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TWI348182B - Figure data verification apparatus and method therefor - Google Patents

Figure data verification apparatus and method therefor

Info

Publication number
TWI348182B
TWI348182B TW097101388A TW97101388A TWI348182B TW I348182 B TWI348182 B TW I348182B TW 097101388 A TW097101388 A TW 097101388A TW 97101388 A TW97101388 A TW 97101388A TW I348182 B TWI348182 B TW I348182B
Authority
TW
Taiwan
Prior art keywords
method therefor
data verification
verification apparatus
data
therefor
Prior art date
Application number
TW097101388A
Other languages
English (en)
Other versions
TW200845122A (en
Inventor
Jun Kasahara
Shigehiro Hara
Shinji Sakamoto
Original Assignee
Nuflare Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nuflare Technology Inc filed Critical Nuflare Technology Inc
Publication of TW200845122A publication Critical patent/TW200845122A/zh
Application granted granted Critical
Publication of TWI348182B publication Critical patent/TWI348182B/zh

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level
    • G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
TW097101388A 2007-01-16 2008-01-14 Figure data verification apparatus and method therefor TWI348182B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007007082A JP2008177224A (ja) 2007-01-16 2007-01-16 図形データの検証方法

Publications (2)

Publication Number Publication Date
TW200845122A TW200845122A (en) 2008-11-16
TWI348182B true TWI348182B (en) 2011-09-01

Family

ID=39618590

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097101388A TWI348182B (en) 2007-01-16 2008-01-14 Figure data verification apparatus and method therefor

Country Status (4)

Country Link
US (1) US8255441B2 (zh)
JP (1) JP2008177224A (zh)
KR (1) KR100941575B1 (zh)
TW (1) TWI348182B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5257571B2 (ja) * 2007-09-07 2013-08-07 大日本印刷株式会社 図形パターン分割方法
JP5848135B2 (ja) * 2012-01-10 2016-01-27 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画方法、荷電粒子ビーム描画プログラムおよび荷電粒子ビーム描画装置
KR102247563B1 (ko) 2014-06-12 2021-05-03 삼성전자 주식회사 전자빔을 이용한 노광 방법과 그 노광 방법을 이용한 마스크 및 반도체 소자 제조방법
JP2016076654A (ja) * 2014-10-08 2016-05-12 株式会社ニューフレアテクノロジー 描画データ生成方法、プログラム、マルチ荷電粒子ビーム描画装置、及びパターン検査装置
JP6350204B2 (ja) * 2014-10-21 2018-07-04 株式会社ニューフレアテクノロジー 描画データ検証方法、プログラム、及びマルチ荷電粒子ビーム描画装置
KR101630535B1 (ko) 2014-12-01 2016-06-24 곽현걸 Ｌｐ 음반을 기반으로 한 온라인 음원제공 미디어시스템 및 그 구동방법
KR102404639B1 (ko) 2015-02-02 2022-06-03 삼성전자주식회사 전자 빔 노광 방법 및 그를 포함하는 기판 제조 방법

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001344302A (ja) 2000-06-02 2001-12-14 Nec Corp 電子線露光装置用データの検証方法およびその検証装置
AU2001273057A1 (en) * 2000-06-27 2002-01-08 Fluidigm Corporation A microfluidic design automation method and system
US7155698B1 (en) * 2001-09-11 2006-12-26 The Regents Of The University Of California Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects
JP2004039933A (ja) 2002-07-04 2004-02-05 Matsushita Electric Ind Co Ltd マスク設計システム、マスク設計方法、およびマスク設計処理またはレイアウト設計処理をコンピュータに実行させるためのプログラム
JP2004133704A (ja) 2002-10-10 2004-04-30 Univ Nihon 構造物の設計支援プログラム及び構造物の設計支援装置
JP2004258756A (ja) 2003-02-24 2004-09-16 Sharp Corp 回路部品配置設計方法、及び回路部品配置設計支援装置
JP2005079392A (ja) 2003-09-01 2005-03-24 Toshiba Mach Co Ltd 描画データ作成方法
JP2006350475A (ja) 2005-06-13 2006-12-28 Toyota Central Res & Dev Lab Inc 部品間接触最適化設計方法及び部品間接触最適化設計装置

Also Published As

Publication number Publication date
US8255441B2 (en) 2012-08-28
US20080172438A1 (en) 2008-07-17
KR100941575B1 (ko) 2010-02-10
JP2008177224A (ja) 2008-07-31
KR20080067579A (ko) 2008-07-21
TW200845122A (en) 2008-11-16

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees