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TWI373814B - Semiconductor device inspecting apparatus and semiconductor device inspecting method using the same - Google Patents

Semiconductor device inspecting apparatus and semiconductor device inspecting method using the same Download PDF

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Publication number
TWI373814B
TWI373814B TW97108287A TW97108287A TWI373814B TW I373814 B TWI373814 B TW I373814B TW 97108287 A TW97108287 A TW 97108287A TW 97108287 A TW97108287 A TW 97108287A TW I373814 B TWI373814 B TW I373814B
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semiconductor device
image
semiconductor
tray
detecting
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TW97108287A
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Chinese (zh)
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TW200847310A (en
Inventor
Seung-Gyu Ko
Ssang-Gun Lim
Sang-Yoon Lee
Kyung-Soo Song
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Intekplus Co Ltd
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    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Quality & Reliability (AREA)
  • Theoretical Computer Science (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Signal Processing (AREA)
  • Cleaning In General (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

1373814 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一整合地架設了清潔器以移除 該等f導體裝置的外表之粉塵或雜質之半導體裝置檢 備,藉此降低因為污染物而被判定為有缺陷的半導體= 的數目,並從而提升半導體裝置的一良率,以及 ^ 備之半導體裝置檢測方法。 【先前技術】 + ^^^^t^(semiconductor integrated circuit) 具有-半導體晶圓上的-晶片之形式,係透過—系 裝製程處理’成為適於保護晶片免於外部震動之半導體封 旦完^了該等封裝製程後,半導體封裝在被供應給 客戶刖,取後會接党一電氣功能測試(心计㈣ functionality test) ° 一已經通過了電氣功能測試的半導體封裳,會被移至標 記設備(marking equipment),以便於半導體封梦上p 種資訊(半導體晶片類型'製造商、交易名稱等) -般來說’即使是微小的外表缺陷和内部缺陷,都會 嚴重地影響此種半導體封裝的效能。所以,在上述電氣功 能測試外’必紐用影像照相觀仏⑽划㈣對半導體 封裝進行外表檢測。 至於上述有關-半導體封裝的外表缺陷,特別是球狀 陣列(Ball GridArrays,BGAs)與引線(leads)的缺陷,可 能會在將半導體褒置組裝至印刷電路板(㈣㈣⑽心 Board ’ PCB)的過程中發生。因此,對引線或球狀陣列以及 7 標記的檢測變得相當重要。 在韓國公開專利案編號2005-48584,由本發明的申請 人所提出之「半導體裝置檢測設備(Semiconductor device inspecting apparatus)」一案中揭示了用以檢測一半導體 封裝的外觀之傳統設備。· 所揭示的傳統半導體裝置檢測設備如第九圖所示,包 括:一主體100 ’ 一用以載入承載要被檢測的半導體裝置 的托盤之載入器(l〇acier)210, 一用以檢測半導體裝置之檢 測裝置(inspecting device)300 ; —緩衝器(buffer)220, 用以暫時地儲存一承載被檢測的半導體裝置之緩衝托盤; 載入承載了根據檢測結果被挑選為有缺陷的半導體裝置之 托盤之第一至第三廢品載體(rejeci; carrier)230、240、 及250,被承載於個別廢品載體的托盤之有缺陷的半導體 裝置會根據缺陷類型而被挑選;一卸載器 (un-loader)260,用以載入承載了根據檢測結果被挑選為 正常的半導體裝置之托盤;複數條托盤傳送帶48〇係分別 連接至載入器210、缓衝器220、第一至第三廢品載體230、 240、與250,以及卸載器260,用以讓托盤在主體1〇〇的 向前與向後方向移動;安裝在主體1〇〇上端的傳送裝置5〇〇 可以水平往返地移動,以傳送介於載入器21〇、緩衝器 220、第一至第三廢品載體230、240、與250,以及卸載器 260的托雜送帶之托# ;以及―被安制以在載入 器210、緩衝器220、第—至第三廢品載體23〇、24〇、與 250’以及卸载器·的托盤傳送帶之間往返地移動之 挑選裝置6GG ’該挑雜置_制來拾起被承載於托盤 上之有缺陷的半導體裝置,以傳送至卸載器,並根據 1373814 =承=衝托盤的正常的半導體裝置個 導體裝置填滿要被傳送至卸載器26〇的托盤之空的地方+ 在此,檢測裝置300包括第—與第 執行一影像檢測。第—影像照相機^ 體裝置的-個表面’第二影像照相機3 ^1373814 IX. Description of the Invention: [Technical Field] The present invention relates to a semiconductor device inspection in which a cleaner is integrally installed to remove dust or impurities of the surface of the f-conductor device, thereby reducing pollution The number of semiconductors that are determined to be defective, and thereby improve the yield of the semiconductor device, and the semiconductor device detection method. [Previous technology] + ^^^^^^(^) (semiconductor integrated circuit) has the form of a wafer on a semiconductor wafer, which is processed by a through-system process to become a semiconductor package suitable for protecting the wafer from external vibration. ^ After the packaging process, the semiconductor package is supplied to the customer, and will be connected to the party for an electrical function test. (A) The semiconductor package that has passed the electrical function test will be moved to the mark. Marking equipment, in order to facilitate the semiconductor information (semiconductor chip type 'manufacturer, transaction name, etc.') - even small defects and internal defects can seriously affect such semiconductor packaging Performance. Therefore, in the above-mentioned electrical function test, the external imaging test of the semiconductor package is carried out by the imaging camera (10). As for the above-mentioned defects in the semiconductor package, especially the defects of the Ball Grid Arrays (BGAs) and leads, the process of assembling the semiconductor device to the printed circuit board ((4) (4) (10) Heart Board 'PCB) may be involved. Happened in. Therefore, the detection of leads or ball arrays and 7 marks becomes quite important. A conventional apparatus for detecting the appearance of a semiconductor package is disclosed in the Korean Patent Publication No. 2005-48584, the "Semiconductor device inspecting apparatus" proposed by the applicant of the present invention. The disclosed conventional semiconductor device detecting device, as shown in the ninth figure, comprises: a main body 100', a loader 210 for loading a tray carrying a semiconductor device to be detected, An inspection device 300 for detecting a semiconductor device; a buffer 220 for temporarily storing a buffer tray carrying the semiconductor device to be inspected; loading and carrying a semiconductor selected to be defective according to the detection result The first to third scrap carriers 230, 240, and 250 of the tray of the apparatus, the defective semiconductor devices carried by the trays of the individual waste carriers are selected according to the type of defect; an unloader (un -loader) 260 for loading a tray carrying a semiconductor device selected as normal according to the detection result; a plurality of tray conveyors 48 are respectively connected to the loader 210, the buffer 220, and the first to third waste products Carriers 230, 240, and 250, and an unloader 260 for moving the tray in the forward and rearward directions of the main body 1; a conveyor 5 mounted on the upper end of the main body 1 〇 can be moved horizontally and horizontally to transfer between the loader 21〇, the buffer 220, the first to third waste carriers 230, 240, and 250, and the unloader 260; and A picking device 6GG that is reciprocally moved between the loader 210, the buffer 220, the first to third scrap carriers 23〇, 24〇, and the 250' and the unloader tray conveyor belt The defective semiconductor device carried on the tray is picked up for transport to the unloader and filled up to be transferred to the unloader 26 according to the normal semiconductor device conductor arrangement of the 1373814=bearing tray. The empty space of the tray + Here, the detecting device 300 includes the first and the first execution of an image detection. First - image camera - surface of the body device 'second image camera 3 ^

的半導體裝置的另一個表面。為了讓第—與二 機310、320能夠依序地檢測半導體裝置的二個表面,上 傳統的檢測設備更包括一反轉裝置(invert = device)700,其係介於第一影像照相機31〇與第二影像照 相機320之間’用以顛倒翻轉承載半導體裝置的托盤。…、 在第九圖之中,參考標號420代表空的托盤,^考標 號410代表載入堆豐器(i〇ading stacker),參考標號Co 代表§叉置空的托盤之饋線(feeder),而參考標號*祁、 440、450、與460代表分別設置在第一、第二、與第』 品載體230、240、與250以及卸載器260的饋線。同樣地旁 參考彳尔5虎610代表一挑選器,用以挑選半導體裝置。 根據上述組態配置’當載入器21〇供應托盤,而托盤 沿著載入器210的托盤傳送帶48〇傳送時’被承载於托 上的個別半導體裝置的-個表面會透過第—影像照构機 310進行影像檢視,當完成影像檢視後,半導體裝置合 反轉裝置700顛倒翻轉。 θ 在此,反轉裝置700必須具有一個空的托盤,用以讓 被承載於載入器托盤上的半導體裝置在被顛倒翻轉時,能 9 1373814 使得個別半導體裝置的另 夠重新被承載於空的托盤上 個表面會曝露出來。 二載巧_半導體裝置之滅會被傳送裝 置500傳 480的杯像照相機32〇 & 一檢視區域内之托盤傳送帶 之門值、、傳送裝£ _會往返地在托盤傳送帶480 :=托盤。在被_翻轉後傳送至檢視區域的半導體 乂 θ接叉第二影像照相機32〇的一影像檢測。 在僖ΪΓ/述傳統的铸體裝置檢測設備有個問題是, 的過程中,粉塵可能會附著至半導體裝 表待別疋,在引線類型的半導體裝置上,特宗 雜貝像是紐,可能會留存在半導體裝置的外表。,、 留存有粉塵或雜質之半導體裝置,儘管可 半導體I置,仍有極大的可合 ㊉的 測結果而湘…古^ 像㈣目機的影像檢 與低良r二:疋有缺陷的。因此,會有檢測正⑽ 爲了解決上述問題,傳統上是以人工方 ,有缺陷的半導體裝置之上,或一個接一 二:除粉塵或雜質等等,接著執行一影像檢: 並且因為多出的人工成本而提高了產品價格產里的下降, 【發明内容】 因此,本發明是以上述問題作為出發, 二目的是提供一種半導體麻則設備,其具有!二 自動=eleaner)被提供於—影像_機的最前端,用二 ==移_存在半導《置的外表上像是粉麵 /木物,藉此預防正常的半導體裝置會因為污染 = 10 1373814 誤地判定是有缺陷的,從而提升良率與檢測正確度,同時 並提供使用其之半導體裝置檢測方法。The other surface of the semiconductor device. In order to enable the first and second machines 310, 320 to sequentially detect the two surfaces of the semiconductor device, the conventional detecting device further includes an inverting device (invert = device) 700 which is interposed between the first image camera 31. A tray between the second image camera 320 and the second image camera 320 is used to reverse the flipping of the semiconductor device. In the ninth diagram, reference numeral 420 denotes an empty tray, reference numeral 410 denotes an i〇ading stacker, and reference numeral Co denotes a feeder of a forked empty tray. Reference numerals * 祁, 440, 450, and 460 denote feed lines respectively provided to the first, second, and ninth article carriers 230, 240, and 250, and the unloader 260. Similarly, the reference to the Muir 5 Tiger 610 represents a picker for selecting semiconductor devices. According to the above configuration, when the loader 21 is supplied to the tray, and the tray is transported along the tray conveyor 48 of the loader 210, the surface of the individual semiconductor device carried on the tray will pass through the first image. The fabric camera 310 performs image inspection, and when the image inspection is completed, the semiconductor device reversing device 700 is reversed and inverted. θ Here, the inversion device 700 must have an empty tray for allowing the semiconductor device carried on the loader tray to be re-inverted when it is turned upside down, 9 1373814 The upper surface of the tray will be exposed. The load-carrying device 500 transmits the 480 cup image camera 32 〇 & a tray conveyor in the viewing area, the transport value _ will be round-trip on the tray conveyor 480: = tray. The semiconductor 乂 θ transmitted to the inspection area after being flipped is spliced to an image detection of the second image camera 32A. There is a problem in the conventional casting device detection device. In the process, the dust may adhere to the semiconductor package, and on the lead type semiconductor device, the Tezuka image is New Zealand. Will remain in the appearance of the semiconductor device. , a semiconductor device that retains dust or impurities, although it can be placed in a semiconductor, there is still a great result that can be combined with the results of the test. The image detection of the image of the image of the image is inferior. Therefore, there will be detection positive (10) in order to solve the above problems, traditionally on the artificial side, defective semiconductor devices, or one after the other: in addition to dust or impurities, etc., then perform an image inspection: and because of the extra The labor cost increases the drop in the product price, and the present invention is based on the above problems. The second object is to provide a semiconductor hemp device having a! Two automatic = eleaner) is provided at the forefront of the image_machine, with two == shift _ there is a semi-conducting "the appearance of the surface is like a powder / wood, thereby preventing normal semiconductor devices because of pollution = 10 1373814 Mistaken judgment is defective, thereby improving yield and detection accuracy, and providing a semiconductor device detection method using the same.

本發明的另一個目的是提供一種半導體裝置檢測設 備,其中刷子清潔器係於一承載有缺陷的半導體裝置的^ 品托盤被退回進行重新檢測時操作,在對半導體裝置進行 影像檢測前,自動地移除留存在半導體裝置的外表上像^ 粉塵或雜質等污染物,藉此預防正常的半導體裝置合因$ 微小的表面缺陷而被錯誤地判定是有缺陷的,同時並提供 使用其之半導體裝置檢測方法。 a 根據本發明的一個型態,上述與其他目的可經由提供 一半導體裝置檢測設備來達成,其中被承載於一托盤(ti/' 上之半導體裝置之外表’會經由一影像檢測裝置(vision inspecting device)拍攝’以根據被拍攝到的影像的八Another object of the present invention is to provide a semiconductor device detecting apparatus in which a brush cleaner is operated when a tray of a semiconductor device carrying a defect is returned for re-detection, and automatically before image sensing of the semiconductor device Removing contaminants such as dust or impurities remaining on the surface of the semiconductor device, thereby preventing a normal semiconductor device from being erroneously determined to be defective due to a small surface defect, and providing a semiconductor device using the same Detection method. a According to one aspect of the present invention, the above and other objects are achieved by providing a semiconductor device detecting device, wherein the semiconductor device is mounted on a tray (the external device on the ti/' is via an image detecting device (vision inspecting) Device) shooting 'to eight according to the image being captured

結果來挑選該等半導體裝置’區分為有缺陷的半導體穿置 (defective semiconductor device)與正常的半導體^置 (ηϋ〇丨ai seiiiicondiictordevice),該等有缺陷的半導^壮 置會根據缺陷類型被挑選與傳送至複數個廢品 (reject carrier),而該等正常的半導體裝置會被傳送至 -卸㈣Om-loader)’其中該半導體裝置檢測設備包括* 氣清潔器,以於利用該影像檢測裝置執行一影像檢 , 自動地移除留在該等半導體裝置的外表之污染物。 該影像檢測裝置包括-第—影像照相:與二旦; 像照相機,以及鱗空氣m係分顺提供於 一= 像照相機與該第二影像照相機的最前端。 步衫 每一該空氣清潔器可包括:一殼體,該殼體之一 面形成有-開口,而該殼體之一上表面形成有複數· 11 1373814 洞;複數根分別被安裝進該等孔洞之真空吸管(vacuum suction tube);以及一水平地置入該殼體的該下端開口之 排氣管(air discharge tube),該排氣管於其下表面形成 有複數個以一預先決定的角度傾斜地形成之排氣孔。 較佳地,殼體具有一圓頂形狀,以確保順利地透過真 空吸管吸引雜質與粉塵。 一離子供應裝置(ion supply device)可被連接至該 排氣管,以供應離子來預防靜電荷,而該空氣清潔器更可 包括一流量調整閥(f low-rate ad justing valve)與一壓力 調整閥’以根據半導體裝置的類型,自動地調整供應給該 排氣管的空氣之該流量與壓力。 每一該空氣清潔器更可包括一感測器’用以感測該等 半導體裝置是否已被正常地承載於該托盤上。, 該半導體裝置檢測設備更可包含:一刷子清潔器,以 於利用戎影像檢測裝置執行一影像檢測前,自動地移除留 在該等半導體裝置的外表之污染物。 該刷子清潔器在一被裝載至一關聯的廢品載體之托 盤被退回作重新檢測時,會進行操作,而該刷子清潔器可 包括:一與複數根刷子整合地形成之刷子模組;一架設於 該刷子模組的一後端之殼體,該殼體之一下表面形成有一 開口,而該外蓋之一上表面形成有複數個孔洞;複數根分 別被安裝進該等孔洞之真空吸管;以及一水平地置入該殼 體的該下端開口之排氣管,用以接受供應至該排氣管之空 氣,該排氣管於其下表面形成有複數個以一預先決定的角 度傾斜地形成之排氣孔。 較佳地,該刷子清潔器可更包括一被提供於該殼體的 12As a result, the semiconductor devices are selected to be classified into a defective semiconductor device and a normal semiconductor device, and the defective semiconductor devices are classified according to the defect type. Picking and transferring to a plurality of reject carriers, and the normal semiconductor devices are transferred to the -4 (Om-loader), wherein the semiconductor device detecting device includes a *gas cleaner for performing with the image detecting device An image inspection automatically removes contaminants remaining on the exterior of the semiconductor device. The image detecting device includes - a first image: and a second; a camera, and a scale air m is provided at the forefront of the image camera and the second image camera. Each of the air cleaners may include: a casing having one surface formed with an opening, and one of the upper surfaces of the casing is formed with a plurality of holes 11 1373814; the plurality of roots are respectively installed into the holes a vacuum suction tube; and an air discharge tube horizontally inserted into the lower end of the housing, the exhaust tube being formed on the lower surface thereof at a predetermined angle A vent hole formed obliquely. Preferably, the housing has a dome shape to ensure smooth passage of impurities and dust through the vacuum pipette. An ion supply device may be connected to the exhaust pipe to supply ions to prevent static charge, and the air cleaner may further include a flow regulator valve (f low-rate ad justing valve) and a pressure The valve ' is adjusted to automatically adjust the flow and pressure of the air supplied to the exhaust pipe according to the type of the semiconductor device. Each of the air cleaners may further include a sensor ' to sense whether the semiconductor devices have been normally carried on the tray. The semiconductor device detecting apparatus may further include: a brush cleaner for automatically removing contaminants remaining on the surface of the semiconductor devices before performing image detection by the image detecting device. The brush cleaner operates when a tray loaded to an associated waste carrier is returned for re-detection, and the brush cleaner can include: a brush module integrally formed with the plurality of brushes; a casing of a rear end of the brush module, an opening is formed on a lower surface of the casing, and a plurality of holes are formed on an upper surface of the outer cover; a plurality of vacuum suction pipes respectively installed into the holes; And an exhaust pipe horizontally inserted into the lower end of the casing for receiving air supplied to the exhaust pipe, the exhaust pipe being formed on the lower surface thereof at a plurality of angles formed at a predetermined angle Vent hole. Preferably, the brush cleaner may further comprise a 12 provided to the housing.

該下端開口之遮罩構件(处41(1贴毗 配置用以降低一吸氣空間以增加一直 置的第一表面朝上之托盤從一載入器(loader)傳送至一第 一影像檢測區域;對該等半導體裝置的該等第一表面執行 第衫像檢測,以及根據該第一影像檢測的結果,將該 等半導體裝置挑選為有缺陷的半導體裝置與正常的半導體 裝置,其中該半導體裝置檢測方法更包含:在將該托盤傳 送至該第一影像檢測區域前,對被承載於該托盤上的該等 半導體裝置執行一空氣清潔操作。 該半導體裝置檢測方法可更包含:在執行該第一影像 檢測之後,與根據該第一影像檢測的結果將該等半導體裝 置挑選為有缺陷的半導體裝置與正常的半導體裝置之前, 將承載於該托盤的該等半導體表面顛倒翻轉,使得該等半 導體裝置的第二表面朝上;對該等半導體裝置的該等第二 表面執行一空氣清潔操作;將該承載已經通過了空氣清潔 操作之該等半導體裝置之托盤傳送至一第二影像檢測區 域;以及對該等被承載於被傳輸至該第二影像檢測區域的 該托盤之半導體裝置的該等第二表面執行一第二影像檢 測。 該半導體裝置檢測方法可更包含:將一承載了被挑選 為有缺陷的半導體裝置之托盤退回至該載入器,並對被承 13 ^/3814 載於該被退回托盤之該等半導體裝置的該等第二表面執行 一刷子清潔操作;將承载了通過該刷子清潔操作的該等半 ,體裝置之1¾托盤關轉,使靠等半導财置的該等 第-表面朝上;對該等半導體裝置的該等第一表面執行一 刷子清潔操作;以及在將承载了已經通過該刷子清潔 的該等半導體裝置之該托盤載入至該載入器後,執行 外的影像檢測。 【實施方式】 …以下將參考附;I圖表詳細朗本發明的實施例,以俾 熟悉此技藝者能夠輕易地理解與重製本發明。 第-圖為根據本發明的—第—實施例所示之 =檢的透視圖。第二圖為第-圖的部分透視 圖。第二圖為第二圖的平面圖。 >考第®至第二圖,本發明提供— 設備,其中被承載於一由一#入哭τ心导體m則 由载入态^所供應的載入器托盤 據所拍攝的影像的分析社果’ ^ = 2置1拍攝,以根 曰根據缺_貞龍挑選與錢讀數 = 等正常的半導體裝置會被傳送至-二 體裝置^測③備更包括空氣清潔n 3,以 、利用丨執行影像檢 除留在半導體裝置的外表之污染物。自動地以工虱移 dev^)圖中用以ΐ考標號「2」代表一挑選裝置(如啊 devlce)心挑選半導體裝置, 的托盤。半導體桊署於.目,丨_^#^ 可知說b」代表工 體裝置仏測权備的所有構成元件,除了空氣 14 1373814 清潔器3外,都與先前敘述的前案相同,因此相同構成元 件與其操作將略而不提。 影像檢測裝置1包括一第一影像照相機11,用以檢視 被承載於載入器托盤上的個別半導體裝置的一個表面,而 一第二影像照相機12用以檢視該半導體裝置的另一表 面。空氣清潔器3係分別位於第一與第二影像照相機11、 12的最前端。 被承載於由載入器L傳送來的托盤上的半導體裝置, 它們的下表面是朝上的,當它們通過第一影像照相機11 的最前端所提供的空氣清潔器3時,會於接受第一影像照 相機11的影像檢測前被清潔。 接著,半導體裝置會被反轉裝置(圖中未顯示)顛倒 翻轉,使得半導體裝置的上表面是朝上的。當承載半導體 裝置的托盤通過第二影像照相機12的最前端之空氣清潔 器3時,半導體裝置在接受第二影像照相機12的影像檢測 前被清潔。 如前述,藉由在影像檢測前吸引與移除像是雜質或粉 塵一類的污染物,本發明可預防正常的半導體裝置因為污 染物,而根據影像檢測的結果被錯誤地判定為有缺陷的。 第四圖為根據本發明的一示範實施例所示之一空氣 清潔器的前方透視圖,而第五圖為第四圖之底視圖。空氣 清潔器3包括一殼體3卜複數根真空吸管(vacuum suction tube)32、一排氣管33、以及一供氣管(air supply tube)34 。 殼體31係於其下表面形成有一開口,而殼體之一上 表面形成有複數個孔洞311。較佳地,殼體31具有一圓頂 15 1373814 形狀’以便讓空氣中所含的雜質與粉 … 地吸引,而不會累積在殼體31的角落。、i吸官32順利 32係破分別安裝於殼體 在此,如果只用一根真空吸管32 吸管32係聚集在殼體31的一特別區域^者疋複數根真空 的雜質與粉塵可能會累積在殼體3「的’被吸引空氣内 會完全通過殼體31。為避免此問^特別區域内’而不The lower end opening mask member (where 41 is disposed adjacent to reduce an inspiratory space to increase the always-on first surface-up tray from a loader to a first image detecting area Performing a first-shirt image detection on the first surfaces of the semiconductor devices, and selecting the semiconductor devices as defective semiconductor devices and normal semiconductor devices according to the results of the first image detection, wherein the semiconductor devices The detecting method further includes: performing an air cleaning operation on the semiconductor devices carried on the tray before the tray is transferred to the first image detecting area. The semiconductor device detecting method may further include: executing the first After an image detection, and before selecting the semiconductor device as a defective semiconductor device and a normal semiconductor device according to the result of the first image detection, the semiconductor surfaces carried on the tray are reversed and inverted, so that the semiconductors The second surface of the device faces upward; performing an air cleaning operation on the second surfaces of the semiconductor devices; Transferring the trays of the semiconductor devices that have passed the air cleaning operation to a second image sensing area; and the semiconductor devices that are carried on the trays that are transferred to the second image sensing area The second surface performs a second image detection. The semiconductor device detecting method may further include: returning a tray carrying the semiconductor device selected to be defective to the loader, and carrying the bearing on the bearing 13^/3814 The second surfaces of the semiconductor devices that are returned to the tray perform a brush cleaning operation; the trays carrying the semiconductor devices that are carried by the brush cleaning operation are turned off, so that the semiconductors are turned off. The first surface is facing upward; performing a brush cleaning operation on the first surfaces of the semiconductor devices; and loading the tray carrying the semiconductor devices that have been cleaned by the brush to the loader After that, the image detection outside is performed. [Embodiment] The following is a reference to the embodiment of the present invention, which can be easily understood by those skilled in the art. The present invention is understood and reproduced. The first drawing is a perspective view of the inspection according to the first embodiment of the present invention. The second drawing is a partial perspective view of the first drawing. The second drawing is a plan view of the second drawing. >Kato® to the second figure, the present invention provides an apparatus in which an image of a loader tray supplied by a loading state is carried by an in-frozen conductor m Analyze the fruit '^ = 2 set 1 to shoot, according to the lack of _ 贞 dragon pick and money reading = etc. Normal semiconductor devices will be transmitted to - two body device ^ test 3 preparations including air cleaning n 3, Performing image detection using 丨 to remove contaminants left on the surface of the semiconductor device. Automatically transferring dev^) in the figure to refer to the label "2" for selecting a device (such as devlce) to select a semiconductor device. Tray. Semiconductors are listed in the head, 丨_^#^ It can be said that b" represents all the components of the work device's test equipment, except for the air 14 1373814 cleaner 3, which is the same as the previous case. The same constituent elements and their operation will not be mentioned. The image detecting device 1 includes a first image camera 11 for viewing a surface of an individual semiconductor device carried on a loader tray, and a second image camera 12 for viewing another surface of the semiconductor device. The air cleaners 3 are located at the foremost ends of the first and second image cameras 11, 12, respectively. The semiconductor devices carried on the tray transported by the loader L have their lower surfaces facing upward, and when they pass through the air cleaner 3 provided at the foremost end of the first image camera 11, they will receive the first The image of the image camera 11 is cleaned before image detection. Next, the semiconductor device is turned upside down by the inverting device (not shown) such that the upper surface of the semiconductor device is upward. When the tray carrying the semiconductor device passes through the air cleaner 3 at the forefront of the second image camera 12, the semiconductor device is cleaned before receiving the image detection of the second image camera 12. As described above, by attracting and removing contaminants such as impurities or dust before image detection, the present invention can prevent a normal semiconductor device from being erroneously determined to be defective based on the result of image detection because of contamination. The fourth figure is a front perspective view of one of the air cleaners according to an exemplary embodiment of the present invention, and the fifth figure is a bottom view of the fourth figure. The air cleaner 3 includes a casing 3, a plurality of vacuum suction tubes 32, an exhaust pipe 33, and an air supply tube 34. The casing 31 is formed with an opening formed on a lower surface thereof, and a plurality of holes 311 are formed in an upper surface of the casing. Preferably, the casing 31 has a shape of a dome 15 1373814 so as to attract impurities and powder contained in the air without accumulating at the corners of the casing 31. i Suqian 32 smoothly 32 series broken separately installed in the housing here, if only one vacuum pipette 32 is used, the suction pipe 32 is gathered in a special area of the casing 31. The impurities and dust of the plurality of vacuum may accumulate. In the case of the housing 3 "the air that is drawn into the air will pass completely through the housing 31. To avoid this question ^ in the special area'

