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TWI368858B - A method for opc correction - Google Patents

A method for opc correction

Info

Publication number
TWI368858B
TWI368858B TW097127103A TW97127103A TWI368858B TW I368858 B TWI368858 B TW I368858B TW 097127103 A TW097127103 A TW 097127103A TW 97127103 A TW97127103 A TW 97127103A TW I368858 B TWI368858 B TW I368858B
Authority
TW
Taiwan
Prior art keywords
opc correction
opc
correction
Prior art date
Application number
TW097127103A
Other languages
Chinese (zh)
Other versions
TW201005564A (en
Original Assignee
Vanguard Int Semiconduct Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vanguard Int Semiconduct Corp filed Critical Vanguard Int Semiconduct Corp
Priority to TW097127103A priority Critical patent/TWI368858B/en
Publication of TW201005564A publication Critical patent/TW201005564A/en
Application granted granted Critical
Publication of TWI368858B publication Critical patent/TWI368858B/en

Links

TW097127103A 2008-07-17 2008-07-17 A method for opc correction TWI368858B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW097127103A TWI368858B (en) 2008-07-17 2008-07-17 A method for opc correction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW097127103A TWI368858B (en) 2008-07-17 2008-07-17 A method for opc correction

Publications (2)

Publication Number Publication Date
TW201005564A TW201005564A (en) 2010-02-01
TWI368858B true TWI368858B (en) 2012-07-21

Family

ID=44826339

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097127103A TWI368858B (en) 2008-07-17 2008-07-17 A method for opc correction

Country Status (1)

Country Link
TW (1) TWI368858B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9747408B2 (en) 2015-08-21 2017-08-29 Taiwan Semiconductor Manufacturing Company, Ltd. Generating final mask pattern by performing inverse beam technology process
US10527928B2 (en) * 2016-12-20 2020-01-07 Taiwan Semiconductor Manufacturing Co., Ltd. Optical proximity correction methodology using pattern classification for target placement

Also Published As

Publication number Publication date
TW201005564A (en) 2010-02-01

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