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TWI369589B - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
TWI369589B
TWI369589B TW096124514A TW96124514A TWI369589B TW I369589 B TWI369589 B TW I369589B TW 096124514 A TW096124514 A TW 096124514A TW 96124514 A TW96124514 A TW 96124514A TW I369589 B TWI369589 B TW I369589B
Authority
TW
Taiwan
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
TW096124514A
Other languages
Chinese (zh)
Other versions
TW200813652A (en
Inventor
Andre Bernardus Jeunink
Marcel Koenraad Marie Baggen
Dirk-Jan Bijvoet
Thomas Josephus Maria Castenmiller
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=38948921&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TWI369589(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200813652A publication Critical patent/TW200813652A/en
Application granted granted Critical
Publication of TWI369589B publication Critical patent/TWI369589B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H10P72/76—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096124514A 2006-07-14 2007-07-05 Lithographic apparatus and device manufacturing method TWI369589B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/486,379 US7675607B2 (en) 2006-07-14 2006-07-14 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
TW200813652A TW200813652A (en) 2008-03-16
TWI369589B true TWI369589B (en) 2012-08-01

Family

ID=38948921

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096124514A TWI369589B (en) 2006-07-14 2007-07-05 Lithographic apparatus and device manufacturing method

Country Status (5)

Country Link
US (1) US7675607B2 (en)
JP (1) JP4791421B2 (en)
KR (1) KR100918248B1 (en)
CN (1) CN101105640B (en)
TW (1) TWI369589B (en)

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DE102008041287A1 (en) * 2007-08-24 2009-02-26 Carl Zeiss Smt Ag Actuator arrangement for deforming e.g. lens, of optical arrangement of microlithography device, has actuator devices exerting actuator forces on body until reaching maximum force values, where one value is smaller than other value
NL2003673A (en) * 2008-11-21 2010-05-25 Asml Netherlands Bv Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determing the effect of thermal loads on a patterning device.
NL2006190A (en) * 2010-03-11 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
TWI542952B (en) * 2010-12-02 2016-07-21 Asml控股公司 Patterning device support
WO2012115002A1 (en) * 2011-02-22 2012-08-30 株式会社ニコン Holding device, exposure device and production method for device
KR20130028165A (en) * 2011-06-21 2013-03-19 삼성디스플레이 주식회사 Mask unit
DE102011086513A1 (en) 2011-11-16 2013-05-16 Carl Zeiss Smt Gmbh Projection exposure method for exposure of semiconductor wafer with image of pattern of reticle for manufacturing semiconductor component, involves heating mask corresponding to two-dimensional heating profile by heating device
JP6198837B2 (en) 2012-10-23 2017-09-20 エーエスエムエル ネザーランズ ビー．ブイ． Patterning device operating system and lithographic apparatus
DE102012111114B4 (en) * 2012-11-19 2018-10-04 Ev Group E. Thallner Gmbh Semiconductor processing apparatus and method
US10289007B2 (en) 2014-07-10 2019-05-14 Nikon Corporation Lithography tool having a reticle stage capable of dynamic reticle bending to compensate for distortion
CN104977815B (en) * 2015-07-03 2018-02-23 苏州微影激光技术有限公司 Scan table in write-through exposure system
DE102018220565A1 (en) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Projection exposure system for semiconductor lithography with a semi-active spacer and method for using the semi-active spacer
CN113324894A (en) * 2021-05-31 2021-08-31 海南大学 Experimental device for be used for studying plastics photodegradation
WO2024213378A1 (en) * 2023-04-10 2024-10-17 Asml Netherlands B.V. Systems and methods for clamping a patterning device in a lithography apparatus

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FR2584824B1 (en) * 1985-07-10 1987-09-25 Commissariat Energie Atomique DEFORMABLE MIRROR
US4711438A (en) * 1986-05-08 1987-12-08 Micrion Limited Partnership Mask holding
JPH02310912A (en) * 1989-05-26 1990-12-26 Hitachi Ltd Method and apparatus for exposure
JPH04158364A (en) * 1990-10-23 1992-06-01 Fujitsu Ltd Projection exposing device
JPH06130344A (en) * 1992-10-22 1994-05-13 Toshiba Corp Mask drawing substrate holding device
JPH07263316A (en) * 1994-03-25 1995-10-13 Toshiba Corp X-ray exposure device
JPH07297118A (en) * 1994-04-27 1995-11-10 Canon Inc Substrate, substrate holding method, and apparatus therefor
JPH088173A (en) * 1994-06-16 1996-01-12 Nikon Corp Exposure apparatus and exposure system
JPH0982606A (en) * 1995-09-13 1997-03-28 Nikon Corp Reticle holder
JP3305188B2 (en) * 1996-02-07 2002-07-22 キヤノン株式会社 Master, master holding apparatus, exposure apparatus using the same, and device manufacturing method
JP3648847B2 (en) * 1996-05-20 2005-05-18 株式会社ニコン Mask support mechanism and exposure apparatus using the same
JPH10214780A (en) * 1997-01-28 1998-08-11 Nikon Corp Projection exposure equipment
JP3634539B2 (en) * 1997-02-28 2005-03-30 キヤノン株式会社 Mask holding apparatus, exposure apparatus, device manufacturing method, and mask structure
JP2001023886A (en) * 1999-07-08 2001-01-26 Nikon Corp Sample holding device and exposure device
JP2001148335A (en) * 1999-11-18 2001-05-29 Canon Inc Exposure apparatus and device manufacturing method
TW504605B (en) * 1999-12-03 2002-10-01 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the same, the device and mask
TW508653B (en) * 2000-03-24 2002-11-01 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit manufacturing method
EP1139176B1 (en) * 2000-03-24 2006-05-10 ASML Netherlands B.V. Lithographic apparatus and mask table
US6398373B1 (en) * 2000-08-09 2002-06-04 Asml Us, Inc. Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
US6947195B2 (en) * 2001-01-18 2005-09-20 Ricoh Company, Ltd. Optical modulator, optical modulator manufacturing method, light information processing apparatus including optical modulator, image formation apparatus including optical modulator, and image projection and display apparatus including optical modulator
JP4196675B2 (en) * 2001-02-13 2008-12-17 株式会社ニコン Holding apparatus, holding method, exposure apparatus, and device manufacturing method
JP2003133233A (en) * 2001-10-23 2003-05-09 Hitachi Kokusai Electric Inc Substrate processing equipment
TWI288302B (en) * 2001-11-09 2007-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6806943B2 (en) * 2002-08-09 2004-10-19 International Business Machines Corporation Mask clamping device
JP2004153122A (en) * 2002-10-31 2004-05-27 Nikon Corp Aligner
CN1311301C (en) * 2002-12-23 2007-04-18 Asml荷兰有限公司 Photoetching projection device
KR101087516B1 (en) * 2003-06-04 2011-11-28 가부시키가이샤 니콘 Stage apparatus, fixing method, exposure apparatus, exposure method, and device manufacturing method
KR100603326B1 (en) * 2003-12-09 2006-07-20 삼성에스디아이 주식회사 Mask and mask frame assembly device and assembly method
US7019816B2 (en) * 2003-12-17 2006-03-28 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7119884B2 (en) * 2003-12-24 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006178318A (en) * 2004-12-24 2006-07-06 Nsk Ltd Exposure equipment
US7436484B2 (en) * 2004-12-28 2008-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7459701B2 (en) * 2005-06-08 2008-12-02 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method
US7239376B2 (en) * 2005-07-27 2007-07-03 International Business Machines Corporation Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices
US7884919B2 (en) * 2006-02-09 2011-02-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US7675607B2 (en) 2010-03-09
KR20080007185A (en) 2008-01-17
CN101105640B (en) 2010-12-29
JP4791421B2 (en) 2011-10-12
TW200813652A (en) 2008-03-16
CN101105640A (en) 2008-01-16
JP2008021997A (en) 2008-01-31
KR100918248B1 (en) 2009-09-21
US20080013068A1 (en) 2008-01-17

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees