TWI351105B - Lateral fet structure with improved blocking voltage and on resistance performance and method - Google Patents
Lateral fet structure with improved blocking voltage and on resistance performance and methodInfo
- Publication number
- TWI351105B TWI351105B TW093131717A TW93131717A TWI351105B TW I351105 B TWI351105 B TW I351105B TW 093131717 A TW093131717 A TW 093131717A TW 93131717 A TW93131717 A TW 93131717A TW I351105 B TWI351105 B TW I351105B
- Authority
- TW
- Taiwan
- Prior art keywords
- resistance performance
- blocking voltage
- fet structure
- improved blocking
- lateral fet
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/257—Source or drain electrodes for field-effect devices for lateral devices wherein the source or drain electrodes are characterised by top-view geometrical layouts, e.g. interdigitated, semi-circular, annular or L-shaped electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/601—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs
- H10D30/603—Insulated-gate field-effect transistors [IGFET] having lightly-doped drain or source extensions, e.g. LDD IGFETs or DDD IGFETs having asymmetry in the channel direction, e.g. lateral high-voltage MISFETs having drain offset region or extended drain IGFETs [EDMOS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
- H10D62/127—Top-view geometrical layouts of the regions or the junctions of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
- H10D62/235—Channel regions of field-effect devices of FETs of IGFETs
- H10D62/299—Channel regions of field-effect devices of FETs of IGFETs having lateral doping variations
- H10D62/307—Channel regions of field-effect devices of FETs of IGFETs having lateral doping variations the doping variations being parallel to the channel lengths
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
- H10D64/517—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
- H10D64/519—Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/729,292 US6982461B2 (en) | 2003-12-08 | 2003-12-08 | Lateral FET structure with improved blocking voltage and on resistance performance and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200525752A TW200525752A (en) | 2005-08-01 |
| TWI351105B true TWI351105B (en) | 2011-10-21 |
Family
ID=34652702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093131717A TWI351105B (en) | 2003-12-08 | 2004-10-19 | Lateral fet structure with improved blocking voltage and on resistance performance and method |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6982461B2 (zh) |
| CN (1) | CN100481499C (zh) |
| TW (1) | TWI351105B (zh) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4342498B2 (ja) * | 2005-09-30 | 2009-10-14 | パナソニック株式会社 | 横型半導体デバイス |
| TWI413254B (zh) * | 2007-05-23 | 2013-10-21 | Fairchild Semiconductor | 用於積體電路應用的低導通電阻金氧半導體電晶體 |
| KR101405310B1 (ko) * | 2007-09-28 | 2014-06-12 | 삼성전자 주식회사 | 반도체 집적 회로 장치 및 그 제조 방법 |
| CN102034823B (zh) * | 2009-09-30 | 2013-01-02 | 意法半导体研发(深圳)有限公司 | 用于spu和stog良好性能的功率晶体管的布局和焊盘布图规划 |
| US8154078B2 (en) * | 2010-02-17 | 2012-04-10 | Vanguard International Semiconductor Corporation | Semiconductor structure and fabrication method thereof |
| KR101715762B1 (ko) * | 2010-08-11 | 2017-03-14 | 삼성전자주식회사 | 반도체 소자 |
| JP5586546B2 (ja) * | 2011-03-23 | 2014-09-10 | 株式会社東芝 | 半導体装置 |
| TWI449159B (zh) * | 2011-04-18 | 2014-08-11 | Episil Technologies Inc | 功率橫向雙擴散金氧半導體元件 |
| JP6718733B2 (ja) * | 2015-05-08 | 2020-07-08 | ローム株式会社 | 半導体装置 |
| US9761668B2 (en) * | 2015-05-08 | 2017-09-12 | Rohm Co., Ltd. | Semiconductor device |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5258636A (en) * | 1991-12-12 | 1993-11-02 | Power Integrations, Inc. | Narrow radius tips for high voltage semiconductor devices with interdigitated source and drain electrodes |
| US5313082A (en) * | 1993-02-16 | 1994-05-17 | Power Integrations, Inc. | High voltage MOS transistor with a low on-resistance |
| JP3356586B2 (ja) * | 1995-06-01 | 2002-12-16 | 日本電気株式会社 | 高耐圧横型mosfet半導体装置 |
| TW400560B (en) * | 1996-12-23 | 2000-08-01 | Koninkl Philips Electronics Nv | Semiconductor device |
| JP3545633B2 (ja) * | 1999-03-11 | 2004-07-21 | 株式会社東芝 | 高耐圧型半導体装置及びその製造方法 |
| US6489653B2 (en) * | 1999-12-27 | 2002-12-03 | Kabushiki Kaisha Toshiba | Lateral high-breakdown-voltage transistor |
| US6448625B1 (en) * | 2001-03-16 | 2002-09-10 | Semiconductor Components Industries Llc | High voltage metal oxide device with enhanced well region |
| US6555883B1 (en) * | 2001-10-29 | 2003-04-29 | Power Integrations, Inc. | Lateral power MOSFET for high switching speeds |
-
2003
- 2003-12-08 US US10/729,292 patent/US6982461B2/en not_active Expired - Lifetime
-
2004
- 2004-10-19 TW TW093131717A patent/TWI351105B/zh not_active IP Right Cessation
- 2004-11-26 CN CNB2004100982919A patent/CN100481499C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TW200525752A (en) | 2005-08-01 |
| CN100481499C (zh) | 2009-04-22 |
| US20050127438A1 (en) | 2005-06-16 |
| HK1077920A1 (zh) | 2006-02-24 |
| CN1630096A (zh) | 2005-06-22 |
| US6982461B2 (en) | 2006-01-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |