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TWI371654B - Photosensitive resin composition for black matrix - Google Patents

Photosensitive resin composition for black matrix

Info

Publication number
TWI371654B
TWI371654B TW097123021A TW97123021A TWI371654B TW I371654 B TWI371654 B TW I371654B TW 097123021 A TW097123021 A TW 097123021A TW 97123021 A TW97123021 A TW 97123021A TW I371654 B TWI371654 B TW I371654B
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
black matrix
black
matrix
Prior art date
Application number
TW097123021A
Other languages
Chinese (zh)
Other versions
TW201001070A (en
Inventor
Chun Hsien Lee
Hau Wei Liao
Original Assignee
Chi Mei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chi Mei Corp filed Critical Chi Mei Corp
Priority to TW097123021A priority Critical patent/TWI371654B/en
Publication of TW201001070A publication Critical patent/TW201001070A/en
Application granted granted Critical
Publication of TWI371654B publication Critical patent/TWI371654B/en

Links

TW097123021A 2008-06-20 2008-06-20 Photosensitive resin composition for black matrix TWI371654B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW097123021A TWI371654B (en) 2008-06-20 2008-06-20 Photosensitive resin composition for black matrix

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW097123021A TWI371654B (en) 2008-06-20 2008-06-20 Photosensitive resin composition for black matrix

Publications (2)

Publication Number Publication Date
TW201001070A TW201001070A (en) 2010-01-01
TWI371654B true TWI371654B (en) 2012-09-01

Family

ID=44824725

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097123021A TWI371654B (en) 2008-06-20 2008-06-20 Photosensitive resin composition for black matrix

Country Status (1)

Country Link
TW (1) TWI371654B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4994136B2 (en) * 2006-07-26 2012-08-08 富士フイルム株式会社 Photosensitive composition, photosensitive resin transfer film, photospacer production method, liquid crystal display substrate, and liquid crystal display device

Also Published As

Publication number Publication date
TW201001070A (en) 2010-01-01

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