load and the polishing rate between the polishing unit and the object to be polished, so that the load between the polishing unit and the object to be polished can be kept fixed. Improve polishing precision of polishing the object to be polished.
有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式之二個較佳實施例的詳細說明中,將可清楚的呈現。The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments of the invention.
在本發明被詳細描述之前,要注意的是,在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it is noted that in the following description, similar elements are denoted by the same reference numerals.
參閱圖1,本發明精密拋光裝置1之第一較佳實施例包含一支架2、一設置該支架2上的拋光單元3,及一連接該支架2的連接單元4。Referring to Figure 1, a first preferred embodiment of the precision polishing apparatus 1 of the present invention comprises a holder 2, a polishing unit 3 on which the holder 2 is disposed, and a connection unit 4 to which the holder 2 is attached.
該連接單元4包括一個界定出有一安裝空間410的基座41、一設置於該安裝空間410中的緩衝座42,及四個設置於該基座41上且能被控制地迫抵該緩衝座42上的作動件44(因視角關係圖1中僅顯示3個)。其中,該緩衝座42包括一設置於該基座41中的本體421、一連接該本體421並突出於該安裝空間410外而連設於該支架2上的連接件43,及多數形成於該本體421上的預留孔422,每一作動件44是設置於該基座41上且位於該基座41與該本體421之間,並能被控制地沿所述預留孔422的方向迫抵該緩衝座42的本體421。於本較佳實施例中,所述作動件44是壓電致動器。The connecting unit 4 includes a base 41 defining a mounting space 410, a buffer base 42 disposed in the mounting space 410, and four disposed on the base 41 and controllably resisting the buffer base Actuator 44 on 42 (only three are shown in Figure 1 due to the viewing angle relationship). The buffer base 42 includes a main body 421 disposed in the base 41, a connecting member 43 connected to the main body 421 and protruding from the mounting space 410 and connected to the bracket 2, and most of the connecting members 43 are formed thereon. Each of the actuating members 44 is disposed on the base 41 and located between the base 41 and the body 421, and can be controlled to be forced along the reserved hole 422. The body 421 of the buffer base 42 is abutted. In the preferred embodiment, the actuator 44 is a piezoelectric actuator.
參閱圖1、2,為方便說明圖2中省略部分構件,該拋光單元3包括一設置於該支架2上且呈圓弧狀的第一導軌5、一與該第一導軌5間隔設置於該支架2上的第一驅動組6,及一連接該第一導軌5與該第一驅動組6的拋光組7,其中,該第一驅動組6具有一設置於該支架2上的第一動力源61,及一為該第一動力源61所驅動而轉動的結合座62;該拋光組7具有一滑動地設置該第一導軌5上的滑動座71、一呈圓弧狀且兩端分別連接該滑動座71與該結合座62的第二導軌72、一能滑動地設置於該第二導軌72上的拋光座73、一能驅動該拋光座73沿該第二導軌72移動的第二驅動組74、一設置於該拋光座73上的第二動力源75、一能為該第二動力源75所驅動旋轉的拋光主軸76,及一拆卸地設置於該拋光主軸76上的拋光刀具77。Referring to FIGS. 1 and 2, for convenience of description, a part of the member is omitted in FIG. 2, the polishing unit 3 includes a first guide rail 5 disposed on the bracket 2 and having an arc shape, and is spaced apart from the first rail 5 a first driving group 6 on the bracket 2, and a polishing group 7 connecting the first rail 5 and the first driving group 6, wherein the first driving group 6 has a first power disposed on the bracket 2 a source 61, and a coupling seat 62 that is driven by the first power source 61. The polishing group 7 has a sliding seat 71 on the first rail 5, and has an arc shape and two ends respectively. a second rail 72 connecting the sliding seat 71 and the coupling seat 62, a polishing seat 73 slidably disposed on the second rail 72, and a second driving unit 7 capable of driving the polishing seat 73 to move along the second rail 72 a driving group 74, a second power source 75 disposed on the polishing base 73, a polishing spindle 76 capable of being rotated by the second power source 75, and a polishing tool detachably disposed on the polishing spindle 76 77.
而該滑動座71具有一座體711、多數樞設於該座體711上且與該第一導軌5滑動接觸的第一滾輪712。The sliding seat 71 has a body 711 and a plurality of first rollers 712 pivotally mounted on the base 711 and in sliding contact with the first rail 5.
參閱圖2、3並一並回顧圖1,為方便說明圖3中省略部分構件,該第二驅動組74具有一形成於該第二導軌72上的齒條741、一與該齒條741相互嚙合的齒輪742、一設置於該拋光座73上且能驅動該齒輪742轉動的第三動力源743,及多數樞設於該拋光座73上且與該第二導軌72滑動接觸的第二滾輪744。於本較佳實施例中,該第一、三動力源61、743是步進馬達、而該第二動力源75則是一伺服馬達。Referring to FIGS. 2 and 3 and reviewing FIG. 1 , for convenience of explaining a part of the components in FIG. 3 , the second driving group 74 has a rack 741 formed on the second rail 72 , and a rack 741 . The meshing gear 742, a third power source 743 disposed on the polishing base 73 and capable of driving the gear 742 to rotate, and a second roller pivotally disposed on the polishing base 73 and in sliding contact with the second rail 72 744. In the preferred embodiment, the first and third power sources 61, 743 are stepping motors and the second power source 75 is a servo motor.
參閱圖4、5、6,實際使用時該精密拋光裝置1是利用該基座41而安裝於一加工機100上以拋光一待拋光物件101,且該第一、二、三動力源61、75、743與所述作動件44的作動模式皆是由程控電腦(圖未示)所控制。於本較佳實施例中,該待拋光物件101即為該加工機100所加工製成,而且該加工機100即是常見的電腦數值控制機台(Computer Numerical Control,CNC),例如常見的CNC銑床或CNC車床...等,皆可安裝本發明之精密拋光裝置1,所以不應以本實施例之說明為限。4, 5, and 6, in actual use, the precision polishing apparatus 1 is mounted on a processing machine 100 by using the base 41 to polish a workpiece 101 to be polished, and the first, second, and third power sources 61, The actuation modes of 75, 743 and the actuating member 44 are all controlled by a programmable computer (not shown). In the preferred embodiment, the object to be polished 101 is processed by the processing machine 100, and the processing machine 100 is a common computer numerical control machine (CNC), such as a common CNC. The precision polishing apparatus 1 of the present invention can be mounted on a milling machine or a CNC lathe, etc., and therefore should not be limited to the description of the embodiment.
使用上,是先使工件在該加工機100上完成加工作業之後,再利用操控該加工機100而將工件平順地移到該精密拋光裝置1的位置處直接進行拋光,此時,該拋光刀具77是觸抵於該待拋光物件101的側表面上,而該第二動力源75即能驅動該拋光刀具77依據圖5中箭頭11所示方向進行該待拋光物件101的拋光作業,此時該拋光刀具77的運動方向是沿著待拋光物件101的徑向方向運動,藉此消彌拋光刀具77表面粗度分布不均的效應。In use, after the workpiece is first processed on the processing machine 100, the workpiece is smoothly moved to the position of the precision polishing apparatus 1 by manipulating the processing machine 100. At this time, the polishing tool is directly polished. 77 is in contact with the side surface of the object to be polished 101, and the second power source 75 can drive the polishing tool 77 to perform the polishing operation of the object to be polished 101 according to the direction indicated by the arrow 11 in FIG. The moving direction of the polishing tool 77 is moved in the radial direction of the object to be polished 101, thereby eliminating the effect of uneven distribution of the surface roughness of the polishing tool 77.
而該第三動力源743驅動與該齒條741(顯示於圖3)相互囓合之齒輪742(顯示於圖3),進而驅動該拋光座73能於該第二導軌72上依據圖5中箭頭14所述方向移動,確保該拋光刀具77的旋轉軸線能與該待拋光物件101表面的法線一起旋轉而保持不變的夾角。The third power source 743 drives a gear 742 (shown in FIG. 3) that meshes with the rack 741 (shown in FIG. 3), thereby driving the polishing seat 73 to be on the second rail 72 according to the arrow in FIG. The direction of movement 14 ensures that the axis of rotation of the polishing tool 77 can be rotated with the normal to the surface of the object to be polished 101 to maintain a constant angle.
而該第一動力源61是能驅動該結合座62依據圖5中箭頭12所示方向轉動,帶動該第二導軌72依據圖6中箭頭13所述方向相對該待拋光物件101擺動,使該滑動座71於該第一導軌5上依據圖6中箭頭13所述方向移動,而使該拋光刀具77沿著待拋光物件101的徑向方向產生搖擺運動,進而增加該拋光刀具77與待拋光物件101間的磨耗範圍(磨耗寬帶),造成該拋光刀具77的磨耗較為均勻,以抑制該拋光刀具77的磨耗效應,增加該拋光刀具77的使用壽命。The first power source 61 is capable of driving the binding base 62 to rotate in the direction indicated by the arrow 12 in FIG. 5, and the second rail 72 is driven to swing relative to the object to be polished 101 according to the direction of the arrow 13 in FIG. The sliding seat 71 moves on the first guide rail 5 in the direction indicated by the arrow 13 in FIG. 6, so that the polishing tool 77 generates a rocking motion along the radial direction of the object to be polished 101, thereby increasing the polishing tool 77 and the polishing tool to be polished. The wear range between the articles 101 (wideband wear) causes the polishing tool 77 to wear more uniformly, thereby suppressing the wear effect of the polishing tool 77 and increasing the service life of the polishing tool 77.
此外,藉由程控電腦控制使每一作動件44(顯示於圖5)是能被控制地沿所述預留孔422的方向迫抵該緩衝座42的本體421,使該緩衝座42的本體421於所述預留孔422處(即結構弱化)產生應力集中現象,同時造成該本體421產生微量變形與位移,連帶的使該拋光刀具77相對該待拋光物件101產生微量的位移變化,使得拋光刀具77與待拋光物件101之間保持穩定的負載,使該拋光刀具77能精準地移除該待拋光物件101的形狀誤差,提高加工的精確度。In addition, each actuating member 44 (shown in FIG. 5) is controlled to be forced against the body 421 of the buffer base 42 in the direction of the reserved hole 422 by the program control computer control, so that the body of the buffer base 42 The 421 generates a stress concentration phenomenon at the reserved hole 422 (ie, the structure is weakened), and causes a slight deformation and displacement of the body 421, which causes the polishing tool 77 to generate a slight displacement change with respect to the object to be polished 101, so that A stable load is maintained between the polishing tool 77 and the object to be polished 101, so that the polishing tool 77 can accurately remove the shape error of the object to be polished 101 and improve the processing accuracy.
由上述可知,本發明精密拋光裝置1在實際應用上,具有下述之功效:It can be seen from the above that the precision polishing apparatus 1 of the present invention has the following effects in practical applications:
1.拋光精密度高:1. High polishing precision:
由於該待拋光物件101在加工機100完成加工作業之後,完全無需移除,就可以直接利用該加工機100本身的高精度移動方式,使該待拋光物件101能平順地移到該精密拋光裝置1的位置處直接進行拋光,不僅作業方便,而且也不會使該待拋光物件101因轉換機具產生位置精度偏移的現象;再者利用該第一、二導軌5、72不但可以固定確保該拋光刀具77的旋轉軸線能與該待拋光物件101表面的法線一起旋轉而保持不變的夾角,更可以使該拋光刀具77沿著待拋光物件101的徑向方向產生搖擺運動進而抑制該拋光刀具77的磨耗效應,最後配合迫抵該緩衝座42上的所述作動件44,使該本體421產生微量變形與位移,改變調整該拋光刀具77於拋光作業進行中與該待拋光物件101間的負載,同時改變該拋光刀具77在該待拋光物件101表面不同位置的停留時間,精準地移除該待拋光物件101的形狀誤差,有效提高拋光作業的精密度。Since the object to be polished 101 is processed without any removal after the processing machine 100 completes the processing operation, the high precision movement of the processing machine 100 itself can be directly utilized, so that the object to be polished 101 can be smoothly moved to the precision polishing device. Polishing directly at the position of 1 not only facilitates the operation, but also does not cause the positional accuracy of the object to be polished 101 to be shifted due to the conversion tool; further, the first and second guide rails 5, 72 can be used to secure the same. The rotation axis of the polishing tool 77 can be rotated together with the normal line of the surface of the object to be polished 101 to maintain a constant angle, and the polishing tool 77 can be caused to swing along the radial direction of the object to be polished 101 to suppress the polishing. The wear effect of the cutter 77 finally matches the actuating member 44 on the buffer base 42 to cause a slight deformation and displacement of the body 421, and the polishing tool 77 is changed and adjusted between the polishing operation and the object to be polished 101. The load, while changing the residence time of the polishing tool 77 at different positions on the surface of the object to be polished 101, accurately removing the object to be polished 101 Shape error, effectively improve the precision of the polishing operation.
2.方便且成本低、易於在各類型加工機上安裝拆卸:2. Convenient and low cost, easy to install and disassemble on all types of processing machines:
利用該連接單元4即可連接該加工機100與該支架2及該拋光單元3,因此可以直接加裝於該加工機100上,不但方便又能降低額外購買機器的成本。The processing unit 100 and the bracket 2 and the polishing unit 3 can be connected by the connecting unit 4, so that it can be directly attached to the processing machine 100, which not only facilitates but also reduces the cost of additional purchase of the machine.
更何況,由於該連接單元4可易於拆卸、安裝地連接於該加工機100上,因此,就可以靈活地將該拋光單元3運用在各種類型的加工機,例如前述CNC銑床與CNC車床...等,換言之,加工機與精密拋光裝置1必要時可以整合在一起,也可以將精密拋光裝置1拆卸下來而只操作加工機,整體運用上相當靈活。Moreover, since the connecting unit 4 can be easily detachably and detachably attached to the processing machine 100, the polishing unit 3 can be flexibly applied to various types of processing machines, such as the aforementioned CNC milling machine and CNC lathe.. In other words, the processing machine and the precision polishing device 1 can be integrated as necessary, or the precision polishing device 1 can be detached and only the processing machine can be operated, and the overall operation is quite flexible.
3.使用壽命長:3. Long service life:
續上述,該拋光刀具77能藉由上述的搖擺運動,增加與該待拋光物件101間的磨耗寬帶,使該拋光刀具77的磨耗更為均勻;再利所述作動件44的作用力,迫使該緩衝座42之本體421因所述預留孔422所造成之結構弱化,產生微量變形與位移,使該拋光刀具77在拋光作業進行中與該待拋光物件101間的負載保持固定,有效抑制該拋光刀具77的磨耗效應,增加整體的使用壽命。Continuing the above, the polishing tool 77 can increase the wear band width with the object to be polished 101 by the above-mentioned rocking motion, so that the wear of the polishing tool 77 is more uniform; and the force of the actuating member 44 is forced to force The structure of the main body 421 of the buffer base 42 is weakened due to the reserved hole 422, and a slight deformation and displacement are generated, so that the polishing tool 77 is kept fixed during the polishing operation and the load between the object to be polished 101 is effectively suppressed. The wear effect of the polishing tool 77 increases the overall service life.
4.圓弧形立體拋光設計的特殊功效:4. Special effects of circular arc stereo polishing design:
如習知技術中所記載之英國公告第GB2452091號專利所述,其雖然也有圓弧形立體拋光設計理念,但是這只是為了因應工件表面形狀所致,而本發明所設計的第一、二導軌5、72,卻能達到該英國專利案所從未提及的功效-即確保該拋光刀具77可以因應待拋光物件101不同位置的自由曲面法線,而保持不變的夾角;以及該拋光刀具77可以沿著待拋光物件101的徑向方向產生搖擺運動,進而增加該拋光刀具77與待拋光物件101間的磨耗寬帶,以抑制該拋光刀具77的磨耗效應。As described in the British Patent No. GB2452091, which is described in the prior art, although it also has a circular arc-shaped three-dimensional polishing design concept, this is only for the surface shape of the workpiece, and the first and second guide rails designed by the present invention. 5, 72, but can achieve the effect never mentioned in the British patent case - that is, to ensure that the polishing tool 77 can maintain a constant angle according to the free surface normal of different positions of the object 101 to be polished; and the polishing tool 77 can generate a rocking motion in the radial direction of the object to be polished 101, thereby increasing the wear width between the polishing tool 77 and the object to be polished 101 to suppress the wear effect of the polishing tool 77.
參閱圖6,本發明精密拋光裝置1之第二較佳實施例大致是與該第一較佳實施例相同,包含一支架2、一拋光單元3,及一連接單元4。不相同的地方在於:該拋光單元3包括一設置於該支架2上的第一傳動組31、一設置於該第一傳動組31上的第二傳動組32,及一設置於該第二傳動組32上的拋光機構33,其中,該第一傳動組31具有沿一第一軸線L1間隔設置於該支架2上的一第一樞轉座311與一第一傳動件312,及一樞設於該第一樞轉座311上且能為該第一傳動件312所傳動而以該第一軸線L1為軸心擺動的外框架313,該第二傳動組32具有一沿一第二軸線L2間隔設置於該外框架313上的一第二樞轉座321與一第二傳動件322,該拋光機構33具有一樞設於該第二樞轉座321上且被該第二傳動件322所傳動而以該第二軸線L2為軸心擺動的安裝座331、一設於該安裝座331上的第三傳動件332、一能為該第三傳動件332所傳動旋轉的作動軸333,及一可拆卸地設置於該作動軸333上的拋光刀頭334,其中,該第一軸線L1與該第二軸線L2是相互垂直,而使該作動軸333能以兩條圓弧形立體交叉的預定路徑15、16相對該待拋光物件101(顯示於圖5)移動,其中,該拋光刀頭334的運動方向是沿著待拋光物件101的徑向方向產生搖擺運動,增加該拋光刀頭334與待拋光物件101間的磨耗寬帶,以抑制該拋光刀頭334的磨耗效應,並且該拋光刀頭334的旋轉軸線能與該待拋光物件101表面的法線一起旋轉而保持不變的夾角。於本較佳實施例中,第一、二傳動件是312、322是步進馬達、而該第三傳動件332則是一伺服馬達。Referring to FIG. 6, a second preferred embodiment of the precision polishing apparatus 1 of the present invention is substantially the same as the first preferred embodiment, and includes a bracket 2, a polishing unit 3, and a connecting unit 4. The difference is that the polishing unit 3 includes a first transmission group 31 disposed on the bracket 2, a second transmission group 32 disposed on the first transmission group 31, and a second transmission unit disposed on the second transmission. a polishing mechanism 33 on the group 32, wherein the first transmission group 31 has a first pivoting seat 311 and a first transmission member 312 spaced apart from each other along the first axis L1, and a pivoting portion An outer frame 313 of the first pivoting member 311 and capable of being driven by the first transmission member 312 and pivoting about the first axis L1. The second transmission group 32 has a second axis L2. a second pivoting seat 321 and a second transmitting member 322 are disposed on the outer frame 313. The polishing mechanism 33 has a pivoting mechanism 321 and is coupled to the second pivoting member 321 and configured by the second transmitting member 322. a mounting base 331 that is pivoted about the second axis L2, a third transmission member 332 disposed on the mounting base 331, and an actuating shaft 333 that can be rotated by the third transmission member 332, and a polishing head 334 detachably disposed on the operating shaft 333, wherein the first axis L1 and the second axis L2 are mutually Vertically, the actuating shaft 333 can be moved relative to the object to be polished 101 (shown in FIG. 5) by a predetermined path 15, 16 intersecting in two arcs, wherein the direction of movement of the buff head 334 is along The radial direction of the object to be polished 101 generates a rocking motion, increasing the wear width between the polishing head 334 and the object to be polished 101 to suppress the wear effect of the polishing head 334, and the rotation axis of the polishing head 334 can be The normal to the surface of the object to be polished 101 is rotated together to maintain a constant angle. In the preferred embodiment, the first and second transmission members are 312, 322 which are stepping motors and the third transmission member 332 is a servo motor.
因為本實施例之整體結構大致皆與前述第一較佳實施例相同,因此上述所提及的各種功效,本實施例亦確實能達成,在此不再贅述,除此之外,也提供使用者一種不同於該第一較佳實施例的態樣。The overall structure of the present embodiment is substantially the same as that of the foregoing first preferred embodiment. Therefore, the various functions mentioned above can be achieved by the present embodiment, and will not be further described herein. A different from the first preferred embodiment.
綜上所述,本發明之精密拋光裝置1利用該連接單元4結合該拋光單元3與該加工機100,在設計安裝上不但方便又能降低額外購買機器的成本;再配合該作動件44能被控制地迫抵該緩衝座42,而使該緩衝座42因結構弱化而產生應力集中現象,造成該緩衝座42產生微量變形與位移,連帶地使連接於該緩衝座42的拋光刀具77,相對該待拋光物件101產生微量的位移變化,藉以使該拋光刀具77於拋光作業進行中與該待拋光物件101間的負載保持固定,而且該拋光刀具77所產生的搖擺運動更能增加與該待拋光物件101間的磨耗寬帶,而能藉此抑制該拋光刀具77與拋光刀頭334的磨耗效應,以提高加工的精確度拋光刀頭,並增加整體的使用壽命,故確實能達成本發明之目的。In summary, the precision polishing apparatus 1 of the present invention combines the polishing unit 3 and the processing machine 100 by using the connecting unit 4, which is convenient in design and installation and can reduce the cost of additional purchase of the machine; Controlly pressing against the buffer base 42 causes the buffer base 42 to be concentrated due to structural weakening, causing a slight deformation and displacement of the buffer base 42 and, in conjunction with the polishing tool 77 connected to the buffer base 42, A slight displacement change is generated with respect to the object to be polished 101, so that the polishing tool 77 is kept fixed with the load between the object to be polished 101 during the polishing operation, and the rocking motion generated by the polishing tool 77 can be increased. The abrasion between the objects to be polished 101 is wide, and the abrasion effect of the polishing tool 77 and the polishing blade 334 can be suppressed, thereby improving the precision of the polishing, and increasing the overall service life, so that the present invention can be achieved. The purpose.
惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.
1‧‧‧精密拋光裝置1‧‧‧Precision polishing device
2‧‧‧支架2‧‧‧ bracket
3‧‧‧拋光單元3‧‧‧ Polishing unit
31‧‧‧第一傳動組31‧‧‧First Transmission Group
311‧‧‧第一樞轉座311‧‧‧First pivoting seat
312‧‧‧第一傳動件312‧‧‧First transmission
313‧‧‧外框架313‧‧‧External framework
32‧‧‧第二傳動組32‧‧‧Second gear set
321‧‧‧第二樞轉座321‧‧‧Second pivoting seat
322‧‧‧第二傳動件322‧‧‧second transmission parts
33‧‧‧拋光機構33‧‧‧ polishing mechanism
331‧‧‧安裝座331‧‧‧ Mounting
332‧‧‧第三傳動件332‧‧‧ Third transmission
333‧‧‧作動軸333‧‧‧ actuation axis
334‧‧‧拋光刀頭334‧‧‧ polishing head
4‧‧‧連接單元4‧‧‧ Connection unit
41‧‧‧基座41‧‧‧Base
410‧‧‧安裝空間410‧‧‧ installation space
42‧‧‧緩衝座42‧‧‧ Buffer seat
421‧‧‧本體421‧‧‧ Ontology
422‧‧‧預留孔422‧‧‧Reserved holes
43‧‧‧連接件43‧‧‧Connecting parts
44‧‧‧作動件44‧‧‧Operator
5‧‧‧第一導軌5‧‧‧First rail
6‧‧‧第一驅動組6‧‧‧First Drive Group
61‧‧‧第一動力源61‧‧‧First power source
62‧‧‧結合座62‧‧‧ joint
7‧‧‧拋光組7‧‧‧ polishing group
71‧‧‧滑動座71‧‧‧Sliding seat
711‧‧‧座體711‧‧‧ body
712‧‧‧第一滾輪712‧‧‧First wheel
72‧‧‧第二導軌72‧‧‧Second rail
73‧‧‧拋光座73‧‧‧ polishing seat
74‧‧‧第二驅動組74‧‧‧Second drive group
741‧‧‧齒條741‧‧‧Rack
742‧‧‧齒輪742‧‧‧ Gears
743‧‧‧第三動力源743‧‧‧ Third power source
744‧‧‧第二滾輪744‧‧‧Second wheel
75‧‧‧第二動力源75‧‧‧second power source
76‧‧‧拋光主軸76‧‧‧ polishing spindle
77‧‧‧拋光刀具77‧‧‧ polishing tools
100‧‧‧加工機100‧‧‧Processing machine
101‧‧‧待拋光物件101‧‧‧Items to be polished
L1‧‧‧第一軸線L1‧‧‧first axis
L2‧‧‧第二軸線L2‧‧‧second axis
11~16‧‧‧箭頭11~16‧‧‧ arrow
圖1是一立體圖,說明本發明精密拋光裝置之第一較佳實施例;圖2是一立體圖,輔助說明圖1,其中省略部分構件;圖3是一局部放大圖,說明該第一較佳實施例中第二驅動組的態樣;圖4是一立體圖,說明該第一較佳實施例安裝於一加工機上的情形;圖5是一側視圖,說明該第一較佳實施例加工時的態樣;圖6是另一側視圖,輔助說明圖5;及 圖7是一立體圖,說明本發明精密拋光裝置之第二較佳實施例。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a first preferred embodiment of the precision polishing apparatus of the present invention; Fig. 2 is a perspective view, which is an explanatory view of Fig. 1, in which a part of the member is omitted; and Fig. 3 is a partially enlarged view showing the first preferred embodiment. FIG. 4 is a perspective view showing the first preferred embodiment mounted on a processing machine; FIG. 5 is a side view showing the processing of the first preferred embodiment Figure 6 is another side view, with assistance in explaining Figure 5; Figure 7 is a perspective view showing a second preferred embodiment of the precision polishing apparatus of the present invention.
1‧‧‧精密拋光裝置1‧‧‧Precision polishing device
2‧‧‧支架2‧‧‧ bracket
3‧‧‧拋光單元3‧‧‧ Polishing unit
4‧‧‧連接單元4‧‧‧ Connection unit
41‧‧‧基座41‧‧‧Base
410‧‧‧安裝空間410‧‧‧ installation space
42‧‧‧緩衝座42‧‧‧ Buffer seat
421‧‧‧本體421‧‧‧ Ontology
422‧‧‧預留孔422‧‧‧Reserved holes
43‧‧‧連接件43‧‧‧Connecting parts
44‧‧‧作動件44‧‧‧Operator
5‧‧‧第一導軌5‧‧‧First rail
6‧‧‧第一驅動組6‧‧‧First Drive Group
61‧‧‧第一動力源61‧‧‧First power source
62‧‧‧結合座62‧‧‧ joint
7‧‧‧拋光組7‧‧‧ polishing group
72‧‧‧第二導軌72‧‧‧Second rail
73‧‧‧拋光座73‧‧‧ polishing seat
744‧‧‧第二滾輪744‧‧‧Second wheel
75‧‧‧第二動力源75‧‧‧second power source
76‧‧‧拋光主軸76‧‧‧ polishing spindle
77‧‧‧拋光刀具77‧‧‧ polishing tools
Claims (8)
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|---|---|---|---|
| TW98129670A TWI395637B (en) | 2009-09-03 | 2009-09-03 | Precision polishing device |
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| Application Number | Priority Date | Filing Date | Title |
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| TW98129670A TWI395637B (en) | 2009-09-03 | 2009-09-03 | Precision polishing device |
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| TW201109120A TW201109120A (en) | 2011-03-16 |
| TWI395637B true TWI395637B (en) | 2013-05-11 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200726574A (en) * | 2005-08-04 | 2007-07-16 | Toyota Motor Co Ltd | Precision machining apparatus and precision machining method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200726574A (en) * | 2005-08-04 | 2007-07-16 | Toyota Motor Co Ltd | Precision machining apparatus and precision machining method |
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