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TWI368765B - Color photo-resist with gold nano-particles and color filters made thereby - Google Patents

Color photo-resist with gold nano-particles and color filters made thereby

Info

Publication number
TWI368765B
TWI368765B TW096121419A TW96121419A TWI368765B TW I368765 B TWI368765 B TW I368765B TW 096121419 A TW096121419 A TW 096121419A TW 96121419 A TW96121419 A TW 96121419A TW I368765 B TWI368765 B TW I368765B
Authority
TW
Taiwan
Prior art keywords
color
resist
particles
gold nano
filters made
Prior art date
Application number
TW096121419A
Other languages
English (en)
Other versions
TW200848805A (en
Inventor
Weifang Lin
Chienchih Lin
I Shuo Liu
Original Assignee
Chimei Innolux Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chimei Innolux Corp filed Critical Chimei Innolux Corp
Priority to TW096121419A priority Critical patent/TWI368765B/zh
Priority to US12/137,686 priority patent/US8211597B2/en
Publication of TW200848805A publication Critical patent/TW200848805A/zh
Application granted granted Critical
Publication of TWI368765B publication Critical patent/TWI368765B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/14—Treatment of metallic powder
    • B22F1/148—Agglomerating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/81—Of specified metal or metal alloy composition

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
TW096121419A 2007-06-13 2007-06-13 Color photo-resist with gold nano-particles and color filters made thereby TWI368765B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW096121419A TWI368765B (en) 2007-06-13 2007-06-13 Color photo-resist with gold nano-particles and color filters made thereby
US12/137,686 US8211597B2 (en) 2007-06-13 2008-06-12 Color photoresist with gold nanoparticles and color filters made thereby

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW096121419A TWI368765B (en) 2007-06-13 2007-06-13 Color photo-resist with gold nano-particles and color filters made thereby

Publications (2)

Publication Number Publication Date
TW200848805A TW200848805A (en) 2008-12-16
TWI368765B true TWI368765B (en) 2012-07-21

Family

ID=40132651

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096121419A TWI368765B (en) 2007-06-13 2007-06-13 Color photo-resist with gold nano-particles and color filters made thereby

Country Status (2)

Country Link
US (1) US8211597B2 (zh)
TW (1) TWI368765B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2675421A2 (en) 2011-02-15 2013-12-25 3M Innovative Properties Company Dental compositions comprising mixture of isocyanurate monomer and tricyclodecane monomer
US9104100B2 (en) 2011-06-08 2015-08-11 3M Innovative Properties Company Photoresists containing polymer-tethered nanoparticles
TWI476953B (zh) * 2012-08-10 2015-03-11 Univ Nat Taiwan 半導體發光元件及其製作方法
KR102342767B1 (ko) 2015-01-09 2021-12-23 삼성디스플레이 주식회사 컬러필터 기판 및 이를 포함하는 표시패널
US10983432B2 (en) 2015-08-24 2021-04-20 Samsung Electronics Co., Ltd. Photosensitive compositions, preparation methods thereof, quantum dot polymer composite prepared therefrom
KR102631400B1 (ko) 2015-10-22 2024-01-29 삼성전자주식회사 감광성 조성물, 이로부터 제조된 양자점-폴리머 복합체 패턴, 및 이를 포함하는 전자 소자
KR102527764B1 (ko) * 2015-12-17 2023-05-02 삼성전자주식회사 감광성 조성물, 이를 제조하기 위한 방법, 및 이로부터 제조된 양자점-폴리머 복합체 패턴
CN105503755B (zh) * 2016-01-10 2018-10-30 江苏博砚电子科技有限公司 一种彩色光阻用赛克基丙烯酸酯树脂及其制备方法
KR20190042000A (ko) * 2016-08-24 2019-04-23 도레이 카부시키가이샤 감광성 페이스트, 세라믹 그린 시트, 전자 부품, 패턴의 제조 방법 및 전자 부품의 제조 방법
US10752834B2 (en) * 2018-05-17 2020-08-25 Chung Yuan Christian University Composite fluorescent gold nanoclusters with high quantum yield and method for manufacturing the same
JP2019199555A (ja) * 2018-05-17 2019-11-21 中原大學 高い量子収量を有する複合蛍光金ナノクラスターおよびその製造方法
US10756243B1 (en) * 2019-03-04 2020-08-25 Chung Yuan Christian University Light-emitting diode package structure and method for manufacturing the same
JP2020145240A (ja) * 2019-03-04 2020-09-10 中原大學 発光ダイオードパッケージ構造およびそれを製造する方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6858372B2 (en) * 2003-03-24 2005-02-22 The United States Of America As Represented By The Secretary Of The Navy Resist composition with enhanced X-ray and electron sensitivity
US6929675B1 (en) * 2003-04-24 2005-08-16 Sandia Corporation Synthesis metal nanoparticle
US7547347B2 (en) * 2005-05-13 2009-06-16 University Of Rochester Synthesis of nano-materials in ionic liquids
CN100437160C (zh) * 2005-07-22 2008-11-26 鸿富锦精密工业（深圳）有限公司 彩色光阻的制造方法
WO2007113107A1 (en) * 2006-03-30 2007-10-11 Ciba Holding Inc. Photosensitive resist composition for color filters for use in electronic paper display devices

Also Published As

Publication number Publication date
US20080311488A1 (en) 2008-12-18
US8211597B2 (en) 2012-07-03
TW200848805A (en) 2008-12-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees