[go: up one dir, main page]

TWI228745B - Projection optics apparatus and thereof display device and thereof manufacturing method - Google Patents

Projection optics apparatus and thereof display device and thereof manufacturing method Download PDF

Info

Publication number
TWI228745B
TWI228745B TW92129420A TW92129420A TWI228745B TW I228745 B TWI228745 B TW I228745B TW 92129420 A TW92129420 A TW 92129420A TW 92129420 A TW92129420 A TW 92129420A TW I228745 B TWI228745 B TW I228745B
Authority
TW
Taiwan
Prior art keywords
optical
patent application
item
scope
light
Prior art date
Application number
TW92129420A
Other languages
Chinese (zh)
Other versions
TW200515457A (en
Inventor
Sean Chang
Original Assignee
Delta Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Delta Electronics Inc filed Critical Delta Electronics Inc
Priority to TW92129420A priority Critical patent/TWI228745B/en
Priority to US10/828,080 priority patent/US7102819B2/en
Priority to DE102004019112A priority patent/DE102004019112A1/en
Application granted granted Critical
Publication of TWI228745B publication Critical patent/TWI228745B/en
Publication of TW200515457A publication Critical patent/TW200515457A/en
Priority to US11/483,023 priority patent/US20060250693A1/en

Links

Landscapes

  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

An optics display device comprises an optics focusing structure, an optics panel, and a light-absorbed layer. The optics focusing structure comprises a plurality of micro-optics focusing component. The light-absorbed layer is between the optics focusing structure and the optics panel. The light-absorbed layer has a plurality of optics transmission windows. Those optics transmission windows are corresponded with those micro-optics focusing component. Those optics transmission windows are formed by using optics exposed method.

Description

1228745 -------------------------- 五、發明說明 【技術領域】 本發明係關於一種投影光學裝置以及其光學投影顯示 構件及製造方法,特別是關於一種具有咼對比度的投影光 學裝置以及其光學投影顯示構件及製造方法。 【先前技術】 現今顯示器之趨勢係朝向輕薄化、大尺寸化發展,在 此種發展趨勢下,由於投影顯示器具有厚度薄、尺寸大等 優點,因而投影顯示器係逐漸取代傳統電視而成為顯示器 之主流商品之一。在投影顯示器之種類中,又以背投式顯 示器為最重要。 在現今的背投式顯示器中,其螢幕具有下列主要的功 能訴求: (1 )用以擴大可視範圍。以使顯示器之觀看視角增 大0 以避免顯示器内部零件受到外 (2 )用以保護顯示器 界灰塵、水氣所影響。 (3 )用以控制外部雜散光的 比度。 尤的反射。以提高顯示器之對 現今之螢幕製作技術雖然 (2)之訴求,然而,在其達成上 易地達成上述(1)、 較高的有效光穿透率的課題上,迷求(3)之際且同時保持 理想的效果。 ’目前的螢幕均無法有較為 之 現今者投式顯示器的瑩: 方式而達成。如同第1圖及 用US2378252所揭露 示,此技術之螢幕1228745 -------------------------- 5. Description of the invention [Technical field] The present invention relates to a projection optical device, an optical projection display member thereof, and The invention relates to a manufacturing method, in particular to a projection optical device with chirped contrast, an optical projection display member and a manufacturing method thereof. [Previous technology] The current trend of displays is toward thin and light, large size. Under this development trend, due to the advantages of thin thickness and large size of the projection display, the projection display gradually replaced the traditional TV and became the mainstream of the display. One of the goods. Of the types of projection displays, rear projection displays are the most important. In today's rear-projection displays, the screen has the following main functional requirements: (1) It is used to expand the visible range. In order to increase the viewing angle of the display to prevent the internal parts of the display from being affected by external (2) to protect the display from dust and moisture. (3) Used to control the ratio of external stray light. You reflection. In order to improve the display's demands for today's screen production technology (2), however, it is fascinated by (3) when it is easy to achieve the above (1) and higher effective light transmittance. And at the same time maintain the desired effect. ’Neither of the current screens can achieve the brightness of today ’s projection displays. As shown in Figure 1 and disclosed in US2378252, the screen of this technology

$ 6頁 1228745 五、發明說明(2) 1 0 0係在光學面板1 0 2與光學球1 〇 4之間加上一層光吸收物 質層1 0 6,以藉此光吸收物質層1 〇 6吸收外部雜散光並防止 其反射,同時藉由光學球104及光學面板丨02將光線之角度 擴大,以增大可視範圍。 然而,在此技術中具有一個先天上的限制,亦即當光 從背面以垂直角度入射時,其可輕易地穿透整個螢幕(如 第1圖所示)。而當光線以一定夾角0入射時,則很容易被 光吸收物質層1 〇 6吸收,進而降低其穿透率(如第2圖所 示)。由第1圖與第2圖可知,光線之入射角度0愈大,其 所需面對之光吸收物質層106之厚度會從li增大為L2,如 此則會大幅降低整個螢幕100效率,甚至影響整個螢幕丨〇〇 的均勻度。如同第3圖所示,以現有技術而言,光線自光 學投影組件108射至螢幕1〇〇的入射角度0將高達2〇度至3〇 度左右,故前述現象實不容忽視。 【内容】 為解決上述問題’本發明係提出 種光學投影$ 6Page 1228745 V. Description of the invention (2) 1 0 0 Adds a light absorbing material layer 1 0 6 between the optical panel 10 2 and the optical ball 1 〇 4 so that the light absorbing material layer 1 〇 6 Absorb external stray light and prevent its reflection. At the same time, the angle of the light is enlarged by the optical ball 104 and the optical panel 丨 02 to increase the visible range. However, there is an inherent limitation in this technique, that is, when light is incident at a perpendicular angle from the back, it can easily penetrate the entire screen (as shown in Figure 1). When light is incident at a certain angle of 0, it is easily absorbed by the light absorbing material layer 106, and the transmittance is reduced (as shown in Fig. 2). As can be seen from Figures 1 and 2, the larger the incident angle 0 of the light, the greater the thickness of the light absorbing material layer 106 it needs to face from li to L2, which will greatly reduce the efficiency of the entire screen 100, and even Affects the uniformity of the entire screen. As shown in FIG. 3, according to the prior art, the incident angle 0 of the light from the optical projection component 108 to the screen 100 will be as high as 20 degrees to 30 degrees, so the foregoing phenomenon cannot be ignored. [Content] To solve the above problem, the present invention proposes an optical projection

因此 顯示構件,以同時提高對比度與顯示效率 p各俏ί Ϊ ’本發明另提出一種光學投影顯示構件,以大幅 降低製造成本及製造時間。Therefore, the display member can improve the contrast and display efficiency at the same time. The present invention also proposes an optical projection display member to greatly reduce the manufacturing cost and manufacturing time.

另外,本發明再提出一種投影光學裝置,以更進一步 增大顯示尺寸,並同時提高對比度與顯示效率 =此,本發明係提供一種光學投影顯ς構件,此光學 杈衫顯不構件係具有光學聚焦結構、光 層。此光學聚焦結構係具有多個微光學 予象焦70件。光吸收In addition, the present invention further proposes a projection optical device to further increase the display size, and at the same time improve the contrast and display efficiency = this, the present invention provides an optical projection display member, the optical switch shirt display member has optical Focusing structure, light layer. This optical focusing structure has a plurality of micro-optical pre-focussing pieces of 70 pieces. Light absorption

第7頁 1228745Page 7 1228745

結構與 透視窗 透視窗 一種光 聚焦結 焦元件 具有多 光學聚 曝光顯 本發明 光吸收 甲 I® 分別與 係以光 學投影 構及光 0 —光 個光學 焦元件 影法所 之光學 層之間 層係位於 穿透視窗 應,其中 本發 示構件係 具有多個 構的焦點 散反射窗 散反射窗 再者 在光學聚 料層。 光學聚焦 ,光學穿 ,光學穿 明另提供 具有光學 微光學聚 附近,且 分別與微 係以光學 ,於上述 焦結構與 板之間, 微光學聚 學曝光顯 顯示構件 吸收層。 吸收層, 擴散反射 相互對應 形成。 投影顯示 形成一層 且具有多個光學 焦元件相互對 影法所形成。 ,此光學投影顯 光學聚焦結構係 位於光學聚焦結 窗,前述光學擴 ,其中,光學擴 構件中,也可以 光學擴散穿透材Structure and see-through window See-through window A light-focusing coking element with multiple optical polyexposures reveals that the light absorbing nail I® of the present invention is layered with the optical layers of the optical projection structure and light It is located in the transmission window, where the present component is a focal diffuse reflection window with multiple structures, and the diffuse reflection window is in the optical polymer layer. Optical focusing, optical transmission, and optical transmission are also provided with optical micro-optics near the optical system and the micro-optics, respectively, between the above focal structure and the plate, micro-optical polymerization exposure display display member absorption layer. Absorptive layers and diffuse reflections are formed corresponding to each other. The projection display is formed by a single layer and a plurality of optical focal elements are formed by mutual shadowing. The optical projection structure of the optical projection display is located in the optical focusing window. The aforementioned optical expansion, among which, the optical expansion member can also optically diffuse through the material.

在 視窗或 學穿透 聚焦結 擴散反 另 有光學 構件具 組件係 以接收 係具有 構與光 之光學投 射窗的方 擴散反射 光點位置 係與前述 再提供一 光學投影 結構、光 學影像光 影組件之 聚焦元件 ,且具有 中,形 顯影法 著光線 學穿透 形狀相 裝置, 其中光 吸收層 影顯示 束。光 係位於 透視窗 上述本發明 光學擴散反 視窗或光學 構後聚焦的 射窗之形狀 外,本發明 投影組件及 有光學聚焦 用以提供光 來自光學投 多個微光學 學面板之間 '衫顯τρτ彳籌件 式係為曝光 窗位置係隨 而變,且光 光線之光道 種投影光學 顯示構件, 學面板及光 束。光學投 光學影像光 。光吸收層 多個光學穿 成光學穿ϋ 。另外,) 照射到光夸 視窗或光, 對應。 此裝置係J 學投影顯六 。光學投景 構件則是斥 學聚焦結才I 光學聚焦詞 ,此光學穿In the window or through the focus diffusion junction, there is another optical component assembly to receive the square diffuse reflection light spot position of the optical projection window with the structure and light. The focusing element has a medium-shaped development method which optically penetrates the shape phase device, wherein the light absorption layer shadows the beam. The light system is located in the perspective window outside the shape of the above-mentioned optical diffuse reflection window or optical focus window of the present invention. The projection assembly of the present invention and the optical focusing are used to provide light from among multiple micro-optical panels. The τρτ 彳 chip type is that the position of the exposure window changes with time, and the optical path of the light rays projects the optical display member, the panel and the light beam. Optical projection optical image light. The light absorbing layer has multiple optical penetrations into optical penetrations. In addition,) shines into the window or light, corresponding. This device is a J-projection display. The optical projection component is the focus of scientific focus.

1228745 五、發明說明(4) 透視窗分別與微光學聚焦元件相互對應,其中, 視窗係以光學曝光顯影法所形成。 另外,本發明另提供一種投影光學裝置,此 有光學投影組件及光學投影顯示構件,其中光學 構件具有光學聚焦結構及光吸收層。光學投影組 提供光學影像光束。光學投影顯示構件則是用以 光學投影組件之光學影像光束。光學聚焦結構係 微光學聚焦元件。一光吸收層,位於光學聚焦結 附近’且具有多個光學擴散反射窗,前述光學擴 分別與微光學聚焦元件相互對應,其中,光學擴 係以光學曝光顯影法所形成。 在上述本發明之光學投影顯示構件中,形成光 視窗或光學擴散反射窗的方式係為曝光顯影法。另 學穿透視窗或光學擴散反射窗位置係隨著光線照射 聚焦結構後聚焦的光點位置而變,且光學穿透視窗 擴政反射®之形狀係與前述光線之光道形狀相對應 另外’在上述本發明之光學投影顯示構件中, 有一個超薄型放大鏡,其中超薄型放大鏡之型式可 像片(Hologram)型式或菲涅耳透鏡(Fresnel Uns) 、再者’本發明另提供一種光學投影顯示構件的 法’首先’提供一個光學聚焦結構,且在此光學聚 上形成有多個微光學聚焦元件,之後,於此光學聚 上形成光敏感材料層。接著,進行曝光顯影步驟, 感材料層中形成多個具有光學視窗形狀的圖案,再 匕學穿ii L置係具 I影顯示 Μ系用以 ?收來自 •有多個 :的焦點 反射窗 反射窗 學穿透 外,光 到光學 或光學 更包括 以為全 型式。 製造方 焦結構 焦結構 於光敏 移除部 1228745 五、發明說明(5) -- 分光敏感材料層,以於光敏感材料層内形成多個具有光學 視窗形狀的圖案區塊。 另外,在上述本發明之光學投影顯示構件的製造方法 中,光敏感材料層係為一個光敏感材料層,其形成方法係 以塗佈光阻劑的方式所形成。再者,在上述本發明之光學 投影顯示構件的製造方法中,也可以於圖案區塊中形成材 料層’甚至於此材料層及光敏感材料層上形成一個光學面 板。當光敏感材料層之材質包括光吸收物質時,前述材料 層係為光學穿透材料層或光學擴散反射材料層。 再者,在上述本發明之光學投影顯示構件的製造方法 中’於圖案區塊中形成材料層後’也可以移除光敏感材料 層,並於移除之部位形成另一材料層,甚至於前述材料層 上形成一個光學面板。 另外,在上述本發明之光學投影顯示構件的製造方法 中’前述曝光顯影步驟可以於預設使用光源位置上提供曝 光光源,此曝光光源經光學聚焦結構聚焦於光敏感材^ 層。其中’此光敏感材料層所使用之光阻劑係正光阻劑或 負光阻劑’另外’移除部分光敏感材料層的方法係移除已 曝光之光敏感材料層或是未曝光之該光敏感材料層。、 綜上所述,在本發明之光學投影顯示構件,由於是其 光學穿透視窗或光學擴散反射窗之形成方式係為光學曝光 顯影的方式,且其曝光光源係位於此光學投影顯示構件之 預設燈源的位置,因此此光學穿透視窗之形狀、位置係與 入射之光束經該光學聚焦結構聚焦後的光線通道相互吻1228745 V. Description of the invention (4) The perspective windows correspond to the micro-optical focusing elements, respectively, wherein the windows are formed by the optical exposure and development method. In addition, the present invention provides a projection optical device, which includes an optical projection module and an optical projection display member, wherein the optical member has an optical focusing structure and a light absorbing layer. Optical projection group Provides optical image beam. The optical projection display component is an optical image beam used for an optical projection component. Optical focusing structure is a micro-optical focusing element. A light absorbing layer is located near the optical focusing junction and has a plurality of optical diffusion reflection windows. The optical expansion and the micro-optical focusing element respectively correspond to each other. The optical expansion is formed by an optical exposure and development method. In the above-mentioned optical projection display member of the present invention, a method of forming a light window or an optical diffusion reflection window is an exposure development method. The position of the penetrating window or optical diffuse reflection window is changed according to the position of the light spot focused after the light illuminates the focusing structure, and the shape of the optical penetrating window expansion reflection® corresponds to the shape of the aforementioned light track In the above-mentioned optical projection display member of the present invention, there is an ultra-thin magnifying glass, in which the type of the ultra-thin magnifying lens can be a Hologram type or a Fresnel lens (Fresnel Uns), and further, the present invention provides another The method of the optical projection display member 'first' provides an optical focusing structure, and a plurality of micro-optical focusing elements are formed on the optical condenser, and then a light-sensitive material layer is formed on the optical condenser. Next, an exposure and development step is performed, and a plurality of patterns having an optical window shape are formed in the sensing material layer, and then the lens is worn through the lens, and the shadow display is used to receive the reflection from the focus reflection window. Outside the window science, light to optics or optics includes the full type. Manufacture of square focus structure Focus structure in the photosensitive removal section 1228745 V. Description of the invention (5)-Separating the light-sensitive material layer to form a plurality of pattern blocks with the shape of an optical window in the light-sensitive material layer. In addition, in the above-mentioned manufacturing method of the optical projection display member of the present invention, the light-sensitive material layer is a light-sensitive material layer, and the formation method thereof is formed by coating a photoresist. Furthermore, in the above-mentioned manufacturing method of the optical projection display member of the present invention, a material layer may be formed in the pattern block, or even an optical panel may be formed on the material layer and the light-sensitive material layer. When the material of the light-sensitive material layer includes a light-absorbing substance, the aforementioned material layer is an optically transmissive material layer or an optically diffused reflective material layer. Furthermore, in the above-mentioned method for manufacturing an optical projection display member of the present invention, 'after the material layer is formed in the pattern block', the light-sensitive material layer may be removed, and another material layer may be formed at the removed portion, or even An optical panel is formed on the aforementioned material layer. In addition, in the above method of manufacturing an optical projection display member of the present invention, the aforementioned exposure and development step may provide an exposure light source at a preset light source position, and the exposure light source is focused on the light-sensitive material layer through the optical focusing structure. Wherein, the photoresist used in this photo-sensitive material layer is a positive photoresist or a negative photoresist. In addition, the method of removing part of the photo-sensitive material layer is to remove the exposed photo-sensitive material layer or the unexposed photo-sensitive material. Light-sensitive material layer. In summary, in the optical projection display member of the present invention, since the optical transmission window or the optical diffusion reflection window is formed by an optical exposure and development method, and its exposure light source is located in the optical projection display member. The position of the light source is preset, so the shape and position of the optical transmission window are in agreement with the light channel of the incident light beam focused by the optical focusing structure.

1228745 五、發明說明(6) 合,故可完全避免來自預設燈源的光受到不必要的損耗’ 而得到大幅提局顯不效率。 再者,由於在預設之不透光區形成有光吸收物質層, 因此可以有效地吸收來自外界之雜散光或來自光學投影組 件中之雜散光,甚至當外界入射光射入此光學投影顯示構 件後,也可以因折射率之緣故,而將其偏折至光吸收物質 層,如此即可大幅提高對比度^ 由於本發明之光學投影顯示構件的光學穿透視窗或光 學擴散反射窗係藉由簡易之光學曝光顯影原理而輕易完成 定位,因此也可以大幅降低製造成本與時間。 另外,由於本發明之光學投影顯示構件之光學穿透視 窗或光學擴散反射窗之形狀、尺寸係隨著光入射角的變化 而自動調整,因此當光學投影顯示構件之顯示尺寸增大 時’光學穿透視窗或光學擴散反射窗仍可位於最佳^穿透 或反射位置,且將光學穿透視窗或光學擴散反射窗之開口 面積維持在最小尺寸。 少菊再ί放ί發明之投影光學裝置,由於使用前述光學投 際’同時得到最佳之對比度與顯示效大顯不尺寸之 顯易2讓ΐ ϊ d:j他目的、特徵、和優點能更明 細說明如下特舉一較佳實施例’並配合所附圖式,作詳 【實施方法】 第4圖係繪示本發明之件 只丨傅什的局部示意圖。如同1228745 V. Description of the invention (6), so it can completely avoid unnecessary loss of light from the preset light source ', which can greatly improve the efficiency of the system. Furthermore, since a light absorbing material layer is formed in a predetermined opaque area, it can effectively absorb stray light from the outside or stray light from an optical projection component, and even when external incident light enters this optical projection display After the component, it can also be deflected to the light absorbing material layer due to the refractive index, so that the contrast can be greatly improved ^ Because the optical transmission window or optical diffusion reflection window of the optical projection display component of the present invention is The simple optical exposure and development principle makes positioning easy, so it can also greatly reduce manufacturing costs and time. In addition, since the shape and size of the optical transmission window or optical diffuse reflection window of the optical projection display member of the present invention are automatically adjusted with the change of the light incident angle, when the display size of the optical projection display member increases, the The transmission window or optical diffusion reflection window can still be located at the optimal transmission or reflection position, and the opening area of the optical transmission window or optical diffusion reflection window is maintained at a minimum size. The projection optical device invented by Shao Ju again, due to the use of the aforementioned optical communication system, at the same time, it can obtain the best contrast and display efficiency. The size and size of the display are easy to display. 2 Let ΐ d: j other purposes, features, and advantages A more detailed description is given below in conjunction with a preferred embodiment, and in conjunction with the attached drawings, [implementation method] FIG. 4 is a partial schematic diagram showing only the components of the present invention. as

1228745 五、發明說明(7) 第4圖所示,顯示構件2 〇 〇係具有光學聚隹 面板⑽'2—及具有光學穿透視窗208的光吸妆二構2〇6、光學 〜久吹物皙居2 Π 4,f 中光學穿透視窗2 0 8係以光學曝光顯影法 / 、 、 光學面板2 0 2係用以將來自其一側面之入一 側面散射出去。其作用原理係為藉由光學2〇2 ^ 之空氣介質間的折射率之差異’而使光自光學面板2〇2之 表面射出時產生較大之散射角度,如此即可達到廣 效果。1228745 V. Description of the invention (7) As shown in FIG. 4, the display member 2000 is an optical polymer panel ⑽'2—and a light-absorbing makeup structure 206 with an optical transmission window 208. In Wuxiju 2 Π 4, f, the optical penetrating window 208 is an optical exposure developing method, and the optical panel 208 is used to scatter out from one side to the other side. Its working principle is that by using the difference in refractive index between the air medium of the optical 202 ', a large scattering angle is generated when light is emitted from the surface of the optical panel 202, so that a wide effect can be achieved.

光學聚焦結構2 0 6係具有多個微光學聚焦元件2 1 〇。每 一微光學聚焦元件2 10係用以將來自一側之光 對# 應之另一側,以使入射之光線聚焦於—焦點…於相對 光吸收物質層204係位於光學面板20 2盥光學聚隹姓 2 0 6之間’其係用以吸收不必要的雜散光線\ 光^ 收物質層204内具有多個光學穿透視窗2〇8,其中,光學穿 透視窗208之位置係與微光學聚焦元件21〇之聚焦焦點相互 對應,而且光學穿透視窗2 0 8之材質例如是空氣介質、光 學擴散穿透物質或光學穿透物質。另外,光學穿透視窗 2 0 8之形成方法例如是諸如曝光顯影法等的光學曝光顯影 法0The optical focusing structure 206 has a plurality of micro-optical focusing elements 2 1 0. Each micro-optical focusing element 2 10 is used to align the light from one side to the other side, so that the incident light is focused on-the focal point ... The light-absorbing material layer 204 is located on the optical panel 20 2 It is used to absorb unnecessary stray light between light and light. It is used to absorb unnecessary stray light. The light receiving material layer 204 has multiple optical transmission windows 208. The position of the optical transmission window 208 is The focusing focal points of the micro-optical focusing element 210 correspond to each other, and the material of the optical transmission window 208 is, for example, an air medium, an optical diffusion penetrating substance, or an optical penetrating substance. In addition, a method of forming the optical transmission window 208 is, for example, an optical exposure development method such as an exposure development method.

接著,以第一較佳實施例說明本發明之顯示構件3 〇 〇 之製造方式。請參照第5 A圖,首先提供一個光學聚焦結構 3 0 2,且此光學聚焦結3 〇 2具有多個微光學聚焦元件 3 1 4。接著,在光學聚焦結構3 〇 2上形成一層光敏感材料層 3 0 4 a,其中光敏感材料層3 0 4 a内係摻雜有光吸收物質。光Next, the first preferred embodiment is used to describe the manufacturing method of the display member 300 of the present invention. Please refer to FIG. 5A. First, an optical focusing structure 3 02 is provided, and the optical focusing junction 3 02 has a plurality of micro-optical focusing elements 3 1 4. Next, a light-sensitive material layer 3 0 4 a is formed on the optical focusing structure 3 02. The light-sensitive material layer 3 0 4 a is doped with a light-absorbing substance. Light

第12頁 1228745Page 12 1228745

感材 敏感材料層304a之材料例如是正光敏感材料、 料或含前述任一光敏感材料的光阻劑。 之後,於預設使用光源位置(約為第6圖所示之光學 投影組件31 0之位置)上設置一曝光光源(未繪示),此 曝光光源例如是UV光源,此曝光光源之發光形0式係與光 投影組件3 1 0之形式相同。Sensitive material The material of the sensitive material layer 304a is, for example, a positive light-sensitive material, a material, or a photoresist containing any of the foregoing light-sensitive materials. After that, an exposure light source (not shown) is set at a preset light source position (approximately the position of the optical projection component 3100 shown in FIG. 6). The exposure light source is, for example, a UV light source, and the light emitting shape of the exposure light source is The type 0 system is the same as the form of the light projection module 3 110.

接著,驅動此曝光光源以使其發射出光線,此光線 (如同圖中箭頭所示)以入射角度0的方式入射至光學聚 焦結構30 2中,經由其上之微光學聚焦元件314的聚隹作 用,而於光敏感材料層304a上形成一聚焦光點,並使此部 分之光敏感材料層304a曝光。而且,此部分之形狀係與 光光源之光道相對應。 之後,凊參照第5B圖,移除被曝光之光敏感材料層 3 0 4a而形成具有多個開口 30 6a的光敏感材料層,其中此部 分之光敏感材料層係作為光吸收物質層3〇4b。Next, the exposure light source is driven to emit light, and the light (as shown by the arrow in the figure) is incident into the optical focusing structure 302 at an incident angle of 0, and passes through the focusing of the micro-optical focusing element 314 thereon. Function, a focused light spot is formed on the light-sensitive material layer 304a, and the light-sensitive material layer 304a of this portion is exposed. Moreover, the shape of this part corresponds to the track of the light source. Then, referring to FIG. 5B, the exposed light-sensitive material layer 3 0 4a is removed to form a light-sensitive material layer having a plurality of openings 30 6a. The light-sensitive material layer in this part is used as a light-absorbing material layer 3. 4b.

接著,請參照第5C圖,於開口 30 6a中形成光學穿透材 料層,以作為光學穿透視窗3 06b。另外,此光學穿透視窗 30 6b也可以直接由空氣介質所構成。之後,於光學穿透^ 窗3 0 6b及光吸收物質層304b上形成光學面板3〇8。如此即 可完成顯示構件3 0 0之製作。 請參照第6圖,組合上述本發明之顯示構件釗〇與光學 投影組件310即可得到本發明之投影光學裝置3丨2。其中光 4-技影組件3 1 0係用以提供投影光學裝置3 1 2所需的影像光 束。光學投影組件3 1 0例如是由用以產生影像之光闕Next, referring to FIG. 5C, an optical penetrating material layer is formed in the opening 30 6a as an optical penetrating window 3 06b. In addition, the optical transmission window 30 6b may be directly composed of an air medium. Thereafter, an optical panel 308 is formed on the optical transmission window 306b and the light absorbing material layer 304b. In this way, the fabrication of the display member 300 can be completed. Referring to FIG. 6, the above-mentioned display member Zhao and the optical projection module 310 of the present invention are combined to obtain the projection optical device 3 丨 2 of the present invention. The light 4-technical shadow module 3 10 is used to provide the image light beam required by the projection optical device 3 1 2. The optical projection module 3 1 0 is, for example, a light used to generate an image.

第13頁 1228745 五、發明說明(10) 積。 綜上所述,此顯示構件上之光學穿透視窗之位置與形 狀皆為最佳的,故使用此顯示構件之投影光學裝置可以同 時具有最佳之對比度與顯示效率。 另外,第7A圖至第7E圖所示係為本發明之第二較佳實 施例之顯示構件的製造流程。 首先,請參照第7 A圖,提供一個光學聚焦結構4 0 2, 且此光學聚焦結構4 0 2具有多個微光學聚焦元件4 1 2。接 著,在光學聚焦結構40 2上形成一層光敏感材料層404a, 其中光敏感材料層404a例如是正光敏感材料層、負光敏感 材料層。 之後,於預設使用光源位置(約為第6圖所示之光學 投影組件3 1 0之位置)上設置一曝光光源(未繪示),此 曝光光源例如是UV光源,此曝光光源之發光形式係與光學 投影組件3 1 0之形式相同,例如是點光源。 接者’驅動此曝光光源以使其發射出光線,此光線 (如同圖中箭頭所示)以入射角度0的方式入射至光學聚 焦結構402中,經由其上之微光學聚焦元件41 2的聚焦作 用,而於光敏感材料層404a上形成一聚焦光點,並使此部 分之光敏感材料層4 0 4 a曝光。而且,此部分之形狀係與曝 光光源之光道相對應。 之後,請參照第7B圖,移除未曝光之光敏感材料層 4〇4a而形成暴露出光學聚焦結構4〇2的區域4〇4c的光敏感 材料層404b。接著,請參照第7C圖,於區域404c上形成光Page 13 1228745 V. Description of the invention (10) Product. In summary, the position and shape of the optical transmission window on the display member are optimal, so the projection optical device using the display member can have the best contrast and display efficiency at the same time. In addition, FIGS. 7A to 7E show a manufacturing process of a display member according to a second preferred embodiment of the present invention. First, referring to FIG. 7A, an optical focusing structure 4 0 2 is provided, and the optical focusing structure 4 0 2 has a plurality of micro-optical focusing elements 4 1 2. Next, a light-sensitive material layer 404a is formed on the optical focusing structure 402. The light-sensitive material layer 404a is, for example, a positive light-sensitive material layer and a negative light-sensitive material layer. After that, an exposure light source (not shown) is set at a preset light source position (approximately the position of the optical projection module 3 1 0 shown in FIG. 6). The exposure light source is, for example, a UV light source, and the exposure light source emits light. The form is the same as that of the optical projection component 3 10, and is, for example, a point light source. The receiver 'drives the exposure light source so that it emits light, and the light (as shown by the arrow in the figure) is incident into the optical focusing structure 402 at an incident angle of 0, and is focused by the micro-optical focusing element 41 2 thereon. Function, a focused light spot is formed on the light-sensitive material layer 404a, and the light-sensitive material layer 40a of this portion is exposed. Moreover, the shape of this part corresponds to the track of the exposure light source. After that, referring to FIG. 7B, the unexposed light-sensitive material layer 404a is removed to form a light-sensitive material layer 404b that exposes the area 404c of the optical focusing structure 402. Next, referring to FIG. 7C, light is formed on the region 404c.

1228745 五、發明說明(11) 吸收物質層406。 接著’請參照第7D圖’移除殘留之光敏感材料層4〇4b 而形成開口408a。之後,請參照第7E圖,於開〇4〇8a中形 成光學穿透材料層’以作為光學穿透視窗4〇8b。其中,光 學穿透視窗4 0 8 b之材質例如是光學擴散穿透物質或光學穿 透物質。另外’此光學穿、透視窗408b也可以直接由空氣介 質所構成。之後,於光學\穿透視窗408b及光吸收物質層 406上形成光學面板410。如此即可完成顯示構件4〇〇之製 作0 當雜散光入射至本發明之顯示構件3 Q 〇 再者1228745 V. Description of the invention (11) Absorbent material layer 406. Next, "refer to Fig. 7D", the remaining photosensitive material layer 404b is removed to form an opening 408a. After that, referring to FIG. 7E, an optically transmissive material layer 'is formed in the opening 408a as an optical transmission window 408b. The material of the optical transmission window 4 0 8 b is, for example, an optical diffusion transmission material or an optical transmission material. In addition, the optical transmission and see-through window 408b may be directly composed of an air medium. Thereafter, an optical panel 410 is formed on the optical \ transmissive window 408b and the light absorbing material layer 406. In this way, the production of the display member 400 can be completed. 0 When stray light is incident on the display member 3 Q of the present invention.

'π u \J ' 4: U U 時,則會因入射角度與預設之入射角度不同而被光吸收物 質層304b、406所吸收,故顯示構件3〇〇、4〇〇在顯示影像 時’不會受到雜散光之干擾而有較佳之對比度。 另外,本發明雖以具有光學穿透視窗的^示構件為例 進行說明,然並不以此為限,也可以變更為具有 散 反射窗的顯示構件。請參照第8人圖,本發明之顯示構^ 5 0 0也可以成前述步驟中之開口 3〇6a或開口 4〇心之 於開口 30 6a、4〇8a中形成光學擴散反射材料層5〇6,如此 即可知到本發明之顯示構件5 〇 〇。 ’'π u \ J' 4: For UU, it will be absorbed by the light absorbing material layers 304b and 406 because the incident angle is different from the preset incident angle. It will not be disturbed by stray light and has better contrast. In addition, although the present invention is described by taking a display member having an optical transmission window as an example, the invention is not limited to this, and may be changed to a display member having a diffuse reflection window. Referring to the figure of the eighth person, the display structure of the present invention ^ 500 can also form the optical diffusion reflection material layer 5 in the openings 306a or 406a in the foregoing steps in the openings 306a and 408a. 6. In this way, the display member 500 of the present invention can be known. ’

w在At佳實施例中’光線行進之路徑係自光路】、2、 3射入,學聚焦結構5〇2之微光學聚焦元件—中,並經: 光學聚焦7G件508聚焦於光學擴散反射材料層5〇6上。之 後’ 1學擴散反射材料層5〇6將光路i、2、3反射 經過 光學聚焦結構502折射至外卩(亦即光路4、$、:In the preferred embodiment of At, 'the path of the light travels from the optical path], 2, 3, and the micro-optical focusing element-focusing structure 502, and through: Optical focusing 7G element 508 focused on optical diffusion reflection Material layer 506. After that, the first layer of the diffuse reflection material layer 506 reflects the optical paths i, 2, and 3 through the optical focusing structure 502 to refract to the outer frame (that is, the optical paths 4, $, and:

第16頁 1228745 (12) 五、發明說明Page 16 1228745 (12) V. Description of the invention

另外,請參照第8B圖,當光路1、2、3以一入射角度0 射入光學聚焦結構5 0 2時’由於光學擴散反射材料層5 〇 6之 位置在製造之際,係自動隨著入射角度0之變化而調整位 置,因此,以入射角度0射入的光路丨、2、3不會被光吸收 物質層5 0 4吸收,而可維持較佳之顯示效率。 ' 另外,如同第9圖所示,本發明之顯示構件3〇〇也可以 包括有超薄型放大鏡316,此超薄型放大鏡316係為用以提 升投射光線的亮度與均勻度的光學組件。超薄型放大鏡 =型式例如是全像片(Hologram)或菲涅耳透鏡(Frenel 1ens)型式。 1enei 本發明 角度不 顯示影 度。 ’也可 學擴散 上塗佈 以上述 之顯示 形成光 〜啊小傅讦a U U 同而被光吸收物 像時,不會受到 以在光學聚焦結 穿透材料層。其 一層光學擴散穿 光學曝光顯影法 構件之另一實例 學面板而得到另 再者,當外界之雜散光入射至 時’則會因入射角度與預設之入射 質層504所吸收,故顯示構件5〇〇在 外界雜散光之干蟓而有較佳之對比 另外,在本發明之顯示構件中 構與光學穿透視窗之間形成一層光 2 =方法例如是先在光學聚焦結構 透材料層,再塗佈光阻層。之1, 形成光學穿透視窗,即 1 的=構。另外,在此實例中也可以 一實例的顯示構件之結構。 为外,本發明雖以曝 源為點光源為例進行說明二;^投影光學裝置之顯示 然並不以此為限,也可以視In addition, please refer to FIG. 8B. When the optical paths 1, 2, and 3 enter the optical focusing structure 5 0 2 at an incident angle 0, the position of the optical diffusion reflection material layer 5 0 6 is automatically followed by the manufacturing process. The position is adjusted by the change of the incident angle 0. Therefore, the light paths 丨, 2, 3 incident at the incident angle 0 will not be absorbed by the light absorbing material layer 504, and a better display efficiency can be maintained. In addition, as shown in FIG. 9, the display member 300 of the present invention may also include an ultra-thin magnifying glass 316. The ultra-thin magnifying glass 316 is an optical component for improving brightness and uniformity of projected light. Ultra-thin magnifying glass = type is, for example, Hologram or Frenel 1ens. 1enei According to the present invention, the angle does not show the inclination. ’Can also be spread on top of the coating as shown above to form light ~ ah Xiao Fu 讦 a U U When the image is absorbed by the light, it will not be subjected to the optical focusing junction penetrating the material layer. One layer of optical diffusion passes through another example panel of the optical exposure and development method member to obtain another. When stray light from the outside is incident, it will be absorbed by the incident angle and the preset incident mass layer 504, so the display member 500. There is a better contrast in the drying of external stray light. In addition, a layer of light is formed between the structure and the optical transmission window in the display member of the present invention. 2 = The method is to first penetrate the material layer in the optical focusing structure, and then Coating a photoresist layer. One is to form an optical transmission window, that is, 1 = structure. In addition, in this example, the structure of a display member of an example is also possible. In addition, although the present invention uses the exposure source as a point light source as an example to explain the second; ^ the projection optical device display is not limited to this, but can also be viewed

第17頁 1228745 五、發明說明(13) 際情形之需要,而改用如第1 0圖所示之線光源3 i 〇 a。其中 線光源3 1 0 a之直接投射區域可以與面板3 〇 〇相似,也可以 經由透鏡組而使線光源3 1 0 a的投射區域與面板3 〇 〇相似。 綜上所述,在本發明之顯示構件,由於是其光學努透 視窗或光學擴散反射窗之形成方式係為光學曝光的方式, 且其曝光光源係位於此顯示構件之預設燈源的位置,因此 此光學穿透視窗之形狀、位置係與預設燈源之光束經該光 學聚焦結構聚焦後的光束通道相互吻合,故可完全避免來 自預設燈源的光受到不必要的損耗,而得到大幅提高顯示 效率。 再者’由於在預設之不透光區形成有光吸收物質層, 因此可以有效地吸收來自外界之雜散光或來自光學投影組 件中之雜散光,甚至當外界入射光射入此顯示構件後,也 可以因折射率之緣故,而將其偏折至光吸收物質層,如此 即可大幅提高對比度。 由^本^明之顯示構件的光學穿透視窗或光學擴散反 射窗係藉由簡易之光學曝光顯影原理而輕易完成定位,因 此也可以大幅降低製造成本與時間。 另外,由於本發明之顯示構件之光學穿透視窗或光學 擴散反射窗之形狀、尺寸係隨著光入射角的變化而自動調 整,因此當顯不構件之顯示尺寸增大時,光學穿透視窗或 光學擴散反射窗仍可位於最佳之穿透或反射位置,且將光 學穿透視窗或光學擴散反射窗之開口面積維持在最小尺 寸0Page 17 1228745 V. Description of the invention (13) In the case of the circumstance, use the linear light source 3 i 〇 a shown in Fig. 10 instead. The direct projection area of the linear light source 3 100a may be similar to that of the panel 300, or the projection area of the linear light source 3 10a may be similar to that of the panel 300 through a lens group. In summary, the display member of the present invention is formed by an optical exposure method or an optical diffusion reflection window, and the exposure light source is located at a preset light source of the display member. Therefore, the shape and position of the optical transmission window coincide with the beam channels focused by the optical focusing structure of the light beam of the preset light source, so the light from the preset light source can be completely avoided from unnecessary loss, and The display efficiency is greatly improved. Furthermore, since a light absorbing material layer is formed in a predetermined opaque area, it can effectively absorb stray light from the outside or stray light from the optical projection module, even when external incident light enters the display member. It is also possible to deflect it to the light absorbing material layer due to the refractive index, so that the contrast can be greatly improved. The optical transmission window or optical diffusion reflection window of the display member described by ^ Ben ^ is easily positioned by a simple optical exposure and development principle, so the manufacturing cost and time can also be greatly reduced. In addition, since the shape and size of the optical transmission window or optical diffusion reflection window of the display member of the present invention are automatically adjusted as the light incident angle changes, when the display size of the display member increases, the optical transmission window Or the optical diffuse reflection window can still be located at the optimal transmission or reflection position, and the opening area of the optical transmission window or optical diffusion reflection window is maintained at a minimum size of 0

1228745 五、發明說明(14) 再者,本發明之投影光學裝置,由於使用前述顯示構 件作為顯示螢幕,因此可以在增大顯示尺寸之際,同時得 到最佳之對比度與顯示效率。 雖然本發明已以較佳實施例揭露如上,然其並非用以 限定本發明,任何熟習此技藝者,在不脫離本發明之精神 和範圍内,當可作各種之更動與潤飾,因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。1228745 V. Description of the invention (14) Furthermore, since the projection optical device of the present invention uses the aforementioned display element as a display screen, it is possible to obtain the best contrast and display efficiency while increasing the display size. Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make various modifications and retouches without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be determined by the scope of the attached patent application.

第19頁 1228745 圖式簡單說明 第1圖係繪示習知之顯示螢幕的局部示意圖。 第2圖係繪示光源以0角入射至第1圖之顯示螢幕的示 意圖。 第3圖係繪示習知之投影光學裝置的示意圖。 第4圖係繪示本發明之顯示構件的局部示意圖。 第5A圖至第5C圖係繪示本發明之第一較佳實施例的顯 示構件的製造流程示意圖。 第6圖係繪示本發明之一較佳實施例的投影光學裝置 的示意圖。 第7A圖至第7E圖係繪示本發明之第二較佳實施例的顯 示構件的製造流程示意圖。 第8 A圖係繪示本發明之第三較佳實施例的顯示構件的 局部示意圖。 第8B圖係繪示光源以0角入射至第8A圖之顯示構件的 示意圖。 第9圖係繪示本發明之第一較佳實施例之投影光學裝 置的另一實例的示意圖。 第1 0圖係繪示本發明之投影光學裝置的另一實例的示 意圖。 【圖示之符號說明】 1、2、3、4、5、6、7、8、9 :光路 100 :螢幕 102、20 2、3 0 8、410 ··光學面板 1 0 4 :光學球Page 19 1228745 Brief Description of Drawings Figure 1 is a partial schematic diagram showing a conventional display screen. Figure 2 shows the schematic diagram of the light source incident on the display screen of Figure 1 at an angle of 0. FIG. 3 is a schematic diagram showing a conventional projection optical device. FIG. 4 is a partial schematic view showing a display member of the present invention. 5A to 5C are schematic diagrams showing a manufacturing process of a display member according to the first preferred embodiment of the present invention. Fig. 6 is a schematic diagram showing a projection optical device according to a preferred embodiment of the present invention. 7A to 7E are schematic diagrams showing a manufacturing process of a display member according to a second preferred embodiment of the present invention. Fig. 8A is a partial schematic view of a display member according to a third preferred embodiment of the present invention. Fig. 8B is a schematic diagram showing a light source incident on the display member of Fig. 8A at an angle of 0; Fig. 9 is a schematic diagram showing another example of the projection optical apparatus according to the first preferred embodiment of the present invention. Fig. 10 is a schematic view showing another example of the projection optical device of the present invention. [Illustrated Symbols] 1, 2, 3, 4, 5, 6, 7, 8, 9: Optical path 100: Screen 102, 20 2, 3 0 8, 410 ·· Optical panel 1 0 4: Optical ball

第20頁 1228745 間單說明 106 、 204 、 304b 、 406 、 504 :光吸收物質層 1 0 8、3 1 0 :光學投影組件 1 10、312 :投影光學裝置 200、300、400、500 :顯示構件 2 0 6、3 0 2、4 0 2、5 0 2 :光學聚焦結構 20 8、30 6b、408b :光學穿透視窗 210、314、412、508 :微光學聚焦元件 304a、404a、404b :光敏感材料層 306a、 408a: P 汗1 口 316 :超薄型放大鏡 404c :區域 50 6 :光學擴散反射材料層 3 1 0 a :光源 0 :入射角度Page 20, 1228745 Single description 106, 204, 304b, 406, 504: Light absorbing material layer 1 0 8, 3 1 0: Optical projection module 1 10, 312: Projection optical device 200, 300, 400, 500: Display member 2 0 6, 3 0 2, 4 0 2, 5 0 2: Optical focusing structure 20 8, 30 6b, 408b: Optical transmission windows 210, 314, 412, 508: Micro-optical focusing elements 304a, 404a, 404b: Light Sensitive material layers 306a, 408a: Phan 1 port 316: Ultra-thin magnifier 404c: Area 50 6: Optical diffuse reflection material layer 3 1 0 a: Light source 0: Incident angle

第21頁Page 21

Claims (1)

1228745 7、申請專利範圍 ' " ------ 1 · 一種光學投影顯示構件,包括·· 一光學聚焦結構,具有複數個微光學聚焦元件;以及 古…^光吸收層,位於該光學聚焦結構的焦點附近,且具 :禝數個光學穿透視窗,該些光學穿透視窗分別與該些微 先學聚焦元件相互對應,其中,該些光學穿透視窗係以一 光學曝光法所形成。 2 ·如申請專利範圍第1項所述之光學投影顯示構件, 更包括一光學面板,且該光吸收層係位於該光學聚焦結構 與該光學面板之間。 3 ·如申請專利範圍第1項所述之光學投影顯示構件, 其中該光學曝光法包括光學曝光顯影法。 4.如申請專利範圍第1項所述之光學投影顯示構件, 其中該光學曝光法包括·· 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示構件,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 5 ·如申請專利範圍第4項所述之光學投影顯示構件, 其中該曝光光源係選自點光源、線光源所組成之族群其中 之〆。 6.如申請專利範圍第1項所述之光學投影顯示構件, 其中該光學曝光法包括: 以一曝光光源產生一光束; 該光束經一曝光投影鏡頭產生一曝光光束;以及1228745 7. Scope of patent application '" ------ 1 · An optical projection display member, including: · An optical focusing structure, with a plurality of micro-optical focusing elements; and an ancient ... ^ light absorbing layer located in the optical Near the focal point of the focusing structure, there are: a plurality of optical transmission windows, and the optical transmission windows respectively correspond to the micro advanced focusing elements, wherein the optical transmission windows are formed by an optical exposure method . 2. The optical projection display member according to item 1 of the scope of patent application, further comprising an optical panel, and the light absorption layer is located between the optical focusing structure and the optical panel. 3. The optical projection display member according to item 1 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method. 4. The optical projection display member according to item 1 of the scope of the patent application, wherein the optical exposure method comprises: generating an exposure beam with an exposure light source; and projecting the exposure beam onto the optical projection display member, and the exposure The angle of the light beam is approximately equal to the angle of the light source of an actual optical projection display image. 5. The optical projection display member according to item 4 of the scope of patent application, wherein the exposure light source is selected from the group consisting of a point light source and a line light source. 6. The optical projection display member according to item 1 of the scope of patent application, wherein the optical exposure method comprises: generating an exposure light beam with an exposure light source; the exposure beam generating an exposure light beam through an exposure projection lens; and 第22頁 1228745 六、申請專利範圍 將該曝光光束投射至該光學投影顯示構件,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 7.如申請專利範圍第6項所述之光學投影顯示構件, 其中該曝光光源係選自點光源、線光源所組成之族群其中 之一0 8.如申請專利範圍第1項所述之光學投影顯示構件, 其中該些微光學聚焦元件係用以將一入射光束聚焦於該些 光學穿透視窗上。 . 9 ·如申請專利範圍第§項所述之光學投影顯示構件, 其中該些光學穿透視窗位置係隨著該入射光束照射到該光 學聚焦結構後聚焦的光點位置而變。 1 0 ·如申請專利範圍第8項所述之光學投影顯示構 件’其中該些光學穿透視窗之形狀係與該入射光束經該光 予ΛΚ焦結構聚焦後之光道形狀相對應。 1 1 ·如申請專利範圍第1項所述之光學投影顯示構 饵其中該些光學穿透視窗之材質包括空氣介質。 1 2 ·如申請專利範圍第1項所述之光學投影顯示構 牛’其中該些光學穿透視窗之材質包括光學擴散穿透材 料。 1 3 ·如申請專利範圍第1項所述之光學投影顯示構 牛,其中該些光學穿透視窗之材質包括光學穿透材料。 14.如申請專利範圍第丨項所述之光學投影顯示構 件,更包括一光學擴散穿透材料層,位於該光吸收層與該Page 22 1228745 6. Scope of patent application The exposure beam is projected onto the optical projection display member, and the angle of the exposure beam is approximately equal to the angle of an actual optical projection display image source beam. 7. The optical projection display member according to item 6 in the scope of patent application, wherein the exposure light source is one selected from the group consisting of point light sources and line light sources. 0 8. The optical device according to item 1 in the scope of patent application The projection display component, wherein the micro-optical focusing elements are used to focus an incident light beam on the optical transmission windows. 9 · The optical projection display member according to item § of the patent application range, wherein the positions of the optical transmission windows vary with the position of the light spot focused after the incident light beam is irradiated to the optical focusing structure. 10 · The optical projection display component according to item 8 of the scope of the patent application, wherein the shape of the optical transmission windows corresponds to the shape of the track of the incident light beam after the light is focused by the ΛK focal structure. 1 1 · The optical projection display structure described in item 1 of the scope of patent application, wherein the material of the optical transmission windows includes air medium. 1 2 · The optical projection display structure described in item 1 of the scope of the patent application, wherein the materials of the optical transmission windows include optical diffusion transmission materials. 1 3 · The optical projection display structure described in item 1 of the scope of patent application, wherein the materials of the optical transmission windows include optical transmission materials. 14. The optical projection display device according to item 丨 of the patent application scope, further comprising a layer of an optical diffusion penetrating material located between the light absorbing layer and the 1228745 六‘、申請專利範圍 光學聚焦結構之間。 15.如申請專利範圍第1項所述之光學投影顯示構 件,更包括一超薄型放大鏡,位於該光學聚焦結構之一入 光側。 16.如申請專利範圍第1 5項所述之光學投影顯示構 件,其中該超薄型放大鏡之型式包括全像片(Hol〇gram) 型式。 17·如申請專利範圍第1 5項所述之光學投影顯示構 件’其十該超薄型放大鏡之型式包括菲涅耳透鏡(Fresnel 1 e n s ) 型式。 18. 一光 一光 之該光學 一光 一光 有複數個 光學聚焦 光學曝光 19. 包括一光 該光學面 20. 中該光學 影光學 組件, 顯示構 束,其 結構, ,位於 透視窗 互對應 成。 專利範 ’且該 〇 專利範 件包括 一種投 學投影 學投影 影像光 學聚焦 吸收層 光學穿 元件相 法所形 如申請 學面板 板之間 如申請 投影組 裝置,包括: 係用以提供一光學影像光束;以及 件,用以接收來自該光學投影組件 中該光學投影顯示構件包括, 具有複數個微光學聚焦元件,及 該光學聚焦結構的焦點附近,且具 ’該些光學穿透視窗分別與該些微 ’其中’該些光學穿透視窗係以一 圍第18項所述之投影光學裝置,更 光吸收層係位於該光學聚^結構與 圍第1 8項所述之投影光學裝置,其 一光閥(Light Valve),用以蓋生、1228745 VI ', patent application scope Between optical focusing structures. 15. The optical projection display component according to item 1 of the scope of the patent application, further comprising an ultra-thin magnifying lens, which is located on the light incident side of one of the optical focusing structures. 16. The optical projection display component according to item 15 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a Hologram type. 17. The optical projection display member described in item 15 of the scope of the patent application, wherein ten types of the ultra-thin magnifying glass include a Fresnel lens (Fresnel 1 e n s) type. 18. One light, one light, one light, one light, one light, a plurality of optical focusing, optical exposure 19. Including one light, the optical surface 20. The optical shadow optical component, the display beam, the structure, and the perspective windows are corresponding to each other. The patent model and the patent model include a projection projection image, an optical focusing absorption layer, and an optical penetrating element phase method, which is similar to an application panel and an application projection unit, and includes: is used to provide an optical image A light beam; and a piece for receiving from the optical projection display member in the optical projection assembly, a plurality of micro-optical focusing elements, and a vicinity of a focal point of the optical focusing structure, and each of the optical transmission windows and the Some of the optical transmission windows are formed by the projection optical device described in item 18, and the light absorption layer is located in the optical polymer structure and the projection optical device described in item 18, one Light valve 第24頁 1228745 六、申請專利範圍 該光學影像光束。 21. 如申請專利範圍第1 8項所述之投影光學裝置,其 中該光學投影組件包括·· 一光閥,用以產生一影像;以及 一投影鏡頭,用以接收該影像產輸出該光學影像光 束。 22. 如申請專利範圍第18項所述之投影光學裝置,其 中該光學曝光法包括光學曝光顯影法° 2 3.如申請專利範圍第1 8項所述之投影光學裝置,其 中該光學曝光法包括: 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示結構,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 24.如申請專利範圍第23項所述之投影光學裝置,其 中該曝光光源係選自點光源、線光源所組成之族群其中之 —~ 〇 2 5 ·如申請專利範圍第1 8項所述之投影光學裝置,其 中該光學曝光法包括: 以一曝光光源產生一光束; 該光束經一曝光投影鏡頭產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示結構,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 1228745 六、申請專利範圍 2 6·如申請專利範圍第2 5項所述之投影光學裝置,其 中該曝光光源係選自點光源、線光源所組成之族群其中之 -〇 2 7·如申請專利範圍第1 8項所述之投影光學裝置,其 中該些光學穿透視窗位置係隨著入射之該光學影像光束照 射到該光學聚焦結構後聚焦的光點位置而變。 2 8·如申請專利範圍第2 7項所述之投影光學裝置,其 中該些光學穿透視窗之形狀係與該光學影像光束經該光學 聚焦結構聚焦後之光道形狀相對應。 2 9·如申請專利範圍第1 8項所述之投影光學裝置,其 中該些光學穿透視窗之材質包括空氣介質。 3 0·如申請專利範圍第1 8項所述之投影光學裝置,其 中該些光學穿透視窗之材質包括光學擴散穿透材料。 31·如申請專利範圍第1 8項所述之投影光學裝置,其 中該些光學穿透視窗之材質包括光學穿透材料。 3 2·如申請專利範圍第1 8項所述之投影光學裝置,其 中該光學投影顯示構件更包括一光學擴散穿透材料層,位 於該光吸收層與該光學聚焦結構之間。 3 3·如申請專利範圍第1 8項所述之投影光學裝置,更 包栝一超薄型放大鏡,位於該光學聚焦結構之一入光側。 34·如申請專利範圍第33項所述之投影光學裝置,其 中該超薄型放大鏡之型式包括全像片型式。 35·如申請專利範圍第33項所述之投影光學裝置,其 中該超薄型放大鏡之型式包括菲涅耳透鏡型式。Page 24 1228745 6. Scope of patent application The optical image beam. 21. The projection optical device according to item 18 of the scope of patent application, wherein the optical projection component includes a light valve for generating an image; and a projection lens for receiving the image and outputting the optical image beam. 22. The projection optical device according to item 18 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method 2 3. The projection optical device according to item 18 of the scope of patent application, wherein the optical exposure method The method includes: generating an exposure beam with an exposure light source; and projecting the exposure beam onto the optical projection display structure, and the angle of the exposure beam is substantially equal to the angle of an actual optical projection display image source beam. 24. The projection optical device according to item 23 of the scope of patent application, wherein the exposure light source is selected from the group consisting of point light sources and line light sources— ~ 〇 2 5 · As described in item 18 of the scope of patent application The projection optical device, wherein the optical exposure method comprises: generating a light beam by an exposure light source; generating the exposure light beam by an exposure projection lens; and projecting the exposure light beam onto the optical projection display structure, and the exposure beam angle The angle of the light beam with an actual optical projection display image source is approximately 1228745 6. Application scope of patent 26. The projection optical device according to item 25 of the scope of patent application, wherein the exposure light source is selected from point light sources and line light sources Among the ethnic groups-〇 2 7 · The projection optical device as described in item 18 of the patent application scope, wherein the positions of the optical transmission windows are focused after the incident optical image beam is irradiated to the optical focusing structure. The spot position varies. 28. The projection optical device according to item 27 in the scope of the patent application, wherein the shapes of the optical transmission windows correspond to the shape of the track of the optical image beam after being focused by the optical focusing structure. 29. The projection optical device according to item 18 of the scope of patent application, wherein the material of the optical transmission windows includes an air medium. 30. The projection optical device according to item 18 of the scope of patent application, wherein the material of the optical transmission windows includes an optical diffusion transmission material. 31. The projection optical device according to item 18 of the scope of patent application, wherein the material of the optical transmission windows includes an optical transmission material. 32. The projection optical device according to item 18 of the scope of patent application, wherein the optical projection display member further includes a layer of optical diffusion penetrating material located between the light absorbing layer and the optical focusing structure. 3 3. The projection optical device as described in item 18 of the scope of patent application, further comprising an ultra-thin magnifying glass, which is located on the light incident side of one of the optical focusing structures. 34. The projection optical device according to item 33 of the scope of application for a patent, wherein the type of the ultra-thin magnifying glass includes a full-image type. 35. The projection optical device according to item 33 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a Fresnel lens type. 第26頁 1228745 六、申請專利範圍 36· 一種投影光學裝置,包括: 一光學投影組件,係用以提供一光學影像光束;以及 一光學投影顯示構件,用以接收來自該光學投影組件 之該光學影像光束’其中該光學投影顯示構件包括, 一光學聚焦結構,具有複數個微光學聚焦元件, 一光吸收層,係位於該光學聚焦結構的焦點附近,且 該光吸收層内具有複數個光學擴散反射視窗,該些光學擴 散反射視窗分別與該些微光學聚焦元件之聚焦位置相互對 應,其中,該些光學擴散反射視窗係以一光學曝光法所形 成。 37. 如申請專利範圍第36項所述之投影光學裝置,其 中該光學曝光法包括光學曝光顯影法。 38. 如申請專利範圍第36項所述之投影光學裝置,其 中該光學曝光法包括: 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示構件,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 39. 如申請專利範圍第38項所述之投影光學裝置,其 中該曝光光源係選自點光源、線光源所組成之族群其卞之 4 0.如申請專利範圍第36項所述之投影光學裝置,其 中該光學曝光法包括: 以一曝光光源產生一光束;Page 26 1228745 6. Patent application scope 36 · A projection optical device includes: an optical projection component for providing an optical image beam; and an optical projection display component for receiving the optical from the optical projection component "Image light beam" wherein the optical projection display member includes an optical focusing structure having a plurality of micro-optical focusing elements, a light absorption layer located near a focal point of the optical focusing structure, and a plurality of optical diffusions in the light absorption layer. Reflective windows, the optical diffuse reflection windows corresponding to the focusing positions of the micro-optical focusing elements, respectively, wherein the optical diffuse reflection windows are formed by an optical exposure method. 37. The projection optical device according to item 36 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method. 38. The projection optical device according to item 36 of the scope of patent application, wherein the optical exposure method comprises: generating an exposure beam with an exposure light source; and projecting the exposure beam onto the optical projection display member, and the angle of the exposure beam It is approximately equal to the angle of an actual optical projection display image source beam. 39. The projection optical device according to item 38 of the scope of patent application, wherein the exposure light source is selected from the group consisting of point light sources and line light sources. 40. The projection optics according to item 36 of the scope of patent application An apparatus, wherein the optical exposure method includes: generating an optical beam with an exposure light source; 第27頁 1228745 六、申請專利範圍 該光束經一曝光投影鏡頭產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示構件,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致 相等。 4 1 ·如申請專利範圍第4 〇項所述之投影光學裝置,其 中該曝光光源係選自點光源、線光源所組成之族群其中之Page 27 1228745 6. Patent application scope The light beam generates an exposure light beam through an exposure projection lens; and the exposure light beam is projected to the optical projection display member, and the angle of the exposure beam and an actual optical projection display the angle of the image source beam Roughly equal. 4 1 · The projection optical device according to item 40 of the scope of patent application, wherein the exposure light source is selected from the group consisting of a point light source and a line light source. 4 2 ·如申請專利範圍第3 6項所述之投影光學裝置,其 中該些光學擴散反射視窗位置係隨著入射之該光學影像光 束照射到該光學聚焦結構後聚焦的光點位置而變。 43.如申請專利範圍第42項所述之投影光學裝置,其 中δ玄些光學擴散反射視窗之形狀係與該光學影像光束經該 光學聚焦結構聚焦後之光道形狀相對應。 44·如申請專利範圍第36項所述之投影光學裳置,更 包括一超薄型放大鏡,位於該光學聚焦結構之一入光側。 45·如申請專利範圍第44項所述之投影光學装置,其 中該超薄型放大鏡之型式包括全像片型式。 46·如申請專利範圍第44項所述之投影光學裝置,其 中該超薄型放大鏡之型式包括菲涅耳透鏡型式。、4 2 · The projection optical device according to item 36 of the scope of patent application, wherein the positions of the optical diffusion reflection windows are changed with the position of the light spot focused after the incident optical image light beam is irradiated to the optical focusing structure. 43. The projection optical device according to item 42 of the scope of the patent application, wherein the shape of the δ-three optical diffuse reflection windows corresponds to the shape of the optical track of the optical image beam after being focused by the optical focusing structure. 44. The projection optical dress according to item 36 of the scope of the patent application, further comprising an ultra-thin magnifying lens, which is located on the light incident side of one of the optical focusing structures. 45. The projection optical device according to item 44 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a full-image type. 46. The projection optical device according to item 44 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a Fresnel lens type. , 47·如申請專利範圍第36項所述之投影光學震置,其 ^该光學投影組件包括一光閥,用以產生該光學影像光 48·如申請專利範圍第36項所述之投影光學梦署,盆 中該光學投影組件包括: 、 、47. The projection optical device according to item 36 of the patent application scope, wherein the optical projection component includes a light valve for generating the optical image light 48. The projection optical dream according to item 36 of the patent application scope The optical projection components in the basin include:,, 第28頁 1228745 申叫專利範圍 光閥,用以產生一影像;以及 東 投影鏡頭,用以接收該影像並輸出該光學影像光 49· 一種光學投影顯示構件的製造方法,包括: 提供一光學聚焦結構,且該光學聚焦結構上形成有複 數個微光學聚焦元件; 於該光學聚焦結構的焦點附近形成一光敏感材料層; 進行一光學曝光顯影步驟,於該光敏感材料層中形成 複數個第一圖案;以及Page 28, 1228745, a patented light valve for generating an image; and an east projection lens for receiving the image and outputting the optical image light 49. A method for manufacturing an optical projection display member, including: providing an optical focus Structure, and a plurality of micro-optical focusing elements are formed on the optical focusing structure; a light-sensitive material layer is formed near the focal point of the optical focusing structure; and an optical exposure and development step is performed to form a plurality of first light-sensitive material layers in the light-sensitive material layer. A pattern; and 移除部分該光敏感材料層,以於該光敏感材料層内形 成複數個第一圖案區塊。 5 0 ·如申請專利範圍第4 9項所述之光學投影顯示構件 的製造方法,其中該光學曝光顯影步驟包括·· 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光敏感材料層’且該曝光光束 角度與一實際光學投影顯示影像來源光束的角度大致相 等。A part of the light-sensitive material layer is removed, so that a plurality of first pattern blocks are formed in the light-sensitive material layer. 50. The method for manufacturing an optical projection display member according to item 49 of the scope of the patent application, wherein the optical exposure and development step includes: generating an exposure beam with an exposure light source; and projecting the exposure beam to the light sensitive Material layer ', and the angle of the exposure beam is substantially equal to the angle of an actual optical projection display image source beam. 51·如申請專利範圍第5 0項所述之光學投影顯不構件 的製造方法,其中該曝光光源係選自點光源、線光源所組 成之族群其中之一。 一 5 2·如申請專利範圍第49項所述之光學投影顯不構件 的製造方法,其中該光學曝光顯影贵驟包括: 以一曝光光源產生一光束; , 該光束經一曝光投影鏡頭產生/曝光光束,以及51. The method for manufacturing an optical projection display member according to item 50 of the scope of the patent application, wherein the exposure light source is one selected from the group consisting of a point light source and a line light source. 522. The method for manufacturing an optical projection display member as described in item 49 of the scope of patent application, wherein the optical exposure and development steps include: generating an optical beam with an exposure light source; and generating the optical beam through an exposure projection lens / Exposure beam, and 第29頁 1228745 ^^------------ 、'申請專利範圍 將該曝光光束投射至該光敏感材料層,且該曝光光束 胃度與一實際光學投影顯示影像來源光束的角度大致相 等。 53·如申請專利範圍第52項所述之光學投影顯示構件 白勺沒造方法,其中該曝光光源係選自點光源、線光源所組 成之族群其中之一。 54·如申請專利範圍第〜49項所述之光學投影顯示構件 的製造方法,更包括於該些第一圖案區塊中形成一第一材 料層。 5 5 ·如申請專利範圍第5 4項所述之光學投影顯示構件 的製造方法,其中該光敏感材料層之材質包括光吸收物 質。 56.如申請專利範圍第55項所述之光學投影顯示構件 的製造方法’更包括於該第一材料層及該光敏感材料層上 形成一光學面板。 , 5 7.如申請專利範圍第5 5項所述之光學投影顯示 的製造方法,其中該第一材料層包括光學擴散穿透材料 層。 5 8 ·如申請專利範圍第5 5項所述之光學投影顯示構件 的製造方法,其中該第·一材料層包括光學穿透材料層。 59.如申請專利範園第49項所·述之光學投影顯示構件 的製造方法,其中在形成該光敏感材料層之步驟前更包括 於該光學聚焦結構上形成一光學擴散穿透材料層,且該光 學擴散穿透材料層位於該光敏感材料層與該光學聚焦結構1228745 on page 29 ^^ ------------, the scope of the patent application is to project the exposure beam onto the light-sensitive material layer, and the exposure beam stomach and an actual optical projection display the image source beam The angles are roughly equal. 53. The optical projection display member according to item 52 of the scope of the patent application, wherein the exposure light source is selected from one of a group consisting of a point light source and a line light source. 54. The method for manufacturing an optical projection display member according to the scope of the patent application No. ~ 49, further comprising forming a first material layer in the first pattern blocks. 5 5 · The method for manufacturing an optical projection display member according to item 54 of the scope of patent application, wherein the material of the light-sensitive material layer includes a light-absorbing substance. 56. The method for manufacturing an optical projection display member according to item 55 of the scope of patent application, further comprising forming an optical panel on the first material layer and the light-sensitive material layer. 5 7. The method for manufacturing an optical projection display according to item 55 of the scope of patent application, wherein the first material layer includes an optical diffusion penetrating material layer. 58. The method for manufacturing an optical projection display member according to item 55 in the scope of the patent application, wherein the first material layer includes an optically transmissive material layer. 59. The method for manufacturing an optical projection display member as described in item 49 of the patent application park, wherein before the step of forming the light-sensitive material layer, further comprising forming an optical diffusion penetrating material layer on the optical focusing structure, And the optical diffusion penetrating material layer is located on the light sensitive material layer and the optical focusing structure 第30頁 1228745 _ 六、申請專利範圍 之間。 60.如申請專利範圍第55項所述之光學投影顯示構件 的製造方法,其中該第一材料層包括光學擴散反射材料 層。 61·如申請專利範園第5 4項所述之光學投影顯示構件 的製造方法,更包括: 移除該光敏感材料層,以形成複數個第二圖案區塊; 以及 於該些第二圖案區塊中形成一第二材料層。 62.如申請專利範圍第6 1項所述之光學投影顯示構件 的製造方法,更包括於該第一材料層及該第二材料層上形 成一光學面板。 6 3·如申請專利範圍第61項所述之光學投影顯示構件 的製造方法,其中該第二材料層包括光吸收物質層。 64.如申請專利範圍第63項所述之光學投影顯示構件 的製造方法,其中該第一材料層包括光學擴散穿透材料 層。 6 5.如申請專利範圍第6 3項所述之光學投影顯示構件 的製造方法,其中該第一材料層包括光學穿透材料層。 6 6·如申請專利範圍第6 3項所述之光學投影顯示構件 的製造方法,其中該第一材料層包括光學擴散反射材料 層。 6 7.如申請專利範圍第6 1項所述之光學投影顯示構件 的製造方法,其中該第一材料層包括光吸收物質層。Page 30 1228745 _ VI. The scope of patent application. 60. The method for manufacturing an optical projection display member according to item 55 of the patent application scope, wherein the first material layer includes an optical diffuse reflection material layer. 61. The method for manufacturing an optical projection display member according to Item 54 of the patent application park, further comprising: removing the light-sensitive material layer to form a plurality of second pattern blocks; and the second patterns A second material layer is formed in the block. 62. The method for manufacturing an optical projection display member according to item 61 of the scope of patent application, further comprising forming an optical panel on the first material layer and the second material layer. 6 3. The method for manufacturing an optical projection display member according to item 61 of the patent application scope, wherein the second material layer includes a light absorbing substance layer. 64. The method for manufacturing an optical projection display member according to item 63 of the scope of patent application, wherein the first material layer includes an optical diffusion penetrating material layer. 6 5. The method for manufacturing an optical projection display member according to item 63 of the patent application scope, wherein the first material layer includes an optically transmissive material layer. 6 6. The method for manufacturing an optical projection display member according to item 63 of the scope of the patent application, wherein the first material layer includes an optical diffuse reflection material layer. 6 7. The method for manufacturing an optical projection display member according to item 61 of the scope of patent application, wherein the first material layer includes a light absorbing substance layer. 1228745 六、申請專利範圍 68·如申請專利範圍第67項所述之光學投影顯示構件 的製造方法,其中該第二材料層包括光學擴散穿透材料 層0 69·如申請專利範圍第67項所述之光學投影顯示構件 的製造方法,其中該第二材料層包括光學穿透材料層。 70. 如申請專利範圍第67項所述之光學投影顯示構件 的製造方法,其中該第二材料層包栝光學擴散反射材料 層。 71. 如申請專利範圍第49項所述之光學投影顯示構件 的製造方法,其中該光學曝光顯影步驟包括: 於一預設使用光源位置上提供/曝光光源;以及 以該曝光光源照射該光學聚焦結構並聚焦於該光敏感 材料層。 72. 如申請專利範圍第7 1項所述之光學投影顯示構件 的製造方法,其中該曝光光源係選自點光源、線光源所組 成之族群其中之一。 73. 如申請專利範圍第71項所述之光學投影顯示構件 的製造方法,其中該曝光光源包栝UV光源。 74. 如申請專利範圍第49項所述之光學投影顯示構件 的製造方法,其中移除部分該光敏感材料層的步驟係移除 已曝光之該光敏感材料層。 75. 如申請專利範圍第49項所述之光學投影顯示構件 的製造方法,其中移除部分該光敏感材料層的步驟係移除 未曝光之該光敏感材料層。 1 m 1 第32頁 1228745 —-----— 六、申請專利範圍 76·如申請專利範圍第49項所述之光學投影 的製造方法,其中該些微光學聚焦元件係形於構件 焦結構之一第一表面上。 战於该光學聚 77·如申請專利範圍第76項所述之光學投影顯示 的製造方法’其中該光敏感材料層係形成於該光學聚隹2 =之一第二表面上,且該第二表面係與該第一表面相g結 78.如申請專利範圍第49項所述之光學投影顯示構件 的製造方法,更包括於該光學聚焦結構之一入光側形成— 超薄型放大鏡。 7 9·如申請專利範圍第78項所述之光學投影顯示構件 的製造方法,其中該超薄型放大鏡之型式包括全像片型 式。 8 0,如申請專利範圍第78項所述之光學投影顯示構件 的製造方法,其中該超薄型放大鏡之型式包括菲涅耳透鏡 型式。 8 1, 一種光學投影顯示構件,包括·· 一光學聚焦結構,具有複數個微光學聚焦元件;以及 一光吸收層,位於該光學聚焦結構的焦點附近,且具 有複數個光學擴散反射窗,該些光學擴散反射窗分別與該 些微光學聚焦元件相互對應,其中,該些光學擴散反射窗 係以一光學曝光法所形成。 8 2 ·如申請專利範圍第8 1項所述之光學投影顯示構 件,其中該光學曝光法包括光學曝光顯影法。1228745 VI. Patent application range 68. The method for manufacturing an optical projection display member as described in item 67 of the patent application scope, wherein the second material layer includes an optical diffusion penetrating material layer 0 69. The method for manufacturing an optical projection display component described above, wherein the second material layer includes an optically transmissive material layer. 70. The method for manufacturing an optical projection display member according to item 67 of the patent application, wherein the second material layer includes an optical diffuse reflection material layer. 71. The method for manufacturing an optical projection display member according to item 49 of the scope of patent application, wherein the step of optically exposing and developing comprises: providing / exposing a light source at a preset light source position; and irradiating the optical focus with the exposure light source Structure and focus on the layer of light-sensitive material. 72. The method for manufacturing an optical projection display member according to item 71 of the scope of patent application, wherein the exposure light source is one selected from the group consisting of a point light source and a line light source. 73. The method for manufacturing an optical projection display member according to item 71 of the scope of patent application, wherein the exposure light source includes a UV light source. 74. The method for manufacturing an optical projection display member according to item 49 of the scope of the patent application, wherein the step of removing a portion of the light-sensitive material layer is removing the exposed light-sensitive material layer. 75. The method for manufacturing an optical projection display member according to item 49 of the scope of patent application, wherein the step of removing a portion of the light-sensitive material layer is to remove the unexposed light-sensitive material layer. 1 m 1 Page 32 1228745 —-----— VI. Patent Application Range 76 · The manufacturing method of optical projection as described in item 49 of the patent application range, wherein the micro-optical focusing elements are formed in the focal structure of the component. On the first surface. Fighting the optical polymer 77. The manufacturing method of the optical projection display as described in item 76 of the patent application scope, wherein the light-sensitive material layer is formed on one of the second surfaces of the optical polymer 2 and the second The surface is connected to the first surface. 78. The method for manufacturing an optical projection display member as described in item 49 of the scope of patent application, further comprising forming an ultra-thin magnifying lens on the light incident side of the optical focusing structure. 7 9. The method for manufacturing an optical projection display member according to item 78 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a holographic type. 80. The method for manufacturing an optical projection display member according to item 78 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a Fresnel lens type. 81. An optical projection display member comprising: an optical focusing structure having a plurality of micro-optical focusing elements; and a light absorbing layer located near a focal point of the optical focusing structure and having a plurality of optical diffusion reflection windows, the The optical diffusion reflection windows correspond to the micro-optical focusing elements, respectively. The optical diffusion reflection windows are formed by an optical exposure method. 8 2 The optical projection display device according to item 81 of the scope of patent application, wherein the optical exposure method includes an optical exposure development method. 第33頁 1228745 六、申請專利範圍 8 3 ·如申請專利範圍第8 1項所述之光學投影顯示構 件,其中該些光學擴散反射窗位置係隨著入射之一光束照 射到該光學聚焦結構後聚焦的光點位置而變。 8 4 ·如申請專利範圍第8 3項所述之光學投影顯示構 件,其中該些光學擴散反射窗之形狀係與入射之該光束照 射到該光學聚焦結構後聚焦之光道形狀相對應。 8 5 ·如申請專利範圍第8 1項所述之光學投影顯示構 件,更包括一超薄型放大鏡,位於該光學聚焦結構之一入 光側。Page 33 1228745 6. Application for Patent Range 8 3 · The optical projection display component as described in Item 81 of the application for patent range, wherein the positions of the optical diffusion reflection windows are after the incident light beam hits the optical focusing structure. The position of the focused spot changes. 84. The optical projection display device according to item 83 of the scope of patent application, wherein the shapes of the optical diffusion reflection windows correspond to the shape of the focused track after the incident light beam is irradiated to the optical focusing structure. 8 5 · The optical projection display component according to item 81 of the scope of patent application, further comprising an ultra-thin magnifying glass, which is located on the light incident side of one of the optical focusing structures. 8 6 ·如申請專利範圍第8 5項所述之光學投影顯示構 件,其中該超薄型放大鏡之型式包栝全像片型式。 8 7·如申請專利範圍第8 5項所述之光學投影顯示構 件,其中該超薄型放大鏡之型式包括菲涅耳透鏡型式。 8 8·如申請專利範圍第8 1項所述之光學投影顯示構 件,其中該些光學擴散反射窗之材質包括光學擴散反射材 料。 89.如申請專利範圍第8 1項所述之光學投影顯示構 件,更包括一光學擴散穿透材料層,位於該光吸收層與該 光學聚焦結構之間。86. The optical projection display device according to item 85 of the scope of the patent application, wherein the ultra-thin magnifying glass includes a full-photographic type. 87. The optical projection display device according to item 85 of the scope of patent application, wherein the type of the ultra-thin magnifying glass includes a Fresnel lens type. 8 8. The optical projection display component according to item 81 of the scope of patent application, wherein the materials of the optical diffusion reflection windows include optical diffusion reflection materials. 89. The optical projection display device according to item 81 of the scope of patent application, further comprising an optical diffusion penetrating material layer located between the light absorption layer and the optical focusing structure. 9 0·如申請專利範圍第8 1項所述之光學投影顯示構 件,其中該光學曝光法包括: 、 以一曝光光源產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示結構,且該曝光 光束角度與一實際光學投影顯示影像來源光束的角度大致90. The optical projection display member according to item 81 of the scope of the patent application, wherein the optical exposure method includes: generating an exposure beam with an exposure light source; and projecting the exposure beam onto the optical projection display structure, and The angle of the exposure beam is approximately the same as the angle of the source beam of an actual optical projection display image 第34頁 1228745 六、申請專利範圍 相等。 9 1 ·如申請專利範圍第90項所述之光學投影顯示構 件,其中該曝光光源係選自點光源、線光源所組成之族群 其中之一。 9 2 ·如申請專利範圍第8 1項所述之光學投影顯示構 件,其中該光學曝光法包括: 以一曝光光源產生一光束; 該光束經一曝光投影鏡頭產生一曝光光束;以及 將該曝光光束投射至該光學投影顯示結構,且該曝光 光東角度與一實際光學投影顯示影像來源光束的角度大致 相等。 一 93如申請專利範圍第92項所述之,學投影顯示構 件,其中該曝光光源係選自點光源、線光源所組成之族群 其中之〆〇Page 34 1228745 6. The scope of patent application is equal. 9 1 · The optical projection display component according to item 90 of the scope of patent application, wherein the exposure light source is one selected from the group consisting of a point light source and a line light source. 9 2 · The optical projection display member according to item 81 of the patent application scope, wherein the optical exposure method includes: generating an exposure light source by an exposure light source; generating the exposure light beam by an exposure projection lens; and exposing the exposure light The light beam is projected onto the optical projection display structure, and the east angle of the exposure light is approximately equal to the angle of an actual optical projection display image source light beam. A 93. As described in item 92 of the scope of patent application, a projection display component is learned, wherein the exposure light source is selected from the group consisting of a point light source and a line light source. 第35頁Page 35
TW92129420A 2003-04-23 2003-10-23 Projection optics apparatus and thereof display device and thereof manufacturing method TWI228745B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
TW92129420A TWI228745B (en) 2003-04-24 2003-10-23 Projection optics apparatus and thereof display device and thereof manufacturing method
US10/828,080 US7102819B2 (en) 2003-04-24 2004-04-19 Projection optics apparatus and thereof display device and thereof manufacturing method
DE102004019112A DE102004019112A1 (en) 2003-04-24 2004-04-20 Optical projection device and associated display device and associated manufacturing method
US11/483,023 US20060250693A1 (en) 2003-04-23 2006-07-07 Projection optics apparatus and display device thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW92109539 2003-04-24
TW92129420A TWI228745B (en) 2003-04-24 2003-10-23 Projection optics apparatus and thereof display device and thereof manufacturing method

Publications (2)

Publication Number Publication Date
TWI228745B true TWI228745B (en) 2005-03-01
TW200515457A TW200515457A (en) 2005-05-01

Family

ID=36013520

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92129420A TWI228745B (en) 2003-04-23 2003-10-23 Projection optics apparatus and thereof display device and thereof manufacturing method

Country Status (1)

Country Link
TW (1) TWI228745B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7530712B2 (en) 2006-03-17 2009-05-12 Industrial Technology Research Institute Reflective illumination device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI396037B (en) * 2008-12-11 2013-05-11 Ind Tech Res Inst Lens unit and projection screen made using the lens unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7530712B2 (en) 2006-03-17 2009-05-12 Industrial Technology Research Institute Reflective illumination device

Also Published As

Publication number Publication date
TW200515457A (en) 2005-05-01

Similar Documents

Publication Publication Date Title
EP0727056B1 (en) Rear projection screen
US10901122B2 (en) Screen for display
JPH0463361B2 (en)
CN101512433B (en) High contrast projection screen
JP2749156B2 (en) Reflective screen and display device using the same
US6862139B2 (en) Rear projection screen, optical component thereof, and method for manufacturing the optical component
KR101182491B1 (en) Optical film with partially coated structure array and manufacturing method thereof
TWI228745B (en) Projection optics apparatus and thereof display device and thereof manufacturing method
TWI232993B (en) Projection optics apparatus and thereof display device and thereof manufacturing method
JP2883430B2 (en) Liquid crystal display
US7102819B2 (en) Projection optics apparatus and thereof display device and thereof manufacturing method
WO2006053176A2 (en) Front-projection screen with subsurface diffusion targets
JP5286633B2 (en) Rear projection screen
JP2004302005A (en) Transmission screen
KR100662911B1 (en) Lenticular lens sheet and manufacturing method thereof
TWI251680B (en) Rear-projection screen and optical device thereof
JP4867167B2 (en) Transmission screen and rear projection display device
JP2002006112A (en) Lens sheet, method of manufacturing the same, and transmission screen
JP2004191429A (en) TRANSMISSION SCREEN, ITS MANUFACTURING METHOD, AND REAR PROJECTION PROJECTION DEVICE
JP2006171486A (en) Total reflection prism sheet, method for manufacturing total reflection prism sheet, rear projection display device
CN1549052A (en) Display device, method of manufacturing the same, and projection optical apparatus using the same
TW200925683A (en) Light guide plate, manufacturing method and application thereof
JP2004271924A (en) Rear projection screen and image display device using the same
JPS59228235A (en) Transparent screen
JP2006017839A (en) Lenticular lens sheet, rear projection type screen, and method for manufacturing lenticular lens sheet

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees