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TWI365921B - Chemical vapor deposition apparatus - Google Patents

Chemical vapor deposition apparatus

Info

Publication number
TWI365921B
TWI365921B TW096126777A TW96126777A TWI365921B TW I365921 B TWI365921 B TW I365921B TW 096126777 A TW096126777 A TW 096126777A TW 96126777 A TW96126777 A TW 96126777A TW I365921 B TWI365921 B TW I365921B
Authority
TW
Taiwan
Prior art keywords
vapor deposition
chemical vapor
deposition apparatus
chemical
vapor
Prior art date
Application number
TW096126777A
Other languages
Chinese (zh)
Other versions
TW200808999A (en
Inventor
Sang-Mun Lee
Sang-Lae Jang
Original Assignee
Sfa Engineering Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sfa Engineering Corp filed Critical Sfa Engineering Corp
Publication of TW200808999A publication Critical patent/TW200808999A/en
Application granted granted Critical
Publication of TWI365921B publication Critical patent/TWI365921B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
TW096126777A 2006-08-03 2007-07-23 Chemical vapor deposition apparatus TWI365921B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060073506A KR100757356B1 (en) 2006-08-03 2006-08-03 Chemical vapor deposition

Publications (2)

Publication Number Publication Date
TW200808999A TW200808999A (en) 2008-02-16
TWI365921B true TWI365921B (en) 2012-06-11

Family

ID=38737267

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096126777A TWI365921B (en) 2006-08-03 2007-07-23 Chemical vapor deposition apparatus

Country Status (3)

Country Link
KR (1) KR100757356B1 (en)
CN (1) CN101126155B (en)
TW (1) TWI365921B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101019530B1 (en) * 2008-05-29 2011-03-09 주식회사 에스에프에이 Chemical vapor deposition apparatus
TW201311926A (en) * 2011-09-05 2013-03-16 Sfa Engineering Corp Chemical vapor deposition apparatus for flat display

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4906171A (en) * 1988-06-17 1990-03-06 Gencorp Inc. Directed flow die assembly
JPH07174273A (en) * 1993-12-17 1995-07-11 Yukio Itagaki Universal joint for pipe
KR100205541B1 (en) * 1995-12-18 1999-07-01 윤종용 Gas Inlet Structure of Chemical Vapor Deposition Equipment
US7163587B2 (en) * 2002-02-08 2007-01-16 Axcelis Technologies, Inc. Reactor assembly and processing method
KR100541559B1 (en) 2004-01-29 2006-01-11 삼성전자주식회사 Batch Deposition Equipment with Gland Part

Also Published As

Publication number Publication date
CN101126155A (en) 2008-02-20
CN101126155B (en) 2011-06-22
TW200808999A (en) 2008-02-16
KR100757356B1 (en) 2007-09-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees