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TWI233840B - Air-assisted-type singular atomization device - Google Patents

Air-assisted-type singular atomization device Download PDF

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Publication number
TWI233840B
TWI233840B TW92108515A TW92108515A TWI233840B TW I233840 B TWI233840 B TW I233840B TW 92108515 A TW92108515 A TW 92108515A TW 92108515 A TW92108515 A TW 92108515A TW I233840 B TWI233840 B TW I233840B
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Taiwan
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gas
singularity
assisted
atomization device
atomization
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TW92108515A
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Chinese (zh)
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TW200420354A (en
Inventor
Muh-Rong Wang
Chang-Ting Lin
Chun-Hsien Chiu
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Univ Nat Cheng Kung
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Publication of TWI233840B publication Critical patent/TWI233840B/en

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Abstract

The present invention relates to an air-assisted-type singular atomization device, particularly a multi-nozzle atomization device, in which a specified volume of liquid is atomized by the atomization device according to a physical singularity high efficiency atomization mechanism to form many micron and sub-micron droplets in order to increase the liquid atomization effect and produce tiny particle mists with a low particle ratio for adsorbing dusts and chemical components in air and further purifying air in the humidifying process, as well as applicable in a nano metal powder atomization process. The atomization device includes an enclosed mixing chamber. The top of the mixing chamber is correspondingly installed with a central main channel for supplying a liquid (water, oil, or liquid metal) into the atomization device. One side of the atomization device is correspondingly installed with a gas main channel which is divided into two branch channels, in which one branch channel is correspondingly connected to the left and right sides of the connector at the base of the mixing chamber to form a lateral impinge flow channel; and the other branch channel is correspondingly installed on an impinge flow channel right below the nozzle head, the impinge flow channel forming an upward current and forming an impinge/resonance situation with the mists ejected by the nozzle head. Through the invented device, a specified volume of liquid is pulverized into tiny droplets under high pressure and impingement. The droplets are uniformly distributed in a space through a nozzle head for adsorbing dusts and chemical components in air, and simultaneously purifying air in the humidifying process, as well as applicable in a nano metal powder atomization process.

Description

1233840 一年 月 曰 ----MM 92108515 正 五、發明說明(1) 【發明所屬之技術領域— 領露^ ί月係為一種氣助式奇點霧化裝置+ 二務化▲置’其裝置令係—旦置,尤指一種多喷 ;化裝置’以物理上奇點式之ί;率::液體,經過-種 :多微米及次微米噴霧之小液滴,提升機制’將其碎化 =粒度比之微粒嘴霧,用 化之效果 ,進而於加濕之過程中同步淨::,中的粉塵及 亦可運用於幾奈米金屬粉末喷霧製程之以;:作設計 【先前技術】 近年來隨耆國内工商業 應用於各方面,從日常^由二: 務化器也被廣泛的 空火箭引擎,諸Γ 頭’到高科技的太 ^車工業、工業用燃燒爐、 =糸、洗,其他像 :射引擎等都需用到霧化噴嘴發動機系統、 ;”喷覆成型、農業用喷灑殺蟲劑、、;::::、粉末 保廢:控制與除塵裝置等也均應用到霧化=表機以及環 制尤其是近年來我國半導體工業發展快竦 的精緻品質提昇’無塵室廣泛用於電子廠边:t導體 ::室中,而無塵室—般控制在悝溫2 體廢 ;;腐敍、纖維破裂及工作人員不適應二見j常冷= 去可分成兩大類,包括蒸氣加濕與水加濕兩種…屬方 洛氣加濕技術採用高溫蒸氣,其溫度 第6頁 12338401233840 The first month of the year ---- MM 92108515 5th, the description of the invention (1) [Technical field to which the invention belongs — Linglu ^ The month is an air-assisted singularity atomizer + two-service ▲▲ ' Device order-once set, especially a multi-spray; the chemical device 'in the form of physical singularity; rate :: liquid, through-species: small droplets of multi-micron and sub-micron spray, lifting mechanism' Fragmentation = particle size mist of the particle size ratio, the effect of use, and then in the process of humidification: simultaneously, the dust and dust can also be used in the process of spraying a few nanometer metal powder; Prior technology] In recent years, domestic industrial and commercial applications have been applied in various aspects, from daily life: from two: the aircraft is also widely used in air rocket engines, various heads to the high-tech railway car industry, industrial combustion furnaces, = 糸, wash, others like: jet engines, etc. need to use atomizing nozzle engine system,; "spray coating, agricultural spraying pesticides, ;; :::, powder waste: control and dust removal device Etc. are also applied to atomization = meter and ring system, especially in recent years, China's semiconductor industry Fast development of exquisite quality improvement 'clean room is widely used in electronics factories: t-conductor :: in the room, and clean room-generally controlled at 悝 2 body waste; corruption, fiber breakage and staff unsuitable Second see j Normally cold = go can be divided into two categories, including steam humidification and water humidification ... belongs to Fang Luo gas humidification technology uses high temperature steam, its temperature page 6 1233840

加濕』。蒸 蒸氣,水蒸 ’水蒸氣與 ’即可提高 水加濕 顆粒液滴, 以熱交換的 ’使液滴成 条氣加濕會 水之熱焓極 為『等給加 、吸收距離 與否,直接 濕系統中霧 離必力ϋ長, 術相當重要 驗,才能設 有鑑於 霧化器,基 須改善其霧 氣產生器内 氣經由蒸氣 空氣完全充 空氣含水率 技術則是利 分布於空調 方式吸收空 份為空氣所 使空氣乾球 小,空氣總 濕』;其中 與水珠顆粒 影響到水吸 化喷嘴之性 加濕性能亦 ,但這必須 計出適當之 此,現有的 於水加濕之 化性能。 之液態水經 分佈器直接 分混合而為 〇 用霧化器或 箱或風管中 氣中之頒熱 吸收,以達 溫度降低, 熱給量幾乎 水加濕的效 大小及分布 收距離及加 能設計不良 不理想,故 靠長期累積 霧化器。 水加濕霧化 水吸收距離 過加熱而汽 分布於空調 空氣吸收達 超音波震盪 與空氣混合 並轉化為水 到水加濕效 但液態水熱 不變,所以 果必須考慮 ,而霧化器 濕性能。基 ,則水加濕 知掌握霧化 霧化器之設 器,為氣助 及家濕特別 化為飽和水 相或風管中 到加濕目的 器所產生之 ,而液滴會 的蒸發淺熱 果’因此水 拾相對氣態 水加濕又稱 到空氣熱焓 之設計適當 本上’若加 之水吸枚距 器之設計技 計、製造經 式的超聲波 之考量,必Humidification. " Steaming and steaming 'water vapor and water' can increase the water droplets to humidify the particles, and the heat exchange of 'making the droplets into strips and humidifying will make the water's enthalpy extremely "wait for the addition, absorption distance or not, directly In the wet system, the mist must be long, and the technique is very important. In order to be equipped with the atomizer, it is necessary to improve the mist generator. The gas in the generator must be completely filled with air through steam and water. The proportion of air is small due to the dry air of the air, and the air is always wet. ”Among them, the water droplets affect the humidification performance of the water suction nozzle, but it must be calculated properly. The existing water humidification performance. The liquid water is directly divided and mixed by the distributor to be absorbed by the atomizer or the air in the box or duct to reduce the temperature. The heat supply is almost the effect of humidification and distribution of water. Poor design is not ideal, so rely on long-term accumulation of atomizer. Water humidification atomization water absorption distance is overheated and the vapor is distributed in the air-conditioning air absorption up to ultrasonic vibration and mixed with air and converted into water-to-water humidification effect but the liquid water heat is unchanged, so the fruit must be considered, and the atomizer is wet performance. Basically, water humidification knows the design of the atomizer and atomizer, which is produced by the air assisted and home humidification into the saturated water phase or the air pipe to the humidification target, and the droplets will evaporate lightly. If 'the water pick-up relative to the gaseous water humidification is also called the appropriate design of the air enthalpy', if the design technology of water suction distance device, the consideration of the manufacture of warp-type ultrasonic waves, must be

【發明内容】 +爰,,本發明之目的係在於:本發明為一種氣助式奇 點霧化裝置’尤指一種多噴頭霧化裝置,其裝置中係將一[Summary of the invention] + 爰, the object of the present invention is that the present invention is an air-assisted singularity atomizing device ', especially a multi-nozzle atomizing device.

_±__1__ _ 1233840 曰 修正 向效率霧化 液滴,提升i:二將其碎化成許多微米及次微米喷霧之小 用以來吸附办::化之效果’產生低粒度比之微粒噴霧, 中同步淨化=中的粉塵及化學成份,進而於加濕之= 贺務製程為目的。 用於被奈未金屬粉末 本發明佐士 設有一穷閉 >、有關一種氣助式奇點霧化裝置’該霧化壯 體現合腔,於混合腔之頂面對應設有::;置 二該霧化袭置之—側邊對應設有主流道 體主流道分成兩路支線,其中一支線係;;該氣 底部銜接頭之左'右兩側,形成-側衝流道,u合腔 對應設置在噴嘴頭正下方之對衝流道該;衝;2線則 、共振之情況W亚與嘴嘴頭喷出之霧氣為—對: 【實 碎 之 、 於 置 分 霧 化 混 油 中 A 成 施 首 化 成 合 或 心 之 方式】 先,請 裝置之 許多小 腔1, 液態金 主流道 一侧邊 配合參 示意圖 液滴之 於混合 屬)導 2上再 對應設 閱第一圖 ,尤指一 裝 腔 引 接 有 置設計 1之頂 所示,係為本發明氣助式$ 種可將一定量體積之液體可 。該霧化裝置A設有一密閉 面對應設有一可供液體(尺 進入霧化裝置之中心主流道2, 設一液 一氣體 並 一支線係 體增壓器7 ,而於該霧化裝 主流道3,該氣體主流道^ _應、it f曼@ >昆合腔1底部衝_ ± __1__ _ 1233840 Said to modify the efficiency of atomizing droplets and improve i: II. It will be broken into many micron and sub-micron sprays. Since the use of small adsorption :: the effect of chemical conversion 'produces a low particle size particle spray, medium Simultaneous purification = dust and chemical components, and then for humidification = congratulations process. For the non-metal powder, the saoshi of the present invention is provided with a closed > related to a gas-assisted singularity atomization device 'the atomization is strong, and the cavity is correspondingly provided on the top surface of the mixing cavity: The atomization strikes the side-the main channel is divided into two branches of the main channel, one of which is a line system; the left and right sides of the gas bottom joint form a side flush channel, and a U-cavity Corresponding to the hedge flow channel directly below the nozzle head; flush; 2 lines, the resonance situation W Ya and the nozzle spray mist is-right: [real broken, in the atomized mixed oil A Cheng Shishou chemical combination or heart method] First, please install many small cavities 1 of the device, the side of the main channel of the liquid gold with the reference diagram (droplets on the mixed genus) guide 2 and then set the first picture correspondingly, especially As shown in the top of a cavity-carrying lead-in design 1, it is a gas-assisted type of the present invention that can dispense a certain volume of liquid. The atomizing device A is provided with a closed surface corresponding to a main channel 2 for liquid (the ruler enters the central main channel 2 of the atomizing device, a liquid-gas and a line system supercharger 7 are provided, and the main channel 3 of the atomizing device is installed. , The main stream of gas ^ _ Ying, it f mann @ > Kunhe cavity 1 bottom punch

第8頁 1233840Page 8 1233840

另一支線則 五、發明說明(4) 接頭4之左、右兩側,形成一側衝流道3 1 對應設置在噴嘴頭5正下方之對衝流道3 2。 及對 _、該中心主流道2、氣體主流道3、側衝流道 衝μ運3 2 —適當處係設有一控制閥6。 乜本發明所稱之奇點霧化裝置,其概念如第二圖之(a 其特徵®中(a )為喷嘴内部奇點流道結構, 在 為肢出口呈現單面銳角之急速變化方式,其角戶 ^:〜75度之變化,利用霧化氣體在奇點結構對液體: 急逮,化作用,以達到高效率霧化之結果。 之 苴扣圖中(b )為噴嘴内部奇點流道結構之另一實施例, ^ :徵為流體出口呈現雙面銳角之急速變化方豆 為5度〜150度之變化。 /、角度 ★圖中(c )為傳、統喷嘴之平行流道結構示意 i 體缚膜化及霧化之機制較差。^夜The other branch line V. Description of the invention (4) The left and right sides of the joint 4 form a side flow channel 3 1 corresponding to the opposite flow channel 32 directly below the nozzle head 5. And, _, the main flow path of the center 2, the main flow path of the gas 3, the side flush flow path and the flow path 3 2-a control valve 6 is provided at an appropriate place.概念 The concept of the singularity atomization device referred to in the present invention is as shown in the second figure (a its feature ® (a) is the structure of the singularity flow channel inside the nozzle, which presents a sharp change in the acute angle on one side of the limb outlet, Its angle ^: ~ 75 degrees, using the atomized gas in the singularity structure of the liquid: quick catch, atomization effect, to achieve the result of high-efficiency atomization. (B) is the singularity flow inside the nozzle Another embodiment of the channel structure, ^: The rapid change in the angle of the fluid outlet showing double-sided acute angles changes between 5 and 150 degrees. /, Angle ★ (c) in the figure is the parallel flow channel of the nozzle. The structure indicates that the mechanism of body-bound film formation and atomization is poor.

1233840 案號92108515 年月日 修正 五、發明說明(5) 流,並產生共振的狀態,進而使霧化之小液滴更加的細微 化,該霧化之小液滴係可對應吸附空氣中的粉塵及化學成 份,進而於加濕之過程中同步淨化空氣的功能。 請再配合參閱第三圖所示,係為本發明氣助式奇點霧 化裝置之銜接頭斷面剖視圖,該側衝流道3 1係對應設置 於銜接頭4之左、右兩侧,其左、右端之側衝流道3 1係 可設計在同一中心軸線上,而形成一對衝氣流(如a狀態 所示);又該銜接頭4左、右端所設之侧衝流道3 1亦可 設計為偏離中心軸線之狀態,使流入之氣流形成一渦旋氣 流(如b狀態所示)。 如第四圖所示,係為本發明氣助式奇點霧化裝置之喷 嘴頭斷面剖視圖,該喷嘴頭5之底面係設有複數個喷水孔 5 1,該喷水孔5 1之設計形式可為多元化之設計及變化 (本發明所揭示之喷水孔設計形態僅為示意,而非為界定 喷水孔之形式);該喷嘴頭5係以螺旋的方式對應鎖固於 銜接頭4下方,藉螺旋之設計,以提供使用者一方便更換 不同型式之喷嘴頭,以提高整體裝置之使用價值。又該喷 嘴頭5之侧面係可設置複數個噴水孔5 2,以對應增加喷 霧之範圍及面積者。 本發明之氣助式奇點霧化裝置中,該中心主流道2 、 氣體主流道3、側衝流道3 1及對衝流道3 2 —適當處係 設有一控制閥6 ,藉以對應控制每一管路中氣體進入混合1233840 Case No. 92108515 Amendment 5 、 Explanation of invention (5) The state of the flow and resonance, which further makes the atomized droplets more fine. The atomized droplets can correspond to the adsorption of air in the air. Dust and chemical composition, and then simultaneously purify the air during humidification. Please refer to the third figure, which is a sectional view of the joint of the gas-assisted singularity atomizing device according to the present invention. The side flushing channels 31 are correspondingly arranged on the left and right sides of the joint 4, The left and right side runners 3 1 can be designed on the same central axis to form a pair of rushes (as shown in state a); and the side runners 3 1 provided at the left and right ends of the joint 4 It can also be designed in a state deviating from the central axis, so that the incoming airflow forms a vortex airflow (as shown in state b). As shown in the fourth figure, it is a sectional view of the nozzle head of the gas-assisted singularity atomization device of the present invention. The bottom surface of the nozzle head 5 is provided with a plurality of water spray holes 51, and the water spray holes 51 The design form can be diversified designs and variations (the design form of the water spray holes disclosed in the present invention is only for illustration, not to define the form of the water spray holes); the nozzle head 5 is correspondingly locked to the connection in a spiral manner Below the head 4, by the design of the spiral, to provide users with a convenient replacement of different types of nozzle heads, to improve the use value of the overall device. In addition, a plurality of water spray holes 5 2 may be provided on the side of the nozzle head 5 to increase the range and area of the spray mist. In the gas-assisted singularity atomizing device of the present invention, the central main flow channel 2, the gas main flow channel 3, the side flush flow channel 31, and the hedge flow channel 3 2 are provided with a control valve 6 at an appropriate place, thereby controlling each Gas in a pipeline enters the mix

第ίο頁 1233840 案號92108515 年 月 曰 修正 五、發明說明(6) 腔之進氣量;該氣體主流道3之進氣量可佔總進氣量的5 0 %〜95%左右;而該侧衝流道3 1之進氣量可佔總進氣量的 0%〜1 0%左右;又該對衝流道3 2之進氣量則可佔總進氣量 的0 %〜5 0 % ;藉氣體不同比例之分配,可達成不同等級之霧 化效果,以因應使用者多元化之需求者。 綜上所述,即可清楚得知本發明係具有下列諸多的優 點: 1 ·本發明之氣助式奇點霧化裝置,其霧化裝置主要 係將一定量體積之液體,經過一種霧化裝置液體碎化成許 多小液滴,藉小液滴之均勻分佈,用以對應吸附空氣中的 粉塵及化學成份,進而於加濕之過程中同步淨化空氣為目 的。 2 ·本發明之氣助式奇點霧化裝置中,該侧衝流道係 對應設置於銜接頭之左、右兩側,其左、右端之側衝流道 係可設計在同一中心軸線上,而形成一對衝氣流。 3 ·本發明之氣助式奇點霧化裝置中,該側衝流道係 對應設置於銜接頭之左、右兩側,其左、右端之側衝流道 係可設計為偏離中心轴線之狀態,使流入之氣流形成一渦 旋氣流。 4 ·本發明之氣助式奇點霧化裝置中,該中心主流道 、氣體主流道、侧衝流道及對衝流道一適當處係設有一控 制閥,藉以對應控制每一管路中氣體進入混合腔之進氣量 ;藉氣體不同比例之分配,可達成不同等級之霧化效果, 以因應使用者多元化之需求者。Page 1233840 Case No. 92108515 Rev. V. Description of Invention (6) The air intake volume of the cavity; the air intake volume of the main flow channel 3 of the gas may account for about 50% ~ 95% of the total air intake volume; and the The intake air volume of the side flow channel 31 can account for about 0% to 10% of the total air intake; and the intake air volume of the side flow channel 3 2 can account for 0% to 50% of the total air intake. By using different proportions of gas, different levels of atomization effects can be achieved to meet the diverse needs of users. In summary, it can be clearly known that the present invention has the following advantages: 1 The gas-assisted singularity atomization device of the present invention, the atomization device of which is mainly a certain volume of liquid through a kind of atomization The liquid of the device is broken into many small droplets, and the uniform distribution of the small droplets is used to correspondingly adsorb the dust and chemical components in the air, and then purify the air simultaneously during the humidification process. 2 · In the gas-assisted singularity atomizing device of the present invention, the side flush channels are correspondingly arranged on the left and right sides of the joint, and the left and right side flush channels can be designed on the same central axis To form a pair of rushing air. 3. In the gas-assisted singularity atomizing device of the present invention, the side flushing channels are correspondingly arranged on the left and right sides of the joint, and the left and right side flushing channels can be designed to deviate from the central axis In this state, the incoming airflow forms a vortex airflow. 4 · In the gas-assisted singularity atomizing device of the present invention, a control valve is provided at an appropriate place of the central mainstream channel, the gas mainstream channel, the side flush channel and the hedge flow channel, thereby controlling the gas in each pipeline correspondingly. The amount of intake air entering the mixing chamber; by the distribution of different proportions of gas, different levels of atomization effects can be achieved to meet the diverse needs of users.

