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TWI341027B - Metal oxide semiconductor device and method of fabricating the same - Google Patents

Metal oxide semiconductor device and method of fabricating the same

Info

Publication number
TWI341027B
TWI341027B TW096116114A TW96116114A TWI341027B TW I341027 B TWI341027 B TW I341027B TW 096116114 A TW096116114 A TW 096116114A TW 96116114 A TW96116114 A TW 96116114A TW I341027 B TWI341027 B TW I341027B
Authority
TW
Taiwan
Prior art keywords
fabricating
semiconductor device
same
metal oxide
oxide semiconductor
Prior art date
Application number
TW096116114A
Other languages
Chinese (zh)
Other versions
TW200845372A (en
Inventor
Ching Hung Kao
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW096116114A priority Critical patent/TWI341027B/en
Publication of TW200845372A publication Critical patent/TW200845372A/en
Application granted granted Critical
Publication of TWI341027B publication Critical patent/TWI341027B/en

Links

TW096116114A 2007-05-07 2007-05-07 Metal oxide semiconductor device and method of fabricating the same TWI341027B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW096116114A TWI341027B (en) 2007-05-07 2007-05-07 Metal oxide semiconductor device and method of fabricating the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW096116114A TWI341027B (en) 2007-05-07 2007-05-07 Metal oxide semiconductor device and method of fabricating the same

Publications (2)

Publication Number Publication Date
TW200845372A TW200845372A (en) 2008-11-16
TWI341027B true TWI341027B (en) 2011-04-21

Family

ID=44822849

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096116114A TWI341027B (en) 2007-05-07 2007-05-07 Metal oxide semiconductor device and method of fabricating the same

Country Status (1)

Country Link
TW (1) TWI341027B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8669617B2 (en) * 2010-12-23 2014-03-11 Intel Corporation Multi-gate transistors

Also Published As

Publication number Publication date
TW200845372A (en) 2008-11-16

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