TWI378272B - Photo-sensitivity resin composition for overcoating layerof color filter - Google Patents

Description

[Technical Field] The present invention relates to a photosensitive resin composition, and particularly to a photosensitive resin composition for a protective film of a color filter. [Prior Art] The color filter of the conventional liquid crystal display panel is formed by first forming a plurality of black matrixes on a glass substrate, and then sequentially forming red (red) between adjacent black matrices. , r), green (green), monitor (blue, B) color layer, as a pixei (pixei), and when the light passes through the halogen, it will show color. Further, after the color filter is completed, a transparent electrode film is formed to cover the black matrix and the color layer. Generally, an overcoating layer is formed between the color filter and the transparent electrode to make the surface of the color filter flatter, which contributes to the manufacture of the transparent electrode, and also protects the color filter. Not affected by subsequent processes. In general, the above protective film must have high transmittance, two degrees of adhesion (ci〇Se adhesivity), high and thermal resistance 'high, acid resistance and high alkali resistance. Characteristics such as base resistance can be applied to this field. In some documents, for example, the patents of US Pat. No. 6,582,862, US Pat. In the above documents, the protective film of the color filter is disclosed as a negative resist composition, which includes an alkali dissolvable resin binder and a photopolymerizable compound. (photopolymerization compound), photoinitiator 1728272 100-9-27 (photopolymerization initiator) and solvent. However, the properties of the compositions proposed in these documents, such as durability, acid resistance, heat discoloration resistance, and light transmittance, are all poor. Therefore, the development of the composition of the protective film for a color filter and the improvement of its characteristics have become one of the important topics in the development of the industry. SUMMARY OF THE INVENTION An object of the present invention is to provide a photosensitive resin composition for a protective film of a color filter, which can avoid the occurrence of conventional problems, and which has high light transmittance and the like. The present invention provides a photosensitive resin composition for a protective film of a color filter, which comprises: (A) a photoreactive type soluble resin binder, (8) a photo-I-type compound containing an ethylenically unsaturated group, (c) a photoinitiator, (D) an organic acid anhydride, a compound having at least two epoxy groups in (E) a molecule, and (F) an organic solvent. Wherein (A) a photoreactive alkali-soluble resin binder comprising (a-fluorene) an ethylenically unsaturated monomer having an acid group, (a_2) an ethylenically unsaturated monomer copolymerizable with (a-fluorene) At least one of the bodies is a vinyl-unsaturated monomer having a soft side, the soft chain of the towel is a C6-C12 cyclic alkyl group, and (a-3) an epoxy group-containing ethylenic group. Saturated monomer. The photosensitive resin composition of the present invention is suitable for a far-protecting film of a color filter, which can have higher light transmittance, adhesion, surface flatness, and has better heat resistance and acid resistance. Alkaline and heat resistant discoloration with component performance. The above and other objects, features, and advantages of the present invention will become more apparent from the description of the appended claims. [Embodiment] The present invention provides a photosensitive resin composition for a protective film of a color filter, which has not only higher light transmittance, adhesion, surface flatness, but also better heat resistance and acidity. Testability and heat resistance.

The photosensitive resin composition for a protective film of a color filter of the present invention, comprising: (A) a photoreactive alkali-soluble resin binder, (B) a photopolymerizable ethylenically unsaturated group-containing compound, (c) a photoinitiator, (D) an organic acid anhydride, a compound having at least two epoxy groups in (E) a molecule, and (F) an organic solvent. The (B) photopolymerizable ethylenically unsaturated group-containing compound of the resin composition of the present invention is an ethylenically unsaturated compound having at least one ethylenically unsaturated group. (B) Photopolymerizable ethylenically unsaturated group-containing compound, for example, ethylene glycol monomethyl methacrylate (ethylene glycol)

Di(meth)acrylate), polyethylene giyc〇i di(meth)acrylate with 2-14 ethylene oxide groups, trimethylolpropane dimercapto acrylate Trimethylol propane di (meth)acrylate, trimethylol propane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, isoprene Pentaerythritol tetra(meth)acrylate, propyleneglycol di(meth)acrylate with 2-14 propylene oxide groups, dipentaerythritol Dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, DPHA, three-mercapto-based Trimethylolpropanetriglycidylether acrylic acid additive (bisphenol A diglycidylether acrylic acid additive), phthalate Acidic diesters of phthalate diesters of hydroxyethyl (meth) acrylate, toluene dihydrogenate additive (meth)acrylic acid - / 9 - (toluene diisocyanate desirable of β-hydroxyethyl (meth)acrylate), and a polymeric compound having an ethylenically unsaturated bond, wherein the ethylenically unsaturated bond is selected from the group consisting of Ditrimethylol propanetetraacrylate, tris(2-acryloxyethyl)isocyanurate, ethoxylated pentaerylthritoltetraacrylate (EO 4 mol), pentaerythritoltetraacrylate (EO 35 mol), ethoxylated trimethylolpropanetriacrylate (EO 9 mol), ethoxylate-containing Trimethylolpropane triacrylate (EO 3 mol), propxylated pentaerythritoltetraacrylate (PO 4 mol) Nonaethylene glycol diacrylate, dipentaerythritol hexaacrylate-modified caprolactone, trimethylolpropane propoxy triacrylate 1372872 100-9 modified with caprolactone Group of -27 (trimethylolpropanepropoxylate triacrylate). The above photopolymerizable ethylenically unsaturated group-containing compound may be used singly or in combination of several kinds. Further, the content of the (B) photopolymerizable ethylenically unsaturated group-containing compound is from 1 to 250 parts by weight based on 100 parts by weight of the (A) photoreactive alkali-soluble resin binder.

(C) The photoinitiator is, for example, a phosphine oxide (ph〇Sphine oxide) compound, a carbonyl compound, an amine carbonyl (amin〇carb〇nyl) compound, a triazine compound, or a ruthenium ( An oxime) compound, an amine compound, and an alkoxyantharcene compound. One of the groups of combinations of thioxanthone compounds. Wherein, the phosphine oxide compound is, for example, an arylphosphine oxide, an acylphosphine oxide, a bisacylphosphine oxide, a 2,4,6-trimercaptobenzylidene group- 2,4,6-trimethylbenzoykliphenylphosphine oxide (TPO), 2,6-di

Ethyl phenyl fluorenyl diphenyl phosphine oxide; 2,6-(^&>^^1120}4(^11611>^1103卩11丨116(^(16), 2,6-two 2,6-dimethoxybenzoyldiphenylphosphine oxide, 2,6-dichlorobenzoyldiphenylphosphine oxide, 2,3, 5,6-tetramethylbenzoyldiphenylphosphine oxide, benzoyldi(2,6-diphenylphenyl)phosphonic acid (benzo, benzoyldi(2,5,6-diphenylphenyl)) 6-dimethylphenyl)phosplionate), 2,4,6-tridecylpyridylmethylphenylphosphonic acid ethyl ester 9 1378272 100-9-27

(2,4,6-trimethylbenzoylethoxyphenylphosphiiie oxide), bis(2,4,6-trimercaptophenyl)phenylphosphine oxide) (1^(2,4,6- to 1116111)^61^〇} 4) 卩11611>^)11〇3卩1111^(1-819)), bis(2,6·oxabenzoyl)-2,4,4-tridecylphenylphosphine oxide (bis( 2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide)). A series of compounds such as a carbonyl group compound, an aminocarbonyl compound, a triazine compound, and an oxime compound are, for example, acetophenone or benzophenone. Biphenylketone, 1-hydroxy-1-benzoylcyclohexane (I-184), benzylacetone 2.2-dimethoxy-1,2- Benzyldimethylketal 2.2- dimethoxy-l, 2-diphenylethane-l-one (1-651), 1-benzyl-1-dimethyl-tert-amine-1-(4·? - 1-benzyl-1 -dimethylamino-1 -(4-morpholino-benzoyl)propane (1-369)), 2-oxalin-2-(4-indolethio)benzoquinone 2-morpholyl-2-(4-methylmercapto)benzoylpropane (1-907), ethylantraquinone, 4-benzoyl-4-methyldiphenylsulfide, benzene Benzyl benzoinbutylether '2-hydroxy-2-benzoylpropane, 2-hydroxy-2-(small isopropyl) benzamidine-propanil (2-hydroxy-2-benzoylpropane) 2-hydroxy-2-(4-isopropyl)benzoylpropane), 4-butyl benzoic acid trisulfide (4-1) 1117 out 6112〇丫113^111〇1'〇11^1:1^1^), 4-phenoxybenzoyldichloromethane, benzoylmethylformate ), 1,7-double (9-11 丫) Gengyuan 8 10 1378272 100-9-27 (l,7-bis(9-acridinyl)heptane), 9-n-butyl-3,6- Double (2-moly-isobutyloyl)

(9-n-butyl-3,6-bis(2-morpholino-isobutyloyl)carbazole), 10-butyl-2-chloroacrydone (10-butyl-2-cliloroacrydone), 2-[2-(4, oxime) -Phenyl)-vinyl]-4,6-bis-trichloroindolyl-[1,3,5]triazine (2-[2-(4-methoxy-phenyl)-vinyl]-4,6 -bis-trichloromethyl-[l,355]tr iazine), 2-(4-decyloxy-naphthalene)-4,6-bis-trichloroindolyl-[1,3,5]triazine (2 -(4-methoxy-naphthalen-1 -yl)-4,6-bis-trichloromethyl-[ 1,3,5]tri azine), 2-indolyl [1,3]dioxol-5- 4-,6-bis-trichloroindolyl-[1,3,5]triazine (2-benzo[l,3]di〇x〇l-5-yl-4,6-bis-trichloromethyl-[ l,3,5]triazine), 2-mercapto-4,6-bis(triseoyl)_s_trimethylmethyl-s-triazine, 2 -Phenyl-4,6-bis(trichloroindenyl)-s-trimethyl-(2-phenyl-4,6-bis(trichloromethyl)-s-triazine), 2-naphthyl--4,6- 2-naphthyl-4,6-bis(trichloromethyl)-s-triazine, 1-[9-ethyl-6-(2-

Nonylphenyl hydrazino)-9_H-carbazol-3-yl]-bicycloheptyl oxime 肟_肟_〇_acetic acid hydrazine, 1-[9-ethyl-6-(2-mercaptobenzene) Brewing base)-9.Η-〇^·π圭_3_基]_bicycloheptyl·ι_ ketone oxime-0-acetate, 1-[9-ethyl-6-(2-fluorenyl) Phenylhydrazinyl]·Adamantyl ketone-1-ketoquinone benzoate, 1-[9-ethyl_6-(2-mercaptobenzamide|yl)-9·Η-° card嗤-3-yl]-Astragalus brothel-1 ketone fat 〇 acetic acid § 叩, 叩 · ethyl-6-(2-mercaptobenzylidene)-9.H-carbazole-3- 4-tetrahydrofuranyl methane-I ketone oxime-0-benzoate, 1-[9-ethyl-6-(2-methylbenzhydryl)_9 H-carbazole·3•yl]_tetrahydrofuran Ketone ketone oxime-indole-acetate, 1_[9-ethyl_6_(2-methyl stupid 11 1378272 100-9-27 base)-9.H-carbazol-3-yl] -Sepenomethane-1-one oxime-indole-benzoate, 1-[9-ethyl-6-(2-methylphenylhydrazin-3-yl]-sepenomethane Ketone 〇·〇·acetic acid hydrazine, 1-[9-ethyl-6-(2-indole basic broth)-9.H-啼°-3-yl]-code phenyl decane-1- Ketone-indole-benzoate, H9-ethyl-6-(2-mercaptophenyl)-9.H-carbazol-3-yl]-code quinone-1-S肟-〇-acetate 1-[9-ethyl-6-(2-mercaptobenzoyl)-9.H-carbazol-3-yl]-ethane-1-one oxime-0-bicyclobutyrate, ι·[9·ethyl-6-(2-mercaptophenyl)-9.Η-carbazol-3-yl]-ethene-1-e with jiang·〇_tricyclic oxime S, 1-[9-ethyl-6-(2-mercaptobenzofuranyl)-9.Η-σ卡α坐-3-yl]-ethidin-1-one oxime-indole-adamantane Acid ester, 1,2-dioxadione-1-[4-(phenylthio)phenyl]-2·(0-phenylhydrazinium), 1,2-butanedione-1-[4- (phenylthio) phenyl]-2-(0-phenylhydrazinyl), 1,2-butadione-1-[4-(phenylthio)phenyl]-2-(0-ethyl Base fat), l,2-octanedifluoren-1-[4-(indolyl)phenyl]-2-(0-benzoquinone) and 1,2-octanedione-1-[4 -(phenylthio)phenyl].2-(indolyl-mercaptobenzylhydrazine). Amine compounds are, for example, triethanolamine, methyldiethanolamine, triisopropylamine. , 4-dimethylaminomethyl benzoate, 4-dimethylaminoethyl benzoate, 4-dif-amino group 4-methylaminoisoamyl benzoate, 2-A 2-methylaminoethyl benzoate, 4-dimethylamino-2-ethylhexyl benzoate, N,N-曱P-toluidine (]^,]^-11^]1>^^ melon 1〇111 pass 116), 4,4'-bis(dimethylamino)benzophenone (4,4'-bis (dimethylamino)benzophenone), 4,4'-bis(diethylamino)benzophenone, 4,4'-bis(ethyldecylamino) Benzophenone 12 1378272 100-9-27 (4,4'-bis(ethylmethylamino)benzophenone). The oxyalkylene compound is, for example, 9,1 〇-dimethoxy oxime (9,1 〇-出11^11〇 丫311 〇3〇 Qiu 0,9,1〇_diethoxy oxime ( 9,10-(^1;11〇乂7&1^11^〇6116), 2-ethyl 9,10-dimethoxyanthracene, 2-ethyl 9,10-diethoxyanthracene. The 0-tonate compound is, for example, 2-isopropylthioxanthone, 4-isopropyl hydrazine. Mocking

(4-isopropylthioxanthone (ΓΡΤΧ)), 2,4-diethylthioxanthone (DETX), 2,4-trichlorothioxanthone, 1 - Qi-4-propyl 嗟〇 town! ^ (1 -chloro-4-propoxythioxanthone). The above photoinitiators can be used singly or in combination of several kinds. Further, the content of the (C) photoinitiator is 0.1 to 1 part by weight based on 100 parts by weight of the (A) photoreactive type soluble resin binder. (D) Organic traits, such as maleic anhydride ('s anhydride''), itaconic anhydride, tetrahydrophthalic anhydride, citraconic acid (citraconic)

Anhydride) or mesaconic acid if (mesaconic anhydride). The above organic acid anhydrides may be used singly or in combination of several kinds. Further, the content of the (D) organic acid anhydride is 〇j to 100 parts by weight based on 100 parts by weight of the (A) photoreactive type testable soluble resin binder. (E) A compound having at least two epoxy groups in the molecule 'for example, a bisphenol A type epoxy compound, a bisphenol S type epoxy compound, 芴-9-double Fluorene-9-bisphenol diglycidyl Ether (FBDE), bisphenol A type epoxy resin (eg: oiled Shell Epoxy public 13 1378272 100-9-27

Epoxy resin obtained by the reaction of alcoholic hydroxyl and epichlorohydrin with the trade name of Epikote 828, 10 (H, 1002, 1004, etc.) (For example: manufactured by Nippon Kayaku Co., Ltd., trade name is NER-1302, epoxy equivalent 323, softening point 76. Bismuth, bisphenol F type epoxy resin (for example: oiled Shell Epoxy company's' The trade name is Epikote 807, 4001, 4002, 4004, etc.), an epoxy resin obtained by reacting an alcoholic hydroxyl group with an epichlorohydrin (for example: 曰本化) Made by the pharmaceutical company, the trade name is NER-74〇6, epoxy equivalent 35〇, softening point 66. Biphenyl glycidyl ether (for example: oiled Shell Epoxy company, the trade name is Epikote YX4000 And a phenol novolac type epoxy resin (for example, manufactured by Nippon Kayaku Co., Ltd., trade name: ΕΡΡΝ·2〇1, manufactured by Oiled Shell Epoxy Co., Ltd., trade name: Epikotel 52, 154, 157S65, 157S70, The Dow Chemical Company , the trade name is DEN_438), A (benzene) aldehyde type epoxy resin (·〇1〇 〇1 this epoxy resin, for example: 曰本化制药公司, the trade name is E〇CN_1〇2S, 1020, 104S) , triglycidyl isocyanurate (for example, manufactured by 曰 化学 化工 化工), and trisphenol methane type epoxy resin (for example: 曰本化药The company's business name is EPPN-501, -502, -503, fluorene type epoxy resin (for example: Nippon Steel Chemical Co., Ltd.'s trade name is ESF 3〇〇), and alicyclic epoxy resin (for example: Daicel Chemical Industry Co., Ltd., σ 么 盔 C Cell 〇 X1de2 〇 21P, ΕΗΡΕ), and epoxidized polybutadiene resin (q): idized polybutadiene ' For example: Daicel Chemical Industry Co., Ltd., the trade name is Ep〇lead 1378272 100-9-27 PB3600), etc. and 'based on (A) photoreactive alkali-soluble resin binder is 100 parts by weight of the compound having at least two epoxy groups in the (E) molecule is 0.1 to 100 parts by weight Share.

(F) organic solvent 'for example, benzene, toluene, xylene, methanol, ethanol, ethylene glycol monopropyl ether, diethylene glycol Diethylene glycol dimethyl ether, diethylene glycol methyl ether, methoxy propionate methyl methoxypropionate, ethyl ethoxy propionate such as 11) 4 61; (double >^0^〇1^6 (ugly ugly?)), ethyl lactate ^11} 413 (^16), tetrahydrofliran (THF), ethanol monomethyl bond (ethylene glycol monomethyl Ether), ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether , diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate (PGMEA), diglycol ether ethyl acetate (g propylene) Glycol ethyl ether acetate), C Propylene glycol propyl ether acetate, methyl isobutyl ketone, methyl ether ketone, acetone, cyclohexanone, dimercapto Amine (dimethylformamide (DMF)), N,N-dimethylacetamide (DMAc), N•methyl-2-pyrrolidone (NMP) , γ-butyrolactone (γ-butyrolactone). The above organic solvents may be used singly or in combination of several kinds. Further, the photoreactive alkali-soluble resin binder based on (A) 15 1378272 100-9-27 is 100 parts by weight of the '(F) organic solvent in an amount of from 1 to 250 parts by weight. Further, the (A) photoreactive alkali-soluble resin binder further includes: (a-. an ethylenically unsaturated monomer having an acid group, (a-2) an ethylenically unsaturated monomer copolymerizable with (a_1) And (a-3) an epoxy group-containing ethylenically unsaturated monomer. (A) The photoreactive alkali-soluble resin binder has a weight average molecular weight of 2,000 to 500, and its acid value is 1 〇. 4〇〇111§1(:〇1^. where '(a-Ι) acid-containing ethylenically unsaturated monomer, such as (meth)acrylic acid, crotonic acid, α-gas (A) An unsaturated monobasic acid such as acrylic acid, (ethyl) acrylic acid or cinnamic acid; maleic acid, maleic anhydride, fumaric acid, and itaconic acid ( Itaconic acid), itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid, mesaconic anhydride, etc. An anhydride); a trivalent or higher unsaturated polyvalent acid, etc. These acid-containing ethylenically unsaturated monomers may be used. Used alone or in combination. The content of the (a-1) acid group-containing ethylenically unsaturated monomer is 100 parts by weight based on the sum of (a-1), (a-2) and (a-3). 10 to 90 parts by weight. In the photosensitive resin composition of the present invention, (a-2) an ethylenically unsaturated monomer copolymerizable with (a-fluorene) may be an ethylenically unsaturated group having a soft chain attached thereto. The monomer, wherein the soft chain is a cyclic alkyl group of C6 to C12. Therefore, a photosensitive resin composition having a transmittance of 97% or more can be obtained, and it can be more suitably used in a process to further improve the device performance. 0-2) an ethylenically saturated monomer copolymerizable with (a-fluorene), for example, allyl methacrylate (allyl 8 16 1378272 100-9-27)

(meth)acrylate) and other allyl groups of ethylene-based compounds; ethylene glycol di(meth)acrylate, dicyclopentanyl dimethacrylate (dicyclopentenyl) Di(meth)acrylate), propylene glycol di(meth)acrylate, 2,2-dimethyl-1,3-propanediol dimercapto acrylate (2,2-dimethyl-) l,3-propylene glycol di(meth)acrylate) 'triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate ), a vinyl compound containing two acrylic groups, such as tri(2-hydroxyetibyl)isocyanate di(meth)acrylate; (mercapto)acrylonitrile (( Meth)acrylonitrile), nitrile vinyl compound such as a-chloro(meth)acrylonitrile; aromatic vinyl such as styrene, mercaptostyrene or nonyloxystyrene a compound; a vinyl compound such as a cyclic alkyl (indenyl) acrylic acid of C6-C12. Preferred is 'dicyclopentanylmethacrylate', dimethicone: fcip (styrene), isos-〇ctylacrylate, acrylonitrile (fluorenyl) Allylmethacrylate), methacrylonitrile, 2,2-dimethyl-l, 3-propylene glycoldiacrylate. These ethylenically unsaturated monomers copolymerized with (a-1) may be used singly or in combination of several kinds. Based on the sum of (a-1), (a-2) and (a-3) being 1 part by weight, (a_2) the content of the ethylenically unsaturated monomer copolymerizable with (a-Ι) is 1 〇~9〇 parts by weight. According to the above, the photosensitive resin composition of the present invention can be selectively added with styrene to further improve the heat resistance and chemical resistance of the resin composition. 17 1378272 100-9-27 (a-3) Epoxy-containing ethylenically unsaturated monomers, for example, (glycidyl (meth)acrylate), (ethyl) acrylate dilute Glycidyl (ethyl)acrylate, 3,4-epoxybutyl (meth)acrylate, 6,7-(meth)acrylic acid heptyl ester (6,7 -epoxyheptyl (meth)acrylate), 6,7-epoxyheptyl (ethyl)acrylate, o-vinylbenzylglycidylether, intervinyl M-vinylbenzylglycidylether, p-vinylbenzylglycidylether. These epoxy group-containing ethylenically unsaturated monomers may be used singly or in combination of several types. And the sum of (a-2) and (a-3) is 100 parts by weight, and the content of the (a-3) epoxy group-containing ethylenically unsaturated monomer is 10 to 90 parts by weight. In the photosensitive resin composition of the present invention, a adhesion agent may be further added to improve the adhesion of the photosensitive resin composition. The composition of the sex tree is 1 part by weight, and the amount of the adhesion aid may be, for example, 0.01 to 30 parts by weight, preferably 0.5 to 3 parts by weight. The adhesion aid is, for example, an epoxy group or an amino group. Shishi compound, which is, for example, p-(3,4-epoxycyclohexane)ethyltrimethoxydecane 卬_(3,4-6卩〇乂乂〇>^1〇116\71 buckle 1: 11}411111^11〇\}^仙116), /3-(3,4-epoxycyclohexane)ethyl-triethoxysilane (P-(3,4-epoxycyclohexyl)ethyl triethoxy silane), Y-giycid〇xypropyl trimethoxysilane (GMS), γ-glycidoxypropyl methyldimethoxysilane, γ-glycidoxypropyl methyldimethoxysilane Γ-glycidoxypropyl methyldiethoxysilane, γ-epoxypropyl 8 18 1378272 100-9-27

Gamma-glycidoxypropyl dimethoxy (ethoxy) silane, γ-glycidoxypropyl dimethyl (methoxy) silane, γ-propylene oxide Γ-glycidoxypropyl dimethyl(ethoxy)silane, 3,4-epoxybutyltrimethoxyxanthene (3,4-6卩〇\丫1)11汐1出1116111〇 \>^13116), 3,4-epoxybutyltriethoxy zebra (3,4-6卩0 forks outside 1^11116^10 father 丫8 blood 116),]^-(2-amine Ethyl>3-aminopropyldimethoxydimethylsilane (N-(2-aminoethyl)-3-aminopropyldimethoxymethylsilane) '(3-Aminopropyl)-trimethoxy-xyl-stone ((3-&11^110卩1*€^1)1;1*111161:110乂78丨131^), (3-aminopropyltriethoxysilane), (N,N- Diethyl-3-aminopropyl)trimethoxysilane, Ν-β(aminoethyl)γ·aminopropyltrimethoxysilane (Np (aminoethyl) Y-aminopropyl trimethoxysilane), the above-mentioned adhesion aids may be used singly or in combination of two or more kinds.

In another embodiment, the photosensitive resin composition of the present invention may further be added to a surfactant. The amount of the surfactant to be used is 0.01 to 30 parts by weight, preferably 〇 5 to 3 parts by weight, based on 1 part by weight of the photosensitive resin composition. The surfactant, for example, polyoxyethylene alkyl ethers (for example: polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether) Oleyl ether), etc., polyoxyethylene aryl ethers (eg polyoxyethylene octyl phenyl ether, nonylphenol ethoxylate 19 1378272 100-9-27 (polyoxyethylene) Nonyl phenyl ether), etc., polyethylene glycol dialkyl esters (eg, polyethylene glycol dilaurate, polyethylene glycol distearate (polyethylene glycol) Glycol distearate), organooxane polymer

(organosiloxane polymer) (for example, KP341 (manufactured by Shin-Etsu Chemical Industry Co., Ltd.), (meth)acrylic acid polymer, for example, Polyflow No. 75, 90, 95 (manufactured by Kyoei-ShaYushi Kagaku Kogyo Co" Ltd), Megafac F171, F172, F173, F475 (manufactured by Dainippon Chemicals ana Ink Co., Ltd.), Florard FC430, FC431 (manufactured by Sumitomo 3M Co., Ltd.) ), Asahi Gard G710, Serflon S382, SC-101, SC-102, SC-103, Sc-104, SC-105, SC-1068 (manufactured by Asahi Glass Co., Ltd.), etc.) The agent may be used singly or in combination of two or more. In other embodiments, the photosensitive resin composition of the present invention may further contain other additives such as a deformer and a leveling agent. (leveling agent), thermal polymerization inhibitor agent, and the like.

Hereinafter, a method for producing the photosensitive resin composition of the present invention and (A) a photoreactive alkali-soluble resin binder will be described. ~ [(A) Method for preparing photoreactive alkali-soluble resin binder] (A) Photoreactive alkali-soluble resin binder is, for example, (^) an ethylenically unsaturated monomer having an acid group and (a_2) Ethylene which may be copolymerized with (a-1), and a monomer, at least one of which is copolymerized with an ethylenically unsaturated monomer having a soft chain attached thereto, and then subjected to an esterification reaction to (a- 3) An epoxy group-containing ethylenically unsaturated monomer is grafted to form. Earth 8 20 1378272 100-9-27

In the case of producing the (A) photoreactive alkali-soluble resin binder, the solvent used may be, for example, the same or different solvent as the (F) organic solvent, which is, for example, benzene, toluene, or Xylene, methanol, ethanol, ethylene glycol monopropyl ether, diethylene glycol dimethyl ether, diethylene glycol Methyl ether), methyl methoxypropionate), ethyl ethoxypropionate (EEP), ethyllactate, tetrahydrofuran (THF), ethanol monohydrazone ( Ethylene glycol monomethyl ether), ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethanol monohydrate _ Diethylene glycol monomethyl ether), dietliylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol oxime acetate vinegar Eglycol methyl ether acetate (PGMEA), propylene glycol ethyl ether acetate, propylene glycol propyl etiier acetate, methyl isobutyl ketone, hydrazine Ketone (methyl ether ketone), acetone (acetone), cyclohexanone, dimethylformamide (DMF), N,N-dimethylacetamide (Ν, Ν-dimethylacetamide (DMAc) , N_methylpyridyl ketone (N-methyl-2-pyirolidone (ΝΜΡ)), γ-butylolactone, etc., these solvents may be used singly or in combination. Further, in the production of the (A) photoreactive type alkali-soluble resin binder, the initiator used may, for example, be a general polymerization initiator, which is, for example, 21 1378272 100-9-27 azobisisobutyronitrile ( AIBN), 2,2'-azobis-(2,4-dimethylvaleronitrile), 2,2'-azobis(4-indolyl dimethylvaleronitrile) (2,2' -azobis-(4-methoxy-2,4-dimethylvaleronitrile), azo compounds such as 2,2'-azobis-2-methyl butyronitrile, and benzoylperoxide ) and other peroxides. The photosensitive resin composition of the present invention is prepared by uniformly mixing the above compounds (A) to (F) into a mixed solution in a stirrer or a mixer. Then, the composition solution is prepared by, for example, filtering the mixed solution with a pore filter of a pore size Ο.ίμιη or other filter. Of course, adhesion aids, surfactants, defoamers, leveling agents, thermal polymerization inhibitors or other additives may be added as needed. The photosensitive resin composition of the present invention has a viscosity measured at 25 C of between 1 and 2 〇 0 cps. The photosensitive resin composition of the present invention is suitable for a color filter of a color filter, which can have higher light transmittance, adhesion, surface flatness, and has better heat resistance and acid resistance. Alkaline and heat-resistant discoloration, with component performance. Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the invention, and those skilled in the art can make some modifications and refinements without departing from the spirit and scope of the invention. In the case of the attached towel, please refer to the patent definition.保叹 [Simple diagram description] None [Main component symbol description] 22

Claims (1)

1378272 Announcement X. Patent application scope: 1. A photosensitive resin composition for a protective film for a shirt color filter, comprising: (A) a photoreactive alkali-soluble resin binder comprising: (a-Ι) an acid group-containing ethylene An unsaturated monomer wherein the (a-fluorene) acid group-containing ethylenically unsaturated monomer does not include a monomer having an anhydride group; (a-2) an ethylenically unsaturated copolymerizable with (a-) Monomer, of which At least one is an ethylenically unsaturated monomer having a soft chain attached thereto, wherein the soft chain is a C6-C12 cyclic alkyl group; and (a-3) an epoxy group-containing ethylenically unsaturated monomer, wherein Al), (4), (4) are compounds that have been fused to each other in the (A) photoreactive disk test for soluble resin binder; (B) compounds of photopolymerization county ethylidene unsaturation; Starting agent; (D) organic acid anhydride; (E) a compound having at least two epoxy groups in the molecule; and (F) an organic solvent. 2. As for the photosensitive tree 1 composition of the protective film of the color flight # described in her article, the total weight of the (a_D, (4) and (a-3) is 100 weight damage' (a- Ii) The ethylenic unsaturated group containing an acid group is 10 to 90 parts by weight. The photosensitive (four) composition of the protective film for a color aerial film according to the above, wherein, based on Μ, (4) and (4) _ and is a dry weight part' (4) The content of the ethylenically unsaturated monomer 23 1378272 101-5-21 which can be copolymerized with (4) is 10 to 90 parts by weight. V 4. The protective film for a color filter according to the invention of claim i Photosensitive tree-forming product, the towel, based on the sum of (a4), (a 2) and (a_3) is 100 parts by weight ', and (a_3) epoxy group-containing ethylenically unsaturated content is 10 to 90 parts by weight 5. A photosensitive resin composition for a protective film of a color ray-receiving sheet as described in the above-mentioned patents, wherein (4) the acid-containing ethylenically unsaturated monomer is selected from (meth)acrylic acid, Butenoic acid, ... gas (mercapto) acrylic acid, (ethyl) acrylic acid, and cinnamic acid, maleic acid, butyl dicarboxylic acid, itaconic acid, coconic acid, mesaconic acid, and One of the trivalent or higher unsaturated polyvalent acid groups. 6. A photosensitive resin composition for a protective film for a color light-receiving sheet according to the above-mentioned patent, wherein (a_3) contains an epoxy group. The ethylenically unsaturated monomer is selected from the group consisting of (meth)acrylic acid glycidol vinegar, (ethyl) acrylic acid glycidol vinegar, 3,4-(methyl) propyl acrylate butyl vinegar, (A) Acetyl epoxide vinegar, 6,7-(ethyl) acrylic acid epoxidized heptane vinegar, o-ethenyl phenyl glycidol _, m-vinyl phenyl glycidol and phenanthrenyl phenyl A photosensitive resin composition for a protective film for a color light-receiving sheet according to the first aspect of the invention, wherein (4) the weight of the photoreactive material-soluble resin binder A photosensitive resin composition for a protective film of a color filter having an average molecular weight of 2, 〇〇〇 〜 5 〇〇, 〇〇 (^ · 8 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The acid value of the soluble resin solvent is 10 to 400 rngKOH/g. 24 1378272 101-5-21 9. The color as described in the scope of the patent application Protective film for color light-emitting sheet, photosensitive resin composition' wherein (A) photoreactive alkali-soluble resin binder is prepared by (a-Ι) acid-containing ethylenically unsaturated monomer and A-2) An ethylenically unsaturated monomer copolymerizable with (ai) may be subjected to a copolymerization reaction, followed by esterification to form (a-3) an epoxy group-containing ethylenically unsaturated monomer. The photosensitive resin composition for protecting φ film of the color (four) light sheet according to claim 9 of the invention, wherein the method for producing the (A) photoreactive alkali-soluble resin binder further includes using a solvent. 11. The photosensitive resin composition for a protective film of a color filter according to claim 10, wherein the solvent used in the method for producing (A) photoreactive alkali-soluble resin-adhesive is F) The organic solvent is the same. 12. The photosensitive resin composition for a protective film of a color filter according to claim 9 of the invention, wherein in the method for producing a (A) photoreactive type soluble resin binder, the use of polymerization is further included Starting agent. 13. The photosensitive resin composition for protective film of a color filter according to the first aspect of the invention, wherein the (A) photoreactive alkali-soluble resin binder is 100 parts by weight, (B) light The content of the polymerizable ethylenically unsaturated group-containing compound is from 1 to 250 parts by weight. 14. The protective film for a color filter according to claim 1, wherein the (B) photopolymerizable ethylenically unsaturated group-containing compound is selected from the group consisting of at least one ethylenic group. One of the groups of unsaturated ethylenically unsaturated compounds. 15. Protection of the color filter as described in claim 1 of the patent scope 25 1378272 101-5-21 = photosensitive resin composition 'where' is based on (A) photoreactive type soluble resin binder 100 parts by weight (c) The content of the photoinitiator is 〇 by weight. The photosensitive resin composition for a protective film of a color filter according to the first aspect of the invention, wherein (c) the photoinitiator is selected from the group consisting of phosphine oxide-based σ, carbonyl compound, and amine carbonyl. One of a group of a compound, a triazine compound, a compound, an amine compound, an alkoxylate compound, and an anthraquinone compound. As in the application of the color filter described in the scope of the patent application, the photosensitive sensitization (10) inspection, the towel is based on (Α) photoreactive type testable resin binder 100 parts by weight, (D) organic acid liver The content is the weight fraction. • The photosensitive resin composition for the protective film of the color film (4) of the color film mentioned in Item 1 of the application, (D) The organic acid Xuan is selected from the group consisting of Shun Ding 1 New Zealand, Yi Kang _, Tetrahydrogen, Gu One of the groups of the sect of the sacred Kang. In the color _ film photosensitive _ composition described in the application of the paste 丨 其中, wherein, based on (A) photoreaction type test = 100 parts by weight of the resin binder, (E) contains at least 2 molecules The content of the compound is from 0.1 to 100 parts by weight. Soil 20. A photosensitive composition for color film film according to item i, wherein the (A) photoreaction type test capacity = resin chelating agent is 100 parts by weight, (F) organic solvent The content is in parts by weight. 1 26 1378272 101-5-21 21. The photosensitive resin composition for a protective film of the color filter according to claim 1, wherein the photosensitive resin composition is 25. The measured viscosity is between 1 and 200 cps. 22. The photosensitive resin composition for a protective film of a color filter according to the above-mentioned patent application, further comprising stupid ethylene. 23. The protection of the color glazing sheet as described in the scope of the application of the patent application 感光 The photosensitive resin composition further includes an adhesion aid. The photosensitive secret composition for a protective film for a color filter according to claim 21, wherein the (A) photoreaction type soluble resin binder is 100 parts by weight, and the adhesion is assisted. The content of the agent is 〇 to parts by weight. The photosensitive resin composition for a protective film of a color filter according to claim 1, further comprising a surfactant. 26. The photosensitive resin composition for a protective film of a color filter according to claim 25, wherein the (A) photoreaction type soluble resin binder is 1 part by weight, the surfactant The content is 〇~3〇 parts by weight. 27. The photosensitive resin composition for a protective film of a color filter according to claim 1, further comprising an additive. The photosensitive resin composition for a protective film of a color filter according to claim 27, wherein the additive comprises an antifoaming agent, a leveling agent or a thermal polymerization inhibitor. 29. The photosensitive resin composition for a protective film of a color filter according to claim 1, wherein the photosensitive resin composition has a light transmittance of 27 1378272 of 101-5-21 degrees or more. 28