TWI386689B - Color filter substrate and fabricating method thereof - Google Patents
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- TWI386689B TWI386689B TW98141225A TW98141225A TWI386689B TW I386689 B TWI386689 B TW I386689B TW 98141225 A TW98141225 A TW 98141225A TW 98141225 A TW98141225 A TW 98141225A TW I386689 B TWI386689 B TW I386689B
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- 239000000758 substrate Substances 0.000 title claims description 58
- 238000000034 method Methods 0.000 title claims description 20
- 239000000463 material Substances 0.000 claims description 87
- 239000005871 repellent Substances 0.000 claims description 46
- 239000011159 matrix material Substances 0.000 claims description 40
- 230000002940 repellent Effects 0.000 claims description 36
- 230000007547 defect Effects 0.000 claims description 26
- 230000008439 repair process Effects 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 238000007641 inkjet printing Methods 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 239000000049 pigment Substances 0.000 description 19
- 239000002245 particle Substances 0.000 description 5
- 239000003086 colorant Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
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Description
本發明是有關於一種彩色濾光片基板,且特別是有關於一種彩色濾光片基板的製造方法。The present invention relates to a color filter substrate, and more particularly to a method of fabricating a color filter substrate.
由於顯示器(liquid crystal display,LCD)具有低電壓操作、無輻射線散射、重量輕以及體積小等傳統陰極射線管(cathode ray tube,CRT)所製造之顯示器無法達到的優點,因此已成為近年來顯示器研究的主要課題,且不斷地朝向彩色化發展。Since liquid crystal display (LCD) has advantages such as low voltage operation, no radiation scattering, light weight, and small size, which cannot be achieved by conventional cathode ray tube (CRT) displays, it has become a recent The main subject of display research is constantly moving towards colorization.
藉由彩色濾光片可使得液晶顯示器進行全彩化顯示。近年來,多種利用噴墨印刷製程(inkjet printing)形成彩色濾光片的方法已被發展出來。此噴墨印刷製程係先於基板上形成黑矩陣,以定義出多個畫素區域。然後,進行噴墨印刷製程以將彩色顏料(紅色、綠色、藍色)注入到黑矩陣所定義的畫素區域中。繼之,進行熱烘烤製程(thermal baking process)以將彩色顏料固化。The color filter can be used to make a full color display of the liquid crystal display. In recent years, various methods of forming color filters using inkjet printing have been developed. The inkjet printing process forms a black matrix on the substrate to define a plurality of pixel regions. Then, an inkjet printing process is performed to inject color pigments (red, green, blue) into the pixel regions defined by the black matrix. Next, a thermal baking process is performed to cure the color pigment.
噴墨印刷(Ink-jet printing)的技術可直接將彩色顏料塗佈於基板上,以製成彩色濾光片,其好處在於,不需利用罩幕(mask)或是網版(stencil)即可以製作出不同顏色的彩色濾光薄膜。此外,噴墨印刷製程不但製程步驟簡易且不會有因需使用其他酸鹼溶液所衍生出的相關問題。Ink-jet printing technology can directly apply color pigments to a substrate to form a color filter, which has the advantage of not requiring the use of a mask or a stencil. Color filter films of different colors can be produced. In addition, the inkjet printing process not only has a simple process step, but also has no problems associated with the use of other acid-base solutions.
圖1A至圖1C為習知彩色濾光片基板的製造流程示意圖,而圖2為習知彩色濾光片基板的上視示意圖。請參照圖1A,首先提供一基板100,並於基板100上形成一黑矩陣層110。從圖1A可知,黑矩陣層110具有多個開口112,以於基板100上定義出畫素區域。值得注意的是,在黑矩陣層110製作過程中,缺陷區D的產生是難以避免的,一般而言,缺陷區D是指黑矩陣層110的缺斷處,若不針對缺陷區D進行修補,將導致後續形成的彩色顏料發生溢流(overflow)以及混色的現象。1A to 1C are schematic diagrams showing a manufacturing process of a conventional color filter substrate, and FIG. 2 is a top view of a conventional color filter substrate. Referring to FIG. 1A, a substrate 100 is first provided, and a black matrix layer 110 is formed on the substrate 100. As can be seen from FIG. 1A, the black matrix layer 110 has a plurality of openings 112 to define a pixel region on the substrate 100. It should be noted that in the fabrication process of the black matrix layer 110, the generation of the defect region D is difficult to avoid. Generally, the defect region D refers to the defect of the black matrix layer 110, and if the defect region D is not repaired. This will cause the subsequent formation of color pigments to overflow and color mixing.
接著請參照圖1B,為了避免後續形成的彩色顏料發生溢流以及混色的現象,可於缺陷區D上形成具有疏墨特性(lyophilic)的修補遮光層120。Next, referring to FIG. 1B, in order to avoid overflow and color mixing of the subsequently formed color pigment, a repair light-shielding layer 120 having a lyophilic property may be formed on the defect region D.
接著請參照圖1C,在形成修補遮光層120之後,接著,於各個開口112中形成不同顏色的彩色顏料。由於修補遮光層120具有疏墨特性,因此彩色顏料幾乎不與修補遮光層120接觸,導致彩色顏料在鄰近於修補遮光層120處(圖1C中的位置X處)出現填入不完全的現象。在開口112中填入彩色顏料之後,透過熱烘烤製程以使彩色顏料固化為彩色濾光薄膜130,以完成彩色濾光片基板CF的製作。此時,彩色濾光薄膜130的填入不完全會導致位置X發生漏光的現象,如圖2所示。Next, referring to FIG. 1C, after the repair of the light-shielding layer 120, color pigments of different colors are formed in the respective openings 112. Since the repairing light-shielding layer 120 has an ink-repellent property, the color pigment hardly comes into contact with the repairing light-shielding layer 120, resulting in a phenomenon in which the color pigment is incompletely filled near the repairing light-shielding layer 120 (at the position X in FIG. 1C). After the color pigment is filled in the opening 112, the color pigment is cured to the color filter film 130 by a thermal baking process to complete the fabrication of the color filter substrate CF. At this time, the incomplete filling of the color filter film 130 may cause light leakage at the position X, as shown in FIG.
本發明提供一種彩色濾光片基板及其製造方法,以有效地改善因彩色濾光薄膜填入不完全所導致的漏光現象(leakage)。The present invention provides a color filter substrate and a method of manufacturing the same to effectively improve leakage caused by incomplete filling of a color filter film.
本發明提供一種彩色濾光片基板,其包括一基板、一黑矩陣層、多個彩色濾光薄膜以及至少一修補結構。黑矩陣層配置於基板上,黑矩陣層具有多個開口,且黑矩陣層具有至少一位於相鄰開口之間的缺陷區。彩色濾光薄膜配置於開口內,而修補結構配置於缺陷區上。前述之修補結構包括一親墨材料層以及一疏墨材料層,其中親墨材料層配置於基板上,且親墨材料層與相鄰之彩色濾光薄膜接觸。此外,疏墨材料層堆疊於親墨材料層上。The present invention provides a color filter substrate comprising a substrate, a black matrix layer, a plurality of color filter films, and at least one repair structure. The black matrix layer is disposed on the substrate, the black matrix layer has a plurality of openings, and the black matrix layer has at least one defect region between adjacent openings. The color filter film is disposed in the opening, and the repair structure is disposed on the defect area. The foregoing repair structure includes a layer of ink receptive material and a layer of ink repellent material, wherein the layer of ink receptive material is disposed on the substrate, and the layer of ink receptive material is in contact with the adjacent color filter film. Further, a layer of ink repellent material is stacked on the layer of ink receptive material.
在本發明之一實施例中,前述之開口將基板的部分區域暴露,而彩色濾光薄膜配置於開口所暴露出之基板上。In an embodiment of the invention, the opening is to expose a portion of the substrate, and the color filter film is disposed on the substrate exposed by the opening.
在本發明之一實施例中,前述之親墨材料層的寬度大於疏墨材料層的寬度。In one embodiment of the invention, the width of the aforementioned layer of inking material is greater than the width of the layer of ink repellent material.
在本發明之一實施例中,前述之親墨材料層與疏墨材料層的總厚度實質上等於黑矩陣的厚度。In one embodiment of the invention, the total thickness of the layer of ink receptive material and layer of ink repellent material is substantially equal to the thickness of the black matrix.
在本發明之一實施例中,前述之親墨材料層與 疏墨材料層能夠遮蔽光線。In one embodiment of the invention, the layer of ink receptive material and layer of ink repellent material are capable of shielding light.
在本發明之一實施例中,前述之親墨材料層或 疏墨材料層能夠遮蔽光線。In one embodiment of the invention, the aforementioned layer of ink receptive material or layer of ink repellent material is capable of shielding light.
本發明提供一種彩色濾光片基板的製造方法。首先,於一基板上形成一黑矩陣層,其中黑矩陣層具有多個開口。接著,檢測黑矩陣層是否具有一位於而相鄰開口之間的缺陷區,當黑矩陣具有缺陷區時,於缺陷區上形成一修補結構,而前述之修補結構的形成方法係先於基板上形成一親墨材料層。之後,於親墨材料層上形成一疏墨材料層,以使疏墨材料層堆疊於親墨材料層上。接著,於開口內形成多個彩色濾光薄膜。The present invention provides a method of manufacturing a color filter substrate. First, a black matrix layer is formed on a substrate, wherein the black matrix layer has a plurality of openings. Next, it is detected whether the black matrix layer has a defect region located between adjacent openings. When the black matrix has a defect region, a repair structure is formed on the defect region, and the foregoing repair structure is formed on the substrate. A layer of inking material is formed. Thereafter, a layer of ink repellent material is formed on the layer of ink receptive material to cause the layer of ink repellent material to be stacked on the layer of ink receptive material. Next, a plurality of color filter films are formed in the openings.
在本發明之一實施例中,前述之親墨材料層的形成方法包括噴墨印刷(inkjet printing)、塗佈(dispensing)或乾膜貼合。In an embodiment of the invention, the method of forming the aforementioned layer of inking material comprises inkjet printing, dispensing or dry film bonding.
在本發明之一實施例中,前述之疏墨材料層的形成方法包括噴墨印刷、塗佈或乾膜貼合。In one embodiment of the invention, the method of forming the aforementioned layer of ink repellent material comprises ink jet printing, coating or dry film bonding.
在本發明之一實施例中,前述之彩色濾光薄膜的形成方法包括噴墨印刷。In an embodiment of the invention, the method of forming the color filter film described above comprises inkjet printing.
基於上述,由於本發明採用親墨材料層以及堆疊於親墨材料層上之疏墨材料層對缺陷區的進行修補,因此本發明能夠使彩色濾光薄膜與親墨材料層接觸,以避免因彩色濾光薄膜填入不完全所導致的漏光現象。Based on the above, since the present invention repairs the defective region by using the layer of the ink receptive material and the layer of the ink repellent material stacked on the layer of the ink receptive material, the present invention enables the color filter film to be in contact with the layer of the ink receptive material to avoid The color filter film is filled with light leakage caused by incompleteness.
為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the present invention will be more apparent from the following description.
圖3A至圖3D以及圖4A至圖4D為本發明一實施例之彩色濾光片基板的製造流程示意圖。首先請參考圖3A與圖4A,提供一基板200,並於基板200上形成一黑矩陣層210。在本實施例中,黑矩陣層210具有多個開口212,以於基板200上定義出畫素區域。值得注意的是,在黑矩陣層210製作過程中,缺陷區D的產生是難以避免的,一般而言,缺陷區D是指黑矩陣層210的缺斷處。3A to 3D and 4A to 4D are schematic views showing a manufacturing process of a color filter substrate according to an embodiment of the present invention. Referring first to FIG. 3A and FIG. 4A, a substrate 200 is provided, and a black matrix layer 210 is formed on the substrate 200. In the present embodiment, the black matrix layer 210 has a plurality of openings 212 to define a pixel region on the substrate 200. It should be noted that in the fabrication process of the black matrix layer 210, the generation of the defect region D is difficult to avoid. Generally, the defect region D refers to the defect of the black matrix layer 210.
從圖3A可知,黑矩陣層210具有多個疏墨顆粒(lyophilic particles)210a,且這些疏墨顆粒210a分佈於黑矩陣層210的上表面,以有效避免後續形成的彩色顏料發生溢流以及混色的問題。As can be seen from FIG. 3A, the black matrix layer 210 has a plurality of lyophilic particles 210a, and the ink repellent particles 210a are distributed on the upper surface of the black matrix layer 210 to effectively prevent overflow and color mixing of subsequently formed color pigments. The problem.
接著請參照圖3B、3C、圖4B以及圖4C,在本實施例中,在黑矩陣層210製作完成後,會檢測黑矩陣層210是否具有一位於而相鄰開口212之間的缺陷區D(繪示於圖3A與圖4A中),當黑矩陣層210具有缺陷區D時,先於缺陷區D上形成一修補結構220,以期避免後續形成的彩色顏料發生溢流以及混色的現象。在本實施例中,修補結構220的製作係先於缺陷區D處的基板200上形成一親墨材料層220a,之後,再於親墨材料層220a上形成一疏墨材料層220b,以使疏墨材料層220b能夠堆疊於親墨材料層220a上。舉例而言,親墨材料層220a以及疏墨材料層220b的形成方法例如是噴墨印刷(inkjet printing)、塗佈(dispensing)或乾膜貼合。值得注意的是,前述的塗佈製程例如可以透過針頭或微滴管來達成。3B, 3C, 4B, and 4C, in the present embodiment, after the black matrix layer 210 is completed, it is detected whether the black matrix layer 210 has a defective region D located between adjacent openings 212. (Drawed in FIG. 3A and FIG. 4A), when the black matrix layer 210 has the defect region D, a repair structure 220 is formed on the defect region D in order to avoid overflow and color mixing of the subsequently formed color pigment. In this embodiment, the repair structure 220 is formed by forming an ink-repellent material layer 220a on the substrate 200 at the defect area D, and then forming an ink-repellent material layer 220b on the ink-receptive material layer 220a, so that The ink repellent material layer 220b can be stacked on the ink receptive material layer 220a. For example, the method of forming the ink receptive material layer 220a and the ink repellent material layer 220b is, for example, inkjet printing, dispensing, or dry film bonding. It should be noted that the aforementioned coating process can be achieved, for example, by a needle or a micropipette.
承上述,本實施例之疏墨材料層220b中例如具有多個疏墨顆粒222,以使得疏墨材料層220b的表面具有一定程度的疏墨特性,有助於避免後續形成的彩色顏料發生溢流以及混色的現象。In the above, the ink repellent material layer 220b of the present embodiment has, for example, a plurality of ink repellent particles 222, so that the surface of the ink repellent material layer 220b has a certain degree of ink repellent property, which helps to prevent the subsequent formation of color pigments from overflowing. Flow and color mixing.
從圖3S與圖4D可知,本實施例之親墨材料層220a的寬度會大於疏墨材料層220b的寬度,而親墨材料層220a與疏墨材料層220b的總厚度實質上等於黑矩陣210的厚度。然而,本發明並不限制親墨材料層220a與疏墨材料層220b的寬度與厚度,此領域具有通常知識者當可依據產品實際需求而作出適當的更動與變化。3S and FIG. 4D, the width of the ink receptive material layer 220a of the present embodiment is greater than the width of the ink repellent material layer 220b, and the total thickness of the ink receptive material layer 220a and the ink repellent material layer 220b is substantially equal to the black matrix 210. thickness of. However, the present invention does not limit the width and thickness of the ink receptive material layer 220a and the ink repellent material layer 220b. Those skilled in the art can make appropriate changes and changes according to the actual needs of the product.
此外,為了使修補結構220仍然具備遮蔽光線的功能,本實施例可以採用能夠遮蔽光線的材料來製作親墨材料層220a以及疏墨材料層220b。當然,本實施例亦可以採用能夠遮蔽光線的材料來製作親墨材料層220a與疏墨材料層220b其中一者。換言之,親墨材料層220a與疏墨材料層220b只要有其中一者能夠遮蔽光線即可,如此,親墨材料層220a與疏墨材料層220b在材料的選擇上將更為多元。In addition, in order to make the repair structure 220 still have the function of shielding light, the present embodiment can use the material capable of shielding light to form the ink-repellent material layer 220a and the ink-repellent material layer 220b. Of course, in this embodiment, one of the ink receptive material layer 220a and the ink repellent material layer 220b may be formed by using a material capable of shielding light. In other words, as long as one of the ink receptive material layer 220a and the ink repellent material layer 220b can shield the light, the ink receptive material layer 220a and the ink repellent material layer 220b will be more diverse in material selection.
接著請參照圖3D與圖4D,在形成修補結構220之後,接著於各個開口212中形成不同顏色的彩色顏料。由於修補結構220中的親墨材料層220a具有親墨特性,而疏墨材料層220b具有疏墨特性,因此彩色顏料會與未被疏墨材料層220b覆蓋之親墨材料層220a接觸,但彩色顏料幾乎不與疏墨材料層220b接觸。此時,彩色顏料可以有效覆蓋在鄰近於修補結構220處(圖3D中的位置X處)而不會有填入不完全的現象發生,故在位置X處不易發生漏光的現象。在開口212中填入彩色顏料之後,可透過熱烘烤製程或是其他固化製程使彩色顏料固化為彩色濾光薄膜230,以完成彩色濾光片基板CF的製作。承上述,前述之彩色濾光薄膜230的形成方法包括噴墨印刷。3D and 4D, after the repair structure 220 is formed, color pigments of different colors are formed in the respective openings 212. Since the ink receptive material layer 220a in the repair structure 220 has an ink receptive property, and the ink repellent material layer 220b has an ink repellent property, the color pigment will be in contact with the ink receptive material layer 220a not covered by the ink repellent material layer 220b, but the color The pigment hardly comes into contact with the ink repellent material layer 220b. At this time, the color pigment can be effectively covered adjacent to the repair structure 220 (at the position X in FIG. 3D) without occurrence of incomplete filling, so that light leakage is less likely to occur at the position X. After the color pigment is filled in the opening 212, the color pigment can be cured into the color filter film 230 through a thermal baking process or other curing process to complete the color filter substrate CF. In view of the above, the aforementioned method of forming the color filter film 230 includes inkjet printing.
以下將搭配圖3D與圖4D針對本實施例之彩色濾光片基板CF的結構進行描述。The structure of the color filter substrate CF of the present embodiment will be described below with reference to FIGS. 3D and 4D.
請參照圖3D與圖4D,本實施例之彩色濾光片基板CF包括一基板200、一黑矩陣層210、多個彩色濾光薄膜230以及至少一修補結構220。黑矩陣層210配置於基板200上,黑矩陣層210具有多個開口212,且黑矩陣層210具有至少一位於相鄰開口212之間的缺陷區D。彩色濾光薄膜230配置於開口212內。詳言之,黑矩陣層210的開口212會將基板200的部分區域暴露,而彩色濾光薄膜230係配置於開口212所暴露出之基板210上。Referring to FIG. 3D and FIG. 4D , the color filter substrate CF of the embodiment includes a substrate 200 , a black matrix layer 210 , a plurality of color filter films 230 , and at least one repair structure 220 . The black matrix layer 210 is disposed on the substrate 200, the black matrix layer 210 has a plurality of openings 212, and the black matrix layer 210 has at least one defect region D between adjacent openings 212. The color filter film 230 is disposed in the opening 212. In detail, the opening 212 of the black matrix layer 210 exposes a portion of the substrate 200, and the color filter film 230 is disposed on the substrate 210 exposed by the opening 212.
而修補結構220則配置於缺陷區D上。前述之修補結構220包括一親墨材料層220a以及一疏墨材料層220b,其中親墨材料層220a配置於基板200上,且親墨材料層220a與相鄰之彩色濾光薄膜230接觸。此外,疏墨材料層220b堆疊於親墨材料層220a上。The repair structure 220 is disposed on the defect area D. The repair structure 220 includes an ink-receptive material layer 220a and an ink-repellent material layer 220b. The ink-repellent material layer 220a is disposed on the substrate 200, and the ink-repellent material layer 220a is in contact with the adjacent color filter film 230. Further, the ink repellent material layer 220b is stacked on the ink receptive material layer 220a.
基於上述,由於本發明同時採用親墨材料層以及堆疊於親墨材料層上之疏墨材料層對缺陷區的進行修補,因此本發明能夠使彩色濾光薄膜與親墨材料層接觸,以避免因彩色濾光薄膜填入不完全所導致的漏光現象。Based on the above, since the present invention simultaneously repairs the defect region by using the layer of the ink receptive material and the layer of the ink repellent material stacked on the layer of the ink receptive material, the present invention can bring the color filter film into contact with the layer of the ink receptive material to avoid Light leakage caused by incomplete color filter film filling.
100、200...基板100, 200. . . Substrate
110、210...黑矩陣層110, 210. . . Black matrix layer
112、212...開口112, 212. . . Opening
120...修補遮光層120. . . Repair the shading layer
130、230...彩色濾光薄膜130, 230. . . Color filter film
210a、222...疏墨顆粒210a, 222. . . Smoky particles
220...修補結構220. . . Repair structure
220a...親墨材料層220a. . . Ink material layer
220b...疏墨材料層220b. . . Thin ink layer
D...缺陷區D. . . Defect zone
CF...彩色濾光片基板CF. . . Color filter substrate
X...位置X. . . position
圖1A至圖1C為習知彩色濾光片基板的製造流程示意圖。1A to 1C are schematic views showing a manufacturing process of a conventional color filter substrate.
圖2為習知彩色濾光片基板的上視示意圖。2 is a top plan view of a conventional color filter substrate.
圖3A至圖3D以及圖4A至圖4D為本發明一實施例之彩色濾光片基板的製造流程示意圖。3A to 3D and 4A to 4D are schematic views showing a manufacturing process of a color filter substrate according to an embodiment of the present invention.
200...基板200. . . Substrate
210...黑矩陣層210. . . Black matrix layer
210a...疏墨顆粒210a. . . Smoky particles
212...開口212. . . Opening
220...修補結構220. . . Repair structure
220a...親墨材料層220a. . . Ink material layer
220b...疏墨材料層220b. . . Thin ink layer
230...彩色濾光薄膜230. . . Color filter film
D...缺陷區D. . . Defect zone
CF...彩色濾光片基板CF. . . Color filter substrate
X...位置X. . . position
Claims (10)
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050253915A1 (en) * | 2004-05-14 | 2005-11-17 | Ryoichi Matsumoto | Droplet-discharging apparatus, electrooptic device, electronic apparatus, and method for electrooptic device |
| US20080074573A1 (en) * | 2006-09-21 | 2008-03-27 | Yoshikazu Yoshimoto | Liquid Crystal Display panel Manufacturing Method and Liquid Crystal Display Panel |
| TW200820315A (en) * | 2006-10-25 | 2008-05-01 | Ind Tech Res Inst | Methods for repairing patterned structure of electronic devices |
| US20090147188A1 (en) * | 2007-12-10 | 2009-06-11 | Yang Byung-Duk | Display and method of manufacturing the same |
| TW200933211A (en) * | 2007-09-27 | 2009-08-01 | Sharp Kk | Color filter manufacturing method and color filter manufacturing system |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050253915A1 (en) * | 2004-05-14 | 2005-11-17 | Ryoichi Matsumoto | Droplet-discharging apparatus, electrooptic device, electronic apparatus, and method for electrooptic device |
| US20080074573A1 (en) * | 2006-09-21 | 2008-03-27 | Yoshikazu Yoshimoto | Liquid Crystal Display panel Manufacturing Method and Liquid Crystal Display Panel |
| TW200820315A (en) * | 2006-10-25 | 2008-05-01 | Ind Tech Res Inst | Methods for repairing patterned structure of electronic devices |
| TW200933211A (en) * | 2007-09-27 | 2009-08-01 | Sharp Kk | Color filter manufacturing method and color filter manufacturing system |
| US20090147188A1 (en) * | 2007-12-10 | 2009-06-11 | Yang Byung-Duk | Display and method of manufacturing the same |
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