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TWI239626B - Structure of electrostatic discharge suppressor and method of stacking package with semiconductor devices - Google Patents

Structure of electrostatic discharge suppressor and method of stacking package with semiconductor devices Download PDF

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Publication number
TWI239626B
TWI239626B TW093100770A TW93100770A TWI239626B TW I239626 B TWI239626 B TW I239626B TW 093100770 A TW093100770 A TW 093100770A TW 93100770 A TW93100770 A TW 93100770A TW I239626 B TWI239626 B TW I239626B
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Taiwan
Prior art keywords
protection circuit
electrostatic
metal
semiconductor device
chip
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TW093100770A
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Chinese (zh)
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TW200524131A (en
Inventor
Tsung-Chieh Wu
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Concord Semiconductor Corp
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Publication of TWI239626B publication Critical patent/TWI239626B/en

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    • H10W72/884
    • H10W90/732
    • H10W90/752

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  • Semiconductor Integrated Circuits (AREA)

Abstract

The present invention relates to an overlap cascaded package structure of a semiconductor device and a static over-voltage and surge protection circuit. The semiconductor device chip such as a light emitted diode (LED) or an integrated circuit (IC) is overlap cascaded package on a static over-voltage and surge protection circuit. The front side of the static over-voltage protection chip is equipped with two isolated metal layer electrodes. The trenches also cut the semiconductor device into two devices with opposite polarity devices in cascaded. The trenches also act as scribed lines to scribe the wafer into chips. The semiconductor device chip is overlap cascaded die bond on the static over-voltage protection chip.

Description

1239626 五、發明說明(1) 1 .發明所屬之技術領域 本發明係有關於靜電突波保護電路之晶片構造及其與 半導體裝置疊置之封裝方法,特別是將半導體裝置如發光 二極體、積體電路等晶片疊置於具靜電突波保^電路晶片 之封裝構造’以節省空間及封裝工程,增進保護電路之町 靠度及效用。 2.先前技術 一般半導體裝置例如發光二極體、積體電路等之耐麈 有限’極易受靜電突波之破壞,尤其是發光二極體用於爻 通號誌、顯示器等,易為電壓不穩定、雷擊,停電等因素 影響’使電源成為發光二極體破壞之元兇,而減短其壽 命。若部分損壞,修理相當困難,影響服務品質。若交通 號誌因此作錯誤之指示,將影響安全。故如何保護半導體 元件之女全,使其不致受靜電突波所破壞,為業界所追求 之目標。傳統上靜電突波之保護,可利用許多種保護電 路,如一極體,稽納二極體(Zener di〇de)、M〇s電晶體。 第1圖顯不傳統上利用二個串聯而反向連接之稽納二 極體保護發光二極體之電路圖。發光二極體102有獨自之 封裝1 0 8,保護電路之稽納二極體丨〇 4、丨〇 6另外封裝於封 裝11〇内,再焊接於電路板上之發光二極體1〇2封裝1〇8之1239626 V. Description of the invention (1) 1. Technical field to which the invention belongs The present invention relates to a wafer structure of an electrostatic surge protection circuit and a packaging method for stacking the same with a semiconductor device, particularly a semiconductor device such as a light emitting diode, Chips such as integrated circuits are stacked on the packaging structure of the circuit chip with electrostatic surge protection to save space and packaging engineering, and improve the reliability and effectiveness of the protection circuit. 2. In the prior art, the general semiconductor devices such as light-emitting diodes, integrated circuits, etc. have limited resistance to damage, and are easily damaged by electrostatic surges. Especially, light-emitting diodes are used for signal signals, displays, etc., and are easily voltage Factors such as instability, lightning strikes, power outages, etc., make the power source the culprit in the destruction of light-emitting diodes and shorten their life. If it is partially damaged, repair is quite difficult, affecting service quality. If traffic signs give wrong instructions, safety will be affected. Therefore, how to protect the female components of semiconductor devices from being damaged by electrostatic surges is the goal pursued by the industry. Traditionally, the protection of electrostatic surges can use many types of protection circuits, such as monopoles, Zener diodes, and Mos transistors. Figure 1 shows a circuit diagram that traditionally uses two serially connected reverse diodes to protect the light emitting diode. The light emitting diode 102 has its own package 108, and the protective diodes of the protection circuit 〇〇04, 丨 〇6 are also packaged in the package 110, and then soldered to the circuit board of the light emitting diode 102 Package 10

第5頁 !239626 ⑵ "'--------- 封梦$ =此佔一個封裝之位置,對小型化相當不便,而且 用二彻不同電路需加倍之工程,很不經濟。雖然也可以 係星:保護電路保護許多發光二極體,但-般發光二極體 路亦右t制其明滅,甚難共用一個保護電路,其他積體電 保譫®雨入不相同之問題而不能共用一個保護電路,因此 解決路,存在即多佔空間,多耗材料及製程。而成亟需 ’、之問題,因此需求一種保護電路與半導體裝置封裝之 又良方法,使保護更為完善。 3·發明内容 ^ 本發明之目的在提供一種靜電突波保護電路之晶片構 >及其與半導體裝置疊置之封裝方法,將半導體裝置晶片 疊置封裝於靜電突波保護電路晶片之上,使半導體之裝置 與保護電路晶片合而為一,藉靜電突波保護電路之設計提 升半導體裝置之抗ESD(Electrostatic Discharge)能力並 可減少封裝空間及工程。 本發明之另一目的在提供一種半導體裝置與靜電突波 保護電路疊置之封裝構造,將半導體裝置晶片之負極與保 護電路晶片之元件之一正極以晶片接合(die b〇nd)黏結, 以節省打線工程。Page 5! 239626 ⑵ " '--------- Feng Meng $ = This occupies the position of a package, which is quite inconvenient for miniaturization, and it needs to double the use of different circuits, which is very uneconomical. Although it can also be a star: the protection circuit protects many light-emitting diodes, but the general light-emitting diodes also control the light on and off. It is very difficult to share a protection circuit. Other integrated circuits have different problems with raindrops. It is not possible to share a protection circuit, so to solve the problem, the existence will occupy more space and consume more materials and processes. This is a problem that is in urgent need. Therefore, there is a need for another good method of protecting circuits and packaging of semiconductor devices to make protection more perfect. 3. SUMMARY OF THE INVENTION ^ The object of the present invention is to provide a wafer structure of an electrostatic surge protection circuit and a packaging method for stacking the same with a semiconductor device. The semiconductor device wafer is stacked and packaged on the electrostatic surge protection circuit chip. The semiconductor device and the protection circuit chip are integrated into one, and the electrostatic surge protection circuit design is used to improve the anti-ESD (Electrostatic Discharge) capability of the semiconductor device and reduce packaging space and engineering. Another object of the present invention is to provide a packaging structure in which a semiconductor device and an electrostatic surge protection circuit are stacked, and a negative electrode of a semiconductor device wafer and a positive electrode of one of the components of the protection circuit wafer are bonded by a die bond, so that Save wiring work.

1239626 五、發明說明(3) 護電路晶片保護,佶個%丨狄座丨丄…兹冰 增加可靠度。 控料導體裝置之保護更確實, 為達成以上目的及改進一般伴if雷政只—仏壯 於半導體元件上之缺& 士八,保漫電路另仃封裝再安裝 電突波仵護電路明之第一觀點在教示一種靜 电大及保邊玉路之構造,至少包一 ί合雜極:之逆偏壓崩潰電壓 弟了1丰導體層,擴散於第一型半導體 半導體之乂圍::體;一絕緣層,形成於二極體之第二型 =體;乍?離層;•一及第二金屬接線墊,形成 塾第第屬接線塾有-突出塊,作極性辨Li; 靜線墊為一矩形;複數條韻刻溝槽,形成 If電保4電路曰曰片之切割道,每二個二極體之間之餘刻溝 槽,用以隔離二個二極體,使二個二極體共用第一型半導 體層。 本發明之第二觀點在教示一種半導體裴置與靜電突波 保護電路疊置封裝構造,將半導體裝置之晶片以晶片接合 法疊置封裝在靜電突波保護電路之上,至少包含阳一靜5 突波保護電路晶片,以晶片接合於導線架上,正面設^互 相隔離之第一金屬接線墊及第二金屬接線墊;一半導體裝 ,晶片,以倒裝晶片(flip chip)疊置於該靜電保護電路义 ,片之,正極之金屬接線墊直接與該靜電突波保護電路 晶片之第一金屬接線墊連接,而與該靜電突波保護電路之 第二金屬接線墊以絕緣層絕緣,負極之金屬接線墊以金屬 第7頁 1239626 五、發明說明(4) 線打線連至该靜電突波保護電路之第二金屬接線墊·,以金 屬線將靜電保護電路晶片之第一金屬接線墊連接至電源之 正極,將靜電保護電路晶片之第二金屬接線墊連至電源之 負極;將該導線架上之靜電突波保護電路晶片及疊置於其 上之半導體裝置晶片封裝於塑膠封裝内。 本發明之第三觀點在教示一種半導體裝置與靜電突波 保護電路叠置封裝構造’該半導體裝置晶片,疊置於該靜 電保護電路晶片之上’與該靜電突波保護電路之金屬接線 塾以絕緣層絕緣’正極之金屬接線塾以金屬線打線連至該 該靜電突波保護電路晶片之第一金屬接線塾,負極之金^ 接線墊亦以金屬線打線連至該靜電突波保護電路之第二金 屬接線墊。 4·實施方式 本發明之内容可經由下述實施例配合其相關圖式之閣 述而予揭示。參考第2圖,第2圖係依據本發明之一實施例 之半導體裝置晶片及保護電路晶片封裝之示意圖。半導體 裝置例如是一發光二極體丨0 2,與保護電路之反向串聯之 二極體104、106係封裝於同一個保護電路及發光二極體封 裝112之内,二極體1〇6之正極連接至發光二極體1〇2之正 極’二極體1 〇 4之正極連接至發光二極體丨〇 2之負極,對外 由二支插腳連接至電源或信號源。1239626 V. Description of the invention (3) Protection of circuit chip protection, one% 丨 Di seat 丨 丄 ... Zingbing Increases reliability. The control of the material-controlling conductor device is more reliable. In order to achieve the above purpose and improve the general companionship, it is stronger than the lack of semiconductor components & Shiba, Baoman circuit is separately packaged and then installed with electric surge protection circuit. The first viewpoint teaches a structure of static electricity and Baobian Jade Road, which includes at least one heteropolar: reverse bias breakdown voltage, a 1-rich conductor layer, and spreads around the first type semiconductor semiconductor: body ; An insulating layer, formed in the second type of the diode = body; Delamination; • First and second metal wiring pads, forming the first subordinate wiring, with-protruding blocks for polarity discrimination Li; static wire pads are rectangular; multiple grooves are engraved to form If electric protection 4 circuits: In the cutting line of the film, a trench is formed between every two diodes to isolate the two diodes, so that the two diodes share the first type semiconductor layer. A second aspect of the present invention teaches a semiconductor package and an electrostatic surge protection circuit stack packaging structure, and a semiconductor device wafer is stacked and packaged on the electrostatic surge protection circuit by a wafer bonding method, including at least Yang Yijing 5 The surge protection circuit chip is bonded to the lead frame with the chip, and the front side is provided with a first metal wiring pad and a second metal wiring pad which are isolated from each other; a semiconductor package, and the wafer is stacked with a flip chip In the electrostatic protection circuit, the positive metal wiring pad is directly connected to the first metal wiring pad of the electrostatic surge protection circuit chip, and the second metal wiring pad of the electrostatic surge protection circuit is insulated by an insulating layer, and the negative electrode is The metal terminal pad is made of metal. Page 7 1239626 V. Description of the invention (4) The wire is connected to the second metal terminal pad of the electrostatic surge protection circuit. The first metal terminal pad of the electrostatic protection circuit chip is connected by a metal wire. To the positive pole of the power supply, connect the second metal wiring pad of the electrostatic protection circuit chip to the negative pole of the power supply; the electrostatic surge protection circuit chip on the lead frame Stacked on the semiconductor device wafer thereon encapsulated within the plastic package. A third aspect of the present invention teaches a stacked packaging structure of a semiconductor device and an electrostatic surge protection circuit 'the semiconductor device wafer is stacked on the electrostatic protection circuit wafer' and the metal wiring of the electrostatic surge protection circuit is to Insulation layer insulation 'The metal wiring of the positive pole is connected to the first metal wiring of the electrostatic surge protection circuit chip by a metal wire, and the gold of the negative electrode ^ The wiring pad is also connected to the electrostatic surge protection circuit by a metal wire. Second metal wiring pad. 4. Embodiment The content of the present invention can be disclosed through the following embodiments in conjunction with the related drawings. Referring to FIG. 2, FIG. 2 is a schematic diagram of a semiconductor device chip and a protection circuit chip package according to an embodiment of the present invention. The semiconductor device is, for example, a light emitting diode 丨 02, and the diodes 104 and 106 in reverse series with the protection circuit are packaged in the same protection circuit and light emitting diode package 112, and the diode 10 is The positive pole of the light-emitting diode 102 is connected to the positive pole of the light-emitting diode 102 and the positive pole of the diode 100 is connected to the negative pole of the light-emitting diode -02. The two pins are externally connected to a power source or a signal source.

第8頁 1239626 五、發明說明(5) 第3圖係依據本發明之 每 之保護電路(在本例為稽封褒半導體裝置 平面圖;第3圖⑻為緣之構造圖。第3圖U)為 線之剖面圖。如第3圖(a)所-°面K ’第3圖(c)為緣B-B 獅上,石夕基議ii:;产極體係製作於石夕基 電壓決定,則,基板之推:===電路之安全 (1)Page 1239626 V. Explanation of the invention (5) Figure 3 is a protection circuit according to the present invention (in this example, the plan view of the semiconductor device; Figure 3) is a structural diagram of the edge. Figure 3 U Is a sectional view of the line. As shown in Figure 3 (a), the-° plane K 'Figure 3 (c) is the edge BB on the lion, Shi Xiji discusses ii :; the production pole system is determined by Shi Xiji voltage, then, the substrate push: = == Circuit Safety (1)

VB= £sEm2/2qNB 式中es為半導體之介電係數(permitivity) :電場,q為電子之電荷,Nb為石夕晶片之摻雜濃度由為(,) j可知NB之摻雜濃度低,崩潰電壓高;反之,心之 高,則崩潰電壓低。例如要保護之電路最高承6受電壓夂 伏特,則崩潰電壓選擇8伏特,摻雜濃度Νβ應為2x 101/' atom/cm3,又如保護電路之最高承受電壓為7〇伏特,摻雜 濃度NB應為l(Pat〇m/cm3。若為M0S電晶體,則設計其間極 之臨限電壓(threshold voltage)而設定其氧化層^度。 在決定矽基板3 0 3之摻雜濃度後,再於其上以擴散法 或離子植入P型摻雜層310而形成PN接面,再以微影餘刻形 成氧化層306及鋁金屬層308,再以微影蝕刻形成隔離溝槽 3〇4。第3圖(a)之平面圖顯示切割後之單一雙稽納二極體 之佈置,隔離溝槽3 0 4用於隔離兩個電晶體,鋁金屬層 1239626 五、發明說明(6) 308、309用於連接被保護之半導體裝置如發光二極體,鋁 金屬層308用以連接電源之正極及被保護半導體裝置之正 極,並電連接至稽納二極體之一陽極(p型層)。鋁金屬声 309直接與被保護半導體裝置之負極連接,再以打線連^ 至電源之負極。凸出之鋁金屬層314係用以識別或連線至 其他電路。氧化層3〇6則為使溝槽3()4之切割道上之晶 陷(因切割而產生)不致受到強電場而漏電。 。、 第4圖顯示依據本發明之一實施例之半導體裝置之構 造圖。一第4圖(a)為平面圖,第4s|(b)為剖面圖。如第*圖 a所不,半導體裝置4〇〇例如為一發光二 為晶片枯合及二極體之正極接線塾。負極金 〇ndlng Pad)410作連線之用,係將藍寶石(A12 n η之—部錢去除所佔面積宜小,宜在—角隅或 :ϊ窨:=通常為100"mx 100_左右,此半導體裝置 Lm )基體408,n型蟲晶層402及p型蟲晶層綱 體,導電層406供晶片黏著(die bond)之用, Λ之Λ極連接至半導體裝置4GG。另有—層絕緣層 線墊編絕緣 之正極與保護電路晶片之第二金屬接 參^第5圖及第6圖,第5圖係 發 施例將半導體梦罟曰U J n 〇矗里w 队墀个知月I 耳 立凌置日日片400壹置封裝於保護電路晶片302上 ”〜圖,第6圖係顯示緣第5圖之d-d線之剖面圖。 1239626 五、發明說明(7) 由第5圖可知,半導體裝置晶片4〇〇係以倒裝晶片(flip chip)黏著方式疊置接合於保護電路晶片302之第二金屬接 線墊308及第一金屬接線墊309上。參考第6圖,半導體裝 置晶片4 0 0之正極金屬電極4 〇 6直接與保護電路晶片3 〇 2之 左邊之保護電路二極體之第一金屬接線墊3〇g接合而導 通,但右邊之保護電路之第二金屬接線墊因有半導體裝置 晶片之正極金屬電極4 〇 6下之絕緣層41 2絕緣,故不導通, 使半導體裝置400之負極金屬接線墊41〇由金屬線打線502 與右邊之保護電路二極體之第二金屬接線墊3〇8連接而導 通’再由金屬線打線504接至電源之負極。因此,電源之 負極經由打線504及第二金屬接線墊3〇8及打線502連至半 導體裝置400之負極金屬接線墊41〇,然後經半導體裝置之 pn接面至正極金屬電極4〇 6,第一金屬接線墊3 〇9及打線 506接至電源之正極。另一通路經由第二金屬接線墊3〇8連 接至保濩電路右邊之二極體之正極(參考第2圖及第6圖)再 經過np接面及pn接面至左邊之二極體之第一金屬接線墊 30 9連接至電源之正極。故半導體裝製晶片4〇〇疊置於保護 路晶片302之上,半導體裝置之正極直接與保護電路連 接,不需另行打線,僅負極需打線連接至電源之負極,不 但減少打線及另行封裝之複雜工作,且散埶亦可經由 電路晶片之第一型半導體302快速散熱, 裝置 400之可靠性及耐用性。 f emu 第7圖係依據本發明之一實施例之半導體裝置7〇〇之構VB = £ sEm2 / 2qNB where es is the permittivity of the semiconductor: electric field, q is the charge of the electron, and Nb is the doping concentration of the Shi Xi wafer. It can be seen that the doping concentration of NB is low, The collapse voltage is high; conversely, the higher the heart, the lower the collapse voltage. For example, the circuit to be protected can withstand a maximum voltage of 6 volts, and the breakdown voltage should be 8 volts. The doping concentration Nβ should be 2x 101 / 'atom / cm3. For example, the maximum withstand voltage of the protection circuit is 70 volts and the doping concentration. NB should be 1 (Pat 0m / cm3. If it is a MOS transistor, design the threshold voltage between them and set its oxide layer. After determining the doping concentration of the silicon substrate 3 0 3, Then, a PN junction is formed thereon by diffusion or ion implantation of the P-type doped layer 310, and then an oxide layer 306 and an aluminum metal layer 308 are formed by lithography, and then an isolation trench is formed by lithography etching. 4. The plan view of Fig. 3 (a) shows the arrangement of a single double zener diode after cutting. The isolation trench 3 0 4 is used to isolate two transistors. The aluminum metal layer is 1239626. 5. Description of the invention (6) 308 and 309 are used to connect a protected semiconductor device such as a light emitting diode, and the aluminum metal layer 308 is used to connect the positive electrode of a power source and the positive electrode of the protected semiconductor device, and is electrically connected to one of the anode diodes (p-type) Layer). Aluminum metal sound 309 is directly connected to the negative electrode of the protected semiconductor device, and then A wire is connected to the negative electrode of the power supply. The protruding aluminum metal layer 314 is used to identify or connect to other circuits. The oxide layer 306 is used to trap the crystals on the cutting path of the groove 3 () 4 (due to cutting And) is not subject to strong electric field leakage. Figure 4 shows the structure of a semiconductor device according to an embodiment of the present invention. Figure 4 (a) is a plan view, and Figure 4s | (b) is a cross-sectional view. As shown in Fig. * A, the semiconductor device 400 is, for example, a light emitting diode, a wafer connection and a positive electrode connection of a diode. The anode gold electrode pad 410 is used for connection, and the sapphire (A12 n The area occupied by η-money removal should be small, and should be at the corner 隅 or: ϊ 窨: = usually about 100 " mx 100_, the semiconductor device Lm) substrate 408, n-type worm crystal layer 402 and p-type The crystal layer structure, the conductive layer 406 is used for die bond, and the Λ pole of Λ is connected to the semiconductor device 4GG. In addition—the insulation of the insulation layer wire pad braided insulation of the positive electrode and the second metal connection of the protection circuit chip ^ Figure 5 and Figure 6, Figure 5 is an example of the semiconductor dream UJ n 〇 矗 里 w team One Zhiyue I Erling Ling sun and sun film 400 is packaged on the protection circuit chip 302 "~ Figure, Figure 6 is a cross-sectional view showing the dd line of Figure 5. 1239626 V. Description of the invention (7) It can be seen from FIG. 5 that the semiconductor device wafer 400 is bonded to the second metal wiring pad 308 and the first metal wiring pad 309 of the protection circuit wafer 302 by flip chip bonding. Refer to No. 6 In the figure, the positive metal electrode 4 0 of the semiconductor device wafer 400 is directly connected to the first metal wiring pad 30 g of the protection circuit diode 3 on the left side of the protection circuit wafer 3 0 2, but the protection circuit on the right side is conductive. The second metal wiring pad is insulated by the insulating layer 41 2 under the positive metal electrode 4 06 of the semiconductor device wafer, so it is not conductive, so that the negative metal wiring pad 41 of the semiconductor device 400 is wired 502 by a metal wire and the protection circuit on the right Diode second metal wiring pad 3 8 connection and conduction, and then connected to the negative electrode of the power supply by the metal wire wire 504. Therefore, the negative electrode of the power supply is connected to the negative metal wire pad 41 of the semiconductor device 400 through the wire 504 and the second metal wiring pad 308 and wire 502 It then connects to the positive metal electrode 406 through the pn junction of the semiconductor device, and the first metal wiring pad 309 and wire 506 are connected to the positive pole of the power supply. The other path is connected to the protection circuit via the second metal wiring pad 308. The positive electrode of the right diode (refer to Figure 2 and Figure 6) is connected to the positive electrode of the power supply through the np interface and the pn interface to the first metal wiring pad 30 9 of the left diode. The chip 400 is stacked on the protection circuit chip 302, and the positive electrode of the semiconductor device is directly connected to the protection circuit without additional wiring. Only the negative electrode needs to be wired to the negative electrode of the power supply, which not only reduces the complicated work of wiring and separate packaging, and Dispersion can also be quickly dissipated through the first type semiconductor 302 of the circuit chip, and the reliability and durability of the device 400. Fig. 7 is a structure of a semiconductor device 700 according to an embodiment of the present invention.

1239626 發明說明(8) 造圖。第7圖(a)係平面圖,第七圖(b)係緣第7圖(&)之£ —E 線之剖面圖。半導體裝置晶片7〇〇係在GaAs基體7〇2上磊晶 P型半導體磊晶層704及N型半導體磊晶層706,再沉積一層 透明導電層7 0 8及以微影術形成負極接線墊了丨〇,作連線之 用,所佔面積宜小,宜在一角隅或一側,其面積通常在 100//mx 100/zm左右。GaAs基底7〇2上面有正極金屬電極 714供晶片黏著(die b〇nd)之用。並將電源之正極連接至 半導體裝置700之正極,另有一層絕緣層712,使半導體裝 置之正極與保護電路晶片之第二金屬接線墊308絕緣。此 種半導體装置例如黃光發光二極體、紅光發光二極體等。 第8圖係顯示依據本發明之一實施例將半導體裝置晶 片700疊一置封裝於保護電路晶片3〇2上之平面示意圖。第9 圖係,、、、員示第8圖之f — ρ線之剖面圖。此一實施例因半導 係磊晶於。^上,而以紅係導電材料,故不需倒裝、 :片封震,僅直接將基板70 2疊置於保護電路上即可,發 由透明導電層射出。其他皆與第5圖及第6圖之實施例相 同,故不贅述。1239626 Description of the invention (8) Drawing. Fig. 7 (a) is a plan view, and Fig. 7 (b) is a sectional view taken along line £ -E of Fig. 7 (&). The semiconductor device wafer 700 is epitaxially p-type semiconductor epitaxial layer 704 and N-type semiconductor epitaxial layer 706 on a GaAs substrate 702, and then a transparent conductive layer 708 is deposited and a negative wiring pad is formed by lithography. For the purpose of connection, the area occupied should be small, it should be at one corner or one side, and its area is usually about 100 // mx 100 / zm. The GaAs substrate 702 has a positive metal electrode 714 on it for die bonding. The positive electrode of the power source is connected to the positive electrode of the semiconductor device 700, and an insulating layer 712 is provided to insulate the positive electrode of the semiconductor device from the second metal wiring pad 308 of the protection circuit chip. Such a semiconductor device is, for example, a yellow light emitting diode, a red light emitting diode, or the like. FIG. 8 is a schematic plan view showing a semiconductor device wafer 700 stacked and packaged on a protection circuit wafer 302 according to an embodiment of the present invention. Fig. 9 is a sectional view taken along line f-ρ of Fig. 8; This embodiment is epitaxial due to the semiconductor system. The red conductive material is used, so there is no need to invert the chip, and the chip is sealed. Simply place the substrate 70 2 on the protective circuit and send it out from the transparent conductive layer. Others are the same as those in the embodiments of FIG. 5 and FIG.

說2然以上實施例以發光二極體之半導體裝置400及7( 及夕曰發月之觀點,但其他半導體裝置如積體電路,So( # ί =片u封敦皆可利用本發明;又保護電路不一定用於 “ 上’亦可用於信號電路上。It is said that although the above embodiments are based on the light emitting diode semiconductor devices 400 and 7 (and the evening moon), but other semiconductor devices such as integrated circuits, So (# ί = 片 u 封 敦) can use the present invention; And the protection circuit is not necessarily used for "up" and can also be used for signal circuits.

.1239626 五、發明說明(9) 朴 ---— 由h鱼办yf土 姑2 上早又佳之具體實施例之詳述,你I炒 是描,本創作之特徵與精神,而並非以上述^ 2更加清 具體貫例來對本發明之範疇加以限制。相反 ^的較佳 希=能涵蓋各種改變及具相等性的安排 ς二:是 之專利範疇内。 个〜月所欲申請 1239626.1239626 V. Description of the invention (9) Pu ------- Detailed description of the specific embodiment of the early and better by h fish office yf TU Gu 2, you describe it, the characteristics and spirit of this creation, not the above ^ 2 is more specific and specific examples to limit the scope of the present invention. On the contrary ^ better hope = can cover all kinds of changes and arrangements with equality ς 2: Yes within the scope of patents. Months ~ months to apply for 1239626

5 ·_式簡單說明: 第1圖顯示傳統上利用一伽由_ 保護發光二極體:電用路-:。串聯而反向連接之積 第2圖係依據本發明一择 電路晶片封裝之示意圖 +導體裝置晶片及保護 r電:d, ΐ明之一實施例用於封裝半導體裝置之保 ^電路(在本例為稽納二極體)之構造圖。 圖4。圖顯不依據本發明之一實施例之半導體裝置之構造 =5圖係顯μ據本發明之—實施例料導體裝置晶片權 且置封/裝於保護電路晶片302上之平面示意圖。 第6圖係顯示緣第5圖之c — c線之剖面圖。 第7圖係依據本發明之一實施例之半導體裝置7〇〇之構造 圖〇 第8圖係顯示依據本發明之一實施例將半導體裝置晶片70C 疊置封裝於保護電路晶片302上之平面示意圖。 第9圖係顯示第8圖之EE線之剖面圖。 符號說明: 102發光二極體 104稽納二極體 1 〇 6稽納二極體 1 0 8封裝5 · _ simple explanation: Figure 1 shows the traditional use of a galvanic protection of light-emitting diodes: electrical circuit-:. The product of serial and reverse connection. Figure 2 is a schematic diagram of a selective circuit chip package according to the present invention + a conductor device chip and protection r electric: d, one of the embodiments is used to package a semiconductor device protection circuit (in this example) It is a structural diagram of the audit diode. Figure 4. The figure shows the structure of a semiconductor device according to an embodiment of the present invention. = 5 The figure shows a schematic plan view of a semiconductor device according to the present invention—a semiconductor device wafer right and sealed / mounted on a protection circuit wafer 302. Fig. 6 is a sectional view taken along line c-c of Fig. 5; FIG. 7 is a structural diagram of a semiconductor device 700 according to an embodiment of the present invention. FIG. 8 is a schematic plan view showing a semiconductor device wafer 70C stacked and packaged on a protection circuit wafer 302 according to an embodiment of the present invention. . FIG. 9 is a cross-sectional view showing the EE line in FIG. 8. Explanation of symbols: 102 light emitting diode 104 accumulator diode 1 06 accumulator diode 1 0 8 package

12396261239626

第15頁 圖式簡單說明 110 封裝 112 封裝 302 晶片 303 矽基板 304 溝槽 306 氧化層 308 金屬層 309 金屬層 310 摻雜層 312 氧化層 314 金屬層 400 半導體裝置 402 η型基體 404 擴散層 406 金屬層 408 藍寶石(Α 12 03 )基體 410 接線墊 412 氧化層 502 打線 5 04, 50 6 打線 700 裝置 702 G a A s基體 704 Ρ型半導體磊晶層 706 N型半導體磊晶層 708 透明導電層 710 接線墊 712 絕緣層 714 正極金屬電極Brief description of drawings on page 15 Package 110 Package 302 Chip 303 Silicon substrate 304 Trench 306 Oxide layer 308 Metal layer 309 Metal layer 310 Doped layer 312 Oxide layer 314 Metal layer 400 Semiconductor device 402 n-type substrate 404 Diffusion layer 406 Metal Layer 408 sapphire (Α 12 03) substrate 410 terminal pad 412 oxide layer 502 wire 5 04, 50 6 wire 700 device 702 G a A s substrate 704 P-type semiconductor epitaxial layer 706 N-type semiconductor epitaxial layer 708 transparent conductive layer 710 Terminal pad 712 Insulating layer 714 Positive metal electrode

Claims (1)

1239626 六、申請專利範圍 1. 一種靜電 一第一型半 極體之逆偏壓崩 一第二型半 成二極體; 一絕緣層, 突波保護電路之構造,至少包含: 導體基板’選擇其摻雜濃度,使形成之二 潰電壓適合所需之值; 導體層,擴散於第一型半導體之上,以形 隔離層 第 及第 緣層之二個窗口 突出塊, 形; 複數條蝕刻 二極體之 極體共用 墊有一 為一矩 每二個 二個二 形成於二極體之第二型半導體之周圍以 作 金屬接線墊,形成於第二型半導體體上絕 :極!1之負極接線墊,第-金屬接線 辨哉及接線之用,第二金屬接線墊 ί:細:成靜電保護電路晶片之切割道, " 1 ’籌槽,用以隔離二個二極體,使 第一型半導體層。 項之構造,其中該蝕刻溝槽亦 護電1 2路利範圍第1項之構造,其中該靜電突波保 β蔓電路為-個串接而極性相反之二極體。 蠖電4路t申:ί利犯圍第1項之構造,其中該靜電突波保 沒電路為一個串接而極性相反之稽納二極體。1239626 VI. Scope of patent application 1. A kind of static electricity-reverse bias of a first type semipolar body-a second type semi-diode; an insulation layer, the structure of the surge protection circuit, at least: the conductor substrate 'selection Its doping concentration makes the formed two breakdown voltages suitable for the required value; the conductor layer is diffused on the first type semiconductor and is shaped as two window protruding blocks of the first and the edge layer of the isolation layer; The diode common pole pads are formed at a moment every two, two and two are formed around the second type semiconductor of the diode as a metal wiring pad, formed on the second type semiconductor body: pole! No. 1 negative terminal pad, the first-metal wiring identification and wiring, the second metal terminal pad: fine: into the static protection circuit chip cutting track, " 1 'chip slot, used to isolate two diodes To make the first type semiconductor layer. The structure of the item, wherein the etched trench also protects the structure of item 1 of the 12-pole range, wherein the electrostatic surge protection β-man circuit is a diode connected in series with opposite polarity. Yingdian No. 4 Road Application: The structure of Lilienwei Item 1, in which the electrostatic surge protection circuit is a series diode with opposite polarity. 1 ·如申請專利範圍第1 2 可用局部氧化層(LOCOS)。 1239626 六、申請專利範圍 敗5.如申請專利範圍第3項之構造,其中該靜電保護電 叫之一極體之崩潰電壓由矽基板之摻雜濃度決定。 6·如申請專利範圍第4項之構造,其中該靜電保護電 之稽納二極體之崩潰電壓由矽基板之摻雜濃度決定。 、7· 種半導體裝置與靜電突波保護電路疊置封裝之 =f將半導體裝置之晶片以晶片接合法疊置封裝在靜電 大波保護電路之上,至少包含: 靜電突波保護電路晶片,以晶片接合於導線架上, 正面設有互相隔離之第一金屬接線墊及第二金屬接線墊; 一半導體裝置晶片,以倒裝晶片(flip chip)疊置於 該2電保護電路晶片之上,正極之金屬接線墊直接與該靜 ,突波保護電路晶片之第一金屬接線墊連接,而與該靜電 突波保護電路之第二金屬接線墊以絕緣層絕緣,負極之金 屬接線墊以金屬線打線連至該靜電突波保護電路之 屬接線墊; π —孟 至雷:ί ΐ Ϊ將靜電保護電路晶片之第—金屬接線墊連接 至電源之正極,將靜電保護電路晶片 至電源之負極; 币鱼屬接線墊連 ,將該導線架上之靜電突波保護電路晶片及聶 之半導體裝置晶片封裝於塑膠封裝内。 且;上 裴之 8· —種半導體裝置與靜電突波保護電路疊置封 第17頁 1239626 六、申請專利範圍 方法,將半導體裝 突波保護電路之上 一靜電突波保 正面設有互相隔離之第一金 一半導體裝置 上,與該靜 正極之金屬 路晶片之第 線連至該靜 以金屬 至電源之正 至電源之負 將該導 之半導體裝 以晶片 含·· 片,以 屬接線 置於該 之金屬 打線連 負極之 之第二 路晶片 電路晶 電突波 線將靜 極,將 極; 線架上 置晶片 晶片接 墊及第 靜電保 接線墊 至該該 金屬接 置之晶片 ,至少包 護電路晶 晶片,疊 電突波保護電路 接線墊以金屬線 一金屬接線墊, 保護電路 電保護電 靜電保護 之靜電突波保護 封裝於塑膠封裝 接合法疊置封裝在靜電 合於導線架上 二金屬接線墊 護電路晶片之 以絕緣層絕緣, 靜電突波保護電 線墊以金屬線打 金屬接線塾,· 之第一金屬接線墊連接 片之第二金屬接線墊連 電路晶片及疊置於其上 内。 如申請專利範圍第7或8項之方法,纟中該靜 保濩電路為二個串接而極性相反之-極體了 1 0 ·如申請專利範圍第7劣s 了石 ^ ^ Φ ^ ^固弟『成8項之方法,其中該靜電突 /皮保遵電路為一個串接而極M q 找改相反之稽納二極體。 1 1 ·如申請專利範圍第q g 路t _ π舻> & t \ 項方法,其中該靜電保護電 塔之_極體之朋潰電壓由 y i板之摻雜濃度決定。 第18頁 12396261 · As the scope of patent application No. 1 2 Local oxide layer (LOCOS) is available. 1239626 6. Scope of patent application Failure 5. For the structure of item 3 of the scope of patent application, in which the breakdown voltage of one electrode body of the electrostatic protection call is determined by the doping concentration of the silicon substrate. 6. The structure of item 4 in the scope of patent application, wherein the breakdown voltage of the electrostatic protection diode is determined by the doping concentration of the silicon substrate. 7, ·· Semiconductor device and electrostatic surge protection circuit are stacked and packaged = f The semiconductor device wafer is stacked and packaged on the electrostatic large wave protection circuit by wafer bonding method, including at least: electrostatic surge protection circuit wafer Bonded to the lead frame, the front side is provided with a first metal wiring pad and a second metal wiring pad that are isolated from each other; a semiconductor device wafer, which is flip chip stacked on the 2 electrical protection circuit wafer, and a positive electrode The metal wiring pad is directly connected to the first metal wiring pad of the static and surge protection circuit chip, and the second metal wiring pad of the electrostatic surge protection circuit is insulated by an insulating layer, and the negative metal wiring pad is wired with a metal wire. The connection pads connected to the electrostatic surge protection circuit are: π — Meng Zhilei: ΐ Ϊ Ϊ Connect the first-metal connection pad of the electrostatic protection circuit chip to the positive pole of the power supply, and connect the electrostatic protection circuit chip to the negative pole of the power supply; The genus wiring pads are connected, and the electrostatic surge protection circuit chip and the Nie semiconductor device chip on the lead frame are packaged in a plastic package. And; Shang Pei's 8 · —Semiconductor device and electrostatic surge protection circuit are superimposed and sealed. Page 17 1239626 6. Method of applying for a patent, the front surface of an electrostatic surge protection circuit on a semiconductor-mounted surge protection circuit is isolated from each other. On the first gold-one semiconductor device, the second line of the metal circuit chip of the static positive electrode is connected to the positive metal to the positive of the power source to the negative of the power source. The conductive semiconductor is mounted on a wafer containing a chip to connect it. The second chip circuit crystal electrical surge line placed on the metal wire and the negative electrode will be static, and the pole; the wafer wafer pad and the electrostatic protection wiring pad on the wire rack to the metal-connected wafer, at least Cover the circuit wafer, stack the electrical surge protection circuit connection pads with metal wire-to-metal connection pads, protect the circuit electrical protection, electrostatic static protection, electrostatic surge protection, encapsulated in a plastic package, bonding method, superimposed and packaged on static electricity, and lead frame. Two metal wiring pads protect the circuit chip with an insulation layer, and the electrostatic surge protects the wire pads with metal wires. The second sheet metal of the metal terminal pads connected to the wiring circuit chip and interconnect pads stacked thereon. For example, if the method of the 7th or 8th in the scope of patent application, the static protection circuit is two in series and the polarity is opposite-the polar body is 10. · If the 7th scope of the patent application is inferior, it is ^ ^ Φ ^ ^ Gudi's method of 8 items, in which the electrostatic rush / pico compliance circuit is a series connection and the pole M q is changed to change the opposite diode. 1 1 · For the method of item q g t_ π 舻 > & t \ in the scope of the patent application, wherein the voltage of the _ pole of the electrostatic protection tower is determined by the doping concentration of the y i plate. Page 18 1239626 第19頁Page 19
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