1233840 ^ --^^-^8515___^ 月 日 鉻不 五、發明說明(7) ' '"" ' - 5本&明之氣助式奇點霧化裝置中,於喷嘴頭之正 了方係設有=對衝流道,該對衝流道中係形成一由下往上 喷的氣流,^與噴嘴頭噴出之霧氣為一對衝、共振之情況 ’可直接提高霧化的效果者。 6 ·本發明之氣助式奇點霧化裝置中,該喷嘴頭係以 螺旋的方式對應鎖固於銜接頭下方,藉螺旋之設計,以提 供使用者一方便更換不同型式之喷嘴頭,以提高整體裝置 之使用價值。 7 ·本發明之氣助式奇點霧化裝置中,該喷嘴頭之側 面係可設置複數個喷水孔,以對應增加喷霧之範圍及面積 者。 、 綜觀上述,本發明之特徵的確能提供一種可有效 生產成本並兼具貫用價值之氣助式水霧化裝置,以其整 之組合及特徵而言,既未曾見諸於同類產品中,申浐前= 未見公開’誠已付合專利法之、、兵定盈杜 、心 專利申請。 J法之法疋要件,没依法提出發明 惟以上所述者,僅為本發 此限定本發明實施之範圍,即 及創作說明書内容所作之等效 作專利涵蓋之範圍内。 明之較佳實施例,當不能以 大凡依本發明申請專利範圍& 變化與修飾,皆應仍屬發明1233840 ^-^^-^ 8515 ___ ^ Cr is not five, the description of the invention (7) '' " " '-5 books & Mingzhi gas-assisted singularity atomization device, right at the nozzle head The square system is provided with = a counterflow channel, in which a stream of air sprayed from the bottom to the top is formed, and the mist sprayed by the nozzle head is a pair of impact and resonance conditions, which can directly improve the effect of atomization. 6 · In the gas-assisted singularity atomizing device of the present invention, the nozzle head is correspondingly locked under the adapter in a spiral manner, and the spiral design is provided to provide users with a convenient way to replace different types of nozzle heads. Improve the use value of the overall device. 7 · In the gas-assisted singularity atomizing device of the present invention, a plurality of water spray holes can be provided on the side of the nozzle head, so as to increase the range and area of the spray. Based on the above, the features of the present invention can indeed provide an air-assisted water atomization device that can effectively produce costs and has a consistent value. In terms of its overall combination and characteristics, it has never been seen in similar products. Before the application of the patent = No public disclosure of the application of the "Payment to the Patent Law", "Bing Ding Ying Du", and "He Xin Patent Application". The law and the requirements of the J method did not propose the invention according to the law. However, the above is only for the purpose of this document to limit the scope of the invention, that is, the scope of the equivalent of the patent for the content of the creation specification. In the preferred embodiment of the invention, when it is not possible to apply for changes and modifications in the scope of patent application &

1233840 _案號92108515_年月曰 修正_ 圖式簡單說明 有關本發明為達上述目的,所採用之技術手段及其他 功效,茲舉較佳可行實施例,並配合圖式說明如下,俾使 審查人員更易於瞭解本發明之產生: 圖式之簡單說明 第一圖 係本發明氣助式水霧化裝置之示意圖。 第二圖 係本發明奇點霧化裝置之概念示意圖。 第三圖 係本發明氣助式水霧化裝置之銜接頭斷面剖 視圖。 第四圖 係本發明氣助式水霧化裝置之喷嘴頭斷面剖 視圖。 圖號之簡單說明 本發明:1233840 _ Case No. 92108515_ Year Month Amendment _ Schematic brief description of the technical means and other effects adopted by the present invention to achieve the above-mentioned purpose, the preferred and feasible embodiments are given, and the description with the schematic is as follows to encourage review It is easier for a person to understand the production of the present invention: Brief description of the drawing The first drawing is a schematic view of an air-assisted water atomizing device of the present invention. The second figure is a conceptual diagram of the singularity atomization device of the present invention. The third figure is a sectional view of the joint of the gas-assisted water atomizing device of the present invention. The fourth figure is a sectional view of the nozzle head of the gas-assisted water atomizing device of the present invention. Brief description of drawing numbers

第13頁 A 霧 化 裝 置 1 混 合 腔 2 中 心 主 流 道 3 氣 體 主 流 道 3 1 侧 衝 流 道 3 2 對 衝 流 道 4 銜接 頭 5 喷 嘴 頭 5 1 、5 2 喷 水孑L 6 控 制 閥 7 液 體 增 壓 器Page 13A Atomization device 1 Mixing chamber 2 Central main channel 3 Gas main channel 3 1 Side flushing channel 3 2 Hinged flow channel 4 Adapter 5 Nozzle head 5 1 、 5 2 Water spray L 6 Control valve 7 Liquid increase Press

Claims (1)

1233840 MM 92108515 修正 六、申請專利範圍 1 ·—種氣助式奇點霧化裝置,該霧化裝置設一穷 閉之混合腔,於混合腔之頂面對應設有一可供液體導= 入霧化裝置之中心主流道,而於該霧化裝置之一側 設有一氣體主流道,該氣體主流道分成兩路支線,复中二 支線係對應連設到混合腔底部銜接頭之左、右兩側了 : :侧衝fL道,另一支線則對應設置在喷嘴頭正下方之對衝 流運’該對衝流道中係形成一由下往上喷的氣流, > 嘴頭喷出之霧氣為一對衝、共振之情況。 一貝1233840 MM 92108515 Amendment 6. Scope of patent application 1-A gas-assisted singularity atomization device, the atomization device is provided with a closed mixing chamber, and a liquid can be provided on the top surface of the mixing chamber for liquid conduction = fogging The main main channel of the atomizing device is provided with a main gas channel on one side of the atomizing device. The main gas channel is divided into two branch lines. The two branches of Fuzhong are connected to the left and right of the joint at the bottom of the mixing chamber. Side:: side fL channel, the other branch line is corresponding to the hedge flow set directly below the nozzle head 'the hedge flow channel is formed from the bottom to the top of the air flow, > the mist from the nozzle head is a Hedging and resonance. One shell 」·如申請專利範圍第1項所述氣助式奇點霧化裝置 ’其中:該側衝流道係對應設置於銜接頭之左、右兩側, 其左、右端之側衝流道係可設計在同一中心軸線上,而形 成一對衝氣流。 夕 3 ·如申請專利範圍第1項所述氣助式奇點霧化裝置 ’其中:該側衝流道係對應設置於銜接頭之左、右兩側, 其左、右端之側衝流道係可設計為偏離中心轴線之狀態, 使流入之氣流形成一渦旋氣流。"· The gas-assisted singularity atomizing device as described in item 1 of the scope of the patent application, wherein: the side flush channel is correspondingly arranged on the left and right sides of the joint, and the left and right side flush channels are Can be designed on the same central axis to form a pair of rush air. Xi 3 · The gas-assisted singularity atomizing device as described in item 1 of the scope of the patent application, wherein: the side flush runners are correspondingly arranged on the left and right sides of the joint, and the left and right side flush runners It can be designed to deviate from the central axis so that the incoming airflow forms a vortex airflow. 4 ·如申請專利範圍第1項所述氣助式奇點霧化裝置 ,其中··該喷嘴頭係以螺設的方式對應鎖固於銜接頭下方 藉螺設之設計,以提供使用者一方便更換不同型式之喷嘴 頭,以提高整體裝置之使用價值。 5 ·如申請專利範圍第1項所述氣助式奇點霧化裝置 ,其中:該喷嘴頭之側面係玎設置複數個噴水孔者。 6 ·如申請專利範圍第1項所述氣助式奇點霧化裝置 ,其中:於該中心主流道、氣體主流道、侧衝流道及對衝4 · The gas-assisted singularity atomization device as described in item 1 of the scope of the patent application, in which the nozzle head is screwed in a manner corresponding to the design secured by the screw under the adapter to provide users with a It is easy to replace different types of nozzle heads to increase the use value of the overall device. 5. The air-assisted singularity atomization device as described in item 1 of the scope of patent application, wherein: the side of the nozzle head is provided with a plurality of water spray holes. 6 · The gas-assisted singularity atomization device as described in item 1 of the scope of patent application, wherein: in the center mainstream channel, gas mainstream channel, side impact flow channel and hedge 1233840 _案號92108515_年月日_Iti_ 六、申請專利範圍 流道一適當處係設有一控制閥,藉以對應控制每一管路中 氣體進入混合腔之進氣量。 7 ·如申請專利範圍第6項所述氣助式奇點霧化裝置 ,其中:該氣體主流道之進氣量可佔總進氣量的0 %〜9 5 %。 8 ·如申請專利範圍第6項所述氣助式奇點霧化裝置 ,其中:該侧衝流道之進氣量可佔總進氣量的5 %〜1 0 %。 9 ·如申請專利範圍第6項所述氣助式奇點霧化裝置 ,其中··該侧衝流道之進氣量亦可佔總進氣量的0%〜5%。 1 0 ·如申請專利範圍第6項所述氣助式奇點霧化裝 置,其中:該對衝流道之進氣量亦可佔總進氣量的〇%〜50% 〇 1 1 ·如申請專利範圍第1項所述氣助式奇點霧化裝 置,其中:該喷嘴内部奇點流道結構,其特徵為流體出口 呈現單面銳角之急速變化方式,其角度為5度〜75度之變 化,利用霧化氣體在奇點結構對液體之急速霧化作用,以 達到高效率霧化之結果。 1 2 ·如申請專利範圍第1 1項所述氣助式奇點霧化 裝置,其中:為流體出口呈現雙面銳角之急速變化方式, 其角度可為5度〜150度之變化。1233840 _ Case No. 92108515_ Year Month Date _Iti_ VI. Scope of patent application A control valve is provided at an appropriate place of the flow channel to control the amount of gas in each pipeline entering the mixing chamber. 7 · The gas-assisted singularity atomization device as described in item 6 of the scope of patent application, wherein the intake air volume of the main flow channel of the gas can account for 0% ~ 95% of the total intake air volume. 8 · The air-assisted singularity atomization device as described in item 6 of the scope of patent application, wherein the intake air volume of the side flush flow channel can account for 5% to 10% of the total intake air volume. 9 · The gas-assisted singularity atomization device as described in item 6 of the scope of the patent application, wherein the intake air volume of the side flush flow channel can also account for 0% ~ 5% of the total air intake volume. 1 0 · The gas-assisted singularity atomization device as described in item 6 of the scope of patent application, wherein: the air intake volume of the hedging runner may also account for 0% to 50% of the total air intake volume. The gas-assisted singularity atomization device described in the first item of the patent scope, wherein the singularity flow channel structure inside the nozzle is characterized by the rapid change of the acute angle of the fluid outlet on one side, and the angle is between 5 degrees and 75 degrees. Change, the rapid atomization of the liquid in the singularity structure of the atomized gas is used to achieve the result of high-efficiency atomization. 1 2 · The gas-assisted singularity atomization device as described in item 11 of the scope of patent application, wherein the fluid outlet presents a rapid change in the acute angle on both sides, and the angle can vary from 5 degrees to 150 degrees. 第15頁 公告本 P年"月〈。民 修正本 、月曰 修正1233840 申請曰期: 〜/ IPC分類 ㈣%。 申請案號:92108515 (以上各欄由本局填註) 發明專利說明書 中文 氣助式奇點霧化裝置 發明名稱 英文 姓名 (中文) 1. 王覺寬 2. 林彰廷 3. 邱俊賢 發明人 (共3人) 姓名 (英文) 1. Muh-Rong Wang 2. Chang-Ting Lin 3. Chun-Hsien Chiu Φ 國籍1 ·中華民國TW (中英文)2·中華民國TW 3。中華民國π 名稱或 姓名 (中文) 1.國立成功大學 名稱或 姓名 (英文) (?db 1.中華民國TW 申請人 (共1人) 住居所 (營業所) (中文) 1.台南市大學路1號(本地址與前向貴局申請者不同) 1. 住居所 (營業所) (英文) 代表人 (中文) 1.高強 代表人 (英文)Page 15 Bulletin P Year " Month. Min Revised, Month Revised 1233840 Application Date: ~ / IPC Classification ㈣%. Application No .: 92108515 (The above columns are filled in by this Office) Invention Patent Description Chinese Gas-assisted Singularity Atomization Device Invention Name English Name (Chinese) 1. Wang Juekuan 2. Lin Zhangting 3. Qiu Junxian Inventor (3 people in total) Name (English) 1. Muh-Rong Wang 2. Chang-Ting Lin 3. Chun-Hsien Chiu Φ Nationality 1 · Republic of China TW (Chinese and English) 2 · Republic of China TW 3. Republic of China π Name or Name (Chinese) 1. Name or Name of National Cheng Kung University (English) (? Db 1. Republic of China TW Applicant (1 person) Residence (Business Office) (Chinese) 1. University Road, Tainan City No. 1 (this address is different from the applicant who applied to your office) 1. Residence (Business Office) (English) Representative (Chinese) 1. High-Qiang Representative (English) 第1頁page 1
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