真空吸管地分佈歧體 ,^為該複數根 31的一特別區域内。 而非聚集在殼體 排氣管33係水平地置入殼體31 複數個排氣孔= =二r空氣痒332連接至排氣管33’以供The manifold is distributed by a vacuum pipette, and is a special area of the plurality of roots 31. Instead of gathering in the casing, the exhaust pipe 33 is horizontally placed in the casing 31. A plurality of exhaust holes == two r air itching 332 is connected to the exhaust pipe 33' for

而用以吸引空氣的真空吸管 31的孔洞311内。 L供應至排氣管33❾空氣會透過排氣孔331被排放至 m=移除附著於半導體裝置_質與粉塵等污染物。 一工吸g 32係用來透過真空吸力吸引被移除的污染物。 六' 也仏氣管34係與一離子供應管(i〇n SUppiy t_ube)35連接’而後者連接至一離子供應裝置(圖中未顯 ’、)'供應離子來預防污染物的靜電吸附(electrostatic adsorption) 〇 一般來說’半導體裝置的表面會因為靜電吸附的粉塵 驗難將靜電韻祕塵或雜質 移除。 16 1373814 為此,在本發明中,較佳為將半導體 透過離子供應管35所供應的離子加財和 =面 移除吸附至半導體裝置的粉塵或雜質的目的。更達到輕鬆 儘管未顯示於圖中,空氣清潔器3較佳地 量調整閥⑴。w-rate adjustlng valve)與—壓力調^ (pressure adjusting valve) ’ 以根據半導體裝置 自動地調整供應給該排氣管的空氣之流量與壓力。 整閥與壓力難_連接至—個人電腦,錢進行 整閥與磨力調整閥的自動遠端控制。 里5。 舉例來說,一般上要被檢測的物件,也就是個 導體裝置,具有㈣元件,像是球狀引線或 所以’如果在所有的情況下都應用同—氣壓,可能合指 架設於半導體裝置上的元件。因此,較佳為調整流盘= 氣壓力。 '二 空氣清潔器3更包括-感測器36,用以感測半導 置是否已被正常地承載於托盤上。 且x 根據上述有關本發明的第-實施例,藉由使用位於^ 像照相機的最則端之空氣清潔器以自動地移除像是粉 雜質等留在半導體裝置外表的污染物,本發明具有可 正常的半導體裝置因為污染物被錯誤地判定為有缺陷的 導體裝置之功效’並因此達到更好的良率與檢測正確度。 第六圖為根據本發明的一第二實施例所示之一半導體$ 檢測設備的透視圖。以下對於與第一圖相同的構成元^將 略而不提。 ' 參考第六圖,根據本發明的第二實施例之半導體裝置 檢測設備更包括一刷子清潔器4,以於利用影像檢測裝置} 1373814 執行一影像檢測前,自動地移除像是粉塵或雜質等留在半 導體裝置外表的污染物(見第一圖)。 較佳地,刷子清潔器4在-被裝載至廢品載體R之托 盤被退回作重新檢測時,會進行操作。 、更特別地,一旦根據影像檢測的結果被判定為有缺陷 的半導體裝置被承載於廢品載體R的托盤上,該廢品托盤 會被退回以便重新檢測。在此情形下,在執行重新檢測前, 半導體裝置的上表面會先利用刷子清潔器4加以清潔。接 鲁 著,再利用反轉裝置(圖中未顯示)將半導體裝置顛倒翻 ; 轉。 . 藉由反轉裝置(圖中未顯示)的操作,承載於托盤上 的半導體裝置的下表面是朝上的。一旦利用刷子清潔器4 將半導體裝置加以清潔後,托盤會被載入至載入器L,並 接受重新檢測。 車又佳地,刷子清潔器4為防靜電刷,以預防和半導體 裝置接觸時產生靜電荷。 • 、帛七圖為第六圖中所示之一刷子清潔器的實施例之 前方透視圖,而第八圖為第六圖所示之刷 透視圖。刷子清潔器4包括-刷子模組41、二:d 數根真空吸管43、以及一排氣管44。 刷子模組41係與複數根刷子411整合地形成。一對 . 張力調整器(tension adjustor)45係耦接至刷子模組41 的兩端。每一張力調整器45係置於一引導構件/guide member)46 内。 儘管上述的實施例是利用刷子411,藉由刷子411的 1373814 滑動來清潔半導體裝置的表面,應可了解的是,本發明的 另一實施例可採用旋轉刷子,利用一馬達的運作來旋轉。 同樣地,儘管在圖中未顯示,不過張力調整器45較 佳地可納入一張力構件(tensi〇n member),像是彈簧於其 中’以於刷子模組以及半導體裝置之間維持適當的預負載The hole 311 of the vacuum pipette 31 for attracting air is used. L is supplied to the exhaust pipe 33, and air is discharged through the exhaust hole 331 to m = removing contaminants attached to the semiconductor device, such as mass and dust. A work suction g 32 system is used to attract the removed contaminants by vacuum suction. The six's 仏 gas tube 34 is connected to an ion supply tube (i〇n SUppiy t_ube) 35 and the latter is connected to an ion supply device (not shown in the figure) to supply ions to prevent electrostatic adsorption of pollutants (electrostatic Adsorption) 〇 In general, the surface of a semiconductor device will remove static dust or impurities due to electrostatic adsorption of dust. 16 1373814 For this reason, in the present invention, it is preferable to remove the ions or the surface supplied from the semiconductor through the ion supply tube 35 for the purpose of removing dust or impurities adsorbed to the semiconductor device. It is easier to achieve. Although not shown in the drawings, the air cleaner 3 preferably adjusts the valve (1). The w-rate adjust lng valve) and the [pressure adjusting valve] are used to automatically adjust the flow rate and pressure of the air supplied to the exhaust pipe according to the semiconductor device. The whole valve and pressure are difficult to connect to - personal computer, money for automatic remote control of the whole valve and the friction adjustment valve. In 5. For example, an object to be inspected, that is, a conductor device, has (4) components, such as spherical leads or so 'if all the same applies to air pressure, it may be mounted on the semiconductor device. Components. Therefore, it is preferable to adjust the flow disk = gas pressure. The 'two air cleaners 3' further include a sensor 36 for sensing whether the semiconductor guides have been normally carried on the tray. And x according to the above-described first embodiment relating to the present invention, by using an air cleaner located at the most end of the camera to automatically remove contaminants such as powder impurities remaining on the surface of the semiconductor device, the present invention has A normal semiconductor device can be erroneously determined to be a defective conductor device because of contaminants' and thus achieve better yield and detection accuracy. Figure 6 is a perspective view of a semiconductor $ detecting apparatus according to a second embodiment of the present invention. The same constituent elements as those of the first figure will not be mentioned below. Referring to a sixth diagram, a semiconductor device detecting apparatus according to a second embodiment of the present invention further includes a brush cleaner 4 for automatically removing dust or impurities before performing image detection using the image detecting device} 1373814 Contaminants that remain on the surface of the semiconductor device (see Figure 1). Preferably, the brush cleaner 4 operates when the tray loaded to the reject carrier R is returned for re-detection. More specifically, once the semiconductor device determined to be defective based on the result of the image detection is carried on the tray of the reject carrier R, the reject tray is returned for re-detection. In this case, the upper surface of the semiconductor device is first cleaned by the brush cleaner 4 before the re-detection is performed. After that, the semiconductor device is turned upside down by using an inverting device (not shown). By the operation of the inverting means (not shown), the lower surface of the semiconductor device carried on the tray is upward. Once the semiconductor device is cleaned with the brush cleaner 4, the tray is loaded into the loader L and re-detected. Preferably, the brush cleaner 4 is an antistatic brush to prevent static charge when in contact with the semiconductor device. • Fig. 7 is a front perspective view of an embodiment of the brush cleaner shown in Fig. 6, and Fig. 8 is a perspective view of the brush shown in Fig. 6. The brush cleaner 4 includes a brush module 41, two: d number of vacuum suction pipes 43, and an exhaust pipe 44. The brush module 41 is formed integrally with the plurality of brushes 411. A pair of tension adjusters 45 are coupled to both ends of the brush module 41. Each tension adjuster 45 is placed within a guide member 46. Although the above embodiment utilizes the brush 411 to clean the surface of the semiconductor device by sliding the 1373814 of the brush 411, it will be appreciated that another embodiment of the present invention can be rotated using the operation of a motor using a rotating brush. Similarly, although not shown in the drawings, the tension adjuster 45 preferably incorporates a force member such as a spring therein to maintain an appropriate pre-between the brush module and the semiconductor device. load

當半導體裝置被承載於托盤中而被傳送時,它們可根 據半導體裝置的類型而具有不同的高度。所以,在無法^ 整刷子核組41與半導體裝置的表面之_預貞載的情形 下,刷子411會被放置得過度接觸半導體裝置,造成半導 體裝置表_刮痕,或者是造錢是職 ^目反地,如果刷子411沒有跟料«置近距離^貝 白造成無法充分清潔半導體裝置。 因此較佳為根據要被檢測的物件,也就是半導體 裝’來選擇適當的張力調整器45。When the semiconductor devices are carried in the tray, they may have different heights depending on the type of the semiconductor device. Therefore, in the case where the brush core group 41 and the surface of the semiconductor device cannot be pre-loaded, the brush 411 is placed excessively in contact with the semiconductor device, causing the semiconductor device to be scratched, or the money is a job. Conversely, if the brush 411 does not follow the material «close distance ^ whitening, the semiconductor device cannot be sufficiently cleaned. Therefore, it is preferable to select an appropriate tension adjuster 45 in accordance with the object to be detected, that is, the semiconductor package.

較佳地,張力調整器45係藉由-滾筒(cylinder)垂 移動’岐筒是因應由—個人電腦根射導體裝置的類 疮所發出的控制訊號而移動,從而調整刷子模組41的高 度0 外蓋42係架設於刷子模組41的後端,外蓋42之一 了表面形成有—開口’而外蓋42之—上表面形成有複數個 洞421。複數根用以吸引空氣之真空吸管43係分別被安 裝進外蓋42的孔洞421。 排氣管44係水平地置入外蓋42的下端開口,排氣管 =其下表面形成有複數個排氣孔441,使得複數個排氣 ;^以―預先決定的角度傾斜地形成。如果线係透過 軋官44 -端的空氣蟬442被送至排氣管44,則空氣可 1373814 透過排氣孔441被排放至外部β 杈佳地,空氣埠442係連接—提供離子之離子供應裝 置(圖中未顯示)’用以避免與半導體裝置靜電接觸。 -般來說,半導體裝置的表面在經由刷子清潔後’半 導體裝置的€子特性有可能會因為與刷子靜電接觸而有劣 化的風險。此外,刷子清潔器與空氣清潔器會因為粉塵和 雜質因為靜電吸_附著至半導體裝置,無法輕易地移除。Preferably, the tension adjuster 45 is moved by the cylinder to move the cylinder to adjust the height of the brush module 41 in response to a control signal generated by the sore of the personal computer root-emitting conductor device. The outer cover 42 is mounted on the rear end of the brush module 41. One of the outer covers 42 has an opening formed thereon, and the upper surface of the outer cover 42 is formed with a plurality of holes 421. A plurality of vacuum suction pipes 43 for attracting air are respectively fitted into the holes 421 of the outer cover 42. The exhaust pipe 44 is horizontally placed in the lower end opening of the outer cover 42, and the exhaust pipe = a plurality of exhaust holes 441 are formed on the lower surface thereof so that a plurality of exhaust gases are formed obliquely at a predetermined angle. If the wire is sent to the exhaust pipe 44 through the air 蝉 442 at the end of the rolling mill 44, the air 1373814 can be discharged to the outside through the vent hole 441, and the air 埠 442 is connected to provide an ion supply device for the ion. (not shown) 'to avoid electrostatic contact with semiconductor devices. In general, the surface characteristics of the semiconductor device after cleaning via the brush may have a risk of deterioration due to electrostatic contact with the brush. In addition, brush cleaners and air cleaners cannot be easily removed because dust and impurities are electrostatically attached to the semiconductor device.

為此,在本發明較佳為離子供應裝置(圖中未顯 示)在刷子清潔操作中提供料,用以避免刷子與半導體 裝置之間的靜電接觸’以達到較佳的電子可靠度,同時可 中和半導體裝置的靜電表面,心讓因為靜電吸附而附著 至半導體裝置之粉塵和雜質可被輕易地移除。 刷子清潔器4更包括一被提供於外蓋42的下端開口 之遮罩構件47。 遮罩構件47沾用了外蓋42的下端開口,以及更特別 地,係用來降低排氣管4 4周圍的多餘空間。縮右To this end, in the present invention, it is preferred that the ion supply device (not shown) supplies material during the brush cleaning operation to avoid electrostatic contact between the brush and the semiconductor device to achieve better electronic reliability. The electrostatic surface of the semiconductor device is neutralized, so that dust and impurities adhering to the semiconductor device due to electrostatic adsorption can be easily removed. The brush cleaner 4 further includes a mask member 47 provided to the lower end opening of the outer cover 42. The mask member 47 is affixed with the lower end opening of the outer cover 42, and more particularly, to reduce excess space around the exhaust pipe 44. Right

增加真空吸管43的真空吸力的功效。因此,可確=罩: 件47更有效率的吸引與移除使用刷子411進 所產生的雜質或粉塵。 糸刼作時 根據上述有關本發明的第二實施例,於再—次 體裝置執行-;!彡像檢測前,使用所提供_子 動地移㈣存在半導體裝置的外表上的粉麵雜質'°,° 本發明具有,免正常的半導體裝置因為為小的表面缺陷: 被錯誤地判定為有缺陷的半導體裝置之功效。 接下來,將根據本發明,簡要地描述使用上述半導體 20 裝置檢測設備所進行之一半導體裝置檢測方法。 ^首先,將一承載了半導體裝置使得該等半導體裝置的 第一表面朝上之托盤,載入至載入器L。 接著,載入器L所負載的托盤會依序地被傳送至一影 像檢測區域。在此情形下’在將托盤傳送至一第—影像^ 測區域前,半導體裝置的第一表面會接受一清潔操作。 在利用第一影像照相機11對被承載於托盤上的半導 體裝置的第一表面執行一影像檢測後,托盤會被反轉骏置 (圖中未顯示)顛倒翻轉’使得半導體裝置的第二表^朝 上。 接著’承載了第二表面朝上的半導體裝置之托盤,合 被傳送至一第二影像檢測區域。在此情形下,在被傳送至 第二影像檢測區域前’半導體裝置的第二表面會以空氣清 潔器3進行一清潔操作。 ' β 在利甩第二影像照相機12執行一影像檢測後,根據 影像檢測的結果,半導體裝置 會被挑選為要被傳送至卸裁^ 器U之正常的半導體裝置,以及要被傳送至廢品载體 有缺陷的半導體裝置。 同時,當承載於廢品載體R的廢品托盤上之有缺陷的 半導體裝置會被退回載入器’以便接受一影像檢測。 更特別地,當承載了第二表面朝上的半導體裝置之廢 品托盤被傳送至載入器時,半導體裝置的第二表面會被刷 子清潔器4加以清潔。 在此情形下,根據被判定為有缺陷的半導體裝置的缺 陷類型,廢品載體R可被分類為不同的廢品區域(reject 1373814 region)m、R2、R3、與B。上述的刷子清潔操作係針搿一 特定的廢品托(盤來進行,其中所承載的是具有表面缺陷之 半導體裝置。 ' 43 舉例來說,當具有表面缺陷的半導體裝置被承载於廢 品區域R2時,刷子清潔器4係安裝於自廢品區域延伸 出來的托盤傳送帶上’而承載於廢品區域R2上的廢品托盤 會被退回以準備進行刷子清潔操作。The effect of the vacuum suction of the vacuum pipette 43 is increased. Therefore, it can be confirmed that the cover 47 more efficiently attracts and removes impurities or dust generated by the use of the brush 411. According to the second embodiment of the present invention described above, before the re-sub-device is executed - the image is detected, the supplied surface is used to move (4) the surface impurity on the surface of the semiconductor device. °, ° The present invention has a normal semiconductor device because it is a small surface defect: the effect of a semiconductor device that is erroneously determined to be defective. Next, a semiconductor device detecting method performed using the above-described semiconductor 20 device detecting device will be briefly described in accordance with the present invention. First, a tray carrying semiconductor devices such that the first surface of the semiconductor devices faces upward is loaded to the loader L. Then, the tray loaded by the loader L is sequentially transferred to an image detecting area. In this case, the first surface of the semiconductor device is subjected to a cleaning operation before the tray is transported to a first image sensing area. After performing image detection on the first surface of the semiconductor device carried on the tray by the first image camera 11, the tray is reversed by the reverse (not shown) to make the second table of the semiconductor device. Upward. The tray carrying the second surface-facing semiconductor device is then transferred to a second image sensing area. In this case, the cleaning operation is performed by the air cleaner 3 on the second surface of the semiconductor device before being transferred to the second image sensing region. After the second image camera 12 performs an image detection, the semiconductor device is selected as a normal semiconductor device to be transferred to the unloader U, and is transmitted to the waste product based on the result of the image detection. A defective semiconductor device. At the same time, the defective semiconductor device on the reject tray carried on the reject carrier R is returned to the loader' to receive an image detection. More specifically, when the waste tray carrying the second surface-facing semiconductor device is transferred to the loader, the second surface of the semiconductor device is cleaned by the brush cleaner 4. In this case, the scrap carrier R can be classified into different scrap regions (reject 1373814 regions) m, R2, R3, and B, depending on the type of defect of the semiconductor device determined to be defective. The above-described brush cleaning operation is performed by a specific waste tray (a disk is carried out in which a semiconductor device having a surface defect is carried.] 43 For example, when a semiconductor device having a surface defect is carried in the scrap region R2 The brush cleaner 4 is mounted on the tray conveyor extending from the waste area and the waste tray carried on the waste area R2 is returned for preparation for the brush cleaning operation.

儘管在本發明的實施例中所述之具有表面缺陷的半 導體裝置係經由挑選而被送至廢品區域R2,而刷子清潔器 4係安裝於從廢品區域R2延伸出來的托盤傳送帶上:|曰: 本發明並不在此限,而具有表面缺陷的半導體裝置的挑= 區域’以及财清„的安裝位置,可㈣本發明的其^ 實施例的各種方式來達成。 ^ 同時,在完成清潔半導體裝置的第二表面後,托盤I 猎由反轉裳置(圖中未顯示)被顛倒翻轉 二 置的第-表面係朝上的。 ^千導體襄Although the semiconductor device having the surface defect described in the embodiment of the present invention is sent to the reject region R2 via selection, the brush cleaner 4 is mounted on the tray conveyor extending from the scrap region R2: |曰: The present invention is not limited thereto, and the picking area of the semiconductor device having surface defects and the mounting position of Caiqing can be achieved in various ways of the embodiment of the present invention. ^ At the same time, the cleaning of the semiconductor device is completed. After the second surface, the tray I is hunted by the reverse skirt (not shown) and is turned upside down to flip the second surface of the first surface up.

,著=導體裝置的第-表面會利用刷子清潔器^ ^ =承載被清潔過的半導體裳置之托盤,會被 接著,對所有被退回的托盤執行一影像檢測。 =本翻的上料導财置檢财法, = 檢測前進行空氣清 早。^ 所造成之任何影像檢測錯 _=清;定= 如此 前’先移除沒有被空氣清潔操作所^像檢測之 22 來可提升檢測正確度。 由先前的實施例說明可以知道,本發明可以提供以下 的數種功效: 首先,根據本發明,—空氣清潔器係被提供於每一影 像照相機的最前端,用以自動地移除留存在半導體裳置的 外表上像是粉塵絲質料染物,這具有預防正常的半導 體裝置會因為污染物而被錯誤地判^為有缺陷的半導體襄 置之功效,從而提升良率與檢測正確度。 其二’根據本發明,由於提供具有一刷子清潔器的一 ^品載體,在料導體裝置進行—額外的影像檢測前,自 ^也移除留存在半導體I置的外表上像是粉麵雜質等污 2 ’這具有·正常的半導體裝置會因為微小的表 ^而被錯誤_定財缺_半導财置之功效。 供靡接至空氣清潔11與刷子清潔器之離子 ΐ:=子特性劣化。同樣地,供應離子可中= 面之粉塵與雜質。 ⑤仕千導體裝置的表 藝者經透過較佳實施例加以說明,熟悉此技 明的::工二障離以下申請專利範圍所揭示之本發 ί的-與精神下,有可能有各種錢、添加與替代的方 【圖式簡單說明】 本發明的上述與其他目的、特點和其他 下的詳細說明與附屬圖表做更詳細的了、解,其中:匕 23 第-圖為根據本發明的—第—實施 體裝置檢測設備的透視圖; ’、之+導 第二圖為第一圖的部分透視圖; 第二圖為第二圖的平面圖; 據本發明的—示範實施例所示之一空氣 /月你态的刖方透視圖; 第五圖為第四圖之底視圖;, the first surface of the conductor device will utilize the brush cleaner ^ ^ = the tray carrying the cleaned semiconductor wafer will be followed by an image inspection of all the returned trays. = The cost of the goods is checked and the money is checked. = The air is cleared before the test. ^ Any image detection error caused by _=clear; fixed = so before removing the image detection that has not been cleaned by the air cleaning operation can improve the detection accuracy. As can be appreciated from the foregoing embodiments, the present invention can provide the following several functions: First, according to the present invention, an air cleaner is provided at the forefront of each image camera for automatically removing the semiconductor remaining. The appearance of the skirt is like a dusty silk material, which has the effect of preventing the normal semiconductor device from being mistakenly judged as a defective semiconductor device due to the contaminant, thereby improving the yield and the detection accuracy. Secondly, according to the present invention, since a carrier having a brush cleaner is provided, the surface of the semiconductor I is removed as a powdery surface impurity before the additional conductor inspection is performed by the material conductor device. Etc. 2 'This has a normal semiconductor device that will be wrong due to a small table ^ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The ions supplied to the air cleaning 11 and the brush cleaner ΐ: = the sub-characteristics are deteriorated. Similarly, the supply of ions can be used as dust and impurities in the surface. The performer of the Shishi thousand conductor device is explained by the preferred embodiment, and is familiar with the technology: the workmanship is different from the spirit of the following patent application scope, and there may be various kinds of money. BRIEF DESCRIPTION OF THE DRAWINGS [0009] The above and other objects, features and other detailed descriptions of the present invention and the accompanying drawings are explained in more detail, wherein: FIG. 23 is a diagram according to the present invention. - a perspective view of the first embodiment device detecting device; ', the second drawing is a partial perspective view of the first figure; the second drawing is a plan view of the second figure; according to the exemplary embodiment of the present invention An air/month view of your state; the fifth picture is the bottom view of the fourth picture;

第六圖為根據本發明的一第二實施例所示之一半導 體裝置檢測設備的透視圖; 第七圖為第六圖中所示之一刷子清潔器的實施例之 前方透視圖; 第八圖為第六圖所示之刷子清潔器的後方透視圖;以 及 第九圖所示為一傳統的半導體裝置檢測設備。 【主要元件符號說明】6 is a perspective view of a semiconductor device detecting apparatus according to a second embodiment of the present invention; and FIG. 7 is a front perspective view of an embodiment of a brush cleaner shown in FIG. 6; The figure is a rear perspective view of the brush cleaner shown in the sixth figure; and the ninth figure shows a conventional semiconductor device detecting apparatus. [Main component symbol description]

[本發明之實施例] 1影像檢測裝置 11第一影像照相機 12第二影像照相機 E空的托盤 L 載入器 R 廢品載體 R1 廢品區域 R2 廢品區域 24 1373814 廢品區域 廢品區域 卸載器 挑選裝置 空氣清潔器 殼體 孔洞 真空吸管 排氣管 排氣孔 空氣埠 供氣管 離子供應管 感測器 刷子清潔器 刷子模組 刷子 外蓋 孔洞 真空吸管 排氣管 排氣孔 空氣槔 張力調整器 25 1373814 46 引導構件 47 遮罩構件[Embodiment of the Invention] 1 Image detecting device 11 First image camera 12 Second image camera E Empty tray L Loader R Waste carrier R1 Waste area R2 Waste area 24 1373814 Waste area waste area Unloader picking device Air cleaning Shell hole vacuum tube exhaust pipe vent hole air 埠 air supply pipe ion supply tube sensor brush cleaner brush module brush cover hole vacuum pipe exhaust pipe vent hole air 槔 tension adjuster 25 1373814 46 Guide member 47 mask member

[先前技術] 100 主體100 210 載入器210 220 緩衝器 230 第一廢品載體 240 第二廢品載體 250 第三廢品載體 260 卸載器 300 檢測裝置 310 第一影像照相機 320 第二影像照相機 410 載入堆疊器 420 空的托盤 430 饋線 440 饋線 450 饋線 460 饋線 470 饋線 480 托盤傳送帶 500 傳送裝置 600 挑選裝置 26 1373814 610 挑選器 700 反轉裝置[Prior Art] 100 Body 100 210 Loader 210 220 Buffer 230 First Waste Carrier 240 Second Waste Carrier 250 Third Waste Carrier 260 Unloader 300 Detection Device 310 First Image Camera 320 Second Image Camera 410 Loading Stack 420 empty tray 430 feeder 440 feeder 450 feeder 460 feeder 470 feeder 480 tray conveyor 500 conveyor 600 picking device 26 1373814 610 picker 700 reversing device

Claims (1)

丄0/J614 十、申請專利範圍: 1 種半導體裝置檢測設備,其中被承載於一托盤上之半 &、置之外表,會鉍由一影像檢測裝置拍攝,以根據被拍攝到 的衫像的分析結果來挑賴科導體裝置區分為有缺陷的半導 體^置與正常料導體裝置,料有雜的半導體裝置會根據缺 ^ 員』破挑選與傳送至複數個廢品健,*該等正常的半導體裝 置會被傳送至一卸载器, 、 中林導體裝置檢測設備包括空氣清潔器,以於利用該影 樣置執行—影像檢測前’自動地儀空氣移除留在該等半 導體裝置的外表之污染物。 .2、如申料纖圍第i項所述之半導體裝置檢測設備,其 精像檢測裂置包括一第一影像照相機與一第二影像照相 機,以及 5玄等空氣清潔ϋ係分職提供於該第—影像照相機與該第二 影像照相機的最前端。 —3、如申請專利_第2項所述之轉體裝置檢測設備,其 中每一該空氣清潔器包括: 而該殼體之一上 -殼體’該殼體之一下表面形成有一開口, 表面形成有複數個孔洞; 複數個分別被安裝入該等孔洞中之真空吸管;以及 一水平地置人該殼體的訂端和之魏管,該排氣管於其 28 1^/3814 T表面形成有複數個[預先決定的角度傾斜祕紅排氣孔。 4、 如申請專利範圍第3項所述之半導體裝置檢測設備,其 中"亥喊體具有一圓頂形狀以確保順暢地透過真空吸管吸引雜質與 粉塵。 5、 如申請專利範圍第3項所述之半導體裝置檢測設備,其 中離子供應裝置係連接至該排氣管,以供應離子來預防靜電荷。 6、 如申請專利範圍第5項所述之半導體裝置檢測設備,其 中邊空氣清潔H進—步包括—流量調_與—壓力調整閥,以根 據半導體裝置的_ ’自動_整供應給該魏管的空氣之該流 量與壓力。 7如申叫專利範圍第2項所述之半導體 中每:該空氣清郎進-步包括―感·,用喊麵等料體 裝置疋否已被正常地承載於該托盤上。 8、 如申請專利範圍第1項至第7項任何-項所述之半導體 裝置檢測設備,進一步包含: 一刷子清潔器’以於利用該影像檢測裝置執行一影像檢測 前’自動地移除留在料半導體裝置的外表之污染物。 9、 如申請專利8項所述之半導體裝置檢測設備,其 中該刷子清潔ϋ在-被裝載至—關聯的廢品载體之托盤被退回作 重新檢測時,會進行操作。 1 〇、如巾請專利_第9賴述之轉體裝置檢測設備, 29 1373814 其中該刷子清潔器包括: 一與複數根刷子整合地形成之刷子模組; -架設於該刷子模組的—後端之外蓋,該外蓋之—下表面形 成有-開α,而料蓋之—上表面形成有複數個孔洞; 複數根分別被安裝進該等孔洞之真空吸管;以及 -水平地置入該外蓋_下關口之排氣管,用以接受供應 至該排氣管之域’該錢管於其下表面形成有複數個以—預先 決定的角度傾斜地形成之排氣孔。 11如申请專利範圍第丄〇項所述之半導體裂置檢測設 備’其巾綱子清潔H進—純括—被提供於耕蓋的該下端開 口之遮罩構件,該遮罩構件並被配置肋降低—吸氣空間以增加 一真空吸力。 曰 12如申δ月專利範圍第i Q項所述之半導體裝置檢測設 ,,其中該離子供驗置進-步連接至該刷子清潔器之該排氣 管,以供應離子來預防靜電荷。 13、 如申請專利範圍第i〇項所述之半導體裝置檢測設 備其中及刷子清潔裔進一步包括一張力調整器以與該等半導 體·1¾•置維持一適當的張力。 、 14、 一種半導體裝置檢測方法,包含: 將-承載了半導體裝置使得該科導體裝置的第—表面朝上 之托盤從-獻輯送至—第—影像檢測區域; 30 1373814 對該等半導體裝置的該等第一表面執行一第一影像檢測;以 及 根據該第一影像檢測的結果,將該等半導體裝置挑選為有缺 陷的半導體裝置與正常的半導體裝置; 其中該半導體裝置檢測方法更包含:在將該托盤傳送至該第 一景>像檢測區域前,對被承載於該托盤上的該等半導體裝置執行 一空氣清潔操作。 15、 如申請專利範圍第14項所述之半導體裝置檢測方 法,其中該半箱裝置檢财法更包含:在執行該第—影像檢測 之後,與根據該第一影像檢測的結果將該等半導體裝置挑選為有 缺陷的半導體裝置與正常的半導體裝置之前: 將承載於該托盤的該等半導體表面顛倒翻轉,使得該等半導 體裝置的第二表面朝上; 對該等半導體裝置的該等第二表面執行一空氣清潔操作; 將該承載已經通過了空氣清潔操作之該等半導體裝置之托盤 傳送至一第二影像檢測區域;以及 對該等被承載於被傳輸至該第二影像檢測區域的該托盤之半 導體裝置的該等第二表面執行-第二景彡像檢測。 16、 如申請專利範圍第i5項所述之半導體裝置檢測方 法,其中該半導體裝置檢測方法進一步包含: 將-承載了被挑選為有缺陷的半導體裝置退回至該載入器, 1373814 並對被承載於該被退回托盤之該等半導體裝置的該等第二表面執 行一刷子清潔操作; 將承載了通過該刷子清潔操作的該等半導體裝置之該托盤顛 倒翻轉,使得該等半導體裝置的該等第一表面朝上; 對該等半導體裝置的該等第一表面執行一刷子清潔操作;以 及 在將承載了已經通過該刷子清潔操作的該等半導體裝置之該托 • 盤載入至該載入器後,執行一額外的影像檢測。丄0/J614 X. Patent application scope: 1 semiconductor device testing device, in which the half & mounted on a tray, the external table will be photographed by an image detecting device to be based on the photographed shirt image The result of the analysis is to distinguish the conductor device from being divided into a defective semiconductor device and a normal material conductor device. The semiconductor device with a miscellaneous material is selected and transmitted to a plurality of waste products according to the defect, *the normal The semiconductor device is transmitted to an unloader, and the Zhonglin conductor device detecting device includes an air cleaner for performing the image-pre-image detection before the image device is automatically removed from the appearance of the semiconductor device. Contaminants. 2. The semiconductor device detecting device according to item ii of claim 1, wherein the fine image detecting and splitting comprises a first image camera and a second image camera, and 5 air and other air cleaning systems are provided separately. The first image camera and the front end of the second image camera. 3. The apparatus for detecting a swivel device according to claim 2, wherein each of the air cleaners comprises: and one of the housings - the housing - the lower surface of one of the housings is formed with an opening, a surface Forming a plurality of holes; a plurality of vacuum suction pipes respectively installed into the holes; and a predetermined end of the casing and the Wei pipe, the exhaust pipe being at the surface of the 28 1^/3814 T A plurality of [predetermined angle tilting secret red vents are formed. 4. The semiconductor device detecting apparatus according to claim 3, wherein the body has a dome shape to ensure smooth suction of impurities and dust through the vacuum pipe. 5. The semiconductor device detecting device of claim 3, wherein the ion supply device is connected to the exhaust pipe to supply ions to prevent electrostatic charge. 6. The semiconductor device testing apparatus according to claim 5, wherein the side air cleaning H step comprises: a flow rate adjustment and a pressure adjustment valve to supply the Wei according to the semiconductor device The flow and pressure of the air of the tube. 7 Each of the semiconductors described in claim 2 of the patent scope includes: the sense of the air, and the use of the material device such as the shouting surface is normally carried on the tray. 8. The semiconductor device testing apparatus of any of clauses 1 to 7, further comprising: a brush cleaner for automatically removing the image before performing an image detection using the image detecting device Contaminants on the surface of the semiconductor device. 9. The semiconductor device testing apparatus of claim 8, wherein the brush cleaning operation is performed when the tray loaded to the associated waste carrier is returned for re-detection. 1 〇 如 如 如 专利 _ 第 第 赖 赖 赖 赖 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 29 a rear cover, the lower surface of the outer cover is formed with -open α, and the upper surface of the cover is formed with a plurality of holes; a plurality of vacuum suction pipes respectively installed into the holes; and - horizontally placed The exhaust pipe of the outer cover_lower opening is adapted to receive a supply to the exhaust pipe. The money pipe is formed on the lower surface thereof with a plurality of exhaust holes formed obliquely at a predetermined angle. The semiconductor cracking detecting device of the invention of claim 2, wherein the semiconductor crack detecting device is provided with a mask member of the lower end opening of the plough cover, and the mask member is configured with ribs. Lowering - the suction space to increase a vacuum suction. The semiconductor device detection device of claim i, wherein the ion supply is connected to the exhaust pipe of the brush cleaner to supply ions to prevent electrostatic charge. 13. The semiconductor device testing apparatus of claim ii, wherein the brush cleaning person further comprises a force adjuster to maintain an appropriate tension with the semiconductor body. 14. A method of detecting a semiconductor device, comprising: carrying a semiconductor device such that a first surface-up tray of the family conductor device is sent from the -to-image detection region; 30 1373814 to the semiconductor device The first surface performs a first image detection; and the semiconductor device is selected as a defective semiconductor device and a normal semiconductor device according to the result of the first image detection; wherein the semiconductor device detection method further comprises: An air cleaning operation is performed on the semiconductor devices carried on the tray before the tray is transported to the first scene > image detection area. 15. The semiconductor device detection method according to claim 14, wherein the half-box device inspection method further comprises: after performing the first image detection, and comparing the semiconductors according to the result of the first image detection Before the device is selected as a defective semiconductor device and a normal semiconductor device: the semiconductor surfaces carried on the tray are inverted upside down such that the second surface of the semiconductor devices faces upward; the second of the semiconductor devices Performing an air cleaning operation on the surface; transferring the tray of the semiconductor device that has passed the air cleaning operation to a second image detecting area; and carrying the same to the second image detecting area The second surfaces of the semiconductor device of the tray perform a second image detection. 16. The method of detecting a semiconductor device according to claim i5, wherein the semiconductor device detecting method further comprises: returning - carrying the semiconductor device selected to be defective to the loader, 1373814 and carrying Performing a brush cleaning operation on the second surfaces of the semiconductor devices that are returned to the tray; inverting the trays carrying the semiconductor devices that are subjected to the brush cleaning operation, such that the semiconductor devices a surface facing upward; performing a brush cleaning operation on the first surfaces of the semiconductor devices; and loading the tray carrying the semiconductor devices that have been cleaned by the brush into the loader After that, an additional image detection is performed. 3232
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