TWI352827B - Integrated optical film - Google Patents
Integrated optical film Download PDFInfo
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- TWI352827B TWI352827B TW97101276A TW97101276A TWI352827B TW I352827 B TWI352827 B TW I352827B TW 97101276 A TW97101276 A TW 97101276A TW 97101276 A TW97101276 A TW 97101276A TW I352827 B TWI352827 B TW I352827B
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Landscapes
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Description
1352827 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種光學膜,尤指一種應用於液晶顯示器 之光學膜。 【先前技術】 液晶面板本身並不發光’因此作為亮度來源之背光模組 為LCD顯示功能的重要元件,且對提高液晶顯示器亮度而1352827 IX. Description of the Invention: [Technical Field] The present invention relates to an optical film, and more particularly to an optical film applied to a liquid crystal display. [Prior Art] The liquid crystal panel itself does not emit light. Therefore, the backlight module as a brightness source is an important component of the LCD display function, and the brightness of the liquid crystal display is improved.
言非常重要。目前,在背光模組中利用各式各樣之光學 臈’提供一種能提高LCD面板亮度以使光源做最有效率之 應用,而不需更動任何元件設計或消耗額外能源的做法, 已成為最經濟與簡便的解決方案。圖〗為背光模組所含各 種光學膜之簡單示意圖。如圖1所示’一般背光模組所含 光學膜係包含配置於導光板(light guide)(2)下方之反射膜 (1);及配置於導光板(2)上方之其它光學膜,其由下至上 依序為:擴散膜(3)、聚光膜(4)及(5)及保護性擴散膜(6)。 擴政膜主要功能為提供液晶顯示器均勻之面光源。聚光 膜業界習稱為增亮臈(Brightness Enhancement FUm)或稜鏡 片(prism film),聚光膜主要功能為藉由折射與内部全反射 將散亂的光線收集,並集中至約±35度的正視角(On·— 方向’以提高LCD的輝度。—般常用之聚光膜係利用規則 排列之線性稜鏡柱狀結構來達到聚光效果。 膜如圖2所示,纟包含一基材21及位於基材21 上方之複數個稜鏡結構22,料錢結構彼此互相平行, 其中各稜鏡結構係H傾斜表面所構成,此:傾斜表面 128054.doc 1352827 於稜鏡頂部相交形成峰23’且各自與相鄰稜鏡之另一傾斜 表面於稜鏡底部相交形成谷24。由於習知聚光膜為固定寬 度之規則條狀結構,所以容易與來自顯示器中其它膜片之 反射或折射光線或該聚光片本身之其它反射或折射光線產 生光學干涉現象,導致在外觀上出現moire或者牛頓環。 此外,如圖3所示,習知聚光膜係各自獨立之稜鏡柱狀結 構’在此構造下仍有大部分的光線無法集中至約±35度的 正視角射出,例如,光線31及32之出光即無集中至約±35 度的正視角之範圍内,無法被有效利用。因此,如何使通 過聚光膜之光線作更有效的利用已為相關產業亟待解決之 課題。 已知可於聚光膜上配置保護性擴散膜(或稱為上擴散 膜),以改善上述光學干涉現象,且防止聚光膜與面板或 其他膜片在輸送時產生振動而引起互相損傷。惟此方法之 缺點為成本增加,且將使背光模組變複雜。此外,除需利 用保護性擴散臈防止聚光膜與面板接觸造成刮傷之外,在 組裝之前,亦需貼附保護膜以避免聚光膜在儲存及/或運 达期間可能造成的損傷。使用保護性擴散膜及保護臈,比 相對提高所需成本。 、白 【發明内容】 有鑑於此,本發明提供一種光學膜以改良上述缺點 ϋ二ί =涉現象’兼顧輝度’且可避免光學膜與其他 學膜或面板間相互接觸所造成的刮傷,進而可省去 上擴散膜或貼附保護膜之成本。 用 12B054.doc 1352827 一^發明乃提供—種光學膜,包含—基材及位於該基材之 面上之微結構層,其中該微結構層包含一或多個第一 區域,該第一區域包含至少-種多峰柱狀結構,該多峰柱 狀、'"構係由至少兩個柱狀結構彼此重疊所形成之聯集結構 且該多峰柱狀結構t最大高度處為弧形柱狀結構所構成; 且該微結構層視需要包含一或多個第二區域該第二區域 包含至少一種單峰稜鏡柱狀結構。 【實施方式】 在本文中,多峰柱狀結構係指由至少兩個柱狀結構彼此 重疊所形成之聯集結構,且任何兩相鄰柱狀結構間之谷線 之高度係為此二相鄰柱狀結構中高度較低者之高度之3〇% 至 95%。 在本文中’ |峰稜鏡柱狀結構係指由單一個棱鏡柱狀結 構所構成且僅具有單-之峰之結構’該單峰棱鏡柱狀結構 與其所相鄰柱狀結構間之谷線之高度係為構成該單峰稜鏡 柱狀結構與其所相鄰柱狀結構中高度較低者之高度之〇% 至29.9%。當相鄰兩稜鏡柱狀結構間之谷線之高度落於上 述範圍時,在本發明中,此二稜鏡柱狀結構係各自被視為 單峰稜鏡柱狀結構。 在本文中,谷線係指由相鄰兩柱狀結構之相鄰側面相接 所形成之線。 在本文中,柱狀結構之高度係指為該柱·狀結構之峰相對 該柱狀結構底部之垂直距離。 在本文中,谷線之高度係指該谷線相對其所相鄰之兩柱 128054.doc -8. 1352827 狀結構底部之垂直距離β 在本文中,柱狀結構之寬度係指 鄰之兩谷間之距離。 击本發明所使用之稜鏡柱狀結構係為本發明所屬技術領, 中具有通常知識者所熟知者,其係、由兩個傾斜平面所右 成,此二傾斜平面於稜鏡頂部相交形成峰且可各自與木 鄰柱狀結構之另-傾斜表面於底部相交形成谷。、The words are very important. At present, the use of a wide variety of optical 臈 in the backlight module provides an application that can increase the brightness of the LCD panel to make the light source the most efficient, without the need to change any component design or consume additional energy. Economical and simple solution. Figure 〖 is a simple schematic diagram of various optical films contained in the backlight module. As shown in FIG. 1 , the optical film included in the general backlight module includes a reflective film (1) disposed under the light guide (2); and other optical films disposed above the light guide plate (2). From bottom to top, the order is: diffusion film (3), concentrating film (4) and (5) and protective diffusion film (6). The main function of the expansion film is to provide a uniform surface light source for the liquid crystal display. The concentrating film industry is known as Brightness Enhancement FUm or prism film. The main function of the concentrating film is to collect scattered light by refraction and internal total reflection, and concentrate it to about ±35 degrees. The positive viewing angle (On·—direction' to increase the brightness of the LCD. The commonly used concentrating film uses a linear columnar structure arranged regularly to achieve a concentrating effect. The film is shown in Figure 2, and the 纟 contains a base. The material 21 and the plurality of 稜鏡 structures 22 located above the substrate 21, the money structure are parallel to each other, wherein each 稜鏡 structure H is formed by an inclined surface, and the inclined surface 128054.doc 1352827 intersects at the top of the raft to form a peak. 23' and each of the other inclined surfaces of the adjacent turns intersect at the bottom of the crucible to form a valley 24. Since the conventional light collecting film is a regular strip structure of a fixed width, it is easy to reflect or refract light with other films from the display. Or other reflected or refracted light of the concentrating sheet itself produces an optical interference phenomenon, resulting in the appearance of a moire or Newton ring. Further, as shown in FIG. 3, the conventional concentrating film is independent of the rib. The mirror-column structure 'in this configuration, most of the light is still unable to concentrate to a positive viewing angle of about ±35 degrees. For example, the light rays 31 and 32 are not concentrated to a positive viewing angle of about ±35 degrees. It cannot be effectively utilized. Therefore, how to make the light through the concentrating film more effective has been an urgent problem for the related industry. It is known that a protective diffusion film (or an upper diffusion film) can be disposed on the concentrating film. In order to improve the above optical interference phenomenon, and prevent the concentrating film and the panel or other diaphragm from vibrating during transportation to cause mutual damage. However, the disadvantage of this method is that the cost is increased, and the backlight module is complicated. It is necessary to use protective diffusion to prevent the concentrating film from being scratched by contact with the panel. Before assembly, a protective film should also be attached to avoid damage that may occur during storage and/or transport of the concentrating film. The diffusion film and the protective ruthenium are relatively higher than the required cost. [Invention] In view of the above, the present invention provides an optical film to improve the above-mentioned shortcomings. Moreover, the scratch caused by the contact between the optical film and other film or panel can be avoided, thereby eliminating the cost of the upper diffusion film or the protective film. The optical film is provided by the invention of 12B054.doc 1352827. Including a substrate and a microstructure layer on a surface of the substrate, wherein the microstructure layer comprises one or more first regions, the first region comprising at least one multimodal columnar structure, the multimodal column And a '" structure consisting of a union structure formed by overlapping at least two columnar structures and a maximum height of the multi-peak columnar structure is an arcuate columnar structure; and the microstructure layer includes one as needed Or a plurality of second regions, the second region comprising at least one unimodal columnar structure. [Embodiment] Herein, the multimodal columnar structure refers to a union formed by overlapping at least two columnar structures with each other. The height of the valley line between any two adjacent columnar structures is between 3% and 95% of the height of the lower of the two adjacent columnar structures. In the present context, the term "peak-column-like column structure" refers to a structure composed of a single prism-column structure and having only a single-peak structure. The valley line between the single-peak prism columnar structure and its adjacent columnar structure The height is 〇% to 29.9% of the height of the lower one of the unimodal columnar structure and its adjacent columnar structure. When the height of the valley line between the adjacent two columnar structures falls within the above range, in the present invention, the two columnar structures are each regarded as a unimodal columnar structure. As used herein, valley line refers to a line formed by the adjacent sides of adjacent two columnar structures. As used herein, the height of the columnar structure refers to the vertical distance of the peak of the columnar structure relative to the bottom of the columnar structure. In this context, the height of the valley line refers to the vertical distance of the valley line relative to the two adjacent columns 128054.doc -8. 1352827. The width of the columnar structure refers to the valley between the two adjacent columns. The distance. The columnar structure used in the present invention is the technical subject of the present invention, and is well known to those skilled in the art, and is formed by two inclined planes which are formed by two oblique planes intersecting at the top of the crucible. The peaks may each form a valley with a further inclined surface of the wood-like columnar structure at the bottom. ,
本發明所使用之弧形柱狀結構係、為本發明所屬技術領域 中具有通常知識者所熟知者,其係由兩個傾斜平面所構 成,此二傾斜平面頂部相交處係鈍化形成一曲面且此二 傾斜平面可各自與相鄰柱狀結構之另—傾斜表面於底部: 交形成谷。 在本文中,弧形柱狀結構頂部曲面之最高處係定義為該 弧形柱狀結搆之峰,弧形柱狀結構之高度係指弧形柱狀結 構之峰相對其底部之垂直距離。The curved columnar structure used in the present invention is well known to those of ordinary skill in the art to which the present invention is composed of two inclined planes, the intersection of the tops of the two inclined planes being passivated to form a curved surface and The two inclined planes may each have an additional inclined surface to the bottom of the adjacent columnar structure: the intersection forms a valley. In this context, the highest point of the top surface of the curved columnar structure is defined as the peak of the curved columnar structure, and the height of the curved columnar structure refers to the vertical distance of the peak of the curved columnar structure relative to the bottom thereof.
與該柱狀結構兩側面相 在本文中,弧形柱狀結構二傾斜平面延伸相交之角度係 定義為該弧形柱狀結構之頂角角度。 本發明光學膜所使用之基材,可為任何本發明所屬技術 領域具有通常知識者所已知者,例如玻璃或塑膠。上述塑 膠基材並無待殊限制’其例如但不限於聚酯樹脂(polyester resin) ’ 如聚對苯二甲酸乙二醋(p〇iyethyiene terephthalate, PET)或1奈一曱酸乙二醋(polyethylene naphthalate, PEN);聚丙婦酸酯樹脂(p〇iyacryiate resin),如聚曱基丙 稀酸曱酯(polymethyl methacrylate,PMMA);聚烯烴樹脂 128054.doc 1352827 (polyolefin resin),如聚乙烯(PE)或聚丙烯(pp);聚苯乙烯 樹脂(polystyrene resin);聚環烯烴樹脂(p〇丨ycycI〇〇iefin resin),聚酿亞胺樹脂(p〇iyjmide resin);聚碳酸醋樹脂 (polycarbonate resin);聚胺基甲酸酯樹脂(p〇lyurethane resin);三醋酸纖’維素(triacetate ceuui〇se,TAC);聚乳酸 (Polylactic acid);或彼等之混合物。較佳為聚對苯二甲酸乙 一 Sa、聚甲基丙婦酸f酯、聚環婦烴樹脂、三醋酸纖維 素、聚乳酸或其混合物’更佳為聚對苯二甲酸乙二酯。基 材之厚度通常取決於所欲得光學產品的需求,其較佳介於 約50微米至約300微米之間。 本發明光學膜之微結構層可由任何折射率大於空氣折射 率之樹脂所構成。一般而言,折射率越高,效果越好。用 以形成該微結構層之樹脂為本發明所屬技術領域中具有通 常知識者所熟知者,例如,熱硬化樹脂或紫外線硬化樹 脂,較佳為紫外線硬化樹脂。可用以構成上述紫外線硬化 樹脂之單體例如但不限於丙烯酸酯類單體。上述丙烯酸酯 類單體之種類例如但不限於丙烯酸酯、甲基丙烯酸酯、胺 基甲酸酯丙烯酸酯(Urethane acrylate)、聚醋丙烯酸酯 (p y ster acrylate)、環氡丙稀酸酯(ep〇xy acryiate)或其混 合,較佳為丙晞酸酯或甲基丙烯酸酯。此外,上述丙烯酸 酿類單體可具有-❹個官能基,較佳具有多官能基。 適用於本發明之丙稀酸醋類單體之實例例如it自包括 (曱基)丙稀酸S旨、三丙二醇基)丙稀㈣(咖咐^ 咖01 di(meth)aCryl叫、Μ-丁二醇二(甲基)丙稀酸酿 128054.doc 1352827In contrast to the two sides of the columnar structure, the angle at which the arcuate columnar structures extend perpendicular to the inclined plane is defined as the apex angle of the arcuate columnar structure. The substrate used in the optical film of the present invention may be any one known to those skilled in the art to which the present invention pertains, such as glass or plastic. The above plastic substrate is not particularly limited 'for example, but not limited to, a polyester resin such as polyethylene terephthalate (PET) or ethyl phthalate (1). Polyethylene naphthalate, PEN); p〇iyacryiate resin, such as polymethyl methacrylate (PMMA); polyolefin resin 128054.doc 1352827 (polyolefin resin), such as polyethylene ( PE) or polypropylene (pp); polystyrene resin; polycyclic olefin resin (p〇丨ycycI〇〇iefin resin), polystyrene resin (p〇iyjmide resin); polycarbonate resin ( Polycarbonate resin; p〇lyurethane resin; triacetate ceuui〇se (TAC); polylactic acid; or a mixture thereof. Preferably, polyethylene terephthalate, Sa, polymethyl propyl ketone, polyglycol resin, cellulose triacetate, polylactic acid or a mixture thereof is more preferably polyethylene terephthalate. The thickness of the substrate will generally depend on the desired optical product requirements, preferably between about 50 microns and about 300 microns. The microstructure layer of the optical film of the present invention may be composed of any resin having a refractive index greater than that of air. In general, the higher the refractive index, the better the effect. The resin used to form the microstructured layer is well known to those skilled in the art, for example, a thermosetting resin or an ultraviolet curable resin, preferably an ultraviolet curable resin. A monomer which can be used to constitute the above ultraviolet curable resin is, for example but not limited to, an acrylate monomer. The types of the above acrylate monomers are, for example but not limited to, acrylate, methacrylate, urethane acrylate, py ster acrylate, cyclopropyl acrylate (ep) 〇xy acryiate) or a mixture thereof, preferably propionate or methacrylate. Further, the above acrylic monomer may have a -functional group, preferably a polyfunctional group. Examples of the acrylic acid vinegar monomer suitable for use in the present invention, for example, include self-contained (mercapto)acrylic acid, tripropylene glycol based propylene (four) (caffe, coffee, 01 di (meth) aCryl, Μ- Butanediol di(meth)acrylic acid brewing 128054.doc 1352827
(l,4-butanediol di(meth)acrylate)、1,6-己二醇二(曱基)丙 稀酸 S旨(l,6-hexanediol di(meth)acrylate)、聚乙二醇二(甲 基)丙烤酸酯(polyethyleneglycol di(meth) acrylate)、稀丙 基化二(曱基)丙稀酸環己S旨(allylated cyclohexyl di(meth)acrylate)、二(曱基)丙稀酸異氰脲酸酯 (isocyanurate di(meth)acrylate)、2 -苯氧基乙基(曱基)丙烯 酸醋(2-phenoxyl ethyl (meth)acrylate)、乙氧基化三經甲基 丙烧三(曱基)丙烯酸δ 旨(ethoxylated trimethylol propane tri(meth) acrylate)、丙氧基化甘油三(曱基)丙稀酸酯 (propoxylated glycerol tri(meth)acrylate)、三經甲基丙烧三 (甲基)丙稀酸酉旨(trimethylol propane tri(meth)acrylate)、2-(對-異丙苯基-苯氧基)-乙基丙埽暖S旨(Cumyl Phenoxyl Ethyl Acrylate,CPEA)及彼等之混合物所組成之群組。(l,4-butanediol di(meth)acrylate), 1,6-hexanediol di(meth)acrylate S (l,6-hexanediol di(meth)acrylate), polyethylene glycol di(meth) Polyglycol di(meth) acrylate, allylated cyclohexyl di(meth)acrylate, bis(indenyl) acrylate Isocyanurate di(meth)acrylate, 2-phenoxyl ethyl (meth)acrylate, ethoxylated trimethoprim (three) Ethoxylated trimethylol propane tri(meth) acrylate, propoxylated glycerol tri(meth)acrylate, trimethyl methacrylate tris(methyl) ) Trimethylol propane tri(meth)acrylate, 2-(p-isopropyl-phenoxy)-ethyl propyl acrylate (CPA) and their a group of mixtures.
市售丙烯酸S旨類單體之實例包括:由Sartomer公司生 產,商品名為 SR454®、SR494®、SR9020®、SR9021® 或 SR9041®者;由Eternal公司生產,商品名為624-100®、 EM210®或EM2108®者;及由UCB公司生產,商品名為 Ebecryl 600®、Ebecryl 830®、Ebecryl 3605® 或 Ebecryl 6700®者等β 上述形成微結構層之樹脂可視需要添加任何習知添加 劑,例如光起始劑、交聯劑、無機微粒、流平劑、消泡劑 或抗靜電劑等,其種類係為本發明所屬技術領域中具有通 常知識者所熟知者。 可視需要在用以形成微結構層之樹脂中添加抗靜電劑, 128054.doc 1352827 以使所製得之光學膜具有抗靜電之效果,進而提高作業良 率。可使用於本發明之抗靜電劑係為本發明所屬技術領域 中具有通常知識者所熟知者,其例如但不限於乙氧基甘油 脂肪酸酯類、四級胺化合物、脂肪胺類衍生物、環氧樹脂 (如聚環氧乙烷)、矽氧烷(sil〇xane)或其它醇類衍生物(如 聚乙醇酯或聚乙二醇醚)等。 可使用於本發明之光起始劑,係經光照射後會產生自由 基,而透過自由基之傳遞引發聚合反應者。適用於本發明 之光起始劑係為本發明所屬技術領域中具有通常知識者所 熟知者,其例如但不限於二苯甲酮(benzophenone)、二苯 乙醇酮(benzoin)、2_經基_2•甲基小苯基丙」酮(2_ hydroxy-2-methyl-l-phenyl-propan-l-one)、2,2-二甲氧基_ 1,2-二苯基乙 酮(2,2_dimeth〇xy l,2_diphenyeth抓小 one)、1-羥基環己基苯基酮卩匕印… ketone)、2,4,6·三甲基苯甲醯基二苯基膦氧化物(2,4,6_ trimethylbenzoyl diphenyl phosphine oxide),或彼等之混 σ物。較佳之光起始劑係二苯T酮或卜羥基環己基苯基 為增進微結構層之硬唐,·?τ相Φ Φ狄也nt上..Examples of commercially available acrylic acid S-type monomers include those manufactured by Sartomer under the trade names SR454®, SR494®, SR9020®, SR9021® or SR9041®; manufactured by Eternal under the trade names 624-100®, EM210 ® or EM2108®; and manufactured by UCB under the trade name Ebecryl 600®, Ebecryl 830®, Ebecryl 3605® or Ebecryl 6700®, etc. The above-mentioned resin forming the microstructured layer may be added with any conventional additives such as light. Starting materials, crosslinking agents, inorganic fine particles, leveling agents, antifoaming agents or antistatic agents, and the like, are well known to those of ordinary skill in the art to which the present invention pertains. An antistatic agent, 128054.doc 1352827, may be added to the resin used to form the microstructure layer as needed to provide an antistatic effect to the resulting optical film, thereby improving work yield. Antistatic agents useful in the present invention are well known to those of ordinary skill in the art to which the present invention pertains, for example, but not limited to, ethoxylated glycerol fatty acid esters, quaternary amine compounds, fatty amine derivatives, rings An oxyresin (such as polyethylene oxide), a siloxane or other alcohol derivative (such as a polyethanol ester or a polyethylene glycol ether). The photoinitiator which can be used in the present invention generates a free radical upon irradiation with light, and initiates a polymerization reaction by the transfer of a radical. Photoinitiators suitable for use in the present invention are well known to those of ordinary skill in the art to which the present invention pertains, for example, but not limited to, benzophenone, benzoin, 2 _2•2-hydroxy-2-methyl-l-phenyl-propan-l-one, 2,2-dimethoxy-1,2-diphenylethanone (2 , 2_dimeth〇xy l, 2_diphenyeth grabs small one), 1-hydroxycyclohexyl phenyl ketone oxime... ketone), 2,4,6·trimethylbenzhydryldiphenylphosphine oxide (2,4 , 6_ trimethylbenzoyl diphenyl phosphine oxide), or a mixture of them. Preferably, the photoinitiator is diphenyl Tketone or hydroxycyclohexylphenyl to promote the microstructure of the microstructure layer, Φτ phase Φ Φ Di also nt..
矽、氧化鋅或其混合物Q 合物,較佳為二氧化鈦、二氧化 。上述無機微粒具有約0,01微米至 128054.doc 12 1352827 約100微米之粒徑大小p 本發明之微結構詹包含一或多個第一區域,該第一區域 各包3至J -種多摩柱狀結構,該多峰柱狀結構係由至少 兩他狀結構彼此重疊所形成之聯集結構且該多蜂柱狀結 構中最大高度處為弧形柱狀結構所構成。當本發明之微結 構層包含多個第一區域’該等第一區域可相同或不相同。 上述多蜂柱狀結構中相鄰兩柱狀結構之相鄰側面係相接形 成-谷線,且谷線之高度為該相㈣柱狀結構中高度較低 ►者之高度之鄕至95%,較佳為30%至85%,更佳為45%至 80%。上述多峰柱狀結構較佳係由選自弧形柱狀結構、棱 鏡柱狀結構及其混合之群組之柱狀結構所構成,且該等柱 :狀結構可等高或不等高、等寬或不等寬。上述多峰柱狀結 . 構更佳係由兩個或兩個以上之弧形柱狀結構所構成,特佳 係由兩個具有相同高度、寬度、頂角角度及曲率半徑之弧 形柱狀結構所構成。 _ _本發明藉由使用第一區域之多峰柱狀結構,可將習知技 術使用單-稜鏡柱狀結構或單一弧形柱狀結構時,兩側原 本無法有效利用之光加以有效利用。如圖4或5所示,使用 單一稜鏡柱狀結構或單一弧形柱狀結構時,光線31之出光 …、法被有效利用,若將其改良為如本發明之多峰柱狀結 構,則可將原光線31之出光位置調整至如光線41或51之出 光位置’從而可有效利用光線β此外,本發明所屬技術領 域中具有通常知識者,一般預期弧形柱狀結構之抗到性 佳,但集光效果較差,本發明藉由設計一最大高度處為弧 128054.doc -13. 1352827 形柱狀結構所構成之多峰柱狀結構中,可提升光學膜之抗 刮性,且由於該多峰柱狀結構在一固定距離叫爪至 200μιη)内具有兩個以上之峰,可提升集光效果改善僅使 用弧形柱狀結構時集光效果不佳之缺點。 為進一步提升光學膜整體之輝度,本發明之微結構層可 視需要包含—或多個第二區域,該第二區域各包含至少一 種單峰稜鏡柱狀結構^當本發明之微結構層包含多個第二 區域時,該等第二區域可相同或不相同;此外,若該第二 區域包含兩個以上之單峰稜鏡柱狀結構時,該等單峰稜鏡 柱狀結構可等高或不等高、等寬或不等寬。該第二區域較 佳包含兩個或兩㈤以上之單峰棱鏡柱狀結才聋,更佳係包含 兩個以上具有相同高度、寬度及頂角角度之單峰稜鏡柱狀 結構。 备本發明之微結構層同時包含第-區域及第二區域時, 第-區域之多峰柱狀結構之最大高度處係為弧形柱狀結構 所構成H區域之多峰柱狀結構之最大高度且係大於 第二區域之單峰稜鏡柱狀結構之最大高度。藉此,可有效 避免微結構層第—區域及第二區域中之稜鏡柱狀結構之尖 角因與其他光學臈或面板接觸造成的到傷。 根據本發明,用以構成第__區域之多峰柱狀結構及該第 二區域之單峰稜鏡柱狀結構之稜鏡柱狀結構及弧形柱狀結 構較佳係為對稱柱狀結構。使用對稱柱狀結構不但可簡化 加工方法且較易控制集光效果。 本發明所使用之稜鏡柱狀結構或弧形柱狀結構之高度取 128054.doc • H· 1352827 決=所欲得光學產品之需求,一般係介於5微米至ι〇〇微米 之範圍’較佳介於1〇微米至5〇微米之範圍更佳介於2〇微 米至40微米之範圍。本發明所使用之弧形柱狀頂部曲面最 高處之曲率夺徑係介於2微米至5〇微米之間,較佳介於5微 米至35微米之間,更佳介於5微米至2Q微米之間。本發明 所使用之棱鏡柱狀結構或派形柱狀結構之頂角角度可彼此 相同或不相同,其係介於4〇。至12〇。,較佳介於6〇。至。 為能兼顧抗到和高輝度特性,稜鏡柱狀結構之頂角角度較 佳為80。至95。,弧形柱狀結構之頂角角度介於的。至%。。 根據本發明之一較佳實施態樣,本發明之微結構層包含 第一區域,該第一區域包含至少一種多峰柱狀結構,該多 峰柱狀結構係由兩個弧形柱狀結構彼此重疊所形成之聯集 結構;且該微結構層包含第二區域,該第二區域包含至少 一種單峰稜鏡柱狀結構。 當本發明之微結構層包含兩個以上之不同的第一區域以: Xl,X2,X3,…)時,該等第一區域可以任何適當之順序排 列,亦即,可以為一隨機結構,其排列方式例如但不限 於:X丨X丨X2XlX2X丨、XiX2XlXlx2等;亦可以為一重複結構, 其排列方式例如但不限於:X1X2X1X2X1X2、X1X1X2X1X1X2 4。當本發明之微結構層同時包含一或多個相同或不同之 第一區域及一或多個相同或不同之第二區域時,微結構層 中之第一區域(X)與第二區域(y)可以以任何適當之順序排 列,亦即,可以為一隨機結構,其排列方式例如但不限 於:xxyxyx、xyxxy等;亦可以為一重複結構,其排列方 128054.doc •15· 1352827 式例如但不限於:xyxyxy,xxyxxy等。本發明之微結構層 較佳包含由第一區域與第二區域所構成之重複結構,更佳 為由複數個相同之第一區域與複數個相同之第二區域所構 成之重複結構。上述第一區域之寬度與第二區域之寬度之 比例係介於0.1至10,較佳介於〇 5至3,更佳介於1至1 3。 一般而言,若第一區域之寬度與第二區域之寬度之比例若 低於0.1,則光學膜整體之防刮性相對不佳。 以下茲以圖式配合說明,舉例說明本發明光學膜之微結 構層之構造,唯非用以限制本發明之範圍。任何熟悉此項 技藝之人士可輕易逹成之修飾及改變均包括於本案說明書 揭示内容。 如圖6a至圖12所示,本發明之光學膜係於基材3〇〇之上 表面形成微結構層310、410、510、610、710、810及 91〇,微結構層之形成方式可為:與基材一起以一體成形 方式製備;或以任何習知之加王方式製肖,例如以塗佈方 式及壓花方式於基材上形成微結構層,或先塗佈再雕刻所 需之結構。 圖6a和圖6b之實施態樣令,第一區域包含多峰柱狀結構 320,其係由兩個等高之弧形柱狀結構32〇&及32肋彼此重 疊所形成之聯集結構,其中弧形柱狀結構32〇a&32〇b間之 谷線之高度h丨為弧形柱狀結構32〇a及32〇b之高度印之 60/。,第二區域可如圖63所示包含一個等高且等寬之單峰 稜鏡柱狀結構340,或如圖6b所示包含兩個等高且等寬之 單峰稜鏡柱狀結構340。 128054.doc • 16 · 1352827 圖7之實施態樣中,第一區域包含多峰柱狀結構42〇,其 係由三個等高(高度為HO之弧形柱狀結構42〇a、42〇b及 420c彼此重疊所形成之聯集結構,其中弧形柱狀結構 及420b間之谷線之高度h為Η2之50%,弧形柱狀結構42〇b 及420c間之谷線之高度h亦為Hz之50°/。;第二區域包含一 個單峰棱鏡柱狀結構440或包含兩個以上之單峰稜鏡柱狀 結構(如圖7右方所示,第二區域可包含三個單峰稜鏡柱 狀結構),該等單峰稜鏡柱狀結構為不等高但等寬之稜鏡 柱狀結構。 圖8之實施態樣中,第一區域包含多峰柱狀結構52〇或包 含多峰柱狀結構521,其中多峰柱狀結構52〇係由兩個不等 高之弧形柱狀結構520a及520b彼此重疊所形成之聯集結 構,弧形柱狀結構520a及520b中高度較低者為52〇a,其高 度為Η*,弧形柱狀結構52〇a及520b間之谷線之高度心為^ 之55。/。,多峰柱狀結構521係由兩個不等高之弧形柱狀結 構521 a及52 lb彼此重疊所形成之聯集結構,弧形柱狀結構 521a及521b中高度較低者為521b,其高度為h5,弧形柱狀 結構521a及52 lb間之谷線之高度hs為Hs之65% ;第二區域 包含一個單峰稜鏡枉狀結構或包含兩個以上之單峰稜鏡柱 狀結構。 圖9之實施態樣中,第一區域包含多峰柱狀結構620,其 係由兩個等高(高度為1^6)之稜鏡柱狀結構62〇3與620(;及一 個高度大於該等棱鏡柱狀結構之弧形柱狀結構620b彼此重 疊所形成之聯集結構,稜鏡柱狀結構620a與弧形柱狀結構 128054.doc • 17· 1352827 620b間之谷線之高度h0為Ηό之62°/。,稜鏡柱狀結構620c與 弧形柱狀結構620b間之谷線之高度h7亦為幵6之62% ;第二 區域包含複敫個等高但不等寬之單峰稜鏡柱狀結構64〇。 圖1 0之實施態樣中,第一區域包含多峰柱狀結構720, 其係由一個弧形柱狀結構720a和一個棱鏡柱狀結構720b彼 此重疊所形成之聯集結構,弧形柱狀結構72〇&之高度大於 稜鏡柱狀結構720b之高度,稜鏡柱狀結構72〇b之高度Us, 弧形柱狀結構720a與棱鏡枉狀結構720b間之谷線之高度1!8 為Hs之45。/。;第二區域包含不等高且不等寬之單峰稜鏡柱 狀結構740及741。 圖11之實施態樣中’第一區域包含多峰柱狀結構82〇或 包含多峰柱狀結構821 ’多峰柱狀結構820係由兩個不等高 之稜鏡柱狀结構820a與820c及一個高度大於該等稜鏡枉狀 結構之弧形柱狀結構820b彼此重疊所形成之聯集結構,其 中稜鏡柱狀結構820a與弧形柱狀結構820b間之谷線之高度 hs>為棱鏡柱狀結構820a之高度H9之67%,棱鏡枉狀結構 820c與弧形权狀結構82〇b間之谷線之高度心❶為稜鏡柱狀結 構820c之高度Η丨〇之58%,多峰柱狀結構821係由兩個等高 (局度為Ηη)弧形柱狀結構82la及82lb彼此重疊所形成之聯 集結構’其中弧形柱狀結構821a及821b間之谷線之高度^丨 為Hu之60% ;第二區域包含至少一個單峰棱鏡柱狀結構 840,且兩個稜鏡柱狀結構840彼此可等高或不等高、等寬 或不等寬。 圖12乏實施態樣中’第一區域包含多峰柱狀結構92〇, 128054.doc -18 · 1352827 其係由兩個等南之弧形柱狀結構920a及920b彼此重疊所形 成之聯集結構’其中弧形柱狀結構920a及920b間之谷線之 同度hu為弧形柱狀結構92〇a&92〇b之高度%2之58% ;第 二區域包含兩個等高且等寬之單峰稜鏡柱狀結構940及 941 ’其中單峰稜鏡柱狀結構940及941間之谷線之高度高 度1^3為單峰棱鏡柱狀結構940及941之高度H13之22%。 圖13為本發明光學膜之一實施態樣之俯視圖,其中第一 區域之多峰柱狀結構與第二區域之單峰棱鏡柱狀結構係為 直線延伸之检狀結構。本發明之柱狀結構不限於呈直線延 伸之柱狀結構,亦可為呈曲線(如圖14所示)或折線延伸之 柱狀結構。此外,該等柱狀結構之峰高度可不沿延伸方向 變化、沿延伸方向呈規則變化或不規則變化。若柱狀結構 之峰高度欲沿延伸方向呈規則變化或不規則變化時,可經 設計後以一體成型方式製造,或先行製造具有不沿延.伸方 向變化之峰高度之柱狀結構,再對其進行二次加工,使該 柱狀結構之峰高度沿延伸方向呈規則變化或不規則變化。 此外,除如本文先前所述可使用二個傾斜平面構成用於本 發明之稜鏡柱狀結構或弧形柱狀結構之外,亦可使用二個 沿著延伸方向彎曲之傾斜曲面構成該稜鏡柱狀結構或該弧 形柱狀結構’且該等傾斜曲面之曲率半徑可各自沿其延伸 方向呈規則變化或不規則變化。 根據本發明,用以構成該第一區域之多峰柱狀結構及該 第二區域之單峰稜鏡柱狀結構之柱狀結構可彼此平行或互 不平行,且互不平行之兩柱狀結構可呈已相交或未相交之 128054.doc -19- 1352827 形式。The ruthenium, zinc oxide or a mixture thereof Q is preferably titanium dioxide or dioxide. The above inorganic microparticles have a particle size of about 0,01 micrometers to 128,054.doc 12 1352827 and about 100 micrometers. The microstructure of the present invention comprises one or more first regions, each of which comprises 3 to J-type Tama A columnar structure consisting of a union structure formed by overlapping at least two other structures and an arcuate columnar structure at a maximum height in the multi-porous columnar structure. When the microstructure layer of the present invention comprises a plurality of first regions, the first regions may be the same or different. The adjacent side faces of the adjacent two columnar structures in the above-mentioned multi-bee columnar structure are connected to form a valley line, and the height of the valley line is the height of the phase (4) columnar structure is lower than the height of the height of the column ► 95% It is preferably from 30% to 85%, more preferably from 45% to 80%. Preferably, the multimodal columnar structure is composed of a columnar structure selected from the group consisting of an arcuate columnar structure, a prismatic columnar structure, and a mixture thereof, and the columnar structures may be of equal height or unequal height, Isometric or unequal width. The above multi-peak columnar structure is preferably composed of two or more arc-shaped columnar structures, and the superior system is composed of two curved columns having the same height, width, apex angle and radius of curvature. Structured. _ _ The present invention can effectively utilize the light that cannot be effectively utilized on both sides when the conventional technique uses a single-稜鏡 columnar structure or a single curved columnar structure by using the multi-peak columnar structure of the first region. . As shown in FIG. 4 or 5, when a single columnar structure or a single arcuate columnar structure is used, the light of the light 31 is effectively used, and if it is modified into a multimodal columnar structure as in the present invention, Then, the light exiting position of the original light ray 31 can be adjusted to the light exiting position of the light ray 41 or 51, so that the light ray β can be effectively utilized. Further, those skilled in the art to which the present invention pertains generally expect the resistance of the curved columnar structure. Preferably, the light collecting effect is poor, and the present invention can improve the scratch resistance of the optical film by designing a multi-peak columnar structure composed of an arc having a maximum height of 128,054.doc -13. 1352827-shaped columnar structure. Since the multimodal columnar structure has more than two peaks at a fixed distance from the claw to 200 μm, the light collecting effect can be improved, and the shortcoming effect of the light collecting effect when only the curved columnar structure is used is improved. In order to further enhance the brightness of the optical film as a whole, the microstructure layer of the present invention may optionally include - or a plurality of second regions each comprising at least one unimodal 稜鏡 columnar structure ^ when the microstructure layer of the present invention comprises When the plurality of second regions are different, the second regions may be the same or different; in addition, if the second region includes two or more single-peak columnar structures, the single-peak columnar structures may wait High or not equal height, equal width or unequal width. Preferably, the second region comprises two or more (five) or more unimodal prism columns, and more preferably two or more unimodal columnar structures having the same height, width and apex angle. When the microstructure layer of the present invention includes both the first region and the second region, the maximum height of the multi-peak columnar structure of the first region is the maximum of the multi-peak columnar structure of the H region formed by the curved columnar structure. The height is greater than the maximum height of the single-peak columnar structure of the second region. Thereby, it is possible to effectively prevent the sharp corners of the columnar structures in the first region and the second region of the microstructure layer from being damaged by contact with other optical rafts or panels. According to the present invention, the columnar structure and the curved columnar structure of the multimodal columnar structure constituting the __ region and the unimodal columnar structure of the second region are preferably symmetrical columnar structures. . The use of a symmetrical columnar structure not only simplifies the processing method but also makes it easier to control the collection effect. The height of the columnar or curved columnar structure used in the present invention is 128054.doc • H· 1352827 决 = the demand for the desired optical product, generally ranging from 5 micrometers to ι 〇〇 micrometers' It is preferably in the range of from 1 μm to 5 μm, more preferably in the range of from 2 μm to 40 μm. The curvature of the curved columnar top surface used in the present invention is between 2 micrometers and 5 micrometers, preferably between 5 micrometers and 35 micrometers, more preferably between 5 micrometers and 2 micrometers. . The apex angles of the prismatic columnar members or the segmented columnar structures used in the present invention may be the same or different from each other, and are 〇4〇. To 12 baht. Preferably, it is between 6 inches. to. In order to achieve both high resistance and high luminance characteristics, the apex angle of the columnar structure is preferably 80. To 95. The angle of the apex angle of the curved columnar structure is between. to%. . According to a preferred embodiment of the present invention, the microstructure layer of the present invention comprises a first region comprising at least one multimodal columnar structure, the multimodal columnar structure being composed of two arcuate columnar structures A union structure formed by overlapping each other; and the microstructure layer comprises a second region comprising at least one unimodal columnar structure. When the microstructure layer of the present invention comprises two or more different first regions: X1, X2, X3, ...), the first regions may be arranged in any suitable order, that is, may be a random structure. The arrangement is, for example, but not limited to, X丨X丨X2X1X2X丨, XiX2X1X1x2, etc.; or a repeating structure, such as but not limited to: X1X2X1X2X1X2, X1X1X2X1X1X2 4. When the microstructure layer of the present invention simultaneously includes one or more first regions that are the same or different and one or more second regions that are the same or different, the first region (X) and the second region in the microstructure layer ( y) may be arranged in any suitable order, that is, may be a random structure, such as but not limited to: xxyxyx, xyxxy, etc.; or a repeating structure, the arrangement side 128054.doc • 15· 1352827 For example but not limited to: xyxyxy, xxyxxy, etc. The microstructure layer of the present invention preferably comprises a repeating structure composed of a first region and a second region, more preferably a repeating structure composed of a plurality of identical first regions and a plurality of identical second regions. The ratio of the width of the first region to the width of the second region is from 0.1 to 10, preferably from 〇 5 to 3, more preferably from 1 to 13. In general, if the ratio of the width of the first region to the width of the second region is less than 0.1, the overall scratch resistance of the optical film is relatively poor. The construction of the microstructure layer of the optical film of the present invention is exemplified by the following description, and is not intended to limit the scope of the present invention. Any modifications and changes that may be readily made by anyone familiar with the art are included in the disclosure of this specification. As shown in FIG. 6a to FIG. 12, the optical film of the present invention is formed on the surface of the substrate 3 to form microstructure layers 310, 410, 510, 610, 710, 810 and 91, and the microstructure layer can be formed. For the preparation of the substrate together with the substrate; or by any conventional method, such as coating or embossing to form a microstructure layer on the substrate, or coating and re-engraving structure. In the embodiment of Figures 6a and 6b, the first region comprises a multi-peak columnar structure 320, which is a combination structure formed by two equal-curved arc-shaped columnar structures 32〇& and 32 ribs overlapping each other. The height h丨 of the valley line between the curved columnar structures 32〇a&32〇b is 60/ of the height of the curved columnar structures 32〇a and 32〇b. The second region may comprise a unimodal columnar structure 340 of equal height and equal width as shown in FIG. 63, or a unimodal columnar structure 340 of two equal heights and equal width as shown in FIG. 6b. . 128054.doc • 16 · 1352827 In the embodiment of Figure 7, the first region comprises a multimodal columnar structure 42〇, which is composed of three equal heights (the arc-shaped columnar structure 42高度a, 42〇 with a height of HO) a combination structure formed by overlapping b and 420c, wherein a height h of the curved columnar structure and the valley line between 420b is 50% of Η2, and a height h of the valley line between the curved columnar structures 42〇b and 420c It is also 50°/Hz; the second region comprises a single-peak prism columnar structure 440 or more than two single-peak columnar structures (as shown on the right side of Figure 7, the second area can contain three The single-peak columnar structure) is a columnar structure of unequal height but equal width. In the embodiment of FIG. 8, the first region comprises a multi-peak column structure 52. The crucible includes a multimodal columnar structure 521, wherein the multimodal columnar structure 52 is a union structure formed by overlapping two arcuate columnar structures 520a and 520b of unequal heights, an arcuate columnar structure 520a and The lower height of 520b is 52〇a, the height is Η*, and the height of the valley line between the curved columnar structures 52〇a and 520b is 55. The peak-column structure 521 is a union structure formed by two arc-shaped columnar structures 521a and 52 lb having unequal heights overlapping each other. The lower height of the arc-shaped columnar structures 521a and 521b is 521b, and the height thereof is 521b. For h5, the height hs of the valley line between the curved columnar structures 521a and 52 lb is 65% of Hs; the second region contains a single-peak 稜鏡枉-like structure or contains more than two unimodal 稜鏡 columnar structures In the embodiment of Figure 9, the first region comprises a multimodal columnar structure 620 consisting of two equal heights (1^6 height) of the columnar structures 62〇3 and 620 (; and a height The height of the valley line between the columnar structure 620a and the curved column structure 128054.doc • 17· 1352827 620b is greater than the height of the valley line 620b of the prismatic column structure overlapping each other. For the 62°/., the height h7 of the valley line between the columnar structure 620c and the curved columnar structure 620b is also 62% of the 幵6; the second area includes the enthalpy of equal height but not equal width. The single-peak columnar structure is 64〇. In the embodiment of Fig. 10, the first region comprises a multi-peak columnar structure 720, which is formed by an arcuate columnar shape. The combination structure 720a and a prism columnar structure 720b overlap each other, the height of the arcuate columnar structure 72〇& is greater than the height of the columnar structure 720b, and the height of the columnar structure 72〇b is Us The height 1!8 of the valley line between the curved columnar structure 720a and the prismatic dome structure 720b is 45 s of Hs. The second area includes a unipolar 稜鏡 columnar structure 740 of unequal height and unequal width. And 741. In the embodiment of Fig. 11, the first region comprises a multimodal columnar structure 82〇 or comprises a multimodal columnar structure 821. The multimodal columnar structure 820 is composed of two unequal height columnar structures. 820a and 820c and a joint structure formed by overlapping arc-shaped columnar structures 820b having a height greater than the meandering structures, wherein the height of the valley line between the columnar structure 820a and the curved columnar structure 820b Hs> is 67% of the height H9 of the prism columnar structure 820a, and the height of the valley line between the prismatic dome structure 820c and the curved weight structure 82〇b is the height of the columnar structure 820c. 58%, multi-peak columnar structure 821 is composed of two equal heights (degrees of Ηη) curved columnar structures 82la and 82lb The union structure formed by the overlaps wherein the height of the valley line between the arcuate columnar structures 821a and 821b is 60% of Hu; the second region comprises at least one unimodal prism columnar structure 840, and two 稜鏡The columnar structures 840 can be of equal height or unequal height, equal width or unequal width. In the embodiment of Fig. 12, the first region includes a multimodal columnar structure 92〇, 128054.doc -18 · 1352827, which is a combination of two equal south arcuate columnar structures 920a and 920b overlapping each other. The structure 'where the valley hull hu between the curved columnar structures 920a and 920b is 58% of the height %2 of the arcuate columnar structure 92〇a &92〇b; the second region contains two equal heights and the like The width of the single-peak columnar structure 940 and 941 'where the height of the valley line between the uniaxial columnar structures 940 and 941 is 1^3 is 22% of the height H13 of the unipolar prism columnar structure 940 and 941 . Figure 13 is a plan view showing an embodiment of an optical film of the present invention, wherein the multi-peak columnar structure of the first region and the unimodal prism columnar structure of the second region are linearly extending inspection structures. The columnar structure of the present invention is not limited to a columnar structure extending in a straight line, and may be a columnar structure extending in a curve (as shown in Fig. 14) or a line extending. Further, the peak heights of the columnar structures may not vary in the direction of extension, but may vary regularly or irregularly along the direction of extension. If the peak height of the columnar structure is to be changed regularly or irregularly along the extending direction, it may be manufactured by integral molding, or the columnar structure having a peak height which does not change along the extension direction may be manufactured first, and then The secondary processing is performed such that the peak height of the columnar structure changes regularly or irregularly along the extending direction. Further, in addition to the two inclined planes which may be used to form the columnar structure or the curved columnar structure of the present invention as previously described herein, two inclined curved surfaces extending in the extending direction may be used to constitute the edge. The mirror columnar structure or the arcuate columnar structure' and the radius of curvature of the inclined surfaces may each change regularly or irregularly along the direction in which they extend. According to the present invention, the columnar structures of the multimodal columnar structure constituting the first region and the unimodal columnar structure of the second region may be parallel or non-parallel to each other, and are not parallel to each other. The structure may be in the form of 128054.doc -19-1352827 which has intersected or not intersected.
為I強硬度及避免基材表面刮傷而影響膜片的光學性 了視需要在基材相對於微結構層之另—表面上形 抗到層。上述抗刮廣可為平滑狀或非平滑狀,例: 細凹凸結構。可使用任何習知方法形成本發明之抗到層, 其例如但不限於網版印刷、喷塗、㈣加丄或於基材表面 塗覆含擴散顆粒之抗刮層等,其中塗覆含擴散顆粒之抗到 層可使抗刮層具有某些程度的光擴散作用。上述抗到層之 厚度較佳係、介於卜5G微米之間,更佳介於i〜職米之間。 根據本發明,較佳可藉由在基材上塗佈包含擴散顆粒和 至少一種選自由紫外線硬化樹脂、熱固性樹脂、熱塑性樹 脂及其混合物所構成群組之樹脂的硬罩液,並視需要以熱 固化、紫外線固化、或加熱和紫外線雙固化(dual cUring) 方式以形成抗刮層,並藉此使該抗刮層具有凹凸結構。上 述擴散顆粒之量相對於該硬罩液中樹脂成分總重量,為 0.1〜10重量%。The optical properties of the film are affected by the hardness of the I and the scratching of the surface of the substrate. The layer is formed on the other surface of the substrate relative to the microstructure layer as needed. The above-mentioned scratch resistance can be smooth or non-smooth, for example: fine uneven structure. The anti-layer of the present invention may be formed by any conventional method, such as, but not limited to, screen printing, spraying, (iv) twisting or coating a surface of a substrate with a scratch-resistant layer containing diffusion particles, etc., wherein the coating contains diffusion The anti-scratch layer of the particles provides some degree of light diffusion to the scratch resistant layer. The thickness of the above-mentioned anti-layer is preferably between 5G micrometers, more preferably between i and meters. According to the present invention, it is preferred to apply a hard cover liquid comprising a diffusion particle and at least one resin selected from the group consisting of an ultraviolet curable resin, a thermosetting resin, a thermoplastic resin, and a mixture thereof on a substrate, and if necessary, Thermal curing, ultraviolet curing, or heating and ultraviolet double curing to form a scratch-resistant layer, and thereby making the scratch-resistant layer have a textured structure. The amount of the above diffusion particles is 0.1 to 10% by weight based on the total weight of the resin component in the hard coat liquid.
可用於本發明之抗刮層之紫外線硬化樹脂係如本文先前 所述’其可視需要另包含分子量介於約1〇3至約104之寡聚 體’此類寡聚體係熟習此項技術之人士所熟知者,例如丙 烯酸酯系寡聚體,其例如但不限於:胺基甲酸酯丙烯酸 酯,如脂肪族胺基甲酸酯丙稀酸酯(aliphatic urethane acrylate)、脂肪族胺基曱酸酯六丙烯酸酯(aiiphatic urethane hexaacrylate)及芳香族胺基甲酸酯六丙烯酸酯 (aromatic urethane hexaacrylate);環氧丙烯酸酯,如雙酚 128054.doc -20- 1352827 A環氧二丙烯酸酯(bisphenol-A epoxy diacrylate)及酚醛環 氧丙烯酸酯(novolac epoxy acrylate);聚酯丙烯酸酯,如 聚酯二丙烯睃酯(polyester diacrylate);或純丙烯酸酯。Ultraviolet-curing resins useful in the scratch-resistant layer of the present invention are as previously described herein, which may optionally include oligomers having a molecular weight of from about 1 to about 3 to about 104. Such oligomeric systems are familiar to those skilled in the art. Well known, for example, acrylate oligomers such as, but not limited to, urethane acrylates such as aliphatic urethane acrylate, aliphatic amine decanoic acid Aiiphatic urethane hexaacrylate and aromatic urethane hexaacrylate; epoxy acrylate such as bisphenol 128054.doc -20-1352827 A epoxy diacrylate (bisphenol- A epoxy diacrylate) and novolac epoxy acrylate; polyester acrylate such as polyester diacrylate; or pure acrylate.
可用於本發明之熱固性樹脂,其平均分子量一般介於約 104至約2xl06之間,較佳介於約2xl04至約3xl〇5之間,更 佳介於約4x1 04至約105之間。本發明之熱固性樹脂可選自 含有羥基(-0H)及/或羧基(-COOH)之聚酯樹脂、環氧樹 脂、聚甲基丙烯酸酯樹脂、聚丙烯酸酯樹脂、聚酿胺樹 脂、氟素樹脂、聚醢亞胺樹脂、聚胺基曱酸酯樹脂、醇酸 樹脂(alkyd resin)及其混合物所組成之群組,較佳為含有 羥基(-OH)及/或羧基(-C00H)之聚曱基丙烯酸酷樹脂或聚 丙烯酸酯樹脂,如聚曱基丙烯酸多元醇樹脂。 可用於本發明之抗刮層之熱塑性樹脂可選自聚酯樹脂; 聚甲基丙烯酸酯樹脂,如聚甲基丙烯酸甲酯(ρμμα);及 彼等之混合物所組成之群組。Thermosetting resins useful in the present invention generally have an average molecular weight of between about 104 and about 2 x 106, preferably between about 2 x 104 and about 3 x 10 , more preferably between about 4 x 104 and about 105. The thermosetting resin of the present invention may be selected from polyester resins containing hydroxyl groups (-0H) and/or carboxyl groups (-COOH), epoxy resins, polymethacrylate resins, polyacrylate resins, polyamine resins, and fluorin. The group consisting of a resin, a polyimide resin, a polyamine phthalate resin, an alkyd resin, and a mixture thereof preferably contains a hydroxyl group (-OH) and/or a carboxyl group (-C00H). A polyacrylic acid or a polyacrylate resin such as a polyacrylonitrile polyol resin. The thermoplastic resin usable in the scratch-resistant layer of the present invention may be selected from the group consisting of polyester resins; polymethacrylate resins such as polymethyl methacrylate (ρμμα); and mixtures thereof.
可用於本發明之抗刮層之擴散顆粒並無特殊限制,係本 發明所屬技術領域中具有通常知識者所熟知者,可為有機 顆粒’例如(甲基)丙稀㈣樹脂、胺基甲酸樹脂、㈣ 樹脂或其混合物;或無機顆粒,例如氧化鋅、二氧化石夕、 二氧化鈦、氧化錯、氧化鋁、硫 队.山 化鋅、硫酸鋇或其混合 ,或上述兩者之組合。較佳+ — > 顆粒為有機顆粒。上述擴 放顆粒之形狀並無特殊限制,例 J為球形、菱形等,豆 粒徑大小較佳介於1〜30微米。 '、 本發明之抗到層可視需要包含任 b 仃本發明所屬技術領域 128054.doc 1352827 中具有通常知識者已知之添加劑,其例如但不限於抗靜電 劑、光起始劑、整平劑、濕濁劑、分散劑或無機微粒。適 用於本發明之抗靜電劑、光起始劑及無機微粒之實例係如 本文先前所述。 本發明光學膜之抗到層具有良好抗靜電性和高硬度特 性,其表面電阻率介於ιο\1〇13ω/〇,⑼口代表歐姆/米平 方)’且根擄JIS Κ5400標準方法量測,其錯筆硬度可達3ΗThe diffusion particles which can be used in the scratch-resistant layer of the present invention are not particularly limited and are known to those skilled in the art to which the present invention is known, and may be organic particles such as (meth) propylene (tetra) resin, urethane resin. And (4) a resin or a mixture thereof; or an inorganic particle such as zinc oxide, cerium oxide, titanium dioxide, oxidized oxidized, alumina, sulphur, zinc sulphate, barium sulphate or a mixture thereof, or a combination of the two. Preferably + - > The particles are organic particles. The shape of the above-mentioned expanded particles is not particularly limited. For example, J is a spherical shape, a rhombic shape, etc., and the bean particle size is preferably from 1 to 30 μm. The anti-layer of the present invention may optionally contain any additives known to those skilled in the art, such as, but not limited to, antistatic agents, photoinitiators, leveling agents, and the like. A wet turbid agent, a dispersing agent or inorganic fine particles. Examples of antistatic agents, photoinitiators and inorganic microparticles suitable for use in the present invention are as previously described herein. The anti-layer of the optical film of the invention has good antistatic property and high hardness property, and its surface resistivity is between ιο\1〇13ω/〇, (9) mouth represents ohm/m square) and is measured by the JIS Κ5400 standard method. , its pen hardness can reach 3Η
或以上,且根據JIS Κ7136標準方法量測,具有ι〇%至燃 之霧度。 可使用任何習知之方法製備本發明光學膜之微結構層及 抗刮層’且製備微結構層及抗刮層之先後順序並無特殊限 制。 本發明光學膜之微結構層可根據本發明所屬技術領域中 具有通常知識者所習知之任何方式製造,例如,可經由包 含以下步驟之方法製造: (a)將樹脂及適當之添加劑 叫成< α以形成一膠態塗料組合 物; 以鑽石工具在轉動之 ’藉由控制鑽石工具 石工具在滾筒上雕刻 (b)在一圓权形毛胚(或稱滾筒)上, 滾筒上以與滾筒橫交之方向移動 之移動遑度及/或滾筒之轉速使鑽 出特定溝槽,· ,然後利用 熱轉印或熱 (。)將該膠態塗料組合物塗佈於基材或滾輪 步驟⑻所雕刻完成之滾筒進行滾輪壓花 擠壓方式使該塗層形成一結構化表面;及 128054.doc -22- 1352827 (d)對該塗層照射能量射線或加熱或兩者併用以使該塗層 固化。 本發明光學膜之抗到層可根據本發明所屬技術領域中具有 通常知識者所習知之任何方式製造,例如:將包含顆粒、樹 脂及視需要添加劑之塗料組合物塗覆於基材上形成塗層,再 對該塗層照射能量射線或加熱或兩者併用以使該塗層固化。 以下實施例係用於對本發明作進一步說明,唯非用以限 制本發明之範圍。任何熟悉此項技藝之人士可輕易達成之 修飾及改變均包括於本案說明書揭示内容及所附申請專利 範圍之範圍内。 膠液A之製備 將60克EM210®(2-苯氡基乙基丙烯酸酯,由Eternai公司 所販售)和60克624-l〇〇®(環氧丙烯酸酯,由Eternai&司所 販售)混合’然後加入5克Chivacure® BP作為光起始劑(二 苯甲酮(benzophenone),雙鍵化工提供)於5〇〇c及轉速1〇〇〇 rpm下攪拌,形成一膠液A。 膠液B之製備 將溶劑(40克甲苯)、丙烯酸酯類單體(1〇克二季戊四醇六 丙稀酸Sa、2克二經甲基丙烧三丙稀酸自旨、μ克季戍四醇 二丙稀酸酯)、养聚體(28克脂肪族胺基甲酸酯六丙稀酸酯 [Eterxure 6145-100,Eternal公司])和光起始劑(6克卜羥基 環己基苯基晒)混合,高速攪拌,製成固形份約6〇%及總重 約100克之樹脂配方B’。 將溶劑(27克曱苯、13.5克丁嗣)、〇.5克壓克力微粒子 128054.doc -23· 1352827 [SSX-108,日本積水化成公司;平均粒徑為8 μιη]、40克 樹脂配方Β'、熱固性樹脂(20克丙烯酸酯樹脂[Eterac 7365- S-30,Eternal公司](固形份約3〇%))和2克抗靜電劑[(}^1丑-36M-AS,Marubishi oil Chem. Co” Ltd](固形份約 20%),形 成一膠液B(固形份約3〇%)。Or above, and measured according to JIS Κ 7136 standard method, having ι〇% to combustion haze. The order of preparing the microstructure layer and the scratch-resistant layer of the optical film of the present invention by any conventional method and preparing the microstructure layer and the scratch-resistant layer is not particularly limited. The microstructure layer of the optical film of the present invention can be produced in any manner known to those of ordinary skill in the art to which the present invention pertains, for example, by a method comprising the steps of: (a) termifying the resin and appropriate additives as < α to form a colloidal coating composition; to be engraved on the drum by controlling the diamond tool stone tool in the rotation of the diamond tool (b) on a rounded blank (or drum), on the drum The moving mobility of the transverse direction and/or the rotational speed of the drum causes a specific groove to be drilled, and then the thermal coating or heat is applied to the substrate or the roller (8). The engraved cylinder is subjected to roller embossing to form the structured surface; and 128054.doc -22- 1352827 (d) the coating is irradiated with energy rays or heat or both to make the coating The layer is cured. The anti-layer of the optical film of the present invention can be produced in any manner known to those skilled in the art to which the present invention pertains, for example, by coating a coating composition comprising particles, a resin and an optional additive on a substrate to form a coating. The layer is then irradiated with energy rays or heat or both to cure the coating. The following examples are intended to be illustrative of the invention and are not intended to limit the scope of the invention. Modifications and variations that may be readily made by those skilled in the art are included within the scope of the disclosure of the present disclosure and the scope of the appended claims. Preparation of Glue A 60 g of EM210® (2-phenylmercaptoethyl acrylate, sold by Eternai) and 60 g of 624-l〇〇® (epoxy acrylate, sold by Eternai & Mixing ' Then add 5 grams of Chivacure® BP as a photoinitiator (benzophenone, supplied by Double Bond Chemicals) at 5 ° C and 1 rpm to form a glue A. The preparation of the glue B is a solvent (40 g of toluene), an acrylate monomer (1 gram of dipentaerythritol hexapropylene acid Sa, 2 gram of dimethicone tripropylene acid, and a gram of quaternary Alcohol diacrylate, aggregator (28 g of aliphatic urethane hexaacrylate [Eterxure 6145-100, Eternal]) and photoinitiator (6 g of hydroxycyclohexyl phenyl) The mixture was mixed at a high speed to prepare a resin formulation B' having a solid content of about 6% by weight and a total weight of about 100 grams. Solvent (27 g of benzene, 13.5 g of butyl hydrazine), 克. 5 g of acrylic granules 128054.doc -23· 1352827 [SSX-108, Japan Sekisui Chemical Co., Ltd.; average particle size of 8 μιη], 40 g of resin Formula Β', thermosetting resin (20 g acrylate resin [Eterac 7365-S-30, Eternal] (solid content about 3%)) and 2 g antistatic agent [(}^1 ugly-36M-AS, Marubishi Oil Chem. Co" Ltd] (about 20% solids) forms a gum B (about 3 % solids).
模具滚輪雕刻C 將精密滾輪表面電鐘無電解鎳或無氧銅,以CNC超精密 精密車床搭配刀具定位儀,以及不同r值及角度之單晶鑽 石刀,車床轉速500 rpm以下,進給量上限值〇.〇15毫米, 依據設定的圖樣撰寫數值控制(NC)程式,採用須要的鑽石 刀,在刀具定位儀的輔助下,在適當時機更換刀具,於滾 輪表面加工製備所欲之微結構凹槽,作為後續加工製程所 用之模具。 如本文先前所述,製備微結構層及抗刮層之先後順序並 無特殊限制,製備方法詳述如下。 微結構層之製備 將膠液A塗佈於一聚笨二甲酸乙二酯(pet)基材上 [A4300®,TOYOBO公司;厚度為188 μηι],以形成塗層, 然後利用由模具滾輪雕刻C之方法所得之具微結構凹槽之 滚輪,以壓花方式於塗層上形成一結構化表面。再於常溫 下,以能量射線(200〜400 nm之UV燈,強度:15〇〜3〇〇 mJ/cm2,時間:2〜15秒)照射該塗層,使之固化。 抗刮層之製備 以RDS塗抹棒#3將膠液B塗佈在基材表面上,經1 〇〇〇c乾 I28054.doc •24· 1352827 燥1刀鐘後’再以uv曝光機台(Fusi〇n uv , F600V,6〇() W/inch,Η型燈源),能量射線2〇〇 mj/cm2,時間· 2〜i5 秒,使之固化,製得厚度約為5pm之抗到層。 實施例1 以上述方法製備之光學膜,其微結構包含由第一區域與 第二區域所構成之重複結構,其中第—區域包含由兩個弧 形柱狀結構所構成之多峰柱狀結構,該多峰弧形柱狀結構 中兩柱狀結構相接谷線之高度係為相鄰兩柱狀結構具有較 低高度者之高度之約58%;且其中第二區域包含兩個單峰 棱鏡柱狀結構。進行各項特性試驗,試驗所得結果如以下 表1、2、3和4所示。 比較例1 以上述製備方法製備比較例丨之光學膜,其中模具滾輪 雕刻C之滚輪係經設計,以使所製得之光學臈之微結構具 有複數個不平行且可相交或未相交之稜鏡柱狀結構,其微 結構為如市售聚光膜96SM (Eternal公司)。進行各項特性試 驗,試驗所得結果如以下表1所示。 比較例2 市售聚光膜PTR733(新禾公司),其微結構為為透鏡狀結構。 測試方法A : 分別將實施例1、比較例1及比較例2之膜片進行下述測 試,並記錄於表1及表2。 透矽#存亮彦的濟/試:利用NDH 5000W霧度計[日本電 色公司],根據JIS K7136標準方法,量測待測樣品之霧度 128054.doc •25- 1352827 (Hz)及全光線透過率(Tt)。 崧筆硬彦試粉:利用鉛筆硬度試驗機[Elcometer 3086, SCRATCH BOY],以 Mitsubishi鉛筆(2H,3H)用 JISK-5400 方法測試待測樣品微結構層表面之鉛筆硬度。 奢潘硬友:利用鐘擺硬度試驗機[Braive Instruments , 型號Pendulum Hardness Konig type],以其棱鏡微結構層 直接測試待測樣品微結構層之硬度耐磨能力,測試行程為 60°至3 0°間,紀錄擺盪次數。當待測樣品表面硬度越硬 時,擺捶可擺動的次數較待測樣品表面硬度軟時多。 硪封試粉:利用線性耐磨試驗機[TABER 5750]於600公 克之重量平台(面積長寬20 mmx20 mm)上貼黏置3M BEF-III-10T膜片(長寬20 mmx20 mm),以其棱鏡微結構層直接 測試待測樣品微結構層之重壓耐刮能力,以試驗行程2 inch,10 eyele/min之速度進行10 cycles财到測試。 表1 霧度 Hz (%) 全光線透過率 Tt (%) 鉛筆硬度 耐刮試驗 鐘擺硬度 (擺盪次數) 實施例1 94.57 24.56 3H 無到傷 71 比較例1 96.75 5.56 Η 嚴重刮傷 48 由實施例1與比較例1之結果可知,利用相同膠液,但雕 刻不同微結構,光學膜之硬度和耐刮能力皆會產生改變, 本發明之光學膜具有較佳之硬度及重壓耐刮能力,其可有 效避免微結構層之損傷,進而可節省使用上擴散膜及保護 膜之成本。 128054.doc •26- 表2 霧度 Hz (%) 全光線透過率 Tt(%) 鉛筆硬度 耐刮試驗 鐘擺硬度 (擺盪次數) 實施例1 94.57 24.56 3H 無刮傷 71 比較例2 92.86 59.92 3H 無刮傷 103 1352827 由表2可知,實施例1與比較例2之硬度和财到能力相 仿。再將實施例1與比較例2之光學膜進行下述測試,以比 較其輝度增益效果。 測試方法B : 輝度測試: 分別將實施例1及比較例2之膜片及Eternal公司所生產的 擴散膜[DI-780A及DI-600A]搭配背光源組合成各種模組, 進行輝度分析。 背光源1 :以尺寸10公分見方之直下式背光源為基準, 其結構為抗UV反射膜上配置4支直管型冷陰極管(CCFL), 再放置2 mm擴散板來勻化光源。 背光源2 :以17”側邊式背光源為基準,其結構為反射膜 上置導光板及導光板兩側邊各放置反射燈罩及冷陰極燈管 (CCFL)。 用輝度計[Topcon公司,SC-777]於背光源正上方(0 °角) 距離背光源50公分處,以輝度計2 °角量測背光源及待測模 組的輝度值(Brightness ;單位:cd/m2)。以背光源的中心 輝度值作為基值,將待測模組之中心輝度值與基值之差值 除以基值再乘以100%,即可得知待測模組相較於背光源 128054.doc •27· 1352827 之輝度增益值。結果記錄於表3及表4中。Mould roller engraving C will be precision roller surface electric clock electroless nickel or oxygen-free copper, with CNC ultra-precision precision lathe with tool positioning instrument, and single crystal diamond knife with different r value and angle, lathe rotation speed below 500 rpm, feed rate The upper limit value is 〇.〇15 mm. Write the numerical control (NC) program according to the set pattern. Use the required diamond knife, and with the aid of the tool positioning instrument, change the tool at the appropriate time to prepare the desired surface on the roller surface. The structural groove is used as a mold for subsequent processing. As described herein before, the order of preparing the microstructured layer and the scratch-resistant layer is not particularly limited, and the preparation method is as follows. Preparation of Microstructure Layer The glue A was coated on a polyethylene terephthalate (PET) substrate [A4300®, TOYOBO; thickness 188 μηι] to form a coating, which was then engraved by a mold roller. The roller of the microstructured groove obtained by the method of C forms an structured surface on the coating by embossing. The coating was irradiated with an energy ray (UV lamp of 200 to 400 nm, intensity: 15 〇 to 3 〇〇 mJ/cm 2 , time: 2 to 15 seconds) at room temperature to cure it. Preparation of scratch-resistant layer. Apply the glue B to the surface of the substrate with RDS applicator #3, and dry it after 1 〇〇〇c. I28054.doc •24· 1352827 After drying for 1 knives, then use uv exposure machine ( Fusi〇n uv, F600V, 6〇() W/inch, Η-type lamp source), energy ray 2〇〇mj/cm2, time · 2~i5 seconds, make it solidified, and obtain a thickness of about 5pm Floor. Embodiment 1 An optical film prepared by the above method, the microstructure comprising a repeating structure composed of a first region and a second region, wherein the first region comprises a multimodal columnar structure composed of two curved columnar structures The height of the intersecting valley line of the two columnar structures in the multi-peak curved columnar structure is about 58% of the height of the adjacent two columnar structures having a lower height; and wherein the second region comprises two single peaks Prism columnar structure. Various characteristic tests were carried out, and the results obtained by the test are shown in Tables 1, 2, 3 and 4 below. Comparative Example 1 An optical film of Comparative Example was prepared by the above preparation method, wherein the roller of the mold roller engraving C was designed such that the microstructure of the prepared optical crucible had a plurality of non-parallel and intersecting or unintersecting edges. The mirror columnar structure has a microstructure such as a commercially available concentrating film 96SM (Eternal Corporation). Various characteristic tests were carried out, and the results obtained in the test are shown in Table 1 below. Comparative Example 2 A commercially available concentrating film PTR733 (Shinhe Corporation) having a microstructure of a lens structure. Test Method A: The films of Example 1, Comparative Example 1, and Comparative Example 2 were subjected to the following tests and recorded in Tables 1 and 2.矽#存亮彦's economy/test: Using the NDH 5000W haze meter [Japan Electro-Color Co., Ltd.], measuring the haze of the sample to be tested according to JIS K7136 standard method 128054.doc • 25- 1352827 (Hz) and full light Transmittance (Tt).嵩笔硬彦 test powder: The pencil hardness of the surface of the microstructure layer of the sample to be tested was tested by a JISK-5400 method using a pencil hardness tester [Elcometer 3086, SCRATCH BOY] with a Mitsubishi pencil (2H, 3H). Extraordinary Pan Hard Friends: Using the pendulum hardness testing machine [Braive Instruments, model Pendulum Hardness Konig type], directly test the hardness and wear resistance of the microstructure layer of the sample to be tested with its prism microstructure layer, the test stroke is 60° to 30° Between, record the number of swings. When the surface hardness of the sample to be tested is harder, the number of swings of the pendulum can be more than that of the surface of the sample to be tested.硪 Sealing test powder: A 3M BEF-III-10T diaphragm (length and width 20 mmx20 mm) is attached to a 600 gram weight platform (area length and width 20 mm x 20 mm) using a linear wear tester [TABER 5750] The prism microstructure layer directly tests the heavy pressure and scratch resistance of the microstructure layer of the sample to be tested, and the test is performed at a speed of 2 inch, 10 eyele/min. Table 1 Haze Hz (%) Total light transmittance Tt (%) Pencil hardness scratch resistance test Pendulum hardness (number of swings) Example 1 94.57 24.56 3H No injury 71 Comparative Example 1 96.75 5.56 严重 Severe scratch 48 by example 1 and the results of Comparative Example 1 show that the same glue is used, but the different microstructures are engraved, and the hardness and scratch resistance of the optical film are changed. The optical film of the present invention has better hardness and heavy pressure and scratch resistance. The damage of the microstructure layer can be effectively avoided, thereby saving the cost of using the upper diffusion film and the protective film. 128054.doc •26- Table 2 Haze Hz (%) Total light transmittance Tt (%) Pencil hardness scratch resistance test pendulum hardness (number of swings) Example 1 94.57 24.56 3H No scratch 71 Comparative example 2 92.86 59.92 3H None Scratch 103 1352827 It can be seen from Table 2 that the hardness and financial ability of Example 1 and Comparative Example 2 are similar. Further, the optical films of Example 1 and Comparative Example 2 were subjected to the following tests to compare their luminance gain effects. Test Method B: Brightness test: The film of Example 1 and Comparative Example 2 and the diffusion film [DI-780A and DI-600A] produced by Eternal Co., Ltd. were combined with a backlight to form various modules for luminance analysis. Backlight 1 : Based on a direct-lit backlight of 10 cm square, the structure is such that four straight-tube type cold cathode tubes (CCFLs) are placed on the anti-UV reflective film, and a 2 mm diffuser plate is placed to homogenize the light source. Backlight 2: Based on the 17" side backlight, the structure is such that the reflector and the cold cathode lamp (CCFL) are placed on the reflective film on both sides of the light guide plate and the light guide plate. Using a luminance meter [Topcon, SC-777] measures the luminance value of the backlight and the module to be tested (Brightness; unit: cd/m2) at a distance of 50 cm from the backlight directly above the backlight (0 ° angle). The central luminance value of the backlight is used as the base value. The difference between the central luminance value and the base value of the module to be tested is divided by the base value and multiplied by 100%, and the module to be tested is compared with the backlight 128054. Doc •27· 1352827 luminance gain value. The results are recorded in Tables 3 and 4.
128054.doc 28- 1352827 表3 lOcmxlOcm直下式背光源、 正向輝度值(cd/m2) 輝度增益(°/〇) 背光源1 3915.35~~ 0 月光源i加片下擴散膜(DI-780A) 及一片比較例2膜片 5408.23' +38 背光源1加一片下擴散膜(DI-780A) 及一片實施例1膜片 5665.76 +45 背光源1加兩片比較例2膜η 5599 +43 背光源1加兩片實施例1膜片 6561.08 +68 鲁 表4 17"側邊式背光运~~ 正向輝度值(cd/m2) 輝度增益(%) 背光源2 180.7 0 背光源2加一片下擴散膜(DI-780A) 及一片比較例2獏片 456.1 +152 背光源2加一片下擴散膜(DI.780A) 及一片實施例1膜片 ~609 +237 由表3和表4之實施例1與比較例2之比較結果可知: (1)原1〇 cmxlO cm直下式背光源1之正向輝度值為 3915.35 cd/m2,加上一片下擴散膜(DI_780A)及一片實施例1 膜片可提供45%之輝度增益值,使輝度達到5665 76 cd/m2 ;然而’背光源i加上一片下擴散膜(DI_78〇A)及一片 比較例2膜片僅可提供38%之輝度增益值,輝度達到 5408.23 cd/m2。因此,本發明之實施例1膜片可兼顧耐刮 與輝度。比較背光源1加上兩片聚光膜之模組,本發明實 施例1之輝度增益值(實施例1 : 68%)明顯優於比較例2之輝 度增益值(43%)。 128054.doc -29- (2)原17侧邊式背光源2之正向輝度值為18〇 7 cd/m2, 加^ 一片下擴散膜(DI-780A)及一片實施例!膜片可提供 237%之輝度増益值,使輝度達到609 cd/m2 ;然而,背光 原2加上片下擴散膜(DI-78〇A)及一片比較例2膜片僅可 提供152/〇之輝度增益值,輝度達到456.1 cd/m2。相較於背 光源2加上一片下擴散膜(DI-780A)及一片比較例2膜片之 模組,本發明實施例1之膜片可提供較佳之輝度增益值》 由實施例與比較例之結果可知’本發明之光學膜具有良 好耐到與高輝度增益的特性。 【圖式簡單說明】 圖1為背光模組所含各種光學膜之簡單示意圖。 圖2為習知聚光膜之示意圖。 圖3為習知稜鏡枉狀结構之出光示意圖。 圖4及圖5為本發明多峰柱狀結構之出光示意圖。 圖6a至圖12係本發明之光學膜實施態樣之示意圖。 圖13及圖14係本發明之光學膜實施態樣之俯視圖。 【主要元件符號說明】 1 反射膜 2 導光板 3 擴散膜 4,5 聚光膜 6 保護性擴散膜 21 基材 22 稜鏡結構 128054.doc •30- 1352827128054.doc 28- 1352827 Table 3 lOcmxlOcm direct-type backlight, forward luminance value (cd/m2) luminance gain (°/〇) backlight 1 3915.35~~ 0 month source i plus under-diffusion film (DI-780A) And a comparative example 2 film 5408.23' +38 backlight 1 plus a piece of lower diffusion film (DI-780A) and a piece of embodiment 1 film 5665.76 +45 backlight 1 plus two pieces of comparative example 2 film η 5599 +43 backlight 1 plus two pieces of embodiment 1 diaphragm 6561.08 +68 Lu 4 4"side backlighting~~ Forward luminance value (cd/m2) luminance gain (%) backlight 2 180.7 0 backlight 2 plus one piece of diffusion Film (DI-780A) and a piece of Comparative Example 2 45 456.1 +152 Backlight 2 plus one piece of lower diffusion film (DI.780A) and one piece of Example 1 film ~ 609 +237 Example 1 of Table 3 and Table 4 Comparing with the results of Comparative Example 2, it can be seen that: (1) The forward luminance value of the original 1〇cmxlO cm direct type backlight 1 is 3915.35 cd/m2, plus a piece of lower diffusion film (DI_780A) and one piece of the film of Example 1 Provides a 45% luminance gain value to achieve a luminance of 5665 76 cd/m2; however, 'backlight i plus a piece of lower diffusion film (DI_78〇A) and one slice of Comparative Example 2 are only available With a gain of 38%, the luminance reaches 5408.23 cd/m2. Therefore, the film of Example 1 of the present invention can achieve both scratch resistance and brightness. Comparing the backlight 1 with the two concentrating film modules, the luminance gain value of Example 1 of the present invention (Example 1: 68%) was significantly better than the luminance gain value (43%) of Comparative Example 2. 128054.doc -29- (2) The positive luminance value of the original 17 side backlight 2 is 18〇 7 cd/m2, plus ^ one piece of lower diffusion film (DI-780A) and one embodiment! The diaphragm provides a brightness value of 237%, which gives a luminance of 609 cd/m2; however, the original backlight 2 plus the under-diffusion film (DI-78〇A) and one piece of the comparative example 2 film can only provide 152/〇. The luminance gain value is 456.1 cd/m2. Compared with the backlight 2 and a module of the lower diffusion film (DI-780A) and a film of the comparative example 2, the film of the first embodiment of the present invention can provide a better luminance gain value" by the embodiment and the comparative example. As a result, it is understood that the optical film of the present invention has characteristics of good resistance to high luminance and high luminance. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a simplified schematic diagram of various optical films contained in a backlight module. 2 is a schematic view of a conventional concentrating film. Fig. 3 is a schematic view showing the light emission of a conventional braided structure. 4 and 5 are schematic views showing the light output of the multimodal columnar structure of the present invention. 6a through 12 are schematic views of an embodiment of an optical film of the present invention. 13 and 14 are plan views showing an embodiment of an optical film of the present invention. [Main component symbol description] 1 Reflective film 2 Light guide plate 3 Diffusion film 4,5 Concentrating film 6 Protective diffusion film 21 Substrate 22 稜鏡 Structure 128054.doc •30- 1352827
23 24 31,32,41,51 300 310, 410, 510, 610, 710, 810 320,420,520,521,620,720, 820,821,920 340, 440, 540, 541, 640, 740, 741, 940, 941 320a, 3 20b, 420a, 420b, 420c, 520a, 5 20b, 521 a, 52 lb, 620b, 720a, 820b, 821a, 82 lb, 920a, 920b 620a, 620c, 720b, 820a, 820c 匕至h13 H】,H2, H4至 H6, HdH12 峰 谷 出光方向 基材 微結構層 第一區域之多峰柱狀結構 第二區域之單峰稜鏡柱狀結構 弧形柱狀結構 稜鏡柱狀結構 谷線高度 多峰柱狀結構中兩相鄰 柱狀結構高度較低者之 局度 128054.doc 3123 24 31,32,41,51 300 310, 410, 510, 610, 710, 810 320, 420, 520, 521, 620, 720, 820, 821, 920 340, 440, 540, 541, 640, 740, 741, 940, 941 320a, 3 20b, 420a, 420b, 420c, 520a, 5 20b, 521 a, 52 lb, 620b, 720a, 820b, 821a, 82 lb, 920a, 920b 620a, 620c, 720b, 820a, 820c 匕 to h13 H], H2, H4 to H6, HdH12 Valley light direction, microstructure, first layer, multi-peak columnar structure, second region, single-peak, columnar structure, arc-shaped columnar structure, columnar structure, valley line height, multi-peak column structure, two adjacent The height of the columnar structure is lower. 128054.doc 31
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| KR20110016423A (en) * | 2009-08-11 | 2011-02-17 | 유브라이트 옵트로닉스 코포레이션 | Brightness-enhanced optical substrate with interference fringe prevention structure |
| TWI460499B (en) * | 2009-09-04 | 2014-11-11 | Eternal Materials Co Ltd | An optical element |
| TWI738824B (en) * | 2010-03-26 | 2021-09-11 | 友輝光電股份有限公司 | A method of forming an optical film |
| JP6046367B2 (en) * | 2011-04-12 | 2016-12-14 | 恵和株式会社 | Optical unit, backlight unit, and liquid crystal display device |
| JP2019139851A (en) * | 2018-02-06 | 2019-08-22 | オムロン株式会社 | Light guide plate, surface light source device, display device, and electronic apparatus |
| CN118348627A (en) * | 2024-06-18 | 2024-07-16 | 苏州弘德光电材料科技有限公司 | Prism structure, brightness enhancement film, backlight module and display device |
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