[go: up one dir, main page]

TWI365352B - Method for managing light exposure mask - Google Patents

Method for managing light exposure mask

Info

Publication number
TWI365352B
TWI365352B TW096130684A TW96130684A TWI365352B TW I365352 B TWI365352 B TW I365352B TW 096130684 A TW096130684 A TW 096130684A TW 96130684 A TW96130684 A TW 96130684A TW I365352 B TWI365352 B TW I365352B
Authority
TW
Taiwan
Prior art keywords
light exposure
exposure mask
managing light
managing
mask
Prior art date
Application number
TW096130684A
Other languages
English (en)
Other versions
TW200832049A (en
Inventor
Shimada Shu
Yamamoto Hideki
Naitoh Akihiko
Original Assignee
Dainippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Printing Co Ltd filed Critical Dainippon Printing Co Ltd
Publication of TW200832049A publication Critical patent/TW200832049A/zh
Application granted granted Critical
Publication of TWI365352B publication Critical patent/TWI365352B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096130684A 2006-08-22 2007-08-20 Method for managing light exposure mask TWI365352B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006225467A JP4863064B2 (ja) 2006-08-22 2006-08-22 露光用マスクの管理方法

Publications (2)

Publication Number Publication Date
TW200832049A TW200832049A (en) 2008-08-01
TWI365352B true TWI365352B (en) 2012-06-01

Family

ID=38515797

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096130684A TWI365352B (en) 2006-08-22 2007-08-20 Method for managing light exposure mask

Country Status (5)

Country Link
US (1) US8158311B2 (zh)
EP (1) EP1892571B1 (zh)
JP (1) JP4863064B2 (zh)
DE (1) DE602007000758D1 (zh)
TW (1) TWI365352B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101699352B (zh) * 2009-11-06 2011-10-19 常州瑞择微电子科技有限公司 去除光掩模中的硫酸根的方法
JP5953715B2 (ja) * 2010-12-01 2016-07-20 大日本印刷株式会社 露光用マスクの表面イオン濃度のモニター方法およびモニターシステム、該モニターシステムを備えた露光用マスク洗浄装置、並びに露光用マスクの製造方法
KR102495226B1 (ko) * 2021-08-20 2023-02-06 에스케이엔펄스 주식회사 블랭크 마스크용 기판의 세정방법, 블랭크 마스크용 기판 및 이를 포함하는 블랭크 마스크
KR102526512B1 (ko) * 2021-11-29 2023-04-26 에스케이엔펄스 주식회사 블랭크 마스크용 적층체 및 이의 제조방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3920429B2 (ja) * 1997-12-02 2007-05-30 株式会社ルネサステクノロジ 位相シフトフォトマスクの洗浄方法および洗浄装置
US7304720B2 (en) 2002-02-22 2007-12-04 Asml Holding N.V. System for using a two part cover for protecting a reticle
JP4267874B2 (ja) * 2002-07-18 2009-05-27 Ｈｏｙａ株式会社 フォトマスクの製造方法
JP2005308896A (ja) * 2004-04-19 2005-11-04 Fujitsu Ltd フォトマスク及びその管理方法
JP4475510B2 (ja) 2004-06-25 2010-06-09 Ｈｏｙａ株式会社 リソグラフィーマスクの製造方法、リソグラフィーマスク、及びリソグラフィーマスクの露光方法

Also Published As

Publication number Publication date
US20080102381A1 (en) 2008-05-01
JP2008051880A (ja) 2008-03-06
EP1892571A1 (en) 2008-02-27
JP4863064B2 (ja) 2012-01-25
DE602007000758D1 (de) 2009-05-07
TW200832049A (en) 2008-08-01
EP1892571B1 (en) 2009-03-25
US8158311B2 (en) 2012-04-17

Similar Documents

Publication Publication Date Title
TWI366065B (en) Method for cleaning photo mask
TWI368461B (en) Euv light source
EP1986221A4 (en) EXPOSURE METHOD, EXPOSURE DEVICE, PHOTOMASK AND PHOTO MASK MANUFACTURING METHOD
GB0906954D0 (en) Improving image mask
AU315297S (en) Frame for respiratory mask
EP2008132A4 (en) OPTICAL LIGHTING LIGHT GUIDING DEVICES
AU317292S (en) Mask frame
EP2008130A4 (en) METHOD FOR PRODUCING AN OPTICAL FILM
SG10201708650WA (en) Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
EP2123442A4 (en) OPTICAL FILM
AU310242S (en) Frame for respiratory mask
IL176369A0 (en) A system & method for preventing photography
IL192667A0 (en) Catadioptric optical system for scatterometry
AU312040S (en) Mask frame
EP1986220A4 (en) OPTICAL PROJECTION SYSTEM, EXPOSURE DEVICE AND METHOD, DISPLAY MANUFACTURING METHOD, MASK, AND MASK MANUFACTURING METHOD
EP2010948A4 (en) HANDLING OF ZINC-BASED FILM FOR OPTICAL FILTER
GB2436294B (en) Laryngeal mask assemblies
EP2001042A4 (en) OPTICAL LIGHTING SYSTEM, EXPOSURE SYSTEM AND DEVICE MANUFACTURING METHOD
EP1843385A4 (en) OPTICAL PROJECTION SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD
TWI365352B (en) Method for managing light exposure mask
EP1983370A4 (en) FILM FOR HIGH DIGITAL OPENING EXPOSURE DEVICE
GB2443095B (en) Laryngeal mask assemblies
TWI372950B (en) Method for forming patterns using single mask
TWI367404B (en) Exposure method
GB0616717D0 (en) Photographic apparatus

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees