TWI349293B - Insulating film composition having improved mechanical property - Google Patents

Insulating film composition having improved mechanical property

Info

Publication number: TWI349293B
Authority: TW; Taiwan
Prior art keywords: insulating film; mechanical property; film composition; improved mechanical; improved
Prior art date: 2003-12-23

Application number

TW093140009A

Other languages

English (en)

Other versions

TW200531085A (en

Inventor

Taewan Kim

Jihoon Rhee

Daechul Park

Jongbaek Seon

Kwanghee Lee

Hyundam Jeong

Original Assignee

Samsung Corning Prec Mat Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-12-23

Filing date

2004-12-22

Publication date

2011-09-21

2004-12-22 Application filed by Samsung Corning Prec Mat Co filed Critical Samsung Corning Prec Mat Co

2005-09-16 Publication of TW200531085A publication Critical patent/TW200531085A/zh

2011-09-21 Application granted granted Critical

2011-09-21 Publication of TWI349293B publication Critical patent/TWI349293B/zh

Classifications

- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- H10P14/6922—
- H10W20/071—
- H10P14/6342—
- H10P14/665—
- H10P14/6686—

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Life Sciences & Earth Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Wood Science & Technology (AREA)
Organic Chemistry (AREA)
Formation Of Insulating Films (AREA)
Paints Or Removers (AREA)
Compositions Of Macromolecular Compounds (AREA)
Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

TW093140009A 2003-12-23 2004-12-22 Insulating film composition having improved mechanical property TWI349293B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
KR1020030095793A KR100572801B1 (ko)	2003-12-23	2003-12-23	기계적 특성이 우수한 절연막 코팅 조성물

Publications (2)

Publication Number	Publication Date
TW200531085A TW200531085A (en)	2005-09-16
TWI349293B true TWI349293B (en)	2011-09-21

Family

ID=34747728

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW093140009A TWI349293B (en)	2003-12-23	2004-12-22	Insulating film composition having improved mechanical property

Country Status (5)

Country	Link
US (1)	US7229672B2 (zh)
JP (1)	JP2005184011A (zh)
KR (1)	KR100572801B1 (zh)
CN (1)	CN1644622A (zh)
TW (1)	TWI349293B (zh)

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KR101119141B1 (ko) *	2005-01-20	2012-03-19	삼성코닝정밀소재 주식회사	폴리머 나노 입자를 포함하는 저유전 박막 형성용 조성물및 이를 이용한 저유전 박막의 제조방법
KR100685734B1 (ko) *	2005-06-07	2007-02-26	삼성전자주식회사	다공성 스핀 온 글래스 조성물, 이의 제조 방법 및 이를이용한 다공성 실리콘 산화막 제조 방법
JP4424341B2 (ja) *	2005-12-02	2010-03-03	セイコーエプソン株式会社	薄膜トランジスタ、電子回路、表示装置および電子機器
US9060560B2 (en) *	2007-08-10	2015-06-23	Greenhill Antiballistics Corporation	Composite material
WO2009152301A2 (en) *	2008-06-12	2009-12-17	3M Innovative Properties Company	Low ion content, nanoparticle-containing resin systems
CN101445396B (zh) *	2008-12-09	2011-08-31	西安交通大学	一种瓷绝缘子表面超疏水性涂层的制备方法
CN101659798B (zh) *	2009-09-29	2011-02-09	包头市山晟新能源有限责任公司	绝缘涂料、多晶硅提纯设备及其防电离与防短路方法、电气设备
CA2814986C (en)	2010-10-18	2019-01-15	Greenhill Antiballistics Corporation	Gradient nanoparticle-carbon allotrope-polymer composite material
JP5281188B1 (ja) *	2012-11-26	2013-09-04	有限会社ナプラ	絶縁性ペースト、電子デバイス及び絶縁部形成方法
CN103387792B (zh) *	2013-08-22	2015-08-19	苏州羽帆新材料科技有限公司	一种绝缘颜料
US12191228B2 (en)	2016-04-06	2025-01-07	Sanctioned Risk Solutions, Inc.	Heat dissipation using nanoscale materials
CN106633909B (zh) *	2017-01-13	2018-09-25	深圳市汉华热管理科技有限公司	绝缘浆料及绝缘处理的方法
KR102668437B1 (ko)	2019-09-27	2024-05-23	후지필름 가부시키가이샤	분산액, 조성물, 경화막, 컬러 필터, 고체 촬상 소자 및 화상 표시 장치
JPWO2025115547A1 (zh) *	2023-11-29	2025-06-05

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US2433776A (en) *	1941-09-03	1947-12-30	Monsanto Chemicals	Preparation of sols
US5013585A (en) *	1989-06-13	1991-05-07	Shin-Etsu Chemical Co., Ltd.	Method for the preparation of surface-modified silica particles
CN1163559C (zh) *	1995-04-28	2004-08-25	日本油脂Basf涂料株式会社	涂料组合物及制法和无机氧化物溶胶分散组分的制法
JP3813268B2 (ja) *	1996-03-25	2006-08-23	触媒化成工業株式会社	低誘電率シリカ系被膜形成用塗布液および低誘電率被膜付基材
JP3635156B2 (ja) *	1996-08-19	2005-04-06	ダウコーニングアジア株式会社	硬化性ポリメチルシルセスキオキサン組成物
JPH10310406A (ja) *	1997-03-12	1998-11-24	Catalysts & Chem Ind Co Ltd	有機化合物修飾無機化合物ゾル
US6599631B2 (en) *	2001-01-26	2003-07-29	Nanogram Corporation	Polymer-inorganic particle composites
US6436513B1 (en) *	1997-09-17	2002-08-20	Oji Paper Co., Ltd.	Ink jet recording material
KR100618301B1 (ko) *	1998-09-01	2006-08-31	쇼꾸바이 카세이 고교 가부시키가이샤	낮은 유전상수를 지니는 실리카-포함 필름을 형성하기위한 코팅 액체 및 그의 필름으로 코팅된 기질
US6180249B1 (en) *	1998-09-08	2001-01-30	General Electric Company	Curable silicone foul release coatings and articles
JP4631119B2 (ja) *	2000-01-28	2011-02-16	Ｊｓｒ株式会社	疎水化コロイダルシリカの製造方法
JP2002208565A (ja) *	2001-01-11	2002-07-26	Sharp Corp	半導体装置、その製造方法および液晶表示装置
EP1245642B1 (en) *	2001-03-27	2005-06-08	Samsung Electronics Co., Ltd.	Siloxane-based resin and method for forming an insulating film between interconnecting layers in wafers
JP4482679B2 (ja) *	2002-03-19	2010-06-16	独立行政法人産業技術総合研究所	任意の表面特性及び表面形状を有する基体表面へのシリカ薄膜の製造方法及び複合構造体

2003
- 2003-12-23 KR KR1020030095793A patent/KR100572801B1/ko not_active Expired - Fee Related
2004
- 2004-12-22 TW TW093140009A patent/TWI349293B/zh not_active IP Right Cessation
- 2004-12-22 US US11/021,048 patent/US7229672B2/en not_active Expired - Lifetime
- 2004-12-23 CN CNA2004101048273A patent/CN1644622A/zh active Pending
- 2004-12-24 JP JP2004374163A patent/JP2005184011A/ja active Pending

Also Published As

Publication number	Publication date
JP2005184011A (ja)	2005-07-07
KR100572801B1 (ko)	2006-04-19
US7229672B2 (en)	2007-06-12
US20050159001A1 (en)	2005-07-21
CN1644622A (zh)	2005-07-27
TW200531085A (en)	2005-09-16
KR20050064430A (ko)	2005-06-29

Publication	Publication Date	Title
GB0305941D0 (en)	2003-04-23	Composition
GB0302738D0 (en)	2003-03-12	Composition
GB0324918D0 (en)	2003-11-26	Composition
TWI349293B (en)	2011-09-21	Insulating film composition having improved mechanical property
GB0317303D0 (en)	2003-08-27	Document composition
TWI341181B (en)	2011-05-01	Film sweetening composition
EP1613352A4 (en)	2009-04-29	MICRO-AGREED COMPOSITIONS
GB0324897D0 (en)	2003-11-26	Composition
GB0318824D0 (en)	2003-09-10	Novel composition
GB0322033D0 (en)	2003-10-22	Composition
GB0305790D0 (en)	2003-04-16	Novel Composition
MY145151A (en)	2011-12-30	Composition
GB0300602D0 (en)	2003-02-12	Compositions
GB0309317D0 (en)	2003-06-04	Composition
GB0316857D0 (en)	2003-08-20	Compositions
GB0306312D0 (en)	2003-04-23	Composition
GB0404470D0 (en)	2004-03-31	Composition
GB0326815D0 (en)	2003-12-24	Composition
GB0311442D0 (en)	2003-06-25	Film compositions
GB0301869D0 (en)	2003-02-26	Composition
GB0311465D0 (en)	2003-06-25	Composition
GB0324168D0 (en)	2003-11-19	Composition II
GB0323203D0 (en)	2003-11-05	Composition II
GB0320018D0 (en)	2003-10-01	Composition
GB0308260D0 (en)	2003-05-14	Composition

Legal Events

Date	Code	Title	Description
2020-06-21	MM4A	Annulment or lapse of patent due to non-payment of fees