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TWI346973B - Substrate processing apparatus and substrate processing method - Google Patents

Substrate processing apparatus and substrate processing method

Info

Publication number
TWI346973B
TWI346973B TW096107285A TW96107285A TWI346973B TW I346973 B TWI346973 B TW I346973B TW 096107285 A TW096107285 A TW 096107285A TW 96107285 A TW96107285 A TW 96107285A TW I346973 B TWI346973 B TW I346973B
Authority
TW
Taiwan
Prior art keywords
substrate processing
processing apparatus
processing method
substrate
processing
Prior art date
Application number
TW096107285A
Other languages
Chinese (zh)
Other versions
TW200802534A (en
Inventor
Yutaka Asou
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200802534A publication Critical patent/TW200802534A/en
Application granted granted Critical
Publication of TWI346973B publication Critical patent/TWI346973B/en

Links

Classifications

    • H10P72/0406—
TW096107285A 2006-03-03 2007-03-02 Substrate processing apparatus and substrate processing method TWI346973B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006057516A JP4674904B2 (en) 2006-03-03 2006-03-03 Substrate processing apparatus and substrate processing method

Publications (2)

Publication Number Publication Date
TW200802534A TW200802534A (en) 2008-01-01
TWI346973B true TWI346973B (en) 2011-08-11

Family

ID=38459194

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107285A TWI346973B (en) 2006-03-03 2007-03-02 Substrate processing apparatus and substrate processing method

Country Status (3)

Country Link
JP (1) JP4674904B2 (en)
TW (1) TWI346973B (en)
WO (1) WO2007100099A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007273826A (en) * 2006-03-31 2007-10-18 Tokyo Electron Ltd Reflow method, pattern forming method, and manufacturing method of TFT element for liquid crystal display device
JP2010103551A (en) * 2009-12-17 2010-05-06 Tokyo Electron Ltd Substrate processing device
JP2012081428A (en) * 2010-10-13 2012-04-26 Tokyo Ohka Kogyo Co Ltd Coating apparatus and coating method
KR102342131B1 (en) 2014-08-15 2021-12-21 가부시키가이샤 스크린 홀딩스 Substrate treatment apparatus, and substrate treatment method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3616584B2 (en) * 2000-06-12 2005-02-02 鹿児島日本電気株式会社 Pattern forming method and display device manufacturing method using the same
JP4410951B2 (en) * 2001-02-27 2010-02-10 Ｎｅｃ液晶テクノロジー株式会社 Pattern forming method and manufacturing method of liquid crystal display device
JP3810056B2 (en) * 2001-03-22 2006-08-16 東京エレクトロン株式会社 Substrate processing method, development processing method, and substrate processing apparatus
JP3741655B2 (en) * 2002-03-04 2006-02-01 東京エレクトロン株式会社 Liquid processing method and liquid processing apparatus
JP2004134627A (en) * 2002-10-11 2004-04-30 Seiko Epson Corp Organic layer removal method
JP2005159293A (en) * 2003-09-18 2005-06-16 Nec Kagoshima Ltd Substrate processing apparatus and processing method
JP2005251989A (en) * 2004-03-04 2005-09-15 Sharp Corp Substrate processing equipment
JP2006013228A (en) * 2004-06-28 2006-01-12 Toshiba Corp Substrate processing method and substrate processing apparatus
JP4524744B2 (en) * 2004-04-14 2010-08-18 日本電気株式会社 Method for forming organic mask and pattern forming method using the organic mask

Also Published As

Publication number Publication date
WO2007100099A1 (en) 2007-09-07
JP2007235025A (en) 2007-09-13
JP4674904B2 (en) 2011-04-20
TW200802534A (en) 2008-01-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees