TWI392871B - Biaxial acceleration sensing element - Google Patents
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Description
本發明有關一種雙軸加速度感測元件,尤指一種電容式之雙軸加速度感測元件。The invention relates to a biaxial acceleration sensing component, in particular to a capacitive biaxial acceleration sensing component.
微機電系統(Micro-electromechanical system, 簡稱MEMS)技術的概念,是利用半導體製程及其他微機械加工的方法,製造並整合成各式感測器、致動器、光學元件等,利用MEMS技術將元件微小化具低成本、低功率損耗、高響應速度以及高準確度等優點。The concept of Micro-electromechanical system (MEMS) technology is to manufacture and integrate various types of sensors, actuators, optical components, etc. by means of semiconductor processes and other micromachining methods, using MEMS technology. Component miniaturization has the advantages of low cost, low power loss, high response speed and high accuracy.
一般微感測器的原理是藉由一感測元件,將欲量測的物理量轉換為電氣訊號,再以分析電子訊號的方式,間接得知欲感測的物理量。因此,加速度感測器係透過感測元件感測加速度作用造成的物理狀態變化,而產生相對應的電壓、電阻、電感等電氣訊號,現已大量應用於汽車安全感知、手機、電腦以及電子遊戲機等領域。The principle of a general micro-sensor is to convert a physical quantity to be measured into an electrical signal by a sensing component, and indirectly to know the physical quantity to be sensed by analyzing the electronic signal. Therefore, the acceleration sensor senses the physical state change caused by the acceleration component through the sensing component, and generates corresponding electrical signals such as voltage, resistance, inductance, etc., which have been widely used in automobile safety perception, mobile phones, computers, and video games. Machine and other fields.
1972年Frobenius利用長短尺寸不一之懸臂梁結構做為感測元件,當感測元件受外力干擾時,懸臂梁結構會因慣性作用而產生位移,致使對應導體產生訊號而偵測加速度;1979年,Roylance利用懸臂樑與質量塊的組合,配合矽之壓阻特性製作出壓阻式之微加速度計;1983年,Rudolf則提出一種電容式之微加速度感測器,其質量塊兩側使用懸臂樑結構作為支撐,當質量塊受外力而擺動時,懸臂梁會受連動而扭轉,進而產生一電容變化而獲得對應的電氣訊號。In 1972, Frobenius used a cantilever beam structure of different lengths and sizes as a sensing element. When the sensing element is disturbed by external force, the cantilever beam structure will be displaced by inertia, causing the corresponding conductor to generate a signal to detect acceleration; Roylance uses a combination of a cantilever beam and a mass to create a piezoresistive micro-accelerometer with the piezoresistive properties of the crucible; in 1983, Rudolf proposed a capacitive micro-acceleration sensor with a cantilever on both sides of the mass. The beam structure serves as a support. When the mass is swung by an external force, the cantilever beam is twisted by the interlocking, thereby generating a capacitance change to obtain a corresponding electrical signal.
電容式微加速度感測器係偵測電容的改變,藉以推算加速度的大小。相較於傳統電壓式(Piezoelectric)、壓阻式(Piezoresistive)、穿隧(Tunneling)電流式的加速度感測器,電容式加速度感測器因具有高靈敏度、低溫度效應、低電源消耗、結構簡單以及高輸出等特性,因此其相關研究、應用領域格外被受注目。中華民國專利第I284203號之「加速度計」揭露一種電容式加速度計,其包含一固定單元及一可動單元,該固定單元及可動單元各自包含複數個感測電極,該些感測電極彼此呈指叉式排列,因此當該可動單元因外力而位移時,感測電極間的間距隨之改變造成電容發生變化,藉此可偵測加速度的改變。Capacitive micro-acceleration sensors detect changes in capacitance to estimate the magnitude of the acceleration. Capacitive accelerometers have high sensitivity, low temperature effect, low power consumption, and structure compared to conventional piezoelectric (piezoelectric), piezoresistive, and tunneling current-type accelerometers. Simple and high-output characteristics, so its related research and application fields are particularly attracting attention. The "accelerometer" of the Republic of China Patent No. I284203 discloses a capacitive accelerometer comprising a fixed unit and a movable unit, the fixed unit and the movable unit each comprising a plurality of sensing electrodes, the sensing electrodes being indexed to each other The forks are arranged so that when the movable unit is displaced by an external force, the spacing between the sensing electrodes changes to cause a change in the capacitance, thereby detecting a change in acceleration.
根據平行電極板的電容公式:C=εA/d (其中ε為介電係數、A為兩電極板重合面積、d為兩電容板之間距),偵測間距(符號d)改變造成的電容變化,其電容變化值與間距變化量呈現非線性關係,因此在加速度的估測與運算上較為困難,且容易產生誤差。因此,本發明提出一種雙軸加速度感測器,其藉偵測面積造成的電容變化而可獲得線性關係較佳之加速度關係。According to the capacitance formula of the parallel electrode plate: C=εA/d (where ε is the dielectric constant, A is the overlap area of the two electrode plates, d is the distance between the two capacitor plates), and the capacitance change caused by the change of the detection pitch (symbol d) The capacitance change value and the variation of the pitch have a nonlinear relationship, so it is difficult to estimate and calculate the acceleration, and it is easy to generate an error. Therefore, the present invention proposes a biaxial acceleration sensor that obtains a linear relationship with a better acceleration relationship by detecting a change in capacitance caused by an area.
綜上所述,本發明之目的在於提供一種靈敏度高且線性關係較佳之雙軸加速度感測元件。In summary, the object of the present invention is to provide a biaxial acceleration sensing element with high sensitivity and good linearity.
本發明之另一目的,在於提供一種雙軸加速度感測元件,其可偵測因電極面積變化造成的電容差值,進而感測加速度的大小與方向。Another object of the present invention is to provide a biaxial acceleration sensing element that can detect a capacitance difference caused by a change in electrode area, thereby sensing the magnitude and direction of the acceleration.
為了達成前述目的,本發明提供之雙軸加速度感測元件,包含一第一感測件、一第二感測件以及一固定單元。第一感測件可相對該第二感測件運動,第二感測件則可相對該固定單元運動,且其相對運動之軸向互異,藉此感測兩互異軸向之加速度。進一步地,第一感測件與第二感測件之間以及第二感測件與該固定單元之間互設有相對應之感測電極,因此當該第一、第二感測件與該固定單元發生相對運動時,該些感測電極可因相互疊合的面積改變,使得輸出的電容產生差值,並藉以感測加速度的變化。In order to achieve the foregoing objective, the present invention provides a dual-axis acceleration sensing component including a first sensing component, a second sensing component, and a fixing unit. The first sensing member is movable relative to the second sensing member, and the second sensing member is movable relative to the fixed unit, and the axial directions of the relative movements are different from each other, thereby sensing the acceleration of the two mutually different axial directions. Further, a corresponding sensing electrode is disposed between the first sensing member and the second sensing member and between the second sensing member and the fixing unit, so when the first and second sensing members are When the fixed unit is in relative motion, the sensing electrodes may be changed by overlapping areas, so that the output capacitance generates a difference, and thereby sensing the change of the acceleration.
根據本發明之一實施例,該些感測電極彼此間具一高度落差且包含一疊合面積,並進一步形成差動式電容感測電極。According to an embodiment of the invention, the sensing electrodes have a height difference from each other and comprise a stacking area, and further form a differential capacitive sensing electrode.
本發明提出之雙軸加速度感測元件可利用微機電製程製作,因此其體積小、成本低;進一步地,其感測之加速度線性關係佳,靈敏度高,且非感測軸向的感測誤差小。有關本發明的詳細技術內容及較佳實施例,配合圖式說明如後。The biaxial acceleration sensing component proposed by the invention can be fabricated by using a micro-electromechanical process, so that the volume is small and the cost is low; further, the sensed acceleration has a good linear relationship, high sensitivity, and non-sensing axial sensing error. small. The detailed technical content and preferred embodiments of the present invention are described in conjunction with the drawings.
有關本發明之詳細說明及技術內容,現配合圖式說明如下:The detailed description and technical content of the present invention will now be described as follows:
請參閱「圖1」所示,其為本發明一實施例之外觀立體示意圖。本發明提出之雙軸加速度感測元件1包含一第一感測件10、一第二感測件20以及一固定單元30,三者形成一感測平台。透過第一感測件10相對第二感測件20運(轉)動以及第二感測件20相對該固定單元30運(轉)動,藉以感測兩相異軸向的加速度大小和方向。Please refer to FIG. 1 , which is a perspective view of an appearance of an embodiment of the present invention. The biaxial acceleration sensing component 1 of the present invention comprises a first sensing component 10, a second sensing component 20 and a fixing unit 30, and the three form a sensing platform. The second sensing member 10 is transported (rotated) relative to the second sensing member 20 and the second sensing member 20 is moved (rotated) relative to the fixed unit 30 to sense the magnitude and direction of the acceleration of the two-phase different axial directions. .
「圖2-1」和「圖2-2」分別顯示本發明之第一感測件10一實施例之外觀立體示意圖及上視圖。該第一感測件10包含一質量體11,該質量體11包含一第一軸12以及複數個相互平行的第一感測電極13。該第一軸12連接於該質量體11相對應的兩側,使得該質量體11受外力產生慣性作用時,能以該第一軸12為軸心擺(扭/轉)動;該些第一感測電極13彼此平行設置,形成梳狀結構。在本實施例中,該些第一感測電極13係設置於該質量體11相對應之兩側,且其方向與該第一軸12軸向相異,例如圖中顯示互相垂直者。FIG. 2-1 and FIG. 2-2 respectively show an external perspective view and a top view of an embodiment of the first sensing member 10 of the present invention. The first sensing member 10 includes a mass body 11 including a first shaft 12 and a plurality of first sensing electrodes 13 that are parallel to each other. The first shaft 12 is connected to opposite sides of the mass body 11 so that the mass body 11 can be pivoted (twisted/turned) with the first shaft 12 when inertia is applied by an external force; A sensing electrode 13 is disposed in parallel with each other to form a comb structure. In this embodiment, the first sensing electrodes 13 are disposed on opposite sides of the mass body 11 and the directions thereof are different from the axial direction of the first axis 12, for example, the figures are perpendicular to each other.
「圖3-1」和「圖3-2」分別顯示本發明之第二感測件20一實施例之外觀立體示意圖及上視圖,該第二感測件20包含一環部21,該環部21內側定義一容置空間22,且該環部21內側對應該第一感測電極13設置複數個第二感測電極23,該些第二感測電極23彼此平行設置,形成梳狀結構;該環部21外側則包含複數個第三感測電極24,該些第三感測電極24彼此平行設置,形成梳狀結構;該環部21並包含一第二軸25,致使該環部21可以該第二軸25為軸心擺(扭/轉)動;本實施例中,該些第三感測電極24係設置於該環部21外側相對應的兩側,且其方向與該第二軸25軸向相異,例如圖中顯示互相垂直者,此時第一軸12亦與第二軸25相互垂直。FIG. 3-1 and FIG. 3-2 respectively show an external perspective view and a top view of an embodiment of the second sensing component 20 of the present invention. The second sensing component 20 includes a ring portion 21, and the ring portion The inner side of the inner portion of the inner portion of the inner portion of the inner portion of the inner portion of the inner portion of the inner portion of the second portion of the second sensing electrode 13 is disposed in parallel with each other to form a comb-like structure; The outer side of the ring portion 21 includes a plurality of third sensing electrodes 24, and the third sensing electrodes 24 are disposed in parallel with each other to form a comb structure; the ring portion 21 includes a second shaft 25, so that the ring portion 21 The second shaft 25 can be pivoted (twisted/rotated). In this embodiment, the third sensing electrodes 24 are disposed on opposite sides of the ring portion 21, and the direction thereof is The two axes 25 are axially different, for example, the figures are perpendicular to each other, and the first axis 12 is also perpendicular to the second axis 25 at this time.
其中,該第一感測件10可容置於該容置空間22,並藉該第一軸12與該環部21相連,如「圖1」所示。此時,該些第一感測電極13與該些第二感測電極23相互交疊平行且交錯排列,呈指叉形式設置而形成相對應的電容感測結構。The first sensing member 10 can be received in the accommodating space 22 and connected to the ring portion 21 by the first shaft 12, as shown in FIG. At this time, the first sensing electrodes 13 and the second sensing electrodes 23 overlap each other in parallel and staggered, and are arranged in the form of an interdigitated fork to form a corresponding capacitive sensing structure.
請參閱「圖4-1」和「圖4-2」,其為本發明之固定單元30一實施例之外觀立體示意圖及上視圖。該固定單元30內部定義一第二容置空間31,且其內側包含複數個對應該第三感測電極24而設置之複數個第四感測電極32;該些第四感測電極32彼此平行設置,形成梳狀結構。如「圖1」所示,該第二感測件20可容置於該第二容置空間31,並藉該第二軸25與該固定單元30相連,致使該些第三感測電極24與該些第四感測電極32相互交疊平行且交錯排列,呈指叉形式設置而形成相對應的電容感測結構。Please refer to FIG. 4-1 and FIG. 4-2, which are perspective views and top views of an embodiment of the fixing unit 30 of the present invention. The fixing unit 30 defines a second accommodating space 31 therein, and the inner side thereof includes a plurality of fourth sensing electrodes 32 disposed corresponding to the third sensing electrodes 24; the fourth sensing electrodes 32 are parallel to each other. Set to form a comb structure. As shown in FIG. 1 , the second sensing component 20 can be received in the second accommodating space 31 and connected to the fixing unit 30 by the second shaft 25 to cause the third sensing electrodes 24 . The fourth sensing electrodes 32 are overlapped with each other in parallel and staggered, and are arranged in the form of an interdigitated fork to form a corresponding capacitive sensing structure.
請再參閱「圖1」所示,在上述之實施例中,該第一感測電極13係垂直該第一軸12設置(如圖中之X軸方向),該第三感測電極24則垂直該第二軸25設置(如圖中之Y軸方向),但不以此為限。進一步地,該第一感測電極13、該第二感測電極23、該第三感測電極24以及/或該第四感測電極32可為高深寬比梳狀感測電極( HARM (high-aspect-ratio-micromachined) vertical-combs),其可藉由蝕刻基板、電鑄、放電加工、溝槽回填等製程而形成;該第一軸12以及該第二軸25可為一彈簧結構(gimbal spring)。請再參閱「圖5-1」和「圖5-2」所示,其分別自「圖1」之AA’線段和BB’線段剖面示意:在另一實施例中,該第一感測電極13與該第二感測電極23彼此交疊且沿Z軸方向高低設置;該第三感測電極24與該第四感測電極32亦彼此交疊而沿Z軸方向高低設置。Referring to FIG. 1 again, in the above embodiment, the first sensing electrode 13 is disposed perpendicular to the first axis 12 (in the X-axis direction in the figure), and the third sensing electrode 24 is The second axis 25 is disposed perpendicularly (in the Y-axis direction as shown in the figure), but is not limited thereto. Further, the first sensing electrode 13, the second sensing electrode 23, the third sensing electrode 24, and/or the fourth sensing electrode 32 can be a high aspect ratio comb sensing electrode (HARM (high) -aspect-ratio-micromachined) vertical-combs), which may be formed by etching a substrate, electroforming, electrical discharge machining, trench backfilling, etc.; the first shaft 12 and the second shaft 25 may be a spring structure ( Gimbal spring). Please refer to FIG. 5-1 and FIG. 5-2 again, which are respectively shown from the AA' line segment and the BB' line segment of FIG. 1 : in another embodiment, the first sensing electrode 13 and the second sensing electrodes 23 overlap each other and are arranged in the Z-axis direction; the third sensing electrodes 24 and the fourth sensing electrodes 32 also overlap each other and are arranged in the Z-axis direction.
在未受力的情況下,該第一感測件10藉該第一軸12的支撐而懸浮,並相對該第二感測件20靜止;相同地,該第二感測件20藉該第二軸25的支撐而懸浮,且相對該固定單元30靜止。當本發明之雙軸加速度感測元件1受到一平行X-Y平面之加速度時,該質量體11可將慣性力輸出,並透過鐘擺(pendulum)型結構產生扭矩,將力量傳遞至該第一軸12及該第二軸25,致使該第一軸12及/或該第二軸25進行解偶合,使得該質量體11分別對該第一軸12及該第二軸25輸出對應的扭矩,驅使該感測平台產生擺動。The first sensing member 10 is suspended by the support of the first shaft 12 and is stationary with respect to the second sensing member 20; in the same manner, the second sensing member 20 borrows the first The support of the two shafts 25 is suspended and is stationary relative to the fixed unit 30. When the biaxial acceleration sensing element 1 of the present invention receives an acceleration in a parallel XY plane, the mass body 11 can output an inertial force and generate torque through a pendulum type structure to transmit power to the first shaft 12 And the second shaft 25, causing the first shaft 12 and/or the second shaft 25 to be decoupled, so that the mass body 11 respectively outputs corresponding torque to the first shaft 12 and the second shaft 25 to drive the The sensing platform produces a wobble.
根據前述之電容公式C=εA/d,當兩平行電極面積改變時,電容亦隨之改變。因此,當該第一感測件10以第一軸12為軸心擺動(扭轉)時,位於該第一軸12兩側之該些第一感測電極13相對該些第二感測電極23會產生面積變化,引發兩端分別產生+ΔC及-ΔC的電容值改變,藉由兩側相異的電容差值輸出,達成差動式電容的量側目的,以感測平行該第二軸25方向(X軸方向)之加速度;同理,當該第二感測件20以該第二軸25為軸心擺動時,可感測平行該第一軸12方向(Y軸方向)之加速度。須再說明的是,不同的加速度大小會致使該第一感測件10或第二感測件20產生對應的擺動程度,不同的擺動程度則對應最後偵測出的不同電容差,可藉以感測加速度的大小。According to the aforementioned capacitance formula C = εA / d, when the area of the two parallel electrodes changes, the capacitance also changes. Therefore, when the first sensing component 10 is oscillated (twisted) with the first axis 12 as an axis, the first sensing electrodes 13 on the two sides of the first axis 12 are opposite to the second sensing electrodes 23 . The area change will be generated, and the capacitance values of +ΔC and -ΔC will be respectively generated at both ends, and the difference of the capacitances on both sides will be output to achieve the quantitative side of the differential capacitance to sense parallel to the second axis. Acceleration in the direction of the 25th direction (the X-axis direction). Similarly, when the second sensing member 20 is pivoted about the second axis 25, the acceleration parallel to the direction of the first axis 12 (the Y-axis direction) can be sensed. . It should be noted that different acceleration magnitudes may cause the first sensing component 10 or the second sensing component 20 to have a corresponding degree of oscillation, and different degrees of oscillation correspond to different capacitance differences detected last, which may be sensed. Measure the magnitude of the acceleration.
「圖6-1」和「圖6-2」分別顯示上述實施例的雙軸加速度感測結果,可舉例說明本發明量測上的優點,其係將加速度產生的電容差值以一商用電容電壓轉換電路(commercial capacitive readout IC)轉換成電壓輸出。由結果可知,偵測到的雙軸加速度結果實質上呈現一線性關係,且其對X軸向以及對Y軸向的靈敏度(sensitivities)分別為2.44 mV/G與51.99 mV/G;此外,其對於非感測軸向的感測誤差(cross-talk errors)極小。"Figure 6-1" and "Figure 6-2" respectively show the biaxial acceleration sensing results of the above embodiment, which can illustrate the advantages of the measurement of the present invention, which is to use the capacitance difference generated by the acceleration as a commercial capacitor. A voltage conversion circuit (commercial capacitive readout IC) is converted into a voltage output. From the results, the detected biaxial acceleration results have a linear relationship, and their sensitivity to the X-axis and the Y-axis are 2.44 mV/G and 51.99 mV/G, respectively. The cross-talk errors for the non-sensing axes are minimal.
須再說明的是,上述本發明將第一感測件10、第二感測件20以及固定單元30分開定義、敘述僅為方便說明及瞭解。實際上,該些結構可互相獨立分離而組裝,或是藉由微機電或半導體製程,利用蝕刻、微影、回填等該領域知悉之技術直接製作而成。舉例來說,本發明之雙軸加速度感測元件1可利用MOSBE之微機電技術平台製程製造,其相關之平台技術可參閱2005年發表之「The Molded Surface-micromachining and Bulk Etching Release (MOSBE) Fabrication Platform on (111) Si for MOEMS」(Journal of Micromechanics and Microengineering, vol. 15, pp. 260-265),在此不加贅述。藉此,該些感測電極以及該第一軸12及該第二軸25可利用溝槽回填(trench-refill)技術達成,其材質可為多晶矽;該質量體11可藉由底層基材蝕刻(backside etching)而形成,例如材質為矽。以微機電製程製造出的加速度感測元件,更具備體積小、低成本、高靈敏的優點。It should be noted that the first sensing member 10, the second sensing member 20, and the fixing unit 30 are separately defined and described herein for convenience of description and understanding. In fact, the structures can be assembled separately from each other or directly fabricated by techniques known in the art, such as etching, lithography, backfilling, by microelectromechanical or semiconductor processes. For example, the biaxial acceleration sensing element 1 of the present invention can be fabricated by MOSBE's MEMS platform process, and the related platform technology can be found in "The Molded Surface-micromachining and Bulk Etching Release (MOSBE) Fabrication" published in 2005. Platform on (111) Si for MOEMS" (Journal of Micromechanics and Microengineering, vol. 15, pp. 260-265), which is not described herein. Thereby, the sensing electrodes and the first shaft 12 and the second shaft 25 can be achieved by a trench-refill technique, and the material can be polycrystalline germanium; the mass 11 can be etched by the underlying substrate. Formed by (backside etching), for example, the material is 矽. The acceleration sensing component manufactured by the micro-electromechanical process has the advantages of small size, low cost and high sensitivity.
惟以上所述者,僅為本發明之較佳實施例,非欲侷限本發明專利之專利保護範圍,故舉凡運用本發明說明書及圖式內容所為之等效變化與修飾,均同理包含於本發明之權利保護範圍,合予陳明。The above is only the preferred embodiment of the present invention, and is not intended to limit the scope of the patent protection of the present invention. Therefore, the equivalent changes and modifications of the present invention and the contents of the drawings are equally included in The scope of protection of the present invention is combined with Chen Ming.
1‧‧‧雙軸加速度感測元件1‧‧‧Biaxial acceleration sensing element
10‧‧‧第一感測件10‧‧‧First sensing parts
11‧‧‧質量體11‧‧‧Quality
12‧‧‧第一軸12‧‧‧ first axis
13‧‧‧第一感測電極13‧‧‧First sensing electrode
20‧‧‧第二感測件20‧‧‧Second sensing parts
21‧‧‧環部21‧‧‧ Ring Department
22‧‧‧容置空間22‧‧‧ accommodating space
23‧‧‧第二感測電極23‧‧‧Second sensing electrode
24‧‧‧第三感測電極24‧‧‧ Third sensing electrode
25‧‧‧第二軸25‧‧‧second axis
30‧‧‧固定單元30‧‧‧Fixed unit
31‧‧‧第二容置空間31‧‧‧Second accommodation space
32‧‧‧第四感測電極32‧‧‧fourth sensing electrode
本發明的實施方式係結合圖式予以描述:Embodiments of the invention are described in conjunction with the drawings:
「圖1」為本發明一實施例之外觀立體示意圖;FIG. 1 is a perspective view showing the appearance of an embodiment of the present invention;
「圖2-1」為本發明之第一感測件一實施例之外觀立體示意圖;Figure 2-1 is a perspective view showing the appearance of an embodiment of the first sensing member of the present invention;
「圖2-2」為本發明之第一感測件一實施例之上視圖;2-2 is a top view of an embodiment of a first sensing member of the present invention;
「圖3-1」為本發明之第二感測件一實施例之外觀立體示意圖;Figure 3-1 is a perspective view showing the appearance of an embodiment of the second sensing member of the present invention;
「圖3-2」為本發明之第二感測件一實施例之上視圖;Figure 3-2 is a top view of an embodiment of a second sensing member of the present invention;
「圖4-1」為本發明之固定單元一實施例之外觀立體示意圖;Figure 4-1 is a perspective view showing the appearance of an embodiment of the fixing unit of the present invention;
「圖4-2」為本發明之固定單元一實施例之上視圖;Figure 4-2 is a top view of an embodiment of the fixing unit of the present invention;
「圖5-1」顯示第一感測電極與第二感測電極彼此高低交疊之一實施例;FIG. 5-1 shows an embodiment in which the first sensing electrode and the second sensing electrode overlap each other;
「圖5-2」顯示第三感測電極與第四感測電極彼此高低交疊之一實施例;FIG. 5-2 shows an embodiment in which the third sensing electrode and the fourth sensing electrode overlap each other;
「圖6-1」顯示上述實施例一軸之加速度感測結果;以及"Fig. 6-1" shows the acceleration sensing result of the first embodiment of the above embodiment;
「圖6-2」顯示上述實施例另一軸之加速度感測結果。Fig. 6-2 shows the acceleration sensing result of the other axis of the above embodiment.
1‧‧‧雙軸加速度感測元件 1‧‧‧Biaxial acceleration sensing element
10‧‧‧第一感測件 10‧‧‧First sensing parts
11‧‧‧質量體 11‧‧‧Quality
12‧‧‧第一軸 12‧‧‧ first axis
13‧‧‧第一感測電極 13‧‧‧First sensing electrode
20‧‧‧第二感測件 20‧‧‧Second sensing parts
21‧‧‧環部 21‧‧‧ Ring Department
22‧‧‧容置空間 22‧‧‧ accommodating space
23‧‧‧第二感測電極 23‧‧‧Second sensing electrode
24‧‧‧第三感測電極 24‧‧‧ Third sensing electrode
25‧‧‧第二軸 25‧‧‧second axis
30‧‧‧固定單元 30‧‧‧Fixed unit
31‧‧‧第二容置空間 31‧‧‧Second accommodation space
32‧‧‧第四感測電極 32‧‧‧fourth sensing electrode
Claims (13)
一第一感測件,包含一質量體,該質量體包含一第一軸以及複數個相互平行之第一感測電極;
一第二感測件,包含一環部,該環部內側包含複數個互相平行之第二感測電極,且定義一容置空間;該環部外側包含複數個互相平行之第三感測電極以及一第二軸;以及
一固定單元,該固定單元包含複數個第四感測電極;
該第一感測件藉該第一軸與該環部相連,致使該些第一感測電極與該些第二感測電極彼此相互對應而交錯排列;該第二感測件藉該第二軸與該固定單元相連,致使該些第三感測電極與該些第四感測電極彼此相互對應而交錯排列。A biaxial acceleration sensing element comprising:
a first sensing member includes a mass body including a first axis and a plurality of first sensing electrodes that are parallel to each other;
a second sensing component includes a ring portion, the inner side of the ring portion includes a plurality of second sensing electrodes that are parallel to each other, and defines an accommodating space; the outer side of the ring portion includes a plurality of third sensing electrodes that are parallel to each other and a second axis; and a fixing unit comprising a plurality of fourth sensing electrodes;
The first sensing component is connected to the ring portion by the first axis, so that the first sensing electrodes and the second sensing electrodes are mutually staggered and arranged in a staggered manner; the second sensing component is borrowed from the second sensing component The shaft is connected to the fixing unit, so that the third sensing electrodes and the fourth sensing electrodes are arranged in a staggered manner with each other.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| TW594014B (en) * | 2003-04-09 | 2004-06-21 | Chung Shan Inst Of Science | Silicon-type dual inertia sensor |
| TW594016B (en) * | 2003-04-29 | 2004-06-21 | Chung Shan Inst Of Science | Z-axis solid state gyroscope and three-axis inertial measurement apparatus |
| US20050235751A1 (en) * | 2004-04-27 | 2005-10-27 | Zarabadi Seyed R | Dual-axis accelerometer |
| TW200827722A (en) * | 2006-12-22 | 2008-07-01 | Delta Electronics Inc | Capacitance sensing structure |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW594014B (en) * | 2003-04-09 | 2004-06-21 | Chung Shan Inst Of Science | Silicon-type dual inertia sensor |
| TW594016B (en) * | 2003-04-29 | 2004-06-21 | Chung Shan Inst Of Science | Z-axis solid state gyroscope and three-axis inertial measurement apparatus |
| US20050235751A1 (en) * | 2004-04-27 | 2005-10-27 | Zarabadi Seyed R | Dual-axis accelerometer |
| TW200827722A (en) * | 2006-12-22 | 2008-07-01 | Delta Electronics Inc | Capacitance sensing structure |
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