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TWI340755B - Sensitive materials and manufacturing method for black matrix banks of ink jet color filter - Google Patents

Sensitive materials and manufacturing method for black matrix banks of ink jet color filter

Info

Publication number
TWI340755B
TWI340755B TW095114386A TW95114386A TWI340755B TW I340755 B TWI340755 B TW I340755B TW 095114386 A TW095114386 A TW 095114386A TW 95114386 A TW95114386 A TW 95114386A TW I340755 B TWI340755 B TW I340755B
Authority
TW
Taiwan
Prior art keywords
manufacturing
color filter
ink jet
black matrix
sensitive materials
Prior art date
Application number
TW095114386A
Other languages
English (en)
Other versions
TW200741258A (en
Inventor
Wei Yuan Chen
Original Assignee
Hon Hai Prec Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hon Hai Prec Ind Co Ltd filed Critical Hon Hai Prec Ind Co Ltd
Priority to TW095114386A priority Critical patent/TWI340755B/zh
Priority to US11/560,781 priority patent/US20070249776A1/en
Priority to KR1020070037449A priority patent/KR20070104238A/ko
Priority to JP2007112098A priority patent/JP2007293347A/ja
Publication of TW200741258A publication Critical patent/TW200741258A/zh
Application granted granted Critical
Publication of TWI340755B publication Critical patent/TWI340755B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
TW095114386A 2006-04-21 2006-04-21 Sensitive materials and manufacturing method for black matrix banks of ink jet color filter TWI340755B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
TW095114386A TWI340755B (en) 2006-04-21 2006-04-21 Sensitive materials and manufacturing method for black matrix banks of ink jet color filter
US11/560,781 US20070249776A1 (en) 2006-04-21 2006-11-16 Black-matrix bank composition and method for manufacturing black-matrix banks
KR1020070037449A KR20070104238A (ko) 2006-04-21 2007-04-17 흑색 매트릭스 분할 벽 조성물 및 흑색 매트릭스 분할 벽을제조하는 방법
JP2007112098A JP2007293347A (ja) 2006-04-21 2007-04-20 ブラックマトリクス隔壁材料及びブラックマトリクス隔壁の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095114386A TWI340755B (en) 2006-04-21 2006-04-21 Sensitive materials and manufacturing method for black matrix banks of ink jet color filter

Publications (2)

Publication Number Publication Date
TW200741258A TW200741258A (en) 2007-11-01
TWI340755B true TWI340755B (en) 2011-04-21

Family

ID=38657146

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095114386A TWI340755B (en) 2006-04-21 2006-04-21 Sensitive materials and manufacturing method for black matrix banks of ink jet color filter

Country Status (4)

Country Link
US (1) US20070249776A1 (zh)
JP (1) JP2007293347A (zh)
KR (1) KR20070104238A (zh)
TW (1) TWI340755B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101561524B (zh) * 2008-04-15 2011-11-30 鸿富锦精密工业（深圳）有限公司 彩色滤光片及其制造方法
CN110649185B (zh) * 2019-09-26 2022-08-09 合肥京东方卓印科技有限公司 显示基板及其喷墨打印方法、显示装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214581A (ja) * 1999-01-20 2000-08-04 Toppan Printing Co Ltd 感光性着色組成物及びそれを用いた耐熱性カラ―フィルタ
JP3940523B2 (ja) * 1999-04-27 2007-07-04 セイコーエプソン株式会社 インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法
JP2004004762A (ja) * 2002-04-16 2004-01-08 Mikuni Color Ltd カラーフィルター用カーボンブラック分散液及びカーボンブラック含有樹脂組成物並びにブラックマトリックス
JP4221964B2 (ja) * 2002-07-15 2009-02-12 東洋インキ製造株式会社 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法
KR101075601B1 (ko) * 2004-09-22 2011-10-20 삼성전자주식회사 블랙매트릭스용 조성물 및 이를 이용한 블랙매트릭스패턴의 형성방법
KR20060091669A (ko) * 2005-02-16 2006-08-21 엘지전자 주식회사 플라즈마 디스플레이 패널 전면기판용 블랙매트릭스 조성물
US20080026302A1 (en) * 2006-07-28 2008-01-31 Quanyuan Shang Black matrix compositions and methods of forming the same

Also Published As

Publication number Publication date
US20070249776A1 (en) 2007-10-25
TW200741258A (en) 2007-11-01
JP2007293347A (ja) 2007-11-08
KR20070104238A (ko) 2007-10-25

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees