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TWI365535B - Thin film transistor, method of fabricating the same, organic light emitting diode display device including the same and method of fabricating the same - Google Patents

Thin film transistor, method of fabricating the same, organic light emitting diode display device including the same and method of fabricating the same

Info

Publication number
TWI365535B
TWI365535B TW097121996A TW97121996A TWI365535B TW I365535 B TWI365535 B TW I365535B TW 097121996 A TW097121996 A TW 097121996A TW 97121996 A TW97121996 A TW 97121996A TW I365535 B TWI365535 B TW I365535B
Authority
TW
Taiwan
Prior art keywords
same
fabricating
light emitting
display device
thin film
Prior art date
Application number
TW097121996A
Other languages
English (en)
Other versions
TW200901460A (en
Inventor
Yang Tae-Hoon
Park Byoung-Keon
Seo Jin-Wook
Lee Ki-Yong
Lee Kil-Won
Original Assignee
Samsung Mobile Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Mobile Display Co Ltd filed Critical Samsung Mobile Display Co Ltd
Publication of TW200901460A publication Critical patent/TW200901460A/zh
Application granted granted Critical
Publication of TWI365535B publication Critical patent/TWI365535B/zh

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6757Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01Manufacture or treatment
    • H10D86/021Manufacture or treatment of multiple TFTs
    • H10D86/0221Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies
    • H10D86/0223Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies comprising crystallisation of amorphous, microcrystalline or polycrystalline semiconductor materials
    • H10D86/0225Manufacture or treatment of multiple TFTs comprising manufacture, treatment or patterning of TFT semiconductor bodies comprising crystallisation of amorphous, microcrystalline or polycrystalline semiconductor materials using crystallisation-promoting species, e.g. using a Ni catalyst
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10P14/3238
    • H10P14/3411
    • H10P14/3806
TW097121996A 2007-06-27 2008-06-12 Thin film transistor, method of fabricating the same, organic light emitting diode display device including the same and method of fabricating the same TWI365535B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070063680A KR100882909B1 (ko) 2007-06-27 2007-06-27 박막트랜지스터, 그의 제조 방법, 이를 포함하는유기전계발광표시장치, 및 그의 제조 방법

Publications (2)

Publication Number Publication Date
TW200901460A TW200901460A (en) 2009-01-01
TWI365535B true TWI365535B (en) 2012-06-01

Family

ID=39791342

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097121996A TWI365535B (en) 2007-06-27 2008-06-12 Thin film transistor, method of fabricating the same, organic light emitting diode display device including the same and method of fabricating the same

Country Status (6)

Country Link
US (1) US8044401B2 (zh)
EP (1) EP2009695A3 (zh)
JP (1) JP5059703B2 (zh)
KR (1) KR100882909B1 (zh)
CN (1) CN101335302B (zh)
TW (1) TWI365535B (zh)

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KR101137391B1 (ko) * 2010-03-24 2012-04-20 삼성모바일디스플레이주식회사 박막 트랜지스터를 갖는 기판, 이를 제조하는 방법, 및 상기 박막 트랜지스터를 갖는 기판을 구비하는 유기 발광 표시 장치
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KR101720533B1 (ko) * 2010-08-31 2017-04-03 삼성디스플레이 주식회사 다결정 실리콘층의 제조 방법, 상기 다결정 실리콘층 제조 방법을 포함하는 박막 트랜지스터의 제조 방법, 상기 방법에 의해 제조된 박막 트랜지스터, 및 상기 박막 트랜지스터를 포함하는 유기 발광 디스플레이 장치
KR101809661B1 (ko) * 2011-06-03 2017-12-18 삼성디스플레이 주식회사 박막 트랜지스터, 그 제조 방법 및 이를 포함하는 유기 발광 표시 장치
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US9601557B2 (en) * 2012-11-16 2017-03-21 Apple Inc. Flexible display
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KR100666564B1 (ko) * 2004-08-04 2007-01-09 삼성에스디아이 주식회사 박막트랜지스터의 제조 방법
KR100611766B1 (ko) * 2004-08-24 2006-08-10 삼성에스디아이 주식회사 박막트랜지스터 제조 방법
KR100659758B1 (ko) 2004-09-22 2006-12-19 삼성에스디아이 주식회사 박막트랜지스터 제조 방법
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Also Published As

Publication number Publication date
KR100882909B1 (ko) 2009-02-10
JP5059703B2 (ja) 2012-10-31
TW200901460A (en) 2009-01-01
CN101335302A (zh) 2008-12-31
US8044401B2 (en) 2011-10-25
CN101335302B (zh) 2012-08-29
JP2009010391A (ja) 2009-01-15
US20090001380A1 (en) 2009-01-01
KR20080114281A (ko) 2008-12-31
EP2009695A2 (en) 2008-12-31
EP2009695A3 (en) 2010-06-30

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