TWI389975B - Thermosetting ethylcarbamate resin composition - Google Patents
Thermosetting ethylcarbamate resin composition Download PDFInfo
- Publication number
- TWI389975B TWI389975B TW094132478A TW94132478A TWI389975B TW I389975 B TWI389975 B TW I389975B TW 094132478 A TW094132478 A TW 094132478A TW 94132478 A TW94132478 A TW 94132478A TW I389975 B TWI389975 B TW I389975B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- thermosetting resin
- group
- polyurethane
- diol
- Prior art date
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- 229920001187 thermosetting polymer Polymers 0.000 title claims description 79
- 239000011342 resin composition Substances 0.000 title claims description 59
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 title description 5
- -1 alicyclic diol Chemical class 0.000 claims description 59
- 150000002009 diols Chemical class 0.000 claims description 51
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 46
- 229920000515 polycarbonate Polymers 0.000 claims description 40
- 239000004417 polycarbonate Substances 0.000 claims description 40
- 229920002635 polyurethane Polymers 0.000 claims description 38
- 239000004814 polyurethane Substances 0.000 claims description 38
- 239000003822 epoxy resin Substances 0.000 claims description 34
- 229920000647 polyepoxide Polymers 0.000 claims description 34
- 229910000679 solder Inorganic materials 0.000 claims description 19
- 229920005862 polyol Polymers 0.000 claims description 17
- 150000003077 polyols Chemical class 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 14
- 229920005989 resin Polymers 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 14
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 claims description 12
- 239000005056 polyisocyanate Substances 0.000 claims description 12
- 229920001228 polyisocyanate Polymers 0.000 claims description 12
- 239000000470 constituent Substances 0.000 claims description 11
- 229920000642 polymer Polymers 0.000 claims description 11
- 150000005846 sugar alcohols Polymers 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 9
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 9
- 230000001681 protective effect Effects 0.000 claims description 9
- 125000000524 functional group Chemical group 0.000 claims description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 7
- 238000007259 addition reaction Methods 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 6
- 238000006482 condensation reaction Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- 239000004593 Epoxy Substances 0.000 claims description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 150000008065 acid anhydrides Chemical class 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims description 3
- 229930185605 Bisphenol Natural products 0.000 claims description 3
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 claims description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 150000002902 organometallic compounds Chemical class 0.000 claims description 2
- 150000003739 xylenols Chemical class 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 description 19
- 238000007747 plating Methods 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 19
- 239000000758 substrate Substances 0.000 description 13
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 239000007788 liquid Substances 0.000 description 12
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- 238000005452 bending Methods 0.000 description 9
- 238000001723 curing Methods 0.000 description 7
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000000565 sealant Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- 239000003085 diluting agent Substances 0.000 description 6
- 238000002845 discoloration Methods 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 125000005442 diisocyanate group Chemical group 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 5
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- 239000005058 Isophorone diisocyanate Substances 0.000 description 4
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 4
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000003566 sealing material Substances 0.000 description 4
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 2
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
- RDFQSFOGKVZWKF-UHFFFAOYSA-N 3-hydroxy-2,2-dimethylpropanoic acid Chemical compound OCC(C)(C)C(O)=O RDFQSFOGKVZWKF-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 101150030514 GPC1 gene Proteins 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000004811 liquid chromatography Methods 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 235000013824 polyphenols Nutrition 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- JVYDLYGCSIHCMR-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butanoic acid Chemical compound CCC(CO)(CO)C(O)=O JVYDLYGCSIHCMR-UHFFFAOYSA-N 0.000 description 1
- AUABZJZJXPSZCN-UHFFFAOYSA-N 2-(dimethylamino)phenol Chemical compound CN(C)C1=CC=CC=C1O AUABZJZJXPSZCN-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- CHZAMJVESILJGH-UHFFFAOYSA-N 3-[bis(2-cyanoethyl)phosphanyl]propanenitrile Chemical compound N#CCCP(CCC#N)CCC#N CHZAMJVESILJGH-UHFFFAOYSA-N 0.000 description 1
- 229940018563 3-aminophenol Drugs 0.000 description 1
- SXFJDZNJHVPHPH-UHFFFAOYSA-N 3-methylpentane-1,5-diol Chemical compound OCCC(C)CCO SXFJDZNJHVPHPH-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- CKZMGOWLQUFWGP-UHFFFAOYSA-N CC.CC=1C(=C(C=CC1)O)C Chemical compound CC.CC=1C(=C(C=CC1)O)C CKZMGOWLQUFWGP-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CHJJGSNFBQVOTG-UHFFFAOYSA-N N-methyl-guanidine Natural products CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical group CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- LNWBFIVSTXCJJG-UHFFFAOYSA-N [diisocyanato(phenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(N=C=O)(N=C=O)C1=CC=CC=C1 LNWBFIVSTXCJJG-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229940022682 acetone Drugs 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 239000003429 antifungal agent Substances 0.000 description 1
- 229940121375 antifungal agent Drugs 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- KQWGXHWJMSMDJJ-UHFFFAOYSA-N cyclohexyl isocyanate Chemical compound O=C=NC1CCCCC1 KQWGXHWJMSMDJJ-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- AZRQQTKALKINGP-UHFFFAOYSA-N dinaphthalen-1-ylmethanone Chemical compound C1=CC=C2C(C(C=3C4=CC=CC=C4C=CC=3)=O)=CC=CC2=C1 AZRQQTKALKINGP-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- IIPOYYXRDNFIOU-UHFFFAOYSA-N hexadecylphosphane;hydrochloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[PH3+] IIPOYYXRDNFIOU-UHFFFAOYSA-N 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940032007 methylethyl ketone Drugs 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- UQKAOOAFEFCDGT-UHFFFAOYSA-N n,n-dimethyloctan-1-amine Chemical compound CCCCCCCCN(C)C UQKAOOAFEFCDGT-UHFFFAOYSA-N 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- HXHCOXPZCUFAJI-UHFFFAOYSA-N prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1 HXHCOXPZCUFAJI-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000012748 slip agent Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229920005792 styrene-acrylic resin Polymers 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- QEXITCCVENILJI-UHFFFAOYSA-M tributyl(phenyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)C1=CC=CC=C1 QEXITCCVENILJI-UHFFFAOYSA-M 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
- C08L75/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
- C08G18/12—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step using two or more compounds having active hydrogen in the first polymerisation step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/44—Polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/06—Polyurethanes from polyesters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Polyurethanes Or Polyureas (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Epoxy Resins (AREA)
Description
本發明係關於含有每一分子具有2個以上羧基之聚胺基甲酸乙酯,尤其是在其分子末端具有1個以上羧基之聚胺基甲酸乙酯,及熱硬化性成分之熱硬化性樹脂組成物。進而詳言之,係關於與基材之密接性,低彎曲性,可撓性,耐濕熱性,銲錫耐熱性,耐鍍錫性優異之熱硬化性樹脂組成物。本發明之熱硬化性樹脂組成物可在鍍銲(solder)光阻或層間絕緣膜等之保護膜或電絕緣材料,IC或超LSI密封材料,層合板等領域之用途予以有效地利用。The present invention relates to a polyurethane containing at least two carboxyl groups per molecule, particularly a polyurethane having one or more carboxyl groups at its molecular terminal, and a thermosetting resin having a thermosetting component. Composition. More specifically, the present invention relates to a thermosetting resin composition which is excellent in adhesion to a substrate, low in flexibility, flexibility, moist heat resistance, solder heat resistance, and tin plating resistance. The thermosetting resin composition of the present invention can be effectively utilized for use in a protective film such as a solder resist or an interlayer insulating film or an electrical insulating material, an IC or a super LSI sealing material, a laminate, or the like.
熱硬化性樹脂係作為先端機能性材料等被廣泛利用之材料,一般在耐熱性,環境安定性,力學性質,電性質等作為具有優異性能之高分子材料係可使用於鍍銲光阻或層間絕緣膜等之保護膜或電絕緣材料,IC或超LSI密封材料,層合板般之用途。A thermosetting resin is a material widely used as a tip functional material, and generally has high heat resistance, environmental stability, mechanical properties, electrical properties, etc. as a polymer material having excellent properties, which can be used for plating solder resist or interlayer. Protective film or electrical insulating material such as insulating film, IC or super LSI sealing material, laminate-like use.
但是,在鍍銲光阻,因硬化收縮及硬化後之冷卻收縮變大故會有產生彎曲之問題。However, in the plating resist, there is a problem that the cooling shrinkage due to hardening shrinkage and hardening becomes large.
習知之熱硬化型光阻方面,係以日本特公平5-75032號公報所揭示之環氧樹脂與二鹼式酸酐為必須成分之環氧樹脂系光阻組成物,例如在所形成之被膜被調整為可賦予低彎曲性,可撓性之情形,會有耐濕熱性,銲錫耐熱性,尤其是耐鍍錫性降低之問題。An epoxy resin-based photoresist composition in which an epoxy resin and a dibasic acid anhydride disclosed in Japanese Patent Publication No. 5-75032 are essential components, for example, in the formed film, It is adjusted so as to impart low bending property, and in the case of flexibility, there is a problem that moisture heat resistance, solder heat resistance, and particularly tin plating resistance are lowered.
又,形成彎曲少的可撓性之保護膜之組成物,雖在日本特開平11-158252號公報有揭示,但在此組成物因係使多官能基之環氧樹脂與特定之聚丙烯酸樹脂為必須成分,故為與該等相反特性(耐電鍍性等)予以均衡,則使該聚丙烯酸樹脂自酸值與玻璃化溫度之兩者予以規制不僅為必要,若可獲得低彎曲性的話,則耐電鍍性可謂並非充分。Further, a composition for forming a flexible protective film having less bending is disclosed in Japanese Laid-Open Patent Publication No. Hei 11-158252, but the composition is based on a polyfunctional epoxy resin and a specific polyacrylic resin. Since it is an essential component, it is not necessary to regulate the polyacrylic resin from the acid value and the glass transition temperature in order to balance the opposite characteristics (electroplating resistance, etc.), and if low bending property is obtained, The plating resistance is not sufficient.
因此,本發明之主要課題係提供一種可解決上述問題,與基材之密接性,低彎曲性及可撓性優異,且耐濕熱性,銲錫耐熱性,及耐鍍錫性優異之熱硬化性樹脂組成物。Therefore, the main object of the present invention is to provide a thermosetting property which is excellent in low adhesion and flexibility, and which is excellent in low heat resistance, heat resistance, solder heat resistance, and tin plating resistance, which can solve the above problems. Resin composition.
本發明人等為解決該課題經戮力研究結果,首先發現含每一分子具有2個以上羧基之聚胺基甲酸乙酯(A)尤其是在其分子末端具有1個以上羧基之聚胺基甲酸乙酯,及熱硬化性成分(B)之熱硬化性樹脂組成物,與基材之密接性,低彎曲性,可撓性,耐濕熱性,銲錫耐熱性,耐鍍錫性之均衡性優異,而可解決該課題,因而完成本發明。In order to solve the problem, the present inventors have found that a polyurethane containing a carboxyl group having two or more carboxyl groups per molecule (A) is particularly a polyamine group having one or more carboxyl groups at a molecular terminal thereof. The thermosetting resin composition of ethyl formate and thermosetting component (B) has good adhesion to the substrate, low bendability, flexibility, moisture resistance, solder heat resistance, and tin plating resistance. It is excellent and the problem can be solved, and thus the present invention has been completed.
亦即,本發明係關於以下1~25所示之熱硬化性樹脂組成物,其硬化物,其硬化物所成鍍銲光阻及保護膜以及被該硬化物所被覆之印刷配線基板。In other words, the present invention relates to a thermosetting resin composition represented by the following 1 to 25, wherein the cured product is a solder resist and a protective film, and a printed wiring board covered with the cured product.
1.一種熱硬化性樹脂組成物,其特徵為含有:每一分子具有2個以上羧基之聚胺基甲酸乙酯(A)及熱硬化性成分(B)者。A thermosetting resin composition comprising: a polyurethane having a carboxyl group of two or more carboxyl groups (A) and a thermosetting component (B).
2.如申請專利範圍第1項記載之熱硬化性樹脂組成物,其中聚胺基甲酸乙酯(A),係在分子末端具有1個以上羧基之聚胺基甲酸乙酯。2. The thermosetting resin composition according to claim 1, wherein the polyurethane (A) is a polyurethane having one or more carboxyl groups at a molecular terminal.
3.如申請專利範圍第1項記載之熱硬化性樹脂組成物,其中聚胺基甲酸乙酯(A)係,每一分子具有2個以上羧基,且係具有以聚合物聚醇(b)與聚異氰酸酯(c)之反應所形成之胺基甲酸乙酯鍵之聚胺基甲酸乙酯。3. The thermosetting resin composition according to claim 1, wherein the polyurethane (A) has two or more carboxyl groups per molecule and has a polymer polyol (b). The urethane bond of the urethane bond formed by the reaction with the polyisocyanate (c).
4.如申請專利範圍第2或3項記載之熱硬化性樹脂組成物,其中聚胺基甲酸乙酯(A)係,使用分子中具有與異氰酸酯基進行加成反應或縮合反應所得官能基與羧基兩者之單羧酸化合物(a)之末端密封反應所形成之聚胺基甲酸乙酯(A),其在分子末端具有1個以上且每一分子具有2個以上羧基之聚胺基甲酸乙酯(A)。4. The thermosetting resin composition according to claim 2, wherein the polyurethane (A) is a functional group having an addition reaction or a condensation reaction with an isocyanate group in the molecule. Polyurethane (A) formed by a terminal sealing reaction of a monocarboxylic acid compound (a) having both carboxyl groups, which has one or more polyaminocarboxylic acids having two or more carboxyl groups per molecule at the molecular terminal Ethyl ester (A).
5.如申請專利範圍第1項記載之熱硬化性樹脂組成物,其中聚胺基甲酸乙酯(A)之數平均分子量為500~100,000,酸值為5~150 mgKOH/g。5. The thermosetting resin composition according to claim 1, wherein the polyurethane (A) has an average number average molecular weight of 500 to 100,000 and an acid value of 5 to 150 mgKOH/g.
6.如申請專利範圍第4項記載之熱硬化性樹脂組成物,其中在分子中具有與異氰酸酯基進行加成反應或縮合反應所得官能基與羧基兩者之單羧酸化合物(a),係選自具有羥基之單羧酸化合物,具有氨基之單羧酸化合物,及具有硫醇基之單羧酸化合物所成群之至少1種。6. The thermosetting resin composition according to claim 4, wherein the monocarboxylic acid compound (a) having both a functional group and a carboxyl group obtained by an addition reaction or a condensation reaction with an isocyanate group in the molecule is a monocarboxylic acid compound (a). At least one selected from the group consisting of a monocarboxylic acid compound having a hydroxyl group, a monocarboxylic acid compound having an amino group, and a monocarboxylic acid compound having a thiol group.
7.如申請專利範圍第4或6項記載之熱硬化性樹脂組成物,其中單羧酸化合物(a)係單羥基羧酸。7. The thermosetting resin composition according to claim 4, wherein the monocarboxylic acid compound (a) is a monohydroxycarboxylic acid.
8.如申請專利範圍第3項記載之熱硬化性樹脂組成物,其中聚合物聚醇(b)係選自聚碳酸酯系聚醇,聚醚系聚醇,聚酯系聚醇,聚烯烴系聚醇,及丙烯酸系聚醇所成群之至少1種。8. The thermosetting resin composition according to claim 3, wherein the polymer polyol (b) is selected from the group consisting of polycarbonate-based polyalcohols, polyether-based polyalcohols, polyester-based polyalcohols, and polyolefins. At least one of a group of a polyalcohol and an acrylic polyalcohol.
9.如申請專利範圍第3項記載之熱硬化性樹脂組成物,其中聚合物聚醇(b)係聚碳酸酯二醇。9. The thermosetting resin composition according to claim 3, wherein the polymer polyol (b) is a polycarbonate diol.
10.如申請專利範圍第9項記載之熱硬化性樹脂組成物,其中聚碳酸酯二醇之數平均分子量為200~5,000。10. The thermosetting resin composition according to claim 9, wherein the polycarbonate diol has a number average molecular weight of 200 to 5,000.
11.如申請專利範圍第9或10項記載之熱硬化性樹脂組成物,其中聚碳酸酯二醇,其構成單位係選自,含有1種或2種以上來自直鏈狀脂肪族二醇之重覆單位之聚碳酸酯二醇,含有1種或2種以上來自脂環式二醇之重覆單位之聚碳酸酯二醇,及來自該兩者之二醇之重覆單位之聚碳酸酯二醇所成群之至少1種。11. The thermosetting resin composition according to claim 9 or 10, wherein the polycarbonate diol is selected from the group consisting of one or more selected from the group consisting of linear aliphatic diols. A repeating unit of polycarbonate diol, a polycarbonate diol containing one or more repeating units derived from an alicyclic diol, and a polycarbonate of a repeating unit derived from the diol of the two At least one of a group of diols.
12.如申請專利範圍第11項記載之熱硬化性樹脂組成物,其中聚碳酸酯二醇,其構成單位係含有來自直鏈狀脂肪族二醇與脂環式二醇之重覆單位的聚碳酸酯二醇,其數平均分子量為400~2,000,直鏈狀脂肪族二醇與脂環式二醇之共聚比率之質量比為3:7~7:3。12. The thermosetting resin composition according to claim 11, wherein the polycarbonate diol has a constituent unit containing a poly unit derived from a repeating unit of a linear aliphatic diol and an alicyclic diol. The carbonate diol has a number average molecular weight of 400 to 2,000, and the mass ratio of the linear aliphatic diol to the alicyclic diol is 3:7 to 7:3.
13.如申請專利範圍第3項記載之熱硬化性樹脂組成物,其中聚異氰酸酯(c)係脂環式二胺所衍生之脂環式二異氰酸酯。The thermosetting resin composition according to claim 3, wherein the polyisocyanate (c) is an alicyclic diisocyanate derived from an alicyclic diamine.
14.如申請專利範圍第3項記載之熱硬化性樹脂組成物,其中聚胺基甲酸乙酯(A)除了聚合物聚醇(b)與聚異氰酸酯(c)以外進而使用具有羧基之聚醇(d)予以反應所得。14. The thermosetting resin composition according to claim 3, wherein the polyurethane (A) is a polyalcohol having a carboxyl group in addition to the polymer polyol (b) and the polyisocyanate (c). (d) The reaction is obtained.
15.如申請專利範圍第14項記載之熱硬化性樹脂組成物,其中具有羧基之聚醇(d)係二羥基脂肪族羧酸。15. The thermosetting resin composition according to claim 14, wherein the polyalcohol (d) having a carboxyl group is a dihydroxy aliphatic carboxylic acid.
16.如申請專利範圍第1項記載之熱硬化性樹脂組成物,其中熱硬化性成分(B)係環氧樹脂。The thermosetting resin composition according to claim 1, wherein the thermosetting component (B) is an epoxy resin.
17.如申請專利範圍第16項記載之熱硬化性樹脂組成物,其中環氧樹脂係選自雙酚S型環氧樹脂,二環氧丙基鄰苯二甲酸酯樹脂,雜環環氧樹脂,雙二甲苯酚型環氧樹脂,雙酚型環氧樹脂,及四環氧丙基二甲苯酚基乙烷樹脂所成群之至少1種。17. The thermosetting resin composition according to claim 16, wherein the epoxy resin is selected from the group consisting of bisphenol S type epoxy resin, digoxypropyl phthalate resin, and heterocyclic epoxy resin. At least one of a group of a resin, a bis xylenol type epoxy resin, a bisphenol type epoxy resin, and a tetra-glycidyl dimethyl phenol ethane resin.
18.如申請專利範圍第16或17項記載之熱硬化性樹脂組成物,其中相對於在分子末端有1個以上且每一分子具有2個以上羧基之聚胺基甲酸乙酯(A)之羧基當量之,為熱硬化性成分(B)之環氧樹脂之環氧基當量之比為1.0~3.0。The thermosetting resin composition according to claim 16 or 17, wherein the polyaminourethane (A) having one or more molecular groups and two or more carboxyl groups per molecule is used. The carboxyl equivalent weight is a ratio of the epoxy equivalent of the epoxy resin of the thermosetting component (B) of 1.0 to 3.0.
19.如申請專利範圍第1項記載之熱硬化性樹脂組成物,其進而含有硬化劑。19. The thermosetting resin composition according to claim 1, further comprising a curing agent.
20.如申請專利範圍第19項記載之熱硬化性樹脂組成物,其中硬化劑係選自胺,四級銨鹽,酸酐,聚醯胺,含氮雜環化合物,及有機金屬化合物所成群之至少1種。20. The thermosetting resin composition according to claim 19, wherein the hardener is selected from the group consisting of an amine, a quaternary ammonium salt, an acid anhydride, a polyamine, a nitrogen-containing heterocyclic compound, and an organometallic compound. At least one of them.
21.如申請專利範圍第1項記載之熱硬化性樹脂組成物,其進而含有有機溶劑。21. The thermosetting resin composition according to claim 1, further comprising an organic solvent.
22.一種硬化物,其特徵為,將如申請專利範圍第項1~21中任一項記載之熱硬化性樹脂組成物予以硬化所成。A cured product obtained by curing a thermosetting resin composition according to any one of claims 1 to 21 of the invention.
23.一種鍍銲光阻,其特徵為,如申請專利範圍第22項記載之硬化物所成。A solder resist which is characterized by being a cured product as described in claim 22 of the patent application.
24.一種保護膜,其特徵為,如申請專利範圍第22項記載之硬化物所成。A protective film comprising the cured product according to claim 22 of the patent application.
25.一種印刷配線基板,其特徵為,以如申請專利範圍第22項記載之硬化物使面之一部份或全面被覆者。A printed wiring board characterized by being partially or fully covered with a cured material as described in claim 22 of the patent application.
與本發明有關之含有具有胺基甲酸乙酯鍵之聚胺基甲酸乙酯(A)及熱硬化性成分(B)之熱硬化性樹脂組成物,與基材之密接性,低彎曲性,可撓性優異,且耐濕熱性,銲錫耐熱性,耐鍍錫性優異,在鍍銲光阻或層間絕緣膜等之保護膜或電絕緣材料,IC或超LSI密封材料,層合板等領域之用途可恰當地利用。在習知之鍍銲光阻,因硬化收縮及硬化後之冷卻收縮大故會有彎曲產生,成為生產率降低之原因,但根據本發明之熱硬化性樹脂組成物,可同時達成低彎曲性或可撓性之為權衡(trade-off)之關係之銲錫耐熱性,耐濕熱性,及耐電鍍性,在含有分子末端有1個以上且每一分子具有2個以上羧基之聚胺基甲酸乙酯(A),及熱硬化性成分(B)之熱硬化性樹脂組成物,尤其是耐鍍錫性優異,優異鍍銲光阻,或保護膜在低成本下可生產性良好的形成。The thermosetting resin composition containing the ethyl urethane bond (A) having a urethane bond and the thermosetting component (B) according to the present invention has adhesion to a substrate, and has low flexibility. Excellent in flexibility, heat and humidity resistance, solder heat resistance, and tin plating resistance. It is used in protective films such as plating resists or interlayer insulating films, electrical insulating materials, ICs, super LSI sealing materials, laminates, etc. Use can be used properly. In the conventional soldering resist, since the cooling shrinkage after hardening shrinkage and hardening is large, bending occurs and the productivity is lowered. However, according to the thermosetting resin composition of the present invention, low bending property can be achieved at the same time. Flexibility is a trade-off relationship between solder heat resistance, damp heat resistance, and electroplating resistance, and includes a polyurethane having one or more molecular terminals and two or more carboxyl groups per molecule. (A) and the thermosetting resin composition of the thermosetting component (B) are particularly excellent in tin plating resistance, excellent in plating resist, or in which the protective film is excellent in productivity at low cost.
以下詳細說明本發明。The invention is described in detail below.
聚胺基甲酸乙酯(A)係,每一分子具有2個以上羧基,且具有聚合物聚醇(b)與聚異氰酸酯(c)之反應所形成之胺基甲酸乙酯鍵。聚胺基甲酸乙酯(A)係,例如以在分子中使用與異氰酸酯基進行加成反應或縮合反應所得之官能基與羧基兩者之單羧酸化合物(a)之末端密封反應所形成,在其分子末端有1個以上且每一分子具有2個以上羧基。在末端密封劑方面可與單羧酸化合物(a)反應,而在調節酸值之目的,在聚合物聚醇(b)與聚異氰酸酯(c)進而添加具有羧基之聚醇(d)亦可。在末端密封劑方面亦可使用單羥基化合物。The polyurethane (A) has two or more carboxyl groups per molecule and has a urethane bond formed by the reaction of the polymer polyol (b) with the polyisocyanate (c). The polyurethane (A) is formed, for example, by a terminal sealing reaction of a monocarboxylic acid compound (a) in which a functional group and a carboxyl group obtained by an addition reaction or a condensation reaction with an isocyanate group are used in a molecule, There are at least one molecular terminal at the molecular terminal and two or more carboxyl groups per molecule. In the case of the terminal sealant, it can be reacted with the monocarboxylic acid compound (a), and in order to adjust the acid value, the polyalcohol (d) having a carboxyl group may be further added to the polymer polyol (b) and the polyisocyanate (c). . Monohydroxy compounds can also be used in the case of terminal sealants.
單羧酸化合物(a)係以使羧基存在於聚胺基甲酸乙酯(A)末端之目的而用者,由於成為聚胺基甲酸乙酯(A)之末端密封劑,若為在分子中與異氰酸酯反應所得官能基與羧基兩者均有之單羧酸化合物則佳。單羧酸化合物(a)之具體例方面,可例舉與異氰酸酯基進行加成反應或縮合反應所得官能基例如具有羥基,氨基,或硫醇之單羧酸,例如,單羥基羧酸(a1),具有氨基之單羧酸(a2),或具有硫醇基之單羧酸(a3)等。單羥基羧酸(a1)之具體例方面,可例舉乙醇酸,乳酸,羥基三甲基乙酸,蘋果酸,檸檬酸。具有氨基之單羧酸(a2)具體例方面可例舉甘氨酸等。具有硫醇基之單羧酸(a3)具體例方面可例舉硫代乙醇酸等。The monocarboxylic acid compound (a) is used for the purpose of allowing a carboxyl group to be present at the terminal of the polyurethane (A), and is a terminal sealant of the polyurethane (A), if it is in the molecule. A monocarboxylic acid compound having both a functional group and a carboxyl group obtained by reacting with an isocyanate is preferred. Specific examples of the monocarboxylic acid compound (a) include a functional group obtained by an addition reaction or a condensation reaction with an isocyanate group, for example, a monocarboxylic acid having a hydroxyl group, an amino group, or a mercaptan, for example, a monohydroxycarboxylic acid (a1) a monocarboxylic acid (a2) having an amino group, or a monocarboxylic acid (a3) having a thiol group, or the like. Specific examples of the monohydroxycarboxylic acid (a1) include glycolic acid, lactic acid, hydroxytrimethylacetic acid, malic acid, and citric acid. Specific examples of the monocarboxylic acid (a2) having an amino group include glycine and the like. Specific examples of the monocarboxylic acid (a3) having a thiol group include thioglycolic acid and the like.
該等分子中可與異氰酸酯基反應之官能基與羧基兩者均有之單羧酸(a)之使用,可使聚胺基甲酸乙酯(A)在分子末端羧基存在,與基材之密接性,低彎曲性,及可撓性優異,且耐濕熱性,銲錫耐熱性,及耐電鍍性之均衡優異,尤其是可獲得耐鍍錫性優異之熱硬化性樹脂組成物。The use of the monocarboxylic acid (a) in both the functional group and the carboxyl group which can react with the isocyanate group in the molecule enables the ethyl urethane (A) to exist at the terminal carboxyl group of the molecule and is in close contact with the substrate. It is excellent in properties, low in flexibility, and flexibility, and is excellent in moisture heat resistance, solder heat resistance, and plating resistance. In particular, it is possible to obtain a thermosetting resin composition excellent in tin plating resistance.
聚合物聚醇(b)方面,可例舉聚碳酸酯系聚醇,聚醚系聚醇,聚酯系聚醇,聚烯烴系聚醇,丙烯酸系聚醇等。聚碳酸酯系聚醇尤其是以聚碳酸酯二醇為佳。聚碳酸酯二醇方面,含有1種或2種以上來自直鏈狀脂肪族二醇之重覆單位作為構成單位之聚碳酸酯二醇(b1),含有1種或2種以上來自脂環式二醇之重覆單位作為構成單位之聚碳酸酯二醇(b2),或含有來自該等兩者二醇之重覆單位作為構成單位之聚碳酸酯二醇(b3)。The polymer polyol (b) may, for example, be a polycarbonate-based polyol, a polyether-based polyol, a polyester-based polyol, a polyolefin-based polyol, or an acrylic polyol. The polycarbonate-based polyol is preferably a polycarbonate diol. In the polycarbonate diol, the polycarbonate diol (b1) containing one or more kinds of repeating units derived from a linear aliphatic diol as a constituent unit contains one or more kinds from the alicyclic formula. The repeating unit of the diol is a polycarbonate diol (b2) as a constituent unit, or a polycarbonate diol (b3) containing a repeating unit derived from the diols as the constituent unit.
含有來自直鏈狀脂肪族二醇之重覆單位作為構成單位之聚碳酸酯二醇(b1)之具體例方面,可例舉例如1,6-己二醇所衍生之聚碳酸酯二醇,1,5-戊烷二醇與1,6-己二醇所衍生之聚碳酸酯二醇,1,4-丁烷二醇與1,6-己二醇所衍生之聚碳酸酯二醇,3-甲基-1,5-戊烷二醇與1,6-己二醇所衍生之聚碳酸酯二醇。Specific examples of the polycarbonate diol (b1) containing a repeating unit derived from a linear aliphatic diol as a constituent unit may, for example, be a polycarbonate diol derived from 1,6-hexanediol. a polycarbonate diol derived from 1,5-pentanediol and 1,6-hexanediol, a polycarbonate diol derived from 1,4-butanediol and 1,6-hexanediol, A polycarbonate diol derived from 3-methyl-1,5-pentanediol and 1,6-hexanediol.
含有來自脂環式二醇之重覆單位作為構成單位之聚碳酸酯二醇(b2)之具體例方面,可例舉例如1,4-環己烷二甲醇所衍生之聚碳酸酯二醇。Specific examples of the polycarbonate diol (b2) containing a repeating unit derived from an alicyclic diol as a constituent unit may, for example, be a polycarbonate diol derived from 1,4-cyclohexanedimethanol.
將含有來自直鏈狀脂肪族二醇與脂環式二醇兩者之二醇之重覆單位作為構成單位之聚碳酸酯二醇(b3)之具體例方面,可例舉例如1,6-己二醇與1,4-環己烷二甲醇所衍生之聚碳酸酯二醇。Specific examples of the polycarbonate diol (b3) containing a repeating unit derived from a diol of a linear aliphatic diol and an alicyclic diol as a constituent unit may, for example, be 1,6- A polycarbonate diol derived from hexanediol and 1,4-cyclohexanedimethanol.
含有來自直鏈狀脂肪族二醇之重覆單位作為構成單位之聚碳酸酯二醇,具有低彎曲性或可撓性優異之傾向。又,含有來自脂環式二醇之重覆單位作為構成單位之聚碳酸酯二醇,會有結晶性變高耐鍍錫性,銲錫耐熱性優異之傾向。由以上之觀點言之,該等聚碳酸酯二醇可使用2種以上之組合,或將含有來自直鏈狀脂肪族二醇與脂環式二醇兩者之二醇之重覆單位作為構成單位之聚碳酸酯二醇而可使用。在欲使低彎曲性或可撓性與,銲錫耐熱性與耐鍍錫性可均勻性良好的顯現,則以直鏈狀脂肪族二醇與脂環式二醇之共聚比率以質量比3:7~7:3之聚碳酸酯二醇之使用為恰當。The polycarbonate diol containing a repeating unit derived from a linear aliphatic diol as a constituent unit tends to have low flexibility or flexibility. In addition, the polycarbonate diol containing a repeating unit derived from an alicyclic diol as a constituent unit tends to have high crystallinity and tin plating resistance, and is excellent in solder heat resistance. From the above viewpoints, the polycarbonate diols may be used in combination of two or more kinds, or a repeating unit containing a diol derived from both a linear aliphatic diol and an alicyclic diol. A unit of polycarbonate diol can be used. In order to achieve low bendability or flexibility, and to exhibit uniformity in solder heat resistance and tin plating resistance, the copolymerization ratio of the linear aliphatic diol to the alicyclic diol is a mass ratio of 3: The use of 7 to 7:3 polycarbonate diol is appropriate.
聚碳酸酯二醇,以數平均分子量200~5,000為佳,但聚碳酸酯二醇作為構成單位係含有來自直鏈狀脂肪族二醇與脂環式二醇之重覆單位,直鏈狀脂肪族二醇與脂環式二醇之共聚比率以質量比為3:7~7:3之情形,數平均分子量以400~2,000為佳。The polycarbonate diol preferably has a number average molecular weight of 200 to 5,000, but the polycarbonate diol as a constituent unit contains a repeating unit derived from a linear aliphatic diol and an alicyclic diol, and a linear fat The copolymerization ratio of the diol and the alicyclic diol is preferably from 3 to 7:7 by mass ratio, and the number average molecular weight is preferably from 400 to 2,000.
聚異氰酸酯(c)之具體例方面,可例舉例如,2,4-甲苯二異氰酸酯,2,6-甲苯二異氰酸酯,異佛爾酮二異氰酸酯,亞己基二異氰酸酯,二苯基亞甲基二異氰酸酯,(鄰,間或對)-二甲苯二異氰酸酯,(鄰,間或對)-氫化二甲苯二異氰酸酯,亞甲基雙(環己基異氰酸酯),三甲基亞己基二異氰酸酯,環己烷-1,3-二亞甲基二異氰酸酯,環己烷-1,4-二亞甲基二異氰酸酯及1,5-萘二異氰酸酯等之二異氰酸酯。該等之聚異氰酸酯可將1種或2種以上予以組合使用。該等中以脂環式二胺所衍生之脂環式二異氰酸酯,具體言之,異佛爾酮二異氰酸酯或(鄰,間或對)-氫化二甲苯二異氰酸酯為佳。在使用該等二異氰酸酯之情形,可獲得耐鍍錫性優異之硬化物。Specific examples of the polyisocyanate (c) include, for example, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, isophorone diisocyanate, hexylene diisocyanate, diphenylmethylene di Isocyanate, (o-, m- or p-)-xylene diisocyanate, (o-, m- or p-)-hydroxylene diisocyanate, methylene bis(cyclohexyl isocyanate), trimethyl hexylene diisocyanate, cyclohexane a diisocyanate such as 1,3-dimethylene diisocyanate, cyclohexane-1,4-dimethylene diisocyanate or 1,5-naphthalene diisocyanate. These polyisocyanates may be used alone or in combination of two or more. The alicyclic diisocyanate derived from the alicyclic diamine, in particular, isophorone diisocyanate or (o-, m- or p-)-hydroxylene diisocyanate is preferred. In the case of using such a diisocyanate, a cured product excellent in tin plating resistance can be obtained.
具有羧基之聚醇(d)方面,以可使用具有羧基之二羥基脂肪族羧酸者特佳。此種二羥基化合物方面,可例舉二羥甲基丙酸,二羥甲基丁烷酸。藉由使用具有羧基之二羥基脂肪族羧酸,可在胺基甲酸乙酯樹脂中容易地使羧基存在。In the case of the polyol (d) having a carboxyl group, it is particularly preferable to use a dihydroxyaliphatic carboxylic acid having a carboxyl group. The dihydroxy compound may, for example, be dimethylolpropionic acid or dimethylolbutanoic acid. By using a dihydroxy aliphatic carboxylic acid having a carboxyl group, a carboxyl group can be easily present in the urethane resin.
在單羥基化合物方面,因可成為聚胺基甲酸乙酯(A)之末端密封劑故可為分子中具有一羥基之化合物為佳,而可例舉脂肪族醇,單羥基單(甲基)丙烯酸酯化合物等。脂肪族醇之例方面,可例舉甲醇,乙醇,丙醇,異丁醇等,單羥基單(甲基)丙烯酸酯化合物之例方面,可例舉2-羥基乙基丙烯酸酯等。In terms of the monohydroxy compound, a compound having a monohydroxy group in the molecule may be preferred because it can be an end sealer of the ethyl urethane (A), and an aliphatic alcohol, monohydroxy mono(methyl) may be exemplified. Acrylate compound, etc. Examples of the aliphatic alcohols include methanol, ethanol, propanol, isobutanol, and the like, and examples of the monohydroxy mono(meth)acrylate compound include 2-hydroxyethyl acrylate.
該胺基甲酸乙酯樹脂(A)之數平均分子量以500~100,000為佳,8,000~30,000進而較佳。在此,數平均分子量係以凝膠滲透層析術測定之聚苯乙烯換算值。胺基甲酸乙酯樹脂(A)之數平均分子量不足500時,會有損及硬化膜之延伸度,可撓性,以及強度之情形,超過100,000時會變硬而有可撓性降低之虞。The number average molecular weight of the urethane resin (A) is preferably from 500 to 100,000, more preferably from 8,000 to 30,000. Here, the number average molecular weight is a polystyrene-converted value measured by gel permeation chromatography. When the number average molecular weight of the urethane resin (A) is less than 500, the elongation of the cured film may be impaired, flexibility, and strength may be obtained, and when it exceeds 100,000, the resin may become hard and the flexibility may be lowered. .
胺基甲酸乙酯樹脂(A)之酸值以5~150 mgKOH/g為佳,30~120 mgKOH/g進而較佳。酸值在不足5 mgKOH/g與硬化性成分之反應性降低而有損及耐熱性之情形。超過50 mgKOH/g時作為硬化膜之耐鹼性,電特性等光阻之特性會有降低之情形。此外,樹脂之酸值係準照JIS K5407所測定之值。The acid value of the urethane resin (A) is preferably from 5 to 150 mgKOH/g, more preferably from 30 to 120 mgKOH/g. When the acid value is less than 5 mgKOH/g and the reactivity with the curable component is lowered, the heat resistance is impaired. When the amount is more than 50 mgKOH/g, the alkali resistance of the cured film and the characteristics of the photoresist such as electrical characteristics may be lowered. Further, the acid value of the resin is a value measured in accordance with JIS K5407.
在熱硬化性成分(B)方面,可使用與為該(A)成分之聚胺基甲酸乙酯反應之環氧樹脂。環氧樹脂之具體例方面,例如雙酚A型環氧樹脂,氫化雙酚A型環氧樹脂,溴化雙酚A型環氧樹脂,雙酚F型環氧樹脂,酚醛清漆型環氧樹脂,苯酚酚醛清漆型環氧樹脂,甲酚酚醛清漆型環氧樹脂,N-環氧丙基型環氧樹脂,雙酚A之酚醛清漆型環氧樹脂,鉗合物型環氧樹脂,乙二醛型環氧樹脂,氨基含有環氧樹脂,橡膠改性環氧樹脂,二環戊二烯酚型(phenolic)型環氧樹脂,聚矽氧改性環氧樹脂,ε-己內酯改性環氧樹脂等之一分子中具有2個以上環氧基之環氧基化合物。又,為賦予難燃性,可使用氯,溴等鹵或磷等之原子被導入其構造中之物。進而,亦可使用雙酚S型環氧樹脂,二環氧丙基鄰苯二甲酸酯樹脂,雜環環氧樹脂,雙二甲苯酚型環氧樹脂,雙酚型環氧樹脂及四環氧丙基二甲苯酚基乙烷樹脂等。As the thermosetting component (B), an epoxy resin which reacts with the polyurethane of the component (A) can be used. Specific examples of the epoxy resin, such as bisphenol A epoxy resin, hydrogenated bisphenol A epoxy resin, brominated bisphenol A epoxy resin, bisphenol F epoxy resin, novolac epoxy resin , phenol novolac type epoxy resin, cresol novolak type epoxy resin, N-epoxypropyl type epoxy resin, bisphenol A novolak type epoxy resin, clamp type epoxy resin, Ethylene Aldehyde type epoxy resin, amino group containing epoxy resin, rubber modified epoxy resin, dicyclopentadiene phenolic type epoxy resin, polyfluorene modified epoxy resin, ε-caprolactone modification An epoxy compound having two or more epoxy groups in one molecule such as an epoxy resin. Further, in order to impart flame retardancy, an atom such as chlorine, bromine or the like such as a halogen or phosphorus may be introduced into the structure. Further, a bisphenol S type epoxy resin, a digoxypropyl phthalate resin, a heterocyclic epoxy resin, a bisxylenol type epoxy resin, a bisphenol type epoxy resin, and a tetracyclic ring can also be used. Oxypropyl dimethyl phenol ethane resin and the like.
本發明之熱硬化性樹脂組成物中,該熱硬化性成分(B),可單獨或2種以上之混合物使用。其配合量,相對於該(A)成分之具有羧基之聚胺基甲酸乙酯之羧基當量之,為該熱硬化性成分(B)之環氧樹脂之環氧基當量比以1.0~3.0為所期望。在不足1.0時,會有熱硬化性樹脂組成物之硬化膜之電絕緣性不充分之情形,超過3.0時,硬化膜之收縮量會變多,在作為可撓性(flexible)印刷配線基板(FPC)之絕緣保護膜使用之情形會有低彎曲性惡化之傾向。In the thermosetting resin composition of the present invention, the thermosetting component (B) may be used singly or in combination of two or more kinds. The amount of the epoxy group equivalent of the epoxy group of the thermosetting component (B) to the carboxyl group equivalent of the carboxyl group of the (A) component is 1.0 to 3.0. Expected. When the thickness is less than 1.0, the electrical insulating property of the cured film of the thermosetting resin composition may be insufficient. When the thickness exceeds 3.0, the amount of shrinkage of the cured film increases, and it is used as a flexible printed wiring board ( In the case where the insulating protective film of FPC) is used, there is a tendency that the low bending property is deteriorated.
本發明所使用之硬化劑,係為促進熱硬化反應者,使密接性,耐藥品性,耐熱性等之特性更進一步提高而使用。此種硬化劑之具體例方面,可例舉咪唑衍生物(例如,四國化成工業公司製,2MZ,2E4MZ,C1 1 Z,C1 7 Z,2PZ,1B2MZ,2MZ-CN,2E4MZ-CN,C1 1 Z-CN,2PZ-CN,2PHZ-CN,2MZ-CNS,2E4MZ-CNS,2PZ-CNS,2MZ-AZINE,2E4MZ-AZINE,C1 1 Z-AZINE,2MA-OK,2P4MHZ,2PHZ,2P4BHZ等);乙醯鳥糞胺,苯并鳥糞胺等之鳥糞胺類;二胺基二苯基甲烷,間伸苯基二胺,間二甲苯二胺,二胺基二苯基碸,二氰基二醯胺,尿素,尿素衍生物,三聚氰胺,多鹽基醯肼等之聚胺類;該等之有機酸鹽及/或環氧基加成物(adduct);三氟化硼之胺錯合物;乙基二胺基-s-三,2,4-二胺基-s-三,2,4-二胺基-6-二甲苯基-s-三等之三衍生物類;三甲基胺,三乙醇胺,N,N-二甲基辛基胺,N-苄基二甲基胺,吡啶,N-甲基嗎啉基,六(N-甲基)三聚氰胺,2,4,6-三(二甲基胺基苯酚),四甲基胍(guanidine),間胺基苯酚等之胺類;聚乙烯苯酚,聚乙烯苯酚溴化物,苯酚酚醛清漆,烷基苯酚酚醛清漆等之聚苯酚類;三丁基膦,三苯基膦,三個-2-氰乙基膦等之有機膦類;溴化三-正丁基(2,5-二羥基苯基)鏻,氯化十六基三丁基鏻等之鏻鹽類;氯化苄基三甲基銨,氯化苯基三丁基銨等之4級銨鹽類;該多鹼式酸酐;二苯基碘鎓四氟硼酸鹽,三苯基鎏六氟銻酸鹽,2,4,6-三苯基硫代吡喃鎓(pyrilium)六氟磷酸鹽酯,CIBA-Geigy公司製,Irgacure-261,旭電化公司製,Optoma SP-170等之光陽離子聚合觸媒;苯乙烯-順丁烯二酸酐樹脂;苯基異氰酸酯與二甲基胺之等莫耳反應物或甲苯二異氰酸酯,異佛爾酮二異氰酸酯等之有機聚異氰酸酯與二甲基胺之等莫耳反應物等之周知慣用硬化劑類或硬化促進劑類。The curing agent used in the present invention is used to promote the thermosetting reaction, and is used to further improve the properties of adhesion, chemical resistance, heat resistance and the like. Specific examples of such a curing agent include an imidazole derivative (for example, manufactured by Shikoku Kasei Kogyo Co., Ltd., 2MZ, 2E4MZ, C 1 1 Z, C 1 7 Z, 2PZ, 1B2MZ, 2MZ-CN, 2E4MZ-CN) , C 1 1 Z-CN, 2PZ-CN, 2PHZ-CN, 2MZ-CNS, 2E4MZ-CNS, 2PZ-CNS, 2MZ-AZINE, 2E4MZ-AZINE, C 1 1 Z-AZINE, 2MA-OK, 2P4MHZ, 2PHZ , 2P4BHZ, etc.; guanine guanamine, guanine guanamine and other guanamine amines; diaminodiphenylmethane, phenyldiamine, m-xylenediamine, diaminodiphenyl Polyamines such as hydrazine, dicyanodiamine, urea, urea derivatives, melamine, polybasic hydrazines, etc.; organic acid salts and/or epoxy adducts; Boron amine complex; ethyldiamine-s-three , 2,4-diamino-s-three , 2,4-diamino-6-dimethylphenyl-s-three Three Derivatives; trimethylamine, triethanolamine, N,N-dimethyloctylamine, N-benzyldimethylamine, pyridine, N-methylmorpholinyl, hexa(N-methyl)melamine , 2,4,6-tris(dimethylaminophenol), amines such as guanidine, m-aminophenol, polyvinylphenol, polyvinylphenol bromide, phenol novolac, alkyl Polyphenols such as phenol novolac; tributylphosphine, triphenylphosphine, organic phosphines such as tris-cyanoethylphosphine; tri-n-butyl bromide (2,5-dihydroxyphenyl)鏻, a sulfonium salt such as hexadecylphosphonium chloride; a quaternary ammonium salt such as benzyltrimethylammonium chloride or phenyltributylammonium chloride; the polybasic acid anhydride; Phenyl iodide tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, 2,4,6-triphenylthiopyranium hexafluorophosphate, manufactured by CIBA-Geigy, Irgacure- 261, photo-cationic polymerization catalyst of Optoma SP-170, manufactured by Asahi Chemical Co., Ltd.; styrene-maleic anhydride resin; molar reaction of phenyl isocyanate with dimethylamine or toluene diisocyanate, Ketone II The organic diisocyanate and the like known polyisocyanates of dimethylamine and equimolar reaction product of the conventional curing agents or curing promoting agents.
該等硬化劑可單獨使用,或混合2種以上使用。硬化劑之使用並非必須,尤其是在欲促進硬化之情形,相對於該熱硬化性成分(B)100質量份較佳為可在25質量份之範圍使用。超過25質量份時自其硬化物之昇華性成分會變多並不佳。These hardeners may be used singly or in combination of two or more. The use of the curing agent is not essential, and in particular, in the case where it is desired to promote hardening, it is preferably used in an amount of 25 parts by mass based on 100 parts by mass of the thermosetting component (B). When the amount exceeds 25 parts by mass, the sublimation component from the hardened material may become unsatisfactory.
本發明之熱硬化性樹脂組成物,係將上述聚胺基甲酸乙酯(A),熱硬化性成分(B)使用混合機,例如分散器(disper),捏合器,三輥磨,球磨等,藉由溶解或分散所得。此時,相對於環氧基,及羧基可使用惰性的溶劑。此種惰性溶劑方面以有機溶劑為佳。In the thermosetting resin composition of the present invention, the polyurethane (A) and the thermosetting component (B) are a mixer, for example, a disperser, a kneader, a three-roll mill, a ball mill, or the like. , obtained by dissolving or dispersing. In this case, an inert solvent can be used with respect to the epoxy group and the carboxyl group. An organic solvent is preferred for such an inert solvent.
有機溶劑因可使上述聚胺基甲酸乙酯(A),熱硬化性成分(B)容易溶解或分散,或為調整於適於塗膜之黏度而使用。有機溶劑方面,例如甲苯,二甲苯,乙基苯,硝基苯,環己烷,異佛爾酮,二乙二醇二甲基醚,乙二醇二乙基醚,卡必醇乙酸酯,丙二醇甲基醚乙酸酯,丙二醇乙基醚乙酸酯,二丙二醇甲基醚乙酸酯,二乙二醇乙基醚乙酸酯,甲氧基丙酸甲酯,甲氧基丙酸乙酯,乙氧基丙酸甲基,乙氧基丙酸乙酯,乙酸乙酯,乙酸正丁酯,乙酸異戊酯,乳酸乙酯,丙酮,甲基乙基酮,環己酮,N,N-二甲基甲醯胺,N,N-二甲基乙醯胺,N-甲基吡咯啶酮,γ-丁內酯,二甲基亞碸,氯仿及氯化亞甲基等。The organic solvent can be used because the above-mentioned polyurethane (A) and the thermosetting component (B) can be easily dissolved or dispersed, or adjusted to a viscosity suitable for a coating film. In terms of organic solvents, for example, toluene, xylene, ethylbenzene, nitrobenzene, cyclohexane, isophorone, diethylene glycol dimethyl ether, ethylene glycol diethyl ether, carbitol acetate , propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, dipropylene glycol methyl ether acetate, diethylene glycol ethyl ether acetate, methyl methoxypropionate, methoxypropionic acid Ethyl ester, methyl ethoxypropionate, ethyl ethoxypropionate, ethyl acetate, n-butyl acetate, isoamyl acetate, ethyl lactate, acetone, methyl ethyl ketone, cyclohexanone, N , N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, γ-butyrolactone, dimethyl hydrazine, chloroform and methylene chloride.
進而,本發明之熱硬化性樹脂組成物,可配合周知各種添加劑,例如硫酸鋇,滑石,碳酸鈣,二氧化鋁,玻璃粉,石英粉,二氧化矽等之無機充填劑,玻璃纖維,碳纖維,氮化硼纖維等之纖維強化材,氧化鈦,氧化鋅,碳黑,鐵黑,有機顏料,有機染料等之著色劑,受阻苯酚系化合物,磷系化合物,受阻胺系化合物等之防氧化劑,苯并三唑系化合物,苯并二苯基酮系化合物等之紫外線吸收劑等。Further, the thermosetting resin composition of the present invention can be blended with various additives such as barium sulfate, talc, calcium carbonate, alumina, glass powder, quartz powder, cerium oxide, etc., inorganic filler, glass fiber, carbon fiber. , fiber reinforced materials such as boron nitride fibers, titanium oxide, zinc oxide, carbon black, iron black, organic pigments, colorants such as organic dyes, hindered phenol compounds, phosphorus compounds, hindered amine compounds, etc. A benzotriazole-based compound, a absorbing agent such as a benzodiphenyl ketone-based compound, or the like.
又,為合乎用途可添加混合黏度調整劑,難燃劑,抗菌劑,防黴劑,防老化劑,防帶電劑,可塑劑,滑劑,發泡劑等。Moreover, a mixed viscosity adjuster, a flame retardant, an antibacterial agent, an antifungal agent, an anti-aging agent, an antistatic agent, a plasticizer, a slip agent, a foaming agent, etc. may be added for the purpose of use.
以下例舉實施例進而詳細說明本發明,但本發明並無受到該等實施例之任何限制。The invention is further illustrated by the following examples, but the invention is not limited by the examples.
合成例1:聚胺基甲酸乙酯(PU-1)之合成在具備攪拌裝置,溫度計,電容器之反應容器,投入1,5-戊烷二醇與1,6-己二醇所衍生之聚碳酸酯二醇(宇部興產公司製,PCDL800,數平均分子量800)2400 g(3 mol),具有羧基之二羥基化合物係投入二羥甲基丙酸402 g(3 mol),聚異氰酸酯係投入異佛爾酮二異氰酸酯1554 g(7 mol)及單羥基化合物係投入2-羥基乙基丙烯酸酯,238 g(2.05 mol)。一邊攪拌加熱至60℃予以停止,在反應容器內之溫度開始降低之時刻再度加熱在80℃持續攪拌,由紅外線吸收光譜可確認異氰酸酯基之吸收光譜(2280 cm- 1 )消失使反應完成。使固形成份成為50質量%之方式,添加卡必醇乙酸酯,獲得含有稀釋劑之液體黏稠液體之聚胺基甲酸乙酯(PU-1)。所得之聚胺基甲酸乙酯之數平均分子量係使用22,000(平均分子量係使用,凝膠載體液體層析術(GPC昭和電工公司製,GPC-1),以換算成聚苯乙烯之值求得。),固形成份之酸值為46mgKOH/g。Synthesis Example 1: Synthesis of Polyurethane (PU-1) In a reaction vessel equipped with a stirring device, a thermometer, and a capacitor, a mixture of 1,5-pentanediol and 1,6-hexanediol was charged. Carbonate diol (PCDL800, number average molecular weight 800), 2400 g (3 mol), dihydroxy compound with carboxyl group, 402 g (3 mol) of dimethylolpropionic acid, polyisocyanate input Isophorone diisocyanate 1554 g (7 mol) and a monohydroxy compound were charged with 2-hydroxyethyl acrylate, 238 g (2.05 mol). With stirring and heated to 60 deg.] C to be stopped, at the time it begins to decrease the temperature inside the reaction vessel was again heated stirring was continued at 80 ℃, an infrared absorption spectrum confirmed that the absorption spectrum of the isocyanate group of (2280 cm - 1) disappears to complete the reaction. The carbitol acetate was added in such a manner that the solid content became 50% by mass to obtain a polyurethane urethane (PU-1) containing a liquid viscous liquid of a diluent. The number average molecular weight of the obtained polyurethane was 22,000 (average molecular weight was used, and gel carrier liquid chromatography (GPC-1 manufactured by GPC Showa Denko Co., Ltd.) was used to obtain the value converted into polystyrene. The acid value of the solid component was 46 mgKOH/g.
合成例2:胺基甲酸乙酯樹脂(PU-2)之合成聚碳酸酯二醇係使用1,6-己二醇與1,4-環己烷二甲醇所衍生之聚碳酸酯二醇(宇部興產公司製,UM-CARB90,數平均分子量900,上述2種二醇之共聚比率以質量比為1:1)2700 g以外其他與合成例1同樣之手段進行合成,獲得含有稀釋劑之液體黏稠液體之聚胺基甲酸乙酯PU-2。所得聚胺基甲酸乙酯之數平均分子量為24,000,固形成份之酸值為57 mgKOH/g。Synthesis Example 2: Synthesis of urethane resin (PU-2) Polycarbonate diol was a polycarbonate diol derived from 1,6-hexanediol and 1,4-cyclohexanedimethanol ( Ubiquita Co., Ltd., UM-CARB90, a number average molecular weight of 900, and a copolymerization ratio of the above two kinds of diols was synthesized in the same manner as in Synthesis Example 1 except that the mass ratio was 1:1) 2700 g, and a diluent was obtained. Polyurethane PU-2 of liquid viscous liquid. The obtained polyethyl urethane had a number average molecular weight of 24,000 and a solid component acid value of 57 mgKOH/g.
比較例1:將Johnson聚合物公司製之苯乙烯-丙烯酸樹脂;JONCRYL 586(分子量4600,固形成份酸值108 mgKOH/g)作為含羧基樹脂使用。Comparative Example 1: A styrene-acrylic resin manufactured by Johnson Polymer Co., Ltd.; JONCRYL 586 (molecular weight 4600, solid component acid value 108 mgKOH/g) was used as a carboxyl group-containing resin.
比較例2:Daicel化學工業公司製之丙烯系共聚樹脂;cyclomer PACA320(分子量20000,固形成份酸值130 mgKOH/g)作為含羧基樹脂使用。Comparative Example 2: A propylene-based copolymer resin manufactured by Daicel Chemical Industry Co., Ltd.; cyclomer PACA320 (having a molecular weight of 20,000 and a solid component acid value of 130 mgKOH/g) was used as a carboxyl group-containing resin.
實施例1~3及比較例1~2:以表1所示各成分及配合比率,以三輥混合(23℃)來調製硬化性樹脂組成物。所得之熱硬化性組成物以棒塗佈器塗膜於基板使膜厚成為約25 μ m。將各塗膜基板在80℃使溶劑預備乾燥15分鐘後,在150℃×60分之條件進行熱硬化。Examples 1 to 3 and Comparative Examples 1 and 2: The curable resin composition was prepared by mixing (23 ° C) in three rolls with the respective components and mixing ratios shown in Table 1. The obtained thermosetting composition was coated on a substrate with a bar coater to a film thickness of about 25 μm. Each of the coating film substrates was preliminarily dried at 80 ° C for 15 minutes, and then thermally cured at 150 ° C × 60 minutes.
在各例中性能係以下述方法評價。其結果如表1所示。The performance in each case was evaluated by the following method. The results are shown in Table 1.
(1)彎曲性在聚醯亞胺薄膜(kapton 100H;Toray Dupont公司製,厚度25 μ m)使熱硬化性樹脂組成物塗膜,予以熱硬化後,在50mm Φ以環形切刀(circle cutter)切割。被切割成圓形者係在中心附近呈現與凸狀或凹狀相反形之變形。在1h後以在下方為凸之狀態靜置,測定自水平面之彎曲高度之最大,最小值,予以平均。符號係表示彎曲之方向,以在下方為凸之狀態靜置時,相對於聚醯亞胺薄膜使硬化膜在成為上側之情形為+,硬化膜成為下側之情形為-。(1) Flexibility A thermosetting resin composition was coated on a polyimide film (kapton 100H; manufactured by Toray Dupont Co., Ltd., thickness: 25 μm), and heat-hardened, and then a circular cutter at 50 mm Φ (circle cutter) ) cutting. The person who is cut into a circular shape exhibits a deformation opposite to the convex or concave shape near the center. After 1 h, it was allowed to stand in a state of being convex below, and the maximum and minimum values of the bending height from the horizontal plane were measured and averaged. The symbol indicates the direction of the bending, and when it is left in a state of being convex, the case where the cured film is on the upper side with respect to the polyimide film is +, and the case where the cured film is on the lower side is -.
(2)可撓性在聚醯亞胺薄膜(kapton 100H;Toray Dupont公司製,厚度25 μ m)上,將進行至熱硬化為止之試料切割成15×70mm,進行180度彎折以成為光阻面朝外側之方式,在彎折部位以0.35kN之力經1秒。以顯微鏡觀察,將可見到龜裂之次數以可撓性測定。此外,評價係進行至10次為止。(2) Flexibility A sample which was subjected to thermal curing was cut into 15 × 70 mm on a polyimide film (kapton 100H; manufactured by Toray Dupont Co., Ltd., thickness: 25 μm), and bent at 180 degrees to become light. The resistance surface faces outward, and the bending portion is subjected to a force of 0.35 kN for 1 second. When observed under a microscope, the number of cracks was observed to be measured by flexibility. In addition, the evaluation was carried out up to 10 times.
(3)銲錫耐熱性將剛性(rigid)銅基板上之一部份以kapton聚醯亞胺膠帶(Toray Dupont公司製)進行掩罩(mask),將掩罩面,非掩罩面全體予以塗膜,獲得硬化塗膜。接著將kapton聚醯亞胺膠帶予以剝離,使松香系銲料塗佈,在銲錫浴進行260℃×10sec浸漬。使光阻膜與膠帶剝離部之界面以目視觀察,來評價膜剝離等之變化出現為止之浸漬次數。此外,評價係至3次為止。(3) Solder heat resistance A part of a rigid copper substrate was masked with a kapton polyimide tape (manufactured by Toray Dupont Co., Ltd.), and the mask surface and the non-mask surface were coated. Membrane, a hardened coating film is obtained. Next, the kapton polyimide tape was peeled off, and the rosin-based solder was applied, and immersed in a solder bath at 260 ° C for 10 sec. The interface between the photoresist film and the tape peeling portion was visually observed to evaluate the number of times of immersion until the change in film peeling or the like occurred. In addition, the evaluation was performed up to three times.
在銅基板,聚醯亞胺薄膜(kapton 300H;Toray Dupont公司製,厚度100μm)上使用硬化之塗膜,準照JIS K5600進行評價。此外,剝離用膠帶係使用日東製。A hardened coating film was applied to a copper substrate, a polyimide film (kapton 300H; manufactured by Toray Dupont Co., Ltd., thickness: 100 μm), and evaluated in accordance with JIS K5600. In addition, the tape for peeling is made by Nitto.
○:棋盤眼之數完全為殘留之情形○: The number of checkerboard eyes is completely residual
△:棋盤眼之數有50個以上不足100個殘留之情形△: The number of checkerboard eyes is less than 50 and less than 100 remains.
×:棋盤眼之數只有不足50個之情形×: The number of checkerboard eyes is less than 50
在可撓性銅基板(宇部興產公司製:Upicel NSE3150)上獲得硬化塗膜,在121℃,相對濕度100%RH之值溫 恒濕機內放置120小時後,以以下基準評價。A hardened coating film was obtained on a flexible copper substrate (manufactured by Ube Industries, Ltd.: Upicel NSE3150) at a temperature of 121 ° C and a relative humidity of 100% RH. After standing in a humidity machine for 120 hours, it was evaluated on the following basis.
○:在硬化塗膜無膨脹,剝離,變色○: no swelling, peeling, discoloration in the cured coating film
△:在硬化塗膜有若干膨脹,剝離,變色△: There are some expansion, peeling, and discoloration in the hardened coating film.
×:在硬化塗膜有膨脹,剝離,變色×: expansion, peeling, discoloration in the cured coating film
在可撓性銅基板(宇部興產公司製:UpicelN SE3150)上獲得硬化塗膜,於鍍錫液(Rohm & Haas公司製:TINPOSITLT-34)之電鍍浴70℃,進行3分浸漬後,清洗(washing)之(70℃,3分),以以下基準進行目視評價。A hardened coating film was obtained on a flexible copper substrate (made by Ube Industries, Ltd.: Upicel N SE3150), and it was immersed in a plating bath of 70 ° C at a plating bath (manufactured by Rohm & Haas Co., Ltd.: TINPOSITLT-34) for 3 minutes, and then washed. (washing) (70 ° C, 3 points), visual evaluation was performed on the following basis.
○:在硬化塗膜並無膨脹,剝離,變色△:在硬化塗膜有若干膨脹,剝離,變色×:在硬化塗膜有膨脹,剝離,變色○: There is no expansion in the cured coating film, peeling, discoloration Δ: There is a certain expansion in the cured coating film, peeling, discoloration ×: swelling, peeling, discoloration in the cured coating film
合成例3:胺基甲酸乙酯樹脂「PU-3」之合成在具備滴下漏斗,攪拌裝置,溫度計,電容器之反應容器,將1,6-己二醇與1,4-環己烷二甲醇所衍生之聚碳酸酯二醇(宇部興產公司製,UM-CARB90,數平均分子量900,上述2種二醇之共聚比率以質量比為1:1)投入1,800 g(=2 mol),具有羧基之二羥基化合物係投入二羥甲基丙酸402 g(=3 mol)及聚異氰酸酯係投入異佛爾酮二異氰酸酯1,554 g(=7 mol)。一邊攪拌一邊加熱至60℃為止予以停止,在反應容器內之溫度開始降低時再度加熱,在80℃持續攪拌2小時。末端密封劑之單羧酸化合物係將乙醇酸153 g(=2 mol)以滴下漏斗添加,在同溫度進而持續攪拌2小時。確認以紅外線吸收光譜異氰酸酯基之吸收光譜(2280 cm- 1 )已消失使反應完成。添加卡必醇乙酸酯使固形成份成為50質量%,獲得含有稀釋劑之液體黏稠液體之胺基甲酸乙酯樹脂PU-3。所得之聚胺基甲酸乙酯之數平均分子量為3,900(平均分子量為,使用凝膠載體液體層析術(GPC昭和電工公司製,GPC-1),以換算為聚苯乙烯之值求得。),固形成份之酸值為87 mgKOH/g。Synthesis Example 3: Synthesis of urethane resin "PU-3" In a reaction vessel equipped with a dropping funnel, a stirring device, a thermometer, and a capacitor, 1,6-hexanediol and 1,4-cyclohexanedimethanol were used. The polycarbonate diol (manufactured by Ube Industries, Ltd., UM-CARB90, number average molecular weight 900, copolymerization ratio of the above two kinds of diols in a mass ratio of 1:1) was put into 1,800 g (=2 mol), and The dihydroxy compound of the carboxyl group was charged with 402 g (=3 mol) of dimethylolpropionic acid and 1,554 g (=7 mol) of isophorone diisocyanate. The mixture was stopped while being heated to 60 ° C while stirring, and heated again when the temperature in the reaction vessel began to decrease, and stirring was continued at 80 ° C for 2 hours. The monocarboxylic acid compound of the terminal sealant was charged with 153 g (= 2 mol) of glycolic acid as a dropping funnel, and stirring was continued for 2 hours at the same temperature. In the infrared absorption spectrum confirmed that the absorption spectrum of the isocyanate group (2280 cm - 1) have disappeared to complete the reaction. The carbitol acetate was added to have a solid content of 50% by mass, and a urethane resin PU-3 containing a liquid viscous liquid of a diluent was obtained. The number average molecular weight of the obtained polyurethane was 3,900 (the average molecular weight was determined by using gel carrier liquid chromatography (GPC-1, manufactured by GPC Showa Denko Co., Ltd.) in terms of polystyrene. The acid value of the solid component is 87 mgKOH/g.
合成例4:胺基甲酸乙酯樹脂「PU-4」之合成除了末端密封劑之單羧酸化合物係使用羥基三甲基乙酸237 g(=2 mol)以外其他以與合成例3同樣之手段進行合成,獲得含有稀釋劑之液體黏稠液體之胺基甲酸乙酯樹脂PU-4。所得之聚胺基甲酸乙酯之數平均分子量為4,000,固形成份之酸值為85 mgKOH/g。Synthesis Example 4: Synthesis of urethane resin "PU-4" The same procedure as in Synthesis Example 3 except that 237 g (=2 mol) of hydroxytrimethylacetic acid was used as the monocarboxylic acid compound of the terminal sealant. The synthesis was carried out to obtain a urethane resin PU-4 containing a liquid viscous liquid of a diluent. The obtained polyurethane had a number average molecular weight of 4,000 and a solid content of 85 mgKOH/g.
合成例5:胺基甲酸乙酯樹脂[PU-5」之合成除了末端密封劑之單羥基化合物係使用2-羥基乙基丙烯酸酯235 g(=2 mol)以外其他則以合成例3同樣手段進行合成,獲得含有稀釋劑之液體黏稠液體之胺基甲酸乙酯樹脂PU-5。所得之聚胺基甲酸乙酯之數平均分子量為4,000,固形成份之酸值為57 mgKOH/g。Synthesis Example 5: Synthesis of urethane resin [PU-5" The same procedure as in Synthesis Example 3 was carried out except that the monohydroxyl compound of the terminal sealant was 235 g (=2 mol) using 2-hydroxyethyl acrylate. The synthesis was carried out to obtain a urethane resin PU-5 containing a liquid viscous liquid of a diluent. The obtained polyurethane had a number average molecular weight of 4,000 and a solid content of an acid value of 57 mgKOH/g.
合成例6:胺基甲酸乙酯樹脂「PU-6」之合成除了末端密封劑之單羥基化合物係使用異丁醇148 g(=2 mol)以外其他則以與合成例3同樣之手段進行合成,獲得含有稀釋劑之液體黏稠液體之胺基甲酸乙酯樹脂PU-6。所得之聚胺基甲酸乙酯之數平均分子量為4,000,固形成份之酸值為58 mgKOH/g。Synthesis Example 6: Synthesis of urethane resin "PU-6" Synthesis was carried out in the same manner as in Synthesis Example 3 except that the monohydroxy compound of the terminal sealant was 148 g (=2 mol) using isobutanol. A urethane resin PU-6 which is a liquid viscous liquid containing a diluent is obtained. The obtained polyurethane had a number average molecular weight of 4,000 and a solid content of 58 mgKOH/g.
實施例4,5與實施例6,7之比較:以表2所示各成分及配合比率,以三輥(triple roll)來混合(23℃),以調製熱硬化性樹脂組成物。將所得之熱硬化性樹脂組成物以棒塗佈器塗膜於基板成為膜厚約25 μ m之方式塗膜(coating)。將各塗膜基板在80℃進行15分鐘溶劑預備乾燥後,在150℃×60分之條件進行熱硬化。於各例中該方法所致性能評價結果與該比較例1,2一起示於表2。Comparison of Examples 4 and 5 with Examples 6 and 7: Each of the components and the compounding ratio shown in Table 2 were mixed by a triple roll (23 ° C) to prepare a thermosetting resin composition. The obtained thermosetting resin composition was coated on a substrate with a bar coater to have a film thickness of about 25 μm. Each of the coated substrates was subjected to solvent pre-drying at 80 ° C for 15 minutes, and then thermally cured at 150 ° C × 60 minutes. The results of the performance evaluation by the method in each of the examples are shown in Table 2 together with the comparative examples 1, 2.
如以上,依照本發明之含有聚胺基甲酸乙酯(A)與熱硬化性成分(B)之熱硬化性樹脂組成物,與基材之密接性,低彎曲性,可撓性,耐濕熱性,銲錫耐熱性,耐鍍錫性優異,可恰當地使用於鍍銲光阻或層間絕緣膜等之電絕緣材料,IC或超LSI密封材料,層合板等之領域之用途。As described above, the thermosetting resin composition containing the polyurethane (A) and the thermosetting component (B) according to the present invention has adhesiveness to a substrate, low flexibility, flexibility, and moist heat resistance. It is excellent in solder heat resistance and tin plating resistance, and can be suitably used for electrical insulating materials such as solder resists or interlayer insulating films, ICs, super LSI sealing materials, laminates, and the like.
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| US20090099283A1 (en) * | 2006-03-16 | 2009-04-16 | Showa Denko K.K. | Thermosetting resin compositions, flexible circuit board overcoating agents, and surface protective layers |
| EP2017307A4 (en) * | 2006-04-28 | 2010-07-07 | Showa Denko Kk | Thermosetting resin composition and use thereof |
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| KR101631540B1 (en) * | 2008-03-21 | 2016-06-17 | 쇼와 덴코 가부시키가이샤 | Resin composition and cured film thereof |
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| WO2010073981A1 (en) | 2008-12-26 | 2010-07-01 | 昭和電工株式会社 | Curable composition |
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| US8420745B2 (en) | 2008-12-30 | 2013-04-16 | Industrial Technology Research Institute | Thermally curable solder resist composition |
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-
2005
- 2005-09-20 TW TW094132478A patent/TWI389975B/en not_active IP Right Cessation
- 2005-09-20 EP EP05787774A patent/EP1802674A1/en not_active Withdrawn
- 2005-09-20 US US11/663,192 patent/US8524838B2/en not_active Expired - Fee Related
- 2005-09-20 CN CN200580031742XA patent/CN101023112B/en not_active Expired - Fee Related
- 2005-09-20 WO PCT/JP2005/017659 patent/WO2006033439A1/en not_active Ceased
- 2005-09-20 KR KR1020077007419A patent/KR101189646B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP1802674A1 (en) | 2007-07-04 |
| CN101023112B (en) | 2010-11-24 |
| US20070293636A1 (en) | 2007-12-20 |
| CN101023112A (en) | 2007-08-22 |
| TW200619318A (en) | 2006-06-16 |
| WO2006033439A1 (en) | 2006-03-30 |
| US8524838B2 (en) | 2013-09-03 |
| KR101189646B1 (en) | 2012-10-12 |
| KR20070068355A (en) | 2007-06-29 |
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